CN101598862A - Touch control liquid crystal display device and manufacture method thereof - Google Patents

Abstract

The invention provides a kind of touch control liquid crystal display device.This touch control liquid crystal display device comprises a reference capacitance and the variable capacitance that one first substrate, is clipped in the liquid crystal layer between this first substrate and this second substrate, one first sense line that is arranged on contiguous this liquid crystal layer one side of this first substrate, one second sense line, connects mutually with second substrate, that this first substrate is oppositely arranged.This reference capacitance is electrically connected this first sense line and this second sense line with the tie point of this variable capacitance, this reference capacitance responds ambient pressure and changes its capacitance.This touch control liquid crystal display device has thin thickness, in light weight, penetrance is high and display effect is good advantage.The present invention also provides a kind of manufacture method of above-mentioned touch control liquid crystal display device simultaneously.

Description

Touch control liquid crystal display device and manufacture method thereof

Technical field

The present invention relates to a kind of touch control liquid crystal display device and manufacture method thereof.。

Background technology

In recent years,, have the touch control liquid crystal display device of touch-screen, be applied in more and more widely in production and the life with development user-friendly for operation, simplicity.Because the user can directly contact touch control liquid crystal display device with input information with hand or other object, thereby minimizing even elimination user are to the dependence of other input equipments (as keyboard, mouse, telepilot etc.), user friendly greatly operation.

Current, touch-screen generally includes polytypes such as resistor-type, capacitor type, acoustic wave type, infra red type, it is generally rectangle transparent panel form, the mode that employing is piled up is arranged on display surface one side of liquid crystal indicator, and by connection liquid crystal indicator and control corresponding devices such as flexible circuit boards, thereby realize touch controllable function.

But, in the touch control liquid crystal display device of above-mentioned stacked structure, touch-screen and liquid crystal indicator need to make respectively, and then by a bonding coat this touch-screen are binded display surface at liquid crystal indicator, and this touch-screen and bonding coat make the thickness and the weight increase of touch control liquid crystal display device.Simultaneously,, the light transmittance of liquid crystal indicator is reduced, and easily produce the optical interference phenomenon, cause display image distortion or variable color, reduce its display effect because this touch-screen and bonding coat have optical effects such as absorption, refraction and reflection to light.

Summary of the invention

Prior art touch control liquid crystal display device thickness is big, penetrance is low and the problem of display effect difference in order to solve, and is necessary to provide the touch control liquid crystal display device that a kind of thickness is little, penetrance is high and display effect is good.

Also be necessary to provide a kind of manufacture method of above-mentioned touch control liquid crystal display device.

A kind of touch control liquid crystal display device, it comprise one first substrate, one and second substrate, that is oppositely arranged of this first substrate be clipped in liquid crystal layer between this first substrate and this second substrate, wherein, contiguous this liquid crystal layer one side of this first substrate is provided with a reference capacitance and a variable capacitance of one first sense line, one second sense line, series connection mutually, the tie point of this reference capacitance and this variable capacitance is electrically connected this first sense line and this second sense line, and this variable capacitance responds ambient pressure and changes its capacitance.

A kind of touch control liquid crystal display device, it comprises that a public electrode, one first sense line, second sense line perpendicular to this first sense line, a reference capacitance and relative with this public electrode are clipped in the liquid crystal layer between this public electrode and this reference capacitance.This reference capacitance comprises one first electrode and one second electrode.Contiguous this public electrode one side of this second electrode, and when this public electrode and the variation of this second distance between electrodes, this second electrode is exported an electric signal to this first sense line and this second sense line.

A kind of manufacture method of touch control liquid crystal display device, it may further comprise the steps: one first substrate is provided, and forms one first electrode and one first sense line on this first substrate; Form first insulation course of this first electrode of covering and this first sense line; On this first insulation course, form second electrode and one second sense line relative with this first electrode; Form second insulation course of this second electrode of covering and this second sense line; Form the web member of electrical connection this second electrode, this first sense line and this second sense line; One second substrate with a public electrode is provided, and this public electrode is relative with this second electrode, thereby defines a variable capacitance.

