CN102445328B - Method for realizing absolute measurement of absorption loss of optical thin film element - Google Patents
Method for realizing absolute measurement of absorption loss of optical thin film element Download PDFInfo
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- CN102445328B CN102445328B CN201110288545.3A CN201110288545A CN102445328B CN 102445328 B CN102445328 B CN 102445328B CN 201110288545 A CN201110288545 A CN 201110288545A CN 102445328 B CN102445328 B CN 102445328B
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Abstract
The invention discloses a method for realizing absolute measurement of the absorption loss of an optical thin film element, comprising the following steps of: firstly, obtaining the linear relationship A of the reflectivity or transmissivity of a wavelength position of a detection light wave to temperature changes through fitting by theoretically analyzing the rule of the reflectivity or transmissivity of a sample changing along with temperatures; establishing an experiment system and obtaining the rule of the reflectivity or transmissivity changing along with heating optical power; obtaining the linear relationship B of the reflectivity or transmissivity to the heating optical power through fitting, thereby obtaining the linear relationship C of the temperature changes to the heating optical power; and then, on the basis of measuring the size of a heating light spot on the surface of the sample and the reflectivity or transmissivity of the sample to the heating light through experiments, obtaining the linear relationship D of the temperature changes to the heating optical power through theoretical calculation; and finally, unifying the linear relationship D with the linear relationship C, thereby obtaining the absolute absorptivity value of the sample to the heating optical power. The method is capable of realizing the measurement of the absolute value of the absorption loss of the optical thin film element in a relative simple and convenient manner.
Description
Technical field
The present invention relates to a kind of measuring method to optical thin film element performance parameter, particularly a kind of absolute method of measurement of optical thin film element absorption loss.
Background technology
Optical thin film has become ingredient indispensable in contemporary optics system, and the quality of its performance directly affects the serviceability of optical system.Absorption loss is to weigh an important parameter of optical thin film performance, and particularly, in high power laser system, it has become the bottleneck that optical system through-put power further improves.Absorption loss can not only cause the heat distortion of optical thin film element, and the beam quality of laser beam is reduced, and also can reduce the ability of film resisting laser damage, the peak power that can export and transmit in restriction laser instrument and laser system.The Measurement accuracy of film absorption loss especially absolute measurement is very important with the performance of raising thin-film component for optimizing rete design and coating process.
At present, laser calorimetry is the international standard of measuring optical element absorption loss, and its maximum advantage is directly to measure the absolute value of absorption loss, does not need calibration, measures highly sensitively, and device is simple, easy to adjust.Shortcoming be respond slower, time and spatial resolution are low, be not easy to realize high-resolution imaging, generally also be not suitable for measuring large scale thin-film component (Li Bincheng, Xiong Shengming etc., Measuring Weak Absorptance of Optical Thin Films with Laser Calorimetric Technique [J], Chinese laser, 2006,33 (6): 823-826).In absorption loss measuring technique, photothermal technique is because the advantages such as it is untouchable, dirigibility, sensitivity height have obtained application comparatively widely, particularly, in weak absorptiometry, be accepted gradually take surface thermal lens technology, Photothermal Deflection Techniques etc. as the photothermal technique of representative.These several photothermal techniques all need to calibrate by standard model the absolute measurement that realizes absorption loss, and the accuracy of its result is limited to calibration sample and the similarity degree of measuring specimen material character.
