CN102480879A - 铝制品及其制备方法 - Google Patents

铝制品及其制备方法 Download PDF

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CN102480879A
CN102480879A CN2010105615536A CN201010561553A CN102480879A CN 102480879 A CN102480879 A CN 102480879A CN 2010105615536 A CN2010105615536 A CN 2010105615536A CN 201010561553 A CN201010561553 A CN 201010561553A CN 102480879 A CN102480879 A CN 102480879A
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vacuum coating
aluminum
aluminum products
porous surface
preparation
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张新倍
陈文荣
蒋焕梧
陈正士
徐华阳
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to CN2010105615536A priority Critical patent/CN102480879A/zh
Priority to US13/165,345 priority patent/US20120135222A1/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23F1/10—Etching compositions
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    • C23F1/16—Acidic compositions
    • C23F1/20—Acidic compositions for etching aluminium or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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Abstract

本发明提供一种铝制品，包括铝基体及形成于该铝基体上的无色透明真空镀膜层，该铝基体包括经化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，所述纳米孔的深度分布在20～300nm范围内，该真空镀膜层形成于该多孔表面上。该铝制品表面呈现多种颜色。本发明还提供一种上述铝制品的制备方法。

Description

铝制品及其制备方法
技术领域
本发明涉及一种铝制品及其制备方法。
背景技术
铝及铝合金因其质轻以及优良的机械加工性能，使得铝及铝合金被广泛地应用于各种家用电器、汽车、电子产品的外壳。
为了获得较好的外观效果，通常通过阳极氧化、电泳涂装、喷漆等表面装饰处理在铝或铝合金产品表面形成某种颜色的装饰层，然而，经上述处理获得的装饰层的颜色通常是固定不变的，缺乏变化和多样性。随着消费水平的提高，这种外观已经不能满足消费者对这些产品的外观追求。
发明内容
有鉴于此，有必要提供一种颜色多变、具有较佳装饰效果的铝制品。
另外，有必要提供一种上述铝制品的制备方法。
一种铝制品，包括铝基体及形成于该铝基体上的无色透明真空镀膜层，该铝基体包括经化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，所述纳米孔的深度分布在20～300nm范围内，该真空镀膜层形成于该多孔表面上。
一种铝制品的制备方法，包括如下步骤：
提供铝基体；
化学蚀刻处理，以使该铝基体形成多孔表面，该多孔表面分布有多个纳米孔，所述纳米孔的深度分布在20～300nm范围内，孔径分布在30～250nm范围内；
真空镀膜处理，以于该多孔表面形成一层无色透明的真空镀膜层。
相较于现有技术，上述铝制品先通过化学蚀刻处理在该铝基体上形成多孔表面，再通过真空镀膜方法于该多孔表面形成该无色透明的真空镀膜层。由于多孔表面分布有所述纳米孔，使该真空镀膜层在不同的位置具有不同的厚度，即真空镀膜层于所述纳米孔处的厚度大于未形成纳米孔处的厚度。在光的照射下，不同厚度的真空镀膜层对光线的反射与折射的光程差不同，因此不同位置处的真空镀膜层可形成不同颜色的干涉光，使得同一铝制品表面呈现多种颜色，具有较佳的装饰效果。该铝制品的制备方法工艺简单。
附图说明
图1为本发明较佳实施例的铝制品的剖视示意图。
主要元件符号说明
铝制品                100
铝基体                10
多孔表面              12
纳米孔                122
真空镀膜层            30
具体实施方式
请参阅图1，本发明较佳实施例的铝制品100包括铝基体10及形成于铝基体10上的一层无色透明的真空镀膜层30。
铝基体10的材料为纯铝或铝合金。
铝基体10包括经化学蚀刻形成的多孔表面12，该多孔表面12上分布有多个纳米孔122。所述纳米孔122的孔径分布在30～250nm范围内，较佳为30～150nm。纳米孔122的深度分布在20～300nm范围内，较佳为20～100nm。
该真空镀膜层30形成于铝基体10的多孔表面12上。由于多孔表面12分布有所述纳米孔122，真空镀膜层30将所述纳米孔122部分或完全填充，使真空镀膜层30在不同的位置具有不同的厚度，即真空镀膜层30对应于纳米孔122位置的厚度大于未形成纳米孔122位置的厚度。真空镀膜层30可以由金属、金属氧化物或非金属氧化物形成，其中金属可以为钛、铬、铝、锌及锆等，金属氧化物可以为钛、铬、铝、锌及锆的氧化物，非金属氧化物可以为二氧化硅。当真空镀膜层30由所述金属形成时，其厚度在50～150nm范围内，其厚度为150nm以下时，真空镀膜层30接近无色透明，超过150nm时，真空镀膜层30自身的颜色在肉眼观察下开始变得较为明显。当真空镀膜层30由所述金属氧化物或非金属氧化物形成时，其厚度在50nm至2μm范围内。
上述铝制品100在形成该真空镀膜层30前，具有多孔表面12的铝基体10为铝材原色。当多孔表面12形成该真空镀膜层30后，由于多孔表面12分布有所述纳米孔122，使真空镀膜层30在不同的位置具有不同的厚度，即真空镀膜层30于纳米孔122处的厚度大于未形成纳米孔122处的厚度。在光的照射下，不同厚度的真空镀膜层30对光线的反射与折射的光程差不同，因此不同位置处的真空镀膜层30可形成不同颜色的干涉光，使得同一铝制品100表面呈现多种颜色。
上述铝制品100的制备方法，包括如下步骤：
首先，提供该铝基体10。
对铝基体10进行预处理。预处理包括对铝基体10除油及化学抛光。其中，所述除油步骤可以用丙酮清洗大约5分钟后，于乙醇中超声振动大约30min，然后用水清洗。所述化学抛光所用抛光液可以用体积比为8∶1∶1的磷酸(质量浓度为85％)、硝酸和水的混合溶液，抛光时抛光液温度在70～80℃之间，抛光时间大约为5分钟。
对经上述预处理的铝基体10进行化学蚀刻处理，以在铝基体10上形成所述多孔表面12。该化学蚀刻处理的条件为：以含20～50g/L三氯化铁和4.2～5.4mol/L盐酸的水溶液为蚀刻液，蚀刻液温度为20～40℃，蚀刻时间为3～15秒，蚀刻过程中可对蚀刻液进行搅拌。经上述化学蚀刻处理形成的多孔表面12形成所述多个纳米孔122。
对经化学蚀刻的铝基体10进行真空镀膜处理，以在该多孔表面12形成该无色透明的真空镀膜层30。该真空镀膜方法可采用溅镀、蒸镀或离子镀。该步骤具体工艺可采用相应方法的常规镀膜工艺，镀膜过程中通过控制镀膜时间来控制真空镀膜层30的厚度在所述范围内，以保证该真空镀膜层30为无色透明。
上述铝制品的制备方法在形成无色透明的真空镀膜层30前，先通过化学蚀刻处理在铝基体10表面形成多孔表面12，由于多孔表面12分布有所述纳米孔122，使真空镀膜层30在不同的位置具有不同的厚度，在光的照射下，不同厚度的真空镀膜层30对光线的折射与反射产生的光程差不同，不同的光程差可产生不同颜色的干涉光。因此，不同位置处的真空镀膜层30能产生不同颜色的干涉光，使得同一铝制品呈现多种颜色，具有较佳的装饰效果。该铝制品的制备方法工艺简单。

Claims (14)

