CN102409307A - Cutting tool with Ti-Mo-N multi-element surface film - Google Patents
Cutting tool with Ti-Mo-N multi-element surface film Download PDFInfo
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- CN102409307A CN102409307A CN2011103073886A CN201110307388A CN102409307A CN 102409307 A CN102409307 A CN 102409307A CN 2011103073886 A CN2011103073886 A CN 2011103073886A CN 201110307388 A CN201110307388 A CN 201110307388A CN 102409307 A CN102409307 A CN 102409307A
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Abstract
The invention provides a cutting tool with a Ti-Mo-N multi-element surface film. According to the invention, a Ti-Mo-N three-element film is prepared on the surface of the cutting tool by adopting a magnetic control sputtering method, and the cutting tool with the high-property Ti-Mo-N three-element film is obtained mainly by optimizing the preparation parameters of the multi-element film and the thermal treatment process parameters of the film. Compared with the Ti-N two-element film, a filmed cutting tool sample has smooth appearance and good compactness; by test, the elements on the surface of the film subjected to thermal treatment comprise the following components by atom percent: 30.5 of Ti, 28.3 of Mo and 41.2 of N; and the hardness of the surface of the film is 35 GPa, and the oxidization weight grain at the temperature of 800 DEG C is only half of that of the Ti-N film.
Description
Technical field
The present invention relates to a kind of cutting tool, especially a kind of cutting tool with the many first surface films of high performance Ti-Mo-N.
Background technology
Cutting tool has special matrix, and its matrix is for example processed by rapid steel, hard metal, carbide metal, sintering metal etc.Usually also on matrix, apply the single or multiple lift film coating, to improve the performance of cutting tool.And have high hardness, wear resistance and excellent rotproofness Ti-N binary film in the cutting tool surface preparation is a kind of method of routine.
Yet along with fast development of modern industry; To the cutting tool demands for higher performance; An urgent demand improves its use properties in all respects such as hardness, wear resistance, erosion resistance, high-temperature oxidation resistances; The aspect is more and more unable to do what one wishes in that hardness, wear resistance, particularly coating's adhesion, solidity to corrosion, high-temperature oxidation resistant be capable etc. for simple Ti-N binary film.Generally used doping the 3rd in the TiN film, the 4th kind of element perhaps thereby film to be implemented the performances such as hardness that thermal treatment changes film now to passing through.
Yet because alternative alloying element kind is more; Also vary and implement the process of thermal treatment step parameter; Therefore select a kind of alloying element of the film of TiN preferably; And find with it the heat treating method of corresponding a kind of suitable TiN film, for the performance that improves the TiN film and then the use range of expanding cutting tool and the working conditions using value with reality that has great importance.
Summary of the invention
To the problems referred to above; The object of the invention promptly is to select suitable alloying element with the preparation multi-element film into the TiN film; And the preparation technology parameter of optimization multi-element film; And the heat treatment process parameter of film, thereby prepare cutting tool with the many first surface films of high performance Ti-Mo-N.
For solving the problems of the technologies described above, the technical scheme that the present invention adopted is following:
At first, be the essentially consist element of film with Ti, Mo, N, the method that adopts magnetron sputtering is at cutting tool surface preparation Ti-Mo-N ternary film.
Particularly be, earlier with the substrate material surface polishing of cutting tool, and respectively with dry for standby behind the about 10min of each cleaning in ultrasonic cleaner such as hydrofluoric acid, acetone, alcohol and deionized water;
Subsequently, body material is placed on the sample table in the magnetron sputtering equipment Vakuumkammer, and with pure Ti target and Ti
50Mo
50Alloys target places different negative electrode target position respectively;
Subsequently vacuum tightness in the Vakuumkammer is extracted into≤5 * 10
-4Pa feeds the Ar that flow is 8-10sccm simultaneously, when gas pressure in vacuum is 2-4Pa, and preparatory sputter 2-3min, the power of sputter is 50-70W in advance, with the film formation surface of further cleaning body material;
The flow of keeping Ar subsequently is 8-10sccm; Control body material temperature is 40-50 ℃, when gas pressure in vacuum is 1-1.5Pa, applies the negative bias of 100-150V to body material; Remove the baffle plate of pure Ti target simultaneously; Power with 50-70W carries out sputter, and sputtering time is 5-10min, to form the pure Ti film of one deck;
Begin to feed the N that flow is 0.3-0.6sccm subsequently
2And the flow of keeping Ar is that 8-10sccm, gas pressure in vacuum are that the negative bias of 1-1.5Pa, body material is that the temperature of 100-150V, body material is 40-50 ℃; Power with 50-70W carries out sputter, and sputtering time is 15-25min, to form one deck Ti-N binary film;
The flow of keeping Ar subsequently is 8-10sccm, N
2Flow be that 0.3-0.6sccm, gas pressure in vacuum are that the negative bias of 1-1.5Pa, body material is 100-150V, the temperature of rising body material is 80-100 ℃, closes the baffle plate of pure Ti target simultaneously and removes Ti
50Mo
50The baffle plate of alloys target carries out sputter with the power of 50-70W, and sputtering time is 80-100min, to form the Ti-Mo-N ternary film.
