CN102411941A - Mask layer of super-resolution compact disc and preparation method thereof - Google Patents
Mask layer of super-resolution compact disc and preparation method thereof Download PDFInfo
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- CN102411941A CN102411941A CN2011103348658A CN201110334865A CN102411941A CN 102411941 A CN102411941 A CN 102411941A CN 2011103348658 A CN2011103348658 A CN 2011103348658A CN 201110334865 A CN201110334865 A CN 201110334865A CN 102411941 A CN102411941 A CN 102411941A
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- mask layer
- target
- disc
- laminated film
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Abstract
The invention relates to a mask layer of a super-resolution compact disc and a preparation method thereof. The mask layer is a composite film made of Ag-doped Si; the content of the Si in the composite film is 13.8-15.3 mol percent; and the thickness of the mask layer (1) is 30-50 nm. The mask layer is prepared by adopting a co-sputtering method; and compared with other preparation methods, the component of the Si in the mask layer is easy to control and adjust. When the mask layer is used on the super-resolution compact disc, a measured readout signal of the compact disc has high carrier to noise ratio and good environmental stability. Therefore, the mask layer can satisfy the requirements in practical use of the future super-resolution compact disc.
Description
Technical field
The present invention relates to optical storage, is mask layer of a kind of super resolution optical disc and preparation method thereof.
Background technology
Far field optical storage in recent years is because the restriction of optical diffraction limit; Make the capacity of CD and the raising of density run into bottleneck; Because the near field of light storage can break through diffraction limit, makes optical disc information RP size reduce, thereby has improved the information storage of CD.In the near field of light memory technology; Since Yasuda etc. in read-only disc, adopt first the method for mask realize the super-resolution RP reading the back (referring to Yasuda K, Ono M, Aratani K et al..Premastered optical disk by super resolution.Jpn.J.Appl.Phys.1993; 32 (11B): 5210-5213); The mask layer technology is just known gradually and become a kind of very promising technology, and in this technology, mask material plays crucial effects again; Such as SbBi; Materials such as AgInSbTe be researcher as mask material study (referring to Zhai Fengxiao, Li Simian, Huang Huan et al..Transient optical response of Bi
20Sb
80Films induced by picosecond laser pulse [J] .Chinese J.Lasers, 2010,37 (10): 2620-2624. and F.Zhang, Y.Wang, W.D.Xu et al.High-density read-only memory disk with Ag
11In
12Sb
51Te
26Super-resolution mask layer [J] .Chin.Phys.Lett., 2004,21 (10): 1973-1975.).These mask material are because poor stability in the super resolution optical disc structure, needs protection between the two layers of dielectric layer, and therefore the CD read-out signal quality receives the influence of medium thickness and coating quality.Seek individual layer and have the level that higher stability and the ultra-distinguish film of reading performance can improve super resolution optical disc practicability greatly simultaneously.Silver Ag and silicon Si usually as total reflection layer and semi-reflective layer material, have certain environmental stability in optical disc production, after further protecting with optic-solidified adhesive, its stability improves greatly, can preserve decades and any variation does not take place.We test and find that the monolayer silicon film has certain super-resolution and reads performance, but the read output signal poor stability, the read output signal carrier-to-noise ratio can not satisfy the requirement of super resolution optical disc practicability less than 20dB; Though the carrier-to-noise ratio that single silver is the highest can reach 25dB, its stability is not fine, is placed in the air oxidized easily and significantly reduces its carrier-to-noise ratio.
Summary of the invention
The objective of the invention is to improve the deficiency of above-mentioned prior art; Mask layer of a kind of super resolution optical disc and preparation method thereof is proposed; This mask layer is used for the preparation of super resolution optical disc, and the carrier-to-noise ratio and the environmental stability of read output signal improve greatly, and super resolution optical disc is simple in structure; Compatible with the read-only Blu-ray Disc, can satisfy the requirement of following super resolution optical disc practicability.
Technical solution of the present invention is following:
A kind of mask layer of super resolution optical disc, its characteristics are that this mask layer is the laminated film of Ag doping Si, and the content of Si is 13.8mol%～15.3mol% in this laminated film, and this mask layer thickness is 30～50nm.
