CN102243382A - Liquid crystal display device and manufacturing method as well as detection and improvement device thereof - Google Patents
Liquid crystal display device and manufacturing method as well as detection and improvement device thereof Download PDFInfo
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- CN102243382A CN102243382A CN2010101786437A CN201010178643A CN102243382A CN 102243382 A CN102243382 A CN 102243382A CN 2010101786437 A CN2010101786437 A CN 2010101786437A CN 201010178643 A CN201010178643 A CN 201010178643A CN 102243382 A CN102243382 A CN 102243382A
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Abstract
The invention provides a liquid crystal display device and a manufacturing method as well as a detection and improvement device thereof. The liquid crystal display device comprises a substrate, a pixel electrode and a common electrode, wherein the pixel electrode and the common electrode are arranged on the substrate and are spaced by a first distance; and the liquid crystal display device further comprises a sensing capacitor arranged on the substrate, wherein the sensing capacitor comprises a first electrode and a second electrode which are arranged on the substrate, and the first electrode and the second electrode are spaced by a second distance associated to the first distance. In the invention, by arranging the sensing capacitor on the liquid crystal display device, the capacitance of the sensing capacitor can be detected conveniently, and gamma regulation is facilitated, so that the influence of dimensional change to the transmissivity of the liquid crystal display device is ameliorated and the identical display effect can be achieved by different displayer individuals.
Description
Technical field
The present invention relates to a kind of display device, relate in particular to a kind of liquid crystal indicator and method for making, also relate to a kind of pick-up unit and method of liquid crystal mesogens display device, relate to a kind of device and method that improves of liquid crystal indicator transmitance again.
Background technology
Liquid crystal indicator (Liquid Crystal Display, LCD) have low pressure, little power consumption, display message amount big, be easy to advantage such as colorize, now be widely used in the display device of electronic equipments such as robot calculator, electronic notebook, mobile phone, video camera, HDTV.Different with cathode-ray tube (CRT) or plasm display device, liquid crystal panel self is not luminous, reaches the demonstration purpose but rely on extraneous reflection of light of control and transmission to form different contrast.The deflection of liquid crystal molecule in the vertical direction causes display viewing angles narrower in the prior art.Therefore the wide viewing angle technology is arisen at the historic moment, and (In PlaneSwitching IPS) is exactly wherein have much advantage a kind of in rotation in the plane.
LCD generally includes liquid crystal board that is used for display image and the drive part that applies drive signal to liquid crystal board.Liquid crystal board has the first relative glass substrate and second glass substrate, between first glass substrate and second glass substrate liquid crystal layer is arranged.Many the data lines that IPS type LCD first glass substrate is provided with in one direction many gate lines arranging at regular intervals, arranges at regular intervals perpendicular to gate line, and the peripheral wiring of transmission electric signal; Gate line and data line limit and form the rectangular pixel region, have a plurality of pixel electrodes, public electrode and thin film transistor (TFT) in the pixel region.Second glass substrate is provided with the light black-matrix layer that is used to cover other parts except that pixel region, and the color filter layer of Show Color.
The principle of IPS type LCD is that pixel electrode and public electrode produce plane electric fields, makes liquid crystal molecule rotate in the plane parallel with substrate of glass to change the transmitance of light, has avoided the deflection of liquid crystal molecule in the vertical direction, reaches bigger observation visual angle.In view of the transmitance and the pixel electrode spacing of IPS liquid crystal indicator has very strong correlativity, accurately control the pixel electrode spacing and seem particularly important.
The Chinese patent application of application number 200610145260.3 (hereinafter to be referred as background patents) discloses a kind of pixel electrode structure of display device.As shown in Figure 1 and Figure 2, in the pixel region 35 of substrate 60, form public electrode 30; The insulation course 36 that covers public electrode 30 is set on public electrode 30; Pixel electrode 50 is set on the end face of insulation course 36.Pixel electrode 50 comprises along the juxtaposed pixel electrode 55 of direction parallel to each other, described pixel electrode 55 crooked obtuse-angulate curved shapes.Along with pixel electrode 55 from a side 32 of pixel region 35 to opposite side 34, the width W 1 of pixel electrode 55 is tending towards increasing gradually, the spacing L10 between adjacent two pixel electrodes 55 also increases gradually.Spacing and the width of background patents by changing pixel electrode 55 successively, thus the display quality that prevents image descends.
But can there be certain deviation in manufacture craft in the batch making display process, has deviation between practical structures after making some displays make and the normal structure, causes the transmitance of these displays there are differences.At this moment,, then need change the structure of display device, perhaps the error finished product be given up, make new display device again, so increase the cost of manufacture of display device greatly if will solve this technical problem.
Summary of the invention
The present invention wants the technical solution problem to be, can detect easily in the batch making liquid crystal indicator process and produce deviation in the manufacture craft process, with the convenient difference of adjusting display.
The invention provides a kind of liquid crystal indicator and comprise a substrate, be arranged on pixel electrode and public electrode on institute's substrate, have first distance between described pixel electrode and the described public electrode; It is characterized in that, described display further comprises the sensing capacitance that is arranged at described substrate, described sensing capacitance comprises first electrode and second electrode that is arranged on the substrate, has the second distance that is associated with first distance between described first electrode and second electrode.
Described pixel electrode and public electrode form pixel capacitance, and the capacitance of described sensing capacitance is greater than the capacitance of described pixel capacitance.
The capacitance of described sensing capacitance is greater than 10 times of the capacitances of described pixel capacitance.
Described substrate comprises viewing area and non-display area, and described pixel electrode and public electrode are positioned at described viewing area, and first electrode and second electrode of described sensing capacitance are positioned at described non-display area.
