CN102089088A - Cleaning device and cleaning method - Google Patents
Cleaning device and cleaning method Download PDFInfo
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- CN102089088A CN102089088A CN2009801265952A CN200980126595A CN102089088A CN 102089088 A CN102089088 A CN 102089088A CN 2009801265952 A CN2009801265952 A CN 2009801265952A CN 200980126595 A CN200980126595 A CN 200980126595A CN 102089088 A CN102089088 A CN 102089088A
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- cleaning medium
- cleaning
- medium
- deposit
- pencil hardness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
Abstract
A cleaning device for removing a deposit adhering to an object to be cleaned is disclosed. The cleaning device includes a cleaning chamber forming a space for housing multiple cleaning media shaped like flakes; a circulating air-flow generating unit configured to generate a circulating air flow to cause the cleaning media to fly and repeatedly collide with the object in the cleaning chamber and thereby to remove the deposit adhering to the object; and a cleaning medium recycling unit configured to suction and remove the deposit adhering to the cleaning media that have collided with the object and thereby to recycle the cleaning media. The pencil hardness of the cleaning media is greater than the pencil hardness of the deposit.
Description
Technical field
Particular aspects of the present invention relates to a kind ofly utilizes solid-state cleaning medium to remove cleaning device and the clean method that adheres to the deposit (deposit) on the object.
Background technology
Usually, the viscous liquid that in welding process, is called " scaling powder " is injected into the wettability that improves scolder on the substrate.Because the heat of scolder, this scaling powder adhere to the anchor clamps that are called pallet (pallet) that PCB was gone up or be used to keep to printed circuit board (PCB) (PCB), therefore, need remove the scaling powder that is adhered to from pallet.
Pallet is widely used in the welding process, and is to be made by the epoxy resin that comprises glass fibre.Because pallet is used for welding process repeatedly, scaling powder accumulation and form thick-layer, and become and be difficult to remove.Simultaneously, office equipment initiatively reclaims activity as the manufacturer of duplicator and laser printer, realizes that a resource reclaims society.In the recovery activity, the product of using is collected from the user by manufacturer, and this product is disassembled into part, and cleaning and reuse these parts and be used for making new product.
For example, manufacturer promotes resources effective to use by the main body (basic pipe) of the photosensitive drums of recovery imaging device.Usually, photosensitive drums reclaims as raw material, and perhaps their basic pipe, removes photosensitive layer and reuses by sand-blast or by grinding by with remover (distintegrant (parting agent)).But, when photosensitive drums reclaims as raw material, need be from raw material production basis pipe once more.Therefore, this method is not preferred in energy resource consumption, aspect the influence of environment and production cost.
When remover was used to remove the photosensitive layer of photosensitive drums or adhere to scaling powder on the pallet, because the resin that dissolves in the remover can adhere on basic pipe or the pallet once more, therefore, this remover can not use repeatedly.Therefore, this method is not preferred aspect cost recovery.And, abandon the remover that is dissolved with deposit such as coating or scaling powder and also can bring other environmental problem.In addition, when highly combustible solvent is used as remover, can there be safety problem.Simultaneously, utilize the clean method of sand-blast or Ginding process, need after cleaning course, clear up and drying and grinding material or abrasive grains.Therefore, these methods need more energy and expensively are used to handle waste water and dry run.And for these methods, in cleaning course, pallet and basic pipe might be out of shape.
Proposed a kind of cleaning device that utilizes cleaning medium before the applicant, solved or alleviate the problems referred to above.The cleaning device that is proposed uses as laminar flexible cleaning medium, and removes the deposit that adheres on the object by making cleaning medium and deposit collide.Though the cleaning device that is proposed is effective such as the granular deposit of toner or dust for removing, and is very ineffective for the film shape deposit of the body that dismantles.
[patent document 1] Japanese Patent Application Publication specification 2007-144395 number
[patent document 2] Japanese Patent Application Publication specification 2007-029945 number
[patent document 3] Japanese Patent Application Publication specification 2007-330947 number
[patent document 4] Japanese Patent Application Publication specification 2007-245079 number
Summary of the invention
Various aspects of the present invention provide a kind of cleaning device and clean method, its solution or alleviated the restriction of prior art and one or more problems that defective is brought.
One aspect of the present invention provides a kind of sedimental cleaning device that adheres on the object that will be cleaned that is used to remove, and this cleaning device comprises: cleaning chamber, this cleaning chamber are formed for holding the cleaning medium of a plurality of shapes as thin slice; Circulating current generating unit, this circulating current generating unit be configured to produce circulating current with cause cleaning medium and in cleaning chamber, fly and repeatedly with described object collision, and remove the deposit that adheres on the described object thus; And the cleaning medium cycling element, this cleaning medium cycling element is configured to draw and remove by adhering to deposit on the cleaning medium with described object collision, and recirculating cleaning medium thus.The pencil hardness of cleaning medium is greater than described sedimental pencil hardness.
Another aspect of the present invention provides a kind of removal to adhere to sedimental method on the object that will be cleaned.This method comprises the steps: to make shape fly in cleaning chamber and collide with described object as a plurality of cleaning mediums of thin slice by circulating current, to remove the deposit that adheres on this object; And draw and remove adhere to described object collision cleaning medium on deposit, to recycle described cleaning medium.The pencil hardness of described cleaning medium is greater than described sedimental pencil hardness.
Of the present inventionly provide on the one hand a kind of cleaning medium again, this cleaning medium shape is as thin slice and be applied to removing in the sedimental cleaning device that adheres on the object that will be cleaned.Described cleaning device be configured to by utilize circulating current to make this cleaning medium in cleaning chamber, fly and repeatedly with described object collision, to remove the deposit that adheres on the object, and be configured to draw and remove the deposit on the cleaning medium that adheres to described object collision, recycle described cleaning medium thus.The pencil hardness of described cleaning medium is greater than described sedimental pencil hardness.
Description of drawings
Figure 1A is the view that illustrates according to the structure of the cleaning device of embodiment of the present invention to Fig. 1 C;
Fig. 2 A and 2B are the amplification cutaway side sectional view around the part of cleaning chamber unit;
Fig. 3 A and 3B are the perspective views of holding unit;
Fig. 4 A and 4B illustrate by sliding-contact to remove sedimental view;
Fig. 5 A and 5B are the zoomed-in views of the part of Fig. 4 A and 4B;
Fig. 6 is illustrated in the view that collides under the different condition;
Fig. 7 is the view that cleaning medium plastic deformation in time is shown;
Fig. 8 A is to be used to describe the machinery of cleaning medium and the view of physical characteristic to 8D;
Fig. 9 is the view that the modification of cleaning medium is shown;
Figure 10 is the view that the modification of cleaning medium is shown;
Figure 11 is the view that the modification of cleaning medium is shown;
Figure 12 is the view that the modification of cleaning medium is shown;
Figure 13 is the view that the modification of cleaning medium is shown;
Figure 14 is the view that the modification of cleaning medium is shown;
Figure 15 is the view that the modification of cleaning medium is shown;
Figure 16 is the view that the modification of cleaning medium is shown;
Figure 17 is the view that the modification of cleaning medium is shown;
Figure 18 is the view that the modification of cleaning medium is shown;
Figure 19 is the view that the modification of cleaning medium is shown;
Figure 20 is the view that the structure of the cleaning device of another embodiment according to the present invention is shown;
Figure 21 A and 21B are the views of working method that the cleaning device of Figure 20 is shown;
Figure 22 is the view that the circulating current generating unit is shown;
Figure 23 A and 23B are the views that cleaning medium recirculation unit is shown;
Figure 24 is the calcspar that illustrates according to the control system of one embodiment of the present invention;
Figure 25 A and 25B are the views that pipe-line system is shown;
Figure 26 is the sequential chart that is used to describe exemplary cleaning course;
Figure 27 A is the view that the illustrative methods that is used to make that static cleaning medium flies is shown to 27C;
Figure 28 A is the view that the another kind of illustrative methods that is used to make that static cleaning medium flies is shown to 28C;
Figure 29 is the view according to the cleaning course of an embodiment of the invention;
Figure 30 is the view of modification that the cleaning device of Figure 20 is shown; And
Figure 31 illustrates the machinery of various cleaning mediums and the curve that physical characteristic distributes.
