CN102147302A - Building-block-type polariscope - Google Patents
Building-block-type polariscope Download PDFInfo
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- CN102147302A CN102147302A CN201010108218.0A CN201010108218A CN102147302A CN 102147302 A CN102147302 A CN 102147302A CN 201010108218 A CN201010108218 A CN 201010108218A CN 102147302 A CN102147302 A CN 102147302A
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- 238000005259 measurement Methods 0.000 claims description 38
- 239000011449 brick Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 5
- 230000017525 heat dissipation Effects 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000011438 cord wood Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Abstract
The invention discloses a building-block-type polariscope. The building-block-type polariscope comprises a light source, a polarizer set which consists of a polarizer and a 1/4 glass plate, an analyzer set which consists of an analyzer and a 1/4 glass plate, and a vidicon. The building-block-type polariscope also comprises two miniature step motors, which drive the polarizer set and the analyzer set respectively to make the polarizer set and the analyzer set rotate independently and rotate synchronously, and a supporting base plate which is used for fixing the light source, the polarizer set, the analyzer set and the vidicon on the supporting base plate detachably so as to form a V-shaped reflective measuring structure and a transmission-type measuring structure sequentially. In a preferable embodiment, the building-block-type polariscope also comprises a semi-reflecting mirror which is fixed on the supporting base plate detachably so as to form a right-angled reflective measuring structure together with the light source, the polarizer set, the analyzer set and the vidicon. Therefore, a right-angled reflective measuring function is further realized.
Description
Technical field
The present invention relates to photo-elastic instrument, be specifically related to a kind of brick pattern photo-elastic instrument that integrates two or three function in the reflective measurement of V-type, the reflective measurement in right angle and the transmission-type measurement function.
Background technology
Photoelastic technique is one of important means of on-the-spot structural stress test, and its concrete measurement structure can be divided into transmission-type measurement structure and reflective measurement structure, and transmission-type photo-elastic instrument and reflective photoelastic instrument are arranged with it accordingly.
Transmission-type photo-elastic instrument (see figure 1) is when operation, light source 0, polarizer 1, quarter wave plate 2 and 6, analyzer 7, measurand 3, optical filter 4, compensator 5 and video camera 8 are arranged in a straight line, the polarized light that forms by polarizer 1 passes each parts arrival video camera 8, video camera 8 obtains interference fringe image, can obtain the STRESS VARIATION on the measurand after this interference fringe image is analyzed.Usually, the object of surveying is a structural model, and described structural model is installed in and loads on the frame, and loads stress load maintainer on frame and force cell to a certain size power of this structural model effect by this.
It still is the perpendicular type light path for the V-type light path that reflective photoelastic instrument is measured light path according to it, and is divided into reflective photoelastic instrument (see figure 2) of V-type and the reflective photoelastic instrument in right angle (Fig. 3), has the reflective measurement structure of reflective measurement structure of V-type and right angle accordingly.They all are by at practical structures part surface 10 bonding light paster 9 materials that can reflect, and utilize reflected light path to come the method for measurement for opaque body structure surface strain field distribution.The reflective photoelastic instrument of V-type is in when operation, polarizer 1 and analyzer 7 with constituted the V-type light paths by measurand 9.The reflective photoelastic instrument in right angle also comprises a half-reflecting mirror 11, and in measuring process, incident light is basically perpendicular to component surface 10 incidents after through half-reflecting mirror 11 reflection, and returns along normal direction, enters video camera 8 after then passing half-reflecting mirror 11, analyzer 7 etc.
In the actual measurement process, different according to measurand and test request will be used transmission-type photo-elastic instrument, the reflective photoelastic instrument of reflective photoelastic instrument of V-type and right angle respectively.
Therefore, for mechanism for testing, purchase three kinds of surveying instruments respectively and satisfy actual measurement requirement, it is very high that it measures cost.
Summary of the invention
One object of the present invention is to provide a kind of brick pattern photo-elastic instrument, comprise analyzer group and a video camera that polarizer group that a light source, one be made up of a polarizer and one 1/4 slide, one are made up of an analyzer and one 1/4 slide, wherein, also comprise:
Two drive polarizer group and analyzer group respectively, the micro-step motor that makes polarizer group and analyzer group rotate independently and synchronously rotate; And
A supporting substrate, it is used for described light source, polarizer group, analyzer group and video camera removably fixed thereon, to form reflective measurement structure of V-type and transmission-type measurement structure successively.
In a preferred embodiment, brick pattern photo-elastic instrument of the present invention also comprises a half-reflecting mirror, and it is used for removably being fixed on supporting substrate, to form the reflective measurement structure in right angle with light source, polarizer group, analyzer group and video camera.
This photo-elastic instrument can be realized the reflective photoelastic instrument of V-type, the reflective photoelastic instrument in right angle and transmission-type photo-elastic instrument measurement function through simple cordwood assembling conversion.By this assembling mode flexibly, some components and parts are reused, thereby greatly reduce the measurement cost.Adopt micro-step motor, also make whole photo-elastic instrument be easier to carry, and measuring accuracy is improved.
Description of drawings
Now in conjunction with the accompanying drawings, the mode with specific embodiment is described further brick pattern photo-elastic instrument of the present invention.But these embodiment are also unrestricted for the application's protection domain, and the application's protection domain is defined by the claims.
Because photoelastic measuring technique has been well known to those of ordinary skill in the art, for this reason, will do concise and to the point the description to known part.
Fig. 1 is the simplification index path of transmission-type photo-elastic instrument;
Fig. 2 is the simplification index path of the reflective photoelastic instrument of V-type;
Fig. 3 is the simplification index path of the reflective photoelastic instrument in right angle;
Fig. 4 is the stereographic map of brick pattern photo-elastic instrument when being assembled into the reflective measurement structure of V-type according to an embodiment of the invention;
Fig. 5 is the arrangenent diagram of micro-step motor according to an embodiment of the invention;
Fig. 6 shows according to an embodiment of the invention brick pattern photo-elastic instrument when forming the transmission-type measurement structure, the transmissive support of being correlated with and on the stereographic map of installing component;
Fig. 7 shows the stereographic map of brick pattern photo-elastic instrument when forming the reflective measurement structure in right angle according to an embodiment of the invention;
Fig. 8 is the stereographic map of supporting substrate according to an embodiment of the invention;
Fig. 9 shows according to an embodiment of the invention brick pattern photo-elastic instrument when forming the reflective measurement structure of V-type, the angle A of required adjustment;
Figure 10 is the Lights section and the radiator structure in according to an embodiment of the invention the brick pattern photo-elastic instrument;
Figure 11 is the compensator part that has the electronic digital indicator structure in according to an embodiment of the invention the brick pattern photo-elastic instrument.
Specific embodiments
Brick pattern photo-elastic instrument of the present invention comprises analyzer group and video camera that polarizer group that a light source, one be made up of a polarizer and one 1/4 slide, are made up of an analyzer and one 1/4 slide, wherein, also comprises:
Two drive polarizer group and analyzer group respectively, the micro-step motor that makes polarizer group and analyzer group rotate independently and synchronously rotate; And
A supporting substrate, it is used for described light source, polarizer group, analyzer group and video camera removably fixed thereon, to form reflective measurement structure of V-type and transmission-type measurement structure successively.
In a preferred embodiment, brick pattern photo-elastic instrument of the present invention also comprises a half-reflecting mirror, and it is used for removably being fixed on supporting substrate, to form the reflective measurement structure in right angle with light source, polarizer group, analyzer group and video camera.Thus, further realize the reflective measurement function in right angle.
The invention will be further described below in conjunction with some specific embodiments.
Fig. 4 is the stereographic map of brick pattern photo-elastic instrument when being assembled into the reflective photoelastic instrument of V-type according to an embodiment of the invention.This brick pattern photo-elastic instrument comprises analyzer group that polarizer group that a light source 0, one be made up of a polarizer and one 1/4 slide 12, one be made up of an analyzer and one 1/4 slide 13, video camera 8, two micro-driving motors 14 and 15, and a supporting substrate 16.Preferably, this brick pattern photo-elastic instrument also comprises a compensator part 17.In described two micro-step motors 14 and 15 one of them drives polarizer group 12, and another drives analyzer group 13, and can make polarizer group 12 and analyzer group 13 rotation synchronously and independent rotation under the control of controller.Among Fig. 4, described light source 0, polarizer group 12, analyzer group 13 and video camera 8 are positioned on the relevant position of supporting substrate, in order to form the reflective measurement structure of V-type.The polarization axle of polarizer, the polarization axle of analyzer, and the relative orientation between the optical axis of two 1/4 slides can change.Preferably, described photo-elastic instrument also comprises optical filter 18.
Brick pattern photo-elastic instrument of the present invention is when being assembled into the reflective photoelastic instrument of V-type, and light source 0, polarizer group 12, analyzer group 13 and video camera 8 will be rearranged point-blank.For ease of control tested object or model structure, and building of light path for convenience, preferably, can introduce transmissive support.Fig. 6 shows an exemplary of this transmissive support 21, it can removably be fixed on the supporting substrate 16, be used to place described polarizer group 12, analyzer group 13 and load frame 22, described loading frame 22 is used for the stress model structure, also force cell can be set on the described loading frame 22, so that model structure applied a certain size stress.When photo-elastic instrument of the present invention is formed the transmission-type measurement structure, light source 0, this transmissive support 21 and video camera 8 are fixed on the relevant position of supporting substrate 16.
Brick pattern photo-elastic instrument of the present invention is when being assembled into the reflective photoelastic instrument in right angle, and the relative position of light source 0, polarizer group 12, analyzer group 13, video camera 8 and a half-reflecting mirror 11 as shown in Figure 7.The light that light source sends passes polarizer group 12, and after half-reflecting mirror 11 reflections, be basically perpendicular to component surface 10 (not shown this component surface of Fig. 7) incident, then return, enter video camera 8 after passing half-reflecting mirror 11, analyzer group 13 along component surface 10 normal direction.The index path of this reflective measurement structure in right angle can see Fig. 3 for details.
When stating various photo-elastic instrument measurement function in realization, each part detachable ground of the present invention is fixed on the relevant position of supporting substrate 16.Wherein, can be by locating and fix these parts in the corresponding pilot hole that these parts is inserted supporting substrate 16.An exemplary of described supporting substrate is furnished with a plurality of pilot holes as shown in Figure 8 on it, as 6 ', and 16 ", 16 " '.The size of pilot hole, quantity and position can be adjusted according to the needs of actual light path arrangement.Also can pass through other location and fixed form, with each part detachable in the light path be positioned to the appropriate location.
In some embodiments, described light source, described polarizer group and the micromachine that drives this polarizer group can be integrated as a unit, and described video camera, described analyzer group and the micromachine that drives this analyzer group integrated as another unit, relative position and adjustment half-reflecting mirror by two unit of conversion, can realize the mutual conversion between the reflective measurement structure of V-type, the reflective measurement structure in right angle and the transmission-type measurement structure, thus, make the use of instrument of the present invention more convenient.
Brick pattern photo-elastic instrument of the present invention is when being assembled into the reflective photoelastic instrument of V-type, in order to guarantee that light is vertically by polarizer group 12, and after paster 9 reflections, can impinge perpendicularly on analyzer group 13, the present invention is designed to analyzer group 13 can be according to the distance between analyzer group 13 and the paster 9 and the deflection certain angle.Wherein, described deflection angle A is defined as the angle between polarizer group 12 planes and analyzer group 13 planes, and as shown in Figure 9, the relation between described distance and the described deflection angle A is as shown in table 1 below.Light source 0 and polarizer group 12 can be kept motionless, analyzer group 13 is designed to rotate around a stationary shaft, be equipped with the scale indication at supporting substrate simultaneously, indicate the shake position of group rotation of analyzing, can make angle A be adjusted to a certain size thus.By this adjustable structure, can significantly improve measuring accuracy.Described deflection can accomplished in various ways, for example, realizes by manual adjustment angular setting screw 23 wherein, or realizes by automatic mode.
The relation of table 1 distance L and deflection angle A
| Distance/mm (L) | 600 | 800 | 1000 | 1200 | 1400 | 1600 | 1800 | 2000 |
| Angle/° (A) | 12.84 | 9.65 | 7.72 | 6.44 | 5.52 | 4.83 | 4.30 | 3.87 |
In addition, the present invention changes the light source heat radiation structure of the Lights section.Figure 10 is the Lights section and the radiator structure in according to an embodiment of the invention the brick pattern photo-elastic instrument.In the figure, the wind direction of fan 24 generations is along direction of arrow P shown in Figure 10.The wind direction of old-fashioned radiator structure fan is opposite with P direction shown in Figure 10, and heat makes the lens heating after blowing to lens, damages, and has therefore influenced serviceable life.The present invention has effectively avoided the problems referred to above by heat dissipation direction being changed into heat radiation backward, has realized the prolongation of equipment task time.For the photo-elastic instrument of right angle light path form, because the transmittance of half-reflecting mirror is low, thereby will use stronger light source usually, and stronger light source is easy to damage optical device, and therefore, those skilled in the art do not adopt this right angle light path to measure stress.In the present invention, owing to adopted above-mentioned radiating mode, reduced the influence of light source sun adjuster spare, thereby allowed light intensity further to strengthen, made this right angle light path can be applicable to the measurement of stress therefrom, the stress measurement of locating in particular for weld seam etc.For the stress that weld seam etc. is located, this right angle light path metering system is than the V-type light path, and is more accurate and convenient.
In addition, for improving measuring accuracy, the present invention adds compensator in light path.As shown in figure 12, compensator part 17 comprises electronic digital indicator structure 25, and fringe order is directly partly read by digital display, wherein by adopting commercially available electronic digital indicator structure 25, quartzy compensator 26 is installed thereon, realizes the function of compensator.Therefore, this implementation is more easy in terms of existing technologies.
In some embodiments, can be as required, add elements such as lens and ground glass at the Lights section, in view of the use of these common elements is well known in the art, do not repeat them here.
Claims (10)
1. brick pattern photo-elastic instrument comprises analyzer group and a video camera that polarizer group that a light source, one be made up of a polarizer and one 1/4 slide, one are made up of an analyzer and one 1/4 slide, wherein, also comprises:
Two drive polarizer group and analyzer group respectively, the micro-step motor that makes polarizer group and analyzer group rotate independently and synchronously rotate; And
A supporting substrate, it is used for described light source, polarizer group, analyzer group and video camera removably fixed thereon, to form reflective measurement structure of V-type and transmission-type measurement structure successively.
2. according to the brick pattern photo-elastic instrument of claim 1, wherein, described supporting substrate is provided with a plurality of pilot holes, and it is used to realize described light source, polarizer group, analyzer group and video camera described the fixing on supporting substrate.
3. according to the brick pattern photo-elastic instrument of claim 1, wherein, also comprise a transmissive support, it removably is fixed on the supporting substrate, be used to place described polarizer group, described analyzer group and a loading frame, make described light source, described transmissive support and described video camera form the transmission-type measurement structure.
4. according to the brick pattern photo-elastic instrument of claim 1 or 2, wherein, also comprise a half-reflecting mirror, it is used for removably being fixed on supporting substrate, forms the reflective measurement structure in right angle with light source, polarizer group, analyzer group and video camera.
5. according to the brick pattern photo-elastic instrument of claim 1, wherein, described analyzer group is configured to and can rotates around a stationary shaft, be used for making the reflective measurement structure of described V-type, the angle (A) between polarizer group plane and the analyzer group plane can change according to the distance of analyzer group apart from measurand.
6. brick pattern photo-elastic instrument according to claim 4, wherein, wherein said light source, described polarizer group and the micromachine that drives this polarizer group integrate, and described video camera, described analyzer group and the micromachine that drives this analyzer group integrate.
7. brick pattern photo-elastic instrument according to claim 4 wherein, also comprises compensator.
8. brick pattern photo-elastic instrument according to claim 7, wherein, described compensator comprises the electronic digital indicator structure, fringe order is partly read by digital display.
9. brick pattern photo-elastic instrument according to claim 8, wherein said light source place disposes radiator structure, and its heat dissipation direction is opposite with the light source light direction.
10. brick pattern photo-elastic instrument according to claim 9, wherein said photo-elastic instrument also comprises optical filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010108218.0A CN102147302B (en) | 2010-02-05 | 2010-02-05 | Building-block-type polariscope |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010108218.0A CN102147302B (en) | 2010-02-05 | 2010-02-05 | Building-block-type polariscope |
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| CN102147302A true CN102147302A (en) | 2011-08-10 |
| CN102147302B CN102147302B (en) | 2013-02-20 |
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| CN201010108218.0A Expired - Fee Related CN102147302B (en) | 2010-02-05 | 2010-02-05 | Building-block-type polariscope |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103644990A (en) * | 2013-12-13 | 2014-03-19 | 苏州精创光学仪器有限公司 | Compact glass surface stress measuring instrument |