Behind the spatter film forming, under the Ar atmosphere, cutting tool is heat-treated, treatment temp is 800-900 ℃, and the treatment time is 40-50min, and slow cooling subsequently is to room temperature.
Advantage of the present invention is: formed multilayer Ti-Mo-N multi-element film of different nature on the surface of cutting tool, both obtained and matrix good binding performance, had excellent hardness, wear resistance, solidity to corrosion and high-temperature oxidation resistance again.
Embodiment
Below, through concrete embodiment the present invention is elaborated.
A kind of cutting tool with the many first surface films of high performance Ti-Mo-N, it is prepared by following preparation process:
It is to be the essentially consist element of film with Ti, Mo, N, and the method that adopts magnetron sputtering is at cutting tool surface preparation Ti-Mo-N ternary film;
Select the body material of W6Mo5Cr4V2 rapid steel for use as cutting tool, earlier with the substrate material surface polishing, and respectively with dry for standby behind the about 10min of each cleaning in ultrasonic cleaner such as hydrofluoric acid, acetone, alcohol and deionized water;
Subsequently, body material is placed on the sample table in the magnetron sputtering equipment Vakuumkammer, and with pure Ti target and Ti
50Mo
50Alloys target places different negative electrode target position respectively;
Subsequently vacuum tightness in the Vakuumkammer is extracted into≤5 * 10
-4Pa feeds the Ar that flow is 9sccm simultaneously, when gas pressure in vacuum is 3Pa, and preparatory sputter 2min, the power of sputter is 60W in advance, with the film formation surface of further cleaning body material;
The flow of keeping Ar subsequently is 9sccm, and control body material temperature is 40 ℃, when gas pressure in vacuum is 1.5Pa; Apply the negative bias of 150V to body material, remove the baffle plate of pure Ti target simultaneously, carry out sputter with the power of 60W; Sputtering time is 7min, to form the pure Ti film of one deck;
Begin to feed the N that flow is 0.4sccm subsequently
2, and the flow of keeping Ar is that 9sccm, gas pressure in vacuum are that the negative bias of 1.5Pa, body material is that the temperature of 150V, body material is 40 ℃, carries out sputter with the power of 60W, sputtering time is 20min, to form one deck Ti-N binary film;
The flow of keeping Ar subsequently is 9sccm, N
2Flow be that 0.4sccm, gas pressure in vacuum are that the negative bias of 1.5Pa, body material is 150V, the temperature of rising body material is 100 ℃, closes the baffle plate of pure Ti target simultaneously and removes Ti
50Mo
50The baffle plate of alloys target carries out sputter with the power of 60W, and sputtering time is 90min, to form the Ti-Mo-N ternary film.
Behind the spatter film forming, under the Ar atmosphere, cutting tool is heat-treated, treatment temp is 900, and the treatment time is 45min, and slow cooling subsequently is to room temperature.
Compare with Ti-N binary film; Cutting tool sample appearance surfaces is smooth smooth after the film forming; Compactness is good, and through test, after heat treatment the atoms of elements percentage composition of film surface is 30.5Ti-28.3Mo-41.2N; The hardness of film surface is 35GPa, and the oxidation weight gain under 800 ℃ of conditions is merely the half the of Ti-N film.