The specific embodiment
Preferred implementation of the present invention is described with reference to the accompanying drawings.
Figure 1A is the view that illustrates according to the structure of the cleaning device 1 of one embodiment of the present invention to 1C.Figure 1A is the front view of cutting open of cleaning device 1; Figure 1B is the cross-sectional view along the cleaning device of the line A-A intercepting of Figure 1A; And Fig. 1 C is the vertical view of cleaning device 1.
Cleaning chamber 6 comprises cleaning chamber main body 9 and separative element 10.Cleaning chamber main body 9 has semi-cylindrical shaped, rectangle or pyramid shape, has sidewall and upper opening.Separative element 10 has a lot of apertures or slit, and this aperture or slit allow gas and removed deposit to pass through, but do not allow cleaning medium M to pass.
Cleaning medium accelerator module 7 is as the circulating current generating unit and comprise cleaning medium accelerating jet 11 and compressed air supply unit 12.Compressed air supply unit 12 is for example realized by compressor.Cleaning medium accelerating jet 11 is arranged to straight line along the center line of the bottom of cleaning chamber main body 9, and extends through cleaning chamber main body 9 and separative element 10.Compressed air supply unit 12 provides compressed air by the air line 14 with control valve 13 to cleaning medium accelerating jet 11.The compressed air that is provided by compressed air supply unit 12 is provided cleaning medium accelerating jet 11, causes cleaning medium M to fly thus.
Fig. 2 A and 2B are that Fig. 2 A illustrates the zoomed-in view of the cleaning chamber unit 2 shown in Figure 1A from the amplification cutaway side sectional view of the part that centers on cleaning chamber unit 2 of the rear side observation of Figure 1A, and Fig. 2 B illustrates the modification of cleaning chamber unit 2.
Refer back to Figure 1A, cleaning medium cycling element 8 comprises draw line 15, suction unit 16 and cleaning medium deceleration unit 17.Draw line 15 forms the gap between cleaning chamber main body 9 and the separative element 10.
The air capacity of being drawn by suction unit 16 is greater than the air supply from 11 ejections of cleaning medium accelerating jet.Thus, suction unit 16 can produce negative pressure in cleaning chamber main body 9.Shown in Fig. 2 B, separative element 10 can replace on the part that only is arranged on cleaning chamber 6, and cleaning chamber main body 9 can be arranged to cover the hole or the slit of separative element 10, to form the draw line 15 of isolating.
Cleaning medium deceleration unit 17 has predetermined length.The laminar flow of square set shape forms unit 19 and is arranged on each side of cleaning chamber main body 9.Approximately 5mm thickness and shape are arranged on the edge of flat upper surface that laminar flow forms unit 19 as the linear guide part 20 of rectangular column.
The size of linear guide part 20 can freely be determined according to the size of cleaning medium M, can realize enough speed as long as flow into the air-flow in gap 22.
Fig. 3 A and 3B are the perspective views of holding unit 3, and Fig. 3 A illustrates and how to be installed to object 4 on the holding unit 3 and how holding unit 3 to be installed on the cleaning chamber unit 2; And Fig. 3 B illustrates the motion of holding unit 3.
At first, the cleaning medium M of right quantity (being determined by test) is introduced in the cleaning chamber 6.Then, as shown in Figure 3A, object 4 is placed on the object retaining part 23 of holding unit 3, and then, holding unit 3 is upside down, and makes object 4 in the face of cleaning chamber unit 2, and is placed on the cleaning chamber unit 2.The holding unit 3 of maintenance object 4 is connected to the driver element (not shown) and object 4 (perhaps holding unit 3) is moved above cleaning chamber 6, shown in Fig. 3 B.
Then, the control module (not shown) is unlocked.Control module drives suction unit 16, to draw air from cleaning chamber 6.As a result, the air pressure in the cleaning chamber 6 become and are different from external atmosphere pressure.Pressure reduction produces conversely by forming the air-flow that the gap that forms between unit 19 and the holding unit 3 flows into cleaning chamber 6 by linear guide part 20 at laminar flow.This air-flow passes the flat surface that laminar flow forms unit 19, and is transformed into laminar flow thus, and causes outside air to flow in the cleaning chamber 6.
Control module is drive compression air feed unit 12 and open control valve 13 then, thus compressed air is supplied to cleaning medium accelerating jet 11.Cleaning medium accelerating jet 11 sprays compressed air, and produces air-flow (circulating current) vertically upward thus in cleaning chamber 6.
The circulating current (comprising turbulent air flow) that cleaning medium accelerating jet 11 produces causes the cleaning medium M in the cleaning chamber 6 to fly and collide with object 4.As a result, the object 4 lip-deep deposits medium M that is cleaned removes.With object 4 collision after, cleaning medium 4 since air-flow and gravity towards the bottom dropped out of cleaning chamber 6.Cleaning medium M is attracted to separative element 10 by suction, and slides arrival cleaning medium accelerating jet 11 zone on every side from the surface of separative element 10.
In this process, the separated unit 10 of deposit of removing and adhering on the cleaning medium M from object 4 separates from cleaning medium M, and the deposit that is separated is collected via draw line 15 and suction pipe 18 by suction unit 16.Simultaneously, the cleaning medium M that drops near the zone the cleaning medium accelerating jet 11 air-flow that medium accelerating jet 11 produces that is cleaned flies once more vertically upward.Object 4 lip-deep deposits can be removed by said process repeatedly.
Each cleaning medium M (cleaning medium M) is designed to it can be caused flying by air-flow.More particularly, the material of cleaning medium M, weight, size and/or shape are determined based on the characteristic (shape, material etc.) of object 4 and the firm sedimental characteristic (pencil hardness, bond strength etc.) that is attached on the object 4; And make the fly speed and the flow of required air-flow of cleaning medium M be determined then.
The behavior of＜cleaning medium and effect 〉
1. the ability that flies along with air-flow (fly and carry out compound movement at a high speed ability)
1-1. the quality of laminar cleaning medium M is very little with respect to vapour lock.Therefore, when the power of air-flow was applied on the surface of the cleaning medium M with big projected area, cleaning medium M was easy to be quickened by air-flow and fly.
1-2. laminar cleaning medium M has low vapour lock on the direction that forms little projected area, and therefore, can keep high-speed motion on long distance on this direction when flying.The thickness of the cleaning medium M of this embodiment is preferably more than or equal to 20 microns and be less than or equal to 200 microns, and its surface area preferably is less than or equal to 100 square millimeters.
Along with the speed of cleaning medium M increases, the energy of cleaning medium M increases, that is: the active force increase of cleaning medium M and object 4 collisions is so and improved clean-up performance.
And along with the speed increase of cleaning medium M, the number of times that cleaning medium M circulates in cleaning chamber 6 increases, that is, and and the increased frequency of cleaning medium and object 4 collisions, so, improved clean-up performance.
1-3. because the vapour lock of laminar cleaning medium M alters a great deal according to its flight attitude, cleaning medium M is except along with carrying out compound movement the air motion, as its direction of quick change.Therefore, cleaning medium M is also highly effective aspect the object 4 of clean complex shape.
1-4. as shown in Figure 1, around object 4, turbulent air flow is produced by other air-flows, the air-flow that is produced by cleaning medium accelerating jet 11 that also is transformed into turbulent air flow runs into when forming the laminar air flow of unit 19 from laminar flow by further disturbance at it, and this turbulent air flow causes cleaning medium M to collide with object 4 at random.
Thus, in some sense, cleaning medium deceleration unit 17 is causing cleaning medium M auxiliary cleaning medium accelerator module 7 aspect object 4 collisions at random.
Because the quality of laminar cleaning medium M is very little with respect to vapour lock, cleaning medium M follows the motion of turbulent air flow faithfully and carries out compound movement.
And, because cleaning medium M collides with object 4 repeatedly, also also rotated around its axis rotation simultaneously by turbulent air flow, can clean even have the object of complicated shape effectively.
Fig. 4 A and 4B illustrate by sliding-contact to remove the sedimental view of film shape.In Fig. 4 A and 4B, " d " expression film shape deposit, and " C " direction of motion of expression cleaning medium M.
