CN102787346B - Plasma cleaning process before clean and environment-friendly plated film - Google Patents
Plasma cleaning process before clean and environment-friendly plated film Download PDFInfo
- Publication number
- CN102787346B CN102787346B CN201210270427.4A CN201210270427A CN102787346B CN 102787346 B CN102787346 B CN 102787346B CN 201210270427 A CN201210270427 A CN 201210270427A CN 102787346 B CN102787346 B CN 102787346B
- Authority
- CN
- China
- Prior art keywords
- environment
- cleaning
- cleaning process
- plated film
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 107
- 238000000034 method Methods 0.000 title claims abstract description 70
- 230000008569 process Effects 0.000 title claims abstract description 65
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims abstract description 28
- 239000003792 electrolyte Substances 0.000 claims abstract description 20
- 230000002000 scavenging effect Effects 0.000 claims abstract description 17
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000004202 carbamide Substances 0.000 claims abstract description 16
- 238000004090 dissolution Methods 0.000 claims abstract description 16
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims abstract description 14
- 235000017557 sodium bicarbonate Nutrition 0.000 claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 13
- 239000010439 graphite Substances 0.000 claims abstract description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000008151 electrolyte solution Substances 0.000 claims description 10
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 7
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 7
- 239000004141 Sodium laurylsulphate Substances 0.000 claims description 7
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 7
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 7
- 235000011152 sodium sulphate Nutrition 0.000 claims description 7
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 5
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 4
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 4
- WCTAGTRAWPDFQO-UHFFFAOYSA-K trisodium;hydrogen carbonate;carbonate Chemical compound [Na+].[Na+].[Na+].OC([O-])=O.[O-]C([O-])=O WCTAGTRAWPDFQO-UHFFFAOYSA-K 0.000 claims 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract description 16
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 2
- -1 highly basic Substances 0.000 abstract description 2
- 238000003754 machining Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 18
- 238000005868 electrolysis reaction Methods 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 10
- 238000007747 plating Methods 0.000 description 10
- 238000005406 washing Methods 0.000 description 9
- 239000010935 stainless steel Substances 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000005070 sampling Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 238000007630 basic procedure Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention belongs to plasma cleaning process, be specifically related to the plasma cleaning process before a kind of clean and environment-friendly plated film.This technique with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes immerse in electrolytic bath simultaneously, anodic dissolution cleaning is produced by direct current, wherein, described electrolyte component comprises: urea 0.5-2000g/L, sodium bicarbonate 0.2-1000g/L, and sodium bicarbonate can substitute with the sodium carbonate of 5-1000g/L, in addition, also inhibiter 0.6-150g/L can be added.Scavenging solution used in the present invention is without strong acid, highly basic, and solution formula safety and environmental protection, production cost is low, and working (machining) efficiency is high.
Description
Technical field
The invention belongs to plasma cleaning process, be specifically related to the plasma cleaning process before a kind of clean and environment-friendly plated film.
Background technology
Plasma body is a branch in physical science research, current plasma technique has been widely used in a series of national economic development fields such as national defence, industry, agricultural, environment, communication, such as: the courses of processing such as microelectronic circuit plasma coating, polishing, cleaning, etching, deposition, greatly promote the development of information industry, facilitate industrial technology progress.
Plasma clean necessarily requires its space scale much larger than Debye length as a kind of state of aggregation of material, time scale is much larger than the plasma clean time of response, in the case, the collective interaction of plasma clean plays a major role, on larger yardstick, positive and negative charge quantity is roughly equal, meets so-called quasi-neutrality condition.
Stainless material is when vacuum plating, and matrix surface has layer oxide film usually, can become by rapid regeneration again after the removing of this oxide film, and therefore, general material surface cleaning is difficult to obtain the good coating of sticking power.All plasma cleaning process technology is applied to the cleaning activation treatment before stainless material vacuum plating at present both at home and abroad, but also there is a lot of electrolyte prescription problem in the application, as: strong acid not environmentally, it is high that the dosings of highly basic etc. cause dosing production cost, efficiency is low, and serious environment pollution.
Summary of the invention
The object of the invention is to the defect for prior art, provide a kind of formulation cost low, and the plasma cleaning process before the plated film of safety nuisance free.
Technical scheme of the present invention is as follows: the plasma cleaning process before a kind of clean and environment-friendly plated film, with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes are placed in electrolytic bath, anodic dissolution cleaning is produced by direct current, wherein, described electrolyte component comprises: urea 100-500g/L, sodium bicarbonate 0.5-20g/L.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, the sodium bicarbonate in electrolytic solution can substitute with sodium carbonate, and content is 5-20g/L.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, can also comprise inhibiter in electrolytic solution; The preferred value of inhibiter is 0.6-10g/L.
