CN102398221A - Chemical mechanical grinding slurry recycling system and method thereof - Google Patents
Chemical mechanical grinding slurry recycling system and method thereof Download PDFInfo
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- CN102398221A CN102398221A CN2010102848017A CN201010284801A CN102398221A CN 102398221 A CN102398221 A CN 102398221A CN 2010102848017 A CN2010102848017 A CN 2010102848017A CN 201010284801 A CN201010284801 A CN 201010284801A CN 102398221 A CN102398221 A CN 102398221A
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- 238000000227 grinding Methods 0.000 title claims abstract description 79
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- 238000004064 recycling Methods 0.000 title claims abstract description 31
- 238000011084 recovery Methods 0.000 claims description 44
- 239000012530 fluid Substances 0.000 claims description 27
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Abstract
The invention discloses a chemical mechanical grinding slurry recycling system and a method thereof. The chemical mechanical grinding slurry recycling system comprises a disposable slurry storage tank, a slurry storage tank and a recovered slurry feeder, wherein the disposable slurry storage tank is used for storing disposable slurry which is generated when new slurry is subjected to advanced grinding by a chemical mechanical grinding machine; the slurry storage tank is used for storing repeated slurry which is generated after recovered slurry is subjected to basic grinding by the chemical mechanical grinding machine; the recovered slurry feeder is used for receiving the disposable slurry and the repeated slurry and mixing the disposable slurry and the repeated slurry to generate the recovered slurry, so that the chemical mechanical grinding machine uses the recovered slurry, and thus, the aims of saving the using amount of the new slurry, reducing the cost and protecting the environment are fulfilled.
Description
Technical field
The invention relates to a kind of grinding system and method thereof, particularly relevant for cmp (CMP) slurries recycling system and method thereof.
Background technology
At the polishing of wafer or the planarization processing procedure in the processing procedure, (Chemical Mechanical Polishing CMP) is effective polishing or planarization processing procedure to cmp.The advantage of CMP is for utilizing liquid slurry (slurry), and has the dual effectiveness that chemical etching and mechanical force are ground concurrently.Liquid in slurries is selected for use can the polished material of microetch such as the function of silicon, silica, and during through wafer surperficial, the particulate of suspension mechanically eliminates the top layer in slurry stream, and the etching solution in the slurries is then with this surface etching one deck that eliminates.So circulation eliminates, and etching makes crystal column surface form a smooth minute surface.
The CMP processing procedure at first is the corase grind wafer, utilizes the continuous circulation of brand-new slurries to grind wafer, when grinding wafer to preset thickness, and the waste liquid after discharge grinding and not re-using.Then, substitute brand-new slurries correct grinding wafer, at this moment, brand-new slurries only can grind once, and to keep the best in quality of grinding wafer, then, discharge is ground slurries once and do not re-used.In the aforesaid manufacturing process, slurries promptly do not re-use after only supplying to grind once, and resource, material are not only wasted in this measure, and need unnecessary manpower handle later slurries of a large amount of uses (be commonly referred to as: waste liquid), with the impact that causes environmental protection.
Because each item problem that known technology exists; In order to take into account solution; The inventor proposes a kind of device and method of chemical and mechanical grinding fluid recycling based on exploitation and the many practical experience of going in for the study for many years, with implementation and the foundation as the above-mentioned shortcoming of improvement.
Summary of the invention
According to a purpose of the present invention; A kind of chemical and mechanical grinding fluid recycling system and method thereof are proposed; The two is mixed into the recovery slurries mutually through the muptiple-use slurries that grind disposable slurries and repeat to grind, carries out basis grinding, enters rank with new slurries again to be ground to required quality precision and supply the chemical mechanical grinder utilization to reclaim slurries; And new slurries after entering rank and grinding promptly as disposable slurries, only grind once the discarded immediately problem that is caused of not using to solve new slurries.
For reaching above-mentioned purpose, the present invention provides a kind of chemical and mechanical grinding fluid recycling system, and it comprises a disposable slurries accumulator tank, a slurries accumulator tank and reclaims the slurries feeder.Wherein, disposable slurries accumulator tank supplying chemical mechanical grinder advances the disposable slurries that the rank grinding is produced with new slurries to subject matter (as: wafer).The slurries accumulator tank stores by chemical mechanical grinder and to reclaim slurries subject matter is carried out the muptiple-use slurries that grinding back, basis is produced, and the quality of these muptiple-use slurries does not reach discarded discharge standard.Reclaim the disposable slurries that the acceptance of slurries feeder is discharged by disposable slurries accumulator tank; And accept by the muptiple-use slurries that discharged in the slurries accumulator tank; And be mixed into the recovery slurries, and reclaim slurries and provide chemical mechanical grinder to carry out basis grinding with disposable slurries and muptiple-use slurries.
