CN102787346B - Plasma cleaning process before clean and environment-friendly plated film - Google Patents

Plasma cleaning process before clean and environment-friendly plated film Download PDF

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CN102787346B
CN102787346B CN201210270427.4A CN201210270427A CN102787346B CN 102787346 B CN102787346 B CN 102787346B CN 201210270427 A CN201210270427 A CN 201210270427A CN 102787346 B CN102787346 B CN 102787346B
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cleaning
clean
environment
plated film
anode
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CN102787346A (en
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沙福国
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沙福国
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Abstract

The invention belongs to plasma cleaning process, be specifically related to the plasma cleaning process before a kind of clean and environment-friendly plated film.This technique with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes immerse in electrolytic bath simultaneously, anodic dissolution cleaning is produced by direct current, wherein, described electrolyte component comprises: urea 0.5-2000g/L, sodium bicarbonate 0.2-1000g/L, and sodium bicarbonate can substitute with the sodium carbonate of 5-1000g/L, in addition, also inhibiter 0.6-150g/L can be added.Scavenging solution used in the present invention is without strong acid, highly basic, and solution formula safety and environmental protection, production cost is low, and working (machining) efficiency is high.

Description

Plasma cleaning process before clean and environment-friendly plated film
Technical field
The invention belongs to plasma cleaning process, be specifically related to the plasma cleaning process before a kind of clean and environment-friendly plated film.
Background technology
Plasma body is a branch in physical science research, current plasma technique has been widely used in a series of national economic development fields such as national defence, industry, agricultural, environment, communication, such as: the courses of processing such as microelectronic circuit plasma coating, polishing, cleaning, etching, deposition, greatly promote the development of information industry, facilitate industrial technology progress.
Plasma clean necessarily requires its space scale much larger than Debye length as a kind of state of aggregation of material, time scale is much larger than the plasma clean time of response, in the case, the collective interaction of plasma clean plays a major role, on larger yardstick, positive and negative charge quantity is roughly equal, meets so-called quasi-neutrality condition.
Stainless material is when vacuum plating, and matrix surface has layer oxide film usually, can become by rapid regeneration again after the removing of this oxide film, and therefore, general material surface cleaning is difficult to obtain the good coating of sticking power.All plasma cleaning process technology is applied to the cleaning activation treatment before stainless material vacuum plating at present both at home and abroad, but also there is a lot of electrolyte prescription problem in the application, as: strong acid not environmentally, it is high that the dosings of highly basic etc. cause dosing production cost, efficiency is low, and serious environment pollution.
Summary of the invention
The object of the invention is to the defect for prior art, provide a kind of formulation cost low, and the plasma cleaning process before the plated film of safety nuisance free.
Technical scheme of the present invention is as follows: the plasma cleaning process before a kind of clean and environment-friendly plated film, with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes are placed in electrolytic bath, anodic dissolution cleaning is produced by direct current, wherein, described electrolyte component comprises: urea 100-500g/L, sodium bicarbonate 0.5-20g/L.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, the sodium bicarbonate in electrolytic solution can substitute with sodium carbonate, and content is 5-20g/L.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, can also comprise inhibiter in electrolytic solution; The preferred value of inhibiter is 0.6-10g/L.
Described inhibiter can adopt sodium lauryl sulphate or ammonium sulfate or sodium sulfate.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, galvanic voltage control is at 10-120V, and scavenging period is 5-60 second.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, cathodic current is 10-80A, and anode and cathode speed of relative movement is 12-60m/min.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, cleaning water temperature is 50-80 DEG C.
Further, the plasma cleaning process before clean and environment-friendly plated film as above, wherein, before anode is placed in electrolytic bath, first to the process being carried out removal rubbing paste by cleaning workpiece as anode.Ultrasonic cleaning process can be adopted to carry out removing the process of rubbing paste, and water temperature is 80-90 DEG C.
Beneficial effect of the present invention is as follows: the plasma cleaning process before clean and environment-friendly plated film provided by the present invention, adopt and produce plasma body by geseous discharge, unbound electron in cleaning and the atom in gas and molecular impact, the interior state change generation of initiation atom, molecule excites dissociation and ionization, and the change of the material produced various chemical reaction occurs and generates compound.The scavenging solution that this technique uses is without strong acid, highly basic, and solution formula safety and environmental protection, production cost is low, and working (machining) efficiency is high.
Embodiment
Below in conjunction with specific embodiment, the present invention is described in detail.
First, illustratively plasma washing machine reason-adhesive films is theoretical, plasma clean mainly anode electrode process and surface electrolyte forms coefficient result, the metal ion got off from anode dissolution and electrolytic solution form the electrolytic solution that solubleness is little, stickiness is large, velocity of diffusion is little, and be accumulated at leisure near anode, be bonded in anode surface, define the electrolyte layer that glutinousness is larger.
For stainless material, stainless material is when vacuum plating, and matrix surface has layer oxide film usually, can become by rapid regeneration again after the removing of this oxide film, and therefore general material surface cleaning is difficult to obtain the good coating of sticking power.Plasma cleaning process can be used for the cleaning activation treatment before stainless material vacuum plating, can ensure that coated product has very strong sticking power, coating quality is significantly improved.Plasma cleaning process be with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, and two electrodes immerse in electrolytic baths, produce anodic dissolution cleaning by direct current, and the plasma body power of anode surface has very large effect to cleaning quality.The cleaning basic procedure of stainless steel product is as follows:
Ultrasonic cleaning → washing → washing → plasma cleaning → washing → washing → activation → washing → washing → ultrasonic cleaning → washing → washing → oven dry.
Clean and environment-friendly plasma cleaning process provided by the present invention is to clean the different of electrolyte prescription from the key distinction of existing similar Technology.More there is the dosing such as strong acid, highly basic in existing similar technique, can cause serious pollution to environment in the formula of cleaning electrolytic solution.Cleaning electrolytic solution provided by the present invention, without strong acid, highly basic formula, has the feature of clean environment firendly.Electrolyte component of the present invention comprises: urea 0.5-2000g/L, sodium bicarbonate 0.2-1000g/L.Sodium bicarbonate can substitute with the sodium carbonate of 5-1000g/L, and can add inhibiter 0.6-150g/L, and the effect of inhibiter suitably slows down liquid to corrosion of metal, and inhibiter can adopt sodium lauryl sulphate or ammonium sulfate or sodium sulfate.The preferred value of electrolyte component can be urea 100-500g/L, sodium bicarbonate 0.5-20g/L.If add inhibiter, the preferred value of inhibiter is 0.6-10g/L.Control voltage 10-120v in concrete electrolysis process, scavenging period 5-60 second, cathodic current 10-80A, anode and cathode speed of relative movement 12-60m/min.In electrolysis process, voltage, electric current, the isoparametric control of scavenging period should be carried out selecting and adjusting according to the type etc. of the quantity of the concentration of component in solution, cleaning workpiece, power unit, for a concrete cleaning products material system, adopt which kind of cleaning formulation actually, should according to cleaning material reason, envrionment conditions, to realizing best cleaning performance, cannot treat different things as the same.
Several concrete process example is provided below:
Embodiment 1
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-aluminium alloy material for anode, graphite is negative electrode, cleaning area is 2000-4000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, described electrolyte component comprises: urea 0.5g/L, sodium bicarbonate 5g/L, sodium lauryl sulphate 13g/L (also can not use).Control voltage 10v in electrolysis process, scavenging period 30 seconds, cathodic current 10A, anode and cathode speed of relative movement 12m/min, water temperature 50 DEG C.By the cleaning of this sampling technology on aluminium zinc plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 2
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-plated material for anode, stainless steel is negative electrode, cleaning area is 500-2000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 2g/L, sodium carbonate 20g/L, ammonium sulfate 6g/L.Control voltage 20v in electrolysis process, scavenging period 40 seconds, cathodic current 20A, anode and cathode speed of relative movement 20m/min, water temperature 50 DEG C.This technique, to the cleaning of plating series products, improves surface smoothness, the greasy dirt on Ex-all surface, removing oxide on surface.
Embodiment 3
Plasma cleaning process before clean and environment-friendly plated film, by cleaning workpiece-aluminium alloy to be anode (or other metal product, plated item), graphite is negative electrode, cleaning area is 200-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 100g/L, sodium bicarbonate 20g/L, sodium sulfate 100g/L.Control voltage 120v in electrolysis process, scavenging period 5 seconds, cathodic current 80A, anode and cathode speed of relative movement 60m/min, water temperature 50 DEG C.Removing surface passivated membrane, exposes metallic crystal tissue.
Embodiment 4
Plasma cleaning process before clean and environment-friendly plated film, by cleaning workpiece-aluminium alloy to be anode (or other metal product, plated item), graphite is negative electrode, cleaning area is 200-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 20g/L, sodium carbonate 5g/L, sodium lauryl sulphate 6g/L.Control voltage 30v in electrolysis process, scavenging period 30 seconds, cathodic current 20A, anode and cathode speed of relative movement 30m/min, water temperature 50 DEG C.Removing surface passivated membrane, exposes metallic crystal tissue, the greasy dirt on Ex-all surface.
Embodiment 5
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 100-2000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 70g/L, sodium bicarbonate 50g/L, sodium lauryl sulphate 150g/L.Control voltage 110v in electrolysis process, scavenging period 5 seconds, cathodic current 70A, anode and cathode speed of relative movement 55m/min, water temperature 80 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 6
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 70g/L, sodium carbonate 250g/L, sodium sulfate 130g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 7
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, stainless steel is negative electrode, cleaning area is 500-1000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, described electrolyte component comprises: urea 0.5g/L, sodium bicarbonate 0.2g/L, sodium lauryl sulphate 0.6g/L.Control voltage 10v in electrolysis process, scavenging period 60 seconds, cathodic current 10A, anode and cathode speed of relative movement 12m/min, water temperature 70 DEG C.This cleaning, is mainly stainless steel-like product, the oxide compound produced in removing Product processing and removing greasy dirt.
Embodiment 8
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium carbonate 800g/L, sodium sulfate 100g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.By the cleaning of this sampling technology on stainless steel part, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 9
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 5000-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium carbonate 1000g/L, sodium sulfate 100g/L.Control voltage 110v in electrolysis process, scavenging period 6 seconds, cathodic current 70A, anode and cathode speed of relative movement 50m/min, water temperature 50 DEG C.By the cleaning of this sampling technology on stainless steel part, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
Embodiment 10
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 200-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 1000g/L, sodium bicarbonate 500g/L.Control voltage 50-90v in electrolysis process, scavenging period 20 seconds-60 seconds, cathodic current 50-80A, anode and cathode speed of relative movement 50m/min, water temperature 80 DEG C.By the cleaning of this sampling technology on stainless steel plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, is comparatively desirable state of the art, and following process can be made to obtain promising result.
Embodiment 11
Plasma cleaning process before clean and environment-friendly plated film, with by cleaning workpiece-stainless material for anode, graphite is negative electrode, cleaning area is 500-10000 square centimeter, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, wherein, electrolyte component comprises: urea 2000g/L, sodium bicarbonate 1000g/L.Control voltage 50-90v in electrolysis process, scavenging period 20 seconds-60 seconds, cathodic current 50-80A, anode and cathode speed of relative movement 50m/min, water temperature 60 DEG C.By the cleaning of this sampling technology on stainless steel plated item, surface removal zone of oxidation, greasy dirt, burr, improve the bonding force of vacuum plating product, quality efficiency is high, and following process can be made to obtain promising result.
On the basis of above-mentioned specific embodiment, plasma cleaning process generally should also be noted that following processing requirement:
(1) stainless steel product thoroughly must remove rubbing paste before plasma clean, and ultrasonic cleaning process can be adopted to carry out removing the process of rubbing paste, and water temperature is 80-90 DEG C.
(2) in cleaning process, relative density and the pH value of often measuring electrolytic solution is needed.By cycle chemical examination analytical solution, adjust in time according to result.
(3) after solution generation is aging, electrolytic solution is changed in time.
(4) settling on negative plate is removed in time, to ensure traffic clearance.
(5) adjust the distance of negative electrode and positive electrode, the distance between negative electrode and positive electrode is advisable with 100-300mm.
(6) suitable anodic current density is controlled, to obtain good plasma clean quality.
Obviously, those skilled in the art can carry out change on various forms and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.