Described inhibiter can adopt sodium lauryl sulphate or ammonium sulfate or sodium sulfate.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, galvanic voltage control is at 10-120V, and scavenging period is 5-60 second.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, cathodic current is 10-80A, and anode and cathode speed of relative movement is 12-60m/min.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, cleaning water temperature is 50-80 DEG C.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, before anode is placed in electrolytic bath, first to the process being carried out removal rubbing paste by cleaning workpiece as anode.Ultrasonic cleaning process can be adopted to carry out removing the process of rubbing paste, and water temperature is 80-90 DEG C.
Beneficial effect of the present invention is as follows: the plasma cleaning process before clean and environment-friendly plated film provided by the present invention, adopt and produce plasma body by geseous discharge, unbound electron in cleaning and the atom in gas and molecular impact, the interior state change generation of initiation atom, molecule excites dissociation and ionization, and the change of the material produced various chemical reaction occurs and generates compound.The scavenging solution that this technique uses is without strong acid, highly basic, and solution formula safety and environmental protection, production cost is low, and working (machining) efficiency is high.
Embodiment
Below in conjunction with specific embodiment, the present invention is described in detail.
First, illustratively plasma washing machine reason-adhesive films is theoretical, plasma clean mainly anode electrode process and surface electrolyte forms coefficient result, the metal ion got off from anode dissolution and electrolytic solution form the electrolytic solution that solubleness is little, stickiness is large, velocity of diffusion is little, and be accumulated at leisure near anode, be bonded in anode surface, define the electrolyte layer that glutinousness is larger.
For stainless material, stainless material is when vacuum plating, and matrix surface has layer oxide film usually, can become by rapid regeneration again after the removing of this oxide film, and therefore general material surface cleaning is difficult to obtain the good coating of sticking power.Plasma cleaning process can be used for the cleaning activation treatment before stainless material vacuum plating, can ensure that coated product has very strong sticking power, coating quality is significantly improved.Plasma cleaning process be with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, and two electrodes immerse in electrolytic baths, produce anodic dissolution cleaning by direct current, and the plasma body power of anode surface has very large effect to cleaning quality.The cleaning basic procedure of stainless steel product is as follows:
Ultrasonic cleaning → washing → washing → plasma cleaning → washing → washing → activation → washing → washing → ultrasonic cleaning → washing → washing → oven dry.
Clean and environment-friendly plasma cleaning process provided by the present invention is to clean the different of electrolyte prescription from the key distinction of existing similar Technology.More there is the dosing such as strong acid, highly basic in existing similar technique, can cause serious pollution to environment in the formula of cleaning electrolytic solution.Cleaning electrolytic solution provided by the present invention, without strong acid, highly basic formula, has the feature of clean environment firendly.Electrolyte component of the present invention comprises: urea 0.5-2000g/L, sodium bicarbonate 0.2-1000g/L.Sodium bicarbonate can substitute with the sodium carbonate of 5-1000g/L, and can add inhibiter 0.6-150g/L, and the effect of inhibiter suitably slows down liquid to corrosion of metal, and inhibiter can adopt sodium lauryl sulphate or ammonium sulfate or sodium sulfate.The preferred value of electrolyte component can be urea 100-500g/L, sodium bicarbonate 0.5-20g/L.If add inhibiter, the preferred value of inhibiter is 0.6-10g/L.Control voltage 10-120v in concrete electrolysis process, scavenging period 5-60 second, cathodic current 10-80A, anode and cathode speed of relative movement 12-60m/min.In electrolysis process, voltage, electric current, the isoparametric control of scavenging period should be carried out selecting and adjusting according to the type etc. of the quantity of the concentration of component in solution, cleaning workpiece, power unit, for a concrete cleaning products material system, adopt which kind of cleaning formulation actually, should according to cleaning material reason, envrionment conditions, to realizing best cleaning performance, cannot treat different things as the same.
Several concrete process example is provided below:
Embodiment 1
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-aluminium alloy material for anode, graphite is negative electrode, cleaning area is 2000-4000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, described electrolyte component comprises: urea 0.5g/L, sodium bicarbonate 5g/L, sodium lauryl sulphate 13g/L (also can not use).Control voltage 10v in electrolysis process, scavenging period 30 seconds, cathodic current 10A, anode and cathode speed of relative movement 12m/min, water temperature 50 DEG C.By the cleaning of this sampling technology on aluminium zinc plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 2
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-plated material for anode, stainless steel is negative electrode, cleaning area is 500-2000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 2g/L, sodium carbonate 20g/L, ammonium sulfate 6g/L.Control voltage 20v in electrolysis process, scavenging period 40 seconds, cathodic current 20A, anode and cathode speed of relative movement 20m/min, water temperature 50 DEG C.This technique, to the cleaning of plating series products, improves surface smoothness, the greasy dirt on Ex-all surface, removing oxide on surface.