Claims (1)
1. cutting tool with Ti-Mo-N multi-element film, it is to be the essentially consist element of film with Ti, Mo, N, the method that adopts magnetron sputtering is at cutting tool surface preparation Ti-Mo-N ternary film; Specifically prepare through following preparation process:
Earlier with the polishing of cutting tool substrate material surface, and respectively with dry for standby behind the about 10min of each cleaning in ultrasonic cleaner such as hydrofluoric acid, acetone, alcohol and deionized water;
Subsequently, body material is placed on the sample table in the magnetron sputtering equipment Vakuumkammer, and with pure Ti target and Ti
50Mo
50Alloys target places different negative electrode target position respectively;
Subsequently vacuum tightness in the Vakuumkammer is extracted into≤5 * 10
-4Pa feeds the Ar that flow is 8-10sccm simultaneously, when gas pressure in vacuum is 2-4Pa, and preparatory sputter 2-3min, the power of sputter is 50-70W in advance, with the film formation surface of further cleaning body material;
The flow of keeping Ar subsequently is 8-10sccm; Control body material temperature is 40-50 ℃, when gas pressure in vacuum is 1-1.5Pa, applies the negative bias of 100-150V to body material; Remove the baffle plate of pure Ti target simultaneously; Power with 50-70W carries out sputter, and sputtering time is 5-10min, to form the pure Ti film of one deck;
Begin to feed the N that flow is 0.3-0.6sccm subsequently
2And the flow of keeping Ar is that 8-10sccm, gas pressure in vacuum are that the negative bias of 1-1.5Pa, body material is that the temperature of 100-150V, body material is 40-50 ℃; Power with 50-70W carries out sputter, and sputtering time is 15-25min, to form one deck Ti-N binary film;
The flow of keeping Ar subsequently is 8-10sccm, N
2Flow be that 0.3-0.6sccm, gas pressure in vacuum are that the negative bias of 1-1.5Pa, body material is 100-150V, the temperature of rising body material is 80-100 ℃, closes the baffle plate of pure Ti target simultaneously and removes Ti
50Mo
50The baffle plate of alloys target carries out sputter with the power of 50-70W, and sputtering time is 80-100min, to form the Ti-Mo-N ternary film.
Behind the spatter film forming, under the Ar atmosphere, cutting tool is heat-treated, treatment temp is 800-900 ℃, and the treatment time is 40-50min, and slow cooling subsequently is to room temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110307388 CN102409307B (en) | 2011-10-11 | 2011-10-11 | Cutting tool with Ti-Mo-N multi-element surface film |
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| CN 201110307388 CN102409307B (en) | 2011-10-11 | 2011-10-11 | Cutting tool with Ti-Mo-N multi-element surface film |
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| CN102409307A true CN102409307A (en) | 2012-04-11 |
| CN102409307B CN102409307B (en) | 2013-10-16 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101210310A (en) * | 2007-12-21 | 2008-07-02 | 广州有色金属研究院 | Multi-component multi-layer hard thin film material for minitype drill bit surface modification and preparation method thereof |
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2011
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101210310A (en) * | 2007-12-21 | 2008-07-02 | 广州有色金属研究院 | Multi-component multi-layer hard thin film material for minitype drill bit surface modification and preparation method thereof |
Non-Patent Citations (9)
| Title |
|---|
| 《wear》 20050825 Q. Yang, et al. "Wear resistant TiMoN Coatings deposited by magnetron sputtering" 119-125 1 第261卷, * |
| 《中国优秀硕士学位论文全文数据库》 20061231 熊飞 "沉积参数对Ti/TiN纳米多层膜微观结构、界面结构和硬度的影响及其热稳定性" 24-38 1 , 第10期 * |
| 《摩擦学学报》 20091130 张晔，等 "磁控溅射Ti1-xAlxN薄膜的结构与摩擦学性能研究" 518-525 1 第29卷, 第6期 * |
| 《材料科学与工程》 20000930 胡社军，等 "Ti-Mo-N三元多层膜的结构与性能" 30-34 1 第18卷, 第3期 * |
| Q. YANG, ET AL.: ""Wear resistant TiMoN Coatings deposited by magnetron sputtering"", 《WEAR》 * |
| 张晔，等: ""磁控溅射Ti1-xAlxN薄膜的结构与摩擦学性能研究"", 《摩擦学学报》 * |
| 杨烈宇，等: "《材料表面薄膜技术》", 31 May 1991, 人民交通出版社 * |
| 熊飞: ""沉积参数对Ti/TiN纳米多层膜微观结构、界面结构和硬度的影响及其热稳定性"", 《中国优秀硕士学位论文全文数据库》 * |
| 胡社军，等: ""Ti-Mo-N三元多层膜的结构与性能"", 《材料科学与工程》 * |
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