CN102445328A - Method for realizing absolute measurement of absorption loss of optical thin film element - Google Patents

Method for realizing absolute measurement of absorption loss of optical thin film element Download PDF

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CN102445328A
CN102445328A CN2011102885453A CN201110288545A CN102445328A CN 102445328 A CN102445328 A CN 102445328A CN 2011102885453 A CN2011102885453 A CN 2011102885453A CN 201110288545 A CN201110288545 A CN 201110288545A CN 102445328 A CN102445328 A CN 102445328A
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thin film
film element
optical thin
linear relationship
heating
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CN102445328B (en
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郝宏刚
李斌成
尹波
王斌
阮巍
谭菲
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Chongqing University of Post and Telecommunications
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Abstract

The invention discloses a method for realizing absolute measurement of the absorption loss of an optical thin film element, comprising the following steps of: firstly, obtaining the linear relationship A of the reflectivity or transmissivity of a wavelength position of a detection light wave to temperature changes through fitting by theoretically analyzing the rule of the reflectivity or transmissivity of a sample changing along with temperatures; establishing an experiment system and obtaining the rule of the reflectivity or transmissivity changing along with heating optical power; obtaining the linear relationship B of the reflectivity or transmissivity to the heating optical power through fitting, thereby obtaining the linear relationship C of the temperature changes to the heating optical power; and then, on the basis of measuring the size of a heating light spot on the surface of the sample and the reflectivity or transmissivity of the sample to the heating light through experiments, obtaining the linear relationship D of the temperature changes to the heating optical power through theoretical calculation; and finally, unifying the linear relationship D with the linear relationship C, thereby obtaining the absolute absorptivity value of the sample to the heating optical power. The method is capable of realizing the measurement of the absolute value of the absorption loss of the optical thin film element in a relative simple and convenient manner.

Description

A kind of method that realizes the absolute measurement of optical thin film element absorption loss
Technical field
The present invention relates to a kind of measuring method, particularly a kind of absolute method of measurement of optical thin film element absorption loss to the optical thin film element performance parameter.
Background technology
Optical thin film has become ingredient indispensable in the contemporary optics system, and the quality of its performance directly affects the serviceability of optical system.Absorption loss is to weigh an important parameter of optical thin film performance, and particularly in high power laser system, it has become the bottleneck that the optical system through-put power further improves.Absorption loss can not only cause the heat distortion of optical thin film element, and the beam quality of laser beam is reduced, and also can reduce the ability of film resisting laser damage, the peak power that can export and transmit in limit laser device and the laser system.The accurate measurement of film absorption loss especially absolute measurement is very important with the performance that improves thin-film component for optimizing rete design and coating process.
At present, the laser calorimetry is to measure the international standard of optical element absorption loss, and its biggest advantage is directly to measure the absolute value of absorption loss, does not need calibration, measures highly sensitively, and device is simply easy to adjust.Shortcoming is to respond slowlyer, and time and spatial resolution are low, are not easy to realize high-resolution imaging; (the laser calorimetry is measured weak absorb [J] of optics thin-film micro for Li Bincheng, Xiong Shengming etc. generally also to be not suitable for measuring the large scale thin-film component; Chinese laser, 2006,33 (6): 823-826).In the absorption loss measuring technique; Advantages such as photothermal technique is untouchable owing to it, dirigibility, sensitivity height have obtained to use comparatively widely; Particularly in weak absorptiometry, be that the photothermal technique of representative is accepted by people gradually with surface thermal lens technology, Photothermal Deflection Techniques etc.These several kinds of photothermal techniques all need be realized the absolute measurement of absorption loss through the standard model calibration, and its result's accuracy is subject to the similarity degree of calibration sample and measuring samples material character.