Embodiment 3
Plasma cleaning process before clean and environment-friendly plated film, by cleaning workpiece-aluminium alloy to be anode (or other metal product, plated item), graphite is negative electrode, cleaning area is 200-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 100g/L, sodium bicarbonate 20g/L, sodium sulfate 100g/L.Control voltage 120v in electrolysis process, scavenging period 5 seconds, cathodic current 80A, anode and cathode speed of relative movement 60m/min, water temperature 50 DEG C.Removing surface passivated membrane, exposes metallic crystal tissue.
Embodiment 4
Plasma cleaning process before clean and environment-friendly plated film, by cleaning workpiece-aluminium alloy to be anode (or other metal product, plated item), graphite is negative electrode, cleaning area is 200-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 20g/L, sodium carbonate 5g/L, sodium lauryl sulphate 6g/L.Control voltage 30v in electrolysis process, scavenging period 30 seconds, cathodic current 20A, anode and cathode speed of relative movement 30m/min, water temperature 50 DEG C.Removing surface passivated membrane, exposes metallic crystal tissue, the greasy dirt on Ex-all surface.
Embodiment 5
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 100-2000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 70g/L, sodium bicarbonate 50g/L, sodium lauryl sulphate 150g/L.Control voltage 110v in electrolysis process, scavenging period 5 seconds, cathodic current 70A, anode and cathode speed of relative movement 55m/min, water temperature 80 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 6
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 70g/L, sodium carbonate 250g/L, sodium sulfate 130g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 7
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, stainless steel is negative electrode, cleaning area is 500-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, described electrolyte component comprises: urea 0.5g/L, sodium bicarbonate 0.2g/L, sodium lauryl sulphate 0.6g/L.Control voltage 10v in electrolysis process, scavenging period 60 seconds, cathodic current 10A, anode and cathode speed of relative movement 12m/min, water temperature 70 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 8
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium carbonate 800g/L, sodium sulfate 100g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.By the cleaning of this sampling technology on stainless steel part, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 9
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 5000-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium carbonate 1000g/L, sodium sulfate 100g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 50 DEG C.By the cleaning of this sampling technology on stainless steel part, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 10
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium bicarbonate 500g/L.Control voltage 50-90v in electrolysis process, scavenging period 20 seconds-60 seconds, cathodic current 50-80A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.By the cleaning of this sampling technology on stainless steel plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, is comparatively desirable state of the art, and following process can be made to obtain promising result.
Embodiment 11
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 500-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 2000g/L, sodium bicarbonate 1000g/L.Control voltage 50-90v in electrolysis process, scavenging period 20 seconds-60 seconds, cathodic current 50-80A, anode and cathode speed of relative movement 50m/min, water temperature 60 DEG C.By the cleaning of this sampling technology on stainless steel plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
On the basis of above-mentioned specific embodiment, plasma cleaning process generally should also be noted that following processing requirement:
(1) stainless steel product thoroughly must remove rubbing paste before plasma clean, and ultrasonic cleaning process can be adopted to carry out removing the process of rubbing paste, and water temperature is 80-90 DEG C.
(2) in cleaning process, relative density and the pH value of often measuring electrolytic solution is needed.By cycle chemical examination analytical solution, adjust in time according to result.
(3) after solution generation is aging, electrolytic solution is changed in time.
(4) settling on negative plate is removed in time, to ensure traffic clearance.
(5) adjust the distance of negative electrode and positive electrode, the distance between negative electrode and positive electrode is advisable with 100-300mm.
(6) suitable anodic current density is controlled, to obtain good plasma clean quality.
Obviously, those skilled in the art can carry out change on various forms and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (6)
1. the plasma cleaning process before a clean and environment-friendly plated film, with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, it is characterized in that: described electrolyte component comprises: urea 100-500g/L, sodium bicarbonate 0.5-20g/L; Galvanic voltage control is at 10-90V, and cathodic current is 10-80A, and anode and cathode speed of relative movement is 12-60m/min, and scavenging period is 5-60 second.
2. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1, is characterized in that: the sodium bicarbonate sodium carbonate in electrolytic solution substitutes, and content is 5-20g/L.
3. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, is characterized in that: also comprise inhibiter 0.6-10g/L in electrolytic solution.
4. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 3, is characterized in that: described inhibiter adopts sodium lauryl sulphate or ammonium sulfate or sodium sulfate.
5. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, is characterized in that: cleaning water temperature is 50-80 DEG C.
6. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, it is characterized in that: before anode is placed in electrolytic bath, first carry out removing the process of rubbing paste to the ultrasonic cleaning process that adopted by cleaning workpiece as anode, water temperature is 80-90 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210270427.4A CN102787346B (en) | 2012-07-31 | 2012-07-31 | Plasma cleaning process before clean and environment-friendly plated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210270427.4A CN102787346B (en) | 2012-07-31 | 2012-07-31 | Plasma cleaning process before clean and environment-friendly plated film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102787346A CN102787346A (en) | 2012-11-21 |
| CN102787346B true CN102787346B (en) | 2015-12-02 |
Family
ID=47152926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210270427.4A Expired - Fee Related CN102787346B (en) | 2012-07-31 | 2012-07-31 | Plasma cleaning process before clean and environment-friendly plated film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102787346B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103498166A (en) * | 2013-09-24 | 2014-01-08 | 重庆市科学技术研究院 | Liquid phase plasma surface cleaning method for tungsten-rhenium wire |
| CN105386068A (en) * | 2015-10-14 | 2016-03-09 | 重庆低回科技有限公司 | Liquid phase plasma rust-removal, decontamination and surface modification method |
| CN105543876B (en) * | 2015-12-09 | 2019-01-04 | 重庆市科学技术研究院 | The injecting type liquid phase plasma derusting decontamination of environmental protection and energy saving and surface modifying method |
| CN111389815A (en) * | 2020-04-24 | 2020-07-10 | 中科九微科技有限公司 | Cleaning equipment and method for cleaning thin film type vacuum gauge sediment removing device |
| CN113560276A (en) * | 2021-05-26 | 2021-10-29 | 苏州安洁科技股份有限公司 | Method for repairing appearance defects of surface film layer of product |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU1244216A1 (en) * | 1983-01-11 | 1986-07-15 | Всесоюзный Ордена Трудового Красного Знамени Научно-Исследовательский Институт Сельскохозяйственного Машиностроения Им.В.П.Горячкина | Method of cleaning metal parts |
| DE4023466C1 (en) * | 1990-07-24 | 1991-06-27 | Hoesch Stahl Ag, 4600 Dortmund, De | Electrical coating of steel strip - using zinc on zinc-nickel alloy then treating strip as anode in electrolyte soln. |
| EP0657564A1 (en) * | 1993-12-09 | 1995-06-14 | Dario Felisari | Process for cleaning and conditioning the surface of an electrolytically oxidizable metal alloy by hyperanodizing said surface |
| CN1376216A (en) * | 1999-07-30 | 2002-10-23 | 丹尼拉·维塔列维奇·雅可夫 | An improved process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology |
| CN1962963A (en) * | 2006-10-31 | 2007-05-16 | 锦西化工机械(集团)有限责任公司 | Method for removing iron dross on the surface of stainless steel by using electrolysis technology |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN101824645A (en) * | 2010-05-14 | 2010-09-08 | 河海大学常州校区 | Method for eliminating oxide skins on stainless steel surface by micro-arc |
| CN101845662A (en) * | 2009-03-27 | 2010-09-29 | 比亚迪股份有限公司 | Magnesium alloy surface treating method and magnesium alloy polished by same |
| CN102337580A (en) * | 2011-09-21 | 2012-02-01 | 合肥金盟工贸有限公司 | Ion liquid polishing solution for electrochemically polishing magnesium alloy and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1399710A (en) * | 1972-11-08 | 1975-07-02 | Electricity Council | Electrolytic cleaning of metal surfaces |
-
2012
- 2012-07-31 CN CN201210270427.4A patent/CN102787346B/en not_active Expired - Fee Related
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU1244216A1 (en) * | 1983-01-11 | 1986-07-15 | Всесоюзный Ордена Трудового Красного Знамени Научно-Исследовательский Институт Сельскохозяйственного Машиностроения Им.В.П.Горячкина | Method of cleaning metal parts |
| DE4023466C1 (en) * | 1990-07-24 | 1991-06-27 | Hoesch Stahl Ag, 4600 Dortmund, De | Electrical coating of steel strip - using zinc on zinc-nickel alloy then treating strip as anode in electrolyte soln. |
| EP0657564A1 (en) * | 1993-12-09 | 1995-06-14 | Dario Felisari | Process for cleaning and conditioning the surface of an electrolytically oxidizable metal alloy by hyperanodizing said surface |
| CN1376216A (en) * | 1999-07-30 | 2002-10-23 | 丹尼拉·维塔列维奇·雅可夫 | An improved process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology |
| CN1962963A (en) * | 2006-10-31 | 2007-05-16 | 锦西化工机械(集团)有限责任公司 | Method for removing iron dross on the surface of stainless steel by using electrolysis technology |
| CN101591798A (en) * | 2008-06-01 | 2009-12-02 | 比亚迪股份有限公司 | A kind of metalwork and surface treatment method thereof |
| CN101845662A (en) * | 2009-03-27 | 2010-09-29 | 比亚迪股份有限公司 | Magnesium alloy surface treating method and magnesium alloy polished by same |
| CN101824645A (en) * | 2010-05-14 | 2010-09-08 | 河海大学常州校区 | Method for eliminating oxide skins on stainless steel surface by micro-arc |
| CN102337580A (en) * | 2011-09-21 | 2012-02-01 | 合肥金盟工贸有限公司 | Ion liquid polishing solution for electrochemically polishing magnesium alloy and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102787346A (en) | 2012-11-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105239083B (en) | A kind of automobile wheel hub surface handling process | |
| CN102787346B (en) | Plasma cleaning process before clean and environment-friendly plated film | |
| CN105522239B (en) | Revolving body surface boss structure Electrolyzed Processing bipolar electrode and its electrochemical machining method | |
| CN100420775C (en) | Microarc oxidation process method for surface of steel and ion | |
| CN107338469B (en) | A kind of method of ironware surface zinc layers and chromium passivating layer electrolytic deplating process | |
| CN102899709B (en) | A kind of liquid phase plasma deruster of steel and derusting process | |
| CN102206823A (en) | Process for directly electrolyzing waste etching solution to extract copper | |
| CN103526251B (en) | A kind of preparation method of the differential arc oxidation film layer with photo-catalysis function | |
| CN102747406B (en) | Magnesium alloy anodic oxidation electrolyte and magnesium alloy surface treatment method | |
| CN102181865A (en) | Treating agent and treating system for micro-etching surfaces of recyclable copper and copper alloys | |
| CN103074666B (en) | A kind of electrolytic derusting agent and electrolytic derusting method | |
| CN103266343B (en) | The surface roughening approach of metallic substance | |
| CN102234513A (en) | Stripping solution for titanium-containing film and using method for stripping solution | |
| CN114855105B (en) | Titanium anode substrate pretreatment method | |
| CN106222681A (en) | A kind of steel pickling waste liquor recovery and treatment method | |
| CN103572360A (en) | Electrolytic stripping solution and method for stripping by applying same | |
| CN101698955A (en) | Stainless steel, titanium and titanium alloy electromechanical blackening method | |
| CN101643928A (en) | Method for electrodepositing phosphate/metal composite film on cathode of surface of magnesium alloy | |
| CN104388938A (en) | Electrochemical polishing liquid for aluminum alloy welding wire and electrochemical polishing method | |
| CN111254476A (en) | Preparation method of pure copper surface corrosion-resistant black micro-arc oxidation film | |
| CN106167915A (en) | A kind of regeneration recovery method of electrochemistry acidic etching liquid used for printed circuit board | |
| CN109267142A (en) | A kind of PH stainless steel room temperature electrolytic pickling method | |
| CN106350854B (en) | A kind of passivating method of chrome-bearing steel muscle | |
| CN203112938U (en) | Multi-voltage variable-electrode electrolyzer | |
| CN104195559A (en) | Method for performing deplating and recovering zinc from zinc layer on steel tube surface |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent for invention or patent application | ||
| CB03 | Change of inventor or designer information |
Inventor after: Sha Fuguo Inventor before: Sha Fuguo Inventor before: Kang Binsheng |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: SHA FUGUO KANG BINSHENG TO: SHA FUGUO |
|
| ASS | Succession or assignment of patent right |
Owner name: SHA FUGUO Free format text: FORMER OWNER: BEIJING TIANYI INNOVATION TECHNOLOGY CO., LTD. Effective date: 20140530 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100070 FENGTAI, BEIJING TO: 100067 FENGTAI, BEIJING |
|
| TA01 | Transfer of patent application right |
Effective date of registration: 20140530 Address after: 100067, Beijing, Fengtai District Jiayuan three li, 28 floor, room 1801 Applicant after: Sha Fuguo Address before: 100070 Beijing Fengtai District Branch Road No. 7 room 507 Applicant before: Beijing Tianyi Innovation Technology Co., Ltd. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151202 Termination date: 20200731 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |