CN102132213B - 光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法 - Google Patents

光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法 Download PDF

Info

Publication number
CN102132213B
CN102132213B CN200980132826.0A CN200980132826A CN102132213B CN 102132213 B CN102132213 B CN 102132213B CN 200980132826 A CN200980132826 A CN 200980132826A CN 102132213 B CN102132213 B CN 102132213B
Authority
CN
China
Prior art keywords
spectral purity
purity filter
radiation
aperture
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200980132826.0A
Other languages
English (en)
Chinese (zh)
Other versions
CN102132213A (zh
Inventor
W·A·索尔
M·M·J·W·范赫彭
M·J·J·杰克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of CN102132213A publication Critical patent/CN102132213A/zh
Application granted granted Critical
Publication of CN102132213B publication Critical patent/CN102132213B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN200980132826.0A 2008-08-29 2009-07-29 光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法 Active CN102132213B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US13634708P 2008-08-29 2008-08-29
US61/136,347 2008-08-29
US19325508P 2008-11-12 2008-11-12
US61/193,255 2008-11-12
PCT/EP2009/005489 WO2010022840A1 (en) 2008-08-29 2009-07-29 Spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method

Publications (2)

Publication Number Publication Date
CN102132213A CN102132213A (zh) 2011-07-20
CN102132213B true CN102132213B (zh) 2014-04-16

Family

ID=41226646

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980132826.0A Active CN102132213B (zh) 2008-08-29 2009-07-29 光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法

Country Status (6)

Country Link
US (1) US20110157573A1 (ko)
JP (1) JP5528449B2 (ko)
KR (1) KR20110063789A (ko)
CN (1) CN102132213B (ko)
NL (1) NL2003303A (ko)
WO (1) WO2010022840A1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4876149B2 (ja) * 2008-07-11 2012-02-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置における使用のためのスペクトル純度フィルタ
EP2564273A1 (en) 2010-04-27 2013-03-06 ASML Netherlands BV Spectral purity filter
JP5419900B2 (ja) * 2011-01-01 2014-02-19 キヤノン株式会社 フィルタ、露光装置及びデバイス製造方法
US9594306B2 (en) 2011-03-04 2017-03-14 Asml Netherlands B.V. Lithographic apparatus, spectral purity filter and device manufacturing method
KR101793316B1 (ko) * 2011-03-16 2017-11-02 케이엘에이-텐코 코포레이션 박막 스펙트럼 순도 필터 코팅을 갖는 영상 센서를 사용하는 ｅｕｖ 화학선 레티클 검사 시스템
JP5513636B2 (ja) * 2013-01-18 2014-06-04 キヤノン株式会社 露光装置及びデバイス製造方法
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
CN113629897B (zh) * 2021-07-29 2023-11-24 同济大学 一种基于复合腔结构的安全性提升的无线充电系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1841098A (zh) * 2005-03-29 2006-10-04 Asml荷兰有限公司 多层光谱纯滤光片与光刻设备、装置制造方法以及装置
CN1854771A (zh) * 2005-04-27 2006-11-01 Asml荷兰有限公司 多层反射镜光谱纯滤光片、光刻设备以及装置制造方法
CN101221261A (zh) * 2008-01-07 2008-07-16 浙江大学 微型超光谱集成滤光片及其制作方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6236033B1 (en) * 1998-12-09 2001-05-22 Nec Research Institute, Inc. Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography
JP2004103773A (ja) * 2002-09-09 2004-04-02 Nikon Corp Ｘ線発生装置、ｘ線露光装置及びｘ線フィルター
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
JP4710406B2 (ja) * 2005-04-28 2011-06-29 ウシオ電機株式会社 極端紫外光露光装置および極端紫外光光源装置
JP2007027212A (ja) * 2005-07-12 2007-02-01 Canon Inc フィルター、露光装置及びデバイス製造方法
DE102005048670B3 (de) * 2005-10-07 2007-05-24 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von unerwünschten Spektralanteilen bei einer plasmabasierten EUV-Strahlungsquelle
NL1035979A1 (nl) * 2007-09-27 2009-03-30 Asml Netherlands Bv Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby.
KR20100106352A (ko) * 2007-11-08 2010-10-01 에이에스엠엘 네델란즈 비.브이. 방사선 시스템 및 방법, 및 스펙트럼 퓨리티 필터

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1841098A (zh) * 2005-03-29 2006-10-04 Asml荷兰有限公司 多层光谱纯滤光片与光刻设备、装置制造方法以及装置
CN1854771A (zh) * 2005-04-27 2006-11-01 Asml荷兰有限公司 多层反射镜光谱纯滤光片、光刻设备以及装置制造方法
CN101221261A (zh) * 2008-01-07 2008-07-16 浙江大学 微型超光谱集成滤光片及其制作方法

Also Published As

Publication number Publication date
JP5528449B2 (ja) 2014-06-25
JP2012501074A (ja) 2012-01-12
CN102132213A (zh) 2011-07-20
KR20110063789A (ko) 2011-06-14
US20110157573A1 (en) 2011-06-30
NL2003303A (en) 2010-03-11
WO2010022840A1 (en) 2010-03-04

Similar Documents

Publication Publication Date Title
CN102132213B (zh) 光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法
JP4547329B2 (ja) リソグラフィ・スペクトル純度フィルタ、リソグラフィ装置及びデバイス製造方法
CN102150084B (zh) 辐射源、光刻设备以及器件制造方法
CN102200693B (zh) 照射系统和光刻设备
CN102132214B (zh) 光谱纯度滤光片和光刻设备
CN101960338B (zh) 光学元件、包括该光学元件的光刻设备、器件制造方法以及所制造的器件
CN101836263A (zh) 光谱滤光片、包括这样的光谱滤光片的光刻设备、器件制造方法以及由此制造的器件
CN102483583A (zh) 光谱纯度滤光片、光刻设备以及制造光谱纯度滤光片的方法
KR100718743B1 (ko) 광학요소, 이 광학요소를 포함하는 리소그래피 장치 및디바이스 제조방법
CN102472975A (zh) 光谱纯度滤光片、光刻设备和用于制造光谱纯度滤光片的方法
CN102460302B (zh) 光刻设备和用于减小杂散辐射的方法
KR20150058455A (ko) 리소그래피 방법 및 장치
CN102105837B (zh) 反射镜、光刻设备以及器件制造方法
CN102792228A (zh) 光谱纯度滤光片、光刻设备、制造光谱纯度滤光片的方法和使用光刻设备制造器件的方法
CN101609267B (zh) 光刻设备
CN102483585B (zh) 光谱纯度滤光片、光刻设备、和制造光谱纯度滤光片的方法
CN102047183B (zh) 多层反射镜和光刻设备
CN102576194A (zh) 光谱纯度滤光片、光刻设备以及器件制造方法
US7872731B2 (en) Lithographic apparatus and device manufacturing method
CN102483586A (zh) 光谱纯度滤光片、光刻设备以及制造光谱纯度滤光片的方法
CN101604123B (zh) 光刻设备、复合材料以及制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant