CN207856637U - A kind of novel low temperature plasma processing equipment - Google Patents

A kind of novel low temperature plasma processing equipment Download PDF

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Publication number
CN207856637U
CN207856637U CN201721690688.6U CN201721690688U CN207856637U CN 207856637 U CN207856637 U CN 207856637U CN 201721690688 U CN201721690688 U CN 201721690688U CN 207856637 U CN207856637 U CN 207856637U
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China
Prior art keywords
air inlet
shell
low temperature
filter plate
plasma processing
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CN201721690688.6U
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Chinese (zh)
Inventor
赵元兵
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Beijing Xingyi Yuan Technology Development Co Ltd
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Beijing Xingyi Yuan Technology Development Co Ltd
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Priority to CN201721690688.6U priority Critical patent/CN207856637U/en
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Abstract

The utility model discloses a kind of novel low temperature plasma processing equipments, it is related to off-gas cleaning equipment field, the utility model includes shell, shell left and right ends are respectively arranged with admission line and outlet pipe, the shell includes the air inlet being connected to admission line and the gas outlet that is connected to outlet pipe, the air inlet and gas outlet is reducer pipe, several wind-guiding isocons are provided in air inlet, in shell air inlet adjustment structure is disposed with along gas flow direction, glass fiber filters, plasma treatment mechanism and activated carbon adsorption layer, the utility model is simple in structure, treatment effeciency is high, deodorization eliminates the unusual smell the good advantage of effect.