Patent " a kind of method of measuring optical film absorption loss " (applicant: Li Bincheng, Hao Honggang, application number 200710118694.9, publication number CN101082537,2007) the middle method proposing, be called as in the literature photo-thermal imbalance technology (Photothermal Detuning Technique), the reflection of the method utilization test sample or transmitted spectrum vary with temperature and the phenomenon of drift occur, the absorbing state of the indirect Optical film of variation by measure spectrum band edge wavelength laser reflectivity or transmissivity to heating light beam.In this technology experiment measuring system, conventionally adopt the configuration of two bundle laser, beam of laser is as heating light beam, beam of laser is as detecting light beam, wherein the wavelength of exploring laser light is chosen at the larger position of edge slope of institute's study sample reflection or transmitted light bands of a spectrum conventionally, to improve the sensitivity of test.Theory and experimental study are known, the Photothermal Signals of this technology is directly proportional to the power that adds thermal laser, and all there is relation with the modulating frequency of heating light beam, relative position and the incident angle of detecting light beam etc. of sample surfaces two beam and focus, its measurement sensitivity under some condition higher than surface thermal lens technology (Honggang Hao and Bincheng Li, Photothermal detuning for absorption measurement of optical coatings[J], Applied Optics, 2008,47 (2): 188-194; Hao Honggang, Li Bincheng, Liu Mingqiang. [J] of remolding sensitivity that surface thermal lens and photo-thermal imbalance commercial measurement optical thin film absorb, Chinese laser, 2009,36 (2): 467-471).In the research work in early stage, the absolute measurement problem that not the method is not realized to absorption loss is inquired into.Because the method depends on, sample reflects or the drift phenomenon of transmitted spectrum, if adopt the method for calibration sample to realize the absolute measurement of absorption loss, must find spectrum and the identical standard model of material optics thermal property, to limit greatly the method in the application aspect absolute measurement, therefore, in conjunction with the theoretical and experiment of photo-thermal imbalance technology, the method that searching realizes absolute measurement is most important to the further application of this technology.
Therefore be badly in need of a kind of method that realizes absolute measurement of absorption loss of optical thin film element.
Summary of the invention
In view of this,, in order to address the above problem, the present invention proposes a kind of method that realizes absolute measurement of absorption loss of optical thin film element.
The object of the invention is to propose a kind of is the method that realizes the absolute measurement of optical thin film element absorption of sample loss by theoretical and experiment combination.
The object of the present invention is achieved like this:
A kind of method that realizes absolute measurement of absorption loss of optical thin film element provided by the invention, comprises the following steps:
S1: according to the reflectivity of tested optical thin film element or the temperature variant rule of transmissivity, matching obtains the linear relationship A surveying between optical wavelength position reflectivity or transmissivity and temperature variation, and the expression formula of described linear relationship A is:
R=k
1ΔT+R
0,
Reflectivity or transmissivity that wherein R is tested optical thin film element, R
0for reflectivity or the transmissivity of initial temperature when unchanged, Δ T is temperature change value, k
1for scale-up factor;
S2: adopt beam of laser as heating light beam irradiates to tested optical thin film element, select a branch of wavelength near (power milliwatt level or lower low-power) continuous laser of the reflection of described optical thin film element or transmission belt edge as detecting light beam, shine the identical or adjacent position of tested optical thin film element with heating light beam, monitored the variation of the reflection of tested optical thin film element or whole detection light intensities of transmission by photodetector, matching obtains the linear relationship B between reflectivity or transmissivity and heating light beam power, the expression formula of described linear relationship B is:
R=k
2P+R
0,
Wherein, P is heating luminous power, k
2for scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and heating light beam power, described linear relationship C is:
ΔT=(k
2/k
1)·P,
Wherein, k
2/ k
1for scale-up factor;
S4: using the optical thin film element of known optical and thermal parameters as known sample, measure the surface heating spot size of known sample and reflectivity or transmissivity to heating light beam, thereby obtain the temperature variation of known sample and heat the linear relationship D between light beam power, the expression formula of described linear relationship D is:
Δ T=k
3p, wherein, k
3for scale-up factor;
S5: by adjusting the absorptivity of known sample to heating light beam, make linear relationship D identical with linear relationship C, i.e. scale-up factor k
3with scale-up factor k
2/ k
1identical, obtain the absorptivity of tested optical thin film element to heating light beam.
