CN102267080A - Disc type double-sided polishing machine for IC (identity card) grinding processing - Google Patents

Disc type double-sided polishing machine for IC (identity card) grinding processing Download PDF

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Publication number
CN102267080A
CN102267080A CN2010101924935A CN201010192493A CN102267080A CN 102267080 A CN102267080 A CN 102267080A CN 2010101924935 A CN2010101924935 A CN 2010101924935A CN 201010192493 A CN201010192493 A CN 201010192493A CN 102267080 A CN102267080 A CN 102267080A
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CN
China
Prior art keywords
bistrique
grinding head
polishing machine
sided polishing
disc type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010101924935A
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Chinese (zh)
Inventor
高文峰
吴弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHANGHAI FENGHONG ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd
Original Assignee
SHANGHAI FENGHONG ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHANGHAI FENGHONG ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd filed Critical SHANGHAI FENGHONG ENVIRONMENTAL PROTECTION TECHNOLOGY Co Ltd
Priority to CN2010101924935A priority Critical patent/CN102267080A/en
Publication of CN102267080A publication Critical patent/CN102267080A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The invention relates to a disc type double-sided polishing machine for IC (identity card) grinding processing, which comprises an upper grinding head, a lower grinding head, a rotating-disc grinding head, a lifting mechanism and a lift motor, wherein the upper grinding head and the lower grinding head are respectively arranged at the upper part of a frame, the grinding surface of the upper grinding head is opposite to the grinding surface of the lower grinding head, a part (arranged at the middle position below the lower grinding head) of the frame is provided with an operating disc, and the inside of the operating disc is provided with two adjacent workpiece discs; and the rear side of the upper grinding head is provided with the lifting mechanism equipped with the lift motor, and the rear sides of the upper grinding head and the lower grinding head are respectively connected with an upper disc motor and a lower disc motor. The double-sided polishing machine provided by the invention has the advantages that a process from an operation of beginning to process a workpiece to an operation of completing the processing on the workpiece can be completed in an automated mode without manual operation, compared with the original process implemented by manually placing the workpiece, the times for taking and placing the workpiece are saved; and based on efficient revivification and cyclic utilization, both the cost for manufacturing new cards is saved, and the production efficiency is improved.

Description

A kind of disc type Twp-sided polishing machine that is used for the IC-card attrition process
Technical field
The present invention relates to a kind of polisher lapper, relate in particular to a kind of disc type Twp-sided polishing machine that is used for the IC-card attrition process.
Background technology
Various on the market at present IC-cards need constantly recycling and upgrade, and whole process is exactly card such as shabby, that surfacial pattern is fuzzy, literal is smudgy, misprint, content are expired, through going attrition process, makes it be reduced to white card to its surface; Existing equipment need be equipped with servicing unit, also needs certain streamline and associated production personnel to operate fast, though these means can reach basic printing and recycling purpose again, has increased the cost of making neocaine on foot.
Summary of the invention
At above defective, the invention provides a kind of disc type Twp-sided polishing machine that is used for the IC-card attrition process, thereby guaranteeing on the efficient multiple new and recycling basis, not only saved the making neocaine cost, but also improved production efficiency.
For achieving the above object, the present invention is by the following technical solutions:
A kind of disc type Twp-sided polishing machine that is used for the IC-card attrition process, comprise bistrique, following bistrique, rotating disk bistrique, elevating mechanism and lifting motor, last bistrique is arranged at upper rack respectively with following bistrique, it is described that upward bistrique is relative up and down with following bistrique buffed surface separately, described frame is positioned at bistrique below medium position place's installment work dish down, and this scratch diskette inside is provided with two adjacent workpiece plates; The described bistrique rear side of going up is provided with the elevating mechanism of being furnished with lifting motor, and last bistrique is connected coil motor and following coil motor respectively with following bistrique rear side.
The beneficial effect that is used for the disc type Twp-sided polishing machine of IC-card attrition process of the present invention is: can guarantee that workpiece need not artificial and adopts automation to finish from beginning to be worked into to machine, and has compared the artificial saving of placing of original needs and has picked and placeed the time; Make it on efficient multiple new and recycling basis, not only saved the making neocaine cost, but also improved production efficiency.
Description of drawings
With reference to the accompanying drawings the present invention is described in further detail below.
Fig. 1 is the described disc type Twp-sided polishing machine structural representation that is used for the IC-card attrition process of the embodiment of the invention;
Fig. 2 is the described vertical view that is used for the disc type Twp-sided polishing machine of IC-card attrition process of the embodiment of the invention;
Fig. 3 is the described side view that is used for the disc type Twp-sided polishing machine of IC-card attrition process of the embodiment of the invention;
Fig. 4 is the described upward view that is used for the disc type Twp-sided polishing machine of IC-card attrition process of the embodiment of the invention.
Among the figure:
1, frame; 2, go up bistrique; 3, following bistrique; 4, sheet case; 5, rotating disk bistrique; 6, rotary tray motor; 7, workpiece plate; 8, the groove that takes up; 9, elevating mechanism; 10, go up coil motor; 11, following coil motor; 12, lifting motor; 13, scratch diskette.
The specific embodiment
Shown in Fig. 1-4, the described disc type Twp-sided polishing machine that is used for the IC-card attrition process of the embodiment of the invention, comprise bistrique 1, following bistrique 2, rotating disk bistrique 5, elevating mechanism 9 and lifting motor 12, it is described that upward bistrique 1 is relative up and down with the buffed surface position that following bistrique 2 is arranged at frame 1 top and two bistriques respectively, described frame 1 is positioned at the horizontal installment work dish 13 in medium position place, bistrique 3 below down, these scratch diskette 7 inside are provided with two adjacent workpiece plates 7, each workpiece plate 7 marginal position place is provided with sheet case 4, the groove 8 that takes up is offered on described case 4 tops, and the bottom of workpiece plate 7 is provided with rotating disk bistrique 5; Described bistrique 1 rear side of going up connects and goes up coil motor 10 in order to drive and bistrique 1 action of polishing is up and down gone up in control, described bistrique 3 rear sides down connect coil motor 11 down, each rotating disk bistrique 5 center position is provided with rotary tray motor 6 in order to drive using 5 spinning movements of rotating disk bistrique below being provided with and driving rotating shaft and this bistrique, and described bistrique 1 rear side of going up is provided with the elevating mechanism 9 of being furnished with lifting motor 12.During work, by up and down two polishing disk bistriques rotations at a high speed in opposite directions, about two working rotary tables transmit workpiece, workpiece box is positioned on the card, can snap into workpiece in the station of working rotary table continuously, thereby reach continuously workpiece is carried out attrition process.

