CN102096123A - Method for preparing super-resolution imaging lens with planar zooming magnification - Google Patents
Method for preparing super-resolution imaging lens with planar zooming magnification Download PDFInfo
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- CN102096123A CN102096123A CN2010106177346A CN201010617734A CN102096123A CN 102096123 A CN102096123 A CN 102096123A CN 2010106177346 A CN2010106177346 A CN 2010106177346A CN 201010617734 A CN201010617734 A CN 201010617734A CN 102096123 A CN102096123 A CN 102096123A
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Abstract
The invention provides a method for preparing a super-resolution imaging lens with planar zooming magnification, comprising the following steps: preparing a circular or square or rectangular flat-bottom groove on a substrate; depositing a silver film layer on the substrate, then coating a cured sol layer on the silver film layer, wherein the sol layer can form an arc surface at the position of the groove under the action of surface tension, and the sol layer is cured after being heated or ultraviolet-irradiated; and so forth, depositing the silver film layers alternatively on the substrate, coating and curing the sol layers, obtaining a plurality of arc-surface film layers formed by a plurality of silver film layers and the sol layers in an alternative manner at the groove position till the groove is filled, and then obtaining the super-resolution imaging lens with planar zooming magnification, wherein an object plane and an image plane of the lens are planes respectively. The super-resolution imaging lens with planar zooming magnification can zoom or amplify images in a two-dimensional manner, and can be applied in super-resolution zooming of photoetching or amplification of images. Therefore, the difficulty that the existing super-resolution imaging lens with planar zooming magnification is difficult to manufacture is solved, and the application potential in the imaging and photoetching fields is large.
Description
Technical field
The present invention relates to a kind of convergent-divergent multiplying power super-resolution imaging lens preparation method, relate in particular to a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens.
Technical background
Convergent-divergent multiplying power super-resolution imaging lens have broad application prospects, and for example, are applied to aspects such as super-resolution imaging, SPP nano-photoetching.
The preparation method of convergent-divergent multiplying power super-resolution imaging lens utilizes the difference of the exposure dose of zones of different photoresist to make the structure graph of exposure area reach desired shape, again by etching with figure transfer to substrate.Can.But its shortcoming is the object plane and the image planes of the convergent-divergent multiplying power super-resolution imaging lens of the type is curved surface, is difficult to combine with projection lithography system; The useful area of imaging or photoetching is very little, and image quality is not high, is difficult to satisfy the needs of practical application.
Summary of the invention
The technical problem to be solved in the present invention is: at the restriction part of existing plane convergent-divergent multiplying power super-resolution imaging lens making, a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens is provided, this method only need be used conventional photoetching, plated film and gluing technology, just can prepare object plane and image planes and be the convergent-divergent multiplying power super-resolution imaging lens on plane, have huge application potential aspect photoetching and the amplification imaging dwindling.
The technical solution adopted for the present invention to solve the technical problems is: a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens is characterized in that step is as follows:
(1) groove of preparation circle or square or rectangular on substrate; Described substrate material is quartz, glass, silicon nitride, silicon, germanium or organic polymer materials; Described groove is shaped as circle, square or rectangular perpendicular to the substrate surface direction, and the bottom surface of groove is plane and surperficial parallel with substrate, and the diameter of groove or the length of side are 200nm to 10000nm, and the degree of depth of groove is 50nm to 4000nm;
(2) deposition one deck silver film on the groove that step 1 is prepared into, the thickness of described silver film is 2nm to 100nm;
(3) adopt the method for spin coating to be coated with the curable sol layer of one deck in the groove that has deposited one deck silver film, sol layer can form cambered surface in groove under capillary effect, and sol layer solidifies after heating or UV-irradiation processing; The thickness of described curable sol layer is 2nm to 100nm;
(4) alternating deposit silver film and coating in described groove, curing sol layer obtain the multilayer cambered surface rete that silver layer and sol layer are alternately formed, and up to groove is filled and led up, promptly prepare the convergent-divergent multiplying power super-resolution imaging lens that the two sides is the plane.
Organic polymer materials in the described step (1) comprises polyimide, polyphenylene sulfide, poly-fluorobenzene ethene.
The quantity of the groove in the described step (1) is one or more.
The preparation method of silverskin can be sputter, evaporation, chemical vapor deposition or chemical liquid deposition in the described step (2).
Colloidal sol comprises slim photoresist such as SOG, PMMA, tackifier or AR3170, AR7700 etc. in the described step (3), and the thickness of each sol layer and thickness distribution are determined jointly by dissolved adhesiveness, spin coating rotating speed, groove arc shape.
The number of plies of the multilayer cambered surface rete that silver layer and sol layer are alternately formed in the described step (4) is 5 to 200 layers; According to the characteristic that the disappearance ripple is propagated perpendicular to silver layer surface, utilize the globoidal structure of multilayer cambered surface rete can realize the curve propagation of light wave, thereby reach convergent-divergent multiplying power super resolution imaging function.
The present invention is with the advantage that existing method is compared: the present invention can prepare the convergent-divergent multiplying power super-resolution imaging lens that object plane and image planes are the plane, and the scope of the convergent-divergent multiplying power of super-resolution imaging lens is 0.1-10; For the preparation of convergent-divergent multiplying power super-resolution imaging lens provide a kind of accurately, novel, convenient, process approach efficiently; And technology is simple, is easy to realize.
Description of drawings
Figure is the realization flow figure of the inventive method;
Fig. 1 is in the embodiment of the invention 1, in the cross-sectional view of quartz substrate;
Fig. 2 is in the embodiment of the invention 1, the cross-sectional view after quartz substrate surface prepares circular groove;
Fig. 3 is in the embodiment of the invention 1, the cross-sectional view behind substrate surface deposition silverskin;
Fig. 4 is in the embodiment of the invention 1, the cross-sectional view behind substrate surface spin coating PMMA;
Fig. 5 is in the embodiment of the invention 1, the cross-sectional view behind substrate surface deposition second layer silverskin;
Fig. 6 is in the embodiment of the invention 1, the cross-sectional view behind substrate surface spin coating second layer PMMA;
Fig. 7 is in the embodiment of the invention 1, alternating deposit silver film and coating, curing sol layer, and up to groove is filled and led up, the two sides that obtains is the cross-sectional view of the convergent-divergent multiplying power super-resolution imaging lens on plane;
Among the figure: 1 represents the backing material quartz; 2 represent silverskin; 3 represent PMMA.
Embodiment
Introduce the present invention in detail below in conjunction with the drawings and the specific embodiments.But following embodiment only limits to explain the present invention, and protection scope of the present invention should comprise the full content of claim, and promptly can realize the full content of claim of the present invention to the technician in field by following examples.
(1) 1 circular groove of preparation on the quartz substrate of as shown in Figure 1 smooth cleaning: as shown in Figure 2, the bottom surface of circular groove is the plane parallel with substrate surface, and the diameter that the diameter of circular groove upper base is 1 micron, go to the bottom is that 1 micron, the degree of depth are 0.5 micron.
(2) as shown in Figure 3, with method deposition one deck silver film of evaporation, the thickness of silver film is 15 nanometers on substrate.
(3) as shown in Figure 4, adopt the method for spin coating to be coated with one deck PMMA on substrate, the PMMA layer can form cambered surface in groove under capillary effect, and PMMA solidifies after heating; The thickness of sol layer is the 15-50 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of PMMA layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) shown in Fig. 5,6,7, in groove, replace 21 layers of silver film of evaporation and coating, 20 layers of PMMA layer of curing, groove is filled and led up, just can be obtained the convergent-divergent multiplying power super-resolution imaging lens that two sides that multilayer cambered surface rete that silver layer and PMMA layer alternately form forms is the plane.
(1) the circular groove array that preparation 100*100 is orthogonal and arranges on the quartz substrate of smooth cleaning; Wherein the center distance of adjacent two circular grooves is 5 microns in each row or each row; The bottom surface of each circular groove all is the plane parallel with substrate surface, and the diameter of circular groove upper base is 1.5 microns, the diameter of going to the bottom, and to be 1.5 microns, the degree of depth be 0.6 micron.
(2) method with evaporation deposits one deck golden membranous layer on substrate, and the thickness of golden membranous layer is 20 nanometers.
(3) adopt the method for spin coating to be coated with the curable X sol layer of one deck on substrate, the X sol layer can form cambered surface in groove under capillary effect, and the X sol layer solidifies after UV-irradiation; The thickness of X sol layer is the 15-50 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of X sol layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) alternately 25 layers of golden membranous layer of evaporation and coating, 24 layers of X sol layer of curing in groove are filled and led up groove, just can obtain gold layer and X sol layer and alternately be the convergent-divergent multiplying power super-resolution imaging lens arra on plane in the two sides of the multilayer cambered surface rete composition of composition.
Embodiment 3, make, and its concrete manufacturing process is as follows:
(1) the square indentations array that preparation 10*10 is orthogonal and arranges on the K9 of smooth cleaning glass substrate; Wherein the center distance of adjacent two circular grooves is 3 microns in each row or each row; The bottom surface of each square indentations all is the plane parallel with substrate surface, and the length of side that the length of side of square indentations upper base is 2 microns, go to the bottom is that 1.5 microns, the degree of depth are 1 micron.
(2) method with magnetron sputtering deposits one deck silver film on substrate, and the thickness of silver film is 20 nanometers.
(3) adopt the method for spin coating to be coated with one deck SOG layer on substrate, the SOG layer can form cambered surface in groove under capillary effect, and heating back SOG is converted into SiO
2And solidify; SiO in the groove
2The thickness of layer is the 15-50 nanometer, wherein according to surface energy minimum principle, SiO
2The thickness distribution rule of layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) 31 layers of silver film of alternating sputtering deposition and coating, 30 layers of SOG layer of curing in groove are filled and led up groove, just can obtain silver layer and SiO
2The two sides that the multilayer cambered surface rete that layer is alternately formed is formed is the convergent-divergent multiplying power super-resolution imaging lens arra on plane.
Embodiment 4
(1) 1 square indentations of preparation on the silicon nitride substrate of smooth cleaning: the bottom surface of square indentations is the plane parallel with substrate surface, and the length of side that the length of side of square indentations upper base is 1 micron, go to the bottom is that 1 micron, the degree of depth are 0.5 micron.
(2) method with evaporation deposits one deck silver film on substrate, and the thickness of silver film is 15 nanometers.
(3) adopt the method for spin coating to be coated with one deck PMMA on substrate, the PMMA layer can form cambered surface in groove under capillary effect, and PMMA solidifies after heating; The thickness of PMMA layer is the 10-50 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of PMMA layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) alternately 41 layers of silver film of evaporation and coating, 40 layers of PMMA layer of curing in groove are filled and led up groove, and the two sides that just can obtain the multilayer cambered surface rete composition that silver layer and PMMA layer alternately form is the convergent-divergent multiplying power super-resolution imaging lens on plane.
Embodiment 5
(1) 1 square indentations of preparation on the quartz substrate of smooth cleaning: the bottom surface of square indentations is the plane parallel with substrate surface, and the length of side that the length of side of square indentations upper base is 10 microns, go to the bottom is that 10 microns, the degree of depth are 3 microns.
(2) method with evaporation deposits one deck silver film on substrate, and the thickness of silver film is 10 nanometers.
(3) adopt the method for spin coating to be coated with one deck tackifier HMDS on substrate, tackifier HMDS layer can form cambered surface in groove under capillary effect, and tackifier HMDS solidifies after heating; The thickness of tackifier HMDS layer is the 5-30 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of tackifier HMDS layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) in groove, replace 100 layers of silver film of evaporation and coating, 100 layers of tackifier HMDS of curing layer, groove is filled and led up, just can be obtained the convergent-divergent multiplying power super-resolution imaging lens that two sides that multilayer cambered surface rete that silver layer and tackifier HMDS layer alternately form forms is the plane.
Embodiment 6
(1) 1 rectangular recess of preparation on the polyimide base film of smooth cleaning: the bottom surface of groove is parallel with substrate surface, and the length of rectangular recess is that 100 microns, upper base width are 1 micron, the width of going to the bottom is that 1 micron, the degree of depth are 0.5 micron.
(2) method with hot evaporation deposits one deck silver film on substrate, and the thickness of silver film is 15 nanometers.
(3) adopt the method for spin coating to be coated with one deck PMMA on substrate, the PMMA layer can form cambered surface in groove under capillary effect, and PMMA solidifies after heating; The thickness of sol layer is the 15-50 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of PMMA layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) alternately 21 layers of silver film of evaporation and coating, 20 layers of PMMA layer of curing in groove are coated with groove flat, and the two sides that just can obtain the multilayer cambered surface rete composition that silver layer and PMMA layer alternately form is the convergent-divergent multiplying power super-resolution imaging lens on plane.。
Embodiment 7
(1) 100 rectangular recess arrays that are arranged in parallel of preparation on the quartz substrate of smooth cleaning; The center distance of wherein adjacent two rectangular recess is 5 microns; The bottom surface of each rectangular recess all is the plane parallel with substrate surface, and length is 200 microns, and the upper base width is 1.5 microns, the width of going to the bottom is 1.5 microns, the degree of depth and is 0.6 micron.
(2) method with electron beam evaporation plating deposits one deck silver film on substrate, and the thickness of silver film is 20 nanometers.
(3) adopt the method for spin coating to be coated with the curable AR7700 photoresist of one deck on substrate, photoresist layer can form cambered surface in groove under capillary effect, and photoresist layer solidifies after heating; The thickness of photoresist layer is the 20-50 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of photoresist layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) alternately 50 layers of silver film of evaporation and coating, curing 49 layer photoetching glue-lines in groove are coated with groove flat, and the two sides that just can obtain the multilayer cambered surface rete composition that silver layer and photoresist layer alternately form is the convergent-divergent multiplying power super-resolution imaging lens arra on plane.
Embodiment 8
(1) 20 rectangular recess arrays that are arranged in parallel of preparation on smooth clean glass substrate; The center distance of wherein adjacent rectangular recess is 3 microns; The bottom surface of each rectangular recess all is the plane parallel with substrate surface, and the length of rectangular recess is 500 microns, and the upper base width is 2 microns, the width of going to the bottom is 1.5 microns, the degree of depth and is 1 micron.
(2) method with magnetron sputtering deposits one deck silver film on substrate, and the thickness of silver film is 20 nanometers.
(3) adopt the method for spin coating to be coated with one deck photoresist on substrate, wherein the model of photoresist is the AR3170 of dilution, and photoresist layer can form cambered surface in groove under capillary effect, and solidify the heating back; The thickness of sol layer is the 20-60 nanometer in the groove, and wherein according to the surface energy minimum principle, the thickness distribution rule of photoresist layer in groove is: the groove central area is thin, and the recess edge zone is thick.
(4) 31 layers of silver film of alternating sputtering deposition and coating, curing 30 layer photoetching glue-lines in groove, groove is coated with flat, just can obtains the convergent-divergent multiplying power super-resolution imaging lens arra that two sides that multilayer cambered surface rete that silver layer and photoresist layer alternately form forms is the plane.
The non-elaborated part of the present invention belongs to techniques well known.
Claims (6)
1. method for preparing plane convergent-divergent multiplying power super-resolution imaging lens is characterized in that step is as follows:
(1) groove of preparation circle or square or rectangular on substrate; Described substrate material is quartz, glass, silicon nitride, silicon, germanium or organic polymer materials; Described groove is shaped as circle, square or rectangular perpendicular to the substrate surface direction, and the bottom surface of groove is plane and surperficial parallel with substrate, and the diameter of groove or the length of side are 200nm to 10000nm, and the degree of depth of groove is 50nm to 4000nm;
(2) deposition one deck silver film on the groove that step 1 is prepared into, the thickness of described silver film is 2nm to 100nm;
(3) adopt the method for spin coating to be coated with the curable sol layer of one deck in the groove that has deposited one deck silver film, sol layer can form cambered surface in groove under capillary effect, and sol layer solidifies after heating or UV-irradiation processing; The thickness of described curable sol layer is 2nm to 100nm;
(4) alternating deposit silver film and coating in described groove, curing sol layer obtain the multilayer cambered surface rete that silver layer and sol layer are alternately formed, and up to groove is filled and led up, promptly prepare the convergent-divergent multiplying power super-resolution imaging lens that the two sides is the plane.
2. a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens according to claim 1, it is characterized in that: described organic polymer materials comprises polyimide, polyphenylene sulfide or poly-fluorobenzene ethene.
3. a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens according to claim 1 is characterized in that: the quantity of the groove in the described step (1) is one or more.
4. a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens according to claim 1 is characterized in that: the preparation method of silverskin can be sputter, evaporation, chemical vapor deposition or chemical liquid deposition in the described step (2).
5. a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens according to claim 1 is characterized in that: colloidal sol comprises SOG, PMMA, tackifier or AR3170, the slim photoresist of AR7700 in the described step (3).
6. a kind of method for preparing plane convergent-divergent multiplying power super-resolution imaging lens according to claim 1 is characterized in that: the number of plies of the multilayer cambered surface rete that silver layer and sol layer are alternately formed in the described step (4) is 5 to 200 layers.
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Cited By (4)
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| CN102621602A (en) * | 2012-04-13 | 2012-08-01 | 中国科学院光电技术研究所 | Preparation method of biplanar super-resolution imaging lens |
| CN102628985A (en) * | 2012-04-13 | 2012-08-08 | 中国科学院光电技术研究所 | Optical micro-imaging device and method for imaging nanometer surface layer by using super-diffraction off-axis illuminating technology |
| CN102633229A (en) * | 2012-04-13 | 2012-08-15 | 中国科学院光电技术研究所 | Preparation method for super-lens with plane-shaped imaging surface by using secondary ion beam etching technology |
| CN116224476A (en) * | 2023-03-22 | 2023-06-06 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102621602A (en) * | 2012-04-13 | 2012-08-01 | 中国科学院光电技术研究所 | Preparation method of biplanar super-resolution imaging lens |
| CN102628985A (en) * | 2012-04-13 | 2012-08-08 | 中国科学院光电技术研究所 | Optical micro-imaging device and method for imaging nanometer surface layer by using super-diffraction off-axis illuminating technology |
| CN102633229A (en) * | 2012-04-13 | 2012-08-15 | 中国科学院光电技术研究所 | Preparation method for super-lens with plane-shaped imaging surface by using secondary ion beam etching technology |
| CN102633229B (en) * | 2012-04-13 | 2015-01-14 | 中国科学院光电技术研究所 | Preparation method for super-lens with plane-shaped imaging surface by using secondary ion beam etching technology |
| CN116224476A (en) * | 2023-03-22 | 2023-06-06 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
| CN116224476B (en) * | 2023-03-22 | 2024-03-08 | 苏州汉骅半导体有限公司 | Microlens array and method for manufacturing same |
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