CN102162867A - Optical film - Google Patents
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- CN102162867A CN102162867A CN2011100874948A CN201110087494A CN102162867A CN 102162867 A CN102162867 A CN 102162867A CN 2011100874948 A CN2011100874948 A CN 2011100874948A CN 201110087494 A CN201110087494 A CN 201110087494A CN 102162867 A CN102162867 A CN 102162867A
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Abstract
The invention discloses an optical film comprising a base material and a micro-structural layer on the surface of the base material, wherein the micro-structural layer comprises a plurality of column-shaped structures which include at least two column-shaped structure groups composed of a linear column-shaped structure with peak height changing along the extending direction, a linear column-shaped structure with peak height not changing along the extending direction, a curve column-shaped structure with peak height changing along the extending direction and a curve column-shaped structure with peak height not changing along the extending direction. The optical film provided by the invention has light gathering effect; and by the optical film, the phenomenon of optical inference can be effectively reduced.
Description
The application is that application number is 200810127579.2, the applying date is on June 27th, 2008, the application people is Changxing Chemical Industry Co Ltd, denomination of invention dividing an application for the Chinese invention patent application of " blooming ".
Technical field
The present invention relates in a kind of blooming, refers to a kind of condensing film that is applied to LCD especially.
Background technology
Liquid crystal panel itself is not luminous, and therefore the backlight module as the brightness source is the significant components of LCD Presentation Function, and extremely important for improving LCD brightness.At present, in backlight module, utilize blooming of all kinds, provide a kind of and can improve the LCD panel luminance, and need not change any component design or consume the way of additional energy source, become most economical and easy solution so that light source is done the application of full blast.Fig. 1 is the rough schematic of the contained various bloomings of backlight module.As shown in Figure 1, the general contained optical film of backlight module comprises the reflectance coating (1) that is disposed at light guide plate (light guide) (2) below; And being disposed at other blooming of light guide plate (2) top, it is from the bottom to top in regular turn: diffusion barrier (3), condensing film (4) and (5) and protectiveness diffusion barrier (6).
The diffusion barrier major function is for providing LCD even area source.The condensing film industry is practised and is called condensing film (Brightness Enhancement Film) or prismatic lens (prism film), the condensing film major function be by the refraction with inner full-reflection with ray-collecting at random, and be concentrated to positive visual angle (On-axis) direction of degree approximately ± 35, to improve the briliancy of LCD.General condensing film commonly used is to utilize regularly arranged linear prism column structure to reach spotlight effect.
Known condensing film is as shown in Figure 2 (as open case WO96/23649 of PCT and United States Patent (USP) the 5th, 626, No. 800), it comprises a base material (21) and is positioned at a plurality of prism structures (22) of base material (21) top, these prism structures are parallel each other, wherein each prism structure system is made of two inclined surfaces, and this two inclined surface forms peak (23) in the prism roof intersection, and intersects formation paddy (24) with another inclined surface of adjacent prisms in the prism bottom separately.Because known condensing film is the regular list structure of fixed width, so produce the optical interference phenomenon easily with from the reflection of other diaphragm in the display or other reflection or the refracted ray of refracted ray or this condensing film itself, cause occurring in appearance lathe work (moir é) or light and shade striped (mura).Fig. 3 is a United States Patent (USP) the 6th, the synoptic diagram of 354, No. 709 condensing film, wherein base material (7) top has a plurality of microscopic prisms structures (8), these linear prism structures are parallel each other, and single prism structure has the peak height of difference in the extension position of difference.Yet,, still have the concentration structure of rule even if known condensing film changes on peak separation or peak height, promptly, be (between peak and the peak or parallel to each other between the Gu Yugu) parallel to each other between each prism, and be systematicness straight line prism structure, therefore can't effectively improve the light and shade fringe phenomena.United States Patent (USP) the 5th, 919, use column structure No. 551 with two or two above peaks, this peak is the state that just differs, this linear prism structure is to have two peaks on the single prism structure at least, the shortcoming of the method is bimodal for engraving is difficult for controlling simultaneously, so yield is not high, cost increases.
