CN102244971A - Atmospheric-pressure direct current arc discharge plasma generator and cathode manufacturing method - Google Patents
Atmospheric-pressure direct current arc discharge plasma generator and cathode manufacturing method Download PDFInfo
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- CN102244971A CN102244971A CN2010101715944A CN201010171594A CN102244971A CN 102244971 A CN102244971 A CN 102244971A CN 2010101715944 A CN2010101715944 A CN 2010101715944A CN 201010171594 A CN201010171594 A CN 201010171594A CN 102244971 A CN102244971 A CN 102244971A
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Abstract
The invention discloses an atmospheric-pressure direct current arc discharge plasma generator and a cathode manufacturing method. The invention is characterized in that: when manufacturing the atmospheric-pressure direct current arc discharge plasma generator, at least two cathodes are made on the generator; one cathode is made of LaB6 materials and the other cathode are made of Tungsten metal materials; a direct current source is adopted in the atmospheric-pressure direct current arc discharge plasma generator. By using the invention, power of generating plasmas can be reduced and generation of the high density plasmas can be guaranteed. A power supply energy conversion rate is high. Operation and maintenance are convenient. Service life is long and equipment is simple. The generator has many other advantages. The invention is especially suitable for carrying out rapid film deposition.
Description
Technical field
The present invention relates to a kind of atmospheric pressure DC arc discharge plasma generating means and negative electrode manufacture method, belong to DC arc discharge plasma technique field.
Background technology
At present, PECVD(plasma enhanced chemical vapor deposition) technology has been widely used in fields such as depositing of thin film such as plasma etching and amorphous silicon hydride.In recent years, fast development along with the PECVD deposition technique, the requirement of article on plasma body source quality of beam is also more and more higher, particularly to low energy and highdensity requirement, because the low energy high density not only can improve film deposition rate, and can reduce the requirement that the plasma intermediate ion bombards the damage that film is caused, thereby improve the service efficiency and the economic benefit of PECVD technology.In this technique device, key technology is a plasma generator.At present widely used is the radio frequency plasma body source.Thereby the basic principle of this radio frequency plasma body source is to make gas ionization produce plasma by the method that high frequency glow discharges.Normally hundreds of KHZ is to several MHZ for the frequency of its current source, and the most frequently used frequency is 13.56MHZ.The rf induction plasma source is by heating the generation plasma around quartz glass tube or the current coil that is seated in the quartz window top.Radio frequency capacitively coupled plasma source is to discharge and produce plasma by than orchestration radio-frequency voltage being added to two parallel plate electrodes.But these single source radio frequency plasma body sources can not article on plasma volume densitys (decision film deposition rate) and are bombarded on the substrate ion angular distribution and energy (influencing film quality) and independently control.In the prior art, in order to improve plasma density, must increase the voltage of radio-frequency power supply, can cause sheath layer electromotive force and bombard that energy of ions also will increase on the substrate thereupon yet do like this, and the bombardment of high-octane ion will cause the sputter of deposit film and the damage of film.Therefore, the result of use of existing plasma generator still is not ideal enough.
Summary of the invention
The objective of the invention is: provide a kind of power, the while that can reduce the generation plasma can guarantee to produce high-density plasma again and can guarantee power supply energy transfer ratio height, operation and maintenance convenience, long service life, the simple atmospheric pressure DC arc of equipment discharge plasma generating means and negative electrode manufacture method, to overcome the deficiencies in the prior art.
The present invention is achieved in that the negative electrode manufacture method of a kind of atmospheric pressure DC arc discharge plasma generating means of the present invention is when making atmospheric pressure DC arc discharge plasma generating means, on this device, make two negative electrodes at least, and with one of them negative electrode employing LaB6(hexaboride) material, and other negative electrode adopts the tungsten metal material to make, and adopts DC power supply as atmospheric pressure DC arc discharge plasma generating means.
