CN102061457A - Gas phase reaction device - Google Patents
Gas phase reaction device Download PDFInfo
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- CN102061457A CN102061457A CN2010105243463A CN201010524346A CN102061457A CN 102061457 A CN102061457 A CN 102061457A CN 2010105243463 A CN2010105243463 A CN 2010105243463A CN 201010524346 A CN201010524346 A CN 201010524346A CN 102061457 A CN102061457 A CN 102061457A
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Abstract
The invention discloses a gas phase reaction device. The device comprises a reaction chamber, an exhaust passage, a recoil gas passage and a pressure switch, wherein the exhaust passage is connected with the reaction chamber and exhausts for the reaction chamber; the recoil gas passage is connected with the exhaust passage; recoil gas flows into the exhaust passage through the recoil gas passage to adjust the pressure of the reaction chamber; and the pressure switch is connected to the recoil gas passage. The gas phase reaction device eliminates a potential security risk caused by the failure of the pressure switch, contributes to prolonging the service life of the pressure switch and reduces the operation cost.
Description
Technical field
The present invention relates to solar cell producing apparatus field, particularly a kind of gas-phase reaction device.
Background technology
In the production process of semi-conductor and solar cell, be extensive use of as gas-phase reaction devices such as chemical vapor deposition (CVD) equipment, low-pressure chemical vapor deposition (LPCVD) equipment.The cardinal principle of gas-phase reaction device is that reactant gases is fed in the reaction chamber, and the reaction conditionss such as pressure, temperature of control reaction chamber, makes reactant gases react, and finishes processing steps such as deposition.
Fig. 1 shows the structural representation of a kind of gas-phase reaction device of prior art, comprising: reaction chamber 10; Vacuum pump 12, described vacuum pump 12 links to each other by the venting port of exhaust valve tube 11 with described reaction chamber 10; Switch-valve 14 and flow director (MFC, Mass Flow Controller) 15 is serially connected on the recoil valve tube 13 successively, and links to each other with recoil gas inlet on the described exhaust valve tube by described recoil valve tube 13; Pressure switch (PS, Pressure Switch) 16 is connected on the described exhaust valve tube 11.
Described exhaust valve tube 11 and vacuum pump 12 have been formed exhaust channel, are mainly used in the gas in the discharging reaction chamber 10; Described switch-valve 14, flow director 15 and recoil valve tube 13 have been formed the recoil gas passage, and recoil gas enters exhaust channel by the recoil gas passage, the pressure in exhaust channel and the reaction chamber 10 is regulated and is compensated, to satisfy reaction conditions.
In use and working process, reactant gases is (not shown by the inlet mouth on the reaction chamber 10, be arranged in the opposite side relative on the described reaction chamber 10 with venting port) enter reaction chamber 10, described vacuum pump 12 is extracted reacted gas out from venting port by described exhaust valve tube 11, simultaneously in order to guarantee that pressure in the reaction chamber 10 is in the scope of reaction needed, need to use recoil gas that the pressure in the reaction chamber 10 are compensated and balance, described reactant gases enters in exhaust valve tube 11 and the reaction chamber 10 by described recoil valve tube 13 and flow through described flow director 15 and switch-valve 14.Wherein, switch-valve 14 is used to control the turn-on and turn-off of recoil valve tube 13, and flow director 15 is used to control the flow of the recoil gas that flows into recoil valve tube 13.
Described pressure switch 16 is used for monitoring the pressure of exhaust valve tube 11 and reaction chamber 10, produces warning signal or control signal, the danger that the equipment pressure anomaly of preventing causes after pressure exceeds the preset threshold value scope.But the gas-phase reaction device in use can produce more byproduct, and described byproduct can adhere to or is deposited on the pressure switch 16 by exhaust valve tube 11.Along with adhering to or being deposited on increasing of byproduct on the pressure switch 16, can cause pressure switch 16 to lose efficacy gradually.The pressure switch 16 that lost efficacy has been lost the function of pressure monitoring, causes unusual circumstance in time, causes potential safety hazard easily.Therefore, in production application, in order to reduce security risk, user's pressure switch of having to change continually.And byproduct in pressure switch deposition or adhere to and have certain randomness, even the periodic replacement pressure switch also can not solve the Problem of Failure of pressure switch fully.
