CN102402633B - Method for establishing parameterized device physical layout unit generating program - Google Patents
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Abstract
The invention discloses a method for establishing a parameterized device physical layout unit generating program, and belongs to the technical field of integrated circuit design automation. The method comprises the following steps: inputting a physical graph of a device by using a graph editor, and marking design rule parameters among the graphs, corresponding relations between device parameters and the graphs and option areas on the physical graph; scanning physical graphs, and determining the position relationship and the position dependence relationship between basic physical graphs; and establishing a generation sequence and a program flow of each basic physical graph according to the position relation and the position dependency relation among the basic physical graphs to generate a program. The invention can automatically generate a parameterized device physical layout unit generating program.
Description
Technical field
The present invention relates to the integrated circuit (IC) design technical field of automation, particularly a kind of method of setting up parameterized device physics territory unit generating program.
Background technology
The design of device physics territory unit is the important step of Analogous Integrated Electronic Circuits design.For the design of faster devices physical pattern unit, generally adopt parameterized device physics territory unit generating program.For the consistent same type device of physical arrangement, by means of parameterized device physics territory unit generating program, input concrete device parameters value and namely can automatically generate the physical pattern unit of respective devices, can avoid like this physical layout of the hand-designed device of repeatability, thereby the raising design efficiency needs to set up parameterized device physics territory unit generating program for this reason.
At present, set up parameterized device physics territory unit generating program and mainly contain two kinds of methods: the one, the peopleware analyzes manual written-out program according to the device physics domain to hand-designed, and its shortcoming is inefficiency, and the code maintenance difficulty; Another kind method is to utilize program to carry out scanning analysis to the fundamental figure that forms the device physical layout, according to analysis result, interactively adds parameter, its shortcoming is effectively to support the retractility of device, the fundamental figure generating algorithm is simply based on coordinate, support parameter well, the code of generation are difficult to safeguard and use.Therefore need to improve to overcome these shortcomings to this existing method.
Summary of the invention
In order to solve that the existing method efficient of setting up device physical pattern unit generator program is low, code maintenance is difficult and the problem such as support parameter well, the invention provides a kind of method of setting up parameterized device physics territory unit generating program, described method comprises:
Utilize the physical graph of graphic editor entering apparatus, go out corresponding relation and the option area of design rule parameter, device parameters and figure between figure and figure at described physical graph subscript;
Scan described physical graph, determine that between basic physical graph, De Wei Ge concerns He Wei Ge dependence; Between described definite basic physical graph, the step of De Wei Ge relation specifically comprises: according to the size relation of each basic physical graph, determine the encirclement relation between each basic physical graph; Described basic physical graph is carried out accessible figure and the analysis of obstacle graphic array is arranged; Described basic physical graph is carried out left and right ordinal relation and up and down ordinal relation analysis; The described step that described basic physical graph is carried out accessible graphic array analysis specifically comprises: according to the up and down between basic physical graph and/or between left and right apart from consistance, basic physical graph is polymerized to one or several one dimensions or two-dimensional array figure; According to the extension direction of described one dimension or two-dimensional array figure, determine the figure figurate number of accessible graphic array; Set up the spacing of described one dimension or two-dimensional array figure and the relation between design rule parameter and device parameters;
Concern He Wei Ge dependence according to De Wei Ge between described basic physical graph, set up genesis sequence and the program circuit of each basic physical graph, generator program.
Described method also comprises adds the figure coordinate relocatable program, specifically comprises: travel through all basic physical graphs of device physical layout, calculate the coordinate points of horizontal stroke, ordinate minimum; The reference origin of described device physics domain is moved to the coordinate points of described horizontal stroke, ordinate minimum.
Described extension direction according to the one-dimensional array figure determines that the step of the figure figurate number of accessible graphic array is specially: the figure figurate number of one-dimensional array figure extension direction=(the device ginseng number – 2 * array pattern of corresponding extension direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of extension direction).
The step of the relation between the described spacing of setting up described one-dimensional array figure and design rule parameter and device parameters is specially: the distance values between described one-dimensional array figure=(between the device ginseng number – 2 * array pattern of corresponding extension direction and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * correspondence direction of this direction figurate number)/(the figure figurate number-1 of correspondence direction).
The described direction of extension according to described two-dimensional array figure, the step of determining the figure figurate number of accessible graphic array is specially: described two-dimensional array figure is in the figure of directions X figurate number=(the device ginseng number – 2 * array pattern of corresponding directions X and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of directions X), and described two-dimensional array figure is in the figure of Y-direction figurate number=(the device ginseng number – 2 * array pattern of corresponding Y-direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of Y-direction).
The step of the relation between the described spacing of setting up the two-dimensional array figure and design rule parameter and device parameters is specially: the distance values of directions X between described two-dimensional array figure=(between the device ginseng number – 2 * array pattern of corresponding directions X and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * directions X of directions X figurate number)/(the figure figurate number-1 of directions X), the spacing of Y-direction between described two-dimensional array figure=(between the device ginseng number – 2 * array pattern of corresponding Y-direction and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * Y-direction of Y-direction figurate number)/(the figure figurate number-1 of Y-direction).
The described step that described basic physical graph is carried out left and right ordinal relation analysis specifically comprises:
Determine the alignment thereof of described basic physical graph, described alignment thereof comprises that coboundary vertical line alignment, the alignment of central horizontal line, the alignment of lower boundary vertical line and up and down are without alignment;
With the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern left margin coordinate figure as this array point, determine left and right ordinal relation between array pattern according to the magnitude relationship of X coordinate figure in the left margin coordinate figure, the little array point of X coordinate figure is on a left side, and the large array point of X coordinate figure is on the right side.
The described step that described basic physical graph is carried out up and down ordinal relation analysis specifically comprises:
Determine the alignment thereof of described basic physical graph, described alignment thereof comprises that the alignment of left margin vertical line, the alignment of center vertical line, the alignment of right margin vertical line and left and right are without alignment;
With the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern lower boundary coordinate figure as this array point, determine ordinal relation up and down between array pattern according to the magnitude relationship of Y coordinate figure in the lower boundary coordinate figure, the little array point of Y coordinate figure under, the large array point of Y coordinate figure is upper.
Between described definite basic physical graph, the step of De Wei Ge dependence specifically comprises:
Set up the tree-like relation of father and son of stratification according to the encirclement relation of each basic physical graph;
Set up with the fraternal tree-like relation of layer according to left and right ordinal relation and the up and down ordinal relation of basic physical graph;
Set up De Wei Ge dependence between root and leaf from the bottom of tree derivation;
Set up with De Wei Ge dependence between layer leaf figure from the figure of same of tree derivation.
The step of described creation facilities program (CFP) flow process specifically comprises:
According to described graphic array analysis, with the generation of graphic array and array dot pattern as a sub-process;
Dimension and size according to graphic array in father's flow process are set up loop body, and calculating respectively generates the required ginseng of each array point and examines a Ge and input parameter in loop body;
The array pattern that generates is shifted according to reference point;
Surround relation according to described basic physical graph, build sub-process and generate besieged figure.
Compared with prior art, the present invention has the following advantages:
The present invention can be according to the dependence between the proximity relations between device physics layout data Automatic-searching figure, covering relation, figure morpheme Ge, the ordinal relation of figure generation, the dependence between dimension of picture etc., and then automatically generate parameterized device physics territory unit generating program, need not the user and determine by hand the above-mentioned relation data, accelerated the exploitation of parametrization device physics territory unit.
Description of drawings
Fig. 1 is the method flow diagram of setting up parameterized device physics territory unit generating program that the embodiment of the present invention provides.
Embodiment
In order to understand the present invention in depth, the present invention is described in detail below in conjunction with drawings and the specific embodiments.
