CN102401924A - Patterned phase retardation membrane and manufacturing method thereof - Google Patents

Patterned phase retardation membrane and manufacturing method thereof Download PDF

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Publication number
CN102401924A
CN102401924A CN2011103903590A CN201110390359A CN102401924A CN 102401924 A CN102401924 A CN 102401924A CN 2011103903590 A CN2011103903590 A CN 2011103903590A CN 201110390359 A CN201110390359 A CN 201110390359A CN 102401924 A CN102401924 A CN 102401924A
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areas
liquid crystal
area
pattern
phase retardation
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CN102401924B (en
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郭真宽
康哲魁
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BenQ Materials Corp
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BenQ Materials Corp
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Abstract

The invention provides a patterned phase retardation membrane and a manufacturing method thereof; the patterned phase retardation membrane comprises a substrate, a patterned structure located on the substrate, and liquid crystal layers; the patterned structure comprises a plurality of first areas and second areas, which are of grid-like strip-type structures, and the second areas are depressed in the first areas and staggered with the first areas in parallel; the top ends of the first areas are provided with a plurality of bulge structures and the bottoms of the second areas are provided with aligned micro-structures; the liquid crystal layers are coated on the patterned structure, liquid crystal molecules located on these first regions are distributed irregularly because of the bulge structures and the liquid crystal molecules located on the second areas are aligned with the aligned micro-structures; liquid crystal layers located above the first areas and the second areas respectively provide a first phase retardation value and a second phase retardation value, and the difference between the first phase retardation value and the second phase retardation value is 180 DEG. According to the patterned phase retardation membrane, the situation of mutual interference between two eyes is avoided when a viewer appreciates stereo images, and the quality of the three-dimensional stereo image is improved.

Description

Patterning phase retardation film and manufacturing approach thereof
Technical field
The present invention is relevant for a kind of patterning phase retardation film and manufacturing approach thereof, is meant a kind of patterning phase retardation film and manufacturing approach thereof that can reduce phase mutual interference between the right and left eyes image (cross talk) when being used for dimensional image display especially.
Background technology
Recently, the holographic display device that promotes the quality of image has received gazing at of all trades and professions, and receives liking of most of consumer.Well known, the beholder can obtain three-dimensional image via polarising glass.
When the patterning phase retardation film is applied to LCD Panel; Phase retardation film comprises a plurality of vertically spaced left-handed polarizations district; And a plurality of, and then be dextrorotation polarisation district between per two adjacent left-handed polarization districts along the spaced dextrorotation polarisation of this vertical direction district.
When carrying out 3-D display; This LCD will be relevant with left-eye images the left-handed polarization district of light wave through this phase retardation film send out; And form left-handed light wave, because the left-handed polarization eyeglass that this left-handed light wave can only be through polarising glass but can not pass through this dextrorotation polarized lenses, so when the user wears polarising glass; Its left eye only can be seen this left-eye images; In like manner, its right eye also only can be seen this right-eye image, and the three-dimensional visual effect of the common combination results of this left-eye images and this right-eye image.
The patterning phase retardation film manufacture of convention comprises with engraving wheel (grooved roller) and carves concavo-convex rag on film material surface; Utilize the coating technique coating of liquid crystalline again in film material indenture; The concavo-convex difference of controlling diaphragm material can make the specific region of film material produce phase differential; The quarter wave plate of the identical alignment direction of arranging in pairs or groups can be left-handed polarization and dextrorotation polarisation with the linear polar biased phototransformation of specific direction just.
But when utilizing the engraving wheel to make the patterning phase retardation film, the liquid crystal of film material elevated regions remains in film material elevated regions because of the adhesion and the adhesion of liquid crystal often in coating.Residual liquid crystal is because of having phase differential; Behind the quarter wave plate superposition; Can due round polar biased light be become oval polar biased light; This oval polar biased light can't be by another rotatory polarization plate filtering on the glasses, and makes the audience that the phenomenon of phase mutual interference (cross talk) between right and left eyes take place when appreciating stereopsis, and influences the quality of 3 D stereoscopic image.
