CN102285263A - Method for printing crystalline silicon solar cell electrodes - Google Patents
Method for printing crystalline silicon solar cell electrodes Download PDFInfo
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- CN102285263A CN102285263A CN2011101454991A CN201110145499A CN102285263A CN 102285263 A CN102285263 A CN 102285263A CN 2011101454991 A CN2011101454991 A CN 2011101454991A CN 201110145499 A CN201110145499 A CN 201110145499A CN 102285263 A CN102285263 A CN 102285263A
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Abstract
The invention relates to a method for printing crystalline silicon solar cell electrodes. The method comprises the following specific steps: 1) carrying out first electrode printing on a silicon wafer on which electrodes are to be prepared according to the screen printing graphics or patterns and then drying or sintering the silicon wafer; and 2) carrying out second electrode printing on the silicon wafer which has undergone first printing according to the fine metal grid line printing graphics or patterns and then drying or sintering the silicon wafer. The method has the following beneficial effects: the electrodes and the fine metal grid lines are printed step by step according to the principle of screen printing, so that the thickness of the screen pattern is uniform and the deformation of the screen is more uniform after the screen is stressed, thus avoiding excessive thickness of local printing, reducing overflow of partial paste, namely reducing paste consumption, and reducing the damaged screen due to nonuniform stress.
Description
Technical field
The present invention relates to a kind of printing process of electrode of solar battery, especially a kind of main electrode is separated the method that the printing preparation is finished with the thin grid line of metal.
Background technology
A formula mode of printing is adopted in the positive printing of solar cell primary electrode technology now, be that the front printed pattern comprises main electrode and the thin grid line of metal, this typography method step is simple, execution easy to operate, save the production technology time, but have a lot of corresponding problem simultaneously: half tone figure thickness thickness is inconsistent, easy unbalance stress causes brokenly version when making screen painting, reduced the service life of half tone, increased production cost, and the inhomogeneous figure thickness that causes of printing deformation is inhomogeneous, spillage, graphics sub prints outer optical issue such as blocked up grade, directly increase the use of slurry, caused the increase of cost of sizing agent.For common solar cell, adopt formula mode of printing of main electrode and the thin grid line of metal to obtain the electrode contact, phenomenon such as there is process limitation in this printing, easily produces spillage, and the printed pattern height is wayward has influenced the final performance of battery greatly.And this mode of printing, half tone figure be complicated (figure thickness thickness is inconsistent) comparatively, because the effect of print principle causes redundant sizing agent to be printed on the electrode, causes the unnecessary increase of technology cost.And the required technology in different figure positions requires different, as factor thickness, resolves precision etc., and the traditional printing mode is that different graphic is realized on a half tone, thereby printing quality is coarse, and is not meticulous, is fit to low precision print request.
Summary of the invention
The technical problem to be solved in the present invention is: propose a kind of method of special printing crystalline silicon solar battery electrode, solve the problem that the half tone life-span is low, slurry overflows, the electrode printed pattern is not controlled by electrode and the mode that thin grid line separates printing.
The technical solution adopted in the present invention is: a kind of method of printing crystalline silicon solar battery electrode, and concrete steps are:
1) will prepare the silicon chip of preparation, do hachure printing for the first time according to screen painting figure or pattern, then oven dry or sintering;
2) on the silicon chip of the first impression, do electrode printing for the second time according to main electrode printed pattern or pattern again, dry then or sintering.
Described step 2) the electrode printed pattern is vertical with first impression figure direction for the second time, and second impression figure can not override first impression figure.
In order to increase the convenience of printing process, the bus electrode printing first time of the present invention and for the second time thin gate line electrode printing can be adopted same slurry or different slurry, make the height of printed pattern and the realization designing requirement that live width can both be comparatively desirable.
The invention has the beneficial effects as follows: the thin grid line of main electrode and metal is implemented printing step by step, makes half tone figure thickness thickness unanimity, and the half tone stress and deformation is more even during printing, and half tone is cracky not, has improved half tone service life.Adopt this mode of printing (half tone figure thickness thickness unanimity), can require to formulate stable technology according to the required technology of figure, make the pattern precision of printing higher, quality is easier to be controlled, meticulousr, be difficult for to produce problem of appearance such as spillage, graphics sub be blocked up, figure after the printing is improved on electric current collection greatly, thereby improve the electrical property and the efficient of battery sheet.
Description of drawings
The present invention is further described below in conjunction with drawings and Examples.
Fig. 1 is the structural representation of preferred embodiment of the present invention;
Fig. 2 is the preferred embodiment structural representation after the first impression of the present invention;
Fig. 3 is the preferred embodiment structural representation after the second impression of the present invention;
Among the figure: 1, the electrode contact portion that obtains for the thin grid line printing of metal for the first time; 2, be the electrode behind the main electrode graphic printing for the second time.
The specific embodiment
The present invention is further detailed explanation with preferred embodiment in conjunction with the accompanying drawings now.These accompanying drawings are the schematic diagram of simplification, basic structure of the present invention only is described in a schematic way, so it only show the formation relevant with the present invention.
As shown in Figure 1, this method adopts symmetry formed battery of printing and electrode fully, and method step is:
1) will prepare the silicon chip of preparation, do the thin grid line printing of metal for the first time according to screen painting figure or pattern, then oven dry or sintering;
2) utilize identical slurry, on the silicon chip of the thin grid line of first impression metal, do electrode printing for the second time according to main electrode printed pattern or pattern again, dry then or sintering.
1) will prepare the silicon chip of preparation, do the thin grid line printing of metal for the first time according to screen painting figure or pattern, then oven dry or sintering;
2) utilize different slurries, on the silicon chip of the thin grid line of first impression metal, do electrode printing for the second time according to main electrode printed pattern or pattern again, dry then or sintering.
Just the specific embodiment of the present invention of describing in the above specification, various not illustrating is construed as limiting flesh and blood of the present invention, the person of an ordinary skill in the technical field after having read specification can to before the described specific embodiment make an amendment or be out of shape, and do not deviate from essence of an invention and scope.
Claims (2)
1. method of printing crystalline silicon solar battery electrode is characterized in that may further comprise the steps:
1) will prepare the silicon chip of preparation, do hachure printing for the first time according to screen painting figure or pattern, then oven dry or sintering;
2) on the silicon chip of the first impression, do electrode printing for the second time according to main electrode printed pattern or pattern again, dry then or sintering.
2. the method for printing crystalline silicon solar battery electrode as claimed in claim 1 is characterized in that: described step 2) the electrode printed pattern is vertical with first impression figure direction for the second time, and second impression figure can not override first impression figure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101454991A CN102285263A (en) | 2011-05-31 | 2011-05-31 | Method for printing crystalline silicon solar cell electrodes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101454991A CN102285263A (en) | 2011-05-31 | 2011-05-31 | Method for printing crystalline silicon solar cell electrodes |
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| CN102285263A true CN102285263A (en) | 2011-12-21 |
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| CN2011101454991A Pending CN102285263A (en) | 2011-05-31 | 2011-05-31 | Method for printing crystalline silicon solar cell electrodes |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102738301A (en) * | 2012-06-15 | 2012-10-17 | 上海中智光纤通讯有限公司 | Method for forming crystalline silicon solar cell front electrode |
| CN102738302A (en) * | 2012-06-15 | 2012-10-17 | 上海中智光纤通讯有限公司 | Method for forming electrodes of heterojunction with intrinsic thin layer (HIT) solar cell |
| CN103072392A (en) * | 2012-12-07 | 2013-05-01 | 常州大学 | Novel front side grid line printing method |
| CN103171268A (en) * | 2011-12-23 | 2013-06-26 | 昆山允升吉光电科技有限公司 | Screen board used for printing of positive electrode of crystalline silicon solar cell |
| CN103171257A (en) * | 2011-12-23 | 2013-06-26 | 昆山允升吉光电科技有限公司 | Solar cell electrode AB screen board in grid line complementary structure and printing method thereof |
| TWI712510B (en) * | 2015-07-22 | 2020-12-11 | 日商信越化學工業股份有限公司 | Screen printing machine, screen printing method and electrode forming method of solar cell |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1606175A (en) * | 2003-10-08 | 2005-04-13 | 夏普株式会社 | Solar cell making method and solar cell made thereby |
| CN101826569A (en) * | 2010-05-13 | 2010-09-08 | 无锡尚德太阳能电力有限公司 | Solar cell, screen printing plate and solar cell module thereof |
| CN102029776A (en) * | 2010-10-26 | 2011-04-27 | 宁波升日太阳能电源有限公司 | Screen for printing silicon solar battery electrodes |
-
2011
- 2011-05-31 CN CN2011101454991A patent/CN102285263A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1606175A (en) * | 2003-10-08 | 2005-04-13 | 夏普株式会社 | Solar cell making method and solar cell made thereby |
| CN101826569A (en) * | 2010-05-13 | 2010-09-08 | 无锡尚德太阳能电力有限公司 | Solar cell, screen printing plate and solar cell module thereof |
| CN102029776A (en) * | 2010-10-26 | 2011-04-27 | 宁波升日太阳能电源有限公司 | Screen for printing silicon solar battery electrodes |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103171268A (en) * | 2011-12-23 | 2013-06-26 | 昆山允升吉光电科技有限公司 | Screen board used for printing of positive electrode of crystalline silicon solar cell |
| CN103171257A (en) * | 2011-12-23 | 2013-06-26 | 昆山允升吉光电科技有限公司 | Solar cell electrode AB screen board in grid line complementary structure and printing method thereof |
| CN102738301A (en) * | 2012-06-15 | 2012-10-17 | 上海中智光纤通讯有限公司 | Method for forming crystalline silicon solar cell front electrode |
| CN102738302A (en) * | 2012-06-15 | 2012-10-17 | 上海中智光纤通讯有限公司 | Method for forming electrodes of heterojunction with intrinsic thin layer (HIT) solar cell |
| CN103072392A (en) * | 2012-12-07 | 2013-05-01 | 常州大学 | Novel front side grid line printing method |
| CN103072392B (en) * | 2012-12-07 | 2015-04-22 | 常州大学 | Novel front side grid line printing method |
| TWI712510B (en) * | 2015-07-22 | 2020-12-11 | 日商信越化學工業股份有限公司 | Screen printing machine, screen printing method and electrode forming method of solar cell |
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Application publication date: 20111221 |