Description

A kind of novel low temperature plasma processing equipment
Technical field
The utility model is related to off-gas cleaning equipment fields, are set more particularly to a kind of processing of novel low temperature plasma It is standby.
Background technology
Industrial waste gas refers to that generated in plant area of enterprise fuel combustion and production process various are discharged into containing for air There is the general name of contaminant gases.These exhaust gas have:Carbon dioxide, carbon disulfide, hydrogen sulfide, fluoride, nitrogen oxides, chlorine, chlorine Change hydrogen, carbon monoxide, sulfuric acid mist lead mercury, beryllide, flue dust and industrial dust, is discharged into air, air can be polluted.These substances Enter the internal of people by different approach respiratory tracts, some directly generates harm, and some also has cumulative effect, can be more serious The health for endangering people.Different material has Different Effects.
Industrial waste gas of plasma treatment technology is as a kind of new environmental pollution treatment technology, since it is to pollutant point The efficient-decomposition of son and processing the features such as low energy consumption, a new thinking is opened for the processing of industrial waste gas.Plasma is anti- Area is answered to be rich in high substance, such as high energy electron, ion, free radical and excited state molecule, polluter in exhaust gas can be with These substances with higher-energy react, and polluter is made to decompose within the extremely short time, and occur subsequent Various reactions are to achieve the purpose that explain pollutant.
Compared with current domestic common gas with foreign flavor administering method, lower temperature plasma technology is applied to foul gas It administers, the mechanism of existing plasma waste gas treatment equipment is complicated, and treatment effeciency is low.
Invention content
The purpose of this utility model is that:In order to solve the volatile organic compounds in exhaust gas and peculiar smell existing equipment hardly possible The technical issues of to handle, the utility model provide a kind of novel low temperature plasma processing equipment.
The utility model specifically uses following technical scheme to achieve the goals above:
A kind of novel low temperature plasma processing equipment, including shell, shell left and right ends be respectively arranged with admission line and Outlet pipe, the shell includes the air inlet being connected to admission line and the gas outlet that is connected to outlet pipe, described Air inlet and gas outlet are reducer pipe, are provided with several wind-guiding isocons in air inlet, in shell along gas flow direction according to It is secondary to be provided with air inlet adjustment structure, glass fiber filters, plasma treatment mechanism and activated carbon adsorption layer, the air inlet adjustment Structure includes the adjustable filter plate that connecting rod, fixed frame and polylith are arranged above and below, and every piece of adjustable filter plate the same end is hinged On connecting rod, the other end of all adjustable filter plates in addition to the adjustable filter plate of the top joins on fixed frame, most The adjustable filter plate other end of upper end is hinged on the inner wall of the housing, and the lower surface that filter plate is adjusted in the lowermost is hinged with The other end of the telescopic shaft of telescopic cylinder, the telescopic cylinder is hinged on bottom in shell.
Further, the angle that the adjustable filter plate can be adjusted in vertical direction is 0~90 °.
Further, the plasma treatment mechanism includes rectangular frame, and the rectangular frame opposite sides is provided with Electrode mounting plate, is connected with positive fixed link on described two electrode mounting plates by insulation rubber sleeve, and the anode is solid Multiple positive discharge blocks are provided in fixed pole at equal intervals, cathode fixed link is connected between described two pieces of electrode mounting plates, Multi-disc negative plate, the negative plate and positive discharge block interlaced arrangement are provided in cathode fixed link at equal intervals.
Further, the negative plate is parallel with positive discharge block.
The beneficial effects of the utility model are as follows:
1, the utility model is simple in structure, and exhaust gas to be clean reaches air inlet by air inlet pipe, if being provided in air inlet It is dry to flow backwards dispersion pipe, exhaust gas can be uniformly dispersed, be conducive to follow-up waste gas absorption and processing;This adjustable air inlet adjustment knot The setting of structure can determine that adjusting gas inlet flow, subsequent glass fiber filters absorbed in exhaust gas as needed The gas of most bulky grain flue dust and little particle flue dust, volatile organic compounds and peculiar smell in plasma treatment mechanism and Activated carbon adsorption layer is decomposed, and discharge standard is reached after absorption.
2, under the action of outer added electric field, a large amount of take that medium discharge generates can electron bombardment pollution for plasma treatment mechanism Object molecule makes its ionization, dissociation and excitation, has then just caused physics, the chemical reaction of a series of complex, has made complicated macromolecular Pollutant is changed into simple small molecule safe material, or the object for making poisonous and harmful substance be transformed into nontoxic or less toxic low evil Matter, to enable pollutant degradation removal.
Description of the drawings
Fig. 1 is the structural schematic diagram of the utility model;
Fig. 2 is the structural scheme of mechanism of plasma treatment mechanism;
Fig. 3 is the structural schematic diagram of air inlet adjustment structure;
Structural schematic diagram when Fig. 4 is the air inflow minimum of Fig. 3.
Specific implementation mode
In order to which those skilled in the art are better understood from the utility model, below in conjunction with the accompanying drawings with following embodiment to this Utility model is described in further detail.
Embodiment 1
As shown in fig. 1 to 4, the present embodiment provides a kind of novel low temperature plasma processing equipment, including shell 10, shells 10 Left and right ends are respectively arranged with admission line 1 and outlet pipe 9, which is characterized in that the shell 10 includes and admission line 1 The air inlet 2 of connection and the gas outlet 8 being connected to outlet pipe 9, the air inlet 2 and gas outlet 8 are reducer pipe, air inlet Several wind-guiding isocons 3 are provided in mouth 2, shell 10 is interior to be disposed with air inlet adjustment structure 4, glass along gas flow direction Fibrous filter layer 5, plasma treatment mechanism 6 and activated carbon adsorption layer 7, the air inlet adjustment structure 4 include connecting rod 4-2, fixation The adjustable filter plate 4-1 that frame 4-3 and polylith are arranged above and below, every piece of the same end adjustable filter plate 4-1 are hinged on connecting rod 4-2 On, the other end of all adjustable filter plate 4-1 in addition to the adjustable filter plate 4-1 of the top joins on fixed frame 4-3, The adjustable filter plate 4-1 other ends of the top are hinged on the inner wall of shell 10, and the lowermost is adjusted under filter plate 4-1 Surface is hinged with the telescopic shaft of telescopic cylinder 4-4, and the other end of the telescopic cylinder 4-4 is hinged on bottom in shell 10.
The angle that the adjustable filter plate 4-1 can be adjusted in vertical direction is 0~90 °.
The plasma treatment mechanism 6 includes rectangular frame 6-1, and the rectangular frame 6-1 opposite sides is provided with electricity Positive fixed link 6-2, institute are connected with by insulation rubber sleeve 6-3 on pole mounting plate 6-7, described two electrode mounting plate 6-7 Be provided with multiple positive discharge block 6-5 on the positive fixed link 6-2 stated at equal intervals, described two pieces of electrode mounting plate 6-7 it Between be connected with cathode fixed link 6-6, multi-disc negative plate 6-4, the negative plate are provided on cathode fixed link 6-6 at equal intervals 6-4 and positive discharge block 6-5 interlaced arrangements.
The negative plate 6-4 is parallel with positive discharge block 6-5.
The above, the only preferred embodiment of the utility model, are not intended to limit the utility model, the utility model Scope of patent protection be subject to claims, it is equivalent made by every specification and accompanying drawing content with the utility model Structure change similarly should be included in the scope of protection of the utility model.