Summary of the invention
Therefore, one of the present invention purpose is to provide a kind of patterning phase retardation film, can improve the problems referred to above.
For reaching above-mentioned purpose, the present invention provides a kind of patterning phase retardation film, comprises base material, pattern structure and liquid crystal layer.Aforesaid pattern structure is positioned on the base material, and forms pattern structure by predetermined pattern impression curable resin.Pattern structure comprises a plurality of first areas and a plurality of second area; First area and second area are palisade zone shape structure; And this second area is recessed in the first area; And with the first area be parallel to each other staggered, wherein the top, first area have distance between a plurality of projective structures and each this projective structure between 0.1 micron (μ m) to 8 microns (μ m) and the second area bottom have alignment microstructure.Aforementioned liquid crystal layer is coated on the pattern structure, and the liquid crystal molecule on the first area is irregular distribution because of aforementioned projective structure, and liquid crystal molecule on the second area and aforementioned alignment microstructure orientation.The liquid crystal layer that is positioned at the top, first area provides first phase-delay value, and the liquid crystal layer that is positioned at the second area top provides second phase-delay value, and the difference of first phase-delay value and second phase-delay value is 180 °.
According to an embodiment of the present invention, above-mentioned base material be selected from the poly terephthalic acid vinyl acetate (poly ethylene terephthalate, PET); Polycarbonate (polycarbonate, PC), Triafol T (triacetyl cellulose; TAC); Polymethylmethacrylate (poly methyl methacrylate, PMMA) and cyclic olefin polymer (cyclo-olefin polymer, the group that COP) is constituted.
According to an embodiment of the present invention, the foregoing curable resin is selected from the group that acryl resin (acrylic resin), silicones (silicone) and polyamine formic ether (polyurethane) are formed.
According to an embodiment of the present invention, above-mentioned pattern structure is formed by engraving wheel impression curable resin.
According to an embodiment of the present invention, the height of above-mentioned projective structure is between 0.5 micron (μ m) to 6 microns (μ m).
According to an embodiment of the present invention, the width of above-mentioned projective structure is between 0.1 micron (μ m) to 20 microns (μ m).
According to an embodiment of the present invention, the coating thickness of the liquid crystal layer on the above-mentioned second area is between 1.96 microns (μ m) to 2.07 microns (μ m).
According to an embodiment of the present invention, the patterning phase retardation film more comprises quarter wave plate, and it is arranged on the above-mentioned liquid crystal layer.
Another object of the present invention is to provide a kind of manufacturing approach of patterning phase retardation film, and its method may further comprise the steps.Base material is provided.The coating curable resin is on base material.Impress curable resin to form pattern structure with predetermined pattern; Pattern structure comprises a plurality of first areas and a plurality of second area; First area and second area are palisade zone shape structure; And second area is recessed in the first area, and with the first area be parallel to each other staggered, wherein the top, first area have distance between a plurality of projective structures and each this projective structure between 0.1 micron (μ m) to 8 microns (μ m) and the second area bottom have alignment microstructure.The cured pattern structure.The coating fluid crystal layer is on pattern structure, and wherein the liquid crystal molecule on the first area becomes irregular alignment because of projective structure.Make liquid crystal molecule and alignment microstructure orientation on the second area.Solidify this liquid crystal layer.Wherein, the residual solution crystal layer that is positioned at the top, first area provides first phase-delay value, and the liquid crystal layer that is positioned at the second area top provides second phase-delay value, and the difference of first phase-delay value and second phase-delay value is 180 °.
According to one of the present invention embodiment, more comprise pasting quarter wave plate on liquid crystal layer.
Compared with prior art, patterning phase retardation film provided by the invention and manufacturing approach thereof can reduce the phenomenon of phase mutual interference between the right and left eyes that the audience takes place when appreciating stereopsis, improve the quality of 3 D stereoscopic image.
Description of drawings
Fig. 1 illustrates the diagrammatic cross-section of the patterning phase retardation film of one embodiment of the invention.
Fig. 2 illustrates the schematic perspective view of the pattern structure resin bed of one embodiment of the invention.
