CN102458075A - 壳体及其制造方法 - Google Patents
壳体及其制造方法 Download PDFInfo
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- CN102458075A CN102458075A CN2010105214206A CN201010521420A CN102458075A CN 102458075 A CN102458075 A CN 102458075A CN 2010105214206 A CN2010105214206 A CN 2010105214206A CN 201010521420 A CN201010521420 A CN 201010521420A CN 102458075 A CN102458075 A CN 102458075A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000011777 magnesium Substances 0.000 claims abstract description 54
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 50
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 49
- 229910000861 Mg alloy Inorganic materials 0.000 claims abstract description 44
- 238000005260 corrosion Methods 0.000 claims abstract description 41
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 11
- 238000000576 coating method Methods 0.000 claims description 39
- 239000011248 coating agent Substances 0.000 claims description 38
- 230000007797 corrosion Effects 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 150000002680 magnesium Chemical class 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 229910019590 Cr-N Inorganic materials 0.000 claims description 3
- 229910019588 Cr—N Inorganic materials 0.000 claims description 3
- 229910011208 Ti—N Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000006056 electrooxidation reaction Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12576—Boride, carbide or nitride component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12729—Group IIA metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Abstract
本发明提供一种壳体,包括镁或镁合金基体、形成于该镁或镁合金基体上的防腐蚀层及具有装饰性的色彩层。所述壳体具有良好的耐腐蚀性及装饰性外观。本发明还提供了所述壳体的制造方法,包括以下步骤:提供镁或镁合金基体;于该镁或镁合金基体上磁控溅射形成防腐蚀层;于该防腐蚀层上磁控溅射形成具有装饰性的色彩层。
Description
技术领域
本发明涉及一种壳体及其制造方法。
背景技术
真空镀膜技术(PVD)是一种非常环保的成膜技术。以真空镀膜的方式所形成的膜层具有高硬度、高耐磨性、良好的化学稳定性、与基体结合牢固以及亮丽的金属外观等优点,因此真空镀膜在镁、镁合金及不锈钢等金属基材表面处理领域的应用越来越广。
然而,由于镁或镁合金的标准电极电位很低,且PVD装饰性涂层本身不可避免的会存在微小的孔隙,如针孔、裂纹,并且镁或镁合金基体会发生微电池腐蚀作用,形成很大的膜-基电位差,加快了微电池的腐蚀速率,因此,直接于镁或镁合金基体表面镀覆诸如TiN层、TiN层、CrN层或其他PVD装饰性涂层,不能有效防止所述镁或镁合金基体发生电化学腐蚀,同时该PVD装饰性涂层本身也会发生异色、脱落等现象。
发明内容
鉴于此,提供一种具有良好的耐腐蚀性及装饰性外观的壳体。
另外,还提供一种上述壳体的制造方法。
一种壳体,包括镁或镁合金基体,一形成于镁或镁合金基体表面的防腐蚀层,及一形成于防腐蚀层表面的色彩层,所述防腐蚀层为镁层。
一种壳体的制造方法,包括以下步骤:
提供镁或镁合金基体;在该镁或镁合金基体上磁控溅射形成防腐蚀层,该防腐蚀层为一镁层;于该防腐蚀层上磁控溅射形成色彩层。
所述壳体的制造方法,通过磁控溅射法依次于镁或镁合金基体上形成镁的耐腐蚀层,当壳体处于腐蚀性介质中时,由于镁与镁合金之间的电位差小、兼容性好,且镁膜层与镁合金基体之间的相同及相似金属的亲和性,能增加其膜-基之间的附着力,从而有效降低了膜-基电位差,使壳体较难以形成发生电化学腐蚀所需要的阴极与阳极的条件,从而提高了壳体的耐腐蚀性。所述壳体耐腐蚀性提高的同时,还可避免所述色彩层发生异色、脱落等失效现象,从而使该壳体经长时间使用后仍具有较好的装饰性外观。
附图说明
图1为本发明较佳实施例的壳体的剖视图。
主要元件符号说明
壳体 10
镁或镁合金基体 11
防腐蚀层 13
色彩层 15
具体实施方式
请参阅图1,本发明一较佳实施例的壳体10包括镁或镁合金基体11、依次形成于该镁或镁合金基体11上的防腐蚀层13及色彩层15。该壳体10可以为3C电子产品的壳体,也可为工业、建筑用件及汽车等交通工具的零部件等。
所述防腐蚀层13为镁层,其厚度为1.0~3.0μm。
所述色彩层15为Ti-N层,其厚度为1.0~3.0μm。
可以理解,所述色彩层15还可以为Cr-N或其他具有装饰性的色彩层。
所述防腐蚀层13及色彩层15均可通过磁控溅射法沉积形成。
本发明一较佳实施例的制造所述壳体10的方法主要包括如下步骤:
提供镁或镁合金基体11,并对镁或镁合金基体11依次进行研磨及电解抛光。电解抛光后,再依次用去离子水和无水乙醇对该镁或镁合金基体11表面进行擦拭。再将擦拭后的镁或镁合金基体11放入盛装有丙酮溶液的超声波清洗器中进行震动清洗,以除去镁或镁合金基体11表面的杂质和油污等。清洗完毕后吹干备用。
对经上述处理后的镁或镁合金基体11的表面进行氩气等离子清洗,进一步去除镁或镁合金基体11表面的油污,以改善镁或镁合金基体11表面与后续涂层的结合力。该等离子清洗的具体操作及工艺参数可为:将镁或镁合金基体11放入一磁控溅射镀膜机(图未示)的镀膜室内,对该镀膜室进行抽真空处理至真空度为1.0×10-3Pa,以400~500sccm(标准状态毫升/分钟)的流量向镀膜室中通入纯度为99.999%的氩气,于镁或镁合金基体11上施加-300~-500V的偏压,对镁或镁合金基体11表面进行等离子清洗,清洗时间为5~10min。
在对镁或镁合金基体11进行等离子清洗后,于该镁或镁合金基体11上形成防腐蚀层13。所述防腐蚀层13为镁层。形成该防腐蚀层13的具体操作及工艺参数如下:以氩气为工作气体,调节氩气流量为100~200sccm,设置占空比为30%~80%,于镁或镁合金基体11上施加-100~-200V的偏压,并加热镀膜室至100~150℃(即溅射温度为100~150℃);选择镁为靶材,设置其功率为8~13kw,沉积防腐蚀层13。沉积该防腐蚀层13的时间30~60min。
形成所述防腐蚀层13后,于该防腐蚀层13上形成色彩层15,形成该色彩层15的具体操作及工艺参数如下:关闭所述镁靶的电源,开启已置于所述镀膜机内的一钛靶或铬靶的电源,,设置其功率8~10kw,保持上述氩气的流量不变,并向镀膜室内通入流量为20~150sccm的反应气体氮气,沉积色彩层15。沉积该色彩层15的时间为20~30min,该色彩层15为Ti-N膜层或Cr-N膜层。
本发明较佳实施方式的壳体10的制造方法,通过磁控溅射法依次于镁或镁合金基体11上形成镁的防腐蚀层13及色彩层15。当壳体10处于腐蚀性介质中时,由于所述壳体10的镁或镁合金基体11之上形成有防腐蚀层13即镁金属层,由于镁与镁合金之间的电位差小、兼容性好,从而有效降低了膜-基电位差,使壳体10较难以形成发生电化学腐蚀所需要的阴极与阳极的条件,从而减缓了壳体10的腐蚀速率,提高了壳体10的耐腐蚀性。所述壳体10耐腐蚀性提高的同时,还可避免所述色彩层15发生异色、脱落等失效现象,从而使该壳体10经长时间使用后仍具有较好的装饰性外观。
Claims (9)
1.一种壳体,包括镁或镁合金基体,一形成于镁或镁合金基体表面的防腐蚀层,及一形成于防腐蚀层表面的色彩层,其特征在于:所述防腐蚀层为镁层。
2.如权利要求1所述的壳体,其特征在于:该防腐蚀层的厚度为1.0~3.0μm。
3.如权利要求1所述的壳体,其特征在于:所述色彩层为Ti-N层或Cr-N层。
4.如权利要求1所述的壳体,其特征在于:所述防腐蚀层及色彩层以磁控溅射镀膜法形成。
5.一种壳体的制造方法,包括以下步骤:
提供镁或镁合金基体;
于该镁或镁合金基体上磁控溅射形成防腐蚀层,该防腐蚀层为一镁层;
于该防腐蚀层上磁控溅射形成色彩层。
6.如权利要求5所述的壳体的制造方法,其特征在于:所述防腐蚀层的生产工艺为:以氩气为工作气体,其流量为100~200sccm,设置占空比为30%~80%,于镁或镁合金基体上施加-100~-200V的偏压,以镁靶为靶材,设置其功率为8~13kw,溅射温度为100~150℃。
7.如权利要求6所述的壳体的制造方法,其特征在于:所述防腐蚀层的溅射时间为30~60min。
8.如权利要求5所述的壳体的制造方法,其特征在于:所述色彩层的生产工艺为:开启一钛靶或铬靶的电源,设置其功率8~10kw,设置氮气流量为20~150sccm。
9.如权利要求8所述的壳体的制造方法,其特征在于:所述色彩层的溅射时间为20~30min。
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Cited By (1)
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CN111455317A (zh) * | 2020-05-18 | 2020-07-28 | 东莞立德生物医疗有限公司 | 可降解镁合金覆膜骨钉及制备方法 |
Citations (3)
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CN1432662A (zh) * | 2002-01-16 | 2003-07-30 | 精工爱普生株式会社 | 装饰品的表面处理方法、装饰品和钟表 |
CN101119860A (zh) * | 2005-02-17 | 2008-02-06 | 桑德维克知识产权股份公司 | 涂敷的金属产品、其制备方法及该方法的用途 |
US20080156638A1 (en) * | 2006-12-27 | 2008-07-03 | Shuixiang Huang | Process for sputtering aluminum or copper onto aluminum or magnalium alloy substrates |
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US7651758B2 (en) * | 2005-10-18 | 2010-01-26 | Endres Machining Innovations Llc | System for improving the wearability of a surface and related method |
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CN1432662A (zh) * | 2002-01-16 | 2003-07-30 | 精工爱普生株式会社 | 装饰品的表面处理方法、装饰品和钟表 |
CN101119860A (zh) * | 2005-02-17 | 2008-02-06 | 桑德维克知识产权股份公司 | 涂敷的金属产品、其制备方法及该方法的用途 |
US20080156638A1 (en) * | 2006-12-27 | 2008-07-03 | Shuixiang Huang | Process for sputtering aluminum or copper onto aluminum or magnalium alloy substrates |
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CN111455317A (zh) * | 2020-05-18 | 2020-07-28 | 东莞立德生物医疗有限公司 | 可降解镁合金覆膜骨钉及制备方法 |
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