About more detailed contents of vapor deposition apparatus, the Chinese patent application file that please refer to 2009 on July 1,, disclosed publication number was CN101469411A.
Summary of the invention
The purpose of this invention is to provide a kind of gas-phase reaction device, with solve exist in the prior art because potential potential safety hazard that the pressure switch inefficacy causes and the problem that influences the work-ing life of pressure switch.
For addressing the above problem, the invention provides a kind of gas-phase reaction device, comprising:
Reaction chamber;
Exhaust channel links to each other with described reaction chamber, and described reaction chamber is carried out exhaust;
The recoil gas passage links to each other with described exhaust channel, and recoil gas flows into described exhaust channel by described recoil gas passage;
Pressure switch, described pressure switch are connected on the described recoil gas passage.
Optionally, described recoil gas passage comprises the recoil valve tube and is serially connected in trunnion on the described recoil valve tube, the internal diameter of described trunnion is less than the internal diameter of described recoil valve tube, and described pressure switch is connected on the recoil gas passage of described trunnion near gas source one side of described recoil gas.
Optionally, described recoil gas passage also comprises gas-holder, and described gas-holder is serially connected on the recoil valve tube of described trunnion near gas source one side of described recoil gas, and described pressure switch is connected on the described gas-holder.
Optionally, described recoil gas passage also comprises switch-valve and the flow director that is serially connected on the described recoil valve tube, and described recoil gas enters described exhaust channel via described flow director, switch-valve, gas-holder and trunnion successively.
Optionally, the concrete inlet end in described recoil gas passage, the flow of the recoil gas of described inlet end is 2 to 4slm, the internal diameter of described recoil valve tube is 30mm to 200mm, the internal diameter of described exhaust valve tube is 100mm to 200mm, the internal diameter of described trunnion is 15 to 17mm, and length is 70 to 90mm.
Optionally, the flow of the recoil gas of described inlet end is 3slm, and the internal diameter of described recoil valve tube is 100mm, and the internal diameter 200mm of described exhaust valve tube, the internal diameter of described trunnion are 16mm, and length is 80mm.
Optionally, described recoil gas passage also comprises transfer tube, and the internal diameter of described transfer tube is greater than the internal diameter of described trunnion, and described trunnion or recoil valve tube link to each other with described exhaust channel by described transfer tube.
Optionally, described exhaust channel comprises vacuum pump and exhaust valve tube, and described vacuum pump links to each other with described reaction chamber by described exhaust valve tube.
Optionally, described gas-phase reaction device is chemical vapor depsotition equipment, low pressure chemical vapor deposition equipment, plasma enhanced chemical vapor deposition equipment or high density plasma CVD equipment.
Optionally, be connected with reactant gases in the described reaction chamber, described reactant gases comprises oxygen-containing gas and contains zinc gas that described recoil gas is nitrogen, rare gas element or other non-active gas.
Compared with prior art, technical scheme of the present invention has following advantage:
The technical program is connected pressure switch on the recoil gas passage, because recoil gas flows into exhaust channel by the recoil gas passage, pressure in the recoil gas passage is more bigger than the pressure in exhaust channel and the reaction chamber, therefore, by product recoil more difficult to get access gas passage under pressure action that reaction produces in the reaction chamber, be beneficial to reduce by product on pressure switch deposition and adhere to, thereby be beneficial to the work-ing life that prolongs pressure switch, eliminated the potential potential safety hazard that lost efficacy and cause owing to pressure switch, and help reducing the replacing frequency of pressure switch, save operation cost.
Further, the technical program has installed trunnion additional on the recoil gas passage, the internal diameter of described trunnion is less than the internal diameter of the recoil valve tube in the recoil gas passage, make trunnion bigger than the pressure of close exhaust channel one side near the pressure of gas source one side of recoil gas, and pressure switch is connected on the recoil gas passage of gas source one side of trunnion near recoil gas, increased trunnion near the recoil gas passage of gas source one side of recoil gas and the difference of the pressure between exhaust channel and the reaction chamber, be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
Further, the technical program installs additional on the basis of trunnion on the recoil gas passage, gas source one side at the close recoil of described trunnion gas is serially connected with gas-holder, described pressure switch is connected on the described gas-holder, thereby further increase and stablized the pressure difference between described gas-holder and exhaust channel and the reaction chamber, be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
Description of drawings
Fig. 1 is the structural representation of a kind of gas-phase reaction device of prior art;
Fig. 2 is the structural representation of the gas-phase reaction device of first embodiment of the invention;
Fig. 3 is the structural representation of the gas-phase reaction device of second embodiment of the invention;
Fig. 4 is the structural representation of the gas-phase reaction device of third embodiment of the invention.
Embodiment
In the gas-phase reaction device of prior art, on the exhaust channel that pressure switch is installed in reaction chamber links to each other, the by product that reaction produces in the reaction chamber is easy to deposition and attached on the pressure switch, causes pressure switch to lose efficacy, make and in time to find the pressure abnormal problem, cause potential danger.And frequent replacing pressure switch increased operation cost on the one hand, also can not solve the stochastic problems that byproduct deposits or adheres in pressure switch on the other hand.
The technical program is connected pressure switch on the recoil gas passage, because recoil gas flows into exhaust channel by the recoil gas passage, pressure in the recoil gas passage is more bigger than the pressure in exhaust channel and the reaction chamber, therefore, by product recoil more difficult to get access gas passage under pressure action that reaction produces in the reaction chamber, be beneficial to reduce by product on pressure switch deposition and adhere to, thereby be beneficial to the work-ing life that prolongs pressure switch, eliminated the potential potential safety hazard that lost efficacy and cause owing to pressure switch, and help reducing the replacing frequency of pressure switch, save operation cost.
Further, the technical program has installed trunnion additional on the recoil gas passage, the internal diameter of described trunnion is less than the internal diameter of the recoil valve tube in the recoil gas passage, make trunnion bigger than the pressure of close exhaust channel one side near the pressure of gas source one side of recoil gas, and pressure switch is connected on the recoil gas passage of gas source one side of trunnion near recoil gas, increased trunnion near the recoil gas passage of gas source one side of recoil gas and the difference of the pressure between exhaust channel and the reaction chamber, be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
Further, the technical program installs additional on the basis of trunnion on the recoil gas passage, gas source one side at the close recoil of described trunnion gas is serially connected with gas-holder, described pressure switch is connected on the described gas-holder, thereby further increase and stablized the pressure difference between described gas-holder and exhaust channel and the reaction chamber, be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
For above-mentioned purpose of the present invention, feature and advantage can more be become apparent, the specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing.
Set forth detail in the following description so that fully understand the present invention.But the present invention can be different from alternate manner described here and implements with multiple, and those skilled in the art can do similar popularization under the situation of intension of the present invention.Therefore the present invention is not subjected to the restriction of following public embodiment.
Fig. 2 shows the structural representation of the gas-phase reaction device of first embodiment of the invention, comprising: reaction chamber 20; Exhaust channel 21 links to each other with described reaction chamber 20, and described reaction chamber 20 is carried out exhaust; Recoil gas passage 22 links to each other with described exhaust channel 21, and recoil gas flows into described exhaust channel 21 by described recoil gas passage 22, so that the pressure of described reaction chamber 20 is regulated; Pressure switch 23 is connected on the described recoil gas passage 22.
In the present embodiment, described exhaust channel 21 comprises exhaust valve tube 211 and vacuum pump 212, and described vacuum pump 212 links to each other by the venting port of exhaust valve tube 211 with described reaction chamber 20, and described reaction chamber 20 is carried out exhaust.
Described recoil gas passage 22 comprises recoil valve tube 221 and is serially connected in switch-valve 222 and flow director 223 on the described recoil valve tube 221, described recoil valve tube 221 links to each other with recoil gas inlet 213 on the described exhaust valve tube 211, flow through successively described flow director 223, switch-valve 222 of recoil gas enters in the described exhaust valve tube 211, and the pressure in described exhaust channel 21 and the reaction chamber 20 are compensated and regulate.Certainly, described recoil gas passage 22 also can only comprise described recoil valve tube 221, and recoil gas flows in the described recoil valve tube 221 by external flow director 223 and switch-valve 222.
Described pressure switch 23 is connected on the described recoil gas passage 22, and is concrete, is connected described switch-valve 222 gases and flows out on the recoil valve tube 221 of an end, and the pressure in the described recoil valve tube 221 is monitored.