Claims (4)

1. a kind of novel low temperature plasma processing equipment, including shell (10), shell (10) left and right ends are respectively arranged with air inlet Pipeline (1) and outlet pipe (9), which is characterized in that the shell (10) includes the air inlet being connected to admission line (1) (2) and with outlet pipe (9) gas outlet (8) being connected to, the air inlet (2) and gas outlet (8) are reducer pipe, air inlet (2) several wind-guiding isocons (3) are provided in, shell (10) is interior to be disposed with air inlet adjustment structure along gas flow direction (4), glass fiber filters (5), plasma treatment mechanism (6) and activated carbon adsorption layer (7), the air inlet adjustment structure (4) Including the adjustable filter plate (4-1) that connecting rod (4-2), fixed frame (4-3) and polylith are arranged above and below, every piece of adjustable filter plate The same end (4-1) is hinged on connecting rod (4-2), all adjustable filterings in addition to the adjustable filter plate (4-1) of the top The other end of plate (4-1) joins on fixed frame (4-3), and adjustable filter plate (4-1) other end of the top is hinged on shell (10) on inner wall, the lower surface that filter plate (4-1) is adjusted in the lowermost is hinged with the telescopic shaft of telescopic cylinder (4-4), institute The other end for the telescopic cylinder (4-4) stated is hinged on shell (10) interior bottom.
2. novel low temperature plasma processing equipment according to claim 1, which is characterized in that the adjustable filter plate The angle that (4-1) can be adjusted in vertical direction is 0~90 °.
3. novel low temperature plasma processing equipment according to claim 1, which is characterized in that the plasma processor Structure (6) includes rectangular frame (6-1), and rectangular frame (6-1) opposite sides is provided with electrode mounting plate (6-7), described Positive fixed link (6-2) is connected with by insulation rubber sleeve (6-3) on two electrode mounting plates (6-7), the anode is fixed Multiple positive discharge blocks (6-5) are provided on bar (6-2) at equal intervals, are connected between described two pieces of electrode mounting plates (6-7) There is cathode fixed link (6-6), is provided with multi-disc negative plate (6-4), the negative plate in cathode fixed link (6-6) at equal intervals (6-4) and positive discharge block (6-5) interlaced arrangement.
4. novel low temperature plasma processing equipment according to claim 3, which is characterized in that the negative plate (6-4) It is parallel with positive discharge block (6-5).
CN201721690688.6U 2017-12-07 2017-12-07 A kind of novel low temperature plasma processing equipment Active CN207856637U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201721690688.6U CN207856637U (en) 2017-12-07 2017-12-07 A kind of novel low temperature plasma processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201721690688.6U CN207856637U (en) 2017-12-07 2017-12-07 A kind of novel low temperature plasma processing equipment

Publications (1)

Publication Number Publication Date
CN207856637U true CN207856637U (en) 2018-09-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201721690688.6U Active CN207856637U (en) 2017-12-07 2017-12-07 A kind of novel low temperature plasma processing equipment

Country Status (1)

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CN (1) CN207856637U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111405741A (en) * 2020-04-26 2020-07-10 武汉理工大学 Low-temperature plasma generating device
KR102222474B1 (en) * 2020-08-21 2021-03-03 박재완 Apparutus for sterilizing airborne microbial in droplets

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111405741A (en) * 2020-04-26 2020-07-10 武汉理工大学 Low-temperature plasma generating device
KR102222474B1 (en) * 2020-08-21 2021-03-03 박재완 Apparutus for sterilizing airborne microbial in droplets

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