A kind of manufacture method of touch control liquid crystal display device, it may further comprise the steps: one first substrate is provided, forms one first electrode and one first sense line on this first substrate; Form one and cover first insulation course on this first electrode and this first sensing layer; Form one second sense line; Form second insulation course of this second sense line of covering; Form second electrode of relative this first electrode, and this second electrode is electrically connected this first sense line and this second sense line; One second substrate with a public electrode is provided, and this public electrode is relative with this second electrode, thereby defines a variable capacitance.

Compared with prior art, this touch control liquid crystal display device inside is provided with first, second sense line, reference capacitance and variable capacitance, utilize the capacitance variations of this variable capacitance and survey the change in electric of this point, thereby realize the function of touch-control location according to the variation of electric signal.Self can realize touch controllable function this touch control liquid crystal display device, and does not need extra contact panel, and its thin thickness, in light weight helps the lightening development of touch control display apparatus.Simultaneously, because this touch control liquid crystal display device reduces elements such as using contact panel and bonding coat, light needn't pass elements such as contact panel and bonding coat, reduce bad optical phenomenas such as light absorption, refraction, reflection and interference, effectively improve the transmittance and the display effect of this touch control liquid crystal display device.

Compared with prior art, in this touch control liquid crystal display device manufacture method, utilize photoetching process that this first, second sense line, this reference capacitance and variable capacitance are made in the liquid crystal indicator, thereby realize the function of embedded touch liquid crystal indicator, have few, the advantage of simple technology of step.

Description of drawings

Fig. 1 is the circuit structure structural representation of touch control liquid crystal display device first embodiment of the present invention.

Fig. 2 is the plane structure for amplifying synoptic diagram of any pixel cell of touch control liquid crystal display device shown in Figure 1.

Fig. 3 is the cross-sectional view along III-III direction shown in Figure 2.

Fig. 4 is the user mode synoptic diagram of touch control liquid crystal display device shown in Figure 3.

Fig. 5 is the schematic equivalent circuit of any pixel cell touch-control part shown in Figure 2.

Fig. 6 is the process flow diagram of this touch control liquid crystal display device first embodiment manufacture method.

Fig. 7 to Figure 16 is the structural representation of each step of LCD device preparation method shown in Figure 6.

Figure 17 is the plane structure for amplifying synoptic diagram of arbitrary pixel cell of touch control liquid crystal display device second embodiment of the present invention.

Figure 18 is the cross-sectional view along XVIII-XVIII direction shown in Figure 17.

Figure 19 is the process flow diagram of this touch control liquid crystal display device second embodiment manufacture method.

Figure 20 to Figure 24 is the structural representation of LCD device preparation method part steps shown in Figure 19.

Embodiment

See also Fig. 1, it is the circuit structure structural representation of touch control liquid crystal display device first embodiment of the present invention.Comprise this touch control liquid crystal display device 100 data drive circuit 101, scan driving circuit 102, one first read circuit 103, a second reading sense circuit 104, many data lines 105, multi-strip scanning line 106, many first sense lines 107 and many second sense lines 108.

These many data lines 105 are parallel to each other and extend along a first direction, and this multi-strip scanning line 106 is parallel to each other and extends along a second direction vertical with first direction, thereby defines a plurality of pixel cells 150.These many first sense lines 107 and these multi-strip scanning line 106 numbers equate, and corresponding respectively adjacent and be arranged in parallel with this multi-strip scanning line 106.These many second sense lines 108 and this many data lines 105 numbers equate, and corresponding respectively adjacent and be arranged in parallel with these many data lines 105.

This data drive circuit 101 and these many data lines 105 are electrically connected, for these many data lines 105 provide data-signal.This scan drive circuit 102 and this multi-strip scanning line 106 are electrically connected, for this multi-strip scanning line 106 provides sweep signal.This first reads circuit 103 and these many first sense lines 107 are electrically connected, to read touching signals from these many first sense lines 107.This second reading sense circuit 104 and these many second sense lines 108 are electrically connected, to read touching signals from these many second sense lines 108.

See also Fig. 2, it is the plane structure for amplifying synoptic diagram of any pixel cell 150 of touch control liquid crystal display device 100 shown in Figure 1.This pixel cell 150 comprises a transistor 160, a pixel electrode 168, a reference capacitance 170, a reference electrode line 174 and a connection piece 175.

This transistor 160 is arranged on the intersection of this data line 105 and corresponding scanning line 106.This transistor 160 comprises one source pole 161, a grid 162 and a drain electrode 163.This source electrode 161 is electrically connected to this data line 105 to receive data-signal.This grid 162 is electrically connected to corresponding scanning line 106 to receive sweep signal.This drain electrode 163 is electrically connected to this pixel electrode 168 to provide data-signal to this pixel electrode 168.

This reference capacitance 170 is arranged on the intersection of this first sense line 107 and this second sense line 108, and it comprises one first electrode 171 and one second electrode 172.This reference electrode line 174 is parallel with this first sense line 107, and connects as one with this first electrode 171.Second electrode 172 of this reference capacitance 170 is arranged on this first electrode 171, and this second electrode 172 is electrically connected this first sense line 107 and this second sense line 108 respectively by this web member 175.

See also Fig. 3, it is the cross-sectional view along III-III direction shown in Figure 2.

This touch control liquid crystal display device 100 further comprises one first substrate 110, one and this first substrate 110 is parallel and second substrate 120 and that be oppositely arranged is clipped in liquid crystal layer 130 between this first substrate 110 and this second substrate 120.

This first substrate 110 is transparent glass substrates.First electrode 171 of the grid 162 of this sweep trace 106, this transistor 160, this reference capacitance 170, this reference electrode line 174 and this first sense line 107 all are arranged on this first substrate, 110 contiguous these liquid crystal layer 130 1 sides.One first insulation course 111 covers this sweep trace 106, the grid 162 of this transistor 160, first electrode 171, this reference electrode line 174 and this first sense line 107 of this reference capacitance 170.This first insulation course 111 is a silicon nitride (SiNx) layers.One semiconductor layer 167 that comprises a light dope amorphous silicon layer 165 and a heavily doped amorphous silicon layer 166 is arranged on the position that 111 pairs of this first insulation courses should grid 162.This source electrode 161 and this drain electrode 163 are arranged on this semiconductor layer 167.Second electrode 172 of this reference capacitance 170 is arranged on the position that 111 pairs of this first insulation courses should first electrode 171.This second sense line 108 is arranged on this first insulation course 111.One second insulation course 112 covers this source electrode 161, this semiconductor layer 167, this drain electrode 163, this first insulation course 111, this second electrode 172 and this second sense line 108.This second insulation course 112 is silicon nitride layers, its to should drain 163, the position of this second electrode 172, this first sense line 107 and this second sense line 108 is provided with a connecting hole 113,114,115,116 respectively.This pixel electrode 168 is arranged on this second insulation course 112, and is electrically connected by this connecting hole 113 and this drain electrode 163.This web member 175 is arranged on 112 pairs of this second insulation courses should second electrode 172 and this first sense line 107 and these second sense line, 108 adjacent areas, and are electrically connected this second electrode 172, this first sense line 107 and this second sense lines 108 by this connecting hole 114,115,116.

This second substrate 120 is elasticity transparency carriers, can respond the ambient pressure effect and produces crooked deformation.The surface of this second substrate 120 contiguous these liquid crystal layers 130 be cascading a chromatic filter layer 121, a planarization layer 122 and a public electrode 123.This chromatic filter layer 121 comprises that filter unit such as red, green, blue is in order to realize colored the demonstration.This public electrode 123 is made by the electrically conducting transparent material, as indium tin oxide (Indium TinOxide, ITO) or indium-zinc oxide (Indium Zinc Oxide, IZO), its external common electric voltage Vcom.This public electrode 123 is provided with column gap 125 with respect to the position of this reference capacitance 170, and this gap 125 is to be made by insulating material.This gap son 125 1 ends (not indicating) connects this public electrode 123, second electrode 172 of the other end (not indicating) and this reference capacitance 170 is a gap d at interval, be full of liquid crystal material in this gap d, and the big I of this gap d is pointed or ambient pressure such as stylus is done the time spent and is changed at this second substrate 120, second insulation course 112 on this gap son 125 and this first substrate 110 contacts, as shown in Figure 4.

See also Fig. 4 and Fig. 5, Fig. 4 is the user mode synoptic diagram of touch control liquid crystal display device 100 shown in Figure 3.Fig. 5 is the schematic equivalent circuit of the touch-control part of touch control liquid crystal display device 100 shown in Figure 3.Because this gap son 125 and this liquid crystal layer 130 are insulating material, second electrode 172 of this public electrode 123, this reference capacitance 170 and the gap son 125 and the liquid crystal layer 130 that are clipped between the two constitute a variable capacitance Cv.The capacitance of this variable capacitance Cv changes with the size of this gap d, and when this gap d existed, the capacitance of this variable capacitance Cv was less, is designated as Cv1, and when this gap d disappeared, the capacitance of this variable capacitance Cv was bigger, is designated as Cv2.

This public electrode 123 is connected different voltage Vcom and Vref respectively with this reference electrode 171, because this variable capacitance Cv and this reference capacitance 170 are shared this second electrode 172, then this variable capacitance Cv and 170 equivalences of this reference capacitance are the relation of being connected in series.

Wherein, Vcom is a reference voltage, and Vref is a reference voltage.This variable capacitance Cv and this reference capacitance 170 are connected in series, and a node D between the two is electrically connected to this first sense line 107 and this second sense line 108 respectively.

According to the principle of capacitance partial pressure, the voltage Vd of this node D can be by following formulate:

$\mathrm{Vd}=\mathrm{Vcom}+\frac{\frac{1}{\mathrm{Cv}}}{\frac{1}{\mathrm{Cv}}+\frac{1}{\mathrm{Cref}}}(\mathrm{Vref}-\mathrm{Vcom})---\left(1\right)$

Wherein:

It is the reactance of this variable capacitance Cv;

It is the reactance of this reference capacitance 107.

When no any pressure acted on this second substrate 120, this gap d kept definite value, and the voltage of this node D can be expressed as:

$\mathrm{Vd}1=\mathrm{Vcom}+\frac{\frac{1}{\mathrm{Cv}1}}{\frac{1}{\mathrm{Cv}1}+\frac{1}{\mathrm{Cref}}}(\mathrm{Vref}-\mathrm{Vcom})---\left(2\right)$

This voltage Vd1 is sent to this respectively by this first sense line 107 and second sense line 108 and first reads circuit 103 and this second reading sense circuit 104.

When a touch-control acted on this second substrate 120, this gap d disappeared, and the voltage of this node D can be expressed as:

$\mathrm{Vd}2=\mathrm{Vcom}+\frac{\frac{1}{\mathrm{Cv}2}}{\frac{1}{\mathrm{Cv}2}+\frac{1}{\mathrm{Cref}}}(\mathrm{Vref}-\mathrm{Vcom})---\left(3\right)$

This voltage Vd2 is sent to this respectively by this first sense line 107 and second sense line 108 and first reads circuit 103 and this second reading sense circuit 104.

Relatively before and after the touch-control action, the voltage Vd of this node D is changed to Vd2 by Vd1 from this formula (2) and formula (3), and this first reads the variation according to voltage of circuit 103 and this second reading sense circuit 104, and then there is touch-control action at this moment in decidable.Simultaneously, this voltage signal Vd2 via this first read circuit 103 and this second reading sense circuit 104 and resolve after, can determine the coordinate of this touch-control action along this first sense line 107 and second sense line, 108 directions, can obtain the two-dimensional coordinate of this touch point.This touch control liquid crystal display device 100 is operated accordingly according to this touch-control coordinate.

Compared to prior art, one first sense line 107 is set in arbitrary pixel cell 150 of this touch control liquid crystal display device 100, one reference capacitance 170 and a variable capacitance Cv of one second sense line 108 and series connection mutually, by measuring the change in voltage of the node D between this reference capacitance 170 and this variable capacitance Cv, thereby when arbitrary pixel cell 150 is subjected to the touch-control action, can corresponding determine the position of this touch point, realize the function of embedded touch panel, thereby avoid the thickness that causes because of the external hanging type contact panel big, transmittance hangs down the shortcoming with the display effect difference, and has frivolous, the transmittance height, the advantage that display effect is good.