Fig. 3 A to 3E illustrates the patterning phase retardation film step of manufacturing figure of one embodiment of the invention.
Embodiment
More detailed and complete for the narration that makes this disclosure, hereinafter has been directed against embodiment of the present invention and specific embodiment has proposed illustrative description; But this is not unique form of implementing or using the specific embodiment of the invention.Following each embodiment that discloses can make up or replace under useful situation each other, also can add other embodiment in one embodiment, and need not further put down in writing or explain.
In the following description, with being described in detail many specific detail so that the reader can make much of following embodiment.Yet, can under the situation of not having these specific detail, put into practice embodiments of the invention.In other cases, be simplicity of illustration, the structure of knowing only schematically is illustrated among the figure with device.
Fig. 1 illustrates the diagrammatic cross-section of patterning phase retardation film 100 according to an embodiment of the present invention.Patterning phase retardation film 100 in this exposure; Can be applicable to utilize light valve (light valve) display device of birefringence; For example three-dimensional LCD is in order to improve the phenomenon that phase mutual interference (cross talk) between right and left eyes takes place display when showing stereopsis.As shown in Figure 1, patterning phase differential phase shift films 100 comprises base material 110; Pattern structure 120, it is positioned on this base material 110, impresses curable resin to form this pattern structure 120 by predetermined pattern; And liquid crystal layer 130.
Fig. 2 illustrates the schematic perspective view of pattern structure 200 according to an embodiment of the present invention.Pattern structure 200 comprises a plurality of first areas 210 and a plurality of second area 220; These first areas 210 are palisade zone shape structure with these second areas 220; And these second areas 220 are recessed in these first areas 210; And be parallel to each other staggered with these first areas 220; Wherein 210 tops, first area have 211 of a plurality of projective structures 211 and each this projective structures distance between 0.1 micron (μ m) to 8 microns (μ m), and these second area 220 bottoms have alignment microstructure 222.
Please be simultaneously with reference to Fig. 1 and Fig. 2; Liquid crystal layer 130 is coated on the pattern structure 200; Liquid crystal molecule on the first area 210 is irregular distribution because of projective structure 211; Make the phase differential between liquid crystal molecule cancel each other, form a kind of tropism's refractive index structures (isotropic reflective index) of Denging.Liquid crystal molecule on the second area 220 then with alignment microstructure 222 orientations of second area 220 bottoms.Wherein, the liquid crystal molecule on the first area 210 provides first phase-delay value, and the liquid crystal molecule on the second area 220 provides second phase-delay value, and the difference of first phase-delay value and second phase-delay value is 180 °.Wherein, Second phase-delay value that the difference in height of first area 210 and second area 220 only need satisfy first phase-delay value that the liquid crystal molecule that can realize on the first area 210 provides and the liquid crystal molecule on the second area 220 to be provided differs and is 180 ° and get final product, and its concrete numerical value waits definite according to the associated liquid crystal parameter.
Base material 110 is in order to supporting pattern structure 120 and the liquid crystal layer 130 on it, and lets patterning phase differential phase shift films 100 have suitable engineering properties.Base material 110 is made for the material that visible light is penetrated.The material that this kind penetrates visible light can be for example for the cellulose-based resin of triacetyl cellulose (TAC) etc., poly terephthalic acid vinyl acetate (poly ethylene terephthalate, PET), polycarbonate (polycarbonate; PC); Triafol T (triacetyl cellulose, TAC), polymethylmethacrylate (poly methyl methacrylate; PMMA) and cyclic olefin polymer (cyclo-olefin polymer, the transparent resin that COP) waits.In addition, also can be applicable among the present invention such as the thermoset resin of acrylic acid series, amine ester system, acrylic amine ester system, epoxy system, silicone-based etc. or ultraviolet light photopolymerization type resin etc.In one embodiment, based on considering polarized light property and permanance, base material 110 comprises the TAC material.
Pattern structure 120 is formed by the impression curable resin.Curable resin is selected from UV-cured resin (UV curable resin) or heat reactive resin (thermo-curable resin).According to an embodiment of the present invention; Selection for curable resin materials; Being preferably this curable resin materials visible light is had suitable penetrance, for example is acryl resin (acrylic resin), silicones (silicone) and polyamine formic ether (polyurethane).
In one of the present invention preferred embodiment, pattern structure 120 is formed with predetermined pattern impression curable resin by engraving wheel (grooved roller).Particularly, the surface of engraving wheel is formed with predetermined concaveconvex structure, and the concavo-convex profile that will carve by the roll extrusion step on the wheel is transferred on the curable resin layer, and forms pattern structure 120.The distance of each projective structure 1211 for example is between 0.1 micron (μ m) to 8 microns (μ m), the height W of each projective structure 1211 1For example be between 0.5 micron (μ m) to 6 microns (μ m), the width W of each projective structure 1211 2For example be between 0.1 micron (μ m) to 20 microns (μ m).
Projective structure 1211 is cancelled out each other the phase differential of distribution liquid crystal on it and tropism's refractive index (isotropic reflective index) structure such as is presented, thereby the degree of right and left eyes phase mutual interference (cross talk) when reducing the liquid crystal that residues on the first area 121 and causing 3-D display.
In one of the present invention embodiment, the shape of projective structure 1211 for example is but is not limited to shapes such as cylindrical, triangle cylindricality, cube, polygon cylindricality, pyramid, pyramid.
In one of the present invention embodiment, the formation method of the alignment microstructure 222 of second area 220 bottoms is selected from scratches orientation method (micro-scratch alignment treatment), brush mill formula orientation method (rubbing treatment), light orientation method (photo-alignment), silicon dioxide and is steaming method (SiO2 evaporation), ion beam orientation method (ion beam alignment).In a preferred embodiment of the present invention, stamp when stating curable resin layer and forming pattern structure by the engraving wheel load and to form.The surface of aforementioned engraving wheel is formed with specific concave-convex micro-structure, and the concavo-convex profile that will carve by imprint step on the wheel is transferred on the curable resin layer, and forms alignment microstructure 222 in second area 220 bottoms.The generation type of alignment microstructure is not in order to limit technical scope of the present invention.Adopt the formed alignment microstructure of any way all to belong to the affiliated scope of the present invention.
Among the present invention, these liquid crystal layer 130 employed liquid crystal materials are a kind of aggretion type liquid crystal material, for example RMS11-010 (Merck photoelectricity, Taiwan).In a preferred embodiment of the present invention, be positioned at the thickness D of the liquid crystal layer 130 on this second area 122 1Approximately between 1.96 microns (μ m)-2.07 microns (μ m).In an embodiment of patterning phase retardation film of the present invention, employed liquid crystal material is RMS11-010 (Merck photoelectricity, Taiwan), wherein is positioned at the thickness D of the liquid crystal layer 130 of these second area 122 tops 1Be about 2 microns (μ m).In another embodiment of patterning phase retardation film of the present invention, employed liquid crystal material is RHS09-080 (Merck photoelectricity, Taiwan), wherein is positioned at the thickness D of the liquid crystal layer 130 of these second area 122 tops 1Be about 4.8 microns (μ m).
According to another embodiment of the present invention, a kind of method of making the patterning phase retardation film is provided.Fig. 3 A to Fig. 3 D illustrates the patterning phase retardation film step of manufacturing figure of one embodiment of the invention.
In manufacturing step; Base material 310 is provided, this base material for example be and be not limited to the poly terephthalic acid diethylester (polyethylene terephthalate, PET), polycarbonate (polycarbonate; PC), Triafol T (triacetyl cellulose; TAC), polymethylmethacrylate (polymethyl methacrylate, PMMA) or cyclic olefin polymer (cyclo-olefin polymer, COP).
