CN102234784A - Coating system - Google Patents
Coating system Download PDFInfo
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- CN102234784A CN102234784A CN2010101596023A CN201010159602A CN102234784A CN 102234784 A CN102234784 A CN 102234784A CN 2010101596023 A CN2010101596023 A CN 2010101596023A CN 201010159602 A CN201010159602 A CN 201010159602A CN 102234784 A CN102234784 A CN 102234784A
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- plated film
- chamber
- coating system
- plated
- electric arc
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Abstract
The invention provides a coating system, which is used for uninterruptedly and circularly coating a plurality of workpieces to be coated. The coating system comprises at least two coating cavities, at least two buffer cavities, transmission devices, a feeding mechanism, a discharging mechanism, electric arc target seats and gas suction devices, wherein the coating cavities are mutually alternatively connected with the buffer cavities to form a circular closed loop; one buffer cavity is provided with the feeding mechanism and the discharging mechanism; the gas suction devices are connected with the coating cavities and the buffer cavities respectively to vacuumize the coating cavities and the buffer cavities; the transmission devices are arranged in the coating cavities and the buffer cavities to transfer the workpieces to be coated; and the electric arc target seats are arranged in the coating cavities and are used for exciting ionized target ions out so as to deposit the excited ions on the workpieces to be coated to form a coating layer. The workpieces to be coated are guided into the circular closed loop through the feeding mechanism, are continuously and circularly coated in the circular closed loop when transferred by the transmission devices, and are led out through the discharging mechanism until the coating is finished.
Description
Technical field
The present invention relates to a kind of coating system, particularly a kind of continous way coating system.
Background technology
Along with the continuous development of electronic product appearance design, need on electronic product shell, be coated with and possess high metallic texture and the full assembly of thin films of various color.Existing filming equipment employing method with the reaction formula magnetron sputtering plating in single cavity mostly carries out plated film to electronic product shell.Yet, the target ionization level of reaction formula magnetron sputtering is lower, target ionic adhesive ability is poor, under the increasingly sophisticated situation of the outward appearance geometrical shape of electronic product casing, easily because of electronic product casing covering mutually structurally produces the bad phenomenon of plated film, as: product edge is heterochromatic, the uneven caused rerum natura of thickness bad (not wear-resisting, hardness is low) etc.Secondly, rete that usually can only a kind of material of sputter in the single cavity of existing filming equipment.When the film of needs plating multiple layers of different materials is, then need to change continuously target, thereby can prolong the plated film time, increase the cost of electronic product.
Summary of the invention
Given this, but be necessary to provide a kind of coating system of continuous sputtering assembly of thin films.
A kind of coating system, it is used for a plurality of workpieces to be plated plated film that circulates incessantly.Described coating system comprises at least two plated film chambeies, at least two cushion chambers, transmitting device, feed mechanism, discharging mechanism, electric arc target stand and air extractors.Described plated film chamber and described cushion chamber alternately connect into a circulation loop line mutually.Described one of them cushion chamber is provided with described feed mechanism and discharging mechanism.Described air extractor is connected to carry out vacuum pumping with described plated film chamber and cushion chamber respectively.Described transmitting device is arranged in described plated film chamber and the cushion chamber to transmit workpiece to be plated.Described electric arc target stand is arranged in the described plated film chamber, and the target ion that is used to inspire ionization forms rete to be deposited on the workpiece to be plated.Described workpiece to be plated imports described circulation loop line by described feed mechanism, and at the plated film that circulates continuously in the circulation loop line under the transmission of described transmitting device, draws by described discharging mechanism after finishing plated film.
With respect to prior art, coating system provided by the present invention has improved the ionization level and the target energy of ions of target by the high-energy that arc-over had, thereby makes the rete plated have higher hardness and sticking power preferably.In addition, described coating system adopts alternately continuous plated film chamber and cushion chamber to form the closed plated film space of circulation, carries out thereby make filming process to circulate incessantly, improves the plated film efficient of described coating system widely.
Description of drawings
Fig. 1 is the structural representation of the coating system that embodiment of the present invention provided.
The main element nomenclature
Coating system 1
Workpiece to be plated 2
Cushion chamber 11
Transmitting device 12
Connect valve 16
Electric arc target stand 104
Target 104a
Refrigerating unit 108
One-level vacuum pump 150
Two-stage vacuum pump 152
Three grades of vacuum pumps 154
CD-ROM drive motor 122
Embodiment
As shown in Figure 1, the coating system 1 that embodiment of the present invention provided is used for a plurality of workpieces to be plated 2 plated film that circulates incessantly, and it comprises at least two plated film chambeies 10, at least two cushion chambers 11, transmitting device 12, feed mechanism 13, discharging mechanism 14, air extractor 15 and a plurality of connection valves 16.
Described plated film chamber 10 is the elongate rectangular parallelepiped, and it comprises first side 100, second side 102, electric arc target stand 104, magnet coil 106 and refrigerating unit 108.Described first side 100 and second side 102 are parallel to each other and extend along the length direction in described plated film chamber 10.A plurality of described electric arc target stands 104 are arranged at described first side 100 evenly and at intervals and are positioned on the side in plated film chamber 10.Born target 104a on the described electric arc target stand 104.Described air extractor 15 comprises one-level vacuum pump 150, two-stage vacuum pump 152 and three grades of vacuum pumps 154.Be respectively arranged with a described one-level vacuum pump 150 on described first side 100 in the both sides of each electric arc target stand 104.Described each one-level vacuum pump 150 is connected on described three grades of vacuum pumps 154 by a described two-stage vacuum pump 152 respectively.Corresponding each described electric arc target stand 104 is respectively arranged with a magnet coil 106 and a refrigerating unit 108 on described second side 102.Described magnet coil 106 is a ring-type cylindrical coil winding.Described electric arc target stand 104 ionization target 104a are to produce a large amount of target ions, and described magnet coil 106 is used for exciting near electric arc target stand 104 magnetic field pulse guide field to carry out the path with guiding target ionic.Described refrigerating unit 108 is used to reduce the temperature in the described plated film chamber 10, to prevent the quality of too high temperature effect plated film.
Described plated film chamber 10 alternately connects into a circulation loop line mutually with described cushion chamber 11.Interconnect by the described valve 16 that is connected between described plated film chamber 10 and the adjacent cushion chamber 11.Described one of them cushion chamber 11 is provided with described discharging mechanism 14 and feed mechanism 13.Described discharging mechanism 14 and feed mechanism 13 connect valve 16 by one respectively and are connected with this cushion chamber 11.Described feed mechanism 13 and discharging mechanism 14 are respectively applied for the circulation loop line that described workpiece to be plated 2 is imported or draws described plated film chamber 10 and cushion chamber 11 formation.In the present embodiment, described plated film chamber 10 and cushion chamber 11 are two.Described two plated film chambeies 10 are arranged in parallel.Two ends that described two cushion chambers 11 are relative with described each plated film chamber 10 respectively are connected.
Described transmitting device 12 comprises transport tape 120 and CD-ROM drive motor 122.Described transport tape 120 runs through the described plated film chamber 10 that alternately links to each other and cushion chamber 11 successively to form the transmission loop of a closure.Described workpiece to be plated 2 is placed on the described transport tape 120.Described CD-ROM drive motor 122 is used to drive described transport tape 120 advances along specific direction, described workpiece to be plated 2 is sent to successively in the described plated film chamber 10 and cushion chamber 11 that alternately links to each other.
Described each cushion chamber 11 is connected on described three grades of vacuum pumps 154 by a described two-stage vacuum pump 152 respectively.Described cushion chamber 11 comprises the heating unit 110 that is arranged in it.Described heating unit 110 is used for the workpiece to be plated 2 in the cushion chamber 11 is carried out preheating, thinks that entering next plated film chamber 10 interior plated films gets ready.
Before carrying out plated film, the described one-level vacuum pump 150 that is connected with plated film chamber 10, two- stage vacuum pump 152 and 154 pairs of described plated films of three grades of vacuum pumps chamber 10 vacuumize, so that the needed specific vacuum tightness of plated film is satisfied in the inside in described plated film chamber 10.The described two-stage vacuum pump 152 that is connected with cushion chamber 11 and 154 pairs of described cushion chambers 11 of three grades of vacuum pumps vacuumize, so that a default vacuum tightness is satisfied in the inside of described cushion chamber 11.Be understandable that because the target 104a that is plated in the described different plated films chamber 10 can be inequality, the described different plated films chamber 10 required vacuum tightnesss that reach also can be different.So the vacuum tightness of different plated films chamber 10 when plated film is determined according to the specific requirement of plating target 104a.
After the vacuum tightness of described plated film chamber 10 and cushion chamber 11 reached preset requirement, described workpiece to be plated 2 entered on the transport tape 120 in the described cushion chamber 11 by described feed mechanism 13 successively.Described workpiece to be plated 2 is sent in the plated film chamber 10 by described transport tape 120 be preheated to a preset temp in cushion chamber 11 after.Electric arc target stands 104 in the described plated film chamber 10 inspire electric arc with target 104a ionizing, and the target ion of being ionized is evaporated with 10 to 100ev average energies and forms the vacuum environment deposit of ionic fluid in plated film chamber 10 that highly excite on the surface of workpiece to be plated 2.Thereby and the impurity particle that produces in excitation process is filtered because of having under the guiding with the magnetic field pulse guide field of electric charge in plated film chamber 10 of described target ion opposed polarity.Described workpiece to be plated 2 is advanced circulating continuously along specific direction between different plated film chambeies 10 and cushion chamber 11 under the transmission of transport tape 120, to carry out the successive filming process, draws by described discharging mechanism 14 after finishing plated film.
Because the high-energy that arc-over had, the ionization level of the atom that from target 104a, inspires about 90% and the target ion that is excited have high-energy, so the film by arc ion plating has higher hardness and sticking power preferably, and the speed of film deposition is fast and evenly.In addition, described coating system 1 adopts alternately continuous plated film chamber 10 and cushion chamber 11 to form the closed plated film space of circulation, carries out thereby make filming process to circulate incessantly, improves the plated film efficient of described coating system 1 widely.
Those skilled in the art will be appreciated that; above embodiment only is to be used for illustrating the present invention; and be not to be used as limitation of the invention; as long as within connotation scope of the present invention, appropriate change and the variation that above embodiment did all dropped within the scope of protection of present invention.
Claims (9)
1. coating system, it is used for a plurality of workpieces to be plated plated film that circulates incessantly, described coating system comprises at least two plated film chambeies, at least two cushion chambers, transmitting device, feed mechanism, discharging mechanism, electric arc target stand and air extractor, described plated film chamber and described cushion chamber alternately connect into a circulation loop line mutually, described one of them cushion chamber is provided with described feed mechanism and discharging mechanism, described air extractor is connected with described plated film chamber and cushion chamber respectively to carry out vacuum pumping, described transmitting device is arranged in described plated film chamber and the cushion chamber to transmit workpiece to be plated, described plated film chamber comprises the electric arc target stand that is arranged in the plated film chamber, the target ion that described electric arc target stand is used to inspire ionization forms rete to be deposited on the workpiece to be plated, described workpiece to be plated imports described circulation loop line by described feed mechanism, and, after finishing plated film, draw by described discharging mechanism at the plated film that in the circulation loop line, circulates continuously under the transmission of described transmitting device.
2. coating system as claimed in claim 1, it is characterized in that: described plated film chamber comprises along the length direction in plated film chamber extends and parallel relative first side and second side, be provided with a plurality of described electric arc target stands on described first side evenly and at intervals, born target on the described electric arc target stand.
3. coating system as claimed in claim 2 is characterized in that: corresponding each described electric arc target stand is respectively arranged with a magnet coil and a refrigerating unit on second side in described plated film chamber.
4. coating system as claimed in claim 3 is characterized in that: described magnet coil is a ring-type cylindrical coil winding, is used for exciting near the electric arc target stand magnetic field pulse guide field to guide the target ionic to carry out the path.