Claims (5)

1. disc type Twp-sided polishing machine that is used for the IC-card attrition process, comprise bistrique (1), following bistrique (2), rotating disk bistrique (5), elevating mechanism (9) and lifting motor (12), last bistrique (1) is arranged at frame (1) top respectively with following bistrique (2), it is characterized in that: described upward bistrique (1) is relative up and down with following bistrique (2) buffed surface separately, described frame (1) is positioned at bistrique (3) below medium position place's installment work dish (13) down, and this scratch diskette (7) inside is provided with adjacent two workpiece plates (7); Described bistrique (1) rear side of going up is provided with the be furnished with lifting motor elevating mechanism (9) of (12).
2. the disc type Twp-sided polishing machine that is used for the IC-card attrition process according to claim 1 is characterized in that: each workpiece plate (7) marginal position place is provided with sheet case (4).
3. the disc type Twp-sided polishing machine that is used for the IC-card attrition process according to claim 2 is characterized in that: the groove that takes up (8) is offered on described case (4) top.
4. the disc type Twp-sided polishing machine that is used for the IC-card attrition process according to claim 1 is characterized in that: the described bistrique (1) of going up is connected coil motor (10) and following coil motor (11) respectively with following bistrique (3) rear side.
5. the disc type Twp-sided polishing machine that is used for the IC-card attrition process according to claim 1 is characterized in that: each rotating disk bistrique (5) center position is provided with rotary tray motor (6) below being provided with and driving rotating shaft and this bistrique.
CN2010101924935A 2010-06-03 2010-06-03 Disc type double-sided polishing machine for IC (identity card) grinding processing Pending CN102267080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010101924935A CN102267080A (en) 2010-06-03 2010-06-03 Disc type double-sided polishing machine for IC (identity card) grinding processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010101924935A CN102267080A (en) 2010-06-03 2010-06-03 Disc type double-sided polishing machine for IC (identity card) grinding processing

Publications (1)

Publication Number Publication Date
CN102267080A true CN102267080A (en) 2011-12-07

Family

ID=45049642

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010101924935A Pending CN102267080A (en) 2010-06-03 2010-06-03 Disc type double-sided polishing machine for IC (identity card) grinding processing

Country Status (1)

Country Link
CN (1) CN102267080A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1441713A (en) * 2000-05-31 2003-09-10 三菱住友硅晶株式会社 Method of polishing semiconductor wafer by using double-sided polisher
US20050159089A1 (en) * 2003-12-22 2005-07-21 Kashiwara Machine Mfg. Co., Ltd. Double-side polishing method and apparatus
CN2843743Y (en) * 2005-10-12 2006-12-06 廖敌江 Four main cone double-ended grinding machine
CN101058161A (en) * 2007-05-18 2007-10-24 宁波甬微集团有限公司 Double face abrading machine
CN101106082A (en) * 2006-07-13 2008-01-16 硅电子股份公司 Method for the simultaneous double-side grinding of a plurality of semiconductor wafers, and semiconductor wafer having outstanding flatness
EP1970159A1 (en) * 2007-03-13 2008-09-17 Peter Wolters GmbH Processing machine with means for recording processing parameters
CN101264585A (en) * 2007-03-15 2008-09-17 不二越机械工业株式会社 Double-side polishing apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1441713A (en) * 2000-05-31 2003-09-10 三菱住友硅晶株式会社 Method of polishing semiconductor wafer by using double-sided polisher
US20050159089A1 (en) * 2003-12-22 2005-07-21 Kashiwara Machine Mfg. Co., Ltd. Double-side polishing method and apparatus
CN2843743Y (en) * 2005-10-12 2006-12-06 廖敌江 Four main cone double-ended grinding machine
CN101106082A (en) * 2006-07-13 2008-01-16 硅电子股份公司 Method for the simultaneous double-side grinding of a plurality of semiconductor wafers, and semiconductor wafer having outstanding flatness
EP1970159A1 (en) * 2007-03-13 2008-09-17 Peter Wolters GmbH Processing machine with means for recording processing parameters
CN101264585A (en) * 2007-03-15 2008-09-17 不二越机械工业株式会社 Double-side polishing apparatus
CN101058161A (en) * 2007-05-18 2007-10-24 宁波甬微集团有限公司 Double face abrading machine

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Application publication date: 20111207