Described liquid crystal indicator is rectangular, and described non-display area is around described viewing area, and described liquid crystal indicator comprises that at least 4 sensing capacitances are separately positioned on four jiaos of liquid crystal indicator.
Also comprise the diaphragm that covers described substrate, described pixel electrode, described public electrode, described first electrode and described second electrode.
Also comprise insulation course and diaphragm, described pixel electrode and described first electrode are positioned at described insulation course, and described public electrode and described second electrode are positioned at described diaphragm.
Has first gauged distance between pre-designed pixel electrode, the public electrode, have second gauged distance between first electrode of pre-designed sensing capacitance, second electrode, the difference between described first distance, first gauged distance equates with the difference between described second distance, second gauged distance.
Also comprise the outermost cabling that is positioned on the non-display area substrate, be used for transmission of electric signals, have the 3rd distance between described outermost cabling and the described sensing capacitance to pixel electrode and public electrode.
Described the 3rd distance is greater than 600 microns.
Also comprise the first metal connecting portion, the second metal connecting portion; The described first metal connecting portion, first end is connected with first electrode of sensing capacitance, and the first metal connecting portion, second end is connected to the liquid crystal indicator outside; The described second metal connecting portion, first end is connected with second electrode of sensing capacitance, and the second metal connecting portion, second end is connected to the liquid crystal indicator outside.
The present invention also provides a kind of pick-up unit that is used to detect described liquid crystal indicator, comprise capacitive detection module and judge module, described detection module is suitable for obtaining the capacitance of sensing capacitance, described judge module is suitable for obtaining difference between the second distance and second gauged distance according to described capacitance, and described second gauged distance is first electrode of pre-designed sensing capacitance, the gauged distance between second electrode.
Described judge module comprises storage unit, and described storage unit is preserved the corresponding relation between the capacitance of difference between second distance, second gauged distance and sensing capacitance.
Described capacitive detection module comprises signal source, first resistance and signal processing unit; First end of signal source and first end of first resistance all are connected to the first input end of signal processing unit; Second end of signal source and second electrode of sensing capacitance all are connected to ground; Second end of first resistance and first electrode of sensing capacitance all are connected to second input end of signal processing unit; The capacitance of the output terminal output sensing capacitance of signal processing unit.
The secondary signal that first signal that described signal processing unit receives first input end and second input end receive is handled, obtain the variable quantity of first signal and secondary signal amplitude and phase place, export the capacitance of sensing capacitance according to the variation of amplitude or phase place.
Described signal processing unit is directly exported the described capacitance that obtains according to the variable signal of amplitude or phase place.
Described signal processing unit carries out mean value computation to the described capacitance that obtains according to the variable signal of amplitude or phase place, exports the capacitance of the sensing capacitance of described process mean value computation.
The present invention provides a kind of device that improves that is used to improve the described liquid crystal indicator transmitance of claim 1 again, comprises capacitive detection module, judge module and correction module, and wherein, described detection module is suitable for by detecting the capacitance of sensing capacitance; Described judge module is suitable for obtaining difference between second distance, second gauged distance according to described capacitance, and described second gauged distance is first electrode of pre-designed sensing capacitance, the gauged distance between second electrode; Described correction module is suitable for obtaining corresponding with it gamma value according to the difference between described second distance, second gauged distance, adjusts the brightness of described liquid crystal indicator according to described gamma value.
Described correction module comprises data cell, and described data unit stores the difference between described second distance, second gauged distance and the corresponding relation of gamma value.
Described judge module comprises storage unit, and described storage unit is preserved the corresponding relation between the capacitance of difference between second distance, second gauged distance and sensing capacitance.
The present invention also provides a kind of method for making of described liquid crystal indicator, it is characterized in that, comprise: first electrode and second electrode that on substrate, form pixel electrode, public electrode and sensing capacitance, described pixel electrode and described first electrode form simultaneously, and described public electrode and described second electrode form simultaneously.
First electrode and second electrode of described pixel electrode, public electrode, sensing capacitance form simultaneously.
The step that first electrode of described pixel electrode, public electrode, sensing capacitance and second electrode form simultaneously comprises: first mask plate and substrate are provided, form first conducting film and first photoresist film successively on the surface of described substrate; Use described first mask plate to form the photoresist graphical set; Make with photoresist graphical set first conducting film be carried out etching, form first electrode, second electrode of pixel electrode, public electrode and sensing capacitance as etching barrier layer; Remove the photoresist graphical set.
Also comprise and form the diaphragm that covers described pixel electrode, public electrode, first electrode and second electrode; Form peripheral connecting line on diaphragm, the described sensing capacitance of described peripheral connecting line distance has the 3rd distance.
Described pixel electrode and described first electrode form simultaneously, the step that described public electrode and described second electrode form simultaneously comprises: second mask plate, the 3rd mask plate and substrate are provided, form first conducting film and first photoresist film successively on the surface of described substrate; Use second mask plate to form the first photoresist graphical set; Use the first photoresist graphical set as etching barrier layer, first conducting film is carried out etching, form first electrode of pixel electrode and sensing capacitance; Remove the first photoresist graphical set, form insulation course, second conducting film and second photoresist film; Use the 3rd mask plate to form the second photoresist graphical set; Use the second photoresist graphical set as etching barrier layer, second conducting film is carried out etching, form second electrode of public electrode and sensing capacitance; Remove the second photoresist graphical set.
Also comprise and form the diaphragm that covers the described public electrode and second electrode; Form peripheral connecting line on diaphragm, the described sensing capacitance of described peripheral connecting line distance has the 3rd distance.
The present invention is by being provided with sensing capacitance on liquid crystal indicator, be convenient to detect the capacitance of this sensing capacitance, thereby carrying out gamma value regulates, utilize the mode of optical compensation to improve the influence of change in size, reach different display individualities and have identical display effect for the liquid crystal indicator transmitance.