The gas-phase reaction device of present embodiment can also comprise intake channel, and reactant gases enters reaction chamber 20 by described intake channel and reacts, for the main points of the explanation the technical program simplified, among the figure and not shown described intake channel.
Described gas-phase reaction device can be chemical vapor depsotition equipment, low pressure chemical vapor deposition equipment, plasma enhanced chemical vapor deposition (PECVD) equipment or high density plasma CVD (HDPCVD) equipment.In one embodiment, in the deposition reaction process as zinc-oxide film, reactant gases enters described reaction chamber 20 by intake channel, described switch-valve 222 is opened, recoil gas enters in the exhaust valve tube 211 by flow director 223, switch-valve 222 successively, so that the pressure in described exhaust channel 21 and the reaction chamber 20 is regulated, satisfy the required pressure conditions of reaction.Described reactant gases comprises oxygen-containing gas and contain zinc gas, and described oxygen-containing gas is vaporous water or ozone, and the described zinc gas that contains is zinc ethyl (DEZ).Described zinc-oxide film is as the electrode layer of solar cell.Described recoil gas is nitrogen, rare gas element or other non-active gas.
Because recoil gas flows in exhaust channel 21 and the reaction chamber 20 by described recoil gas passage 22, thereby pressure P1 more described exhaust channel 21 and the pressure P2 in reaction chamber 20 of recoil in the gas passage 22 is slightly high, and the by product that reaction produces in the reaction chamber 20 is difficult to enter in the recoil gas passage 22.And the pressure switch 23 in the present embodiment is connected on the recoil gas passage 22, specifically be connected on the recoil valve tube 221 in the backwashing passage 22, thereby can effectively reduce by product on pressure switch 23 deposition and adhere to, eliminated the potentially dangerous that pressure switch 23 lost efficacy and causes, and prolonged the work-ing life of pressure switch 23, reduced operation cost.
Need to prove, pressure P1 in the described recoil gas passage 22 is more bigger than the pressure P2 in exhaust channel 21 and the reaction chamber 20, and pressure switch 23 is connected on the recoil gas passage 22, therefore make that the read-around ratio exhaust channel 21 of pressure switch 23 and the pressure P2 in the reaction chamber 20 are bigger, but also can guarantee the supervisory function bit of pressure switch 23, can't cause the problem of failing to report of pressure unusual phenomenon.
Fig. 3 shows the structural representation of the gas-phase reaction device of second embodiment of the invention, comprising: reaction chamber 30; Exhaust channel 31 links to each other with described reaction chamber 30, and described reaction chamber 30 is carried out exhaust; Recoil gas passage 32 links to each other with described exhaust channel 31, and recoil gas flows into described exhaust channel 31 by described recoil gas passage 32, and the pressure of described reaction chamber 30 is regulated; Pressure switch 33 is connected on the described recoil gas passage 32.
Concrete, described exhaust channel 31 comprises exhaust valve tube 311 and vacuum pump 312, described vacuum pump 312 links to each other by the venting port of exhaust valve tube 311 with described reaction chamber 30, and described reaction chamber 30 is carried out exhaust.
Described recoil gas passage 32 comprises recoil valve tube 321 and is serially connected in trunnion 324 on the described recoil valve tube 321, switch-valve 322 and flow director 323, the internal diameter of described trunnion 324 is less than the internal diameter of described recoil valve tube 321, described trunnion 324 links to each other with recoil gas inlet 313 on the described exhaust valve tube 311 by described recoil valve tube 321 and/or transfer tube 325, the recoil gas described flow director 323 of flowing through successively, switch-valve 322 and trunnion 324 enter in the described exhaust valve tube 311, and the pressure in described exhaust channel 31 and the reaction chamber 30 is compensated and regulates.Certainly, described recoil gas passage 32 also can only comprise described recoil valve tube 321 and trunnion 324, and recoil gas flows in the described recoil valve tube 321 by external flow director 323 and switch-valve 322.
Described pressure switch 33 is connected on the described recoil gas passage 32, specifically be connected on the recoil gas passage 31 of described trunnion 324 near gas source one side of described recoil gas, specifically be connected in the present embodiment on the recoil valve tube 321 of described trunnion 324 near gas source one side of described recoil gas, between described trunnion 324 and switch-valve 322, the pressure in the described recoil valve tube 321 is monitored.
The gas-phase reaction device of present embodiment can also comprise intake channel, and reactant gases enters reaction chamber 30 by described intake channel and reacts, for the main points of the explanation the technical program simplified, among the figure and not shown described intake channel.
Described gas-phase reaction device can be chemical vapor depsotition equipment, low pressure chemical vapor deposition equipment, plasma enhanced chemical vapor deposition equipment or high density plasma CVD equipment.In concrete an application, in the deposition reaction process as zinc-oxide film, reactant gases enters described reaction chamber 30 by intake channel, described switch-valve 322 is opened, recoil gas enters in the exhaust valve tube 311 by flow director 323, switch-valve 322 and trunnion 324 successively, so that the pressure in described exhaust channel 31 and the reaction chamber 30 is regulated, satisfy the required pressure conditions of reaction.Described reactant gases comprises oxygen-containing gas and contain zinc gas, and described oxygen-containing gas is vaporous water or ozone, and the described zinc gas that contains is zinc ethyl (DEZ).Described zinc-oxide film is as the electrode layer of solar cell.Described recoil gas is nitrogen, rare gas element or other non-active gas.
In the present embodiment, described recoil gas passage 32 also comprises transfer tube 325, the internal diameter of described transfer tube 325 is greater than the internal diameter of described trunnion 324, described trunnion 324 or recoil valve tube 321 link to each other with described exhaust channel 31 by described transfer tube 325, concrete, link to each other with the recoil gas inlet 313 of exhaust valve tube 311 in the described exhaust channel 31.Because the bore of described recoil gas inlet 313 is different with the bore of recoil valve tube 321 and trunnion 324, transfer tube 325 can improve the connectivity between them, realizes the switching between the bore.
On the basis of first embodiment, present embodiment has further installed trunnion 324 additional on recoil gas passage 32, because the internal diameter of described trunnion 324 is less than the internal diameter of recoil valve tube 321, therefore, when recoil gas is entered recoil valve tube 321 and is flowed into trunnion 324 by gas source, trunnion 324 forms bottleneck effect, make trunnion 324 near the pressure P3 of gas source one side of recoil gases greater than pressure P4 near exhaust channel 31 1 sides, thereby the by product that reaction produces in the reaction chamber 30 is difficult to enter in the recoil gas passage 32, especially be difficult to enter in the recoil gas passage 32 of trunnion 324 near gas source one side of recoil gas, and the pressure switch 33 of present embodiment is connected gas source one side of described trunnion 324 near recoil gas, thereby can effectively reduce the deposition of by product and adhere to, eliminated the potentially dangerous that pressure switch 33 lost efficacy and causes, and prolonged the work-ing life of pressure switch 33, reduced operation cost.
Need to prove, the internal diameter size of described trunnion 33 is mainly determined according to the flow of recoil gas, guaranteeing that described trunnion 33 has under the prerequisite of suitable conductance, promptly guarantee to realize the difference of the pressure of its both sides by the internal diameter of regulating trunnion 33 under the prerequisite of pressure in the reaction chamber 30 for the required pressure conditions of reaction.In addition, the contriver measures through research and finds that the length of trunnion 33 also can influence the pressure difference of trunnion 33 both sides, and its length is long more, and the difference of the pressure of both sides is big more.
The gas-phase reaction device of present embodiment is a low pressure chemical vapor deposition equipment, the contriver is through research and experiment measuring, experiment condition specifically comprises: envrionment temperature is 20 ℃, the temperature of reaction of the substrate in the reaction chamber 30 is 200 ℃, the volume of reaction chamber 30 is 700L, the gas flow of described intake channel is 4.6slm, the gas flow of described exhaust channel is 8slm, with this understanding, for internal diameter is 200mm, length is the exhaust valve tube 311 of 5m, and internal diameter is 100mm, length is the recoil valve tube 321 of 100mm, when the flow of the recoil gas of the inlet end of recoil gas passage 32 is 2 to 4slm, when also the flow that promptly flows into the recoil gas of a side at the recoil gas of trunnion 324 is 2 to 4slm, selecting internal diameter for use is 15 to 17mm, length is 70 to 90mm trunnion 324, make that described trunnion 324 is 1.36mbar near the pressure P3 of gas source one side of recoil gas, the pressure P4 of described trunnion 324 is 1mbar, under this pressure difference, in the recoil valve tube 321 of the by product that produces in the reaction chamber 30 trunnion 324 more difficult to get access near gas source one side of recoil gas, it is less to make that pressure switch 33 is subjected to the influence of by product, thereby eliminated the potentially dangerous that pressure switch 33 lost efficacy and causes, and prolonged the work-ing life of pressure switch 33, helped cutting operating costs.
