CN102331645B - Liquid crystal display and manufacturing method thereof - Google Patents
Liquid crystal display and manufacturing method thereof Download PDFInfo
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- CN102331645B CN102331645B CN 201110306726 CN201110306726A CN102331645B CN 102331645 B CN102331645 B CN 102331645B CN 201110306726 CN201110306726 CN 201110306726 CN 201110306726 A CN201110306726 A CN 201110306726A CN 102331645 B CN102331645 B CN 102331645B
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Abstract
The invention discloses a liquid crystal display and a manufacturing method thereof. The liquid crystal display comprises a first substrate, a first grid electrode, a dielectric layer, a first voltage input electrode, a source electrode, a drain electrode, a pixel electrode, a common electrode, a second voltage input electrode, a silicon island and a second grid electrode, wherein the first voltage input electrode, the source electrode, the drain electrode, the pixel electrode, the common electrode and the second voltage input electrode are formed on the surface of the dielectric layer in a same photo-etching process; the first grid electrode, the second voltage input electrode and the second grid electrode are connected with an external driving circuit; and the first voltage input electrode is connected with an externally independent power supply. The manufacturing method comprises: providing the externally independent power supply and the second grid electrode for the liquid crystal display. A scanning signal and a data signal of the liquid crystal display provided by the invention are respectively supplied by different power supplies through different routes, so that the scanning signal and the data signal are respectively controlled and the scanning signal and the data signal are provided for the liquid crystal display through the different routes, thereby promoting the display effect of the liquid crystal display.
Description
Technical field
The present invention relates to the demonstration field, relate in particular to a kind of Liquid crystal disply device and its preparation method.
Background technology
Informationized society more and more needs frivolous portable display device, and the most ripe current product has been exactly liquid crystal indicator (Liquid Crystal Display, LCD).LCD generally includes for the display panels of display frame with for the circuit part that signal is provided to display panels.This display panels generally includes first substrate and second substrate, and they are bonded to each other and are separated by the gap by frame glue, and liquid crystal material is injected in gap between first substrate and second substrate.
Described first substrate is for example thin film transistor (TFT) (Thin Film Transistor, TFT) array base palte, be formed with many gate lines and many data lines above it, wherein many gate lines are parallel to each other and are separated from each other with fixing interval, and extend along first direction, and many data lines also are parallel to each other and are separated from each other with fixing interval, and extend along the second direction that is substantially perpendicular to first direction; Also comprise a plurality of pixel regions that the mutual intersection by described gate line and data line limits on described tft array substrate, be arranged on a plurality of pixel electrodes in each pixel region, and the thin film transistor (TFT) that is connected with pixel electrode (TFT); Described TFT can respond the signal that offers corresponding every gate line and will send to from the signal of corresponding data line each corresponding pixel electrode, and then controls turning to of liquid crystal molecule.
As Fig. 1-shown in Figure 5, in prior art, the method for making of the thin-film transistor array base-plate of liquid crystal indicator comprises:
As shown in Figure 1, provide first substrate 1, described first substrate 1 comprises grid 2, and described grid 2 is after deposit first crystal silicon layer, forms through steps such as photoetching and etchings;
Referring to Fig. 2,1 forms silicon island 3 on described first substrate;
Referring to Fig. 3, form the first electrode layer on first substrate 1 surface, form pixel electrode 4 through steps such as photoetching and etchings on the first electrode layer;
Referring to Fig. 4, form data line layer on silicon island 3 and first substrate 1 and pixel electrode 4, form data line 5 through steps such as photoetching and etchings on data line layer;
Referring to Fig. 5, form protective seam 6 on pixel electrode 4 and data line 5, form the second electrode lay on described protective seam 6, form common electrode 7 through steps such as photoetching and etchings on the second electrode lay.
Existing liquid crystal indicator connects source electrode, grid and common electrode by external drive circuit, described external drive circuit should provide sweep signal, control the conducting of source electrode and drain electrode, data-signal is provided again, control the electric field between pixel electrode and common electrode, so having relatively high expectations for external drive circuit in prior art, when externally driving circuit is controlled liquid crystal indicator, inevitably, sweep signal and data-signal meeting mutual interference mutually, affect the display effect of liquid crystal indicator, make its display effect reduce.