Known can be on condensing film configuration protection diffusion barrier (or being called diffusion barrier), improving above-mentioned optical interference phenomenon, and prevent condensing film and panel or other diaphragm from when carrying, producing vibration and cause mutual damage.Only the shortcoming of the method is that cost increases, and will make structure of back lighting module become complicated.
Summary of the invention
In view of this, the invention provides a kind of blooming to improve above-mentioned shortcoming, it can reduce the optical interference phenomenon.
The present invention's purpose is that a kind of blooming is provided, comprise a base material and be positioned at the last microstructured layers in one of this base material surface, wherein this microstructured layers comprise a plurality of column structures and this column structure comprise at least two kinds be selected from by peak heights along the linear column structure of bearing of trend variation, peak heights not the curve column structure along the linear column structure of bearing of trend variation, peak heights along the bearing of trend variation and peak heights not along the column structure of the group that the curve column structure of bearing of trend variation is formed.
Description of drawings
Fig. 1 is the rough schematic of the contained various bloomings of backlight module.
Fig. 2 is the synoptic diagram of known condensing film.
Fig. 3 is the synoptic diagram of condensing film in the prior art.
Fig. 4 to Figure 15 is the synoptic diagram that the present invention's blooming is implemented aspect.
Embodiment
In this article, " multimodal column structure " means the connection structure set that is overlapped each other and formed by at least two column structures, and the valley line between any two adjacent column structures highly be in this two adjacent column structure the height junior height 30% to 95%.
In this article, " unimodal prism column structure " mean by single prism column structure and constituted and only have the structure at single peak,
In this article, " valley line " means the line that is joined and formed by the adjacent side of adjacent two column structures.
In this article, " column structure is height " means the vertical range into relative this column structure bottom, peak of this column structure.
In this article, " valley line is height " means this valley line vertical range of its two adjacent column structure bottoms relatively.
In this article, " width of column structure " means the distance between two paddy adjacent with these column structure two sides.
Prism column structure used herein is a persond having ordinary knowledge in the technical field of the present invention institute well known, it is made of two inclined surfaces, this inclined surface can be curved surface or plane, and this two inclined surface forms the peak in the prism roof intersection, and can be separately intersects in the bottom with another inclined surface of adjacent column structure and form paddy.
Arc column structure used herein is a persond having ordinary knowledge in the technical field of the present invention institute well known, it is made of two clinoplanes, this two clinoplanes roof intersection place is that passivation forms a curved surface, and this two clinoplane can be separately intersects in the bottom with another inclined surface of adjacent column structure and forms paddy.
In this article, " highest point of arc column structural top curved surface " is the peak that is defined as this arc column structure, and the peak that highly means the arc column structure of arc column structure is the vertical range of its bottom relatively.
In this article, " arc column structure two clinoplanes extend the angle that intersects " is the drift angle angle that is defined as this arc column structure.
In this article, " linear column structure " is the column structure that the crest line (ridge) that is defined as column structure extends straight.
In this article, " curve column structure " is the column structure that the crest line that is defined as column structure is the bending change extension, this bending is extended crest line system and is formed suitable surface curvature change, the surface curvature change system that crest line is extended in this bending is 0.2% to 100% of a benchmark with this curve column structure height, and preferable system is 1% to 20% of a benchmark with this curve column structure height.
The base material that blooming of the present invention used can be any the technical field of the invention and has and know the known person of the knowledgeable, for example glass or plastics usually.Above-mentioned plastic basis material can be made of one or more polymer resin layer.Kind in order to the resin that constitutes above-mentioned polymer resin layer there is no particular restriction, it is such as but not limited to vibrin (polyester resin), as polyethylene terephthalate (polyethylene terephthalate, PET) or Polyethylene Naphthalate (polyethylene naphthalate, PEN); Polyacrylate resin (polyacrylate resin), as polymethylmethacrylate (polymethyl methacrylate, PMMA); Polyolefin resin (polyolefin resin) is as tygon (PE) or polypropylene (PP); Polystyrene resin (polystyrene resin); Poly-cyclic olefin resins (polycycloolefin resin); Polyimide resin (polyimide resin); Polycarbonate resin (polycarbonate resin); Polyurethane resin (polyurethane resin); Triafol T (triacetate cellulose, TAC); PLA (polylactic acid); Or they's potpourri.Be preferably polyethylene terephthalate, polymethylmethacrylate, poly-cyclic olefin resins, Triafol T, PLA or its potpourri, be more preferred from polyethylene terephthalate.The thickness of base material depends on the demand of the optical articles of wishing to get usually, and it is preferable between about 50 microns to about 300 microns.
The optical property of microstructure series of strata in order to provide blooming to desire of blooming of the present invention.The present invention's microstructured layers can prepare in integrally formed mode with base material, for example directly makes in impression (emboss) mode; Or make after processing on the base material with any conventional approaches, for example: on base material, directly form a microstructured layers with coating method, or in the coating one resinous coat required microstructured layers of engraving on this coating more earlier on the base material.The thickness of above-mentioned microstructured layers there is no particular restriction, usually system between about 1 micron to about 50 microns thickness, be preferably 5 microns to 30 microns, the best is 15 microns to 25 microns.
The microstructured layers of blooming of the present invention can be made of the resin of any refractive index greater than air refraction.Generally speaking, the refractive index of microstructured layers is high more, and spotlight effect is good more.Blooming of the present invention has at least 1.50 refractive index, and preferable have a refractive index of 1.50 to 1.70.Be persond having ordinary knowledge in the technical field of the present invention institute well known in order to the resin that forms this microstructured layers, it is preferably acrylate resin such as but not limited to the group that acrylate resin, polyamide resin, epoxy resin, fluoroplast, polyimide resin, polyurethane resin, alkyd resin (alkyd resin), vibrin and composition thereof are constituted.Can be in order to the monomer that constitutes the aforesaid propylene acid ester resin such as but not limited to acrylic ester monomer.The kind of aforesaid propylene esters of gallic acid monomer is preferably acrylate or methacrylate such as but not limited to acrylate, methacrylate, amido formate acrylate (urethane acrylate), polyester acrylate (polyester acrylate), epoxy acrylate (epoxy acrylate) or its mixing.In addition, aforesaid propylene esters of gallic acid monomer can have one or more functional group, and preferable have a multiple functional radical.
The example that is applicable to the present invention's acrylic ester monomer for example is selected from and comprises (methyl) acrylate, tripropylene glycol two (methyl) acrylate (tripropylene glycol di (meth) acrylate), 1,4-butylene glycol two (methyl) acrylate (1,4-butanediol di (meth) acrylate), 1,6-hexanediol two (methyl) acrylate (1,6-hexanedioldi (meth) acrylate), polyglycol two (methyl) acrylate (polyethyleneglycol di (meth) acrylate), allylation two (methyl) cyclohexyl acrylate (allylated cyclohexyl di (meth) acrylate), two (methyl) acrylic acid isocyanates (isocyanurate di (meth) acrylate), 2-phenoxy group ethyl (methyl) acrylate (2-phenoxyl ethyl (meth) acrylate), ethoxylated trimethylolpropane three (methyl) acrylate (ethoxylated trimethylol propanetri (meth) acrylate), propoxylated glycerol three (methyl) acrylate (propoxylated glyceroltri (meth) acrylate), trimethylolpropane tris (methyl) acrylate (trimethylol propane tri (meth) acrylate), 2-(right-cumenyl-phenoxy group)-ethyl propylene acid esters (cumyl phenoxyl ethyl acrylate, CPEA) and the group that forms of they's potpourri.
The example of commercial acrylate class monomer comprises: produced by Sartomer company, commodity are by name
Or
The person; Produced by Eternal company, commodity are by name
Or
The person; And by UCB. S.A.'s production, commodity are by name
Or
Person etc.
The resin of above-mentioned formation microstructured layers can optionally add any known adjuvant, for example light initiator, crosslinking chemical, inorganic particles, levelling agent, defoamer or antistatic agent etc., its kind is a persond having ordinary knowledge in the technical field of the present invention institute well known.
Can so that obtained blooming has antistatic effect, and then improve the operation yield if necessary in order to add antistatic agent in the resin that forms microstructured layers.The antistatic agent that can be used in the present invention is a persond having ordinary knowledge in the technical field of the present invention institute well known, and it is such as but not limited to ethoxy fatty acid glyceride class, quaternary ammonium compound compound, fatty amine analog derivative, epoxy resin (as polyethylene oxide), siloxane (siloxane) or other alcohol derivatives (as poly-ethanol ester or polyglycol ether) etc.
Can be used in the present invention's light initiator, be after rayed, can produce free radical, and see through the transmission initiated polymerization person of free radical.The light initiator that is applicable to the present invention is a persond having ordinary knowledge in the technical field of the present invention institute well known, it is such as but not limited to benzophenone (benzophenone), diphenylhydroxyethanone (benzoin), 2-hydroxy-2-methyl-1-phenyl third-1-ketone (2-hydroxy-2-methyl-1-phenyl-propan-1-one), 2,2-dimethoxy-1,2-diphenyl second-1-ketone (2,2-dimethoxy-1,2-diphenylethan-1-one), 1-hydroxycyclohexylphenylketone (1-hydroxycyclohexyl phenyl ketone), 2,4,6-trimethylbenzene first anilide diphenyl phosphine oxide (2,4, or they's potpourri 6-trimethylbenzoyldiphenyl phosphine oxide).Preferable light initiator is benzophenone or 1-hydroxycyclohexylphenylketone.
Be to promote the hardness of microstructured layers, how can to add the meter level inorganic particles in the resin.The inorganic particles that can be used in the present invention is a persond having ordinary knowledge in the technical field of the present invention institute well known, it is preferably titania, zirconia, silicon dioxide, zinc paste or its potpourri such as but not limited to zinc paste, silicon dioxide, strontium titanates, zirconia, aluminium oxide, titania, calcium sulphate, barium sulphate, lime carbonate or its potpourri.Above-mentioned inorganic particles have about 50 how rice to about 350 particle size of rice how.
The present invention's microstructured layers comprises a plurality of column structures, and these column structures can be linearity (linear), curve (serpentine) or broken line (zigzag), and the peak heights of these column structures can not change or change along bearing of trend along bearing of trend.The peak heights of above-mentioned column structure along bearing of trend change mean have the part position in this column structure at least highly be at random or systematicness change along the structure main spindle's, its amplitude of variation is at least 3 percent of nominal height (or average height), preferable its amplitude of variation be this nominal height 50 5 percent to percent between.
The column structure of the present invention's microstructured layers comprises at least one unimodal column structure, and the column structure of microstructured layers of the present invention can be arc column structure, prism column structure or its mixing, is preferably the prism column structure.Above-mentioned column structure is preferable to be symmetrical column structure, uses symmetrical column structure not only can simplify job operation and light harvesting effect more easy to control.
The column structure of microstructured layers of the present invention can be contour or not contour, wide or not wide.Preferable system comprise at least two kinds be selected from by peak heights along the linear column structure of bearing of trend variation, peak heights not the curve column structure along the linear column structure of bearing of trend variation, peak heights along the bearing of trend variation and peak heights not along group that the curve column structure of bearing of trend variation is formed and have same widths and the column structure of drift angle angle.The demand that highly depends on the optical articles of wishing to get of column structure used herein, general system is between 5 microns to 100 microns scope, preferable scope between 10 microns to 50 microns, better scope between 20 microns to 40 microns.
Column structure used herein can be prism or arc column structure.When column structure was arc, the radius-of-curvature of arc column top curve surface highest point is between 2 microns to 50 microns, and was preferable between 3 microns to 35 microns, better between 5 microns to 20 microns.The prism column structure used herein or the drift angle angle of arc column structure can be mutually the same or inequality, and it is between 40 ° to 120 °, and be preferable between 60 ° to 95 °.For taking into account anti-scratch and high briliancy characteristic, the drift angle angle of prism column structure is preferably 80 ° to 95 °, and the drift angle angle of arc column structure is between 60 ° to 95 °.
When the present invention's microstructured layers comprises two kinds (for example representing with x1 and x2) or two or more (for example with x1, x2, x3, ... expression) different column structure the time, these column structures can be any suitable series arrangement, that is, can be a random structure, its arrangement mode is such as but not limited to x1x1x2x1x2x1, x1x2x1x1x2 etc.; Also can be a repetitive structure, its arrangement mode such as but not limited to: x1x2x1x2x1x2, x1x1x2x1x1x2 etc. are preferably two kinds of repeated arrangement structures that different column structure constituted.
Another preferable enforcement aspect according to the present invention, the present invention's blooming can be coated with the microstructured layers of above-mentioned tool spotlight effect as light collecting layer more optionally with the diffusion layer of the continuous production technology first applying implenent diffusion effect on base material of volume to volume formula (roll to roll) on diffusion layer.This diffusion layer comprises transparent particulate, and the refractive index of transparent particulate is greater than the refractive index of this light collecting layer in this diffusion layer, and the difference of the refractive index of the refractive index of transparent particulate and this light collecting layer is 0.05 to 1.1 in this diffusion layer.The transparent particle species that can be used among the present invention there is no particular restriction, can be glass beads (beads), metal oxide particle, plastic beads or its mixing.Above-mentioned plastic beads there is no particular restriction, and it is such as but not limited to acrylate resin, styrene resin, amido formate resin, silicone resin or they's potpourri; And metal oxide particle there is no particular restriction, and it is such as but not limited to titania (TiO2), silicon dioxide (SiO2), zinc paste (ZnO), barium sulphate (BaSO4), aluminium oxide (Al2O3), zirconia (ZrO2) or they's potpourri.The shape of this transparent particulate there is no particular restriction, for example can be sphere, rhombus, ellipse, biconvex lens shape etc.The mean grain size size of this transparent particulate is preferably 3 to 30 microns between 1 to 50 micron, the best is 5 to 20 microns, and the refractive index of this transparent particulate is 1.5 to 2.5, and the best is 1.9.
For avoiding the substrate surface scratch to influence the optical property of diaphragm, can go up with respect to another surface of microstructured layers if necessary in base material and form an anti-scratch layer.Above-mentioned anti-scratch layer can be level and smooth shape or non-level and smooth shape, can use any prior art method to form the present invention's anti-scratch layer, it applies the anti-scratch layer that contains granule proliferation etc. such as but not limited to screen painting, spraying, embossing processing or in substrate surface, wherein apply the anti-scratch layer that contains granule proliferation and can make anti-scratch layer have the light diffusion of some degree.The preferable system of the thickness of above-mentioned anti-scratch layer is between 0.5～30 micron, and is better between 1～10 micron.Above-mentioned granule proliferation can be sphere, rhombus, oval sphere or biconvex lens shape (biconvex lenses) etc., its particle size is preferable between 1～30 micron, its kind does not also have particular restriction, can be organic filler or inorganic particulate, be preferably organic filler, for example polyacrylate resin, polystyrene resin, polyurethane resin, silicone resin or its potpourri are preferably polyacrylate resin.
The optical characteristics of optical articles can represent that wherein haze value is relevant with the light scattering of optical articles by haze value (Hz), total light transmittance (Tt), and total light transmittance is relevant with the light penetration rate of optical articles.Do not exist on one of base material surface under the situation of microstructured layers, the mist degree of the last resinous coat in another surface is measured in standard method according to JIS K7136, and the gained mist degree is 1%～90%, is preferably 5%～40%, therefore, the present invention's anti-scratch layer has the ability of scattered light.And according to JIS K7136 standard method, measure the total light transmittance of blooming of the present invention, have and be not less than 60% total light transmittance, be preferably and be higher than 80%, more than better 90% or 90%.In addition, the present invention's anti-scratch layer measures according to the JISK5400 standard method, and it has can reach 3H or above pencil hardness.
Can use any known method to prepare the microstructured layers and the anti-scratch layer of blooming of the present invention, and the sequencing of preparation microstructured layers and anti-scratch layer there is no particular restriction.
The manufacture of the microstructured layers of blooming of the present invention there is no particular restriction, for example, and can be via the method manufacturing that comprises following steps:
(a) resin and suitable adjuvant are mixed to form a colloidal state coating composition;
(b) on a cylindrical blank (or claiming cylinder), with diamond cutter on the cylinder of rotation with drum shaft to direction move the radial feed that fixes, make diamond cutter on cylinder, carve out specific linear column groove by the control translational speed of diamond cutter and/or the rotating speed of cylinder, again with change c-axle rotating speed change that the diamond cutter mode of resonance reaches that height rises and falls or about the structure of variation continuously;
(c) this colloidal state coating composition is coated on base material or the roller, utilized step (b) cylinder of finishing of carving to carry out roller embossing, hot transfer printing or hot extrusion mode then and make this coating form a patterned surface; And
(d) to this coating irradiation energy ray or heating or both and with so that this coating solidify.
Being characterized as of said method utilizes secondary processing mode at least to make the microstructured layers of blooming of the present invention, what is called secondary processing mode at least means the specific groove of carving at least two kinds of decorative patterns (pattern) on cylinder, the method great advantage obtains maximum yield for can utilize the simplest processing mode.
Below cooperate the graphic structure that illustrates the microstructured layers of blooming of the present invention now, only non-scope in order to restriction the present invention.Modification and change that any personage who is familiar with this skill can reach easily are included in this case instructions disclosure.
To shown in Figure 13, the present invention's optical film surface on base material (300) forms microstructured layers (310,410,510,610 and 710) as Fig. 4, and the generation type of microstructured layers can be: prepare in integrally formed mode with base material; Or, for example on base material, form microstructured layers, or required structure is carved in coating more earlier with coating method and embossing mode with any known processing mode preparation.
In one of the present invention embodiment, microstructured layers comprises a plurality of column structures, and this column structure comprises a plurality of linear column structures and a plurality of curve column structure.In a preferred embodiment, these column structures comprise by peak heights along the unimodal curve column structure (320) of bearing of trend variation (x1) and peak heights (x2) do not constitute along the unimodal linear column structure (330) of bearing of trend variation, these column structures are arranged (x1x2x1x2x1x2) with the repetitive structure that replaces mutually, as shown in Figure 4.The column structure of microstructured layers is contour, wide and unimodal prism column structure with identical drift angle angle in the enforcement aspect of Fig. 4.
In another embodiment of the present invention, microstructured layers comprises a plurality of column structures, and these column structures are linear column structure, and the peak heights of part column structure changes along bearing of trend, as Fig. 5 to shown in Figure 8.The column structure of this microstructured layers is contour, wide and has the unimodal prism column structure of identical drift angle angle.
In the enforcement aspect of Fig. 5 to 8 optical thin film of the present invention, these column structures comprise by peak heights along the unimodal linear column structure (340) of bearing of trend variation (x3) and peak heights (x2) do not constitute along the unimodal linear column structure (330) of bearing of trend variation, these column structures are arranged (x3x2x3x2x3x2) with the repetitive structure that replaces mutually.In the enforcement aspect of Fig. 5, this base material is level and smooth shape with respect to another surface of microstructured layers.In the enforcement aspect of Fig. 6, comprise an anti-scratch layer (100) that contains granule proliferation on this base material another surface with respect to microstructured layers.In the enforcement aspect of Fig. 7, be coated with diffusion layer (110) on the base material earlier, go up this microstructured layers of coating as light collecting layer in diffusion layer (110) again, this diffusion layer (110) comprises and comprises an anti-scratch layer (100) that contains granule proliferation on transparent particulate and this base material another surface with respect to microstructured layers.In the enforcement aspect of Fig. 8, these microstructure series of strata prepare in one-body molded mode with base material.
Fig. 9 and the present invention's of Figure 10 illustration the column structure that microstructured layers comprised can be contour (as Fig. 9 b and Figure 10 b), not contour (as Fig. 9 a and 9c), wide (as Fig. 9 b and Figure 10 b) or not wide (as Figure 10 a and Figure 10 c).