| CN105424242A (en) * | 2015-12-18 | 2016-03-23 | 苏州精创光学仪器有限公司 | Automatic measuring instrument of glass internal stress |
| CN106092407A (en) * | 2016-06-07 | 2016-11-09 | 清华大学 | A kind of Harmonic Gears Tooth friction force based on photoelastic coating method test system and method |
| CN106959177A (en) * | 2017-04-07 | 2017-07-18 | 清华大学 | Harmonic gear teeth friction testing system and method based on photoelastic coating method |
| CN108303202A (en) * | 2018-02-09 | 2018-07-20 | 苏州利力升光电科技有限公司 | Laser photo-elastic instrument |
| CN110082296A (en) * | 2018-01-26 | 2019-08-02 | 清华大学 | Optical signal measurement system |
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| CN110954253A (en) * | 2019-10-25 | 2020-04-03 | 华南理工大学 | A stress measurement method and stress measurement optical path device |
| CN111122030A (en) * | 2019-12-10 | 2020-05-08 | 同济大学 | Reflection-transmission type dual-purpose photoelastic instrument |
| CN111818251A (en) * | 2020-08-12 | 2020-10-23 | 中国海洋大学 | Rotating Polarization Distance Gated Camera |
| CN111880189A (en) * | 2020-08-12 | 2020-11-03 | 中国海洋大学 | Continuous optical range gated lidar |
| CN112461419A (en) * | 2020-12-02 | 2021-03-09 | 中国科学院武汉岩土力学研究所 | Endoscopic scanning photoelastic instrument for tunnel model |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2066175U (en) * | 1989-01-26 | 1990-11-21 | 天津大学 | L-w type multi-functional polarizing testing demonstrating instrument |
| CN1144037C (en) * | 2001-02-22 | 2004-03-31 | 中国兵器工业第二○五研究所 | Standard device for calibrating polarized-light stressometer and method for locating minimal light intensity |
| CN2713464Y (en) * | 2003-12-19 | 2005-07-27 | 深圳职业技术学院 | Inner stress detector for transparent plastic piece |
| CN2779378Y (en) * | 2005-03-31 | 2006-05-10 | 南通大学 | Multifunctional experimental instrument for elasticity of material |
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2010
- 2010-02-05 CN CN201010108218.0A patent/CN102147302B/en not_active Expired - Fee Related
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|---|---|---|---|---|
| CN103644990A (en) * | 2013-12-13 | 2014-03-19 | 苏州精创光学仪器有限公司 | Compact glass surface stress measuring instrument |
| CN105424242A (en) * | 2015-12-18 | 2016-03-23 | 苏州精创光学仪器有限公司 | Automatic measuring instrument of glass internal stress |
| CN106092407A (en) * | 2016-06-07 | 2016-11-09 | 清华大学 | A kind of Harmonic Gears Tooth friction force based on photoelastic coating method test system and method |
| CN106959177A (en) * | 2017-04-07 | 2017-07-18 | 清华大学 | Harmonic gear teeth friction testing system and method based on photoelastic coating method |
| CN106959177B (en) * | 2017-04-07 | 2019-04-02 | 清华大学 | Harmonic gear teeth friction testing system and method based on photoelastic coating method |
| CN110082296A (en) * | 2018-01-26 | 2019-08-02 | 清华大学 | Optical signal measurement system |
| CN110082296B (en) * | 2018-01-26 | 2021-01-12 | 清华大学 | Optical signal measuring system |
| CN108303202A (en) * | 2018-02-09 | 2018-07-20 | 苏州利力升光电科技有限公司 | Laser photo-elastic instrument |
| CN110360949B (en) * | 2019-07-19 | 2020-10-20 | 东北大学 | A Multifunctional Holographic Interferometry System |
| CN110360949A (en) * | 2019-07-19 | 2019-10-22 | 东北大学 | A kind of multifunctional holographic interferometer measuration system |
| CN110954253A (en) * | 2019-10-25 | 2020-04-03 | 华南理工大学 | A stress measurement method and stress measurement optical path device |
| CN111122030A (en) * | 2019-12-10 | 2020-05-08 | 同济大学 | Reflection-transmission type dual-purpose photoelastic instrument |
| CN111122030B (en) * | 2019-12-10 | 2024-05-31 | 同济大学 | Reflection-transmission type dual-purpose photoelastic instrument |
| CN111818251A (en) * | 2020-08-12 | 2020-10-23 | 中国海洋大学 | Rotating Polarization Distance Gated Camera |
| CN111880189A (en) * | 2020-08-12 | 2020-11-03 | 中国海洋大学 | Continuous optical range gated lidar |
| CN111818251B (en) * | 2020-08-12 | 2021-07-20 | 中国海洋大学 | Rotating Polarization Distance Gated Camera |
| CN112461419A (en) * | 2020-12-02 | 2021-03-09 | 中国科学院武汉岩土力学研究所 | Endoscopic scanning photoelastic instrument for tunnel model |
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| CN102147302B (en) | 2013-02-20 |
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