CN102306683A - Processing method of silicon chip reworked after screen printing - Google Patents
Processing method of silicon chip reworked after screen printing Download PDFInfo
- Publication number
- CN102306683A CN102306683A CN201110276340A CN201110276340A CN102306683A CN 102306683 A CN102306683 A CN 102306683A CN 201110276340 A CN201110276340 A CN 201110276340A CN 201110276340 A CN201110276340 A CN 201110276340A CN 102306683 A CN102306683 A CN 102306683A
- Authority
- CN
- China
- Prior art keywords
- silicon chip
- screen printing
- processing method
- reworked
- hydrochloric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 36
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 35
- 239000010703 silicon Substances 0.000 title claims abstract description 35
- 238000007650 screen-printing Methods 0.000 title claims abstract description 11
- 238000003672 processing method Methods 0.000 title claims abstract description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000018044 dehydration Effects 0.000 claims abstract description 4
- 238000006297 dehydration reaction Methods 0.000 claims abstract description 4
- 239000008367 deionised water Substances 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- RBNWAMSGVWEHFP-UHFFFAOYSA-N trans-p-Menthane-1,8-diol Chemical compound CC(C)(O)C1CCC(C)(O)CC1 RBNWAMSGVWEHFP-UHFFFAOYSA-N 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract description 2
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 abstract 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000002791 soaking Methods 0.000 abstract 1
- 229940116411 terpineol Drugs 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Abstract
The invention relates to a processing method of a silicon chip reworked after screen printing. The method comprises the following steps: cleaning the silicon chip by adopting alcohol mixed with terpineol; then putting the silicon chip in hydrochloric acid with the mass percent concentration of 3-8% and immersing for 1-3 hours; then removing the residual hydrochloric acid on the surface of the silicon chip by utilizing de-ionized water; and finally putting the wetted silicon chip into alcohol for soaking and dehydration. By adopting the method provided by the invention, the problem of aluminum being residual on the surface of the silicon chip of the screen printing reworked chip in the treating process can be reduced, the generation of rejected products is reduced, and the solar conversion efficiency of the silicon chip is improved.
Description
Technical field
The present invention relates to a kind of processing method of the silicon chip of after silk screen printing, doing over again.
Background technology
At present; Existing solar cell can produce many silicon chips of doing over again in screen printing process; Traditional processing method adopts terpinol to add the manual cleaning of alcohol; Perhaps using alcohol to do the solvent supersonic ripple cleans; These two kinds of methods can make the part aluminium paste remain in silicon chip surface; Finally cause battery sheet dark current higher, open circuit voltage is on the low side, thereby has reduced qualification rate and conversion efficiency that the battery sheet is produced.
Summary of the invention
The purpose of this invention is to provide that to reduce silicon chip surface aluminium residual, thereby improve a kind of processing method of the silicon chip of after silk screen printing, doing over again of the solar energy converting efficient of silicon chip.
The technical scheme that the present invention takes is: a kind of processing method of the silicon chip of after silk screen printing, doing over again; It is characterized in that adopting alcohol to add terpinol earlier cleans up silicon chip; Then silicon slice placed was soaked 1～3 hour in the hydrochloric acid of mass percent concentration 3～8%; Afterwards; Use the deionized water hydrochloric acid that silicon chip surface is residual to remove; At last, the silicon chip of band water is put into alcohol and soak dehydration.
Adopt the inventive method, can reduce the silk screen printing residual problem of silicon chip surface aluminium in the sheet processing procedure of doing over again, reduce the generation of defective item, improve the solar energy converting efficient of silicon chip.
Embodiment
Embodiment below in conjunction with concrete is described further the present invention.
This a kind of processing method of after silk screen printing, doing over again silicon chip comprises the following steps:
One, adopt alcohol to add terpinol earlier, manual front, the back side with silicon chip cleans up.
Two, silicon slice placed is soaked taking-up in 1～3 hour in the hydrochloric acid of mass percent concentration 3～8%.
Three, use the deionized water rinsing silicon chip, the hydrochloric acid that silicon chip surface is residual is removed.
Four, will put into alcohol with the silicon chip of water and soak more than 20 seconds, make the silicon chip surface dehydration.
Adopt above-mentioned steps, show, can reach the generation that reduces defective item, improve the purpose of the solar energy converting efficient of silicon chip fully with silicon chip surface aluminium residue removal through actual test result.
Claims (1)
1. processing method of silicon chip of after silk screen printing, doing over again; It is characterized in that adopting alcohol to add terpinol earlier cleans up silicon chip; Then silicon slice placed was soaked 1～3 hour in the hydrochloric acid of mass percent concentration 3～8%; Afterwards; Use the deionized water hydrochloric acid that silicon chip surface is residual to remove; At last, the silicon chip of band water is put into alcohol and soak dehydration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110276340A CN102306683A (en) | 2011-09-09 | 2011-09-09 | Processing method of silicon chip reworked after screen printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110276340A CN102306683A (en) | 2011-09-09 | 2011-09-09 | Processing method of silicon chip reworked after screen printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102306683A true CN102306683A (en) | 2012-01-04 |
Family
ID=45380515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110276340A Pending CN102306683A (en) | 2011-09-09 | 2011-09-09 | Processing method of silicon chip reworked after screen printing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102306683A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103337563A (en) * | 2013-07-15 | 2013-10-02 | 山东力诺太阳能电力股份有限公司 | Method for reworking defective printing piece of crystalline silicon solar cell |
| CN104009122A (en) * | 2014-05-26 | 2014-08-27 | 奥特斯维能源（太仓）有限公司 | Processing method for reworking silicon wafers in silk-screen printing |
| CN104624566A (en) * | 2013-11-15 | 2015-05-20 | 浙江鸿禧能源股份有限公司 | Method for wiping screen printing plate in silk-screen printing |
| CN105449036A (en) * | 2015-12-03 | 2016-03-30 | 通威太阳能（合肥）有限公司 | Reworking treatment method for poor screen printing sheet |
| CN105537181A (en) * | 2015-12-17 | 2016-05-04 | 欧贝黎新能源科技股份有限公司 | A kind of cleaning device and cleaning method for bad screen printing film |
| CN108198874A (en) * | 2017-12-28 | 2018-06-22 | 南京日托光伏科技股份有限公司 | A kind of processing method of MWT battery silk-screen printing defective products |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101217169A (en) * | 2007-12-27 | 2008-07-09 | 江阴浚鑫科技有限公司 | A reworking method on degraded products after the printing of crystal silicon solar battery |
| CN102074617A (en) * | 2010-12-02 | 2011-05-25 | 上海超日(洛阳)太阳能有限公司 | Processing method for screen-printing reworked silicon slice |
-
2011
- 2011-09-09 CN CN201110276340A patent/CN102306683A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101217169A (en) * | 2007-12-27 | 2008-07-09 | 江阴浚鑫科技有限公司 | A reworking method on degraded products after the printing of crystal silicon solar battery |
| CN102074617A (en) * | 2010-12-02 | 2011-05-25 | 上海超日(洛阳)太阳能有限公司 | Processing method for screen-printing reworked silicon slice |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103337563A (en) * | 2013-07-15 | 2013-10-02 | 山东力诺太阳能电力股份有限公司 | Method for reworking defective printing piece of crystalline silicon solar cell |
| CN104624566A (en) * | 2013-11-15 | 2015-05-20 | 浙江鸿禧能源股份有限公司 | Method for wiping screen printing plate in silk-screen printing |
| CN104009122A (en) * | 2014-05-26 | 2014-08-27 | 奥特斯维能源（太仓）有限公司 | Processing method for reworking silicon wafers in silk-screen printing |
| CN104009122B (en) * | 2014-05-26 | 2016-05-18 | 奥特斯维能源（太仓）有限公司 | The do over again processing method of silicon chip of a kind of serigraphy |
| CN105449036A (en) * | 2015-12-03 | 2016-03-30 | 通威太阳能（合肥）有限公司 | Reworking treatment method for poor screen printing sheet |
| CN105449036B (en) * | 2015-12-03 | 2017-10-03 | 通威太阳能（合肥）有限公司 | Reworking treatment method for poor screen printing sheet |
| CN105537181A (en) * | 2015-12-17 | 2016-05-04 | 欧贝黎新能源科技股份有限公司 | A kind of cleaning device and cleaning method for bad screen printing film |
| CN108198874A (en) * | 2017-12-28 | 2018-06-22 | 南京日托光伏科技股份有限公司 | A kind of processing method of MWT battery silk-screen printing defective products |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102306683A (en) | Processing method of silicon chip reworked after screen printing | |
| CN101916787B (en) | Black silicon solar cell and preparation method thereof | |
| CN104393118B (en) | The crystal silicon solar batteries Wet chemical processing method that making herbs into wool is carried out with cleaning substep | |
| CN102181935B (en) | Method and corrosive liquid for making texture surface of monocrystalline silicon | |
| CN107706087B (en) | Silicon wafer cleaning method | |
| CN102593268B (en) | Method for carrying out cleaning and texture-surface-making on heterojunction solar cells by using texturing smoothing and rounding technique | |
| CN103441182B (en) | The matte processing method of solar cell and solar cell | |
| CN104218122B (en) | A kind of etching method of the polysilicon emitter rate reducing diamond wire cutting | |
| CN102005504A (en) | Silicon wafer fine hair making method capable of improving solar cell conversion efficiency | |
| CN105576074A (en) | Wet etching method for N-type double-sided battery | |
| CN102593263A (en) | Preparation method of N-type crystalline silicon back emitter junction solar battery and corrosive liquid | |
| CN106601862A (en) | Texturing method for reducing reflectivity of monocrystalline silicon heterojunction solar cell | |
| CN116799106A (en) | Pre-cleaning method for efficient gettering of crystalline silicon heterojunction solar cell | |
| CN106409977A (en) | Solar cell silicon wafer cleaning method and solar cell preparation method | |
| CN104201244B (en) | Substandard products reworking method after a kind of crystal silicon solar cell sheet silk screen printing | |
| CN103721968A (en) | Texturing and cleaning method for improving battery conversion efficiency | |
| CN103606595A (en) | Reutilization method and grating line recovery method of defective monocrystalline silicon battery sheet after sintering | |
| CN103426972A (en) | Cleaning method for texture surface making of silicon chip | |
| CN104088018A (en) | Mono-crystalline silicon wafer texturing cleaning method and mono-crystalline texturing device | |
| CN102214726A (en) | Method for treating flocking on surface of solar silicon slice | |
| CN108766869A (en) | A kind of silicon chip of solar cell slot type cleaning method | |
| CN104393094B (en) | N-type silicon chip cleaning texturing method for HIT battery | |
| CN101593790A (en) | The etching method of silicon cell | |
| CN104112795A (en) | Method for producing silicon heterojunction solar cell | |
| CN106981547A (en) | A kind of monocrystalline that handles is done over again the method for piece |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120104 |