Claims (6)

1. the plasma cleaning process before a clean and environment-friendly plated film, with by cleaning workpiece for anode, insoluble petal or graphite are negative electrode, two electrodes are placed in electrolytic bath, produce anodic dissolution cleaning by direct current, it is characterized in that: described electrolyte component comprises: urea 100-500g/L, sodium bicarbonate 0.5-20g/L; Galvanic voltage control is at 10-90V, and cathodic current is 10-80A, and anode and cathode speed of relative movement is 12-60m/min, and scavenging period is 5-60 second.
2. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1, is characterized in that: the sodium bicarbonate sodium carbonate in electrolytic solution substitutes, and content is 5-20g/L.
3. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, is characterized in that: also comprise inhibiter 0.6-10g/L in electrolytic solution.
4. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 3, is characterized in that: described inhibiter adopts sodium lauryl sulphate or ammonium sulfate or sodium sulfate.
5. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, is characterized in that: cleaning water temperature is 50-80 DEG C.
6. the plasma cleaning process before clean and environment-friendly plated film as claimed in claim 1 or 2, it is characterized in that: before anode is placed in electrolytic bath, first carry out removing the process of rubbing paste to the ultrasonic cleaning process that adopted by cleaning workpiece as anode, water temperature is 80-90 DEG C.
CN201210270427.4A 2012-07-31 2012-07-31 Plasma cleaning process before clean and environment-friendly plated film Expired - Fee Related CN102787346B (en)

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CN103498166A (en) * 2013-09-24 2014-01-08 重庆市科学技术研究院 Liquid phase plasma surface cleaning method for tungsten-rhenium wire
CN105386068A (en) * 2015-10-14 2016-03-09 重庆低回科技有限公司 Liquid phase plasma rust-removal, decontamination and surface modification method
CN105543876B (en) * 2015-12-09 2019-01-04 重庆市科学技术研究院 The injecting type liquid phase plasma derusting decontamination of environmental protection and energy saving and surface modifying method

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