CN102426860A - Method for detecting disturbance of programming operation to adjacent memory cells - Google Patents
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技术领域 technical field
本发明涉及存储器信息存储领域,特别是涉及检测存储阵列编程操作对临近存储单元干扰的方法。 The invention relates to the field of memory information storage, in particular to a method for detecting the interference of memory array programming operations on adjacent memory cells. the
背景技术 Background technique
整个闪存存储器的核心是闪存存储单元构成的阵列,参见图1,闪存存储单元以普通MOS管为例,每个存储单元(cell)有三个端口,其中一个是控制端口,相当于普通MOS管的栅极,其余两个端口相当于普通MOS管的源极和漏极。存储单元的控制端口连接字线,并且阵列中同一行存储单元的控制端口连接同一字线WL1,字线电位高低实现对存储单元的开启和关断。存储阵列中同一行存储单元的源极和漏极顺次首尾相连,相邻的两个存储单元的源极和漏极连接在一根位线上。通常对存储单元进行编程(包括写入、擦除等)时,以对图1中存储单元cell2编程为例,字线WL1电平为高后存储单元cell2开启,位线选通装置选通存储单元cell2源极和漏极相连接的两根位线BLa和BLa+1,编程电流提供装置为位线BLa施加编程所需的低电压,编程电压提供装置为位线BLa+1施加编程所需的高电压,存储单元cell2两端存在电势差。在编程电流I的作用下,由于闪存存储单元沟道热电子效应(CHE),电荷注入存储单元cell2的存储层完成存储单元的编程操作。 The core of the entire flash memory is an array of flash storage units. See Figure 1. The flash storage unit is an example of an ordinary MOS tube. Each storage unit (cell) has three ports, one of which is a control port, which is equivalent to the common MOS tube. The gate, and the other two ports are equivalent to the source and drain of ordinary MOS transistors. The control ports of the memory cells are connected to the word line, and the control ports of the memory cells in the same row of the array are connected to the same word line WL1. The sources and drains of memory cells in the same row in the memory array are connected end to end in sequence, and the sources and drains of two adjacent memory cells are connected to a bit line. Usually when memory cells are programmed (including writing, erasing, etc.), take memory cell cell2 programming in Fig. Two bit lines BLa and BLa+1 connected to the source and drain of the unit cell2, the programming current supply device applies the low voltage required for programming to the bit line BLa, and the programming voltage supply device applies the programming required for the bit line BLa+1 The high voltage of the memory cell cell2 has a potential difference. Under the action of the programming current I, due to the channel hot electron effect (CHE) of the flash memory cell, charges are injected into the storage layer of the memory cell cell2 to complete the programming operation of the memory cell. the
目前,对存储单元cell2进行编程操作时,只关注这个存储单元的编程情况,不考虑其周围存储单元(例如cell0、cell1、cell3、cell4)在此编程操作过程中是否受到影响。在对存储单元cell1进行编程操作之前的若干周期过程中,与存储单元cell2施加低电压的位线BLa相邻的位线BLa-1可能曾被施加过信号,会有残留电荷留在位线BLa-1上。当进行存储单元cell2编程操作时,由于位线BLa施加低电压,存储单元cell1两端产生电势差,从而形成流经存储单元cell1的泄露电流,而字线WL1在编程过程中置于高电平使存储单元开启,编程操作时,字线WL1的电位较高,泄露电流较大时将会使电荷进入存储单元cell1的存储层,对存储单元cell1原有的存储信息产生干扰,可能使 存储单元cell1原有的存储信息被改写。 At present, when programming the memory cell cell2, only the programming of this memory cell is concerned, regardless of whether the surrounding memory cells (such as cell0, cell1, cell3, cell4) are affected during the programming operation. During several cycles before the program operation of the memory cell cell1, the bit line BLa-1 adjacent to the bit line BLa to which the memory cell cell2 applies a low voltage may have been applied with a signal, and there will be residual charges left on the bit line BLa -1 on. When performing the programming operation of the memory cell cell2, due to the low voltage applied to the bit line BLa, a potential difference is generated across the memory cell cell1, thereby forming a leakage current flowing through the memory cell cell1, and the word line WL1 is placed at a high level during the programming process to enable When the memory cell is turned on, the potential of the word line WL1 is relatively high during the programming operation. When the leakage current is large, the charge will enter the storage layer of the memory cell cell1, which will interfere with the original storage information of the memory cell cell1 and may make the memory cell cell1 The original stored information is overwritten. the
发明内容 Contents of the invention
本发明解决了检测存储阵列编程操作时对临近单元是否造成干扰的问题。 The invention solves the problem of detecting whether the programming operation of the memory array causes interference to adjacent cells. the
为达到上述目的,本发明提供了一种检测存储阵列编程操作对临近存储单元干扰的方法,包括: In order to achieve the above object, the present invention provides a method for detecting the interference of memory array programming operations on adjacent memory cells, including:
选通被编程存储单元的字线;选通存储阵列的多根连续位线,其中,在所述被编程存储单元的一根位线施加第一编程电压,另一根位线施加第二编程电压,所述第二编程电压高于所述第一编程电压;在检测过程中每根位线只施加一次电压; Gate the word line of the programmed memory cell; gate a plurality of consecutive bit lines of the memory array, wherein a first programming voltage is applied to one bit line of the programmed memory cell, and a second programming voltage is applied to the other bit line voltage, the second programming voltage is higher than the first programming voltage; each bit line is only applied once during the detection process;
测量与所述被编程存储单元的位线相邻的两根连续位线之间的电压; measuring the voltage between two consecutive bit lines adjacent to the bit line of the programmed memory cell;
根据所述两根连续位线之间的电压计算流过所述两根连续位线连接的存储单元的泄露电流; calculating the leakage current flowing through the memory cells connected by the two consecutive bit lines according to the voltage between the two consecutive bit lines;
判断所述泄露电流是否大于预设电流值,如果是,与所述被编程存储单元临近的存储单元中存储信息受到所述泄露电流干扰;如果否,与所述被编程存储单元临近的存储单元中存储信息不受所述泄露电流干扰。 Judging whether the leakage current is greater than a preset current value, if yes, the information stored in the storage unit adjacent to the programmed storage unit is disturbed by the leakage current; if not, the storage unit adjacent to the programmed storage unit The stored information is not disturbed by the leakage current. the
与现有技术相比,本发明具有下列优点: Compared with the prior art, the present invention has the following advantages:
本发明还提供了检测存储阵列编程操作对临近存储单元干扰的方法,同时选通多根连续位线,在编程存储单元的同时,测量与被编程存储单元的位线相邻的连续两根位线的电压,计算流过所述两根连续位线连接的存储单元的泄露电流,通过判断所述泄露电流是否大于预设电流值,可以检测与被编程存储单元临近的存储单元中原有的信息是否受到泄露电流的干扰。 The present invention also provides a method for detecting the interference of the programming operation of the memory array on the adjacent memory cells. Simultaneously, a plurality of consecutive bit lines are selected, and while the memory cells are being programmed, two consecutive bit lines adjacent to the bit lines of the programmed memory cells are measured. Line voltage, calculate the leakage current flowing through the memory cells connected to the two consecutive bit lines, and by judging whether the leakage current is greater than the preset current value, the original information in the memory cells adjacent to the programmed memory cells can be detected Whether it is disturbed by leakage current. the
