CN102337580A - Ion liquid polishing solution for electrochemically polishing magnesium alloy and preparation method thereof - Google Patents
Ion liquid polishing solution for electrochemically polishing magnesium alloy and preparation method thereof Download PDFInfo
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- CN102337580A CN102337580A CN2011102798703A CN201110279870A CN102337580A CN 102337580 A CN102337580 A CN 102337580A CN 2011102798703 A CN2011102798703 A CN 2011102798703A CN 201110279870 A CN201110279870 A CN 201110279870A CN 102337580 A CN102337580 A CN 102337580A
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Abstract
The invention discloses an ion liquid polishing solution for electrochemically polishing magnesium alloy, which is prepared from the following raw materials in percentage by mass: 88-96% of depth eutectic ion liquid and 4-12% of additives. The polishing solution can be used for well polishing and leveling the magnesium alloy to achieve an effect of high brightness; besides, the magnesium alloy is environmental-friendly, naturally degradable and pollution-free.
Description
Technical field
The present invention relates to the electrochemical etching field, specifically is a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy and preparation method thereof.
Background technology
Magnesiumalloy has good thermal conductivity, excellent diamagnetic ability and is easy to advantage such as recovery, is one of light-weight high-strength material of tool development and application potentiality, at numerous areas such as aviation, electronics, automobiles very application prospects is arranged.Yet the chemical property of magnesiumalloy is very active, is prone to especially be corroded with water generation chemical reaction.This is the key issue that hinders its widespread use.
When the processing and manufacturing magnesium alloy workpiece,, need carry out polishing and leveling to its surface usually for satisfying requirement to workpiece surface luminance brightness or precision.At present, the Mg alloy surface polishing technology mainly contains mechanical polishing, chemical rightenning and electrochemical etching etc.Wherein, mechanical polishing exists that efficient is low, work under bad environment, can only process defectives such as structured surface; Chemical rightenning is owing to adopt water as solvent, and magnesiumalloy and water electrode are prone to reaction, thereby high material consumption; Operating cost is high; The polishing precision is not high, is difficult to satisfy high-precision surface treatment requirement, and; Workpiece after the polishing is prone to produce local corrosion or before plating, in the etch process spot corrosion takes place when storing, and makes subsequent technique hard to carry on; But electrochemical etching has efficiently, easy handling processed complex workpiece, can realize advantages such as high brightness and high-precision processing request; But; Existing various electrochemical etching technology is the technology based on aqueous phase solution; The a large amount of gases that produce during electropolishing cause spot corrosion at magnesium alloy matrix surface easily, and the polishing fluid life-span is short, and operating cost is high.
Summary of the invention
The technical problem that the present invention will solve provides a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy and preparation method thereof; Solve existing electropolishing and cause spot corrosion at magnesium alloy matrix surface easily; And the polishing fluid life-span is short, the problem that operating cost is high.
Technical scheme of the present invention is:
A kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy, it is formulated by mass percentage by following raw material: degree of depth congruent melting type ionic liquid 88-96%, additive 4-12%.
Described degree of depth congruent melting type ionic liquid is made up of by the weight percent of 40-44%:48-52% basic substance and other components; Wherein, described basic substance is selected choline chloride 60 for use; Said other components are one or more mixing in urea, terepthaloyl moietie, glycerine, ethanamide, thiocarbamide, trichoroacetic acid(TCA), toluylic acid, propanedioic acid, oxalic acid, p-methyl benzenesulfonic acid, m-methyl phenol, p-methyl phenol, ortho-methyl phenol, the fructose.
Described additive comprises has leveling agent, inhibiter and brightening agent, and three's mass percent is 2-6%:1.8-5%:0.2-1%.
The mass percent concentration of described other components is 5-95%.
Described leveling agent is selected trolamine, urea, thiocarbamide, 1, the mixing of one or more in the 4-butynediol for use; Described inhibiter is selected one or more the mixing in ethanol, N.F,USP MANNITOL, terepthaloyl moietie, glycerine, tartrate, oxysuccinic acid, acetate, oxalic acid, the Hydrocerol A for use; Described brightening agent is selected one or more the mixing in glucose, asccharin, starch, sucrose, the benzotriazole for use.
The mass percent concentration of described leveling agent is 0.1-10%; The mass percent concentration of described inhibiter is 0.01-10%; The mass percent concentration of described brightening agent is 0.01-5%.