Patent " a kind of method of measuring optical film absorption loss " (applicant: Li Bincheng; Hao Honggang; Application number 200710118694.9; Publication number CN101082537,2007) the middle method that proposes, in document, be called as photo-thermal imbalance technology (Photothermal Detuning Technique); This method is utilized the reflection of specimen or the phenomenon that transmitted spectrum drifts about with temperature variation, studies the absorbing state of optical thin film to the heating light beam indirectly through the variation of measure spectrum band edge wavelength laser reflectivity or transmissivity.In this technology experiment measuring system; Usually adopt the configuration of two bundle laser; Beam of laser is as the heating light beam; Beam of laser is as detecting light beam, and wherein the wavelength of exploring laser light is chosen at the big position of edge slope of institute's study sample reflection or transmitted light bands of a spectrum usually, so that improve the sensitivity of test.Theoretical and experimental study can be known; This technological photo-thermal signal is directly proportional with the power that adds thermal laser; And relation is all arranged with modulating frequency, the relative position of sample surfaces two beam and focus and the incident angle of detecting light beam etc. of heating light beam; Its measurement sensitivity is higher than surface thermal lens technology (Honggang Hao and Bincheng Li, Photothermal detuning for absorption measurement of optical coatings [J], Applied Optics under some condition; 2008,47 (2): 188-194; Hao Honggang, Li Bincheng, Liu Mingqiang. the remolding sensitivity that surface thermal lens and photo-thermal imbalance commercial measurement optical thin film absorb is [J], Chinese laser, 2009,36 (2): 467-471).In the research work in early stage, the absolute measurement problem of this method realization absorption loss is not inquired into.Because this method depends on the drift phenomenon of sample reflection or transmitted spectrum; If adopt the method for calibration sample to realize the absolute measurement of absorption loss; Must seek spectrum and the identical standard model of material optics thermal property, with limiting this method greatly in the application aspect the absolute measurement, therefore; In conjunction with the theoretical and experiment of photo-thermal imbalance technology, it is most important to the further application of this technology to seek the method that realizes absolute measurement.
Therefore be badly in need of a kind of method that realizes the absolute measurement of optical thin film element absorption loss.
Summary of the invention
In view of this, in order to address the above problem, the present invention proposes a kind of method that realizes the absolute measurement of optical thin film element absorption loss.
The objective of the invention is to propose a kind of is the method that realizes the absolute measurement of optical thin film element absorption of sample loss through theoretical and experiment combination.
The objective of the invention is to realize like this:
A kind of method that realizes the absolute measurement of optical thin film element absorption loss provided by the invention may further comprise the steps:
S1: according to the reflectivity or the temperature variant rule of transmissivity of tested optical thin film element, match obtains the linear relationship A between detection optical wavelength position reflectivity or transmissivity and the temperature variation, and the expression formula of said linear relationship A is:
R=k 1ΔT+R 0
Wherein R is the reflectivity or the transmissivity of tested optical thin film element, R 0Reflectivity or transmissivity during for the initial temperature no change, Δ T is a temperature change value, k 1Be scale-up factor;
S2: adopt beam of laser as heating light beam irradiates to tested optical thin film element; Select a branch of wavelength near (power milliwatt level or lower low-power) continuous laser of reflection of described optical thin film element or transmission belt edge as detecting light beam; Shine the identical or adjacent position of tested optical thin film element with the heating light beam; Monitor the variation of whole detection light intensities of reflection or the transmission of tested optical thin film element by photodetector; Match obtains the linear relationship B between reflectivity or transmissivity and the heating light beam power, and the expression formula of said linear relationship B is:
R=k 2P+R 0
Wherein, P is heating luminous power, k 2Be scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and the heating light beam power, said linear relationship C is:
ΔT=(k 2/k 1)·P,
Wherein, k 2/ k 1Be scale-up factor;
S4: with the optical thin film element of known optical and thermal parameters as known sample; Measure the surface heating spot size of known sample and to the reflectivity or the transmissivity of heating light beam; Thereby obtain the temperature variation of known sample and the linear relationship D between the heating light beam power, the expression formula of said linear relationship D is:
Δ T=k 3P, wherein, k 3Be scale-up factor;
S5:, make linear relationship D identical, i.e. scale-up factor k with linear relationship C through the absorptivity of adjustment known sample to the heating light beam 3With scale-up factor k 2/ k 1Identical, obtain the absorptivity of tested optical thin film element to the heating light beam.
Further, pass through the high bridge model acquisition reflectivity of narrow-cut filter domain analysis spectroscopic temperature property or the linear relationship A of transmissivity and temperature variation among the said step S1;
Further, the laser among the said step S2 is intensity periodic modulation (power watt level or above high power) continuous laser light beam or pulsed laser beam;
Further, obtain through following formula in the experiment of the reflectivity of the asynchronous tested optical thin film element of said heating luminous power or transmissivity:
R = ( V ac + V dc V dc ) · R 0 ,
Wherein, V AcBe expressed as the alternating signal amplitude that experiment measures, V DcBe expressed as the direct current signal amplitude that experiment measures;
Further, measure the surface heating spot size of known sample among the said step S4 and, obtain the sample surfaces variation of temperature according to heat-conduction equation then heating the reflectivity or the transmissivity of light beam;
Further, said optical film absorption loss is weak absorbing state, guarantees the linearity of various relations;
Further, when the heating light beam is continuous laser, adopt the first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof through calibration; When the heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof through calibration;
Further, be provided with a condenser lens before the said photodetector, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity;
Further, when the exploring laser light bundle makes reflection or transmitted light polarization separation remarkable with respect to the incident angle on tested optical thin film element surface, add polaroid in the detector front, but the variation of real-time detection reflection or transmission-polarizing light intensity.