Summary of the invention
For solving the problems of the technologies described above, the invention provides a kind of Liquid crystal disply device and its preparation method, improved the display effect of liquid crystal indicator.
This liquid crystal indicator comprises:
First substrate;
First grid and dielectric layer, described first grid and dielectric layer are arranged on described first substrate surface, and described dielectric layer covers described first grid and first substrate surface, and described first grid is connected with external drive circuit;
The first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point, and the described first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point are formed in same photoetching process on described dielectric layer surface;
Wherein, the described first voltage input utmost point and source electrode are an one-piece construction, and the described first voltage input utmost point is connected with outside independent current source;
Described drain electrode and pixel electrode are an one-piece construction;
The input of described common electrode and second voltage is an one-piece construction very, and the described second voltage input utmost point is connected with external drive circuit, and described second voltage inputs very that common electrode provides voltage;
Silicon island, described silicon island are arranged on the dielectric layer surface of described first grid top, and cover described source electrode and drain electrode;
Second grid, described second grid cover on surface, described silicon island, and are connected with external drive circuit.
Preferably, when having voltage difference between described first grid and second grid, described source electrode and drain electrode conducting;
When described source electrode and drain electrode conducting, outside independent current source provides voltage by the described first voltage input utmost point to described pixel electrode.
Preferably, exist the situation of voltage difference to be specially between described first grid and second grid:
Described first grid is in noble potential, and described second grid is in electronegative potential.
Preferably, described liquid crystal indicator also comprises isolated protective seam, and described isolated protective seam covers on described pixel electrode and common electrode surface.
Preferably, described second grid can also cover on described silicon island and isolated protective layer.
Preferably, described liquid crystal indicator also comprises second substrate, and described second substrate comprises black matrix" and ink lay.
A kind of method for making of liquid crystal indicator comprises:
First substrate is provided, and described first substrate is provided with first grid and dielectric layer on the surface;
Form electrode layer on described dielectric layer surface, form the first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point on described electrode layer;
Wherein, the described first voltage input utmost point and source electrode are an one-piece construction, and described drain electrode and pixel electrode are an one-piece construction, and described common electrode and second voltage input be an one-piece construction very;
Forming the silicon island layer on the dielectric layer surface above described first grid and on described source electrode, drain surface, form the silicon island on the layer of described silicon island;
Form the second grid layer on surface, described silicon island, form second grid on described second grid layer.
Preferably, the method for making of described liquid crystal indicator also comprises:
Form isolated protective seam on described pixel electrode and common electrode surface.
Preferably, described second grid covers on described silicon island and isolated protective layer.
Preferably, the method for making of described liquid crystal indicator also comprises:
Second substrate is provided, and described second substrate and first substrate are oppositely arranged;
Form liquid crystal layer between described second substrate and first substrate.
Compared with prior art, technique scheme has the following advantages:
liquid crystal indicator provided by the present invention, be provided with second grid above the silicon island, second grid and first grid be the conducting of responding scanning signal controlling source electrode and drain electrode together, and source electrode and the input of the first voltage be an one-piece construction very, the first voltage input utmost point is connected with the independent current source of outside, outside independent current source provides data-signal, controls the electric field between pixel electrode and common electrode, first grid, second grid is connected the utmost point and is connected with external drive circuit with second voltage, described external drive circuit provides sweep signal, control the conducting of source electrode and drain electrode, that is: in liquid crystal indicator provided by the present invention, sweep signal is provided respectively by different circuits by different power supplys from data-signal, so can be by controlling different power supply or chip, the waveform of difference gated sweep signal and data-signal, frequency and voltage, avoided the complicated chaotic situation of the control procedure that caused by two kinds of signals of a chip controls in the prior art and two kinds of signals mutually the situation of mutual interference occur, and then improved the display effect of liquid crystal indicator.
Description of drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or description of the Prior Art, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1-Fig. 5 is the available liquid crystal display device sectional view in each stage of method for making;
Fig. 6 is the sectional view of the disclosed a kind of liquid crystal indicator of the embodiment of the present invention;
Fig. 7 is the equivalent circuit diagram of the disclosed a kind of liquid crystal indicator of the embodiment of the present invention;
Fig. 8 is the sectional view of the disclosed another kind of liquid crystal indicator of the embodiment of the present invention;
Fig. 9 is the sectional view of disclosed another liquid crystal indicator of the embodiment of the present invention;
Figure 10 is the equivalent circuit diagram of disclosed another liquid crystal indicator of the embodiment of the present invention;
Figure 11 is the method for making process flow diagram of the disclosed a kind of liquid crystal indicator of the embodiment of the present invention.
Embodiment
just as described in the background section, existing liquid crystal indicator connects source electrode by external drive circuit, grid and common electrode, described external drive circuit should provide sweep signal, control the conducting of source electrode and drain electrode, data-signal is provided again, control the electric field between pixel electrode and common electrode, so having relatively high expectations for external drive circuit in prior art, when externally driving circuit is controlled liquid crystal indicator, inevitably, two kinds of signals of a chip controls and the complicated confusion of the control procedure that causes and sweep signal and data-signal can mutual interference mutually, affect the display effect of liquid crystal indicator, make its display effect reduce.
The inventor studies discovery, can sweep signal and data-signal be separated by the structure of adjusting thin film transistor (TFT), the waveform of gated sweep signal and data-signal, frequency and voltage so easily, and then improved the display effect of liquid crystal indicator.
On basis based on above-mentioned research, the invention provides a kind of liquid crystal indicator, this device comprises:
First substrate;
First grid and dielectric layer, described first grid and dielectric layer are arranged on described first substrate surface, and described dielectric layer covers described first grid and first substrate surface, and described first grid is connected with external drive circuit;
The first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point, and the described first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point are formed in same photoetching process on described dielectric layer surface;
Wherein, the described first voltage input utmost point and source electrode are an one-piece construction, and the described first voltage input utmost point is connected with outside independent current source;
Described drain electrode and pixel electrode are an one-piece construction;
The input of described common electrode and second voltage is an one-piece construction very, and the described second voltage input utmost point is connected with external drive circuit, and described second voltage inputs very that common electrode provides voltage;
Silicon island, described silicon island are arranged on the dielectric layer surface of described first grid top, and cover described source electrode and drain electrode;
Second grid, described second grid cover on surface, described silicon island, and are connected with external drive circuit.
The technical scheme that the embodiment of the present invention provides is separated sweep signal and the data-signal of liquid crystal indicator, the waveform of gated sweep signal and data-signal, frequency and voltage so easily, and then improved the display effect of liquid crystal indicator.
It is more than the application's core concept, below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
A lot of details have been set forth in the following description so that fully understand the present invention, but the present invention can also adopt other to be different from alternate manner described here and implement, those skilled in the art can be in the situation that do similar popularization without prejudice to intension of the present invention, so the present invention is not subjected to the restriction of following public specific embodiment.
Secondly, the present invention is described in detail in conjunction with schematic diagram, when the embodiment of the present invention is described in detail in detail; for ease of explanation; the sectional view of indication device spare structure can be disobeyed general ratio and be done local the amplification, and described schematic diagram is example, and it should not limit the scope of protection of the invention at this.The three-dimensional space that should comprise in addition, length, width and the degree of depth in actual fabrication.
Embodiment one:
The present embodiment provides a kind of liquid crystal indicator, and as shown in Figure 6, this device comprises:
the first voltage input utmost point 104, source electrode 105, drain electrode 106, pixel electrode 107, common electrode 108 and the second voltage input utmost point 109, and the described first voltage input utmost point 104, source electrode 105, drain electrode 106, pixel electrode 107, common electrode 108 and the second voltage input utmost point 109 is formed in same photoetching process on described dielectric layer 103 surfaces, wherein, the described first voltage input utmost point 104 and source electrode 105 are an one-piece construction, and the described first voltage input utmost point 104 is connected with outside independent current source VCOM+, described drain electrode 106 is an one-piece construction with pixel electrode 107, described common electrode 108 and the second voltage input utmost point 109 are an one-piece construction, and the described second voltage input utmost point 109 is connected with external drive circuit, the described second voltage input utmost point 109 provides voltage for common electrode 108,
Concrete, the equivalent electrical circuit of the described liquid crystal indicator of the present embodiment as shown in Figure 7, described first grid 102 links together by sweep trace GATE-X and external drive circuit IC, described second grid 111 links together by sweep trace GATE-Y and external drive circuit IC, external drive circuit IC provides sweep signal for described first grid 102 and second grid 111, when having voltage difference between described first grid 102 and second grid 111, described first grid 102 and second grid 111 responding scanning signal controlling source electrodes 105 and drain electrode 106 conductings are specially:
When external drive circuit IC provides voltage by sweep trace GATE-X for first grid 102, make it be in noble potential, external drive circuit IC provides voltage by sweep trace GATE-Y for second grid 111, when making it be in electronegative potential, form electric field between first grid 102 and second grid 111, described direction of an electric field is to point to second grid 111 by first grid 102, the effect that this moment, the electronics in silicon island 110 was subject to electric field is moved and assembles the formation conductive channel to the direction near first grid 102, and source electrode 105 is realized conducting with drain electrode 106.
Because described source electrode 105 is an one-piece construction with the described first voltage input utmost point 104, described drain electrode 106 is an one-piece construction with described pixel electrode 107, and the described first voltage input utmost point 104 is connected with outside independent current source VCOM+ by data line, so, when described source electrode 105 and drain electrode 106 conducting, the described first voltage input utmost point 104 and pixel electrode 107 conductings, outside independent current source VCOM+ can provide data-signal, provides voltage by the described first voltage input utmost point 104 for pixel electrode 107.
Because described common electrode 108 is an one-piece construction with the described second voltage input utmost point 109, and the described second voltage input utmost point 109 is connected with external drive circuit IC, and the described second voltage input utmost point is connected on Control of Voltage point VCOM-in external drive circuit IC, and external drive circuit IC can put VCOM-by Control of Voltage and provide voltage for common electrode 108.
When the voltage of the voltage of described common electrode 108 and pixel electrode 107 does not wait, can form crooked electric field between pixel electrode 107 and common electrode 108, the voltage that provides for pixel electrode 107 by the first voltage input utmost point 104 by regulating outside independent current source VCOM+, and then the electric field between adjusting pixel electrode 107 and common electrode 108, so just can control turning to of liquid crystal molecule, realize the Presentation Function of liquid crystal indicator.
as seen, the liquid crystal indicator that the present embodiment provides is by providing outside independent current source VCOM+, for this liquid crystal indicator provides data-signal, external drive circuit IC only provides sweep signal for first grid 102 and second grid 111, sweep signal offers liquid crystal indicator by different power supplys through different circuits from data-signal, the waveform of gated sweep signal and data-signal so easily, frequency and voltage, avoided the complicated chaotic situation of the control procedure that caused by two kinds of signals of a chip controls and the situation of the phase mutual interference between sweep signal and data-signal to occur, and then improved the display effect of liquid crystal indicator.
In addition; as shown in Figure 8; the described liquid crystal indicator of the present embodiment can also comprise isolated protective seam 112, and described isolated protective seam 112 covers described pixel electrode 107 and common electrode 108 surfaces, and the making material of described isolated protective seam 112 is insulating material.the present embodiment is provided with isolated protective seam 112, on the one hand, can make the thin-film transistor array base-plate surface more smooth, and then make more even that liquid crystal molecule distributes, the consistance that keeps initial state, on the other hand, because the thin-film transistor array base-plate of liquid crystal indicator is made of a plurality of thin film transistor (TFT)s, each thin film transistor (TFT) is connected with data line by sweep trace, when making second grid 111, can increase the area of second grid 111, it is covered on described silicon island 110 and isolated protective seam 112 surfaces, to facilitate the making of sweep trace GATE-Y.
As shown in Figure 9, the described liquid crystal indicator of the present embodiment also comprises second substrate 113, described second substrate 113 comprises black matrix" 114 and ink lay 115, described second substrate 113 is glass substrate, described second substrate 113 is oppositely arranged with first substrate 101, also includes liquid crystal layer 116 between two plates.
Embodiment two:
The present embodiment discloses another kind of liquid crystal indicator, and different from above-described embodiment is, the outside independent current source VCOM+ of this device is arranged on external drive circuit IC the inside, and equivalent electrical circuit as shown in figure 10.
The described liquid crystal indicator of the present embodiment can be controlled outside independent current source VCOM+ and Control of Voltage point VCOM-simultaneously by external drive circuit IC, at this moment, outside independent current source VCOM+ provides data-signal, and Control of Voltage point VCOM-provide sweep signal, and by a chip controls.So, outside independent current source VCOM+ is integrated in external drive circuit IC, can reduce the volume of liquid crystal indicator control circuit, accordingly, it is less that the volume of liquid crystal indicator can be done, and data-signal and sweep signal be still by different circuits and arrive liquid crystal indicator, so both can the phase mutual interference, the display effect of liquid crystal indicator also can increase than existing device.
Embodiment three:
The present embodiment discloses a kind of method for making corresponding with the described liquid crystal indicator of above-described embodiment, as shown in figure 11, comprising:
Step S11, provide first substrate, described first substrate is provided with first grid and dielectric layer on the surface.
Concrete, adopt the chemical vapor deposition mode to form the first grid layer, namely at first first substrate is put into reaction chamber, gas precursors is transferred to the first substrate surface and carries out suction-operated and reaction, and then the accessory substance with reaction removes, and obtains the first grid layer.But the formation of first grid layer is not limited in the chemical vapor deposition mode, can also utilize the modes such as physical vapor deposition to form, and is not described in detail at this.And then on described first grid layer the spin coating photoresist, form photoresist layer, the mask that utilization has the first grid figure carries out photoetching, after developing, form the first grid figure on photoresist layer, take photoresist layer with first grid figure as mask, obtain first grid through techniques such as dry etching or wet etchings.
" first grid pattern " described in the present embodiment is the first grid pattern in the lip-deep two dimension of photoresist layer, and area of the pattern is only limited to the photoresist layer surface and not to surperficial downward-extension, does not have three-dimensional shape; Described " first grid figure " for to have the three-dimensional picture of three-dimensional shape, the thickness of this figure is the thickness of photoresist layer.
It is the dielectric layer that adopts the mode of chemical vapor deposition to form on first grid and first substrate surface, described dielectric layer can also form by the mode of physical vapor deposition, the present embodiment adopts the mode of chemical vapor deposition, but do not limit other deposit modes that adopt, produce concrete conditions in the establishment of a specific crime and decide according to tool.
Step S12, form electrode layer on described dielectric layer surface, form the first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point on described electrode layer.
concrete, at first adopt the chemical vapor deposition mode to form electrode layer on described dielectric layer surface, adopt as forming the photoetching method of first grid in step S11, form the first voltage input utmost point by a photoetching and etching technics on described electrode layer, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point, the wherein said first voltage input utmost point and source electrode are an one-piece construction, described drain electrode and pixel electrode are an one-piece construction, described common electrode and second voltage input be an one-piece construction very, that is: this time photoetching is divided into three parts with electrode layer, form the described first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point.
S13, forming the silicon island layer on the dielectric layer surface above described first grid and on described source electrode, drain surface, form the silicon island on the layer of described silicon island.
Concrete, at first adopt the chemical vapor deposition mode forming the silicon island layer on the dielectric layer surface above described first grid and on described source electrode, drain surface, then adopt as forming photoetching and the etching technics of first grid in step S11, form described silicon island on the layer of described silicon island, described silicon island is positioned on the dielectric layer surface of described first grid top, and covers described source electrode and drain electrode.
S14, form the second grid layer on surface, described silicon island, form second grid on described second grid layer.
Concrete, at first adopt the chemical vapor deposition mode to form the second grid layer on surface, described silicon island, then adopt photoetching and etching technics as forming first grid in step S11 to form second grid on the second grid layer.
In addition, the described method of the present embodiment can also comprise after step S13:
Form isolated protective seam on described pixel electrode and common electrode surface.
Corresponding described second grid covers on described silicon island and isolated protective layer, and the step that forms second grid is:
Form the second grid layer on described silicon island and isolated protective layer;
Form described second grid on described second grid layer.
At last, the described method of the present embodiment also comprises:
Second substrate is provided, and described second substrate and first substrate are oppositely arranged, and form liquid crystal layer between described second substrate and first substrate.
