CN105624770A - Electrochemical polishing solution for cobalt-based alloy - Google Patents
Electrochemical polishing solution for cobalt-based alloy Download PDFInfo
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- CN105624770A CN105624770A CN201410696654.2A CN201410696654A CN105624770A CN 105624770 A CN105624770 A CN 105624770A CN 201410696654 A CN201410696654 A CN 201410696654A CN 105624770 A CN105624770 A CN 105624770A
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Abstract
The invention relates to an electrochemical polishing solution for a cobalt-based alloy, which comprises the following components in percentage by volume: concentrated phosphoric acid: concentrated sulfuric acid: ethylene glycol is 23-43: 12-45: 12-65; and adding 0.1-1g/L additive, wherein the additive is one or more of polymers of polyhydroxy aldehyde or polyhydroxy ketone and derivatives thereof, chlorides of cobalt and chlorides of chromium. The electrochemical polishing solution provided by the invention can be used for polishing the surface of the cobalt-based alloy, and has the advantages of remarkable polishing effect, long service life and good safety.
Description
Technical field
The present invention relates to electrochemical polish field, be specifically related to a kind of novel electrochemical polish liquid for cobalt-base alloys.
Background technology
Electrochemical polish is also referred to as electrobrightening, it is that insoluble petal or nonmetallic materials are negative electrode, and the two poles of the earth are contemporaneously immersed in electrolysis bath to be thrown workpiece for anode, pass to unidirectional current and produce selectively anodic solution, thus reaching surface of the work to remove trickle burr and the effect of brightness increase.
Electrochemical polish is mainly mucosa theory by acknowledged now. This theory is mainly: the metal ion departed from workpiece and the high viscosity composition in polishing fluid form one layer of salt film and be adsorbed on surface of the work, this mucosa is relatively thin at high spot, recess is thicker, dissolve fast because high spot electric current density is high, flow with mucosa, concavo-convex it is continually changing, the process that rough surface is leveled gradually.
The feature of electrochemical polish is that the surface 1. polished will not produce metamorphic layer and without additional stress and can remove or reduce original stressor layers 2. can process 3. polishing time with goods short and more than one piece can polish that the high surface roughness that 4. electrobrightening can reach of production efficiency is relevant with initial surface roughness generally can improve two-stage to being difficult to the complicated tiny part of the hard material soft material with machine glazed finish and thin wall profile simultaneously.
Disclosed main flow cobalt-base alloys electrochemical polish technology mainly adopts based on perchloric acid at present, adds the polishing fluid for main component such as glacial acetic acid (or acetic anhydride) or alcohols. Such polishing fluid be mainly characterized by highly versatile, parameter adaptation is good, quality of finish is good, except can be used for cobalt-base alloys electrochemical polish, can be used for the electrochemical polish of the various metals such as aluminium alloy, rustless steel, nickel-base alloy, molybdenum-base alloy, in the parts of horological industry polish, now successfully obtain the application more than 10 years. But, such polishing fluid exists affects great insoluble shortcoming, specifically:
Perchloric acid is a kind of inorganic acid, it is provided that the electric conductivity of polishing fluid, improves the conductivity of polishing fluid, improves dispersibility and anodic current efficiency, play main dissolution in polishing process; But, perchloric acid has extremely strong strong oxidizing property, unstable easily decomposition under normal temperature and pressure, generate gas poisonous, strong and stimulating, contacting with a lot of combustibles to occur vigorous reaction even to burn, explode, be there is the healthy of very big potential safety hazard, harm operator and surrounding enviroment personnel by production process in operator and surrounding enviroment personnel.
Glacial acetic acid is the organic monoacid that a kind of viscosity is bigger, and it plays certain dissolution in polishing process, also helps the mucus rete forming surface of the work, promotes selective dissolution to occur, and stops surface of the work generation excessive erosion; But, volatile under glacial acetic acid normal temperature and pressure, produce the healthy of abnormal smells from the patient poisonous, strong and stimulating, harm operator and surrounding enviroment personnel.
The intermolecular of alcohols forms hydrogen bond and association occurs, and forms mucus rete at surface of the work, makes recess dissolution velocity slow down, protrusion place enhanced dissolution rate, the surface that final acquisition is smooth, smooth. But, alcohols includes methanol, ethanol etc. and belongs to combustibles more, with there is strong oxidizing property, there is bigger potential safety hazard when mixing in the perchloric acid of strong combustion-supporting property, easily burn, the major accident such as blast.