另外,如果测量与被编程存储单元的施加低电压的位线相邻的连续两根位线的电压,计算流过所述两根连续位线连接的存储单元的泄露电流,通过判断所述泄露电流的大小,可以检测被编程存储单元的编程速度和精度是否受到泄露电流的干扰。 In addition, if the voltages of two consecutive bit lines adjacent to the bit line to which a low voltage is applied to the programmed memory cell are measured, the leakage current flowing through the memory cell connected to the two consecutive bit lines is calculated, and by judging the leakage current The magnitude of the current can detect whether the programming speed and accuracy of the programmed memory cell are disturbed by the leakage current. the
附图说明 Description of drawings
通过附图所示,本发明的上述及其它目的、特征和优势将更加清晰。在 全部附图中相同的附图标记指示相同的部分。并未刻意按实际尺寸等比例缩放绘制附图,重点在于示出本发明的主旨。 The above and other objects, features and advantages of the present invention will be more clearly illustrated by the accompanying drawings. Like reference numerals refer to like parts throughout the drawings. The drawings are not intentionally scaled according to the actual size, and the emphasis is on illustrating the gist of the present invention. the
图1为存储阵列单元编程操作时的装置连接示意图; Fig. 1 is a schematic diagram of device connection during programming operation of memory array unit;
图2为本发明的检测存储阵列编程操作对临近存储单元干扰的方法测流程图; Fig. 2 is the flow chart of the method for detecting memory array programming operation of the present invention interferes with adjacent memory cells;
图3为本发明的第一实施例的方法检测时装置连接示意图; Fig. 3 is a schematic diagram of device connection during detection by the method of the first embodiment of the present invention;
图4为本发明的第一实施例的方法带有电压跟随装置的连接示意图; Fig. 4 is the connection schematic diagram that the method of the first embodiment of the present invention has voltage follower;
图5为第一实施例的电压跟随装置的电路示意图; Fig. 5 is the schematic circuit diagram of the voltage following device of the first embodiment;
图6为高精度电压测试装置的示意图; Fig. 6 is the schematic diagram of high precision voltage testing device;
图7为本发明的第一实施例的方法检测时装置连接示意图; Fig. 7 is a schematic diagram of device connection during detection by the method of the first embodiment of the present invention;
图8为本发明的检测存储阵列编程操作对临近存储单元干扰的方法的位线选通装置连接示意图。 FIG. 8 is a schematic diagram of the connection of the bit line gating device of the method for detecting the interference of the programming operation of the memory array on the adjacent memory cells of the present invention. the
具体实施方式 Detailed ways
正如背景技术所述,常规的存储阵列进行编程操作时与施加低电压信号或高电压信号的位线相邻的位线上不施加任何信号,当前编程操作之前的若干编程周期过程中,与被编程存储单元的位线相邻的位线由于曾被施加过编程信号,会有残留正电荷,在编程操作的瞬间,在与被编程存储单元临近的共用一条字线的临近的存储单元的源极和漏极两端存在电势差而产生泄露电流,编程时字线电位较高,泄露电流较大时将会使电荷进入存储单元的存储层,对与被编程存储单元临近的存储单元原有的存储信息产生干扰。 As described in the background art, when a conventional memory array performs programming operations, no signal is applied to the bit lines adjacent to the bit lines to which the low-voltage signal or the high-voltage signal is applied. During several programming cycles before the current programming operation, the Because the bit line adjacent to the bit line of the programmed memory cell has been applied with a programming signal, there will be residual positive charges. There is a potential difference between the electrode and the drain to generate a leakage current. When programming, the potential of the word line is high. When the leakage current is large, the charge will enter the storage layer of the memory cell, and the original memory cell adjacent to the programmed memory cell Stored information interferes. the