The invention has the advantages that:
(1) realized the absolute measurement of absorption of sample loss, for the further application of photo-thermal imbalance technology is laid a good foundation.
(2) this method combines theory with experiment, compares with other photothermal technique calibrating methods that adopt the standard model calibration, and workable, degree of accuracy is high.
(3) under optimal conditions, depend on the sensitivity of photo-thermal imbalance technology, this method can realize the face of survey element absorption loss absolute measurement is absorbed high-resolution imaging, improves the room and time resolution of absorptiometry.
Other advantage of the present invention, target and characteristic will be set forth in instructions subsequently to a certain extent; And to a certain extent; Based on being conspicuous to those skilled in the art, perhaps can from practice of the present invention, obtain instruction to investigating of hereinafter.Target of the present invention and other advantage can be passed through following instructions, claims, and the structure that is particularly pointed out in the accompanying drawing realizes and obtains.
Description of drawings
In order to make the object of the invention, technical scheme and advantage clearer, will combine accompanying drawing that the present invention is made further detailed description below, wherein:
Fig. 1 is for realizing optical thin film element absorption loss absolute method of measurement process flow diagram;
Reflectivity that Fig. 2 obtains for Theoretical Calculation and temperature variation concern synoptic diagram;
Fig. 3 is the experimental provision synoptic diagram;
Fig. 4 is experiment measuring reflectivity that obtains and the synoptic diagram that concerns that heats luminous power;
Fig. 5 is Theoretical Calculation temperature that obtains and the synoptic diagram that concerns that heats luminous power.
Embodiment
Below will combine accompanying drawing, the preferred embodiments of the present invention will be carried out detailed description; Should be appreciated that preferred embodiment has been merely explanation the present invention, rather than in order to limit protection scope of the present invention.
Fig. 1 is for realizing optical thin film element absorption loss absolute method of measurement process flow diagram, and as shown in the figure: a kind of method that realizes the absolute measurement of optical thin film element absorption loss provided by the invention may further comprise the steps:
S1: according to the reflectivity or the temperature variant rule of transmissivity of tested optical thin film element; Match obtains the linear relationship A between reflectivity or transmissivity and the temperature; Through the high bridge model acquisition detection optical wavelength position reflectivity of narrow-cut filter domain analysis spectroscopic temperature property or the linear relationship A of transmissivity and temperature variation, the expression formula of said linear relationship A is:
R=k 1ΔT+R 0
Wherein R is the reflectivity or the transmissivity of tested optical thin film element, R 0Reflectivity or transmissivity during for the initial temperature no change, Δ T is a temperature change value, k 1Be scale-up factor; As shown in Figure 2, reflectivity that Fig. 2 obtains for Theoretical Calculation and temperature variation concern synoptic diagram;
S2: according to patent " a kind of method of measuring optical film absorption loss " (applicant: Li Bincheng, Hao Honggang, application number 200710118694.9; Publication number CN101082537,2007) the middle method that proposes, set up experimental system; As shown in Figure 3, Fig. 3 is the experimental provision synoptic diagram; The output beam of heating LASER Light Source is after passing through the chopper modulation behind the beam splitter; Focus on the surface that sample is an optical thin film element through lens 1;, catoptron is focused into the same area that the surface that is mapped to tested thin-film component is heated laser beam irradiation from the light beam of exploring laser light light source output after turning to by lens 2; Converge on the receiving plane of photodetector by lens 3 from the exploring laser light bundle of sample surfaces reflection or transmission, obtain the photodetection signal.The output signal of chopper is connected to lock-in amplifier signal as a reference simultaneously.When surveying reflection or transmission and survey the DC quantity of light and read and exchanged the variable quantity heated light sources by oscillograph and be continuous modulating lasering beam, reads by photodetector by lock-in amplifier.