When the edge of the cleaning medium M of high-speed motion and object 4 collisions, cleaning medium M scraping film shape deposit d.Shown in Fig. 4 B, the cleaning medium M that has the deposit d ' that is scraped flies away, and collides with other cleaning mediums M or separative element 10.As a result, deposit d ' is removed from cleaning medium M.This process is described below in more detail.
Fig. 5 A and 5B are the enlarged drawings of the part of Fig. 4 A and 4B.Fig. 5 A just shows the cleaning medium M that collided with object 4; And Fig. 5 B is illustrated in the cleaning medium M that slides on the object 4.Fig. 6 is illustrated in the cleaning medium M that collides with object 4 under the different condition.
2. the behavior of cleaning medium (function of edge and sliding-contact) when contacting or colliding with object
2-1. the pencil hardness of laminar cleaning medium M is greater than the sedimental pencil hardness of film shape, therefore, film shape deposit be easy to the to be cleaned edge of medium M slackens or swipes.And because contact force concentrates on the edge of cleaning medium M, the cleaning medium M with this little quality can be cut in the film shape deposit.
In this application, pencil hardness is to utilize according to the method for JIS K-5600-5-4 to measure.The pencil hardness of cleaning medium M is number to be represented by the lead for retractable pencil of the hardest pencil lead that can not form cut or pit on cleaning medium M.
2-2. when cleaning medium M contacted or collides with object 4 with the angle that tilts, shown in Fig. 5 A, cleaning medium M became and deposit d sliding-contact, and can apply power to deposit d being parallel on the direction of contact surface, shown in Fig. 5 B.The film shape deposit d thereby cleaning medium M can swipe.And, when the bond strength of deposit d and object 4 hour, cause in slip in the sliding-contact meeting that is parallel on the contact surface direction, and cause deposit d to come off in conjunction with the interface place.Therefore, in this case, cleaning medium M can be once removes deposit d on large tracts of land, and effective cleaning objects 4.
2-3. when having gap and cleaning medium M when entering in this gap between deposit d and object 4, as shown in Figure 6, cleaning medium M can peel off and remove deposit d easily as chock.
2-4. adhere to deposit M on the laminar cleaning medium M can be for example by being drawn by suction unit 16 at cleaning medium M and vibration during with separative element 10 collisions and delamination.
The feasible medium M that can keep clean is clean for this mechanism, and can prevent that the deposit d on the cleaning medium M from adhering on the object 4 once more.
Other advantages of laminar cleaning medium M are described below.
Because cleaning medium M shape is as thin slice, the quantity of material that is used for cleaning medium M is very little.This makes again and reduces operating cost to the influence of environment and the cleaning device possibility that becomes.
The abrasives that is used for the prior art of sand-blast can not provide this advantage with the friction media that is used for the prior art of tumbling.
Have according to the cleaning device of one aspect of the invention and to be suitable for the structure of coming cleaning objects by the laminar cleaning medium M that circulates with air-flow.
As mentioned above, utilize the object (or part) that cleaning device can be effectively and cleaning has complicated shape efficiently of laminar cleaning medium.
When object 4 is utilized the cleaning medium M cleaning that flies, in cleaning chamber 6, form negative pressure, and therefore very strong laminar air flow flow in the cleaning chamber 6 by the gap 22 that laminar flow forms between unit 19 and the holding unit 3.The cleaning medium M that laminar air flow will attempt to enter into this gap 22 pushes back, and prevents that thus cleaning medium M is ejected out to outside the cleaning chamber 6.And the decay flying speed of cleaning medium M of the stream long enough that forms of gap 22.Therefore, even a spot of cleaning medium M enters into gap 22, they are decelerated and finally are pulled back in the cleaning chamber 6, and can not run out of outside the cleaning device 1.
When making that cleaning medium M flies cleaning objects 4, by alternately opening and closing control valve 13, air sprays off and on from cleaning medium accelerating jet 11.From cleaning medium accelerating jet 11 intermittently the air of ejection cause pressure in the cleaning chamber 6 and the difference between the external pressure to increase in particular moment, more effectively cleaning medium M is withdrawn in the cleaning chamber 6 thus.
When alternately opening and closing control valve 13, the control module of cleaning device 1 makes holding unit 3 move around along linear guide part 20 and side guide member 21 that the laminar flow of cleaning chamber unit 2 forms unit 19 on cleaning chamber 6.After at least one time of the holding unit 3 of moving around, control module stops to compress air feed feed unit 12 and suction unit 16, finishes cleaning course.
In this application, " fragility " is illustrated in material by before the external force deformation or the material behavior that fractures and shown after material is out of shape a little by external force.
Preferably, the folding strength of laminar cleaning medium M is more than or equal to 0 and less than 65.Folding strength is in this application measured according to JIS P8115, and the expression cleaning medium can bend to the number of times of 135 degree (R=0.38mm) before fractureing.
And " ductility (ductility) " is meant material even surpassing the ability that is elongated and deformed under the pulling force of its elastic limit and does not rupture in this application.
Fig. 7 illustrates cleaning medium in time and the view of plastic deformation.
When elastic fluid used repeatedly, cleaning medium was because collision and the damage gradually by causing alternating bending with object collision repeatedly on its edge.Owing to damage, cleaning medium is out of shape gradually or ruptures, and finally form plastic deformation, ductile fracture (ductile fracture) or brittle fracture.
Fig. 8 A illustrates the various collision patterns of laminar cleaning medium to 8D.
When cleaning medium that is easy to plastic deformation and object collision, the collision edge of cleaning medium is out of shape shown in Fig. 8 C, and this distortion has increased the contact area at edge and reduced impact force.As a result, disperseed, and clean-up performance descends in the contact force of cleaning medium edge.And cleaning medium becomes and can not cut film shape deposit deeply, and the cleaning efficiency of cleaning device reduces.
When cleaning medium that is easy to ductile fracture and object collision, shown in Fig. 8 D, the crack edge plastic deformation of cleaning medium, and this distortion has increased the contact area at edge and has reduced its impact force.As a result, disperseed, and clean-up performance reduces in the contact force of the edge of cleaning medium.And cleaning medium becomes and can not cut film shape deposit deeply, and the cleaning efficiency of cleaning device reduces.
Simultaneously, the crack edge that is easy to the cleaning medium of brittle fracture can greatly not be out of shape, and therefore, can not disperse very big in the contact force of the edge of cleaning medium.
And even film shape deposit is attached on the edge of cleaning medium, because cleaning medium can be concatenated to form new edge by brittle fracture repeatedly, its cleaning efficiency can not reduce.
The example of fragile material comprises the resin film sheet of sheet glass, potsherd and acrylic resin, polystyrene or polylactide resin.
When bending force is applied on the cleaning medium repeatedly, the cleaning medium fracture.In this application, the fragility of cleaning medium is limited by its folding strength.
When having fragility cleaning medium less than 65 folding strength, on the edge of cleaning medium, form burr repeatedly with object collision.But burr disconnects and drops from cleaning medium shown in Fig. 8 B, and is ejected.Because burr can not stayed on the edge of cleaning medium, has kept the function at this edge.
When having less than the fragility cleaning medium of 10 folding strength and object collision, cleaning medium before forming burr in separated, and shown in Fig. 8 A, form new edge.
So, kept the function at the edge of cleaning medium.In other words, kept the edge of cleaning medium to cut the sedimental ability of film shape deeply, and the cleaning medium removal sedimental performance of film shape (deposit removal performance) can not reduce in time.
The thickness of the laminar cleaning medium M of present embodiment is preferably more than or equal to 20 microns and be less than or equal to 200 microns, and its surface area preferably is less than or equal to 100 square millimeters.
In this application, pencil hardness is to utilize to measure according to the method for JIS K-5600-5-4.The pencil hardness of cleaning medium M number is determined by the lead for retractable pencil of the hardest pencil lead that can not form cut or indenture on cleaning medium M.
Folding strength is in this application measured according to JIS P8115, and the expression cleaning medium can be bent to the number of times of 135 degree (R=0.38mm) before it disconnects.
Fig. 9 is the view that the modification of cleaning medium is shown, and Figure 10 to 20 also illustrates the modification of cleaning medium.
Cleaning medium shown in Figure 9 has groove at least on a side (surface).This groove extends to the other end from an end of cleaning medium, and its shape of cross section is as rectangle.
Figure 10 illustrates the illustrative methods of producing cleaning medium.In this illustrative methods, the band with groove is cut into a plurality of cleaning medium M by for example electronic band cutting machine.
Groove function on the cleaning medium is a striping, and the stress that collision is applied concentrates on trench portions.Therefore, when cleaning medium during repeatedly with object collision, trench portions is easy to disconnect by brittle fracture.As shown in figure 11, be accumulated on the edge of cleaning medium even deposit adheres to by static, cleaning medium is in the brittle fracture of groove office, and forms new edge.Because the plastic deformation of the crack edge of cleaning medium is very little, can on large tracts of land, not disperse in the contact force of the edge of cleaning medium.
Figure 12 is illustrated in the cleaning medium that has groove on each side, and Figure 13 illustrates the side view of the cleaning medium of Figure 12.
Figure 14 to 19 illustrates other modification of cleaning medium.Each cleaning medium shown in Figure 14 to 19 has one or more grooves.The cross section of this groove has the shape outside the rectangle.
Simultaneously, the cleaning medium with different-thickness can be used for cleaning device.For example Bao cleaning medium is easy to enter the gap between film shape deposit and the object, and can be easy to peel off and remove deposit by sliding-contact as chock.Thick and hard cleaning medium is used with this thin cleaning medium, can further improve cleaning efficiency.
And, have difform cleaning medium and can be used for cleaning device.This feasible object that can clean different shape.
For example, cleaning medium can have disc-shape, triangular shaped, square configuration, rectangular shape or star shape, and the cleaning medium of one or more shapes can be used in the cleaning device.
The characteristic of cleaning medium is different according to its shape.Therefore, use cleaning medium, can improve total clean-up performance of cleaning device with different shape.
For example, the cleaning medium with square or rectangular shape has long straight flange, and is easy to produce.Cleaning medium with rectangle or star shape has cusp, and this cusp is easy to enter the depression or the corner of object, therefore can remove the deposit in this narrow space.
Cleaning medium with disc-shape is always with identical attitude (orientation) and object collision, and therefore can stably remove deposit.
In addition, the cleaning medium with different size can be used in the cleaning device.This can clean difform object.Nature, the cleaning medium with different size and shape can further improve the clean-up performance of cleaning device.
Figure 20 is the structure that the cleaning device 100 of another embodiment according to the present invention is shown.
The cleaning medium M that cleaning device utilization shown in Figure 20 is circulated by air-flow removes the cleaning medium M on the object 4 that will be cleaned.Cleaning device 100 comprises cleaning chamber 26, circulating current generating unit 46, cleaning medium accelerator module 27 and cleaning medium recirculation unit 28.
In this embodiment, object 4 is placed on when being cleaned in the cleaning chamber 26, has improved thus by cleaning medium recirculation unit 28 and has drawn the sedimental efficient of film shape.
And, in this embodiment, prevent film shape deposit d that the collision by cleaning medium M is removed from object 4 and scatter by the air-flow that the fragment that collide the cleaning medium M that produces repeatedly with object 4 is recycled air- flow generating unit 46 and 27 generations of cleaning medium accelerator module.
Figure 21 A and 21B are the views that the operation of cleaning device 100 is shown.
Shown in Figure 21 A, cleaning chamber 26 is that shape is similar to cubical ducted body, and has object feed opening 29 on the side thereon.Object 4 is placed in the cleaning chamber 26 by object feed opening 29.Provide lid 30 to close and open object feed opening 29.Also has an opening in the bottom of cleaning chamber 26.Cleaning medium recirculation unit 28 is arranged in the bottom of cleaning chamber 26, under the described opening.Circulating current generating unit 46 is arranged on the madial wall of cleaning chamber 26.Circulating current generating unit 46 produces circulating currents, and this circulating current circulates along the formed circulating path of the madial wall of cleaning chamber 26 (can comprise cover 30 and the separating part 81 described the later upper wall and the diapire that form).
Shown in Figure 21 B, each turning that forms the madial wall of circulating path is formed by angle θ 1 and θ 2.This structure makes effective circulating current become possibility.
Because geometry, θ 1+ θ 2 equals 270 °.If 270 ° are divided into two half equal ones, 2=135 ° of θ 1=θ.But θ 1 and θ 2 must not equate.According to test, by with a value that is set between 120 ° to 150 ° among θ 1 and the θ 2, can make minimum and effective circulating current cleaning chamber 26 in thus to the resistance of circulating current.
Figure 22 is the view that is shown in further detail circulating current generating unit 46.
Circulating current generating unit 46 comprises draws part 62 and discharge section 64.Draw part 62 and have inlet 61, this inlet has than major diameter, passes to allow cleaning medium M.Discharge section 64 has compressed air and supplies with opening 63, and this compressed air is supplied with opening 63 and is arranged near the outlet of drawing part 62, on its outer surface.
When compressed air is supplied with opening 63 from compressed air and provided, produce air-flow, and the air-flow that is produced causes air to be sucked from drawing part 62 towards the outlet 65 of discharge section 64.As a result, a large amount of air are discharged from the outlet 65 of discharge section 64.Will be from the amount that exports 65 air of discharging than supplying with compressed-air actuated amount that opening 63 provides from compressed air larger about several times to ten times.
Compare with common blow-out nozzle, Gou Zao circulating current generating unit 46 utilizes a spot of compressed air as mentioned above, and therefore can more effective circulation cleaning medium M.Replace compressed air, any other gas can be supplied with opening 63 from compressed air and provide.For example, such as nitrogen, CO
2The inert gas of gas or argon gas can be used as compressed-air actuated substitute.
Circulating current generating unit 46 is arranged near the bottom of cleaning chamber 26, on one of them madial wall that forms circulating path, make inlet 61 vertical planes up, and export 65 vertical planes down.
Cleaning medium accelerator module 27 is included in and the madial wall that the forms circulating path array of the accelerating jet 71a on the antetheca of quadrature mutually.Cleaning medium accelerator module 27 is also included within the array in the face of the accelerating jet 71b on the rear wall of antetheca.The blast injection that accelerating jet 71 (accelerating jet 71a and 71b) will provide from compressed air source (as compressor or pressurized tank) and causes cleaning medium M to fly to cleaning chamber 26 thus, and with object 4 collisions.Alternately, accelerating jet 71a and 71b have the structure that is similar to circulating current generation unit 46.
In some sense, making cleaning medium M at random aspect object 4 collision, cleaning medium accelerator module 27 auxiliary circulation air-flow generating units 46.
Figure 23 A and 23B illustrate the view of cleaning medium recirculation unit 28.Figure 23 A is the perspective view of cleaning medium recirculation unit 28, and Figure 23 B is the cutaway side sectional view of cleaning medium recirculation unit 28.
Cleaning medium recirculation unit 28 is arranged on the bottom of cleaning chamber 26, and comprises separating part 81 and guard shield 82, and they form enclosure space.Suction pipe 41 is connected on the side of guard shield 82.
And, comprise that the dust collecting unit (not shown) of negative pressure generator is connected on the opposite side of guard shield 82.Dust collecting unit produces negative pressure in guard shield 82.Separating part 81 has aperture or slit, and this aperture or slit allow gas and powder to pass, but do not allow cleaning medium to pass.Separating part 81 is porous parts, as silk screen, plastic wire, perforated metal or slit plate.Cleaning medium recirculation unit 26 via separating part 81 collect and discharge the film shape deposit removed from object 4, by with the cleaning medium of object 4 gouging abrasions or fracture and at the long-time cleaning medium that uses back elasticity to reduce.
Figure 24 is the calcspar of control system that the cleaning device 100 of this embodiment is shown.Figure 25 A and 25B are the views that the pipeline system of cleaning device is shown.Figure 25 A illustrates and air-flow produces relevant pipeline, and Figure 25 B illustrates the pipeline with cleaning medium circular correlation.
Shown in Figure 25,26A and 26B, the control system of cleaning device 100 comprises control module 32, air-flow circulating electromagnetic valve 34, quickens magnetic valve 35, quickens air-flow transfer valve 36 and recirculation magnetic valve 37.Air-flow circulating electromagnetic valve 34 opens and closes and is used for and will supplies to the air hose of circulating current generating unit 46 from the compression air feed of compressed air supply unit 38.Quicken magnetic valve 35 and open and close the air hose that is used for compressed air is supplied to cleaning medium accelerator module 27.Acceleration air-flow transfer valve 36 switches the compressed-air actuated flow direction of the accelerating jet 71 that will be provided to cleaning medium accelerator module 27.Recirculation magnetic valve 37 opens and closes the air hose 41 that is connected to cleaning medium recirculation unit 28 and dust collecting unit 39.Control module 32 is according to controlling each valve from the driving signal of trigger element 33.
Figure 26 is the sequential chart that is used to describe the exemplary cleaning course of this embodiment.Figure 27 A is that the view that is used to cause the illustrative methods that static cleaning medium flies is shown to 27C.Below, the cleaning course of the cleaning device 100 of Figure 20 is described with reference to the sequential chart of Figure 26.
At first, laminar cleaning medium M is introduced in the cleaning chamber 26.Under cleaning medium M is stacked in situation on the cleaning medium recirculation unit 28, is held the object 4 that unit 3 kept and is carried in the cleaning chamber 26 by object feed opening 29 by load bearing unit 40.Then, object feed opening 29 tegmentums 30 of cleaning chamber 26 are closed.Trigger element 33 is worked and is sent the cleaning commencing signal to control module 32.Control module 32 is opened air-flow circulating electromagnetic valve 34, so that compressed air is provided to circulating current generation unit 46 from the compressed air supply unit 38 as compressor.Circulating current generation unit 46 produces along the circulating current of the formed circulating path circulation of the madial wall of cleaning chamber 26.
As shown in Figure 27 A, the circulating current that flows through cleaning medium recirculation unit 28 blows the heap of the cleaning medium M on the cleaning medium recirculation unit 28 in the horizontal direction.Shown in Figure 27 B and 27C, the heap of this cleaning medium M is caused flying by (from the top to the bottom) gradually and rises along the length direction of cleaning chamber 6.Circulating current directly is drained into the cleaning chamber 26 from circulating current generating unit 46, and therefore, can apply bigger power on the cleaning medium M that is stacked and placed on the cleaning medium recirculation unit 28.Thus, circulating current generating unit 46 can cause cleaning medium on the cleaning medium recirculation unit 28 along with circulating current flies reliably.
Figure 28 A is to illustrate to be used to the another kind of illustrative methods that causes static cleaning medium to fly to 28C.
In the method shown in Figure 28 A, be provided on the cleaning medium M that is stacked on the separating part 81 along vertical direction from the compressed air of nozzle 42.In this case, compressed air must have enough energy to promote all the cleaning medium M on the separating part 81.And the compressed-air actuated energy of needs lifting cleaning medium M is along with the amount (perhaps Dui thickness) of the cleaning medium M on the separating part 81 increases and increases.Although might utilize compressed air that the cleaning medium M directly over the nozzle 42 is promoted, shown in Figure 28 B, be difficult to promote residue cleaning medium M around nozzle 42.
In addition, even around nozzle 42 bowl-shape slope is set, shown in Figure 28 C, the cleaning medium M that centers on nozzle 42 can not slide the slope owing to the mobile low of cleaning medium M.Thereby, utilize Figure 28 A to the method shown in the 28C, be difficult to make that the whole cleaning medium M on the separating part 81 fly.
Simultaneously, Figure 27 A that utilizes this embodiment is to the method shown in the 27C, circulating current generating unit 46 is configured to produce along the circulating current by the formed circulating path of madial wall of cleaning chamber 26, on the cleaning medium M that makes air-flow be applied in the horizontal direction to be stacked on the separating part 81.
This structure can utilize less energy stabilization ground to cause a pile cleaning medium M to fly, and can reduce the compressed-air actuated amount that is provided to circulating current generating unit 46 thus.At this, the cleaning medium M if conduit or flexible pipe are used to circulate, cleaning medium M might be stuck in conduit or the flexible pipe.Simultaneously, in this embodiment, circulating path forms along the inner wall surface of cleaning chamber 26.This structure prevents that cleaning medium M is stuck on the circulating path, and can stably cause cleaning medium M to circulate in cleaning chamber 26.
Circulating current generating unit 46 is arranged near the bottom of cleaning chamber 26, constitutes on one of them madial wall of circulating path, make inlet 61 vertical planes up, and the outlet vertical plane down.This structure can form very strong air-flow along the lower surface of cleaning chamber 26, and air-flow is applied to equably the cleaning medium M on the zone of separating part 81, and wherein separating part 81 is separated with outlet 65.This again can be along a large amount of cleaning medium M of inner surface carrying of cleaning chamber 26.Therefore utilize said structure, the space density of cleaning medium M is in that to enter inlet 61 o'clock lower, and cleaning medium M can not stop up inlet 61.Thereby said structure can be stablized the generation circulating current.Make inlet 61 face down if circulating current generating unit 46 is positioned on the opposite orientation, the power of drawing air only is applied near the inlet 61 the cleaning medium M.Utilize this structure, be difficult to carry a large amount of cleaning medium M on cleaning chamber 26 bottoms.And, utilizing this structure, the space density of the cleaning medium M of suction inlet 61 becomes too high and is easy to stop up inlet 61.The said structure of this embodiment can solve or alleviate this problem.
Figure 29 is the view that cleaning course according to the embodiment of the present invention is shown.Figure 29 (a) is illustrated in the object 4 of initial position; Figure 29 (b) is illustrated in the object 4 of extreme lower position; And Figure 29 (c) is illustrated in the object 4 (promptly turning back to initial position) of uppermost position.
At the fixed time after the section, control module 32 closed gas flow circulating electromagnetic valves 34, and stop thus producing circulating currents by circulating current generating unit 46.Shown in Figure 29 (a), utilize load bearing unit 40 with object 4 when initial position moves down gradually, control module 32 is opened and is quickened magnetic valve 35, by acceleration air-flow transfer valve 36 compressed air is provided to the accelerating jet 71a of cleaning medium accelerator module 27 from compressed air supply unit 38.
Then, when compressed air sprayed from accelerating jet 71a, control module 32 was opened recirculation magnetic valve 37, to connect cleaning medium recirculation unit 28 and dust collecting unit 39, produced negative pressure thus in guard shield 82.When the circulating current of circulating current generating unit 46 generations was stopped, the cleaning medium M that flies began to fall.The cleaning medium M that falls is caused and object 4 collisions by the compressed air that sprays from accelerating jet 71a, removes the deposit on the object 4 thus.
Deposit d that removes from object 4 or the cleaning medium M with removed deposit d drop owing to gravity and are accumulated on the separating part 81 of cleaning medium recirculation unit 28, and this separating part 81 is air-breathing owing to the negative pressure in guard shield 82.Drop to the deposit d on the separating part 81 or adhere to deposit d on the cleaning medium M owing to negative pressure is inhaled into guard shield 82, and collected by dust collecting unit 39 thus.Thereby, recirculating cleaning medium M.
After causing accelerating jet 71a ejection compressed air predetermined amount of time, control module 32 is closed and is quickened magnetic valve 35 and recirculation magnetic valve 37, stops the work of cleaning medium accelerator module 27 and cleaning medium recirculation unit 28 thus.When recirculation magnetic valve 37 cut out, the negative pressure in the guard shield 82 lost, and disappeared from the suction to being accumulated in the cleaning medium M on the separating part 81 of guard shield 82.As a result, cleaning medium M separates with separating part 81, and is caused flying once more by circulating current next time.
This structure prevents that the hole of separating part 81 or the slit medium M that is cleaned from stopping up, and can repeatedly deposit d be separated from cleaning medium M.Therefore, do not need to replace all cleaning medium M, that is: only need to add the cleaning medium M that cleaning medium M compensates fracture and loses.Therefore, said structure can effectively utilize cleaning medium M and also make and safeguard that cleaning device is easier.
After said process, control module 32 is opened air-flow circulating electromagnetic valve 32 once more, so that circulating current generating unit 46 produces circulating currents, and cause the cleaning medium M of the recirculation on the separating part 81 of the cleaning medium recirculation unit 28 time period T that flies thus.Then, control module is opened and is quickened magnetic valve 35 and recirculation magnetic valve 37, and switch acceleration air-flow transfer valve 36 to accelerating jet 71b, remove the process (deposit removal process) of deposit d and process (process recycling) the preset time section of recirculating cleaning medium M to carry out from object 4.
Be used for deposit and remove the time of process and process recycling and be set to such time period, that is: the time segment length that produces than circulating current of this time period, make can cleaning objects 4 broad area.And, alternately cause accelerating jet 71a and accelerating jet 71b to spray compressed air and can prevent to interfere with each other from the air-flow of nozzle 71a and 71b.Thereby said structure can cause cleaning medium M and object 4 stably to collide, and cleaning objects 4 effectively thus.
With object 4 when initial position moves down gradually, control module 32 carries out the generation, deposit of circulating current repeatedly and removes process and process recycling.When object 4 arrived extreme lower position or turning point, shown in Figure 29 (b), control module 32 stopped to move downward of object 4, and the object 4 that moves up gradually.When object 4 was moved up gradually, control module 32 also carried out the generation, deposit of circulating current repeatedly and removes process and process recycling, thus from the whole surperficial removing films shape deposit of object 4.
When object 4 arrived uppermost position or initial position, shown in Figure 29 (c), control module 32 was finished cleaning course.After cleaning course was finished, the lid 30 of cleaning chamber 26 was opened, and utilized load bearing unit 40 that the object 4 that holding unit 3 is kept is taken out outside the cleaning chamber 26.Then, object 4 is substituted with new object 4, and begins cleaning course once more.
Figure 30 is the view of modification that the cleaning device 100 of above-mentioned embodiment is shown.The cleaning device of Figure 30 comprises holding unit 31 and is used for the load bearing unit 40 of mobile up and down holding unit 31.Holding unit 31 can keep difform a plurality of object 4.Thereby the cleaning device of Figure 30 can clean difform a plurality of object 4 simultaneously.
In the above-described embodiment, compressed air alternately sprays from the accelerating jet 71a and the accelerating jet 71b of cleaning medium accelerator module 27, with the whole surface of cleaning objects 4.Alternately, accelerating jet 71a can be positioned to form different spray angles with object 4 with accelerating jet 71b, and compressed air can be simultaneously from accelerating jet 71a and accelerating jet 71b ejection.
Even in this case, if deposit only on a side of object 4, an only ejection from accelerating jet 71a and accelerating jet 71b of compressed air.
In the example that is described below, suppose that wanting removed deposit is to be used in imaging device, as the releasing layer (fluoroplastic layer) of the fixing roller in duplicator or the laser printer.But the present invention also can be applied to be used to remove the sedimental cleaning device of film shape of any other type.The type of cleaning medium and the speed of air-flow and flow are determined according to the object and the sedimental characteristic of film shape that will be cleaned.
＜example 1 〉
In example 1, the fixing roller of imagio Neo 300 (one-color copier) is used as the object that will be cleaned.
The pencil hardness of the fluoroplastics of the releasing layer of formation fixing roller is about " F ".
Utilize air nozzle array SL-920A injection compressed air and the compressed-air actuated pressure of Silvent to be maintained at 0.5MPa, each object was cleaned two minutes.
In example 1, use the cleaning medium M of following type:
(example 1-1): 100 microns of thickness, be of a size of the polyethylene film (pencil hardness is 6B or lower) of 5mm * 5mm.
(example 1-2): 100 microns of thickness are of a size of the PET film (pencil hardness is H) of 5mm * 5mm.
(example 1-3): 100 microns of thickness are of a size of the acrylic resin film (pencil hardness is 2H) of 5mm * 5mm.
(example 1-4): 100 microns of thickness are of a size of the SUS304 thin slice (pencil hardness is 9H or higher) of 5mm * 5mm.
As a comparison case, utilize below the granular cleaning medium of type replace laminar cleaning medium M and come cleaning objects by dry friction:
(Comparative Examples 1-1): the nylon cube of the 2mm length of side (pencil hardness is H).
(Comparative Examples 1-2): diameter (φ) is the nylon ball of 2mm (pencil hardness is H).
Clean the result shown in the table 1 below.
(table 1)
Cleaning quality in table 1 is by following symbolic representation:
*: deposit almost is not removed
△: the part deposit is not removed
Zero: deposit is removed satisfactorily
Shown in the result in the table 1, utilize according to the laminar cleaning medium M dry friction Billy of embodiment of the present invention and provide the better cleaning quality with the granular cleaning medium dry friction of prior art.
＜example 2 〉
Utilize air nozzle array SL-920A injection compressed air and the compressed-air actuated pressure of Silvent to be maintained at 0.5MPa, each object was cleaned two minutes.
In example 2, a plurality of objects are used cleaning medium repeatedly, and do not change cleaning medium, and assess cleaning quality according to the quantity of processed object.
In example 2, use the cleaning medium of following type:
(example 2-1): 100 microns of thickness, be of a size of the polyethylene film (pencil hardness is 6B or lower) of 5mm * 5mm.
(example 2-2): 100 microns of thickness are of a size of the PET film (pencil hardness is H) of 5mm * 5mm.
(example 2-3): 100 microns of thickness are of a size of the acrylic resin film (pencil hardness is 2H) of 5mm * 5mm.
(example 2-4): 100 microns of thickness are of a size of the SUS304 thin slice (pencil hardness is 9H or higher) of 5mm * 5mm.
Cleaning is the result be shown in the following Table 2.Employed identical in the implication of the symbol that in table 2, uses and the table 1:
(table 2)
The underscore symbol (
△With
*) bending owing to plastic deformation of expression cleaning medium.
Shown in the result in the table 2, the cleaning medium of making as the acrylic resin of fragile material provides good cleaning result aspect use repeatedly.
＜example 3 〉
In example 3 and 4, at electro-photography apparatus, being used as the bulging photosensitive layer (Merlon bond resin, pencil hardness F) of Organophotoreceptor (OPC) that uses in duplicator or the laser printer will removed deposit.But the present invention also can be applied to be used to remove the sedimental cleaning device of film shape of any other type.
The type of cleaning medium and the speed of air-flow and flow are suitably determined according to object that will be cleaned and the sedimental characteristic of film shape.
Utilize air nozzle array SL-920A injection compressed air and the compressed-air actuated pressure of Silvent to be maintained at 0.5MPa, each object was cleaned two minutes.
In example 3, use the cleaning medium M of following type.
(example 3-1): 100 microns of thickness, be of a size of the polyethylene film (pencil hardness is 6B or lower) of 5mm * 5mm.
(example 3-2): 100 microns of thickness are of a size of the PET film (pencil hardness is H) of 5mm * 5mm.
(example 3-3): 100 microns of thickness are of a size of the acrylic resin film (pencil hardness is 2H) of 5mm * 5mm.
(example 3-4): 100 microns of thickness are of a size of the SUS304 thin slice (pencil hardness is 9H or higher) of 5mm * 5mm.
As a comparison case, utilize below the granular cleaning medium of type replace laminar cleaning medium M and come cleaning objects by dry friction:
(Comparative Examples 3-1): the nylon cube of the 2mm length of side (pencil hardness is H).
(Comparative Examples 3-2): diameter (φ) is the nylon ball of 2mm (pencil hardness is H).
Cleaning is the result be shown in the following Table 3.
In utilizing the cleaning course of laminar cleaning medium, to observe owing to skidding in conjunction with intersection, photosensitive layer is wrinkling, and the wrinkling part of photosensitive layer begins to drop.
(table 3)
＜example 4 〉
Utilize air nozzle array SL-920A injection compressed air and the compressed-air actuated pressure of Silvent to be maintained at 0.5MPa, each object was cleaned two minutes.
In example 4, a plurality of objects are used cleaning medium repeatedly, and do not change cleaning medium, and assess cleaning quality according to the quantity of processed object.In example 4, use the cleaning medium of following type:
(example 4-1): 100 microns of thickness, be of a size of the polyethylene film (pencil hardness is 6B or lower) of 5mm * 5mm.
(example 4-2): 100 microns of thickness are of a size of the PET film (pencil hardness is H) of 5mm * 5mm.
(example 4-3): 100 microns of thickness are of a size of the acrylic resin film (pencil hardness is 2H) of 5mm * 5mm.
(example 4-4): 100 microns of thickness are of a size of the SUS304 thin slice (pencil hardness is 9H or higher) of 5mm * 5mm.
Cleaning is the result be shown in the following Table 4.
(table 4)
The underscore symbol (
△With
*) bending owing to plastic deformation of expression cleaning medium.
Shown in the result in the table 2, the cleaning medium of making as the acrylic resin of fragile material provides good cleaning result aspect use repeatedly.
＜example 5 〉
In example 5, the pallet that the epoxy resin of filled glass fiber is made is used as the object that will be cleaned.Pallet is to utilize employed anchor clamps in the welding process of fluid solder tank, does not expect soldered zone to hide on the printed circuit board (PCB) (PCB).When this when blocking anchor clamps or pallet and using repeatedly, scaling powder accumulation and on pallet, form thick-layer.Therefore, need often to remove one deck scaling powder (scaling powder layer) from pallet.In this example, the pencil hardness of scaling powder is 2B, the thickness of scaling powder layer 0.5 and 1mm between.
The pallet of size 330mm * 330mm utilizes surface cleaning implement cleaning shown in Figure 1 two minutes.The pressure of institute's compressed and supplied air remains on 0.4MPa.
Table 5 illustrates employed cleaning medium type and corresponding cleaning result.Table 5 also illustrates the folding strength that comprises all kinds cleaning medium and the physical characteristic of pencil hardness.
Table 5
* the underscore symbol (
△With
*) bending owing to plastic deformation of expression cleaning medium
* double underline symbol
The edge of expression cleaning medium is because plastic deformation and sagging
Cleaning quality among Fig. 5 is by following symbolic representation:
*: deposit almost is not removed
△: the part deposit is not removed
Zero: deposit is removed satisfactorily
-: cleaning medium is worn and discharges from cleaning chamber
Shown in the result that the initial clean-up performance of table 5 is assessed, the cleaning medium with Pencil with 2B hardness hardness (pencil hardness of scaling powder) or lower pencil hardness almost can not be removed scaling powder.This is owing to the cleaning medium with so low pencil hardness can not be cut in the scaling powder layer.
Cleaning medium caused flying by air-flow and repeatedly with object collision.Cleaning medium damages and produces fracture or distortion gradually owing to collide repeatedly.
Figure 31 illustrates the machinery of various cleaning mediums and the curve that physical characteristic distributes.
Describe the degeneration of cleaning medium in detail to 8D below with reference to table 5 and Fig. 8 A.When cleaning medium of making less than 10 glass, acrylic resin (1), acrylic resin (2) or COC when folding strength and object collision, cleaning medium ruptures in the centre, and the result forms new edge, shown in Fig. 8 A.Because new edge can be cut in the scaling powder layer, can not reduce the deposit of cleaning medium and remove performance.
When folding strength more than or equal to 10 and when the cleaning medium made less than 64 TAC (1), TAC (2) or PI (2) and object collision, burr is formed on the edge, and drops from cleaning medium, shown in Fig. 8 B.Because the thickness of cleaning medium can not change, cleaning medium still can be cut in the scaling powder layer, that is, kept its deposit to remove performance.
When folding strength is 65 or when higher cleaning medium and object collision, cleaning medium can not rupture, but its edge plastic deformation.
The edge of cleaning medium is shown Fig. 8 C because also sagging example is flattened in plastic deformation.For example, the cleaning medium made of PI (1) is out of shape like this.
Fig. 8 D illustrates the edge of cleaning medium because plastic deformation and curling example.For example, the cleaning medium made of SUS, PS (1), PS (2), PE, PET or TPX is out of shape like this.
The edge plastic deformation of the cleaning medium of describing as reference Fig. 8 C and 8D and sagging, and because this distortion their impulsive force when collision descends, therefore, the clean-up performance of these cleaning mediums greatly descends after handling a plurality of objects, and is as shown in table 5.
Shown in this result, in order on long-time section, effectively and stably to remove the scaling powder layer, preferably, the cleaning medium that utilizes fragile material to make, its pencil hardness greater than the pencil hardness of scaling powder and its folding strength more than or equal to 0 and less than 65.
At the folding strength measured value of multiple cleaning medium shown in the table 6, to be provided for the numerical value basis in the description of the present embodiment book.
Table 6:
| Sequence number | Material | Average folding strength | Maximum folding strength | |
| 3 | Acrylic resin (2) | 2 | 8 | 0 |
| 4 | Acrylic resin (1) | 4 | 9 | 1 |
| 7 | ?PI(2) | 45 | 52 | 41 |
| 8 | ?PS(1) | 88 | 115 | 65 |
Minimum folding strength is that 0 laminar cleaning medium (glass, COC, acrylic resin (2)) is highly brittle, and is easy to fracture.Therefore as shown in table 5, they wear and tear in short time period, and increase operating cost.
Simultaneously, the maximum folding strength that shows the cleaning medium that the PI (2) of good clean-up performance makes is 52.
Therefore, the preferred folding strength that is to use is more than or equal to 1 and be less than or equal to 52 cleaning medium, so as in long-time section effective and steady removal deposit.
The minimum folding strength of the cleaning medium that the PS (1) of generation ductility distortion makes is 65, and therefore, the maximum folding strength of fragility cleaning medium is less than 65.
The maximum folding strength that shows the cleaning medium that the PI (2) of good clean-up performance makes is 52.This expression folding strength is less than or equal to 52 cleaning medium and can stablizes the generation brittle fracture.
In the cleaning medium that produces the brittle fracture shown in Fig. 8 A, the cleaning medium that acrylic resin (1) is made has the highest folding strength 9.So folding strength is more than or equal to 0 and be less than or equal to 9 cleaning medium and produce brittle fracture shown in Fig. 8 A, folding strength is more than or equal to 10 and produce brittle fracture shown in Fig. 8 B less than 65 cleaning medium.
Minimum folding strength is that the cleaning medium made of 0 acrylic resin (2) is extremely crisp, and therefore is unsuitable for long-time use (using repeatedly), and is as shown in table 5.Simultaneously, minimum folding strength is that the clean-up performance of the cleaning medium made of 1 acrylic resin (1) does not reduce in long-time section, and is as shown in table 5.
As mentioned above, one aspect of the present invention has provided a kind of cleaning device, this cleaning device can be effectively and is removed film shape deposit efficiently, as releasing layer on the fixing roller of photosensitive layer on the photosensitive drums that is used for scaling powder layer, imaging device on the pallet of welding process or imaging device or fixing toner.
The present invention is not limited to concrete disclosed embodiment, but can make various distortion and improvement under the prerequisite that does not deviate from scope of the present invention.
The Japanese priority application 2009-124269 that the Japanese priority application 2009-113793 that the Japanese priority application 2008-180378 that the application submitted to based on July 10th, 2008, on May 8th, 2009 submit to and on May 22nd, 2009 submit to, the full content of these priority applications is incorporated herein by reference.
Claims (11)
1. a cleaning device is used to remove the deposit that sticks on the object that will be cleaned, and comprising:
Cleaning chamber, this cleaning chamber are formed for holding the space of shape as a plurality of cleaning mediums of thin slice;
The circulating current generating unit, this circulating current generating unit is configured to produce circulating current, causing cleaning medium to fly in cleaning chamber and to collide repeatedly with described object, and removes the deposit that adheres on the described object thus; And
Cleaning medium recirculation unit, this cleaning medium recirculation unit are configured to draw and remove the deposit on the cleaning medium that sticks to object collision, and recirculating cleaning medium thus,
Wherein, the pencil hardness of described cleaning medium is greater than described sedimental pencil hardness.
2. cleaning device as claimed in claim 1, wherein, the folding strength of described cleaning medium is more than or equal to 0 and less than 65.
3. cleaning device as claimed in claim 2 wherein, forms groove at least one side of each cleaning medium, this groove extends to the other end from an end of each cleaning medium.
4. cleaning device as claimed in claim 1, wherein, described cleaning medium comprises the cleaning medium of different-thickness.
5. cleaning device as claimed in claim 1, wherein, described cleaning medium comprises difform cleaning medium.
6. cleaning device as claimed in claim 1, wherein, described cleaning medium comprises the cleaning medium of different size.
7. a removal sticks to the sedimental method on the object that will be cleaned, and may further comprise the steps:
By utilizing circulating current to make shape in cleaning chamber, fly and collide repeatedly, stick to deposit on this object with removal with described object as a plurality of cleaning mediums of thin slice; And
Draw and remove the deposit on the cleaning medium that sticks to described object collision, with the recirculating cleaning medium,
Wherein, the pencil hardness of described cleaning medium is greater than described sedimental pencil hardness.
8. method as claimed in claim 7, wherein, the folding strength of described cleaning medium is more than or equal to 0 and less than 65.
9. method as claimed in claim 8 wherein, forms groove at least one side of each cleaning medium, this groove extends to the other end from an end of each cleaning medium.
10. cleaning medium; This cleaning medium shape is as thin slice and be used in the cleaning device; This cleaning device is used for removing the deposit that sticks on the object of wanting cleaned; Described cleaning device is configured to by utilizing circulating current so that cleaning medium flies in cleaning chamber and repeatedly collide with described object; Stick to deposit on the described object with removal; And be configured to draw and remove the deposit on the cleaning medium that sticks to described object collision; With the recirculating cleaning medium
Wherein, the pencil hardness of described cleaning medium is greater than described sedimental pencil hardness.
11. cleaning medium as claimed in claim 10, wherein, the folding strength of described cleaning medium is more than or equal to 0 and less than 65.
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008180378 | 2008-07-10 | ||
| JP180378/08 | 2008-07-10 | ||
| JP2009113793 | 2009-05-08 | ||
| JP113793/09 | 2009-05-08 | ||
| JP2009124269A JP4758497B2 (en) | 2008-07-10 | 2009-05-22 | Cleaning device and cleaning method |
| JP124269/09 | 2009-05-22 | ||
| PCT/JP2009/062257 WO2010004945A1 (en) | 2008-07-10 | 2009-06-30 | Cleaning device and cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102089088A true CN102089088A (en) | 2011-06-08 |
| CN102089088B CN102089088B (en) | 2013-01-23 |
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ID=41507058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009801265952A Active CN102089088B (en) | 2008-07-10 | 2009-06-30 | Cleaning device and cleaning method |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20110067731A1 (en) |
| EP (1) | EP2293886B1 (en) |
| JP (1) | JP4758497B2 (en) |
| KR (1) | KR101282453B1 (en) |
| CN (1) | CN102089088B (en) |
| WO (1) | WO2010004945A1 (en) |
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| CN113814226B (en) * | 2020-06-19 | 2023-01-24 | 理光高科技(深圳)有限公司 | Dry type cleaning device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02208486A (en) * | 1989-02-06 | 1990-08-20 | Nippon Sheet Glass Co Ltd | Method and device for draining and drying |
| JPH0459087A (en) * | 1990-06-21 | 1992-02-25 | Masazumi Nara | Method and device for cleaning using flying body |
| CN101031370A (en) * | 2005-06-22 | 2007-09-05 | 株式会社理光 | Dry cleaning device and dry cleaning method |
| US20080141484A1 (en) * | 2006-12-15 | 2008-06-19 | Tatsuya Satoh | Cleaning medium and dry cleaning apparatus using the same |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2699403A (en) * | 1952-05-24 | 1955-01-11 | Emmett J Courts | Means and methods for cleaning and polishing automobiles |
| US2978850A (en) * | 1958-05-01 | 1961-04-11 | Dixon Sintaloy Inc | Tumble finishing process |
| US3011602A (en) * | 1959-07-13 | 1961-12-05 | Lockheed Aircraft Corp | Panel construction |
| US5820447A (en) * | 1997-02-18 | 1998-10-13 | Inter+Ice, Inc. | Ice blasting cleaning system |
| JP2003190247A (en) * | 2001-12-25 | 2003-07-08 | Kochi Univ Of Technology | Grain jet type washer |
| US7049369B2 (en) * | 2002-01-31 | 2006-05-23 | Dainippon Ink And Chemicals, Inc. | Styrene resin composition and process for producing the same |
| JP4580916B2 (en) * | 2005-11-02 | 2010-11-17 | 株式会社リコー | Cleaning device and cleaning method |
| JP4741998B2 (en) * | 2006-09-06 | 2011-08-10 | 株式会社リコー | Cleaning device and cleaning method |
| US7730896B2 (en) * | 2006-09-06 | 2010-06-08 | Ricoh Company, Limited | Dry cleaning device and dry cleaning method |
-
2009
- 2009-05-22 JP JP2009124269A patent/JP4758497B2/en active Active
- 2009-06-30 CN CN2009801265952A patent/CN102089088B/en active Active
- 2009-06-30 WO PCT/JP2009/062257 patent/WO2010004945A1/en active Application Filing
- 2009-06-30 EP EP09794390A patent/EP2293886B1/en active Active
- 2009-06-30 US US12/993,279 patent/US20110067731A1/en not_active Abandoned
- 2009-06-30 KR KR1020107028811A patent/KR101282453B1/en active IP Right Grant
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02208486A (en) * | 1989-02-06 | 1990-08-20 | Nippon Sheet Glass Co Ltd | Method and device for draining and drying |
| JPH0459087A (en) * | 1990-06-21 | 1992-02-25 | Masazumi Nara | Method and device for cleaning using flying body |
| CN101031370A (en) * | 2005-06-22 | 2007-09-05 | 株式会社理光 | Dry cleaning device and dry cleaning method |
| US20080141484A1 (en) * | 2006-12-15 | 2008-06-19 | Tatsuya Satoh | Cleaning medium and dry cleaning apparatus using the same |
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| CN103567192A (en) * | 2012-07-23 | 2014-02-12 | 株式会社理光 | Dry-type cleaning chassis, dry-type cleaning device, and dry-type cleaning method |
| CN107650007A (en) * | 2016-07-25 | 2018-02-02 | 魏金卿 | Woodwork processing method, device for deburring and its woodwork |
| US11717850B2 (en) | 2017-06-13 | 2023-08-08 | Hymmen Gmbh Maschinen-Und Anlagenbau | Method and apparatus for producing a decorative workpiece and workpiece |
| US11883843B2 (en) | 2017-06-13 | 2024-01-30 | Hymmen Gmbh Maschinen-Und Anlagenbau | Method for producing a structured surface |
| US11717851B2 (en) | 2017-06-13 | 2023-08-08 | Hymmen GmbH Maschinen—und Anlagenbau | Method and apparatus for producing a decorative workpiece and workpiece |
| US11420229B2 (en) | 2017-06-13 | 2022-08-23 | Hymmen GmbH Maschinen—und Anlagenbau | Method and apparatus for producing a decorative surface |
| US11511318B2 (en) | 2017-06-13 | 2022-11-29 | Hymmen GmbH Maschinen- und Anlagenbau | Method and apparatus for producing a decorative workpiece and workpiece |
| CN109692846A (en) * | 2018-12-29 | 2019-04-30 | 深圳市富诺依科技有限公司 | A kind of dry cleaning device |
| CN109759390A (en) * | 2018-12-29 | 2019-05-17 | 深圳市富诺依科技有限公司 | A kind of the packaging container component and dry cleaning device of dry cleaning device |
| US11559824B2 (en) | 2019-05-03 | 2023-01-24 | Hymmen Gmbh Maschinen-Und Anlagenbau | Method for producing a structure on a surface |
| CN112188936A (en) * | 2019-05-03 | 2021-01-05 | 海曼机械和设备有限公司 | Method and apparatus for forming a decorative surface |
| CN112188936B (en) * | 2019-05-03 | 2024-01-09 | 海曼机械和设备有限公司 | Method and apparatus for forming a decorative surface |
| US11707772B2 (en) | 2019-10-29 | 2023-07-25 | United States Of America As Represented By The Administrator Of Nasa | High flow differential cleaning system |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110067731A1 (en) | 2011-03-24 |
| EP2293886A4 (en) | 2012-05-30 |
| JP4758497B2 (en) | 2011-08-31 |
| EP2293886B1 (en) | 2012-12-12 |
| EP2293886A1 (en) | 2011-03-16 |
| WO2010004945A1 (en) | 2010-01-14 |
| JP2010279850A (en) | 2010-12-16 |
| KR101282453B1 (en) | 2013-07-04 |
| KR20110028459A (en) | 2011-03-18 |
| CN102089088B (en) | 2013-01-23 |
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