For reaching above-mentioned purpose, another kind of chemical and mechanical grinding fluid recycling method of the present invention comprises the following step; Reclaiming the slurries feeder provides the recovery slurries to chemical mechanical grinder; Make chemical mechanical grinder carry out basis to subject matter and grind, and the quality of the muptiple-use slurries that produced after grinding with first measure and control device monitoring basis, when muptiple-use slurries quality drops to when discarding discharge standard to reclaim slurries; These muptiple-use slurries promptly belong to the waste liquid that can't utilize once more; And be discharged into liquid waste treating apparatus, otherwise, be discharged into the slurries accumulator tank.When chemical mechanical grinder is accomplished the basis grinding; Utilize new slurries feeder to provide new slurries again to chemical mechanical grinder; Make chemical mechanical grinder enter rank and be ground to required quality precision, and the disposable slurries system of advancing that rank grind that the back produced is discharged into disposable slurries accumulator tank subject matter.
Wherein, More comprise the step of using the monitoring of second measure and control device to reclaim the quality of the recovery slurries that store in the slurries feeder; When the quality that reclaims slurries drops to the adjustment preset value; The disposable slurries of disposable slurries accumulator tank are supplemented to reclaim the slurries feeder, the quality that slurries are reclaimed in adjustment returns to the higher limit of the use standard that reclaims slurries or greater than higher limit.
Wherein, when the muptiple-use slurries of slurries accumulator tank, desire to be supplemented to when reclaiming the slurries feeder; Muptiple-use slurries carry out quality adjustment (as: contaminant filter) through the slurries processor earlier; Promote the quality of muptiple-use slurries, be discharged into again and reclaim the slurries feeder, at this moment; Cause its quality to descend though reclaim slurries because of adding muptiple-use slurries, its quality decline degree is unlikely to reach discarded discharge standard.
Wherein, When the disposable slurries of disposable slurries accumulator tank desire to be supplemented to recovery slurries feeder; Disposable slurries carry out quality adjustment (as: contaminant filter) through the slurries processor earlier; Promote the quality of disposable slurries, be discharged into again and reclaim in the slurries feeder, and then promote the quality that reclaims the recovery slurries in the slurries feeder.
Hold the above, chemical and mechanical grinding fluid recycling system of the present invention and method thereof have following one or more advantage:
(1) this chemical and mechanical grinding fluid recycling system and method thereof, disposable slurries that use is reclaimed and muptiple-use slurries are mixed into the recovery slurries and carry out the basis grinding, so have the effect of the use amount of saving new slurries, reach the purpose of minimizing cost.
(2) this chemical and mechanical grinding fluid recycling system and method thereof; Reclaim and add disposable slurries in the slurries feeder; In order to the quality of adjustment recovery slurries,, also has the effect of the use amount of saving new slurries with improving the number of times that slurries use; Reach the purpose that reduces cost, and save the effect of material.
(3) this chemical and mechanical grinding fluid recycling system and method thereof reduce the use amount of new slurries, promptly reduce the waste liquid discharge rate, therefore, reduce the purpose that the discharging waste liquid promptly reaches environmental protection.
Description of drawings
For making your auditor further understanding and understanding arranged, existing with preferred embodiment and cooperate detailed explanation following to technical characterictic of the present invention and the effect that reached:
Fig. 1 is the device block schematic diagram of chemical and mechanical grinding fluid recycling of the present invention.
Fig. 2 is the configuration diagram of the first embodiment of the present invention.
Fig. 3 is the configuration diagram of the second embodiment of the present invention.
Fig. 4 carries out rate of etch of grinding on the basis and the sketch map that concerns that grinds number of times for the present invention to reclaim slurries.
Fig. 5 is the configuration diagram of the third embodiment of the present invention.
Fig. 6 is the method flow diagram of chemical and mechanical grinding fluid recycling of the present invention.Among the figure:
400: the device of chemical and mechanical grinding fluid recycling;
401: chemical mechanical grinder;
402: new slurries feeder;
403: liquid waste treating apparatus;
404: reclaim the slurries feeder;
405: the slurries processor;
406: disposable slurries accumulator tank;
408: the slurries accumulator tank;
412: the first measure and control devices;
414: the second measure and control devices; And
S1-S22: step.
The specific embodiment
To explain according to chemical and mechanical grinding fluid recycling system of the present invention and method thereof that below be convenient to understand for making, the similar elements among the following embodiment is explained with identical symbology with reference to correlative type.
See also Fig. 1, it is a chemical and mechanical grinding fluid recycling of the present invention system block schematic diagram.Among the figure, chemical and mechanical grinding fluid recycling system 400 comprises a chemical mechanical grinder 401, one new slurries feeder 402, and reclaims slurries feeder 404, disposable slurries accumulator tank 406 and a slurries accumulator tank 408.Wherein, Chemical mechanical grinder 401 connects new slurries feeder 402 and reclaims slurries feeder 404; And accept with the recovery slurries that recovery slurries feeder 404 is provided subject matter (as: wafer) to be carried out the basis and grind, the new slurries that provided with new slurries feeder 402 again enter rank to subject matter and are ground to required quality precision.At least disposable slurries accumulator tank 406 provides storage chemical mechanical grinder 401 with new slurries subject matter to be entered rank and grinds the disposable slurries that produced, and is connected with recovery slurries feeder 404.Slurries accumulator tank 408 provides storage chemical mechanical grinder 401 to reclaim slurries subject matter to be carried out the muptiple-use slurries that grinding back, basis is produced, and is connected with recovery slurries feeder 404.Reclaiming slurries feeder 404 provides storage to reclaim slurries.
And; When this system has just begun to launch, reclaim not store in the slurries feeder 404 and reclaim slurries, at this moment; Can the disposable slurries of disposable slurries accumulator tank 406 be provided to earlier and reclaim in the slurries feeder 404 as reclaiming slurries till storage is full; But not as limit, also can provide the disposable slurries of disposable slurries accumulator tank 406 to be provided to earlier to reclaim to arrive scheduled volumes in the slurries feeder 404, as: it is half the or 1/3rd or 1/4th to reclaim slurries feeder 404 ... etc.; Can supply chemical mechanical grinder 401 to use the recovery slurries to carry out the basis grinding of one or many at least in the hope of reclaiming slurries feeder 404; Produce muptiple-use slurries and be stored in the slurries accumulator tank 408, afterwards, can be again produce the recovery slurries with the mode of adding and mix disposable slurries and muptiple-use slurries.
See also shown in Figure 2; Configuration diagram for the first embodiment of the present invention; Among the figure; More comprise a liquid waste treating apparatus 403 and one first measure and control device 412, wherein first measure and control device 412 is connected between chemical mechanical grinder 401 and liquid waste treating apparatus 403, disposable slurries accumulator tank 406 and the slurries accumulator tank 408, is detected the quality of the muptiple-use slurries that produced after chemical mechanical grinder 401 grinds in the basis by first measure and control device 412; When muptiple-use slurries quality drops to the set discarded discharge standard of first measure and control device 412; These muptiple-use slurries promptly belong to the waste liquid that can't utilize once more, and are discharged into liquid waste treating apparatus 403, otherwise; Muptiple-use slurries are discharged into slurries accumulator tank 408, and first measure and control device 412 is discharged into disposable slurries accumulator tank 406 with chemical mechanical grinder 401 in the disposable slurries that produced that advance after grind on rank.In the first embodiment of the present invention; First measure and control device 412 detects the foundation of the quality of muptiple-use slurries; Detect acid-base value (pH value), the concentration of muptiple-use slurries ... etc.; To determine whether muptiple-use slurries reach the degree that can't utilize once more, are discharged into liquid waste treating apparatus 403 and be taken as waste liquid, maybe can be discharged into slurries accumulator tank 408.Wherein the liquid waste processing in the liquid waste treating apparatus 403 comprises neutralization, Shen Dian, waste discharge, dehydration, drying, burning at least ... wait processing.
See also shown in Figure 3ly, be the configuration diagram of the second embodiment of the present invention, among the figure; The difference of the second embodiment of the invention and first embodiment is; Comprise that more one second measure and control device, 414, the second measure and control devices 414 connect recovery slurries feeder 404, and reclaim the quality of slurries by 414 observing and controlling of second measure and control device; Whether reach the set adjustment preset value of first measure and control device 414; When the quality that reclaims slurries drops to the adjustment preset value, the disposable slurries of disposable slurries accumulator tank 406 are supplemented to reclaim slurries feeder 406, adjust the quality that reclaims slurries and return in the use critical field that reclaims slurries.Same, in the second embodiment of the present invention, second measure and control device 414 detects the foundation of the quality that reclaims slurries, detects the acid-base value (pH value), the concentration that reclaim slurries ... etc., reclaim slurries with decision and whether drop to the degree below the adjustment preset value.