Adopt the mode of continuous laser heating; (power watt level or above high power) the continuous laser light beam or the pulsed laser beam that perhaps adopt a beam intensity periodic modulation as the heating light beam irradiates to tested optical thin film element; Select a branch of wavelength near (power milliwatt level or lower low-power) continuous laser of reflection of described optical thin film element or transmission belt edge as detecting light beam; Shine the identical or adjacent position of tested optical thin film element with the heating light beam; Under optimal conditions, change the heated light sources output power, when the heating light beam is continuous laser; Adopt the first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof through calibration; When the heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof through calibration;
The reflectivity or the transmissivity of the asynchronous tested optical thin film element of said heating luminous power obtain through following formula:
RI 0 R 0 I 0 = V ac + V dc V dc ⇒ R = ( V ac + V dc V dc ) · R 0 ,
Wherein, V AcBe expressed as the alternating signal amplitude that experiment measures, V DcBe expressed as the direct current signal amplitude that experiment measures, I 0The incident intensity of light is surveyed in expression;
Monitor the variation of whole detection light intensities of reflection or the transmission of tested optical thin film element by photodetector; First harmonic amplitude and phase place through lock-in amplifier recording light electric explorer output current or voltage signal; The perhaps DC current or the voltage signal of digital storage oscilloscope recording light electric explorer output; Obtain reflectivity or transmissivity rule with the heating optical power change; Match obtains the linear relationship B between reflectivity or transmissivity and the heating luminous power, and the expression formula of said linear relationship B is:
R=k 2P+R 0
Wherein, P is heating luminous power, k 2Be scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and the heating light beam power, said linear relationship C is:
ΔT=(k 2/k 1)·P,
Wherein, k 2/ k 1Be scale-up factor;
S4: with the optical thin film element of known optical and thermal parameters as known sample; Obtain the sample surfaces variation of temperature according to heat-conduction equation; Measure the surface heating spot size of known sample and to the reflectivity or the transmissivity of heating light beam; As shown in Figure 4, Fig. 4 is experiment measuring reflectivity that obtains and the synoptic diagram that concerns that heats luminous power; Thereby obtain the temperature variation of known sample and the linear relationship D between the heating light beam power, as shown in Figure 5, Fig. 5 is Theoretical Calculation temperature that obtains and the synoptic diagram that concerns that heats luminous power, and the expression formula of said linear relationship D is:
Δ T=k 3P, wherein, k 3Be scale-up factor;
S5: because the temperature variation of optical thin film element sample surfaces is proportional to the absorptivity of sample to heating light, so, make linear relationship D identical, i.e. scale-up factor k with linear relationship C through the absorptivity of adjustment known sample to the heating light beam 3With scale-up factor k 2/ k 1Identical, obtain the absorptivity of tested optical thin film element to the heating light beam.
Embodiment provided by the invention is used for realizing the absolute measurement of optical thin film element absorption loss, and is suitable equally to analyzing reflectivity or transmissivity.Even be in weak absorbing state, because above-mentioned various relations are linear relationship, so above-mentioned absolute method of measurement is suitable equally.
Be provided with a condenser lens before the said photodetector, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
When the exploring laser light bundle makes reflection or transmitted light polarization separation remarkable with respect to the incident angle on tested optical thin film element surface, add polaroid in the detector front, the variation of real-time detection reflection or transmission-polarizing light intensity.
When the heating light beam is continuous laser, adopt the first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof through calibration.
When the heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof through calibration.
The center of described heating laser beam irradiation optical thin film element thin layer and exploring laser light bundle overlaps or the next-door neighbour.
Add a condenser lens before the described photodetector, the detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
When the exploring laser light bundle makes reflection or transmitted light polarization separation remarkable with respect to the incident angle on tested optical thin film element surface, add polaroid in the detector front, but the variation of real-time detection reflection or transmission-polarizing light intensity.
The above is merely the preferred embodiments of the present invention, is not limited to the present invention, and obviously, those skilled in the art can carry out various changes and modification and not break away from the spirit and scope of the present invention the present invention.Like this, belong within the scope of claim of the present invention and equivalent technologies thereof if of the present invention these are revised with modification, then the present invention also is intended to comprise these changes and modification interior.

Claims (9)

1. method that realizes the absolute measurement of optical thin film element absorption loss is characterized in that: may further comprise the steps:
S1: according to the reflectivity or the temperature variant rule of transmissivity of tested optical thin film element, match obtains to survey the linear relationship A between optical wavelength position reflectivity or transmissivity and the temperature variation, and the expression formula of said linear relationship A is:
R=k 1ΔT+R 0
Wherein R is the reflectivity or the transmissivity of tested optical thin film element, R 0Reflectivity or transmissivity during for the initial temperature no change, Δ T is a temperature change value, k 1Be scale-up factor;
S2: adopt beam of laser as heating light beam irradiates to tested optical thin film element; Select a branch of wavelength near (power milliwatt level or lower low-power) continuous laser of reflection of described optical thin film element or transmission belt edge as detecting light beam; Shine the identical or adjacent position of tested optical thin film element with the heating light beam; Monitor the variation of whole detection light intensities of reflection or the transmission of tested optical thin film element by photodetector; Match obtains the linear relationship B between reflectivity or transmissivity and the heating light beam power, and the expression formula of said linear relationship B is:
R=k 2P+R 0
Wherein, P is heating luminous power, k 2Be scale-up factor;
S3: according to linear relationship A and linear relationship B, obtain the linear relationship C between temperature variation and the heating light beam power, said linear relationship C is:
ΔT=(k 2/k 1)·P,
Wherein, k 2/ k 1Be scale-up factor;
S4: with the optical thin film element of known optical and thermal parameters as known sample; Measure the surface heating spot size of known sample and to the reflectivity or the transmissivity of heating light beam; Thereby obtain the temperature variation of known sample and the linear relationship D between the heating light beam power, the expression formula of said linear relationship D is:
ΔT=k 3P,
Wherein, k 3Be scale-up factor;
S5:, make linear relationship D identical, i.e. scale-up factor k with linear relationship C through the absorptivity of adjustment known sample to the heating light beam 3With scale-up factor k 2/ k 1Identical, obtain the absorptivity of tested optical thin film element to the heating light beam.
2. the method for realization optical thin film element absorption loss according to claim 1 absolute measurement is characterized in that: the high bridge model that passes through narrow-cut filter domain analysis spectroscopic temperature property among the said step S1 obtains the linear relationship A of reflectivity or transmissivity and temperature variation.
3. the method for realization optical thin film element absorption loss according to claim 2 absolute measurement is characterized in that: the laser among the said step S2 is (power watt level or above high power) continuous laser light beam or pulsed laser beam of intensity periodic modulation.
4. the method for realization optical thin film element absorption loss according to claim 3 absolute measurement is characterized in that: obtain through following formula in the reflectivity of the asynchronous tested optical thin film element of said heating luminous power or the transmissivity experiment:
R = ( V ac + V dc V dc ) · R 0 ,
Wherein, V AcBe expressed as the alternating signal amplitude that experiment measures, V DcBe expressed as the direct current signal amplitude that experiment measures.
5. the method for realization optical thin film element absorption loss according to claim 4 absolute measurement; It is characterized in that: measure the surface heating spot size of known sample among the said step S4 and, obtain the sample surfaces variation of temperature according to heat-conduction equation then heating the reflectivity or the transmissivity of light beam.
6. the method for realization optical thin film element absorption loss according to claim 5 absolute measurement, it is characterized in that: said optical film absorption loss is weak absorbing state, guarantees the linearity of various relations.
7. the method for realization optical thin film element absorption loss according to claim 6 absolute measurement; It is characterized in that: when the heating light beam is continuous laser; Adopt the first harmonic amplitude and the phase place of lock-in amplifier recording light electric explorer output current or voltage signal, obtain tested optical thin film element absorption loss and real-time change situation thereof through calibration; When the heating light beam is pulse laser, adopt digital storage oscilloscope or data collecting card recording light electric explorer output current or voltage signal process over time, obtain optical thin film element absorption loss to be measured and real-time change situation thereof through calibration.
8. the method for realization optical thin film element absorption loss according to claim 7 absolute measurement; It is characterized in that: be provided with a condenser lens before the said photodetector; The detection light of thin-film component reflection or transmission is all converged on the receiving plane of detector, reflected or the real-time change of transmitted intensity.
9. the method for realization optical thin film element absorption loss according to claim 8 absolute measurement; It is characterized in that: when the exploring laser light bundle makes reflection or transmitted light polarization separation remarkable with respect to the incident angle on tested optical thin film element surface; Add polaroid in the detector front, but the variation of real-time detection reflection or transmission-polarizing light intensity.
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