Further, in described step S1, obtain the linear relationship A of reflectivity or transmissivity and temperature variation by the Takahashi model of narrow-cut filter domain analysis spectroscopic temperature;
Further, the laser in described step S2 is intensity periodic modulation (power watt level or above high power) continuous laser light beam or pulsed laser beam;
Further, in the reflectivity of the asynchronous tested optical thin film element of described heating luminous power or transmissivity experiment, obtain by following formula:
Wherein, V
acbe expressed as the alternating signal amplitude that experiment measures, V
dcbe expressed as the direct current signal amplitude that experiment measures;
Further, in described step S4, measure the surface heating spot size of known sample and reflectivity or transmissivity to heating light beam, then obtain the variation of sample surfaces temperature according to heat-conduction equation;
Further, described optical film absorption loss is weak absorbing state, guarantees the linearity of various relations;
Further, in the time that heating light beam is continuous laser, adopt first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof by calibration; In the time that heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof by calibration;
Further, before described photodetector, be provided with a condenser lens, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity;
Further, when exploring laser light bundle makes reflection or transmitted light polarization separation when remarkable with respect to the incident angle on tested optical thin film element surface, before detector, add polaroid, can real-time detection reflection or the variation of transmission-polarizing light intensity.
The invention has the advantages that:
(1) realized the absolute measurement of absorption of sample loss, for the further application of photo-thermal imbalance technology is laid a good foundation.
(2) the method combines theory with experiment, and compared with adopting other photothermal technique calibrating methods of standard model calibration, workable, degree of accuracy is high.
(3) under optimal conditions, depend on the sensitivity of photo-thermal imbalance technology, the method can realize the face of surveyed element absorption loss absolute measurement is absorbed to high-resolution imaging, improves the room and time resolution of absorptiometry.
Other advantage of the present invention, target and feature will be set forth to a certain extent in the following description, and to a certain extent, based on will be apparent to those skilled in the art to investigating below, or can be instructed from the practice of the present invention.The objects and other advantages of the present invention can be passed through instructions below, claims, and in accompanying drawing, specifically noted structure realizes and obtains.
Accompanying drawing explanation
In order to make the object, technical solutions and advantages of the present invention clearer, below in conjunction with accompanying drawing, the present invention is described in further detail, wherein:
Fig. 1 is for realizing absolute measurement of absorption loss of optical thin film element method flow diagram;
Fig. 2 is the schematic diagram that is related to of the reflectivity that calculates of theory and temperature variation;
Fig. 3 is experimental provision schematic diagram;
Fig. 4 is the experiment measuring reflectivity obtaining and the schematic diagram that is related to that heats luminous power;
Fig. 5 is the theory temperature calculating and the schematic diagram that is related to that heats luminous power.
Embodiment
Below with reference to accompanying drawing, the preferred embodiments of the present invention are described in detail; Should be appreciated that preferred embodiment is only for the present invention is described, rather than in order to limit the scope of the invention.
Fig. 1 is for realizing absolute measurement of absorption loss of optical thin film element method flow diagram, as shown in the figure: a kind of method that realizes absolute measurement of absorption loss of optical thin film element provided by the invention, comprises the following steps:
S1: according to the reflectivity of tested optical thin film element or the temperature variant rule of transmissivity, matching obtains the linear relationship A between reflectivity or transmissivity and temperature, Takahashi model by narrow-cut filter domain analysis spectroscopic temperature obtains the linear relationship A that surveys optical wavelength position reflectivity or transmissivity and temperature variation, and the expression formula of described linear relationship A is:
R=k
1ΔT+R
0,
Reflectivity or transmissivity that wherein R is tested optical thin film element, R
0for reflectivity or the transmissivity of initial temperature when unchanged, Δ T is temperature change value, k
1for scale-up factor; As shown in Figure 2, Fig. 2 is the schematic diagram that is related to of the reflectivity that calculates of theory and temperature variation;
S2: according to patent " a kind of method of measuring optical film absorption loss " (applicant: Li Bincheng, Hao Honggang, application number 200710118694.9, publication number CN101082537,2007) the middle method proposing, set up experimental system, as shown in Figure 3, Fig. 3 is experimental provision schematic diagram; After the output beam of heating LASER Light Source is modulated by chopper after beam splitter, focus on through lens 1 surface that sample is optical thin film element, the light beam of exporting from exploring laser light light source is focused into the same area of the heated laser beam irradiation in surface that is mapped to tested thin-film component after catoptron turns to by lens 2, converged to the receiving plane of photodetector by lens 3 from the exploring laser light bundle of sample surfaces reflection or transmission, obtain photodetection signal.Simultaneously the output signal of chopper is connected to lock-in amplifier as with reference to signal.The DC quantity of photodetector detection reflection or transmission detection light is read and is exchanged by oscillograph when variable quantity heated light sources is continuous modulation laser beam and read by lock-in amplifier.