See also Fig. 4, it carries out rate of etch of grinding on the basis and the sketch map that concerns that grinds number of times for the present invention to reclaim slurries.Among the figure; With the rate of etch is example; If reclaiming the rate of etch of slurries is 1, to the k time, the rate of etch that grind on the basis was reduced to 0.9 o'clock after utilizing the wafer that reclaims slurries grinding predetermined number; Replenish disposable slurries to reclaiming slurries feeder 404 from disposable slurries accumulator tank, rate of etch is returned to approach 1.After replenishing n+1 time, slurries use and are less than (for example k=4 time, rate of etch promptly reduces to 0.9) k time.At this moment, promptly should not replenish disposable slurries again to reclaiming slurries feeder 404.
When no longer replenishing disposable slurries to recovery slurries feeder 404; Carry out the muptiple-use slurries after grind on the basis by chemical mechanical grinder 401 to reclaim slurries subsequently; Its quality will inevitably drop to the discarded discharge standard of first measure and control device 412, is waste liquid and is discharged into liquid waste treating apparatus 403 and be taken as.So, follow above-mentioned process repeatedly, till the recovery slurries in reclaiming slurries feeder 404 are used up.Afterwards, store the mode that reclaims slurries in the slurries feeder 404 to reclaim again, with disposable slurries, muptiple-use slurries or the mode of mixing disposable slurries and muptiple-use slurries, storage recovery slurries in reclaiming slurries feeder 404.
See also shown in Figure 5; Configuration diagram for the third embodiment of the present invention; Among the figure; The difference of the third embodiment of the invention and second embodiment is, more comprises a slurries processor 405, and slurries processor 405 is connected and reclaims between slurries feeder 404 and disposable slurries accumulator tank 406 recovery slurries feeders 404 and recovery slurries feeder 404 and the slurries accumulator tank 408; Slurries processor 405 is that the muptiple-use slurries of desiring to be supplemented to recovery slurries feeder, disposable slurries are carried out quality adjustment (as: contaminant filter) through the slurries processor earlier; Promote the quality of muptiple-use slurries, disposable slurries, be discharged into again and reclaim in the slurries feeder, and then promote quality and the access times that reclaim the recovery slurries in the slurries feeder.
According to the above, system of the present invention circulates constantly according to this, can when grind on the basis, use and reclaim the slurries grinding; Yu Jinjie uses new slurries when grinding; And the consumption that can save a large amount of new slurries, but process quality still can remain unchanged, and reaches environmental protection and cost-effective purpose.
See also that Fig. 6 is continuous to consult Fig. 5, it is the method flow diagram of chemical and mechanical grinding fluid recycling of the present invention.Among the figure, start from step S1, wafer is inserted chemical mechanical grinder (as shown in Figure 1).In step S2; Judge whether to use new slurries, if the processing procedure requirement, in the time of must be with new slurries; Then get into step S3; Utilize new slurries that subject matter is entered rank and grind, enter disposable at least slurries accumulator tank (below be referred to as disposable slurries accumulator tank) and will grind once slurries (preferred mode is the slurries that ground once, below is referred to as to grind slurries once) at least.Judge to grind whether accomplish, if not, return step S3 in step S4, continue to grind with new slurries, if, then get into step S15, take out wafer.Judge whether to grind another wafer in step S16.If get back to step S1; If not, step S17 promptly stops to grind.
In step S2, if the processing procedure failed call is with new slurries (also being pass), then grind with reclaiming slurries, get into step S5 this moment, whether the quality that slurries are reclaimed in measure and control device observing and controlling is qualified.If, then get into step S7 and judge whether to accomplish grinding when step S6 judges.If not, get into step S8, utilize and reclaim slurries grinding wafer,, then get into step S15 and take out wafer if accomplished grinding.
When reclaiming the slurries grinding,, judge that whether institute's discharge slurry concentration is greater than preset concentration in step S9.If, slurries are entered slurries accumulator tank 408 continue to provide and grind required recovery slurries in step S10.In step S11, the running of slurries processor,, and slurries are replied like filtration, adjustment pH value or adjustment concentration etc.Get into step S12 then, the slurries after replying are delivered to reclaimed slurries feeder 404.Get back to step S5 then, continue to grind processing procedure.