In another embodiment of the present invention, microstructured layers comprises a plurality of column structures, and these column structures are linear arc column structure, and the peak heights of part arc column structure changes along bearing of trend, as shown in figure 11.The column structure of this microstructured layers is contour, wide and has the unimodal arc column structure of identical drift angle angle.In the enforcement aspect of Figure 11, these column structures comprise by peak heights along the unimodal linear column structure (350) of bearing of trend variation (x4) and peak heights (x5) do not constitute along the unimodal linear column structure (360) of bearing of trend variation, these column structures are arranged (x4x5x4x5x4x5) with the repetitive structure that replaces mutually.
In another embodiment of the present invention, the present invention's microstructured layers comprises a plurality of column structures, in the enforcement aspect of Figure 12, these column structures comprise peak heights along the unimodal linear column structure (340) of bearing of trend variation (x3), peak heights not along the unimodal linear column structure (330) of bearing of trend variation (x2), peak heights do not change along bearing of trend more than the repetitive structure (x6x2x3x6x2x3x6x2x3) that (x6) constituted of crest line column structure (370).Multimodal column structure (370), it is the connection structure set that is overlapped each other and formed by two contour arc column structures (370a and 370b), wherein the height h1 of the valley line between arc column structure (370a and 370b) be arc column structure (370a and 370b) height H 1 60%; Unimodal prism column structure (330) be contour, wide and peak heights not along the unimodal prism column structure (330) of bearing of trend variation, unimodal prism column structure (340) be contour, wide and peak heights along the unimodal prism column structure (340) of bearing of trend variation.
In another embodiment of the present invention, microstructured layers comprises a plurality of column structures, as shown in figure 13.In the enforcement aspect of Figure 13, these column structures comprise peak heights along the unimodal linear prism column structure (340) of bearing of trend variation (x3), peak heights not along the unimodal linear prism column structure (330) of bearing of trend variation (x2), the repetitive structure (x7x2x3x7x2x3x7x2x3) that (x7) do not constituted of peak heights along the unimodal linear arc column structure (380) of bearing of trend variation.
In another embodiment of the present invention, microstructured layers comprises a plurality of column structures, these column structures comprise by peak heights along the unimodal linear prism column structure (340) of bearing of trend variation (x3) and peak heights (x8) do not constitute along the unimodal linear prism column structure (390) of bearing of trend variation, these column structures are arranged (x8x3x8x3x8x3) with the repetitive structure that replaces mutually, as shown in figure 14.The column structure of this microstructured layers has identical drift angle angle height and width, unimodal linear prism column structure (390) (x8) is made of two dip plane, above-mentioned two dip plane, one side is the plane, another side is a curved surface, the curved transition system of its curved surface is 0.2% to 100% of a benchmark with this curve column structure height, and preferable system is 1% to 20% of a benchmark with this curve column structure height.
In another embodiment of the present invention, microstructured layers comprises a plurality of column structures, these column structures comprise by peak heights along the unimodal linear prism column structure (340) of bearing of trend variation (x3) and peak heights (x2) do not constitute along the unimodal linear prism column structure (330) of bearing of trend variation, these column structures are arranged (x3x2x3x2x3x2) with the repetitive structure that replaces mutually, as shown in figure 15.The column structure of this microstructured layers has identical drift angle angle, is about 90 °, but not contour (x2＞x3), highly be about 16 microns to 26 microns, difference in height is between 1 micron to 7 microns.On base material (300) another surface, comprise an anti-scratch layer (100) that contains granule proliferation with respect to microstructured layers, the thickness system of this anti-scratch layer is between about 1 micron to about 5 microns, this granule proliferation is a polyacrylate resin, its particle size is between about 2 microns to about 7 microns, measure according to JIS K7136 standard method, the gained mist degree is 10%-30%.The peak heights of above-mentioned column structure changes to mean in this column structure highly being that systematicness changes along extension position along bearing of trend, be a curve of cyclical fluctuations, its wavelength is approximately between 0.5 micron to 2 microns, its amplitude of variation be average height 30 5 percent to percent between.