Shown in Fig. 3 A, curable resin 320 is coated on this base material 310.In one embodiment of the invention, this curable resin 320 can be UV-cured resin (UV curable resin) or heat reactive resin (thermo-curable resin).The method that forms curable resin 320 can for example be slot coated method (slit coating), drum-type rubbing method (roller coating) or die type rubbing method (Die coating) etc.According to the embodiment of the present invention; Selection for curable resin materials; Being preferably this curable resin materials visible light is had suitable penetrance, for example is acryl resin (acrylic resin), silicones (silicone) and polyamine formic ether (polyurethane).
Shown in Fig. 3 B, impress curable resin 320 to form pattern structure 330 with predetermined pattern.Pattern structure 330 comprises a plurality of first areas 331 and a plurality of second area 332, and first area 331 is palisade zone shape structure with second area 332, and second area 332 is recessed in the first area 331, and is parallel to each other staggered with first area 331.331 tops, first area have a plurality of projective structures 3311, and the distance that each projective structure is 3311 is between 0.1 micron (μ m) to 8 microns (μ m).Second area 332 bottoms have alignment microstructure.
In one embodiment of the present invention, the shape of projective structure 3311 for example is but is not limited to shapes such as cylindrical, triangle cylindricality, cube, polygon cylindricality, pyramid, pyramid.
Can possess the roller implementation of predetermined structure by imprinting apparatus or surface with predetermined pattern impression curable resin 320.In a preferred embodiment of manufacturing approach of the present invention, this impression is handled by engraving wheel 340 and is carried out, shown in Fig. 3 B.The surface of engraving wheel 340 is formed with specific concaveconvex structure, and the concavo-convex profile that will carve by the roll extrusion step on the wheel 340 is transferred on the curable resin layer 320, and forms pattern structure 330.Particularly, pattern structure 330 has the complementary convex-concave profile of concavo-convex profile with engraving wheel 340, and makes pattern structure 330 have the zone and the alignment microstructure of differing heights.In another embodiment of the present invention, the method that forms the alignment microstructure of second area bottom is selected from scratches orientation method (micro-scratch alignment treatment), brush mill formula orientation method (rubbing treatment), light orientation method (photo-alignment), silicon dioxide and is steaming method (SiO2 evaporation), ion beam orientation method (ion beam alignment).
Cured pattern structure 330.In an embodiment of manufacturing approach of the present invention, this curable resin 320 is a UV-cured resin, via solidifying behind the UV-irradiation.In another embodiment of manufacturing approach of the present invention, this curable resin 320 is a heat reactive resin, via solidifying after the heat treated.
Shown in Fig. 3 D, form pattern structure 330 tops of liquid crystal layer 350 in sclerosis.The mode that forms liquid crystal layer can for example be slot coated method (slit coating) or other appropriate method.In one embodiment of the invention, these liquid crystal layer 350 employed liquid crystal materials are RMS11-010 (Merck photoelectricity, Taiwan).In a preferred embodiment of the present invention, the thickness that is positioned at the liquid crystal layer 350 on this second area 332 is approximately between 1.96 microns (μ m)-2.07 microns (μ m).In an embodiment of patterning phase retardation film of the present invention, employed liquid crystal material is RMS11-010 (Merck photoelectricity, Taiwan), and the thickness that wherein is positioned at the liquid crystal layer 350 of these second area 332 tops is about 2 microns (μ m).In another embodiment of the present invention's patterning phase retardation film, employed liquid crystal material is RMS09-080 (Merck photoelectricity, Taiwan), and the thickness D1 that wherein is positioned at the liquid crystal layer 350 of these second area 332 tops is about 4.8 microns (μ m).Liquid crystal molecule on the first area 331 makes that because of projective structure 3311 is irregular distribution the phase differential between liquid crystal molecule is cancelled each other and tropism's refractive indexes such as formation (isotropic reflective index) structure.Liquid crystal molecule on the second area 332 then carries out orientation with the alignment microstructure of second area 332 bottoms.In one embodiment, the fluid that will contain liquid crystal molecule is coated on the pattern structure 330 of sclerosis, carries out hot processing procedure subsequently again, to form above-mentioned liquid crystal layer 350.
Then, solidify this liquid crystal layer 350 by UV-irradiation.Shown in Fig. 3 E, in one embodiment of the invention, once curing is completed, this patterning phase retardation film can more stick quarter wave plate 360.
Though the present invention discloses as above with embodiment; Right its is not in order to limiting the present invention, anyly has the knack of this art, do not breaking away from the spirit and scope of the present invention; When can doing various changes and retouching, so protection scope of the present invention is as the criterion when looking the claim person of defining.

Claims (10)

1. patterning phase retardation film is characterized in that comprising:
Base material;
Pattern structure; It is positioned on this base material, and this pattern structure by predetermined pattern impression curable resin to form, this pattern structure comprises a plurality of first areas and a plurality of second area; These a plurality of first areas are palisade zone shape structure with these a plurality of second areas; And these a plurality of second areas are recessed in these a plurality of first areas, and are parallel to each other staggeredly with these a plurality of first areas, and wherein this top, first area has a plurality of projective structures; And the distance between each this projective structure is between 0.1 micron to 8 microns, and this second area bottom has alignment microstructure; And
Liquid crystal layer, it is coated on this pattern structure, and wherein the liquid crystal molecule on these a plurality of first areas is irregular distribution because of these a plurality of projective structures, and the liquid crystal molecule on these a plurality of second areas and this alignment microstructure orientation;
Wherein, the liquid crystal layer that is positioned at this top, a plurality of first area provides first phase-delay value, and the liquid crystal layer that is positioned at this a plurality of second areas top provides second phase-delay value, and the difference of this first phase-delay value and this second phase-delay value is 180 °.
2. patterning phase retardation film as claimed in claim 1 is characterized in that this base material is selected from poly terephthalic acid vinyl acetate, polycarbonate, Triafol T, the group that polymethylmethacrylate and cyclic olefin polymer constituted.
3. patterning phase retardation film as claimed in claim 1 is characterized in that this curable resin is selected from the group that acryl resin, silicones and polyamine formic ether are formed.
4. patterning phase retardation film as claimed in claim 1 is characterized in that this pattern structure is formed by this curable resin of engraving wheel impression.
5. patterning phase retardation film as claimed in claim 1, the height that it is characterized in that these a plurality of projective structures is between 0.5 micron to 6 microns.
6. patterning phase retardation film as claimed in claim 1, the width that it is characterized in that these a plurality of projective structures is between 0.1 micron to 20 microns.
7. patterning phase retardation film as claimed in claim 1, the coating thickness that it is characterized in that this liquid crystal layer on this second area is between 1.96 microns to 2.07 microns.
8. patterning phase retardation film as claimed in claim 1 is characterized in that more comprising quarter wave plate, and it is arranged on this liquid crystal layer.
9. the manufacturing approach of a patterning phase retardation film is characterized in that comprising:
Base material is provided;
The coating curable resin is on this base material;
Impress this curable resin to form pattern structure with predetermined pattern; This pattern structure comprises a plurality of first areas and a plurality of second area; These a plurality of first areas are palisade zone shape structure with these a plurality of second areas; And these a plurality of second areas are recessed in these a plurality of first areas; And be parallel to each other staggeredly with these a plurality of first areas, wherein this top, first area has distance between a plurality of projective structures and each this projective structure between 0.1 micron to 8 microns, and this second area bottom has alignment microstructure;
Solidify this pattern structure;
The coating fluid crystal layer is on this pattern structure, and wherein the liquid crystal molecule on this first area becomes irregular alignment because of these a plurality of projective structures;
Make liquid crystal molecule and this alignment microstructure orientation on this second area;
Solidify this liquid crystal layer;
Wherein, the liquid crystal layer that is positioned at this top, a plurality of first area provides first phase-delay value, and the liquid crystal layer that is positioned at this a plurality of second areas top provides second phase-delay value, and the difference of this first phase-delay value and this second phase-delay value is 180 °.
10. manufacturing approach as claimed in claim 9 is characterized in that more comprising pasting quarter wave plate on this liquid crystal layer.
CN2011103903590A 2011-12-01 2011-12-01 Patterned phase retardation membrane and manufacturing method thereof Active CN102401924B (en)

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