CN102330125B - Array electrode cavity for jet electrodeposition - Google Patents
Array electrode cavity for jet electrodeposition Download PDFInfo
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- CN102330125B CN102330125B CN 201110269330 CN201110269330A CN102330125B CN 102330125 B CN102330125 B CN 102330125B CN 201110269330 CN201110269330 CN 201110269330 CN 201110269330 A CN201110269330 A CN 201110269330A CN 102330125 B CN102330125 B CN 102330125B
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- 238000004070 electrodeposition Methods 0.000 title abstract description 15
- 238000012545 processing Methods 0.000 claims abstract description 20
- 238000007789 sealing Methods 0.000 claims abstract description 8
- 239000008151 electrolyte solution Substances 0.000 claims description 8
- 238000002347 injection Methods 0.000 claims description 8
- 239000007924 injection Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 6
- 238000005868 electrolysis reaction Methods 0.000 claims description 4
- 239000003792 electrolyte Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 abstract description 7
- 230000005684 electric field Effects 0.000 abstract description 7
- 230000008021 deposition Effects 0.000 abstract description 5
- 229910021645 metal ion Inorganic materials 0.000 abstract description 5
- 230000003647 oxidation Effects 0.000 abstract description 2
- 238000007254 oxidation reaction Methods 0.000 abstract description 2
- 239000007921 spray Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 230000002950 deficient Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
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Abstract
The invention provides an array electrode cavity for jet electrodeposition. The electrode cavity is characterized by comprising a top cover, a cavity, a sleeve, an array electrode, a sealing ring, a rigid retainer ring and a tightening nut, wherein the top cover is in threaded connection with the cavity; the sleeve clamps the array electrode; the elastic sealing ring and the retainer ring are sequentially connected on the array electrode in series; the cavity and the nut are in threaded connection; and the top of the sleeve is tightened by screwing the cavity and the nut, so that the array electrode is clamped, the elastic sealing ring and the retainer ring are pressed tightly, and the shape of the extending section of the array electrode is limited by the retainer ring. According to the array electrode cavity, an array electrode nozzle with an arbitrary section shape and profile can be formed at the bottom of the electrode cavity, so that uniform electric field and flow field in jet electrodeposition processing can be acquired, the current density of electric deposition is improved, local concentration of metal ions is improved, oxidation in electrodeposition is avoided, and efficiency and quality of electrodeposition are finally improved. Processing of electrodeposition parts with special structures can be realized by designing array electrode cavities with different shapes and controlling conduction of the electrode.
Description
Technical field
The present invention relates to a kind of special processing technology field, especially a kind of electro-deposition techniques, the array electrode chamber is used in a kind of injection galvanic deposit processing specifically.
Background technology
Traditional electrical deposition technique (electroforming and plating) is because the influence of factors such as concentration polarization, non-uniform electric and liberation of hydrogen, tend to cause that available current density and current efficiency are low, long processing time, deposition layer lack of homogeneity, and be prone to pin hole, pit, cast layer and defective such as burn.Spraying electro-deposition techniques is to contain the form of the electrolytic solution of metal ion with high-speed jet, rushes at negative electrode at a high speed under the control of computer, and carries out the regioselectivity galvanic deposit.
The jet electro-deposition techniques can effectively overcome some defectives and the limitation that above-mentioned traditional electrical deposition exists, and has its incomparable advantage, as: (1) electrolytic solution high-velocity jet is to cathode surface, flow with strong turbulent form, the metal ion of cathode surface is promptly replenished, improved limit current density, for the migration of metal ion provides powerful power, its current density can be far above other electrodeposition technology, the unit's of making sedimentation rate improves tens times to hundreds of times, thereby has overcome the unit long processing time of traditional electrical deposition technique existence and the problems such as settled layer defective that liberation of hydrogen brings; (2) spray the higher current density of electro-deposition techniques and can produce higher electrochemical polarization, be conducive to obtain the settled layer of dense structure, grain refining; (3) under the impact of high-speed jet, the bubble hydrogen that galvanic deposit produces is difficult to be adsorbed on cathode surface, has reduced the possibility of defectives such as settled layer generation hydrogen embrittlement, pin hole and pit.
But, spray electro-deposition techniques at present and have more weak point equally, as: (1) electric field and Flow Field Distribution on the spray liquid flow radial section is inhomogeneous, and it is inhomogeneous make to spray the galvanic deposit deposition process, shows as that variable thickness causes, surface irregularity etc.; (2) spraying under the galvanic deposit high current densities, can enlarge the preferential growth characteristics of crystallisation process, can aggravate to spray the deposition ununiformity of galvanic deposit; (3) the existing electro-deposition techniques that sprays uses non-metallic material (engineering plastics, resin etc.) as nozzle material in anode cavities, this slim-lined construction with bottleneck (jet orifice) not only can increase the spacing at negative and positive the two poles of the earth greatly, and can improve the resistance at jet orifice place greatly; When (4) adopting the fine nozzle mode in order to improve jet electric field and Flow Field Distribution homogeneity, overall galvanic deposit working (machining) efficiency can greatly reduce.Above-mentioned factor has seriously restricted application and the development of jet electro-deposition techniques.
Summary of the invention
The objective of the invention is at existing injection galvanic deposit working (machining) efficiency low, the problem of deposition quality difference, a kind of electric field and the flow field that can evenly spray galvanic deposit processing is provided, improve its current density and sedimentation velocity, and make its injection galvanic deposit processing that can be used for complex-curved galvanic deposit processing use the array electrode chamber.
Technical scheme of the present invention is:
The array electrode chamber is used in a kind of injection galvanic deposit processing, it is characterized in that it comprises:
One top cover 1, an end of this top cover 1 links to each other with the liquid-inlet pipe of conveying electrolyte, and the other end has outside screw, and its center is provided with the through hole that electrolysis liquid passes through;
One cavity 2, an end of this cavity 2 are provided with the internal thread that the outside screw with aforesaid top cover 1 matches, and the outside of its other end is provided with the connection outside screw, and inside is provided with a positive taper type inner chamber;
One sleeve pipe 3, the tapered structure of upper end outside surface of this sleeve pipe 3, this pyramidal structure are inserted in the positive taper type inner chamber of aforementioned cavity 2, have tightening up with notch 8 radially on the tube wall of described pyramidal structure;
An array electrode 4, this array electrode 4 is made up of the thin-walled club shaped structure of many hollows, and the centre of the thin-walled club shaped structure of hollow is provided with the through hole that electrolysis liquid passes through, and the main body of described array electrode 4 is clamped in the aforesaid sleeve pipe 3;
One wear ring 5, sealing ring 5 is installed between the end and rigidity baffle ring 6 of sleeve pipe 3, the center of described wear ring 5 and rigidity baffle ring 6 is equipped with the through hole that stretches out for array electrode 4, and the shape of the through hole at the cross-sectional shape of array electrode and rigidity baffle ring 6 centers matches;
One tightens up nut 7, and this end that tightens up nut 7 links to each other with outside screw on the cavity 2 by internal thread, and its other end offsets by the step surface of step body and aforementioned rigidity baffle ring 6, thereby rigidity step body 6, wear ring 5 and sleeve pipe 3 are fixed in the cavity 2.
Described array electrode 4 is formed by the electrode boundling of the thin-walled club shaped structure of hollow, and the cross section of the through hole that the thin-walled of hollow is bar-shaped can be one or more the combination in the forms such as circle, trilateral, tetragon, pentagon, hexagon.
The electrolytic solution entrance end of the tubular body arranged inside of described composition array electrode 4 can be opened or close according to the shape of lithosomic body.
Beneficial effect of the present invention:
(1) the present invention adopts array electrode directly to form the nozzle that sprays galvanic deposit, improved and sprayed galvanic deposit and add electric field and the homogeneity in flow field in man-hour, can greatly shorten simultaneously the spacing of negative and positive two-stage, improve the electrodeposit liquid handling capacity at nozzle place, improve speed and the quality of galvanic deposit processing.
(2) the present invention can limit the cross-sectional shape that array electrode stretches out by baffle ring, can be according to the shape in the required shower nozzle of processing cross section, and design has elastic seal ring and the baffle ring of same inner profile, obtains the better flow field of selectivity and electric field.
(3) the present invention tightens up cannula tip by the cooperation of cavity, sleeve pipe and nut, can realize reliable, the stable clamping of array electrode, and can form the nozzle of arbitrary section profile.
(4) the present invention can form the array electrode shower nozzle of arbitrary section shape and profile in the bottom of electrode cavity, thereby can obtain to spray uniformly galvanic deposit processing electric field and flow field, improve the galvanic deposit current density, improve the partial concn of metal ion, prevent the oxidation in the galvanic deposit, final electrodeposition efficiency and the quality of improving by designing the conducting of difform array electrode chamber and control electrode, can realize special construction galvanic deposit part processing.
Description of drawings
Fig. 1 is three-dimensional decomposition texture synoptic diagram of the present invention.
Fig. 2 is sectional structure synoptic diagram of the present invention.
Fig. 3 is the end view of back-shaped array electrode of the present invention.
Fig. 4 is the structural representation that utilizes the lithosomic body of the described array electrode processing of Fig. 3.
Embodiment
The present invention is further illustrated below in conjunction with drawings and Examples.
Shown in Fig. 1,2,3,4.
The array electrode chamber use in a kind of injection galvanic deposit processing, and is extremely shown in Figure 2 as Fig. 1, its top cover 1, cavity 2, sleeve pipe 3, array electrode 4, wear ring 5, rigidity baffle ring 6 and tighten up nut 7.Wherein: top cover 1 is threaded with cavity 2, sleeve pipe 3 clamping array electrodes 4, series seal ring 5, rigidity baffle ring 6 successively on the array electrode 4, cavity 2 and tightening up between the nut 7 by being threaded.By screwing cavity 2 and tightening up nut 7, sleeve pipe 3 tops are tightened up, realize to the clamping of array electrode 4 and to the compressing of wear ring 5 and rigidity baffle ring 6, and the cross-sectional shape that stretches out by baffle ring 6 restriction array electrodes, as shown in Figure 2.Details are as follows:
Described top cover 1 inside has centre hole being pressed into electrolytic solution, and top cover 1 outside one end is provided with the ring interface that the liquid-inlet pipe with conveying electrolyte is complementary; Top cover 1 outside interlude is the outer-hexagonal structure, is convenient to spanner screwing top cover 1; Top cover 1 outside the other end is provided with helicitic texture to connect cavity.
Described cavity 2 inside have centre hole with transmission electrolytic solution, and cavity 2 outsides one end is the outer-hexagonal structure, and its inside is provided with the internal thread that is connected with top cover 1; The other end is provided with external thread structure with coupling nut 7, and its inside is provided with the conical surface that matches with sleeve pipe 3.
Described sleeve pipe 3 outer sides are provided with the conical surface, are provided with equally distributed tightening up with notch 8 along the outer side circumferential direction, and to realize the clamping to array electrode 4, lateral section is circular in it, as shown in Figure 1.
Described array electrode 4 is formed by the electrode boundling of the thin-walled club shaped structure of hollow, and its cross section can be one or more the combination in circle, trilateral, tetragon, pentagon, the hexagon.
The cross-sectional shape that described wear ring 5 inboard cross-sectional shapes and array electrode 4 stretch out is complementary, and its lateral profile is circular.
Described rigidity baffle ring 6 is hollow annular structure, and in order to limit the cross-sectional shape that array electrode 4 stretches out, its lateral profile is the round boss structure.The baffle ring 6 that can have the same inner profile according to the shape design in required shower nozzle cross section has only the array electrode 4 that is in fully in the baffle ring 6 interior profile scopes just can stretch, and forms the shower nozzle that sprays galvanic deposit.
Described to tighten up nut 7 outsides one end be the outer-hexagonal structure, and its inboard is provided with the female thread structure that links to each other with cavity 2; The other end is provided with the blocking surface that matches with rigidity baffle ring 6 boss structures.
Principle of work of the present invention is:
Connect by nut between top cover 1 and the cavity 2, an end of top cover 1 links to each other with the liquid-inlet pipe of conveying electrolyte, forces electrolytic solution to enter the array electrode chamber.Sleeve pipe 3 non-pinching end end faces and wear ring 5, rigidity baffle ring 6 contact, and its pinching end outside fluting conical surface matches with the inboard conical surface of cavity 2.Tighten up nut 7 and cavity 2 by the precession that is threaded, cavity 2 is realized reliable clamping to array electrode 4 by its inboard cone in the face of sleeve pipe 3 crimped end provide tightening force radially, sleeve pipe 3 non-pinching end end faces provide axial pressing force to rigidity baffle ring 6 and elastic sealing ring 5 simultaneously, realize electrolytic solution is sprayed the sealing that adds man-hour.Wherein the inboard cross-sectional shape of elastic sealing ring 5 and rigidity baffle ring 6 according to actual needs the cross-sectional shape of shower nozzle design.Fig. 3 is a kind of synoptic diagram of the back-shaped array electrode that forms by the switching of control array electrode, and it is logical that black part is divided the expression flow field among the figure, and white portion represents that the flow field closes.Array electrode shown in Figure 3 can galvanic deposit form back-shaped metal construction as shown in Figure 4.This shows, only need control the break-make of every electrode in the array electrode when specifically implementing and just can design the assorted nozzle arrangements of complicated shape, thereby deposit the structure of complicated shape.
Below only provided a kind of comparatively detailed embodiment and concrete operating process, but protection scope of the present invention is not limited to following embodiment.
The part that the present invention does not relate to all prior art that maybe can adopt same as the prior art is realized.
Claims (3)
1. the array electrode chamber is used in an injection galvanic deposit processing, it is characterized in that it comprises:
One top cover (1), an end of this top cover (1) links to each other with the liquid-inlet pipe of conveying electrolyte, and the other end has outside screw, and its center is provided with the through hole that electrolysis liquid passes through;
One cavity (2), an end of this cavity (2) are provided with the internal thread that the outside screw with aforesaid top cover (1) matches, and the outside of its other end is provided with the connection outside screw, and inside is provided with a positive taper type inner chamber;
One sleeve pipe (3), the tapered structure of upper end outside surface of this sleeve pipe (3), this pyramidal structure are inserted in the positive taper type inner chamber of aforementioned cavity (2), have tightening up with notch (8) radially on the tube wall of described pyramidal structure;
An array electrode (4), this array electrode (4) is made up of the thin-walled club shaped structure of many hollows, and the centre of the thin-walled club shaped structure of hollow is provided with the through hole that electrolysis liquid passes through, and the main body of described array electrode (4) is clamped in the aforesaid sleeve pipe (3);
One wear ring (5), sealing ring (5) is installed between the end and rigidity baffle ring (6) of sleeve pipe (3), the center of described wear ring (5) and rigidity baffle ring (6) is equipped with the through hole that stretches out for array electrode (4), and the shape of the through hole at the cross-sectional shape of array electrode and rigidity baffle ring (6) center matches;
One tightens up nut (7), this end that tightens up nut (7) links to each other with outside screw on the cavity (2) by internal thread, its the other end offsets by the step surface of step body and aforementioned rigidity baffle ring (6), thereby rigidity step body (6), wear ring (5) and sleeve pipe (3) are fixed in the cavity (2).
2. use the array electrode chamber according to the described injection galvanic deposit processing of claim 1, it is characterized in that described array electrode (4) is formed by the electrode boundling of the thin-walled club shaped structure of hollow, the cross section of the through hole that the thin-walled of hollow is bar-shaped is one or more the combination in circle, trilateral, tetragon, pentagon and the hexagon.
3. the array electrode chamber is used in injection galvanic deposit processing according to claim 1 and 2, it is characterized in that the electrolytic solution entrance end of the tubular body arranged inside of described composition array electrode (4) can be opened or close according to the shape of lithosomic body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110269330 CN102330125B (en) | 2011-09-13 | 2011-09-13 | Array electrode cavity for jet electrodeposition |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110269330 CN102330125B (en) | 2011-09-13 | 2011-09-13 | Array electrode cavity for jet electrodeposition |
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| Publication Number | Publication Date |
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| CN102330125A CN102330125A (en) | 2012-01-25 |
| CN102330125B true CN102330125B (en) | 2013-08-14 |
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| CN 201110269330 Expired - Fee Related CN102330125B (en) | 2011-09-13 | 2011-09-13 | Array electrode cavity for jet electrodeposition |
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| CN104947172B (en) * | 2014-03-28 | 2018-05-29 | 通用电气公司 | Plating tool and the method using the plating tool |
| CN106555221B (en) * | 2015-09-25 | 2023-03-07 | 盛美半导体设备(上海)股份有限公司 | Spray head device |
| CN106799891A (en) * | 2015-11-26 | 2017-06-06 | 深圳市富彩三维技术有限公司 | A kind of array electrofluid spray printing shower nozzle and logic control method |
| CN107946201B (en) * | 2017-12-19 | 2020-03-31 | 哈尔滨工业大学 | Preparation method of lead bonding welding spot structure based on local electrodeposition |
| CN115573016A (en) * | 2021-06-21 | 2023-01-06 | 盛美半导体设备(上海)股份有限公司 | Electroplating device and electroplating method for non-circular substrate |
| CN114752989B (en) * | 2022-03-01 | 2024-01-02 | 江苏江航智飞机发动机部件研究院有限公司 | Precise electrolytic machining method for titanium alloy screw |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4762135A (en) * | 1985-08-30 | 1988-08-09 | Puije P D V D | Cochlea implant |
| CN2173791Y (en) * | 1993-09-30 | 1994-08-10 | 李可瑞 | Fast replacing type total enclosed tube electrode device |
| US5928143A (en) * | 1996-03-29 | 1999-07-27 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Implantable multi-electrode microdrive array |
| CN1341166A (en) * | 1999-12-24 | 2002-03-20 | 株式会社荏原制作所 | Semiconductor wafer electroplating and electrolyzing apparatus and method |
| DE10055722A1 (en) * | 2000-11-10 | 2002-05-29 | Eder Bernd | Swimming pool water purified by submerged direct current electrodes with periodically reversed polarity |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030236562A1 (en) * | 2000-10-10 | 2003-12-25 | Kuzma Janusz A. | Band type multicontact electrode and method of making the same |
| US8116886B2 (en) * | 2005-10-14 | 2012-02-14 | The Trustees Of Columbia University In The City Of New York | Electrode arrays and systems for inserting same |
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2011
- 2011-09-13 CN CN 201110269330 patent/CN102330125B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4762135A (en) * | 1985-08-30 | 1988-08-09 | Puije P D V D | Cochlea implant |
| CN2173791Y (en) * | 1993-09-30 | 1994-08-10 | 李可瑞 | Fast replacing type total enclosed tube electrode device |
| US5928143A (en) * | 1996-03-29 | 1999-07-27 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Implantable multi-electrode microdrive array |
| CN1341166A (en) * | 1999-12-24 | 2002-03-20 | 株式会社荏原制作所 | Semiconductor wafer electroplating and electrolyzing apparatus and method |
| DE10055722A1 (en) * | 2000-11-10 | 2002-05-29 | Eder Bernd | Swimming pool water purified by submerged direct current electrodes with periodically reversed polarity |
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| CN102330125A (en) | 2012-01-25 |
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