Referring to Fig. 1, the embodiment of the present invention provides a kind of method of setting up parameterized device physics territory unit generating program, comprises the steps:
Step 101: the physical graph that utilizes the graphic editor entering apparatus;
The physical layout of device is comprised of the some basic physical graph that is closely related with device architecture, each basic physical graph comprises the information such as type, coordinate points and process layer, utilizes the type, coordinate points of the basic physical graph of graphic editor input and the information such as process layer at basic physical graph place;
Step 102: go out the design rule parameter of figure, the corresponding relation of design rule parameter, device parameters and figure between figure and option area etc. at the physical graph subscript;
Step 103: scan basic physical graph, determine De Wei Ge relation between basic physical graph;
Between basic physical graph, De Wei Ge relation comprises:
1, figure surrounds relationship analysis
Figure A is surrounded fully by another figure B on how much, and namely A is in B, and we are referred to as figure A and are subordinated to figure B, and figure surrounds the judgement of relation and can calculate to determine according to simple plane geometry;
2, array pattern relationship analysis
The array relation comprises between array point has an obstacle array pattern without what other figures were arranged between the accessible array pattern of other figures and array point;
2.1 accessible array pattern analysis
2.1.1 determining of accessible array pattern: for the identical basic physical graph of the shape and size parameter that belongs to same process layer with same direct father's encirclement, according to the up and down between basic physical graph and/or between left and right apart from consistance, these basic physical graphs are polymerized to one or several one dimensions or two-dimensional array figure; It should be noted that does not have figure at the same level or advanced figure to isolate between array pattern;
2.1.2 the encirclement relation gets reconstruct: with the figure in virtual these array patterns of the circumscribed covering of grand plan shape, replace the array pattern of this direct father in surrounding with this virtual grand plan shape, namely, surround the virtual grand plan shape of increase one deck between figure and former array pattern same direct father;
2.1.3 determine the figure figurate number of accessible array pattern
2.1.3.1 for the one-dimensional array figure, the figure figurate number of array extension direction=(the device ginseng number – 2 * array pattern of corresponding extension direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of extension direction);
2.1.3.2 for the two-dimensional array figure, in the figure of directions X figurate number=(the device ginseng number – 2 * array pattern of corresponding directions X and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of directions X), in the figure of Y-direction figurate number=(the device ginseng number – 2 * array pattern of corresponding Y-direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of Y-direction);
2.1.4 set up the spacing of array pattern in accessible array pattern and the relation between design rule parameter and device parameters: the spacing between accessible array pattern should satisfy maximum, minimum or the settled principle of design rule parameter, and this depends on the design rule file that concrete technology is corresponding; Under the spacing settled principle, the distance values between accessible array pattern is exactly the given numerical value of design rule file; At maximum, minimum principle but not under settled principle, distance values between accessible array pattern except with the design rule relating to parameters, also relevant with the parameter value of device, this parameter is relevant with the outside figure that the restriction array extends, seek immediate figure along the array bearing of trend, thereby seek out the device parameters of this figure of control, this device parameters is exactly the device parameters of indirectly control array size;
For the one-dimensional array figure, the distance values between accessible array pattern is: the distance values between accessible array pattern=(between the device of corresponding extension direction ginseng number – 2 * array pattern and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * correspondence direction of this direction figurate number)/(the figure figurate number-1 of correspondence direction);
To the two-dimensional array figure, spacing between accessible array pattern is: the distance values of directions X between accessible array pattern=(between the device of corresponding directions X ginseng number – 2 * array pattern and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * directions X of directions X figurate number)/(the figure figurate number-1 of directions X), the spacing of Y-direction between accessible array pattern=(between the device ginseng number – 2 * array pattern of corresponding Y-direction and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * Y-direction of Y-direction figurate number)/(the figure figurate number-1 of Y-direction);
2.2 the analysis of obstacle array pattern is arranged
There is the analysis of obstacle array pattern to carry out after accessible array pattern analysis, have other figure obstacles between array pattern, but the obstacle figure do not done any impact to these fundamental figure forming arrays; There is the dot matrix size of array pattern of obstacle relevant with device parameters;
2.2.1 determining of obstacle array pattern: for the identical figure of shape and size parameter that belongs to same process layer with same direct father's encirclement, according to the up and down between the obstacle array pattern and/or between left and right apart from consistance, these obstacle array patterns are polymerized to one or several one dimensions or two-dimensional array figure; It should be noted that has figure at the same level or senior compound virtual pattern to isolate between the obstacle array pattern, as consisting of the array pattern that obstacle is arranged between many fingers gate figure of MOSFET;
2.2.2 determining of obstacle array of figure figurate number: for the identical basic physical graph of the shape and size parameter that belongs to same process layer with same direct father's encirclement, according to the up and down between basic physical graph and/or between left and right apart from consistance, these basic physical graphs are polymerized to one or several one dimensions or two-dimensional array figure; It should be noted that has figure at the same level or advanced figure to isolate between array pattern; According to parameter identification, determine the size of array with a device parameters or a plurality of device parameters again;
2.2.3 determining of obstacle figure: determine figure between the array dot pattern with the coordinate figure of the minimum boundary rectangle of figure, list the figure between the array dot pattern in the obstacle figure, the obstacle figure can be fundamental figure, can be also the array that fundamental figure forms, can be directly linked to corresponding virtual grand plan shape;
2.2.4 determine the distance values between the obstacle array pattern: the spacing of distance values=obstacle figure between the size of figure spacing direction+2 * obstacle figure and array dot pattern;
2.3 array pattern left and right ordinal relation is analyzed
2.3.1 determine the alignment thereof between the figure of left and right in array pattern: the alignment of coboundary vertical line, the alignment of central horizontal line, the alignment of lower boundary vertical line and up and down are without alignment;
2.3.2 with the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern left margin coordinate figure as this array point, determine left and right ordinal relation between array pattern according to the magnitude relationship of X coordinate figure in the left margin coordinate figure, the little array point of X coordinate figure is on a left side, and the large array point of X coordinate figure is on the right side;
2.4 array pattern up and down ordinal relation analysis
2.4.1 determine the alignment thereof between the figure of up and down in array pattern: the alignment of left margin vertical line, the alignment of center vertical line, the alignment of right margin vertical line and left and right are without alignment;
2.4.2 with the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern lower boundary coordinate figure as this array point, determine ordinal relation up and down between array pattern according to the magnitude relationship of Y coordinate figure in the lower boundary coordinate figure, the little array point of Y coordinate figure under, the large array point of Y coordinate figure is upper;
2.5 the analysis of the line figure between array point
Take connected graph as the Analysis of Topological Structure of basis to line; Analyze the size of line figure in conjunction with design rule; Analyze line to the covering of figure, thereby determine the position reference figure of line figure; In conjunction with design rule, the relation between analysis line figure and other figures is to calculate spacing; Determine the coordinate formula of line figure;
2.6 option pattern analysis
The option figure is controlled by the option parameter of control device physical layout, according to option sign and option parameter, is the option figure of this option parameter with the logotype in option area;
Step 104: determine De Wei Ge dependence between each basic physical graph;
Set up the tree-like relation of father and son of stratification according to figure encirclement relation; Left and right ordinal relation and up and down ordinal relation according to basic physical graph are set up with the fraternal tree-like relation of layer; Set up De Wei Ge dependence between root and leaf from the bottom of tree derivation; Set up with De Wei Ge dependence between layer leaf figure from the figure of same of tree derivation, so that with a same layer leaf figure De Wei Ge as a reference, other move to the Xiang Dui Wei Ge place of regulation with layer leaf figure and inner body thereof;
Step 105: the genesis sequence of setting up each basic physical graph;
Set up the genesis sequence of basic physical graph according to the left and right relation of the hierarchical relationship of setting up, same level, upper and lower relation, reference relation etc., its principle is:
1) according to hierarchical relationship: the inner bottom figure generates and surrounds figure prior to direct father;
2) according to reference relation: its genesis sequence of the figure that is referenced is preferential;
3) according to the left and right relation of same level: order generates from left to right;
4) according to the upper and lower relation of same level: order generates from the bottom up;
Step 106: creation facilities program (CFP) flow process;
1, the foundation of flow process stratification relation is surrounded relationship analysis according to array pattern analysis and figure: according to the array pattern analysis, with the generation of array pattern and array dot pattern as a sub-process; Dimension and size according to array pattern in father's flow process are set up loop body, and calculating respectively generates the required ginseng of each array point and examines a Ge and input parameter etc. in loop body, calls this sub-process, and then the array pattern that generates is shifted according to reference point; Surround relation according to figure, build sub-process and generate besieged figure;