In sum, such formula contain main component at normal temperatures and pressures volatile, easily decompose, seriously reduce the service life of such polishing fluid and poor stability.
Summary of the invention
It is an object of the invention to overcome the shortcoming of prior art, it is provided that a kind of effect is notable, long service life, the model electrochemical polishing fluid for cobalt-base alloys that safety is good.
The invention provides a kind of electrochemical polish liquid for cobalt-base alloys, described polishing fluid comprises the composition of volumes below ratio: strong phosphoric acid: concentrated sulphuric acid: ethylene glycol=23��43:12��45:12��65.
Preferably, described polishing fluid comprises the composition of volumes below ratio: strong phosphoric acid: concentrated sulphuric acid: ethylene glycol=30��38:14��25:45��56.
It is further preferred that described polishing fluid comprises the composition of volumes below ratio: strong phosphoric acid: concentrated sulphuric acid: ethylene glycol=36:15:49.
In mentioned component, described strong phosphoric acid is the phosphoric acid that concentration is not less than 85%, plays dissolution, and its high viscosity characteristic also helps the mucus rete forming surface of the work, promotes selective dissolution to occur, and stops surface of the work generation excessive erosion. Described concentrated sulphuric acid is the sulphuric acid that concentration is not less than 98%, it is possible to improve the electric conductivity of polishing fluid, improves the conductivity of polishing fluid, improves dispersibility and anodic current efficiency, plays main dissolution in polishing process. The intermolecular of described ethylene glycol forms hydrogen bond and association occurs, mucus rete is formed at surface of the work, recess dissolution velocity is made to slow down, protrusion place enhanced dissolution rate, the surface that final acquisition is smooth, smooth, realizes the purpose of inhibition by reducing acid strength and raising polishing fluid viscosity.
Electrochemical polish liquid provided by the invention also comprises additive, and described additive addition in polishing fluid is 0.1-1g/L, it is preferred to 0.3-0.7g/L, more preferably 0.5g/L.
Additive of the present invention is one or more in the chloride of the polymer of polyhydroxy aldehyde or polyhydroxyketone and derivant thereof, the chloride of cobalt, chromium, preferably one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose, more preferably cobalt chloride hexahydrate, Hexaaquachromium chloride and glucose. Described additive can improve the uniformity and the brightness on cobalt-base alloys surface after polishing; Specifically, cobaltous chloride and Chlorizate chromium can make each metallographic composition corrosion rate in cobalt-base alloys close, improve the gloss on polished surface, glucose easily forms coordination compound on cobalt-base alloys surface, thus changing the performance of some deposits, it is favorably improved the uniformity of surface of the work, makes workpiece bright and luminous in vain.
Preferably, electrochemical polish liquid of the present invention is mixed by the composition of volumes below percentage ratio: strong phosphoric acid 23-43%, concentrated sulphuric acid 12-45%, ethylene glycol 12-65%, and the volume sum of above-mentioned three kinds of compositions is 100%; Additionally adding 0.1-1g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
It is highly preferred that described electrochemical polish liquid is mixed by the composition of volumes below percentage ratio: strong phosphoric acid 30-38%, concentrated sulphuric acid 14-25%, ethylene glycol 45-56%, the volume sum of above-mentioned three kinds of compositions is 100%; Additionally adding 0.3-0.7g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
It is further preferred that described electrochemical polish liquid is mixed by the composition of volumes below percentage ratio: strong phosphoric acid 36%, concentrated sulphuric acid 15%, ethylene glycol 49%; Additionally adding 0.5g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
As the most preferably scheme of the present invention, described electrochemical polish liquid is mixed by the composition of volumes below percentage ratio: strong phosphoric acid 36%, concentrated sulphuric acid 15%, ethylene glycol 49%; Additionally add 0.1g/L cobalt chloride hexahydrate, 0.2g/L Hexaaquachromium chloride and 0.2g/L glucose.
Namely described electrochemical polish liquid is obtained after each composition mix homogeneously of the present invention; Each composition is all commercially.
The application in cobalt-base alloys surface electrochemistry polishes of the described electrochemical polish liquid is protected in progress one of the present invention. Cobalt-base alloys of the present invention is the hard alloy using cobalt as main component that this area is conventional, and its character is special, is all widely used in every field; At medical domain, described cobalt-base alloys can be processed to various element and medical apparatus and instruments.
Compared with prior art, polishing fluid provided by the invention has following significant effect:
1) polishing fluid polishing effect provided by the invention is good, it is possible to be applied to the electrochemical polish of the surface of the work of cobalt-base alloys material pointedly, thus obtaining the surface of the unstressed layer of flat smooth;
2) electrochemical polish liquid provided by the invention uses the ethylene glycol of the difficulty Undec sulphuric acid of volatilization and difficult volatilization to be main component, makes polishing fluid extend service life;
3) sulphuric acid that polishing fluid provided by the invention uses combustion-supporting property relatively weak is main component with relative nonflammable ethylene glycol, makes the safety of polishing fluid strengthen;
4) volatilization of polishing fluid provided by the invention use difficulty does not produce the sulphuric acid of harmful gas is main component with the difficult ethylene glycol not producing harmful gas that volatilizees, thus reducing the healthy harm to operator and surrounding enviroment personnel.
Detailed description of the invention
The strong phosphoric acid concentration that various embodiments of the present invention use is 85%, and concentrated sulphuric acid concentration is 98%.
Embodiment
Component preparation electrochemical polish liquid listed by table 1.
Table 1: the composition of electrochemical polish liquid
In each embodiment, according to consumption by each composition mix homogeneously, obtain polishing fluid.
Comparative example
Comparative example 1, compared with embodiment 1, differs only in: replaced strong phosphoric acid by concentrated sulphuric acid.
Comparative example 2, compared with embodiment 1, differs only in: replaced concentrated sulphuric acid by strong phosphoric acid.
Comparative example 3, compared with embodiment 1, differs only in: replaced ethylene glycol by ethanol.
Comparative example 4, compared with embodiment 1, differs only in: replaced the additive being made up of 0.08g cobalt chloride hexahydrate, 0.16g Hexaaquachromium chloride and 0.16g glucose by 0.4g ferrous chloride.
Comparative example 5 is the perchloric acid-ol class polishing fluid used in prior art, and it consists of: dense perchloric acid 100ml, ethanol 90ml.
Experimental example: electrochemical polish liquid performance detects
1, sample: embodiment 1��6 and comparative example 1��5 gained polishing fluid.
2, detection method: when conventional electrochemical polish, is polished operation with above-mentioned polishing fluid to workpiece; Described workpiece is L605 cobalt-base alloys material coronary stent semi-finished product, carries out pretreatment, make initial surface roughness Ra meansigma methods 0.8 ��m, initial weight meansigma methods 60mg before workpiece is polished.
(1) polishing effect detection: after polishing, adopts contourograph to measure the roughness Ra of surface of the work, and whether detection surface of the work excessive erosion occurs simultaneously;
(2) detection in service life: reuse polishing fluid and workpiece is polished, after polishing terminates each time, the roughness of detection surface of the work, if workpiece surface roughness is not more than 0.2 ��m, then polishing fluid is used for the polishing of next workpiece, when the surface roughness of polished workpiece is more than 0.2 ��m, stops reusing, and calculate the weight reduced value sum of whole workpiece polished through this polishing fluid, obtaining the maximum of polishing fluid can polished amount; Maximum polished amount can embody the lasting polishing ability of polishing fluid, reflect the service life of polishing fluid, namely maximum can polished amount more big, then service life is more long;
(3) safety: in polishing process, makes short circuit 0.5s, detects whether flare occur.
Table 2: the serviceability of electrochemical polish liquid
According to table 2 result it can be seen that the electrochemical polish liquid of various embodiments of the present invention offer, workpiece will not being made while realizing notable polishing effect excessive erosion and long service life occur, safety is good, and wherein, the combination property of the polishing fluid that embodiment 1 provides is optimum; By comparison, the polishing effect of comparative example 2��4 is poor; Although the surface roughness of comparative example 1 and 5 is close with each embodiment, but it can cause the excessive erosion of workpiece, and service life and safety are all poor, are not appropriate for practical application.
In sum, polishing fluid provided by the invention can be applied to cobalt-base alloys surface finish efficiently and safely.
Although, above use generality explanation, detailed description of the invention and test, the present invention is described in detail, but on basis of the present invention, it is possible to it is made some modifications or improvements, and this will be apparent to those skilled in the art. Therefore, these modifications or improvements without departing from theon the basis of the spirit of the present invention, belong to the scope of protection of present invention.