The preparation method of the mask layer of described super resolution optical disc, this method comprises the following steps:
1. the installation of optical disk and target:
The one side that described optical disk is carved with information faces is contained in the disc holder facing to target, then the disc holder is clamped on the disc seat in the vacuum chamber of magnetron sputtering coater; Ag target and the Si target that selected good sputter is used also is fixed on the target pedestal in the vacuum chamber of magnetron sputtering coater, regulates the position and the distance of disc seat and target, closes vacuum chamber and covers, begin to vacuumize, until the vacuum chamber internal pressure less than 4 χ 10
-4Pa;
2. sputter Ag doping Si laminated film:
Adopt Ar gas as working gas, the flow of controlling Ar gas through gas meter is 80 ml/min, (being designated hereinafter simply as sccm); Regulating magnetic control sputtering device slide valve to operating air pressure simultaneously is 0.85Pa; Regulate the direct current and the radio-frequency power supply of magnetic control sputtering device respectively, the sputtering power on control Ag target and the Si target utilizes computer-controlled program control sputtering time to carry out sputter; The content that makes Si in the laminated film is 13.8mol%～15.3mol%, and this mask layer thickness is 30～50nm; Sputter is closed radio-frequency power supply, gas meter after accomplishing successively, opens and closes slide valve after slide valve was bled 10 minutes, exits, and opens the vacuum chamber of magnetic control sputtering device, takes out the disc with individual layer Ag doping Si laminated film of preparation.
Technique effect of the present invention
Compare with the super resolution optical disc technology of preparing with mask layer material in the past; The super resolution optical disc of the mask layer preparation of super resolution optical disc of the present invention; The carrier-to-noise ratio and the environmental stability of read output signal improve greatly; Super resolution optical disc is simple in structure, and is compatible with the read-only Blu-ray Disc, can satisfy the requirement of following super resolution optical disc practicability.
Preparation method of the present invention adopts two independently Ag doping Si films of target (Ag target and Si target) co-sputtered preparation under two power supplys, and the method for traditional than before paster target is accurate more and easy in the component control of Ag or Si.
Description of drawings
Fig. 1 is a super resolution optical disc structural representation of the present invention.
Fig. 2 is the structural representation of the super resolution optical disc dish base that utilizes when preparing of the present invention
Fig. 3 is a super resolution optical disc dynamic checkout unit principle schematic
Among the figure: I-super resolution optical disc, II-mask layer, 1-laser instrument; 2, the 9-polaroid; 3, the 8-polarization splitting prism; The 4-catoptron; The 5-convergent lens; The 6-CD; The 7-motor; 10-reflected light receiver.
Embodiment
Below in conjunction with embodiment and accompanying drawing the present invention is further specified, but should not limit protection scope of the present invention with this.
Fig. 1 is the structural representation that spatters the film disc altogether of the present invention's preparation.Visible by figure; The present invention is the mask layer I that on the optical disk substrate II of the prefabricated 390nm of having size information faces, has deposited super resolution optical disc; The mask layer I of this super resolution optical disc; Be the laminated film of Ag doping Si, the content of Si is 13.8mol%～15.3mol% in this laminated film, and this mask layer thickness is 30～50nm.
The preparation method's of this mask layer I specific embodiment 1 may further comprise the steps:
1. ready disc is positioned in the disc holder, information faces blows clean disc surface with high pure nitrogen (99.99%) up, then the disc holder is clamped on the disc seat in the vacuum chamber.Be placed on Ag target and Si target respectively on the corresponding target stand and fix, then with two targets simultaneously to center curvature 45 degree of two targets.The target size of different coating machines is different, and the used target size of this laboratory coating machine is the round target that diameter is 60nm, and the distance between target and the disc is 60cm.Then; Close vacuum chamber cavity lid and begin to vacuumize, at first open mechanical pump and be evacuated to chamber vacuum below the 5Pa, then open molecular pump; When treating that the molecular pump rotating speed reaches 200 commentaries on classics; Open slide valve molecular pump is vacuumized vacuum cavity, opened high vacuum gauge later in about 1 and a half hours, check whether the vacuum tightness in the cavity is superior to 4 χ 10
-4Pa is if vacuum tightness is superior to 4 χ 10
-4Pa then can begin the preparation of membraneous material.
2. at first be to open the shielding power supply preheating 5 minutes, open gas meter then and feed working gas Ar gas that flow is 80sccm, the regulator plate valve is that the air pressure (being sputtering pressure) in the cavity rises to 0.85Pa.Open the sputter coating program controlled software on the computing machine, move on to the place that target can not be splashed to the disc holder.Next regulate shielding power supply to required power, Ag target 55W for example, Si target 95W, the preparation of film is accomplished in sputter 2 minutes in advance then through the time of program controlled software regulation and control plated film earlier.Sputtering time is closed shielding power supply after accomplishing, and opens slide valve molecular pump was bled 5 minutes to cavity, so that remove the impurity in the cavity.At last, close slide valve, bleed off the gas in the coating machine cavity; Open the chamber lid of coating machine cavity; Take out the super resolution optical disc with individual layer Ag doping Si laminated film of preparation, put into sample box to the super resolution optical disc taking-up and treat input, the closure molecule pump; Mechanical pump, and coating machine general supply.
Utilize Fig. 3 super resolution optical disc dynamic checkout unit that prepared super resolution optical disc disc is tested, the result is following:
The signal testing of disc: being put into wavelength to the disc that is coated with the mask layer material is 780nm, and numerical aperture is to measure on 0.40 the disc tester, and the highest read output signal is 28dB.
Spatter the constituent analysis of membraneous material altogether: is the signal to noise ratio (S/N ratio) that makes that the film that spatters altogether of Ag and Si is analyzed and can be obtained with EDS more than or equal to the mask layer material of 25dB, and the content of Si is 13.8mol%-15.3mol% in the film.
Spatter the measurement of the stability of membraneous material altogether: will be coated with the disc that Ag and Si spatter film altogether and place after one month, it is carried out the read output signal test again, the highest read output signal is reduced to 26dB from 28dB, and read output signal descends less than 10%, and stability is better.
Table 1
Claims (2)
1. the mask layer of a super resolution optical disc, its characteristics are that this mask layer is the laminated film of Ag doping Si, and the content of Si is 13.8mol%～15.3mol% in this laminated film, and this mask layer (I) thickness is 30～50nm.
2. the preparation method of the mask layer of the described super resolution optical disc of claim 1 is characterized in that this method comprises the following steps:
1. the installation of optical disk and target:
The one side that described CD (II) is carved with information faces is contained in the disc holder facing to target, then the disc holder is clamped on the disc seat in the vacuum chamber of magnetron sputtering coater; Ag target and the Si target that selected good sputter is used also is fixed on the target pedestal in the vacuum chamber of magnetron sputtering coater, regulates the position and the distance of disc seat and target, closes vacuum chamber and covers, begin to vacuumize, until the vacuum chamber internal pressure less than 4 χ 10
-4Pa;
2. sputter Ag doping Si laminated film:
Adopt Ar gas as working gas; Flow through gas meter control Ar gas is 80sccm, and regulating magnetic control sputtering device slide valve to operating air pressure simultaneously is 0.85Pa, regulates the direct current and the radio-frequency power supply of magnetic control sputtering device respectively; Sputtering power on control Ag target and the Si target; Utilize computer-controlled program control sputtering time to carry out sputter, the content that makes Si in the laminated film is 13.8mol%～15.3mol%, and this mask layer thickness is 30～50nm; Sputter is closed radio-frequency power supply, gas meter after accomplishing successively, opens and closes slide valve after slide valve was bled 10 minutes, exits, and opens the vacuum chamber of magnetic control sputtering device, takes out the disc with individual layer Ag doping Si laminated film of preparation.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103348658A CN102411941A (en) | 2011-10-28 | 2011-10-28 | Mask layer of super-resolution compact disc and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103348658A CN102411941A (en) | 2011-10-28 | 2011-10-28 | Mask layer of super-resolution compact disc and preparation method thereof |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5709978A (en) * | 1993-06-18 | 1998-01-20 | Hitachi, Ltd. | Supperresolution readout thin film and information recording medium |
| CN1588544A (en) * | 2004-09-29 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | Read-only super resolution optical disc using platinum oxide as mask |
| CN101260511A (en) * | 2008-04-16 | 2008-09-10 | 中国科学院上海光学精密机械研究所 | Metal semiconductor composite ultra-distinguish film and preparation method thereof |
| CN101393275A (en) * | 2008-10-31 | 2009-03-25 | 中国科学院上海光学精密机械研究所 | Ultra-resolution thin-film structure of photomagnetic mixing stored record |
| CN101845608A (en) * | 2010-05-07 | 2010-09-29 | 中国科学院上海光学精密机械研究所 | TeOx-based thin film material for laser direct writing and method for preparing same |
-
2011
- 2011-10-28 CN CN2011103348658A patent/CN102411941A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5709978A (en) * | 1993-06-18 | 1998-01-20 | Hitachi, Ltd. | Supperresolution readout thin film and information recording medium |
| CN1588544A (en) * | 2004-09-29 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | Read-only super resolution optical disc using platinum oxide as mask |
| CN101260511A (en) * | 2008-04-16 | 2008-09-10 | 中国科学院上海光学精密机械研究所 | Metal semiconductor composite ultra-distinguish film and preparation method thereof |
| CN101393275A (en) * | 2008-10-31 | 2009-03-25 | 中国科学院上海光学精密机械研究所 | Ultra-resolution thin-film structure of photomagnetic mixing stored record |
| CN101845608A (en) * | 2010-05-07 | 2010-09-29 | 中国科学院上海光学精密机械研究所 | TeOx-based thin film material for laser direct writing and method for preparing same |
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Application publication date: 20120411 |