Above-mentioned steps S6, if not, slurries had ground of a specified duration, and defective, then got into step S13, whether judged normally that by rate of etch slurries still can grind.If normal, then grinding slurries once are provided, and get back to step S8 in step S14, continue to grind.If rate of etch is not undesired, the slurries that adding is ground once also can not recover, and then get into step S18, are ground to residue recovery slurries to use until exhausted.Afterwards, in step S19, slurries are entered in the liquid waste treating apparatus.In step S20, judge whether reclaim slurries uses up then.If use up, then get into step S21, use new slurries instead and grind, and deposit the slurries after grinding once to disposable slurries accumulator tank.In step S22, judge whether reclaim the slurries feeder has stored up full.If promptly get back to step S5 and continue to grind.Do not use up if reclaim slurries, then get back to step S18, continue to grind it to using until exhausted to reclaim slurries in step S20.In step S22, if reclaim the slurries feeder less than, then get back to step S21, continue to grind and deposit the slurries after grinding once to disposable slurries accumulator tank with new slurries.
Above-mentioned steps S7 accomplishes if grind, then gets into step S15, takes out wafer then in step S16, judges whether to continue to grind another wafer.If get back to step S1.If not, then in step S17, stop to grind.
Above-mentioned steps S9 is if concentration of slurry not greater than preset concentration, then enters slurries in the liquid waste treating apparatus in step S19.
Like the method and the device of above-mentioned chemical and mechanical grinding fluid recycling, can save new slurries use amount in a large number, and reduce and handle artificial, the material of waste pulp.Not only save material, manpower and help the protection of environment.
The above is merely illustrative, but not is restricted person.Anyly do not break away from spirit of the present invention and category, and, all should be contained in the claim its equivalent modifications of carrying out or change.
Claims (10)
1. the device of a chemical and mechanical grinding fluid recycling is characterized in that: comprise one and reclaim the slurries feeder, its supply also stores a chemical mechanical grinder and grinds required recovery slurries in the basis;
One new slurries feeder, it supplies said chemical mechanical grinder in the required new slurries of precise finiss;
One disposable slurries accumulator tank, it links said chemical mechanical grinder and said recovery slurries feeder, uses new slurries that subject matter is carried out the disposable slurries that precise finiss produced in order to ccontaining said chemical mechanical grinder;
One slurries accumulator tank, it links said chemical mechanical grinder and recovery slurries feeder, uses in order to ccontaining said chemical mechanical grinder and reclaims slurries carry out the basis grinding to subject matter muptiple-use slurries;
Wherein, reclaim slurries and forms, and when not having the muptiple-use slurries of storage in the said slurries accumulator tank, this disposable slurries accumulator tank provides disposable slurries to give said recovery slurries feeder by disposable slurries and muptiple-use slurries.
2. the device of chemical and mechanical grinding fluid recycling as claimed in claim 1; It is characterized in that: more comprise one first measure and control device; One end of this first measure and control device links said chemical mechanical grinder; The other end links a liquid waste treating apparatus, disposable slurries accumulator tank and slurries accumulator tank, in order to detect muptiple-use slurries quality; Wherein, when the muptiple-use slurries quality of said first measure and control device detecting drops to discharge standard, promptly be disposed to this liquid waste treating apparatus.
3. the device of chemical and mechanical grinding fluid recycling as claimed in claim 1; It is characterized in that: more comprise one second measure and control device; This second measure and control device connects said recovery slurries feeder, the recovery slurries quality that provides in order to the said recovery slurries of observing and controlling feeder; Wherein, drop to the preset matter of said second measure and control device when following when reclaiming the slurries quality, said disposable slurries accumulator tank provides disposable slurries to give said recovery slurries feeder and reclaims the adjustment of slurries quality.
4. the device of chemical and mechanical grinding fluid recycling as claimed in claim 3; It is characterized in that: more comprise a slurries processor; The one of which end links said recovery slurries feeder; The other end links said slurries accumulator tank and disposable slurries accumulator tank, will get into the disposable slurries of said recovery slurries feeder and the quality of muptiple-use slurries in order to adjust in advance.
5. the method for a chemical and mechanical grinding fluid recycling is characterized in that: comprise the following step:
One new slurries feeder provides new slurries and a chemical mechanical grinder that subject matter is carried out the basis and grinds and precise finiss, and the disposable slurries after grinding are disposed to a disposable slurries accumulator tank;
Utilizing disposable slurries slurries to carry out the basis grinds; Muptiple-use slurries after grinding are disposed to a slurries accumulator tank, carry out precise finiss by new slurries again, the disposable slurries after grinding are disposed to said disposable slurries accumulator tank; Adjust the slurries quality of muptiple-use slurries and disposable slurries through a slurries processor after; Deposit one in and reclaim the slurries feeder, be in harmonious proportion, subject matter is carried out the basis grinding again in order to supply with said chemical mechanical grinder to reclaiming slurries;
Reclaim the slurries quality with one second controller observing and controlling; When reaching set point number or reclaim the slurries quality, grinding drops to preset value when following; Said disposable slurries accumulator tank replenishes disposable slurries to said recovery slurries device is provided; Make the higher limit of quality answer use standard or, continue the grinding use of supply basis greater than higher limit;
Detect the muptiple-use slurries quality of side with one first controller, when muptiple-use slurries quality drops to discarded discharge standard, promptly be disposed to a waste liquid accumulator tank, use until exhausted, come back to and use disposable slurries to carry out basis grinding up to muptiple-use slurries.
6. the method for chemical and mechanical grinding fluid recycling as claimed in claim 5; It is characterized in that: said slurries quality is as the criterion with rate of etch; And the rate of etch that said second controller is detected the recovery slurries of said recovery slurries supply is reduced to preset value when following; Said disposable slurries accumulator tank replenishes disposable slurries to said recovery slurries feeder; And the rate of etch that said first controller is detected muptiple-use slurries is reduced to below the preset value, but actual when grinding number of times and not reaching the preset value of normal grinding number of times, muptiple-use slurries promptly are disposed to this liquid waste treating apparatus; Use until exhausted up to muptiple-use slurries, come back to and use disposable slurries to carry out the basis grinding.
7. the method for chemical and mechanical grinding fluid recycling as claimed in claim 5; It is characterized in that: wherein the quality of slurries is as the criterion with the pH value; The pH value of the recovery slurries of said recovery slurries supply is reduced to preset value when following, and said disposable slurries accumulator tank replenishes disposable slurries to said recovery slurries supply.
8. the method for chemical and mechanical grinding fluid recycling as claimed in claim 7; It is characterized in that: the pH value of the muptiple-use slurries of said first controller detecting is reduced to below the preset value but actual grinding number of times when not reaching the preset value of normal grinding number of times; Muptiple-use slurries promptly are disposed to said liquid waste treating apparatus; Use until exhausted up to muptiple-use slurries, come back to and use disposable slurries to carry out the basis grinding.
9. the method for chemical and mechanical grinding fluid recycling as claimed in claim 5; It is characterized in that: wherein the quality of slurries is as the criterion with concentration; The concentration of the recovery slurries of this recovery slurries supply is reduced to preset value when following, and said disposable slurries accumulator tank replenishes disposable slurries to said recovery slurries supply.
10. the method for chemical and mechanical grinding fluid recycling as claimed in claim 9; It is characterized in that: the concentration of the muptiple-use slurries of said first controller detecting is reduced to below the preset value but is actual when grinding number of times and not reaching the preset value of normal grinding number of times; Muptiple-use slurries promptly are disposed to said liquid waste treating apparatus; Use until exhausted up to muptiple-use slurries, come back to and use disposable slurries to carry out the basis grinding.
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| CN2010102848017A CN102398221A (en) | 2010-09-15 | 2010-09-15 | Chemical mechanical grinding slurry recycling system and method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105121095A (en) * | 2013-04-04 | 2015-12-02 | 株式会社可乐丽 | Slurry regeneration apparatus, slurry regeneration method, and regenerated slurry |
| CN108098564A (en) * | 2017-12-20 | 2018-06-01 | 常州市知豆信息科技有限公司 | A kind of semiconductor crystal wafer chemical-mechanical polisher |
| CN110153871A (en) * | 2019-05-17 | 2019-08-23 | 西安奕斯伟硅片技术有限公司 | Grinding method, the evaluation method of polishing fluid, corresponding intrument and silicon wafer |
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| CN105121095A (en) * | 2013-04-04 | 2015-12-02 | 株式会社可乐丽 | Slurry regeneration apparatus, slurry regeneration method, and regenerated slurry |
| CN108098564A (en) * | 2017-12-20 | 2018-06-01 | 常州市知豆信息科技有限公司 | A kind of semiconductor crystal wafer chemical-mechanical polisher |
| CN110153871A (en) * | 2019-05-17 | 2019-08-23 | 西安奕斯伟硅片技术有限公司 | Grinding method, the evaluation method of polishing fluid, corresponding intrument and silicon wafer |
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