5. coating system as claimed in claim 2, it is characterized in that: described air extractor comprises one-level vacuum pump, two-stage vacuum pump and three grades of vacuum pumps, be respectively arranged with a described one-level vacuum pump in the both sides of each electric arc target stand on described first side, described each one-level vacuum pump is connected to described three grades of vacuum pumps by a described two-stage vacuum pump respectively.
6. coating system as claimed in claim 5 is characterized in that: described each cushion chamber is connected to described three grades of vacuum pumps by a described two-stage vacuum pump respectively.
7. coating system as claimed in claim 1 is characterized in that: described plated film chamber and cushion chamber are two, and described two plated film chambeies are arranged in parallel, and two ends that described two cushion chambers are relative with described each plated film chamber respectively are connected.
8. coating system as claimed in claim 1, it is characterized in that: described coating system comprises a plurality of connection valves, interconnect by the described valve that is connected between described plated film chamber and the adjacent cushion chamber, described discharging mechanism and feed mechanism are connected with described cushion chamber by a described connection valve respectively.
9. coating system as claimed in claim 1, it is characterized in that: described transmitting device comprises transport tape and CD-ROM drive motor, described transport tape runs through the described plated film chamber that alternately links to each other and cushion chamber successively to form the transmission loop of a closure, and described CD-ROM drive motor is used to drive described transport tape and advances along specific direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101596023A CN102234784A (en) | 2010-04-29 | 2010-04-29 | Coating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101596023A CN102234784A (en) | 2010-04-29 | 2010-04-29 | Coating system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102234784A true CN102234784A (en) | 2011-11-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101596023A Pending CN102234784A (en) | 2010-04-29 | 2010-04-29 | Coating system |
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| CN (1) | CN102234784A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107099781A (en) * | 2017-04-20 | 2017-08-29 | 邵海平 | A kind of filming equipment and film plating process |
| CN109252138A (en) * | 2018-11-29 | 2019-01-22 | 东莞市粒米薄膜科技有限公司 | Vacuum coating equipment |
| CN112992690A (en) * | 2021-02-08 | 2021-06-18 | 杭州航鹏机电科技有限公司 | Integrated circuit manufacturing process |
| CN115287621A (en) * | 2022-08-10 | 2022-11-04 | 圣思科技(廊坊)有限公司 | Automatic transmission structure applied to functional coating vacuum coating equipment |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4313815A (en) * | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| CN101103136A (en) * | 2005-07-29 | 2008-01-09 | 株式会社爱发科 | Vacuum processing device |
-
2010
- 2010-04-29 CN CN2010101596023A patent/CN102234784A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4313815A (en) * | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| CN101103136A (en) * | 2005-07-29 | 2008-01-09 | 株式会社爱发科 | Vacuum processing device |
Non-Patent Citations (1)
| Title |
|---|
| 李成明等: "ZrN及其多层膜的性质和耐腐蚀性能", 《材料热处理学报》 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107099781A (en) * | 2017-04-20 | 2017-08-29 | 邵海平 | A kind of filming equipment and film plating process |
| CN109252138A (en) * | 2018-11-29 | 2019-01-22 | 东莞市粒米薄膜科技有限公司 | Vacuum coating equipment |
| CN109252138B (en) * | 2018-11-29 | 2019-08-30 | 东莞市一粒米薄膜科技有限公司 | Vacuum coating equipment |
| CN112992690A (en) * | 2021-02-08 | 2021-06-18 | 杭州航鹏机电科技有限公司 | Integrated circuit manufacturing process |
| CN112992690B (en) * | 2021-02-08 | 2024-03-19 | 杭州航鹏机电科技有限公司 | Integrated circuit manufacturing process |
| CN115287621A (en) * | 2022-08-10 | 2022-11-04 | 圣思科技(廊坊)有限公司 | Automatic transmission structure applied to functional coating vacuum coating equipment |
| CN115287621B (en) * | 2022-08-10 | 2024-05-07 | 圣思科技(廊坊)有限公司 | Automatic transmission structure applied to functional coating vacuum coating equipment |
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Application publication date: 20111109 |