Concrete, second substrate is provided, with the first substrate after cleaning and the upper alignment film solution of second substrate coating, and the friction trend, then coat sealed plastic box in the first substrate surrounding, and scatter sept and make thereon the strong point, with the combination of first substrate and second substrate, form empty box with the sealed plastic box involution again, that the box substrate that this is empty cuts is disconnected, sliver, obtain the required size of final display device product, after inspection, inject liquid crystal material and involution in addition with vacuum mode; In addition, can also first inject liquid crystal, cut after part involution again.
the disclosed method of the present embodiment provides outside independent current source for liquid crystal indicator, described outside independent current source provides data-signal for this liquid crystal indicator, external drive circuit only provides sweep signal for first grid and second grid, sweep signal offers liquid crystal indicator by different power supplys through different circuits from data-signal, the waveform of gated sweep signal and data-signal so easily, frequency and voltage, avoided the complicated chaotic situation of the control procedure that caused by two kinds of signals of a chip controls and the situation of the phase mutual interference between sweep signal and data-signal to occur, and then improved the display effect of liquid crystal indicator.
In this instructions, various piece adopts the mode of going forward one by one to describe, and what each part stressed is and the difference of other parts that between various piece, identical similar part is mutually referring to getting final product.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the present invention.Multiple modification to these embodiment will be apparent concerning those skilled in the art, and General Principle as defined herein can be in the situation that do not break away from the spirit or scope of the present invention, realization in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (10)
1. a liquid crystal indicator, is characterized in that, comprising:
First substrate;
First grid and dielectric layer, described first grid and dielectric layer are arranged on described first substrate surface, and described dielectric layer covers described first grid and first substrate surface, and described first grid is connected with external drive circuit;
The first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point, and the described first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point are formed in same photoetching process on described dielectric layer surface;
Wherein, the described first voltage input utmost point and source electrode are an one-piece construction, and the described first voltage input utmost point is connected with outside independent current source;
Described drain electrode and pixel electrode are an one-piece construction;
The input of described common electrode and second voltage is an one-piece construction very, and the described second voltage input utmost point is connected with external drive circuit, and described second voltage inputs very that common electrode provides voltage;
Silicon island, described silicon island are arranged on the dielectric layer surface of described first grid top, and cover described source electrode and drain electrode;
Second grid, described second grid cover on surface, described silicon island, and are connected with external drive circuit.
2. install according to claim 1, it is characterized in that, when having voltage difference between described first grid and second grid, described source electrode and drain electrode conducting;
When described source electrode and drain electrode conducting, outside independent current source provides voltage by the described first voltage input utmost point to described pixel electrode.
3. install according to claim 2, it is characterized in that, exist the situation of voltage difference to be specially between described first grid and second grid:
Described first grid is in noble potential, and described second grid is in electronegative potential.
4. device according to claim 1, is characterized in that, also comprise isolated protective seam, described isolated protective seam covers on described pixel electrode and common electrode surface.
5. install according to claim 4, it is characterized in that, described second grid covers on described silicon island and isolated protective layer.
6. install according to claim 1, it is characterized in that, also comprise second substrate, described second substrate comprises black matrix" and ink lay.
7. the method for making of a liquid crystal indicator, is characterized in that, comprising:
First substrate is provided, and described first substrate is provided with first grid and dielectric layer on the surface;
Form electrode layer on described dielectric layer surface, form the first voltage input utmost point, source electrode, drain electrode, pixel electrode, common electrode and the second voltage input utmost point on described electrode layer;
Wherein, the described first voltage input utmost point and source electrode are an one-piece construction, and described drain electrode and pixel electrode are an one-piece construction, and described common electrode and second voltage input be an one-piece construction very;
Forming the silicon island layer on the dielectric layer surface above described first grid and on described source electrode, drain surface, form the silicon island on the layer of described silicon island;
Form the second grid layer on surface, described silicon island, form second grid on described second grid layer.
8. method according to claim 7, is characterized in that, also comprises:
Form isolated protective seam on described pixel electrode and common electrode surface.
9. method according to claim 8, is characterized in that, described second grid covers on described silicon island and isolated protective layer.
10. method according to claim 7, is characterized in that, also comprises:
Second substrate is provided, and described second substrate and first substrate are oppositely arranged;
Form liquid crystal layer between described second substrate and first substrate.
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| CN 201110306726 CN102331645B (en) | 2011-10-11 | 2011-10-11 | Liquid crystal display and manufacturing method thereof |
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