为了检测存储阵列的存储单元编程操作时与被编程存储单元临近的共用一条字线的临近的存储单元中存储信息是否受到编程操作的影响,本发明提出一种检测编程操作对临近存储单元干扰的方法,技术方案是在对被编程存储单元进行编程时,同时测量与被编程存储单元的位线相邻的两根连续位线之间的电压,计算流过所述两根连续位线连接的存储单元的泄露电流,并判断该泄露电流是否会干扰与所述被编程存储单元临近的存储单元中存储信息。本发明的方案能够在编程操作进行的同时,通过测量流过与被编程存储单元临近的存储单元的泄露电流,达到检测编程操作是否会对与被编程存储单元临近的存储单元产生干扰的目的。 In order to detect whether the stored information in the adjacent memory cells sharing a word line adjacent to the programmed memory cell is affected by the programming operation during the programming operation of the memory cells of the memory array, the present invention proposes a method for detecting the interference of the programming operation on the adjacent memory cells The method, the technical solution is to simultaneously measure the voltage between two consecutive bit lines adjacent to the bit line of the programmed memory cell when programming the programmed memory cell, and calculate the voltage flowing through the two consecutive bit lines connected The leakage current of the memory cell, and judging whether the leakage current will interfere with the information stored in the memory cell adjacent to the programmed memory cell. The scheme of the present invention can detect whether the programming operation will interfere with the storage unit adjacent to the programmed storage unit by measuring the leakage current flowing through the storage unit adjacent to the programmed storage unit while the programming operation is in progress. the
本发明公开的检测编程操作对临近存储单元干扰的方法的检测流程图见图2,包括: The detection flow chart of the method for detecting the interference of the programming operation on the adjacent storage unit disclosed by the present invention is shown in Figure 2, including:
步骤S1,选通被编程存储单元的字线;选通存储阵列的多根连续位线,其中,在所述被编程存储单元的一根位线施加第一编程电压,另一根位线施加第二编程电压,所述第二编程电压高于所述第一编程电压;在一个编程过程中每根位线只施加一次电压; Step S1, gating the word line of the programmed memory cell; gating multiple consecutive bit lines of the memory array, wherein the first programming voltage is applied to one bit line of the programmed memory cell, and the other bit line is applied A second programming voltage, the second programming voltage is higher than the first programming voltage; each bit line is only applied with a voltage once during a programming process;
步骤S2,测量与所述被编程存储单元的位线相邻的两根连续位线之间的电压; Step S2, measuring the voltage between two consecutive bit lines adjacent to the bit line of the programmed memory cell;
步骤S3,根据所述两根连续位线之间的电压计算流过所述两根连续位线连接的存储单元的泄露电流; Step S3, calculating the leakage current flowing through the memory cells connected to the two consecutive bit lines according to the voltage between the two consecutive bit lines;
步骤S4,判断所述泄露电流是否大于预设电流值,如果是,编程操作对与所述被编程存储单元临近的存储单元中存储信息受到所述泄露电流干扰;如果否,编程操作对与所述被编程存储单元临近的存储单元中存储信息不受所述泄露电流干扰。 Step S4, judging whether the leakage current is greater than a preset current value, if yes, the programming operation interferes with the information stored in the memory unit adjacent to the programmed memory unit by the leakage current; The information stored in the storage unit adjacent to the programmed storage unit is not disturbed by the leakage current. the
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图对本发明的具体实施方式做详细的说明。 In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. the
在下面的描述中阐述了很多具体细节以便于充分理解本发明,但是本发明还可以采用其他不同于在此描述的其它方式来实施,因此本发明不受下面公开的具体实施例的限制。 In the following description, many specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways than those described here, so the present invention is not limited by the specific embodiments disclosed below. the
其次,本发明结合示意图进行详细描述,在详述本发明实施例时,为便于说明,所述示意图只是示例,其在此不应限制本发明保护的范围。下面通过具体的实施例来详细描述本发明的方法: Secondly, the present invention is described in detail with reference to the schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of explanation, the schematic diagrams are only examples, which should not limit the protection scope of the present invention. Describe the method of the present invention in detail below by specific embodiment:
实施例一 Embodiment one
本实施例提供了一种检测编程操作对临近存储单元干扰的方法,检测与被编程存储单元施加低电压的位线相邻的两根连续位线之间的电压,对存储单元进行编程操作时检测编程操作对临近存储单元干扰的检测示意图参见图3,以为存储单元Celln+2进行编程操作为例,字线选通控制信号通过字线选通装置选通存储单元Celln+2的字线WL,位线选通控制信号通过位线选通装置同时选通存储阵列的至少四根连续位线BLn-1、BLn、BLn+1和BLn+2,在 一个编程操作中每根位线只施加一次电压,编程电流提供装置为位线BLn+1施加第一编程电压,编程电压提供装置为位线BLn+2施加第二编程电压,其中,第二编程电压大于第一编程电压;与位线BLn+1相邻的位线BLn-1和BLn通过位线选通装置连接在电压测试装置上,位线BLn-1和BLn之间的电压通过电压测试装置测出。其中,编程电流提供装置和编程电压提供装置为通常进行存储单元编程时的常用装置。
This embodiment provides a method for detecting the interference of the programming operation on adjacent memory cells, detecting the voltage between two consecutive bit lines adjacent to the bit line to which the programmed memory cell applies a low voltage, and performing a programming operation on the memory cell Refer to Figure 3 for a schematic diagram of detecting the interference of a programming operation on an adjacent memory cell. Taking the programming operation of the memory cell Celln+2 as an example, the word line gating control signal is used to gating the word line WL of the memory cell Celln+2 through the word line gating device. , the bit line gating control signal simultaneously gating at least four consecutive bit lines BLn-1, BLn, BLn+1 and BLn+2 of the memory array through the bit line gating device, each bit line is only applied in a programming operation Primary voltage, the programming current providing device applies the first programming voltage to the bit
如果位线BLn-1和BLn中存在残余电荷,则在对存储单元Celln+2编程时,位线BLn+1被瞬间置于第一编程电压,由于字线WL为高电位,与存储单元Celln+2临近的存储单元Celln和Celln+1导通,将有泄露电流流过它们的沟道,该泄露电流超过预设电流值时,会使电子进入存储单元Celln和Celln+1的浮栅,对存储单元Celln和Celln+1原有的存储信息产生干扰。测量泄露电流大小的方法是由电压测试装置测量在编程操作瞬间位线BLn-1和BLn之间的电压值U1,存储单元Celln的沟道电阻为R1,存储单元的沟道电阻与其上存储信息相关。存储单元Celln上流过的泄露电流Ileak1根据下式计算:
If there is residual charge in the bit lines BLn-1 and BLn, then when the memory cell Celln+2 is programmed, the bit
Ileak1=U1/R1 Ileak1 = U 1 /R1
计算出泄露电流Ileak1的大小,比较泄露电流与预设电流值,如果泄露电流大于预设电流,存储单元Celln和Celln+1信息受到泄露电流干扰,可能会被改写;如果泄露电流小于所述预设电流,存储单元信息不受述泄露电流干扰。 Calculate the magnitude of the leakage current Ileak1, compare the leakage current with the preset current value, if the leakage current is greater than the preset current, the information of the storage unit Celln and Celln+1 may be rewritten due to the interference of the leakage current; if the leakage current is less than the preset value If the current is set, the information of the storage unit will not be disturbed by the leakage current. the
本实施例的检测编程操作对临近存储单元干扰的方法中,还可以选通存储阵列中的至少五根位线,在与施加第二编程电压的位线相邻的至少一根位线上施加与第二编程电压相同的电压。参见图4,在编程操作时,位线选通控制信号通过位线选通装置还选通与位线BLn+2相邻的位线BLn+3,位线BLn+3施加与位线BLn+2相等的第二编程电压,施加在位线BLn+3的电压由电压跟随装置提供。电压跟随装置的作用是跟随被编程的存储单元施加第二编程电压一端的电压,并使与之相连的位线电压到达同一值。对存储单元Celln+2进行编程时,存储单元Celln+3的两端电压相等,所以不会产生泄露电流,能够保证存储单元Celln+2上的编程精度。
In the method for detecting interference of programming operation on adjacent memory cells in this embodiment, at least five bit lines in the memory array may be selected, and at least one bit line adjacent to the bit line to which the second programming voltage is applied is applied. The same voltage as the second programming voltage. Referring to Fig. 4, during the programming operation, the bit line gating control signal also gating the bit