Adopt the mode of continuous laser heating, or (power watt level or above high power) the continuous laser light beam of employing one beam intensity periodic modulation or pulsed laser beam are as heating light beam irradiates to tested optical thin film element, select a branch of wavelength near (power milliwatt level or lower low-power) continuous laser of the reflection of described optical thin film element or transmission belt edge as detecting light beam, shine the identical or adjacent position of tested optical thin film element with heating light beam, under optimal conditions, change heated light sources output power, in the time that heating light beam is continuous laser, adopt first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof by calibration, in the time that heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof by calibration,
Reflectivity or the transmissivity of the asynchronous tested optical thin film element of described heating luminous power obtain by following formula:
Wherein, V
acbe expressed as the alternating signal amplitude that experiment measures, V
dcbe expressed as the direct current signal amplitude that experiment measures, I
0represent to survey the incident intensity of light;
Monitored the variation of the reflection of tested optical thin film element or whole detection light intensities of transmission by photodetector, by first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, or DC current or the voltage signal of the output of digital storage oscilloscope recording light electric explorer, obtain reflectivity or the transmissivity rule with heating optical power change, matching obtains the linear relationship B between reflectivity or transmissivity and heating luminous power, and the expression formula of described linear relationship B is:
R=k
2P+R
0,
Wherein, P is heating luminous power, k
2for scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and heating light beam power, described linear relationship C is:
ΔT=(k
2/k
1)·P,
Wherein, k
2/ k
1for scale-up factor;
S4: using the optical thin film element of known optical and thermal parameters as known sample, obtain the variation of sample surfaces temperature according to heat-conduction equation, measure the surface heating spot size of known sample and reflectivity or transmissivity to heating light beam, as shown in Figure 4, Fig. 4 is the experiment measuring reflectivity obtaining and the schematic diagram that is related to that heats luminous power; Thereby obtain the temperature variation of known sample and heat the linear relationship D between light beam power, as shown in Figure 5, Fig. 5 is the theory temperature calculating and the schematic diagram that is related to that heats luminous power, and the expression formula of described linear relationship D is:
Δ T=k
3p, wherein, k
3for scale-up factor;
S5: because the temperature variation of optical thin film element sample surfaces is proportional to sample to adding the absorptivity of thermo-optical, so by adjusting the absorptivity of known sample to heating light beam, make linear relationship D identical with linear relationship C, i.e. scale-up factor k
3with scale-up factor k
2/ k
1identical, obtain the absorptivity of tested optical thin film element to heating light beam.
Embodiment provided by the invention is used for realizing absolute measurement of absorption loss of optical thin film element, applicable equally to analyzing reflectivity or transmissivity.Even in weak absorbing state, because above-mentioned various relations are linear relationship, so above-mentioned absolute method of measurement is applicable equally.
Before described photodetector, be provided with a condenser lens, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
When exploring laser light bundle makes reflection or transmitted light polarization separation when remarkable with respect to the incident angle on tested optical thin film element surface, before detector, add polaroid, the variation of real-time detection reflection or transmission-polarizing light intensity.