Description of drawings
Fig. 1 is the planimetric map of the pixel electrode structure of background patents display device;
The sectional view of Fig. 2 for making along Fig. 1 center line I-I '
Fig. 3 is that the display of the application first embodiment is made process flow diagram;
Fig. 4 is the process flow diagram of the embodiment of the application first embodiment;
Fig. 5-Fig. 9 is the diagrammatic cross-section that the display of the application first embodiment is made flow process;
Figure 10 is the display device structure synoptic diagram of the application first embodiment;
The sectional view of Figure 11 for making along Figure 10 center line A-A ';
Figure 12-Figure 13 is the diagrammatic cross-section that the display of the other embodiment of the application is made flow process;
Figure 14 is that the display of the application second embodiment is made process flow diagram;
Figure 15 is the process flow diagram of the embodiment of the application second embodiment;
Figure 16-21 is the diagrammatic cross-section that the display of the application second embodiment is made flow process;
Figure 22 is the display device structure synoptic diagram of the application second embodiment;
The sectional view of Figure 23 for making along Figure 22 center line A-A ';
Figure 24 is the application's capacitive detection module structural representation.
Embodiment
Below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.In the following passage, with way of example the present invention is described more specifically with reference to accompanying drawing.Will be clearer according to following explanation and claims advantages and features of the invention.
The method for making of liquid crystal indicator of the present invention comprises: first electrode and second electrode that form pixel electrode, public electrode and sensing capacitance on substrate, described pixel electrode and described first electrode form simultaneously, and described public electrode and described second electrode form simultaneously.
As shown in Figure 3, the method for making of the liquid crystal indicator of first embodiment of the invention comprises: S100 provides first mask plate with first mask pattern and second mask pattern; S200 uses first mask pattern of first mask plate to form pixel electrode and public electrode on the substrate of viewing area, uses second mask pattern of first mask plate to form sensing capacitance simultaneously on the substrate of non-display area.
Among the step S100, as shown in Figure 5, first mask plate 300 comprises between first mask substrate 301 that formed by transparent material and a plurality of first shielding portion, 302, the first shielding portions 302 and forms the exposure area.First mask substrate 301 and first shielding portion 302 form first mask pattern 311 and second mask pattern 312.Have between first mask pattern, 311 shielding portions 302 between the first shielding portion distance L, 1, the first mask pattern, 311 shielding portions 302 and have the second shielding portion distance L 2.
As shown in Figure 4, step S200 comprises: step S201, a substrate is provided, and on the surface of substrate, form first conducting film and first photoresist film successively; Step S202 uses first mask pattern of first mask plate and second mask pattern to form the photoresist graphical set; Step S203 makes with photoresist graphical set as etching barrier layer first conducting film be carried out etching, forms first electrode, second electrode of pixel electrode, public electrode and sensing capacitance; Step S204 removes the photoresist graphical set.
Among the step S201, as shown in Figure 6, substrate 10 is divided into viewing area 101 and non-display area 102, forms first conducting film 21 and first photoresist film 22 on the surface of substrate 10 successively.Substrate 10 can be glass substrate, perhaps for having the glass substrate of silicon nitride layer.First conducting film 21 can utilize the deposition technology of sputter etc. to form, and first conducting film, 21 materials can be tin indium oxide (ITO), indium zinc oxide (IZO), decrystallized tin indium oxide (a-ITO), aluminum or aluminum alloy.
Among the step S202, as shown in Figure 7, use optionally expose first photoresist film 22 and developing of first mask pattern 311 of first mask plate 300, form the first photoresist figure 221 and the second photoresist figure 222, use optionally expose first photoresist film 22 and developing of second mask pattern 312 of first mask plate 300 simultaneously, form the 3rd photoresist figure 223 and the 4th photoresist figure 224.Wherein, have the first photoresist distance L 11 between the first photoresist figure 221 of formation and the second photoresist figure 222, have the second photoresist distance L 12 between the 3rd photoresist figure 223 of formation and the 4th photoresist figure 224.
Among the step S203, as shown in Figure 8, utilize the first photoresist figure 221 and the second photoresist figure 222 as etching barrier layer, first conducting film 21 is carried out etching, form pixel electrode 11 and public electrode 12, utilize the 3rd photoresist figure 223 and the 4th photoresist figure 224 as etching barrier layer simultaneously, first conducting film 21 is carried out etching, form first electrode 131 and second electrode 132 of sensing capacitance.Wherein, have first distance L 21 between the pixel electrode 11 of formation and the public electrode 12, have second distance L22 between first electrode 131 of sensing capacitance and second electrode 132.
Among the step S204, as shown in Figure 9, utilize cineration technics to remove the first photoresist figure 221, the second photoresist figure 222, the 3rd photoresist figure 223, the 4th photoresist figure 224.
Preferable, remove the photoresist graphical set and form diaphragm afterwards, on the diaphragm on the non-display area substrate, form the outermost cabling, the material of described diaphragm can be silicon nitride.The formation position described sensing capacitance of distance of described outermost cabling has the 3rd distance, and described the 3rd distance makes the work of described sensing capacitance not be subjected to the influence of the control signal in the outermost cabling substantially.Selectable, described the 3rd distance is greater than 600 microns.The technology that forms peripheral wiring and diaphragm can realize according to those skilled in the art's common technology means, repeats no more herein.