A kind of atmospheric pressure DC arc discharge plasma generating means according to method making of the present invention, comprise the discharge chamber, above the discharge chamber, be provided with LaB6 negative electrode and tungsten cathode, top at the discharge chamber, be provided with the gas source interface that is connected with the working gas source between LaB6 negative electrode and the tungsten cathode, bottom at the discharge chamber is provided with insulating barrier, have cooled plate at insulating barrier, below cooled plate, be provided with the anode that anode nozzle is installed, at the LaB6 negative electrode, tungsten cathode is provided with the joint that is connected with DC power supply with anode, is provided with to make anode and the identical passage of discharge chamber in insulating barrier and cooled plate.
On above-mentioned discharge chamber, be fixed with the negative electrode coolant jacket that is provided with intake-outlet, and LaB6 negative electrode and tungsten cathode are installed in respectively in the negative electrode coolant jacket.
On above-mentioned arc chamber, also be provided with water inlet and delivery port, and in arc chamber, be provided with the cooling water pipe that is connected with water inlet and delivery port.
On above-mentioned anode, be provided with the cooling water circulation canal.
The diameter of aforementioned channels is 3～8 millimeters.
The diameter of above-mentioned passage is preferably 4.5 millimeters.
Because having adopted technique scheme, DC arc discharge plasma source of the present invention is to utilize the DC arc discharge to make gas ionization and produce plasma.Its basic principle is that working gas enters the plasma source arc chamber, and the hot cathode emitting electrons forms electron cloud near negative electrode.The bombarding gas atom causes ionization under cathode sheath layer electric field quickens, and forms the plasma electrically arc discharge.Compare with single source radio frequency plasma, have advantages such as the independently control of plasma density and ion energy, plasma density, electronics and ion temperature height, plasma distribution be even.The present invention passes through a negative electrode use LaB6 and a tungsten electrode material therein, and tungsten cathode wherein has two effects, and the one, produce electronics, the 2nd, can heat the LaB6 negative electrode to more than the 1500K.Tungsten cathode and LaB6 negative electrode produce a large amount of electronics, bump ionization, excited gas produces plasma thereby these cathode electronics obtain energy and gas under sheath layer electric field quickens, and making the diameter of plasma by a multistage suspension then is 4.5 millimeters passage arrival anode.The present invention compares with traditional simple tungsten cathode, and composite cathode of the present invention can reduce consumed power more than 50%, and can prolong the life-span of negative electrode.In addition, the present invention guarantees to obtain effectively high-density plasma by using the method for LaB6 again when reducing the generation plasma power.Combined type negative electrode provided by the present invention can effectively cool off it by cooling water.So, the present invention compared with prior art, the present invention not only has can reduce the power that produces plasma, can guarantee to produce the advantage of high-density plasma again simultaneously, but also has advantages such as power supply energy transfer ratio height, operation and maintenance all make things convenient for, long service life.The present invention is particularly suitable for carrying out quick thin film deposition and uses.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Drawing reference numeral explanation: 1-passage, 2-LaB6 negative electrode, 3-gas source interface, 4-tungsten cathode, the 5-chamber that discharges, the 6-cooling water pipe, 7-insulating barrier, 8-cooled plate, 9-anode, 10-anode nozzle, the 11-intake-outlet, 12-negative electrode coolant jacket, 13-water inlet, 14-delivery port, 15-cooling water circulation canal.
Embodiment
Below in conjunction with drawings and Examples the present invention is done further to say in detail.
Embodiments of the invention: when making atmospheric pressure DC arc discharge plasma generating means, make according to method of the present invention, promptly on this device, make two negative electrodes at least, one of them negative electrode is adopted the LaB6(hexaboride) material, and other negative electrode adopts the tungsten metal material to make, and adopts DC power supply as atmospheric pressure DC arc discharge plasma generating means.
When making atmospheric pressure DC arc discharge plasma generating means of the present invention, the structural representation of atmospheric pressure DC arc discharge plasma generating means of the present invention as shown in Figure 1, the materials used of its discharge chamber 5 can be the same with prior art, during making, the quantity of a LaB6 negative electrode 2 and a tungsten cathode 4(tungsten cathode 4 is installed respectively above discharge chamber 5 can also installs 2 or 2～6) according to the needs that use, and at each LaB6 negative electrode 2, tungsten cathode 4 is all produced a joint that can convenient be connected with DC power supply, then at the top of discharging chamber 5, make the gas source interface 3 that energy is connected with the working gas source between LaB6 negative electrode 2 and the tungsten cathode 4, a layer insulating 7 is installed in bottom at discharge chamber 5, and install cooled plate 87 times at insulating barrier, the quantity of cooled plate 8 can be determined according to practical needs; In fixed installation below the cooled plate 8, be provided with the anode 9 of anode nozzle 10, on anode 9, also make a joint that can convenient be connected with DC power supply, anode 9 can adopt anode of the prior art, in insulating barrier 7 and cooled plate 8, produce the passage 1 that can make anode 9 and discharge chamber 5 identical, the diameter of passage 1 is 3～8 millimeters, under normal conditions, the diameter of passage 1 can be made as 4.5 millimeters; In order to reach better cooling effect, can on discharge chamber 5, make the negative electrode coolant jacket 12 that is fixed with intake-outlet 11, and LaB6 negative electrode 2 and tungsten cathode 4 are installed in respectively in the negative electrode coolant jacket 12; On arc chamber 5, produce water inlet 13 and delivery port 14, and in arc chamber 5, install the cooling water pipe 6 that can be connected with water inlet 13 and delivery port 14; For cooling anodes 9 better, can on anode 9, make cooling water circulation canal 15 that an energy is connected with cooling water source.During use, only need the negative pole of DC power supply is connected on the DC power supply jointing of LaB6 negative electrode 2 and tungsten cathode 4, the positive pole of DC power supply is connected with anode gets final product.
Claims (7)
1. the negative electrode manufacture method of an atmospheric pressure DC arc discharge plasma generating means, it is characterized in that: when making atmospheric pressure DC arc discharge plasma generating means, on this device, make two negative electrodes at least, one of them negative electrode is adopted the LaB6 material, and other negative electrode adopts the tungsten metal material to make, and adopts DC power supply as atmospheric pressure DC arc discharge plasma generating means.
2. atmospheric pressure DC arc discharge plasma generating means, comprise discharge chamber (5), it is characterized in that: the top at discharge chamber (5) is provided with LaB6 negative electrode (2) and tungsten cathode (4), top at discharge chamber (5), be provided with the gas source interface (3) that is connected with the working gas source between LaB6 negative electrode (2) and the tungsten cathode (4), bottom at discharge chamber (5) is provided with insulating barrier (7), have cooled plate (8) at insulating barrier (7), the anode (9) that is provided with anode nozzle (10) is installed in the below of cooled plate (8), in LaB6 negative electrode (2), tungsten cathode (4) is provided with the joint that is connected with DC power supply with anode (9), is provided with to make anode (9) and the identical passage (1) of discharge chamber (5) in insulating barrier (7) and cooled plate (8).
3. atmospheric pressure DC arc discharge plasma generating means according to claim 2, it is characterized in that: in discharge chamber (5), be fixed with the negative electrode coolant jacket (12) that is provided with intake-outlet (11), and LaB6 negative electrode (2) and tungsten cathode (4) are installed in respectively in the negative electrode coolant jacket (12).
4. atmospheric pressure DC arc discharge plasma generating means according to claim 2, it is characterized in that: on arc chamber (5), be provided with water inlet (13) and delivery port (14), and in arc chamber (5), be provided with the cooling water pipe (6) that is connected with water inlet (13) and delivery port (14).
5. atmospheric pressure DC arc discharge plasma generating means according to claim 2 is characterized in that: be provided with cooling water circulation canal (15) on anode (9).
6. atmospheric pressure DC arc discharge plasma generating means according to claim 2, it is characterized in that: the diameter of passage (1) is 3～8 millimeters.
7. atmospheric pressure DC arc discharge plasma generating means according to claim 6, it is characterized in that: the diameter of passage (1) is 4.5 millimeters.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010101715944A CN102244971A (en) | 2010-05-13 | 2010-05-13 | Atmospheric-pressure direct current arc discharge plasma generator and cathode manufacturing method |
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| CN2010101715944A CN102244971A (en) | 2010-05-13 | 2010-05-13 | Atmospheric-pressure direct current arc discharge plasma generator and cathode manufacturing method |
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| CN2012103175776A Division CN102833936A (en) | 2010-05-13 | 2010-05-13 | Atmosphere DC (direct current) arc discharge plasma generator |
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| CN102244971A true CN102244971A (en) | 2011-11-16 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103298233A (en) * | 2013-05-10 | 2013-09-11 | 合肥聚能电物理高技术开发有限公司 | Novel high-density negative pole plasma source |
| CN110402010A (en) * | 2019-07-15 | 2019-11-01 | 中国科学院合肥物质科学研究院 | A kind of cascade arcs cathode construction of large area high uniformity active cooling |
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| CN86206238U (en) * | 1986-08-26 | 1987-04-15 | 中国科学院高能物理研究所 | Vacuum tube with hexaboride (mb6) cathod |
| CN1103900A (en) * | 1994-10-19 | 1995-06-21 | 太原工业大学 | Synthesis of diamond film with double cathode glow discharge |
| CN1328693A (en) * | 1998-10-05 | 2001-12-26 | 三星Sdi株式会社 | Cathode material of electron beam device and preparation method thereof |
| JP2002020860A (en) * | 2000-07-06 | 2002-01-23 | Nissin Electric Co Ltd | Vacuum arc evaporation source, and film deposition system using it |
| CN1412343A (en) * | 2002-03-18 | 2003-04-23 | 太原理工大学 | Bicathode-high frequency glow ion diffusion coating equipment and its process |
| CN2718947Y (en) * | 2004-07-26 | 2005-08-17 | 王忠义 | Inner-cooled anode low-power air plasma generator |
| CN101296551A (en) * | 2007-04-25 | 2008-10-29 | 烟台龙源电力技术股份有限公司 | Association type double-cathode of plasma generator |
| US20080292812A1 (en) * | 2007-05-25 | 2008-11-27 | Juergen Ramm | Vacuum Treatment Installation and Vacuum Treatment Method |
| CN201690672U (en) * | 2010-05-13 | 2010-12-29 | 贵州翔明科技有限公司 | Atmospheric pressure direct current arc electric discharge plasma generating device |
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2010
- 2010-05-13 CN CN2010101715944A patent/CN102244971A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN86206238U (en) * | 1986-08-26 | 1987-04-15 | 中国科学院高能物理研究所 | Vacuum tube with hexaboride (mb6) cathod |
| CN1103900A (en) * | 1994-10-19 | 1995-06-21 | 太原工业大学 | Synthesis of diamond film with double cathode glow discharge |
| CN1328693A (en) * | 1998-10-05 | 2001-12-26 | 三星Sdi株式会社 | Cathode material of electron beam device and preparation method thereof |
| JP2002020860A (en) * | 2000-07-06 | 2002-01-23 | Nissin Electric Co Ltd | Vacuum arc evaporation source, and film deposition system using it |
| CN1412343A (en) * | 2002-03-18 | 2003-04-23 | 太原理工大学 | Bicathode-high frequency glow ion diffusion coating equipment and its process |
| CN2718947Y (en) * | 2004-07-26 | 2005-08-17 | 王忠义 | Inner-cooled anode low-power air plasma generator |
| CN101296551A (en) * | 2007-04-25 | 2008-10-29 | 烟台龙源电力技术股份有限公司 | Association type double-cathode of plasma generator |
| US20080292812A1 (en) * | 2007-05-25 | 2008-11-27 | Juergen Ramm | Vacuum Treatment Installation and Vacuum Treatment Method |
| CN201690672U (en) * | 2010-05-13 | 2010-12-29 | 贵州翔明科技有限公司 | Atmospheric pressure direct current arc electric discharge plasma generating device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103298233A (en) * | 2013-05-10 | 2013-09-11 | 合肥聚能电物理高技术开发有限公司 | Novel high-density negative pole plasma source |
| CN103298233B (en) * | 2013-05-10 | 2016-03-02 | 合肥聚能电物理高技术开发有限公司 | High density cathode plasma body source |
| CN110402010A (en) * | 2019-07-15 | 2019-11-01 | 中国科学院合肥物质科学研究院 | A kind of cascade arcs cathode construction of large area high uniformity active cooling |
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Application publication date: 20111116 |