电压跟随装置中可以包括一个运算放大器,如图5所示,运算放大器的输出端12与反相输入端11连接,使放大器的输出端12的电压就和同相输入端10的电压保持一致。参见图4,运算放大器的输入端10为电压跟随装置的输入端,连接在编程电压提供装置的电压输出端,运算放大器的输出端12输出的电压通过位线选通装置施加在位线BLn+3上。在编程操作时,电压跟随装置可以为与其连接的位线BLn+3跟随位线BLn+2进行同步充电。
An operational amplifier may be included in the voltage follower, as shown in FIG. 5 , the
另外,本实施例中的电压跟随电路还可以包括控制端,参见图5,控制端13为高电平时电压跟随电路工作,输出端12输出与同相输入端10相等的电压;控制端13为低电平时,电压跟随电路不工作,输出端12输出电压为零。
In addition, the voltage follower circuit in this embodiment may also include a control terminal. Referring to FIG. 5, the voltage follower circuit operates when the
本实施例中的电压测试装置可以采用一般的电压测试设备,也可以采用高精度电压测试装置,其结构参见图6,包括前置放大电路、高通滤波电路、低通滤波电路、主放大电路和50Hz陷波电路,其中,前置放大电路用于将高精度测试装置的传感器采集到的电压信号进行差模方式放大避免信号失真,可以由带自动失调补偿的三级运算放大器组成(例如可以采用LM725CN等独立元件);高通和低通滤波电路用于减少测试噪声干扰,可以由二阶压控源电路组成;主放大电路和50Hz陷波电路用于产生与A/D转换器的输入端匹配的幅度。传感器采集到的电压信号进行差模方式后,高通和低通滤波电路减少测试噪声干扰,最后经过主放大电路和50Hz陷波电路产生与A/D转换器的输入端匹配的信号幅度,高精度电压测试装置可以灵敏准确地测试出电压值。 The voltage testing device in the present embodiment can adopt general voltage testing equipment, also can adopt high-precision voltage testing device, its structure sees Fig. 6, comprises preamplifier circuit, high-pass filter circuit, low-pass filter circuit, main amplifier circuit and 50Hz notch circuit, wherein the preamplifier circuit is used to amplify the voltage signal collected by the sensor of the high-precision test device in a differential mode to avoid signal distortion, and can be composed of a three-stage operational amplifier with automatic offset compensation (for example, it can be used LM725CN and other independent components); high-pass and low-pass filter circuits are used to reduce test noise interference, which can be composed of a second-order voltage-controlled source circuit; the main amplifier circuit and 50Hz trap circuit are used to generate and match the input of the A/D converter Amplitude. After the voltage signal collected by the sensor is differential mode, the high-pass and low-pass filter circuits reduce the test noise interference, and finally the main amplifier circuit and 50Hz notch circuit generate a signal amplitude that matches the input of the A/D converter, with high precision The voltage testing device can test the voltage value sensitively and accurately. the
同时,参见图3,在对存储单元Celln+2进行编程时,如果与其临近的存储单元Celln、Celln+1等上有泄露电流存在,就会有电荷不断补充到位线BLn+2上,直到残留电荷全部泄漏完毕,位线BLn+1才能达到满足编程操作的低电压值U0,此时的读取操作结果才能有效。因此,泄露电流的存在,将可能干扰编程操作的速度,也可能影响编程的精度。本实施例的检测编程操作对临近存储单元干扰的方法,通过判断泄露电流的大小也可以检测编程操作速度和精度是否受到泄露电流的干扰。
At the same time, referring to Figure 3, when the memory cell Celln+2 is programmed, if there is a leakage current in the adjacent memory cells Celln, Celln+1, etc., there will be charges continuously added to the bit line BLn+2 until the remaining After all the charges are leaked, the bit
实施例二: Embodiment two:
本实施例提供了一种检测编程操作对临近存储单元干扰的方法,检测与被编程存储单元施加高电压的位线相邻的两根连续位线之间的电压,对存储 单元进行编程操作时检测编程操作对临近存储单元干扰的检测示意图参见图7,以存储单元Cellm+1进行编程操作为例,字线选通控制信号通过字线选通装置选通存储单元Cellm+1的字线WL,位线选通控制信号通过位线选通装置同时选通存储阵列的至少四根连续位线BLm、BLm+1、BLm+2和BLm+3,编程电流提供装置为位线BLm施加第一编程电压,编程电压提供装置为位线BLm+1施加第二编程电压,与位线BLm+1相邻的位线BLm+2和BLm+3通过位线选通装置连接在电压测试装置上,位线BLm+2和BLm+3之间的电压通过电压测试装置测出。其中,编程电流提供装置和编程电压提供装置为通常进行存储单元编程时的常用装置,电压测试装置也可以采用实施例一中的高精度测试装置。
This embodiment provides a method for detecting the interference of programming operations on adjacent memory cells, by detecting the voltage between two consecutive bit lines adjacent to the bit line to which a high voltage is applied to the programmed memory cell, when performing a programming operation on the memory cell Refer to FIG. 7 for a schematic diagram of detecting the interference of a programming operation on an adjacent storage unit. Taking the programming operation of the storage unit Cellm+1 as an example, the word line gating control signal gates the word line WL of the storage unit Cellm+1 through the word line gating device. The bit line gating control signal simultaneously gating at least four consecutive bit lines BLm, BLm+1, BLm+2 and BLm+3 of the memory array through the bit line gating device, and the programming current supply device applies the first bit line BLm to the bit line BLm. programming voltage, the programming voltage providing device applies a second programming voltage to the bit
在对存储单元Cellm+1编程时,位线BLm+1被瞬间置于第二编程电压U2,由于字线WL为高电位,与存储单元Cellm+1临近的存储单元Cellm+2和Cellm+3导通,位线BLm+2和BLm+3不施加电压,在存储单元Cellm+2和Cellm+3的两端存在电势差,将有泄露电流Ileak2流过存储单元Cellm+2和Cellm+3的沟道,该泄露电流超过设定电流值时,会使电子进入存储单元Cellm+2和Cellm+3的浮栅,对存储单元Cellm+2和Cellm+3原有的存储信息产生干扰。测量泄露电流大小的方法是由电压测试装置测量在编程操作时的瞬间位线BLm+2和BLm+3之间的电压值U2,存储单元Cellm+3的沟道电阻为R2,存储单元的沟道电阻与其上存储信息相关。存储单元Cellm+3上流过的泄露电流Ileak2根据下式计算:
When programming the memory
Ileak2=U2/R2 Ileak2 = U 2 /R2
计算出泄露电流Ileak2的大小,比较泄露电流与预设电流值,如果泄露电流大于预设电流,存储单元Cellm+2和Cellm+3信息受到泄露电流干扰,可能会被改写;如果泄露电流小于所述预设电流,存储单元信息不受述泄露电流干扰。 Calculate the magnitude of the leakage current Ileak2, compare the leakage current with the preset current value, if the leakage current is greater than the preset current, the information of the storage cells Cellm+2 and Cellm+3 may be rewritten due to the interference of the leakage current; if the leakage current is less than the preset value The preset current, the storage unit information will not be disturbed by the leakage current. the
同时,对存储单元Cellm+1编程时的编程信息由位线BLm+1上的编程电流I决定,编程时泄露电流Ileak2的存在,可能会影响编程电流I的准确性,因此本实施例的检测编程操作对临近存储单元干扰的方法,通过判断泄露电流的大小还可以检测编程操作的准确性。
At the same time, the programming information when programming the memory cell Cellm+1 is determined by the programming current I on the bit
本实施例的检测编程操作对临近存储单元干扰的方法中,选通存储阵列的多根连续位线由位线选通装置根据选通控制信号实现,位线选通装置有多种结构,本实施例的位线选通装置可以采用一个选通控制信号选通一根位线的选通结构。参见图8,位线选通装置包括多个MOS晶体管M1、M2、M3...,控制信号为高电平时,MOS晶体管的源极和漏极导通,位线选通控制信号S1选通MOS晶体管M1,编程电流提供装置通过MOS晶体管M1为存储阵列的位线BLm施加第一编程电压;位线选通控制信号S2选通MOS晶体管M2,编程电压提供装置通过MOS晶体管M2为存储阵列的位线BLm+1施加第二编程电压;位线选通控制信号S3选通MOS晶体管M3,存储阵列的位线BLm+2通过MOS晶体管M3与电压测试装置一端连接;位线选通控制信号S4选通MOS晶体管M4,存储阵列的位线BLm+3通过MOS晶体管M4与电压测试装置另一端连接。
In the method for detecting the interference of the programming operation on adjacent memory cells in this embodiment, the multiple consecutive bit lines of the memory array are selected by the bit line gating device according to the gating control signal. The bit line gating device has various structures. The bit line gating device of the embodiment may adopt a gating structure in which one gating control signal is used to gate one bit line. Referring to FIG. 8, the bit line gating device includes a plurality of MOS transistors M1, M2, M3..., when the control signal is at a high level, the source and drain of the MOS transistors are turned on, and the bit line gating control signal S1 gating MOS transistor M1, the programming current providing device applies the first programming voltage to the bit line BLm of the memory array through the MOS transistor M1; The second programming voltage is applied to the bit