The structure of the liquid crystal indicator 1 that forms according to the liquid crystal indicator method for making of first embodiment as shown in figure 10, liquid crystal indicator 1 comprises substrate 10, is arranged on pixel electrode 11, public electrode 12 on institute's substrate, and sensing capacitance 13.Described liquid crystal indicator 1 is rectangular, and substrate 10 is divided into viewing area 101 and non-display area 102, and described non-display area 102 is around described viewing area 101.Described liquid crystal indicator 1 along the cross-section structure of A-A ' as shown in figure 11, pixel electrode 11 and public electrode 12 are positioned on the substrate 10 of viewing area 101, have first distance L 21 between pixel electrode 11 and the described public electrode 12.Sensing capacitance 13 is positioned on the substrate 10 of non-display area 102, has between first electrode 131 and second electrode, 132, the first electrodes and described second electrode and has second distance L22.The quantity of described sensing capacitance 13 can be provided with according to need.In one embodiment, described liquid crystal indicator comprises at least 4 sensing capacitances, and described 4 sensing capacitances are separately positioned on four jiaos of rectangle liquid crystal indicator 1.
Described first distance L 21 is associated with described second distance L22.Particularly, difference between described first distance L 21 and first gauged distance is first apart from the relative error value, difference between the described second distance L22 and second gauged distance is described second distance relative error value, and described first is relevant with described second distance relative error value apart from the relative error value.Described first gauged distance is pre-designed pixel electrode, the criterion distance value between the public electrode; Described second gauged distance is first electrode, the second distance between electrodes standard value of pre-designed sensing capacitance.Ideally first distance L 21 between the pixel electrode 11 of Xing Chenging, the public electrode 12 is first gauged distance, and ideally first electrode 131 of the sensing capacitance 13 of Xing Chenging, the second distance L22 between second electrode 132 are second gauged distance.Describedly be meant ideally that influence is made the error of all factors of pixel electrode, public electrode of liquid crystal indicator all in admissible scope.
When first distance L 21 between pixel electrode 11, the public electrode 12 equates with first gauged distance, first electrode 131 of sensing capacitance 13, the second distance L22 between second electrode 132 equate that with second gauged distance promptly first is all zero apart from relative error value and second distance relative error value.Under this kind situation, pixel electrode 11 and public electrode 12 produce electric field in the course of the work, make liquid crystal molecule 17 normal deflections, and liquid crystal indicator has the transmitance of standard, makes image normally show.
If forming the photoresist graphical set or forming in the etching technics of pixel electrode 11, public electrode 12, sensing capacitance 13, the deviation of operation or the variation of process conditions appear, the factor error that causes influencing manufacture craft exceeds admissible scope, make and win non-vanishingly, have certain deviation between liquid crystal indicator transmitance that produce this moment and the standard transmitance apart from relative error value, second distance relative error value.In view of sensing capacitance 13 forms under identical processing step and condition with the same mask plate simultaneously with pixel electrode 11, public electrode 12, so first electrode 131 of sensing capacitance 13 and the formation of second electrode 132 are subjected to the influence with pixel electrode 11, public electrode 12 same degree, make that second distance relative error value is non-vanishing and equate substantially apart from the relative error value with first.
In one embodiment, as shown in figure 12, use the deviation that produces exposure technology in first mask pattern 311 of first mask plate 300 and the step that second mask pattern 312 forms the photoresist graphical set, the first photoresist figure 221 and the distance of first photoresist between the second photoresist figure 222 that make distance should be L1 become L11=L1+ Δ L.Owing to be subjected to the influence of same degree exposure technology deviation, the 3rd photoresist figure 223 and the distance of second photoresist between the 4th photoresist figure 224 that make distance should be L2 become L21=L2+ Δ L.
As shown in figure 13, first gauged distance that ideally forms between pixel electrode 11, the public electrode 12 is the first shielding portion distance L 1 of first mask pattern 311 of mask plate 300, first electrode 131 of sensing capacitance, second gauged distance between second electrode 132 are the second shielding portion distance L 2 of second mask pattern 312 of mask plate 300, and the liquid crystal indicator of producing this moment has the transmitance of standard.
But, the utilization of this specific embodiment has produced the photoresist graphical set of range deviation first conducting film 21 has been carried out etching, the range deviation that pixel electrode 11, first distance L 21 between the public electrode 12 and first gauged distance that forms has Δ L, promptly first is Δ L apart from the relative error value; The range deviation that first electrode 131, the second distance L22 between second electrode 132 and second gauged distance that forms and second gauged distance have Δ L, promptly second distance relative error value is Δ L.The liquid crystal indicator transmitance that produce this moment changes, and the standard capacitance value that the capacitance of sensing capacitance is corresponding with second gauged distance is compared variation has also been taken place.
Preferable, as shown in figure 11, liquid crystal indicator also has diaphragm 26 and the outermost cabling 14 that is positioned on the non-display area substrate.
Described diaphragm 26 covers first electrode 131 and second electrode 132 of described pixel electrode 11, public electrode 12, sensing capacitance 13.Diaphragm 26 can utilize the deposition technology of vapour deposition etc. to form, and diaphragm 26 materials can be silicon nitride.
Has the 3rd distance L 3 between described sensing capacitance 13 and the outermost cabling 14, described outermost cabling 14 is used for transmission and controls signal to public electrode 11, pixel electrode 12, and described the 3rd distance L 3 makes the work of described sensing capacitance 13 not be subjected to the influence of the control signal in the outermost cabling 14 substantially.Selectable, described the 3rd distance L 3 is greater than 600 microns.
Liquid crystal indicator of the present invention can also have the first metal connecting portion, the second metal connecting portion in the diaphragm 26 on non-display area 102 substrates.The described first metal connecting portion, first end is connected with first electrode 131 of sensing capacitance 13, and the first metal connecting portion, second end is connected to the liquid crystal indicator outside, connects for the external testing terminal.The described second metal connecting portion, first end is connected with second electrode 132 of sensing capacitance 13, and the second metal connecting portion, second end is connected to the liquid crystal indicator outside, connects for the external testing terminal.