Claims (16)
1. blooming, comprise a base material and be positioned at microstructured layers on this substrate surface, wherein this microstructured layers comprises a plurality of column structures and this column structure and comprises at least two kinds to be selected from by peak heights be not unimodal column structure along group and this column structure that the curve column structure of bearing of trend variation is formed along linear column structure, the peak heights of bearing of trend variation not along the curve column structure and the peak heights of bearing of trend variation along linear column structure, the peak heights of bearing of trend variation.
2. blooming according to claim 1, wherein this column structure system is selected from arc column structure, prism column structure and mixes the group that is formed.
3. blooming according to claim 1, wherein these peak heights have a nominal height along the linear column structure or the curve column structure of bearing of trend variation, what have the part position in these column structures at least highly is random variation, and its amplitude of variation is at least 3 percent of this nominal height.
4. blooming according to claim 3, wherein this amplitude of variation be this nominal height 50 5 percent to percent between.
5. blooming according to claim 2, wherein the drift angle of these prism column structures and/or arc column structure system is between 40 ° to 120 °.
6. blooming according to claim 5, wherein the drift angle angle of these prism column structures and/or arc column structure system is between 60 ° to 95 °.
7. blooming according to claim 2, wherein the radius-of-curvature at these arc column tops is between 2 microns to 50 microns.
8. blooming according to claim 1, wherein these column structures highly is scope between 5 microns to 100 microns.
9. blooming according to claim 1, wherein the bending of this curve column structure extension crest line surface curvature change system is 0.2% to 100% of a benchmark with this curve column structure height.
10. blooming according to claim 9, wherein the bending of this curve column structure extension crest line surface curvature change system is 1% to 20% of a benchmark with this curve column structure height.
11. blooming according to claim 1, wherein this column structure is symmetrical column structure.
12. blooming according to claim 1 wherein further comprises anti-scratch layer on this base material another surface with respect to microstructured layers.
13. blooming, comprise a base material and be positioned at the last microstructured layers in one of this base material surface, wherein this microstructured layers comprises a plurality of column structures and these column structures to comprise the repetitive structure and this column structure that are made of linear column structure and curve column structure is unimodal column structure.
14. blooming according to claim 13, wherein these column structure systems are selected from arc column structure, prism column structure and mix the group that is formed.
15. blooming according to claim 13, wherein these column structures highly is scope between 5 microns to 100 microns.
16. blooming according to claim 13, wherein the peak heights of these linear column structures does not change along bearing of trend.
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| CN2011100874948A CN102162867A (en) | 2008-06-27 | 2008-06-27 | Optical film |
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| CN2011100874948A CN102162867A (en) | 2008-06-27 | 2008-06-27 | Optical film |
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| CNA2008101275792A Division CN101295047A (en) | 2008-06-27 | 2008-06-27 | Optical film |
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| CN102162867A true CN102162867A (en) | 2011-08-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103728544A (en) * | 2012-10-10 | 2014-04-16 | 新世纪光电股份有限公司 | Detection device |
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| US20060226583A1 (en) * | 2005-04-04 | 2006-10-12 | Marushin Patrick H | Light directing film |
| CN101004461A (en) * | 2007-01-22 | 2007-07-25 | 长兴光学材料（苏州）有限公司 | Anti scraping thin film, and liquid crystal display |
| CN201017056Y (en) * | 2007-03-14 | 2008-02-06 | 迎辉科技股份有限公司 | Anti-adsorb light gathering film |
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| US20060226583A1 (en) * | 2005-04-04 | 2006-10-12 | Marushin Patrick H | Light directing film |
| CN101004461A (en) * | 2007-01-22 | 2007-07-25 | 长兴光学材料（苏州）有限公司 | Anti scraping thin film, and liquid crystal display |
| CN201017056Y (en) * | 2007-03-14 | 2008-02-06 | 迎辉科技股份有限公司 | Anti-adsorb light gathering film |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103728544A (en) * | 2012-10-10 | 2014-04-16 | 新世纪光电股份有限公司 | Detection device |
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Application publication date: 20110824 |