Seeing also Fig. 6, is the process flow diagram of these touch control liquid crystal display device 100 manufacture methods, and this manufacture method may further comprise the steps:

Step S11: form the first metal layer;

See also Fig. 7, one first substrate 110 is provided, form a first metal layer 131 and one first photoresist layer 141 thereon in regular turn, this metal level 131 can be a single layer structure, also can be a sandwich construction, it is metal, molybdenum (Mo), chromium (Cr), tantalum (Ta) or copper (Cu) etc. that its material can be aluminium (Al).

Step S12: form grid, reference electrode and first sense line;

See also Fig. 8, one first light shield (figure does not show) is provided and this first photoresist layer 141 is carried out exposure imaging, thereby form a predetermined photoresist pattern.This first metal layer 131 is carried out etching, removing, thereby form the pattern of a grid 162, a reference electrode 171 and one first sense line 107, remove this first photoresist layer 141 then not by the first metal layer 131 of photoresist pattern covers.

Step S13: form first insulation course, amorphous silicon membrane and heavily doped amorphous silicon film;

See also Fig. 9, and usefulness chemical vapor deposition on this first substrate 110 (Chemical Phase Deposition, CVD) method deposits a silicon nitride film, thereby forms this first insulation course 111; On this insulation course 111, form an amorphous silicon material with chemical gaseous phase depositing process again; Carry out one doping process again, this amorphous silicon material is mixed, to form a light amorphous silicon membrane 132 and a heavily doped amorphous silicon film 133; Deposition one second photoresist layer 142 on this heavily doped amorphous silicon film 133.

Step S14: form light dope amorphous silicon layer and heavily doped amorphous silicon layer;

See also Figure 10, one second light shield (figure does not show) is provided and this second photoresist layer 142 is carried out exposure imaging, thereby form a predetermined photoresist pattern; This heavily doped amorphous silicon film 133 and this light dope amorphous silicon membrane 132 are carried out etching, remove this heavily doped amorphous silicon film 133 and this light dope amorphous silicon membrane 132 not by the part of photoresist pattern covers, form a light dope amorphous silicon layer 165 and a heavily doped amorphous silicon layer 166, this light dope amorphous silicon layer 165 and heavily doped amorphous silicon layer 166 common definition semi-conductor layer 167; Remove this second photoresist layer 142 then.

Step S15: form second metal level;

See also Figure 11, on this first insulation course 111 and this heavily doped amorphous silicon layer 166, form one second metal level 134 and one the 3rd photoresist layer 143 successively.

Step S16: form source electrode, drain electrode, second electrode and second sense line;

See also Figure 12, provide one the 3rd light shield (figure does not show) that the 3rd photoresist layer 143 is carried out exposure imaging, thereby form a predetermined photoresist pattern; This second metal level 134 is carried out etching, and then form one source pole 161, drain electrode 163,1 second electrode 172 and one second sense line 108; Remove the 3rd photoresist layer 143 then.

Step S17: form second insulation course;

See also Figure 13, on this source electrode 161, drain electrode 163, this second insulation course 111, this second electrode 172 and this second sense line 108, deposit a silicon nitride film, thereby form one second insulation course 112 with chemical gaseous phase depositing process; Deposition one the 4th photoresist layer 144 on this second insulation course 112.

Step S18: the connecting hole that forms second insulation course;

See also Figure 14, provide one the 4th road light shield (figure does not show) that the 4th photoresist layer 144 is carried out exposure imaging, thereby form a predetermined photoresist pattern; This second insulation course 112 is carried out etching, and then form the connecting hole 113,114,115,116 that runs through this second insulation course 112, to expose the subregion of this drain electrode 163, this second electrode 172, this first sense line 107 and this second sense line 108; Remove the 4th photoresist layer 144 then.

Step S19: form transparency conducting layer;

See also Figure 15, form a transparency conducting layer 135 and one the 5th photoresist layer 145 in regular turn on this second insulation course 112, this transparency conducting layer 135 can be indium tin oxide or indium-zinc oxide.

Step S110: form pixel electrode and web member.

See also Figure 16, provide one the 5th road light shield (figure does not show) that the 5th photoresist layer is carried out exposure imaging, thereby form a predetermined photoresist pattern; This transparency conducting layer 135 is carried out etching, and then form this pixel electrode 168 and this web member 175; Remove the 5th photoresist layer 145, thereby form this touch control liquid crystal display device 100.

Compared to prior art, in the manufacture method of this touch control liquid crystal display device 100, adopt and five identical road light shield processing procedures of manufacturing liquid crystal indicator, can make this reference capacitance 170, this first sense line 107 and this second sense line 108 simultaneously, thereby touch-control structure is produced on liquid crystal indicator inside, form embedded touch liquid crystal indicator 100, it has, and light shield is few, the simple advantage of processing procedure.

See also Figure 17 and Figure 18, Figure 17 is the structural representation of any pixel cell of touch control liquid crystal display device second embodiment of the present invention, and Figure 18 is the cross-sectional view along XVIII-XVIII direction shown in Figure 17.The structural similarity of the liquid crystal indicator 100 of this touch control liquid crystal display device 200 and first embodiment, its difference is: second electrode 272 of this reference capacitance 270 is arranged on the position that 212 pairs of this second insulation courses should reference electrode 271, and this second electrode 272 has a projection (indicating).This second electrode 172 is electrically connected this first sense line 207 and this second sense line 208 by the connecting hole 215,216 of this projection, this first sense line 207 and second sense line, 208 correspondence positions.

In this touch control liquid crystal display device 200, utilize the projection of second electrode 272 to be electrically connected this first sense line 207 and this second sense line 208, can reduce the tie point on this second electrode 272, improve the reliability of its electrical connection.

See also Figure 19, the process flow diagram of these touch control liquid crystal display device 200 manufacture methods, the listed step S11-S15 of the step S21-S25 that this flow process Figure 19 is listed and the process flow diagram of a last embodiment 6 is identical, no longer repeats to introduce herein, directly begins to introduce from step S26:

Step S26: form source electrode, drain electrode and second sense line;

See also Figure 20, provide one the 3rd light shield (figure does not show) that the 3rd photoresist layer (figure does not show) is carried out exposure imaging, thereby form a predetermined pattern; This second metal level (figure does not show) is carried out etching, and then form one source pole 261, a drain electrode 262 and 1 second sense line 208; Remove the 3rd photoresist layer then.

Step S27: form second insulation course;

See also Figure 21, on this source electrode 261, drain electrode 263, this second insulation course 211 and this second sense line 208, deposit a silicon nitride film, thereby form one second insulation course 212 with chemical gaseous phase depositing process; Deposition one the 4th photoresist layer 244 on this second insulation course 212.

Step S28: the connecting hole that forms second insulation course;

See also Figure 22, provide one the 4th road light shield (figure does not show) that the 4th photoresist layer 244 is carried out exposure imaging, thereby form a predetermined photoresist pattern; This second insulation course 212 is carried out etching, and then form the connecting hole 213,215,216 that runs through this second insulation course 212, to expose the subregion of this drain electrode 263, this first sense line 207 and this second sense line 208; Remove the 4th photoresist layer 244 then.

Step S29: form transparency conducting layer;

See also Figure 23, form a transparency conducting layer 235 and one the 5th photoresist layer 245 in regular turn on this second insulation course 212, this transparency conducting layer 235 can be indium tin oxide or zinc oxide.

Step S210: form the pixel electrode and second electrode.

See also Figure 24, the 5th photoresist layer 245 is carried out exposure imaging, thereby form a predetermined photoresist pattern with one the 5th road light shield (figure does not show); This transparency conducting layer 235 is carried out etching, and then form this pixel electrode 268, this second electrode 272 and the projection that is connected this second electrode 272, this first sense line 207 and this second sense line 208 (not indicating); Remove the 5th photoresist layer 245, thereby form this touch control liquid crystal display device 200.

In addition, gap 125,225 of touch control liquid crystal display device 100,200 of the present invention can also be arranged on this second electrode 172,272, and and keep certain interval d between this public electrode 123,223, utilize the variation of this gap d to form the variable capacitance effect, thereby utilize this variable capacitance effect to realize touch controllable function.

Claims (10)

1. touch control liquid crystal display device, it comprise one first substrate, one and second substrate, that is oppositely arranged of this first substrate be clipped in liquid crystal layer between this first substrate and this second substrate, it is characterized in that: contiguous this liquid crystal layer one side of this first substrate is provided with a reference capacitance and a variable capacitance of one first sense line, one second sense line, series connection mutually, the tie point of this reference capacitance and this variable capacitance is electrically connected this first sense line and this second sense line, and this variable capacitance responds ambient pressure and changes its capacitance.

2. touch control liquid crystal display device as claimed in claim 1, it is characterized in that: this reference capacitance comprise one first electrode, one second electrode and be clipped in this first electrode and this second electrode between insulation course, this variable capacitance comprise one be arranged on public electrode, this second electrode of contiguous this liquid crystal layer one side of this first substrate and be clipped in this public electrode and this second electrode between liquid crystal layer.

3. touch control liquid crystal display device as claimed in claim 2 is characterized in that: this second electrode is electrically connected this first sense line and this second sense line.

4. touch control liquid crystal display device, it is characterized in that: this touch control liquid crystal display device comprises a public electrode, one first sense line, one second sense line perpendicular to this first sense line, one reference capacitance and relative with this public electrode is clipped in the liquid crystal layer between this public electrode and this reference capacitance, this reference capacitance comprises one first electrode and one second electrode, contiguous this public electrode one side of this second electrode, and when this public electrode and the variation of this second distance between electrodes, this second electrode is exported an electric signal to this first sense line and this second sense line.

5. touch control liquid crystal display device as claimed in claim 4 is characterized in that: this public electrode, second electrode and the liquid crystal layer that is clipped between the two define a variable capacitance, and the capacitance of this variable capacitance changes with the change of this thickness of liquid crystal layer.

6. touch control liquid crystal display device as claimed in claim 4 is characterized in that: comprise that further one first reads a circuit and a second reading sense circuit, this first reads circuit and is electrically connected this first sense line, and this second reading sense circuit is electrically connected this second sense line.

7. the manufacture method of a touch control liquid crystal display device, it may further comprise the steps:

Step S1 provides one first substrate, and forms one first electrode and one first sense line on this first substrate;

Step S2, formation one covers first insulation course of this first electrode and this first sense line;

Step S3 forms second electrode and one second sense line relative with this first electrode on this first insulation course;

Step S4, formation one covers second insulation course of this second electrode and this second sense line;

Step S5, formation one is electrically connected the web member of this second electrode, this first sense line and this second sense line; With

Step S6 provides second substrate with a public electrode, and this public electrode is relative with this second electrode, thereby defines a variable capacitance.

8. the manufacture method of touch control liquid crystal display device as claimed in claim 7 is characterized in that: among the step S1, form the grid of a thin film transistor (TFT) simultaneously;

Among the step S2, further form one and be positioned at this first insulation course semiconductor layer that should gate location;

Among the step S3, form an one source pole and a drain electrode that is positioned at this semiconductor layer simultaneously;

Among the step S4, this second insulation course covers this source electrode and this drain electrode simultaneously; With

Among the step S5, form the pixel electrode of this drain electrode of electrical connection simultaneously.

9. the manufacture method of a touch control liquid crystal display device, it may further comprise the steps:

Step S1 provides one first substrate, forms one first electrode and one first sense line on this first substrate;

Step S2 forms one and covers first insulation course on this first electrode and this first sensing layer;

Step S3 forms one second sense line;

Step S4, formation one covers second insulation course of this second sense line;

Step S5, second electrode of formation one relative this first electrode, and this second electrode is electrically connected this first sense line and this second sense line;

Step S6 provides second substrate with a public electrode, and this public electrode is relative with this second electrode, thereby defines a variable capacitance.

10. the manufacture method of touch control liquid crystal display device as claimed in claim 9 is characterized in that:

Among the step S1, on this substrate, form the grid of a thin film transistor (TFT) simultaneously;

Among the step S2, further form one and be positioned at this first insulation course semiconductor layer that should gate location;

Among the step S3, form an one source pole and a drain electrode that is positioned at this semiconductor layer simultaneously;

Among the step S4, this second insulation course covers this source electrode and this drain electrode simultaneously;

Among the step S5, form the pixel electrode of this drain electrode of electrical connection simultaneously.

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