2, the foundation of flow process relation in same level
2.1 according to the genesis sequence of basic physical graph, the order of determine procedures flow process is carried out relation;
2.2 according to the option figure and control that parameter builds condition judgment and condition is carried out branch, namely judge nest relation;
2.3 build the loop blocks flow process with array pattern, carry out the loop nesting relation;
2.4 according to the dependence between fundamental figure, calculate the coordinate with reference to figure De Wei Ge, and generate fundamental figure according to Wei Ge coordinate;
Step 107: according to the program circuit generator program;
Utilize the order in existing CASE technical basis flow process to carry out relation, judge that nest relation, loop nesting relation, redirect nest relation etc. are automatically converted to detailed source program code; The language of program can be SKILL, Tcl/tk, Python, C/C++ etc.; The fundamental figure generating function of calling in source program is derived from the predefine of system;
Step 108: add figure translation program;
The lower left corner take the device housing is one of basic demand of parametrization device physics domain as reference origin (0,0), can realize by the figure translation, specifically comprise: all fundamental figures of traversal device physical layout, calculate (Xmin, Ymin) and (Xmax, Ymax); To the coordinate point value (X, Y) in the attribute of all fundamental figures change replace (Xnew=X-Xmin, Ynew=Y-Ymin) thus with reference to origin translation to original (Xmin, Ymin) point.
Above-described specific embodiment further describes purpose of the present invention, technical scheme and beneficial effect.Will be appreciated that, above said content is only the specific embodiment of the present invention, is not limited to the present invention.All within essence of the present invention and ultimate principle, any modification of making, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (10)
1. a method of setting up parameterized device physics territory unit generating program, is characterized in that, described method comprises:
Utilize the physical graph of graphic editor entering apparatus, go out corresponding relation and the option area of design rule parameter, device parameters and figure between figure and figure at described physical graph subscript;
Scan described physical graph, determine position relationship and position dependence between basic physical graph; The step of the position relationship between described definite basic physical graph specifically comprises: according to the size relation of each basic physical graph, determine the encirclement relation between each basic physical graph; Described basic physical graph is carried out accessible figure and the analysis of obstacle graphic array is arranged; Described basic physical graph is carried out left and right ordinal relation and up and down ordinal relation analysis; The described step that described basic physical graph is carried out accessible graphic array analysis specifically comprises: according to the up and down between basic physical graph and/or between left and right apart from consistance, basic physical graph is polymerized to one or several one dimensions or two-dimensional array figure; According to the extension direction of described one dimension or two-dimensional array figure, determine the figure figurate number of accessible graphic array; Set up the spacing of described one dimension or two-dimensional array figure and the relation between design rule parameter and device parameters;
According to the position relationship between described basic physical graph and position dependence, set up genesis sequence and the program circuit of each basic physical graph, generator program.
2. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, it is characterized in that, described method also comprises adds the figure coordinate relocatable program, specifically comprise: travel through all basic physical graphs of device physical layout, calculate the coordinate points of horizontal stroke, ordinate minimum; The reference origin of described device physics domain is moved to the coordinate points of described horizontal stroke, ordinate minimum.
3. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, it is characterized in that, described extension direction according to the one-dimensional array figure determines that the step of the figure figurate number of accessible graphic array is specially: the figure figurate number of described one-dimensional array figure extension direction=(the device ginseng number – 2 * array pattern of corresponding extension direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of extension direction).
4. the method for setting up parameterized device physics territory unit generating program as claimed in claim 3, it is characterized in that, the step of the relation between the described spacing of setting up described one-dimensional array figure and design rule parameter and device parameters is specially: the distance values between described one-dimensional array figure=(between the device ginseng number – 2 * array pattern of corresponding extension direction and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * correspondence direction of this direction figurate number)/(the figure figurate number-1 of correspondence direction).
5. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, it is characterized in that, described extension direction according to described two-dimensional array figure, the step of determining the figure figurate number of accessible graphic array is specially: described two-dimensional array figure is in the figure of directions X figurate number=(the device ginseng number – 2 * array pattern of corresponding directions X and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of directions X), described two-dimensional array figure is in the figure of Y-direction figurate number=(the device ginseng number – 2 * array pattern of corresponding Y-direction and the spacing between the outsourcing figure)/(array pattern is in the array pattern minimum spacing that physical dimension+design rule allows of Y-direction).
6. the method for setting up parameterized device physics territory unit generating program as claimed in claim 5, it is characterized in that, the step of the relation between the described spacing of setting up the two-dimensional array figure and design rule parameter and device parameters is specially: the distance values of directions X between described two-dimensional array figure=(between the device ginseng number – 2 * array pattern of corresponding directions X and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * directions X of directions X figurate number)/(the figure figurate number-1 of directions X), the spacing of Y-direction between described two-dimensional array figure=(between the device of corresponding Y-direction ginseng number – 2 * array pattern and outsourcing figure between apart from the – array pattern in the figure of the physical dimension * Y-direction of Y-direction figurate number)/(the figure figurate number-1 of Y-direction).
7. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, is characterized in that, the described step that described basic physical graph is carried out left and right ordinal relation analysis specifically comprises:
Determine the alignment thereof of described basic physical graph, described alignment thereof comprises that coboundary vertical line alignment, the alignment of central horizontal line, the alignment of lower boundary vertical line and up and down are without alignment;
With the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern left margin coordinate figure as this array point, determine left and right ordinal relation between array pattern according to the magnitude relationship of X coordinate figure in the left margin coordinate figure, the little array point of X coordinate figure is on a left side, and the large array point of X coordinate figure is on the right side.
8. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, is characterized in that, the described step that described basic physical graph is carried out up and down ordinal relation analysis specifically comprises:
Determine the alignment thereof of described basic physical graph, described alignment thereof comprises that the alignment of left margin vertical line, the alignment of center vertical line, the alignment of right margin vertical line and left and right are without alignment;
With the point coordinate value in minimum boundary rectangle its lower left corner of the array dot pattern lower boundary coordinate figure as this array point, determine ordinal relation up and down between array pattern according to the magnitude relationship of Y coordinate figure in the lower boundary coordinate figure, the little array point of Y coordinate figure under, the large array point of Y coordinate figure is upper.
9. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, is characterized in that, the step of the position dependence between described definite basic physical graph specifically comprises:
Set up the tree-like relation of father and son of stratification according to the encirclement relation of each basic physical graph;
Set up with the fraternal tree-like relation of layer according to left and right ordinal relation and the up and down ordinal relation of basic physical graph;
Set up position dependence between root and leaf from the bottom of tree derivation;
Set up with the position dependence between layer leaf figure from the figure of same of tree derivation.
10. the method for setting up parameterized device physics territory unit generating program as claimed in claim 1, is characterized in that, the step of described creation facilities program (CFP) flow process specifically comprises:
According to described graphic array analysis, with the generation of graphic array and array dot pattern as a sub-process;
Dimension and size according to graphic array in father's flow process are set up loop body, calculate in loop body and respectively generate the required reference position of each array point and input parameter;
The array pattern that generates is shifted according to reference point;
Surround relation according to described basic physical graph, build sub-process and generate besieged figure.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1521833A (en) * | 2002-11-18 | 2004-08-18 | 三洋电机株式会社 | Integrated circuit designing apparatus, designing method and designing program |
| CN101308375A (en) * | 2008-07-16 | 2008-11-19 | 四川普什宁江机床有限公司 | Numerical control longitudinal cutting machine tool machining program simulated realization method and its system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1521833A (en) * | 2002-11-18 | 2004-08-18 | 三洋电机株式会社 | Integrated circuit designing apparatus, designing method and designing program |
| CN101308375A (en) * | 2008-07-16 | 2008-11-19 | 四川普什宁江机床有限公司 | Numerical control longitudinal cutting machine tool machining program simulated realization method and its system |
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| JP特开2007-334549A 2007.12.27 |
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