以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制。 The above descriptions are only preferred embodiments of the present invention, and do not limit the present invention in any form. the
虽然本发明已以较佳实施例披露如上,然而并非用以限定本发明。任何熟悉本领域的技术人员,在不脱离本发明技术方案范围情况下,都可利用上述揭示的方法和技术内容对本发明技术方案作出许多可能的变动和修饰,或修改为等同变化的等效实施例。因此,凡是未脱离本发明技术方案的内容,依据本发明的技术实质对以上实施例所做的任何简单修改、等同变化及修饰,均仍属于本发明技术方案保护的范围内。 Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any person familiar with the art, without departing from the scope of the technical solution of the present invention, can use the methods and technical content disclosed above to make many possible changes and modifications to the technical solution of the present invention, or modify it into an equivalent implementation of equivalent changes example. Therefore, any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention, which do not deviate from the technical solution of the present invention, still fall within the protection scope of the technical solution of the present invention. the
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105372435A (en) * | 2014-08-26 | 2016-03-02 | 中国科学院苏州纳米技术与纳米仿生研究所 | Biological detection system based on graphene and making and integrating methods thereof |
CN109390028A (en) * | 2017-08-10 | 2019-02-26 | 北京兆易创新科技股份有限公司 | It is automatically repaired the method and device of NOR type storage array bit line failure |
CN118782119A (en) * | 2024-09-09 | 2024-10-15 | 新存科技(武汉)有限责任公司 | Memory and operation method thereof and storage system |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1411001A (en) * | 2001-09-27 | 2003-04-16 | 夏普公司 | Bit line controlling decoder circuit, semiconductor storage device and data device and data reading method thereof |
US20040190351A1 (en) * | 2003-03-24 | 2004-09-30 | Kabushiki Kaisha Toshiba | Leak immune semiconductor memory |
CN101667455A (en) * | 2008-09-01 | 2010-03-10 | 松下电器产业株式会社 | Semiconductor memory device |
CN102148051A (en) * | 2010-02-10 | 2011-08-10 | 上海宏力半导体制造有限公司 | Memory and sensitive amplifier |
-
2011
- 2011-11-30 CN CN201110391567.2A patent/CN102426860B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1411001A (en) * | 2001-09-27 | 2003-04-16 | 夏普公司 | Bit line controlling decoder circuit, semiconductor storage device and data device and data reading method thereof |
US20040190351A1 (en) * | 2003-03-24 | 2004-09-30 | Kabushiki Kaisha Toshiba | Leak immune semiconductor memory |
CN101667455A (en) * | 2008-09-01 | 2010-03-10 | 松下电器产业株式会社 | Semiconductor memory device |
CN102148051A (en) * | 2010-02-10 | 2011-08-10 | 上海宏力半导体制造有限公司 | Memory and sensitive amplifier |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105372435A (en) * | 2014-08-26 | 2016-03-02 | 中国科学院苏州纳米技术与纳米仿生研究所 | Biological detection system based on graphene and making and integrating methods thereof |
CN109390028A (en) * | 2017-08-10 | 2019-02-26 | 北京兆易创新科技股份有限公司 | It is automatically repaired the method and device of NOR type storage array bit line failure |
CN109390028B (en) * | 2017-08-10 | 2021-01-22 | 北京兆易创新科技股份有限公司 | Method and device for automatically repairing NOR type memory array bit line fault |
CN118782119A (en) * | 2024-09-09 | 2024-10-15 | 新存科技(武汉)有限责任公司 | Memory and operation method thereof and storage system |
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