Claims (10)
1. the electrochemical polish liquid for cobalt-base alloys, it is characterised in that described polishing fluid comprises the composition of volumes below ratio: strong phosphoric acid: concentrated sulphuric acid: ethylene glycol=23��43:12��45:12��65; Additional 0.1-1g/L additive, described additive is one or more in the chloride of the polymer of polyhydroxy aldehyde or polyhydroxyketone and derivant thereof, the chloride of cobalt, chromium.
2. electrochemical polish liquid according to claim 1, it is characterised in that described strong phosphoric acid, concentrated sulphuric acid, ethylene glycol volume ratio be 30��38:14��25:45��56.
3. electrochemical polish liquid according to claim 2, it is characterised in that described strong phosphoric acid, concentrated sulphuric acid, ethylene glycol volume ratio be 36:15:49.
4. the electrochemical polish liquid according to claims 1 to 3 any one, it is characterised in that described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
5. electrochemical polish liquid according to claim 4, it is characterised in that described additive is cobalt chloride hexahydrate, Hexaaquachromium chloride and glucose.
6. electrochemical polish liquid according to claim 1, it is characterised in that mixed by the composition of volumes below percentage ratio: strong phosphoric acid 23-43%, concentrated sulphuric acid 12-45%, ethylene glycol 12-65%, the volume sum of three kinds of compositions is 100%; Additional 0.1-1g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
7. electrochemical polish liquid according to claim 1, it is characterised in that mixed by the composition of volumes below percentage ratio: strong phosphoric acid 30-38%, concentrated sulphuric acid 14-25%, ethylene glycol 45-56%, the volume sum of three kinds of compositions is 100%; Additional 0.3-0.7g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
8. electrochemical polish liquid according to claim 1, it is characterised in that mixed by the composition of volumes below percentage ratio: strong phosphoric acid 36%, concentrated sulphuric acid 15%, ethylene glycol 49%; Additional 0.5g/L additive, described additive is one or more in cobalt chloride hexahydrate, Hexaaquachromium chloride, glucose.
9. electrochemical polish liquid according to claim 1, it is characterised in that mixed by the composition of volumes below percentage ratio: strong phosphoric acid 36%, concentrated sulphuric acid 15%, ethylene glycol 49%; Additional 0.5g/L additive, described additive is cobalt chloride hexahydrate, Hexaaquachromium chloride and glucose.
10. the application of electrochemical polish liquid described in claim 1��9 any one, it is characterised in that described electrochemical polish liquid is for the electrochemical polish of cobalt-base alloys.
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Cited By (4)
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|---|---|---|---|---|
| CN109763165A (en) * | 2019-02-22 | 2019-05-17 | 江苏科技大学 | The electrolytic etching method of precipitation phase in a kind of cobalt-base alloys |
| CN112500802A (en) * | 2020-12-24 | 2021-03-16 | 黄楚燊 | Plasma polishing agent and preparation method and application thereof |
| CN113418770A (en) * | 2021-06-21 | 2021-09-21 | 江西铜业技术研究院有限公司 | Electrolytic polishing solution for preparing molybdenum-rhenium alloy metallographic specimen and method thereof |
| CN113618177A (en) * | 2021-08-17 | 2021-11-09 | 青岛理工大学 | Method for improving surface quality of alloy micro-area by salt film method and application |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109763165A (en) * | 2019-02-22 | 2019-05-17 | 江苏科技大学 | The electrolytic etching method of precipitation phase in a kind of cobalt-base alloys |
| CN112500802A (en) * | 2020-12-24 | 2021-03-16 | 黄楚燊 | Plasma polishing agent and preparation method and application thereof |
| CN113418770A (en) * | 2021-06-21 | 2021-09-21 | 江西铜业技术研究院有限公司 | Electrolytic polishing solution for preparing molybdenum-rhenium alloy metallographic specimen and method thereof |
| CN113618177A (en) * | 2021-08-17 | 2021-11-09 | 青岛理工大学 | Method for improving surface quality of alloy micro-area by salt film method and application |
| WO2023019882A1 (en) * | 2021-08-17 | 2023-02-23 | 青岛理工大学 | Method for improving surface quality of alloy micro-region by salt film method and application |
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