As shown in figure 11, according to the liquid crystal indicator that the liquid crystal indicator method for making of first embodiment forms, first electrode 131 and second electrode 132 of pixel electrode 11, public electrode 12, sensing capacitance 13 all are positioned at one deck diaphragm 26.
In the second embodiment of the invention, as shown in figure 14, the method for making of the liquid crystal indicator of second embodiment of the invention comprises: step S110, second mask plate with the first sub-mask pattern and second sub-mask pattern is provided, and the 3rd mask plate with the 3rd sub-mask pattern and the 4th sub-mask pattern; Step S210 uses the first sub-mask pattern of second mask plate to form pixel electrode on the substrate of viewing area, uses the second sub-mask pattern of second mask plate to form first electrode of sensing capacitance simultaneously on the substrate of non-display area; Use the 3rd sub-mask pattern of the 3rd mask plate on the substrate of viewing area, to form public electrode, use the 4th sub-mask pattern of the 3rd mask plate on the substrate of non-display area, to form second electrode of sensing capacitance simultaneously.
Among the step S110; as shown in figure 16; second mask plate 400 comprises second mask substrate 401 and a plurality of second shielding portion, 402, the second mask substrates 401 and second shielding portion, the 402 formation first sub-mask pattern 411 and the second sub-mask patterns 412 that formed by transparent material.The 3rd mask plate 500 comprises second mask substrate 501 and a plurality of the 3rd shielding portion 502, the second mask substrates 501 and the 3rd shielding portion 502 formation the 3rd sub-mask pattern 511 and the 4th sub-mask patterns 512 that formed by transparent material.
Wherein, being used to form the shielding portion that is used to form public electrode 11 in the first sub-mask pattern 411 of the shielding portion of pixel electrode 12 and second mask plate 400 in the 3rd sub-mask pattern 511 is provided with and has the first shielding portion distance L 1 between the position; Being used to form the shielding portion that is used to form first electrode 131 in the second sub-mask pattern 412 of the shielding portion of second electrode 132 and second mask plate 400 in the 4th sub-mask pattern 512 is provided with and has the second shielding portion distance L 2 between the position.
As shown in figure 15, step S210 comprises: step S211, a substrate is provided, and on the whole surface of substrate, form first conducting film and first photoresist film successively; Step S212 uses the first sub-mask pattern of second mask plate and the second sub-mask pattern to form the first photoresist graphical set; Step S213 uses the first photoresist graphical set as etching barrier layer, and first conducting film is carried out etching, forms first electrode of pixel electrode and sensing capacitance; Step S214 removes the first photoresist graphical set, forms insulation course, second conducting film and second photoresist film; Step S215 uses the 3rd sub-mask pattern of the 3rd mask plate and the 4th sub-mask pattern to form the second photoresist graphical set; Step S216 uses the second photoresist graphical set as etching barrier layer, and second conducting film is carried out etching, forms second electrode of public electrode and sensing capacitance; Step S217 removes the second photoresist graphical set.
Among the step S211, as shown in figure 17, on the whole surface of substrate 10, form first conducting film 21 and first photoresist film 22 successively.Substrate 10 can be glass substrate, perhaps for having the glass substrate of silicon nitride layer.First conducting film 21 can utilize the deposition technology of sputter etc. to form, and first conducting film, 21 materials can be tin indium oxide (ITO), indium zinc oxide (IZO), decrystallized tin indium oxide (a-ITO), aluminum or aluminum alloy.
Among the step S212, as shown in figure 18, use optionally expose first photoresist film 22 and developing of the first sub-mask pattern 411 of second mask plate 400 and the second sub-mask pattern 412, form the first photoresist figure 221 and the 3rd photoresist figure 223.
Step S213 utilizes the first photoresist figure 221 and the 3rd photoresist figure 223 as etching barrier layer, and first conducting film 21 is carried out etching, forms first electrode 131 of pixel electrode 11 and sensing capacitance.
Step S214 as shown in figure 19, removes the first photoresist graphical set, forms insulation course 23, second conducting film 24 and second photoresist film 25.Utilize cineration technics to remove the first photoresist figure 221 and the 3rd photoresist figure 223.Insulation course 23 can utilize the deposition technology of vapour deposition to form, and insulation course 23 materials can be silicon nitride.
Step S215 as shown in figure 20, uses optionally expose second photoresist film 25 and developing of the 3rd sub-mask pattern 513 of the 3rd mask plate 500 and the 4th sub-mask pattern 514, forms the second photoresist figure 222 and the 4th photoresist figure 224.When using the 3rd mask plate 500 to carry out photoetching process, be used to form the shielding portion that is used to form public electrode 11 in the first sub-mask pattern 411 of the shielding portion of pixel electrode 12 and second mask plate 400 in the 3rd sub-mask pattern 511 and be provided with and have the first shielding portion distance L 1 between the position; Being used to form the shielding portion that is used to form first electrode 131 in the second sub-mask pattern 412 of the shielding portion of second electrode 132 and second mask plate 400 in the 4th sub-mask pattern 512 is provided with and has the second shielding portion distance L 2 between the position.
Form step S216, use the second photoresist figure 222 and the 4th photoresist figure 224, second conducting film 24 is carried out etching, form second electrode 132 of pixel electrode 12 and sensing capacitance as etching barrier layer.First distance L 21 that has between pixel electrode 11 that forms and the public electrode 12, first electrode 131 and second electrode 132 of sensing capacitance 13 have second distance L22.
Step S217 as shown in figure 21, utilizes cineration technics to remove the second photoresist figure 222 and the 4th photoresist figure 224.
Preferable, remove the photoresist graphical set and form diaphragm afterwards, on diaphragm, form peripheral connecting line, the material of described diaphragm can be silicon nitride.The formation position described sensing capacitance of distance of described outermost cabling has the 3rd distance, and described the 3rd distance makes the work of described sensing capacitance not be subjected to the influence of the control signal in the outermost cabling substantially.Selectable, described the 3rd distance is greater than 600 microns.The technology that forms peripheral wiring and diaphragm can realize according to those skilled in the art's common technology means, repeats no more herein.
Difference between described first distance L 21 and first gauged distance is first apart from the relative error value, difference between described second distance and L21 second gauged distance is described second distance relative error value, and described first is relevant with described second distance relative error value apart from the relative error value.
The liquid crystal indicator that forms according to the liquid crystal indicator method for making of second embodiment with repeat no more according to the identical part of the liquid crystal indicator structure of the liquid crystal indicator method for making formation of first embodiment; both are in difference: the liquid crystal indicator that forms according to the liquid crystal indicator method for making of second embodiment; the pixel electrode 11 and first electrode 131 are positioned at same layer insulating 23, and the public electrode 12 and second electrode 132 are positioned at one deck diaphragm 26.
First apart from relative error value and second distance relative error value all zero the time, and pixel electrode 11 and public electrode 12 produce electric field in the course of the work, makes liquid crystal molecule 17 normal deflections, and liquid crystal indicator has the transmitance of standard, makes image normally show.
But, if the deviation of operation or the variation of process conditions in etching or other technology, occur, the factor error that causes influencing manufacture craft exceeds admissible scope, make that second distance relative error value is non-vanishing and equate to have certain deviation between liquid crystal indicator transmitance that produce this moment and the standard transmitance with first apart from the relative error value substantially.
Preferable, as shown in figure 23, liquid crystal indicator also has diaphragm 26 and the outermost cabling 14 that is positioned on the non-display area substrate.
Described diaphragm 26 covers second electrode 132 of described public electrode 12 and sensing capacitance 13.Diaphragm 26 can utilize the deposition technology of vapour deposition etc. to form, and diaphragm 26 materials can be silicon nitride.
Has the 3rd distance L 3 between described sensing capacitance 13 and the outermost cabling 14, described outermost cabling is used for transmission and controls signal to public electrode 11, pixel electrode 12, and described the 3rd distance L 3 makes the work of described sensing capacitance 13 not be subjected to the influence of the control signal in the outermost cabling 14 substantially.Selectable, described the 3rd distance L 3 is greater than 600 microns.
Liquid crystal indicator of the present invention can also have the first metal connecting portion, the second metal connecting portion in the diaphragm 26 on non-display area 102 substrates.The described first metal connecting portion, first end is connected with first electrode 131 of sensing capacitance 13, and the first metal connecting portion, second end is connected to the liquid crystal indicator outside, connects for the external testing terminal.The described second metal connecting portion, first end is connected with second electrode 132 of sensing capacitance 13, and the second metal connecting portion, second end is connected to the liquid crystal indicator outside, connects for the external testing terminal.The formation technology of the described first metal connecting portion, the second metal connecting portion can be finished according to the technology that those skilled in the art make the metal connecting line.
Preferable, in the above-described embodiments, pixel electrode 12 and public electrode 11 form pixel capacitance, and the capacitance of described sensing capacitance 13 is greater than the capacitance of described pixel capacitance.Concrete, the capacitance of described sensing capacitance is greater than 10 times of the capacitances of described pixel capacitance.
What should know is, described pixel electrode and public electrode are positioned at described viewing area, and first electrode and second electrode of described sensing capacitance can be positioned at described viewing area or non-display area.
In order to detect the deviation between liquid crystal indicator transmitance and the standard transmitance, the present invention also provides a kind of liquid crystal indicator pick-up unit, and described liquid crystal indicator pick-up unit comprises detection module and judge module.Described detection module is suitable for obtaining the capacitance of described sensing capacitance.Described judge module is suitable for according to the difference between the described capacitance acquisition second distance and second gauged distance.
In one embodiment, as shown in figure 24, detection module comprises signal source 601, resistance 602, signal processing unit 603.First end of signal source 601 and first end of resistance 602 all are connected to the first input end of signal processing unit 603; Second electrode 132 of second end of signal source 601 and sensing capacitance all is connected to ground; First electrode 131 of second end of resistance 602 and sensing capacitance all is connected to second input end of signal processing unit 603; The capacitance of the output terminal output sensing capacitance of signal processing unit 603.
During the work of liquid crystal indicator pick-up unit, the signal source 601 of capacitive detection module is sent first sinusoidal signal
First electrode at sensing capacitance goes out to produce second sinusoidal signal
First sinusoidal signal that signal processing unit 603 receives first input end
And second second sinusoidal signal that receives of input end
Handle, obtain the variable quantity of first sinusoidal signal and the second sinusoidal signal amplitude and phase place, export the capacitance of sensing capacitances according to the variable signal processing unit 603 of amplitude or phase place.
Selectable, described signal processing unit 603 is directly exported the described capacitance that obtains according to the variable signal of amplitude or phase place; Perhaps, the described capacitance that obtains according to the variable signal of amplitude or phase place is carried out mean value computation, export described capacitance through the mean value computation sensing capacitance.Preferable, when a sensing capacitance is taken multiple measurements, when perhaps a plurality of sensing capacitances on the same liquid crystal indicator being taken multiple measurements, 603 pairs of described capacitances that obtain according to the variable signal of amplitude or phase place of described signal processing unit carry out mean value computation, export described capacitance through mean value computation.
In the other specific embodiment, judge module comprises storage unit, and described storage unit is preserved the corresponding relation between the capacitance of second distance relative error value and sensing capacitance.Corresponding relation between the capacitance of described second distance relative error value and sensing capacitance is set up and can be set up according to following manner: by first electrode 131 of optical microscope measuring sensing capacitance and the second distance L22 between second electrode 132; The described second distance L22 and second gauged distance are compared, obtain second distance relative error value; Detect the capacitance of the sensing capacitance of described second distance L22 correspondence by capacitive detection module, thereby in judge module, set up the corresponding relation between the capacitance of described second distance relative error value and described sensing capacitance.In judge module when work,, the capacitance of the sensing capacitance that obtains according to capacitive detection module obtains corresponding second distance relative error value with described capacitance from described storage unit.
Preferable, described liquid crystal indicator has the first metal connecting portion, the second metal connecting portion on the non-display area substrate, the described first metal connecting portion, first end is connected with first electrode 131 of sensing capacitance, and second end of the first metal connecting portion, second end and resistance 602 all is connected to second input end of signal processing unit 603.The described second metal connecting portion, first end is connected with second electrode 132 of sensing capacitance, and second end of the second metal connecting portion, second end and signal source 601 all is connected to ground.
Because second distance relative error value equals first substantially apart from the relative error value, be in the admissible error range apart from the relative error value when first, the transmitance of liquid crystal indicator is basic identical with the standard transmitance.When first apart from the relative error value be not in the admissible scope time, the transmitance of liquid crystal indicator departs from the standard transmitance substantially, image quality quality that liquid crystal indicator presents reduces.Described admissible error range is meant that first distance between pixel electrode and the public electrode equates substantially with first gauged distance.
In order to improve the deviation between liquid crystal indicator transmitance and the standard transmitance, the present invention provides a kind of device that improves again, comprises capacitive detection module, judge module and correction module.Wherein, described detection module is suitable for by detecting the capacitance of described sensing capacitance; Described judge module is suitable for obtaining according to described capacitance the second distance relative error value of described capacitance correspondence; Described correction module is suitable for obtaining the gamma value of described second distance relative error value correspondence according to described second distance relative error value, adjusts the brightness of described liquid crystal indicator according to described gamma value.
Capacitive detection module can be realized according to structure shown in Figure 24, repeat no more herein.Described judge module comprises the corresponding relation between the capacitance of second distance relative error value and sensing capacitance, and the capacitance that detects according to capacitive detection module obtains second distance relative error value.
Correction module comprises the data cell of the corresponding relation that stores second distance relative error value and gamma value.Described second distance relative error value can be set up according to following manner with the corresponding relation of gamma value: measure the corresponding required brightness adjustment of transmitance variable quantity of different second distance relative error values, determine corresponding gamma value according to described brightness adjustment, in data cell, set up the corresponding relation of second distance relative error value and gamma value.When liquid crystal indicator improves device work, calling with it corresponding gamma value according to second distance relative error value drives liquid crystal indicator and carries out image and show, the transmitance variation that distance error between pixel electrode and the public electrode is caused compensates by brightness, makes the image quality quality can not reduce.The present application people finds to improve by the mode of optical compensation the variation of this transmitance, promptly adjust liquid crystal indicator brightness by changing gamma value, can reach and the essentially identical effect of change liquid crystal indicator entity structure, and the easier realization of this kind mode.
Though the present invention discloses as above with preferred embodiment, the present invention is defined in this.Any those skilled in the art without departing from the spirit and scope of the present invention, all can do various changes and modification, so protection scope of the present invention should be with claim institute restricted portion.
Claims (26)
1. a liquid crystal indicator comprises a substrate, is arranged on pixel electrode and public electrode on institute's substrate, has first distance between described pixel electrode and the described public electrode; It is characterized in that, described liquid crystal indicator further comprises the sensing capacitance that is arranged at described substrate, described sensing capacitance comprises first electrode and second electrode that is arranged on the substrate, has the second distance that is associated with first distance between described first electrode and second electrode.
2. liquid crystal indicator as claimed in claim 1 is characterized in that, described pixel electrode and public electrode form pixel capacitance, and the capacitance of described sensing capacitance is greater than the capacitance of described pixel capacitance.
3. liquid crystal indicator as claimed in claim 2 is characterized in that, the capacitance of described sensing capacitance is greater than 10 times of the capacitances of described pixel capacitance.
4. liquid crystal indicator as claimed in claim 1 is characterized in that described substrate comprises viewing area and non-display area, and described pixel electrode and public electrode are positioned at described viewing area, and first electrode and second electrode of described sensing capacitance are positioned at described non-display area.
5. liquid crystal indicator as claimed in claim 4 is characterized in that described liquid crystal indicator is rectangular, and described non-display area is around described viewing area, and described liquid crystal indicator comprises that at least 4 sensing capacitances are separately positioned on four jiaos of liquid crystal indicator.
6. liquid crystal indicator as claimed in claim 1 is characterized in that, also comprises the diaphragm that covers described substrate, described pixel electrode, described public electrode, described first electrode and described second electrode.
7. liquid crystal indicator as claimed in claim 1 is characterized in that, also comprises insulation course and diaphragm, and described pixel electrode and described first electrode are positioned at described insulation course, and described public electrode and described second electrode are positioned at described diaphragm.
8. liquid crystal indicator as claimed in claim 1, it is characterized in that, has first gauged distance between pre-designed pixel electrode, the public electrode, have second gauged distance between first electrode of pre-designed sensing capacitance, second electrode, the difference between described first distance, first gauged distance equates with the difference between described second distance, second gauged distance.
9. liquid crystal indicator as claimed in claim 1, it is characterized in that, also comprise the outermost cabling that is positioned on the non-display area substrate, be used for transmission of electric signals, have the 3rd distance between described outermost cabling and the described sensing capacitance to pixel electrode and public electrode.
10. liquid crystal indicator as claimed in claim 9 is characterized in that, described the 3rd distance is greater than 600 microns.
11. liquid crystal indicator as claimed in claim 1 is characterized in that, also comprises the first metal connecting portion, the second metal connecting portion; The described first metal connecting portion, first end is connected with first electrode of sensing capacitance, and the first metal connecting portion, second end is connected to the liquid crystal indicator outside; The described second metal connecting portion, first end is connected with second electrode of sensing capacitance, and the second metal connecting portion, second end is connected to the liquid crystal indicator outside.
12. one kind is used for the pick-up unit that test right requires 1 described liquid crystal indicator, comprise capacitive detection module and judge module, described detection module is suitable for obtaining the capacitance of sensing capacitance, described judge module is suitable for obtaining difference between the second distance and second gauged distance according to described capacitance, and described second gauged distance is first electrode of pre-designed sensing capacitance, the gauged distance between second electrode.
13. pick-up unit as claimed in claim 12 is characterized in that, described judge module comprises storage unit, and described storage unit is preserved the corresponding relation between the capacitance of difference between second distance, second gauged distance and sensing capacitance.
14. pick-up unit as claimed in claim 12 is characterized in that, described capacitive detection module comprises signal source, first resistance and signal processing unit; First end of signal source and first end of first resistance all are connected to the first input end of signal processing unit; Second end of signal source and second electrode of sensing capacitance all are connected to ground; Second end of first resistance and first electrode of sensing capacitance all are connected to second input end of signal processing unit; The capacitance of the output terminal output sensing capacitance of signal processing unit.
15. pick-up unit as claimed in claim 14, it is characterized in that, the secondary signal that first signal that described signal processing unit receives first input end and second input end receive is handled, obtain the variable quantity of first signal and secondary signal amplitude and phase place, export the capacitance of sensing capacitance according to the variation of amplitude or phase place.
16. pick-up unit as claimed in claim 15 is characterized in that, described signal processing unit is directly exported the described capacitance that obtains according to the variable signal of amplitude or phase place.
17. pick-up unit as claimed in claim 15 is characterized in that, described signal processing unit carries out mean value computation to the described capacitance that obtains according to the variable signal of amplitude or phase place, exports the capacitance of the sensing capacitance of described process mean value computation.
18. the device that improves that is used to improve the described liquid crystal indicator transmitance of claim 1 comprises capacitive detection module, judge module and correction module, wherein,
Described detection module is suitable for by detecting the capacitance of sensing capacitance;
Described judge module is suitable for obtaining difference between second distance, second gauged distance according to described capacitance, and described second gauged distance is first electrode of pre-designed sensing capacitance, the gauged distance between second electrode;
Described correction module is suitable for obtaining corresponding with it gamma value according to the difference between described second distance, second gauged distance, adjusts the brightness of described liquid crystal indicator according to described gamma value.
19. the device that improves as claimed in claim 18 is characterized in that described correction module comprises data cell, described data cell stores the difference between described second distance, second gauged distance and the corresponding relation of gamma value.
20. the device that improves as claimed in claim 18 is characterized in that described judge module comprises storage unit, described storage unit is preserved the corresponding relation between the capacitance of difference between second distance, second gauged distance and sensing capacitance.
21. method for making of liquid crystal indicator according to claim 1, it is characterized in that, comprise: first electrode and second electrode that on substrate, form pixel electrode, public electrode and sensing capacitance, described pixel electrode and described first electrode form simultaneously, and described public electrode and described second electrode form simultaneously.
22. method for making as claimed in claim 21 is characterized in that, first electrode and second electrode of described pixel electrode, public electrode, sensing capacitance form simultaneously.
23. method for making as claimed in claim 22 is characterized in that, the step that first electrode of described pixel electrode, public electrode, sensing capacitance and second electrode form simultaneously comprises:
First mask plate and substrate are provided, on the surface of described substrate, form first conducting film and first photoresist film successively;
Use described first mask plate to form the photoresist graphical set;
Make with photoresist graphical set first conducting film be carried out etching, form first electrode, second electrode of pixel electrode, public electrode and sensing capacitance as etching barrier layer;
Remove the photoresist graphical set.
24. method for making as claimed in claim 21 is characterized in that, also comprises forming the diaphragm that covers described pixel electrode, public electrode, first electrode and second electrode; Form peripheral connecting line on diaphragm, the described sensing capacitance of described peripheral connecting line distance has the 3rd distance.
25. method for making as claimed in claim 21 is characterized in that, described pixel electrode and described first electrode form simultaneously, and the step that described public electrode and described second electrode form simultaneously comprises:
Second mask plate, the 3rd mask plate and substrate are provided, on the surface of described substrate, form first conducting film and first photoresist film successively;
Use second mask plate to form the first photoresist graphical set;
Use the first photoresist graphical set as etching barrier layer, first conducting film is carried out etching, form first electrode of pixel electrode and sensing capacitance;
Remove the first photoresist graphical set, form insulation course, second conducting film and second photoresist film;
Use the 3rd mask plate to form the second photoresist graphical set;
Use the second photoresist graphical set as etching barrier layer, second conducting film is carried out etching, form second electrode of public electrode and sensing capacitance;
Remove the second photoresist graphical set.
26. method for making as claimed in claim 25 is characterized in that, also comprises forming the diaphragm that covers the described public electrode and second electrode; Form peripheral connecting line on diaphragm, the described sensing capacitance of described peripheral connecting line distance has the 3rd distance.
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| CN102243382B (en) | 2014-12-31 |
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