1.一种铝制品，包括铝基体及形成于该铝基体上的无色透明真空镀膜层，其特征在于：该铝基体包括经化学蚀刻形成的多孔表面，该多孔表面分布有多个纳米孔，所述纳米孔的深度分布在20～300nm范围内，该真空镀膜层形成于该多孔表面上。
2.如权利要求1所述的铝制品，其特征在于：所述纳米孔的孔径分布在30～250nm范围内。
3.如权利要求1所述的铝制品，其特征在于：该真空镀膜层由金属形成。
4.如权利要求3所述的铝制品，其特征在于：所述金属为钛、铬、铝、锌及锆中的一种。
5.如权利要求3所述的铝制品，其特征在于：所述真空镀膜层的厚度为50～150nm。
6.如权利要求1所述的铝制品，其特征在于：所述真空镀膜层由金属氧化物或者二氧化硅形成。
7.如权利要求6所述的铝制品，其特征在于：所述金属氧化物为铬、铝、锌及锆的氧化物中的一种。
8.如权利要求6所述的铝制品，其特征在于：所述真空镀膜层的厚度为50nm至2μm。
9.一种铝制品的制备方法，包括如下步骤：
提供铝基体；
化学蚀刻处理，以使该铝基体形成多孔表面，该多孔表面分布有多个纳米孔，所述纳米孔的深度分布在20～300nm范围内，孔径分布在30～250nm范围内；
真空镀膜处理，以于该多孔表面形成一层无色透明的真空镀膜层。
10.如权利要求9所述的铝制品的制备方法，其特征在于：所述真空镀膜为蒸镀、溅镀及离子镀中的一种。
11.如权利要求9所述的铝制品的制备方法，其特征在于：所述化学蚀刻是以含20～50g/L三氯化铁和4.2～5.4mol/L盐酸的水溶液为蚀刻液，蚀刻液温度为20～40℃，蚀刻时间为3～15秒。
12.如权利要求9所述的铝制品的制备方法，其特征在于：该铝制品的制备方法还包括在所述化学蚀刻处理前，对铝基体进行预处理的步骤，该预处理包括对铝基体除油及化学抛光。
13.如权利要求9所述的铝制品的制备方法，其特征在于：该真空镀膜层由金属形成，真空镀膜层的厚度为50nm～150nm。
14.如权利要求9所述的铝制品的制备方法，其特征在于：该真空镀膜层由所述真空镀膜层由金属氧化物或者二氧化硅形成，真空镀膜层的厚度为50nm～2μm。
CN2010105615536A 2010-11-26 2010-11-26 铝制品及其制备方法 Pending CN102480879A (zh)

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Cited By (5)

* Cited by examiner, † Cited by third party
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CN105744782A (zh) * 2016-03-14 2016-07-06 联想(北京)有限公司 一种电子设备及电子设备的金属壳体的制成方法
CN107815686A (zh) * 2017-11-03 2018-03-20 安徽新合富力科技有限公司 一种不锈钢纳米处理方法
CN109182986A (zh) * 2018-08-01 2019-01-11 Oppo（重庆）智能科技有限公司 板材及其制备方法、壳体以及电子设备
CN112203444A (zh) * 2019-07-08 2021-01-08 苹果公司 具有蚀刻表面的钛部件
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CN105744782A (zh) * 2016-03-14 2016-07-06 联想(北京)有限公司 一种电子设备及电子设备的金属壳体的制成方法
CN107815686A (zh) * 2017-11-03 2018-03-20 安徽新合富力科技有限公司 一种不锈钢纳米处理方法
CN109182986A (zh) * 2018-08-01 2019-01-11 Oppo（重庆）智能科技有限公司 板材及其制备方法、壳体以及电子设备
CN109182986B (zh) * 2018-08-01 2021-04-13 Oppo（重庆）智能科技有限公司 板材及其制备方法、壳体以及电子设备
CN112203444A (zh) * 2019-07-08 2021-01-08 苹果公司 具有蚀刻表面的钛部件
US11511519B2 (en) 2019-07-08 2022-11-29 Apple Inc. Titanium part having an etched surface

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