When heating light beam is continuous laser, adopt first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof by calibration.
When heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof by calibration.
Described heating laser beam irradiation optical thin film element thin layer and the center of exploring laser light bundle overlap or next-door neighbour.
Before described photodetector, add a condenser lens, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
When exploring laser light bundle makes reflection or transmitted light polarization separation when remarkable with respect to the incident angle on tested optical thin film element surface, before detector, add polaroid, can real-time detection reflection or the variation of transmission-polarizing light intensity.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.
Claims (9)
1. a method that realizes absolute measurement of absorption loss of optical thin film element, is characterized in that: comprise the following steps:
S1: according to the reflectivity of tested optical thin film element or the temperature variant rule of transmissivity, matching obtains the linear relationship A surveying between optical wavelength position reflectivity or transmissivity and temperature variation, and the expression formula of described linear relationship A is:
R=k
1ΔT+R
0,
Reflectivity or transmissivity that wherein R is tested optical thin film element, R
0for reflectivity or the transmissivity of initial temperature when unchanged, △ T is temperature change value, k
1for scale-up factor;
S2: adopt beam of laser as heating light beam irradiates to tested optical thin film element, select a branch of wavelength near the power milliwatt level of the reflection of described optical thin film element or transmission belt edge or lower low-power continuous laser as detecting light beam, shine the identical or adjacent position of tested optical thin film element with heating light beam, monitored the variation of the reflection of tested optical thin film element or whole detection light intensities of transmission by photodetector, matching obtains the linear relationship B between reflectivity or transmissivity and heating light beam power, and the expression formula of described linear relationship B is:
R=k
2P+R
0,
Wherein, P is heating luminous power, k
2for scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and heating light beam power, described linear relationship C is:
ΔT=(k
2/k
1)·P,
Wherein, k
2/ k
1for scale-up factor;
S4: using the optical thin film element of known optical and thermal parameters as known sample, measure the surface heating spot size of known sample and reflectivity or transmissivity to heating light beam, thereby obtain the temperature variation of known sample and heat the linear relationship D between light beam power, the expression formula of described linear relationship D is:
ΔT=k
3P,
Wherein, k
3for scale-up factor;
S5: by adjusting the absorptivity of known sample to heating light beam, make linear relationship D identical with linear relationship C, i.e. scale-up factor k
3with scale-up factor k
2/ k
1identical, obtain the absorptivity of tested optical thin film element to heating light beam.
2. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 1, is characterized in that: the linear relationship A that obtains reflectivity or transmissivity and temperature variation in described step S1 by the Takahashi model of narrow-cut filter domain analysis spectroscopic temperature.
3. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 2, is characterized in that: the laser in described step S2 is the power watt level of intensity periodic modulation or above high power continuous laser light beam or pulsed laser beam.
4. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 3, is characterized in that: in the reflectivity of the asynchronous tested optical thin film element of described heating luminous power or transmissivity experiment, obtain by following formula:
Wherein, V
acbe expressed as the alternating signal amplitude that experiment measures, V
dcbe expressed as the direct current signal amplitude that experiment measures.
5. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 4, it is characterized in that: in described step S4, measure the surface heating spot size of known sample and reflectivity or transmissivity to heating light beam, then obtain the variation of sample surfaces temperature according to heat-conduction equation.
6. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 5, is characterized in that: described optical film absorption loss is weak absorbing state, guarantees the linearity of various relations.
7. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 6, it is characterized in that: in the time that heating light beam is continuous laser, the first harmonic amplitude and the phase place that adopt lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof by calibration; In the time that heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof by calibration.
8. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 7, it is characterized in that: before described photodetector, be provided with a condenser lens, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
9. the method that realizes absolute measurement of absorption loss of optical thin film element according to claim 8, it is characterized in that: when exploring laser light bundle makes reflection or transmitted light polarization separation when remarkable with respect to the incident angle on tested optical thin film element surface, before detector, add polaroid, can real-time detection reflection or the variation of transmission-polarizing light intensity.
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5268746A (en) * | 1989-09-26 | 1993-12-07 | Ente Per Le Nuove Tecnologie, L'energia E L'ambiente (Enea) | Devices for measuring the optical absorption in thin layer materials by using the photothermal deflection spectroscopy |
CN1632527A (en) * | 2004-12-28 | 2005-06-29 | 中国科学院上海光学精密机械研究所 | Method and device for measuring absorption of transparent and reflective film of thermal lens |
CN1971233A (en) * | 2006-12-13 | 2007-05-30 | 中国科学院光电技术研究所 | Method for simultaneously measuring absorption loss and surface thermal deformation of optical element |
CN101082537A (en) * | 2007-07-12 | 2007-12-05 | 中国科学院光电技术研究所 | Method for measuring absorption loss of optical film |
RU2377542C1 (en) * | 2008-10-27 | 2009-12-27 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха (ФГУП "НИИ "Полюс" им. М.Ф. Стельмаха) | Device for determining optical absorption losses in thin films |
CN102053006A (en) * | 2010-11-03 | 2011-05-11 | 中国科学院光电技术研究所 | Data processing improvement method for measuring absorption loss of optical element |
CN102175427A (en) * | 2010-12-31 | 2011-09-07 | 中国科学院光电技术研究所 | Comprehensive test method for stability of deep ultraviolet optical element |
-
2011
- 2011-09-26 CN CN201110288545.3A patent/CN102445328B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5268746A (en) * | 1989-09-26 | 1993-12-07 | Ente Per Le Nuove Tecnologie, L'energia E L'ambiente (Enea) | Devices for measuring the optical absorption in thin layer materials by using the photothermal deflection spectroscopy |
CN1632527A (en) * | 2004-12-28 | 2005-06-29 | 中国科学院上海光学精密机械研究所 | Method and device for measuring absorption of transparent and reflective film of thermal lens |
CN1971233A (en) * | 2006-12-13 | 2007-05-30 | 中国科学院光电技术研究所 | Method for simultaneously measuring absorption loss and surface thermal deformation of optical element |
CN101082537A (en) * | 2007-07-12 | 2007-12-05 | 中国科学院光电技术研究所 | Method for measuring absorption loss of optical film |
RU2377542C1 (en) * | 2008-10-27 | 2009-12-27 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха (ФГУП "НИИ "Полюс" им. М.Ф. Стельмаха) | Device for determining optical absorption losses in thin films |
CN102053006A (en) * | 2010-11-03 | 2011-05-11 | 中国科学院光电技术研究所 | Data processing improvement method for measuring absorption loss of optical element |
CN102175427A (en) * | 2010-12-31 | 2011-09-07 | 中国科学院光电技术研究所 | Comprehensive test method for stability of deep ultraviolet optical element |
Non-Patent Citations (6)
Title |
---|
光热失调技术的试验研究;郝宏刚 等;《光电子技术》;20110630;第31卷(第2期);103-106 * |
脉冲激光光热失调技术;郝宏刚 等;《光学学报》;20081031;第28卷(第10期);1942-1946 * |
表面热透镜与光热失调技术测量光学薄膜吸收的灵敏度比较;郝宏刚 等;《中国激光》;20090228;第36卷(第2期);467-471 * |
郝宏刚 等.光热失调技术的试验研究.《光电子技术》.2011,第31卷(第2期),103-106. |
郝宏刚 等.脉冲激光光热失调技术.《光学学报》.2008,第28卷(第10期),1942-1946. |
郝宏刚 等.表面热透镜与光热失调技术测量光学薄膜吸收的灵敏度比较.《中国激光》.2009,第36卷(第2期),467-471. |
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