A kind of preparation method who is used for the ionic liquid polishing fluid of electrochemical etching magnesiumalloy; May further comprise the steps: place container 75-85 ℃ of following heated and stirred the ion liquid basic substance of degree of depth congruent melting type and other components; Form colourless transparent solution; And then add various additives, guarantee 75-85 ℃ of following heated and stirred until stirring into colourless transparent solution, the finished product polishing fluid.
Described type of heating adopts the mode of oil bath heating, and described alr mode adopts magnetic agitation.
Ionic liquid polishing fluid of the present invention can also comprise the pH regulator agent, and components such as viscosity modifier and/or skimmer reach the object of the invention.
Advantage of the present invention is following:
(1), this polishing fluid is non-aqueous solution, can under water-less environment, realize the polishing and leveling of magnesiumalloy, obtains the minute surface of high light, satisfies the high-precision processing requirement;
(2), in polishing process, use degree of depth congruent melting type ionic liquid as solvent, do not have the existence of water, therefore can be in Mg alloy surface generation spot corrosion;
(3), cheap, nontoxic, the Heat stability is good of this polishing fluid, do not burn, recyclablely recycle, biodegradable, non-environmental-pollution problem.
Ionic liquid is applied to the electrochemical etching of magnesiumalloy as a kind of non-aqueous solvent, and the problems that can avoid the reaction of magnesiumalloy and water to be brought fully can obtain high bright surface, satisfy the requirement of high polishing precision and subsequent technique.Different with traditional imidazoles with the pyridines ionic liquid; The degree of depth congruent melting type ionic liquid that with the choline chloride 60 is basic substance is a kind of non-aqueous solvent of novel type; This type of degree of depth congruent melting type ionic liquid is except that the characteristics that possess conventional ion liquid; Also have cheap, simple, nontoxic, the Heat stability is good of preparation, not flammable, biodegradable, advantage such as specific conductivity is high, potential window is wide, thereby be more suitable in industrial applications.
Embodiment
Embodiment 1
A kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy is formulated by mass percentage by following raw material: choline chloride 60 42%, urea 50%, thiocarbamide leveling agent 5%, tartrate inhibiter 3.75%, glucose brightening agent 0.25%.
Preparing method: choline chloride 60 and urea are placed container and heat magnetic agitation 75-85 ℃ oil bath; Form colourless transparent solution; And then adding thiocarbamide leveling agent, tartrate inhibiter and glucose brightening agent; Continue to guarantee that the heating magnetic agitation gets the finished product polishing fluid until stirring into colourless transparent solution in 75-85 ℃ oil bath.
The polishing test: before the test, the processing parameter that electrochemical etching at first is set is following: pulse constant potential mode, dutycycle 5:1, recurrence interval 120s, 65 ℃ of temperature, voltage 8.0 V, maximum current density 10 mA/cm
2With the magnesiumalloy licence plate be the magnesiumalloy of AZ91D earlier with ultrasonic oil removing of acetone and pickling, then ionic liquid polishing fluid and magnesiumalloy are put into electrolyzer and carry out electrochemical etching, the Mg alloy surface behind the electrochemical etching is bright and do not have a spot corrosion.
Embodiment 2
A kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy is formulated by mass percentage by following raw material: choline chloride 60 42%, urea 50%, thiocarbamide leveling agent 4%, tartrate inhibiter 3.5%, glucose brightening agent 0.5%.
The preparation method is with embodiment 1.
Polishing test is with embodiment 1, and the light of the Mg alloy surface behind the electrochemical etching and do not have spot corrosion.
Embodiment 3
A kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy is formulated by mass percentage by following raw material: choline chloride 60 42%, urea 50%, thiocarbamide leveling agent 3%, tartrate inhibiter 4%, glucose brightening agent 1%.
The preparation method is with embodiment 1.
Polishing test is with embodiment 1, and the light of the Mg alloy surface behind the electrochemical etching and do not have spot corrosion.
Claims (8)
1. ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy, it is characterized in that: it is formulated by mass percentage by following raw material: degree of depth congruent melting type ionic liquid 88-96%, additive 4-12%.
2. a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy according to claim 1 is characterized in that: described degree of depth congruent melting type ionic liquid is made up of by the weight percent of 40-44%:48-52% basic substance and other components; Wherein, described basic substance is selected choline chloride 60 for use; Said other components are one or more mixing in urea, terepthaloyl moietie, glycerine, ethanamide, thiocarbamide, trichoroacetic acid(TCA), toluylic acid, propanedioic acid, oxalic acid, p-methyl benzenesulfonic acid, m-methyl phenol, p-methyl phenol, ortho-methyl phenol, the fructose.
3. a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy according to claim 1 is characterized in that: described additive comprises has leveling agent, inhibiter and brightening agent, and three's mass percent is 2-6%:1.8-5%:0.2-1%.
4. a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy according to claim 2, it is characterized in that: the mass percent concentration of described other components is 5-95%.
5. a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy according to claim 3, it is characterized in that: described leveling agent is selected trolamine, urea, thiocarbamide, 1, the mixing of one or more in the 4-butynediol for use; Described inhibiter is selected one or more the mixing in ethanol, N.F,USP MANNITOL, terepthaloyl moietie, glycerine, tartrate, oxysuccinic acid, acetate, oxalic acid, the Hydrocerol A for use; Described brightening agent is selected one or more the mixing in glucose, asccharin, starch, sucrose, the benzotriazole for use.
6. a kind of ionic liquid polishing fluid that is used for the electrochemical etching magnesiumalloy according to claim 3, it is characterized in that: the mass percent concentration of described leveling agent is 0.1-10%; The mass percent concentration of described inhibiter is 0.01-10%; The mass percent concentration of described brightening agent is 0.01-5%.
7. a kind of preparation method who is used for the ionic liquid polishing fluid of electrochemical etching magnesiumalloy according to claim 1; It is characterized in that: may further comprise the steps: place container 75-85 ℃ of following heated and stirred the ion liquid basic substance of degree of depth congruent melting type and other components; Form colourless transparent solution; And then add various additives, guarantee 75-85 ℃ of following heated and stirred until stirring into colourless transparent solution, the finished product polishing fluid.
8. a kind of preparation method who is used for the ionic liquid polishing fluid of electrochemical etching magnesiumalloy according to claim 7 is characterized in that: described type of heating adopts the mode of oil bath heating, and described alr mode adopts magnetic agitation.
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102787346A (en) * | 2012-07-31 | 2012-11-21 | 北京天艺创新科技有限公司 | Coating film cleaning process for clean environment-friendly plasma |
| CN103938262A (en) * | 2013-01-23 | 2014-07-23 | 汉达精密电子(昆山)有限公司 | Magnesium alloy electrochemical polishing solution and method of processing magnesium alloy with the polishing solution |
| CN105386027A (en) * | 2015-12-07 | 2016-03-09 | 浙江大学 | Preparation process for chemical conversion coating on surface of magnesium alloy |
| CN105603500A (en) * | 2016-01-13 | 2016-05-25 | 上海轻合金精密成型国家工程研究中心有限公司 | Electrolytic polishing agent and electrolytic polishing method for pretreatment of magnesium alloy residual stress test |
| CN106048707A (en) * | 2016-06-29 | 2016-10-26 | 西北有色金属研究院 | Surface treatment method for degradable metal interventional stent |
| CN106435706A (en) * | 2015-08-04 | 2017-02-22 | 张无量 | Electrochemical polishing method for magnesium metal component |
| CN109989080A (en) * | 2019-04-09 | 2019-07-09 | 西安交通大学 | A kind of method that polyhydroxy ionic liquid electrodeposition prepares steel surface high-tin bronze Corrosion Resistant Film |
| CN110862773A (en) * | 2019-10-23 | 2020-03-06 | 宁波日晟新材料有限公司 | Core-shell structure nano abrasive polishing solution and preparation method thereof |
| CN111455447A (en) * | 2020-05-28 | 2020-07-28 | 四川大学 | Self-expandable interventional valve stent and surface treatment method thereof |
| CN114561643A (en) * | 2022-03-16 | 2022-05-31 | 四川大学 | Chemical polishing solution for aluminum material and polishing method thereof |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1107904A (en) * | 1994-12-29 | 1995-09-06 | 华中理工大学 | Electrochemical polishing method for aluminum or aluminum alloy welding wire |
| RU2134177C1 (en) * | 1998-04-27 | 1999-08-10 | Кузбасский государственный технический университет | Quasi-reversible heat indicator |
| WO2002026701A2 (en) * | 2000-09-27 | 2002-04-04 | Scionix Limited | Ionic liquids and their use as solvents |
| CN1961055A (en) * | 2004-05-28 | 2007-05-09 | 卡伯特微电子公司 | Electrochemical-mechanical polishing composition and method for using the same |
| CN101591799A (en) * | 2008-05-30 | 2009-12-02 | 比亚迪股份有限公司 | A kind of electrolytic polishing liquid of magnesium alloy and surface finish treatment process thereof |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN101845662A (en) * | 2009-03-27 | 2010-09-29 | 比亚迪股份有限公司 | Magnesium alloy surface treating method and magnesium alloy polished by same |
-
2011
- 2011-09-21 CN CN2011102798703A patent/CN102337580A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1107904A (en) * | 1994-12-29 | 1995-09-06 | 华中理工大学 | Electrochemical polishing method for aluminum or aluminum alloy welding wire |
| RU2134177C1 (en) * | 1998-04-27 | 1999-08-10 | Кузбасский государственный технический университет | Quasi-reversible heat indicator |
| WO2002026701A2 (en) * | 2000-09-27 | 2002-04-04 | Scionix Limited | Ionic liquids and their use as solvents |
| US20040097755A1 (en) * | 2000-09-27 | 2004-05-20 | Abbott Andrew P. | Ionic liquids and their use as solvents |
| DE60124411T8 (en) * | 2000-09-27 | 2008-02-07 | Scionix Ltd. | IONIC LIQUIDS AND ITS USE AS SOLVENTS |
| CN1961055A (en) * | 2004-05-28 | 2007-05-09 | 卡伯特微电子公司 | Electrochemical-mechanical polishing composition and method for using the same |
| CN101591799A (en) * | 2008-05-30 | 2009-12-02 | 比亚迪股份有限公司 | A kind of electrolytic polishing liquid of magnesium alloy and surface finish treatment process thereof |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN101845662A (en) * | 2009-03-27 | 2010-09-29 | 比亚迪股份有限公司 | Magnesium alloy surface treating method and magnesium alloy polished by same |
Non-Patent Citations (2)
| Title |
|---|
| ANDREW P.ABBOTT ETC.: "Voltammetric and impedance studies of the electropolishing of type 316 stainless steel in a choline chloride based ionic liquid", 《ELECTROCHIMICA ACTA》, vol. 51, no. 21, 30 June 2006 (2006-06-30), pages 4420 - 4425 * |
| 郭红霞 等: "离子液体及其在电化学中的应用", 《上海化工》, vol. 32, no. 6, 30 June 2007 (2007-06-30), pages 30 - 34 * |
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| CN102787346B (en) * | 2012-07-31 | 2015-12-02 | 沙福国 | Plasma cleaning process before clean and environment-friendly plated film |
| CN102787346A (en) * | 2012-07-31 | 2012-11-21 | 北京天艺创新科技有限公司 | Coating film cleaning process for clean environment-friendly plasma |
| CN103938262A (en) * | 2013-01-23 | 2014-07-23 | 汉达精密电子(昆山)有限公司 | Magnesium alloy electrochemical polishing solution and method of processing magnesium alloy with the polishing solution |
| CN106435706A (en) * | 2015-08-04 | 2017-02-22 | 张无量 | Electrochemical polishing method for magnesium metal component |
| CN106435706B (en) * | 2015-08-04 | 2019-02-26 | 张无量 | The electrochemical polishing method of magnesium intravascular stent |
| CN105386027A (en) * | 2015-12-07 | 2016-03-09 | 浙江大学 | Preparation process for chemical conversion coating on surface of magnesium alloy |
| CN105603500A (en) * | 2016-01-13 | 2016-05-25 | 上海轻合金精密成型国家工程研究中心有限公司 | Electrolytic polishing agent and electrolytic polishing method for pretreatment of magnesium alloy residual stress test |
| CN106048707A (en) * | 2016-06-29 | 2016-10-26 | 西北有色金属研究院 | Surface treatment method for degradable metal interventional stent |
| CN106048707B (en) * | 2016-06-29 | 2018-09-28 | 西北有色金属研究院 | A kind of surface treatment method of medical degradable metal intervention support |
| CN109989080A (en) * | 2019-04-09 | 2019-07-09 | 西安交通大学 | A kind of method that polyhydroxy ionic liquid electrodeposition prepares steel surface high-tin bronze Corrosion Resistant Film |
| CN110862773A (en) * | 2019-10-23 | 2020-03-06 | 宁波日晟新材料有限公司 | Core-shell structure nano abrasive polishing solution and preparation method thereof |
| CN110862773B (en) * | 2019-10-23 | 2021-10-01 | 宁波日晟新材料有限公司 | Core-shell structure nano abrasive polishing solution and preparation method thereof |
| CN111455447A (en) * | 2020-05-28 | 2020-07-28 | 四川大学 | Self-expandable interventional valve stent and surface treatment method thereof |
| CN114561643A (en) * | 2022-03-16 | 2022-05-31 | 四川大学 | Chemical polishing solution for aluminum material and polishing method thereof |
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Application publication date: 20120201 |