With first embodiment similarly be, described trunnion 324 is more bigger than the pressure P4 of close exhaust channel 31 1 sides near the pressure P3 of gas source one side of recoil gas, and pressure switch 33 is to be connected trunnion 324 near gas source one side of recoil gases, therefore make that the pressure in the read-around ratio reaction chamber 30 of pressure switch 33 is bigger, but also can guarantee the supervisory function bit of pressure switch 33, can't cause the problem of failing to report of pressure unusual phenomenon.
Fig. 4 shows the structural representation of the gas-phase reaction device of third embodiment of the invention, comprising: reaction chamber 40; Exhaust channel 41 links to each other with described reaction chamber 40, and described reaction chamber 40 is carried out exhaust; Recoil gas passage 42 links to each other with described exhaust channel 41, and recoil gas flows into described exhaust channel 41 by described recoil gas passage 42, and the pressure in the described reaction chamber 40 is regulated; Pressure switch 43 is connected on the described recoil gas passage 42.
Concrete, described exhaust channel 41 comprises exhaust valve tube 411 and vacuum pump 412, described vacuum pump 412 links to each other by the venting port of exhaust valve tube 411 with described reaction chamber 40, and described reaction chamber 40 is carried out exhaust.
Described recoil gas passage 42 comprises recoil valve tube 421 and is serially connected in trunnion 424 on the described recoil valve tube 421, gas-holder 425, switch-valve 422 and flow director 423, the internal diameter of described trunnion 424 is less than the internal diameter of described recoil valve tube 421, described trunnion 424 links to each other with recoil gas inlet 413 on the described exhaust valve tube 411, described gas-holder 425 is serially connected on the recoil valve tube 421 of described trunnion 424 near gas source one side of recoil gas, the recoil gas described flow director 423 of flowing through successively, switch-valve 422, gas-holder 425 and trunnion 424 enter in the described exhaust valve tube 411, and the pressure in described exhaust channel 41 and the reaction chamber 40 is compensated and regulates.Certainly, described recoil gas passage 42 also can only comprise described recoil valve tube 421, gas-holder 425 and trunnion 424, and recoil gas flows in the described recoil valve tube 421 by external flow director 423 and switch-valve 422.
Described pressure switch 43 specifically is connected on the described gas-holder 425 in the present embodiment, and the pressure in the described gas-holder 425 is monitored.
The gas-phase reaction device of present embodiment can also comprise intake channel, and reactant gases enters reaction chamber 40 by described intake channel and reacts, for the main points of the explanation the technical program simplified, among the figure and not shown described intake channel.
Described gas-phase reaction device can be chemical vapor depsotition equipment, low pressure chemical vapor deposition equipment, plasma enhanced chemical vapor deposition equipment or high density plasma CVD equipment.In one embodiment, in the deposition reaction process as zinc-oxide film, reactant gases enters described reaction chamber 40 by intake channel, described switch-valve 422 is opened, recoil gas enters in the exhaust valve tube 411 by flow director 423, switch-valve 422, gas-holder 425 and trunnion 424 successively, so that the pressure in described exhaust channel 41 and the reaction chamber 40 is regulated, satisfy the required pressure conditions of reaction.Described reactant gases comprises oxygen-containing gas and contain zinc gas, and described oxygen-containing gas is vaporous water or ozone, and the described zinc gas that contains is zinc ethyl (DEZ).Described zinc-oxide film is as the electrode layer of solar cell.Described recoil gas is nitrogen, rare gas element or other non-active gas.
On the basis of second embodiment, present embodiment has further installed gas-holder 425 additional on recoil gas passage 42, described gas-holder 425 is serially connected in gas source one side of trunnion 424 near recoil gas, its volume is bigger, pressure wherein is comparatively stable, and because the bottleneck effect of trunnion 424, further increased pressure P5 in the gas-holder 425 and trunnion 424 pressure P6 near exhaust channel 41 1 sides, and described pressure switch is connected on the described gas-holder 425, thereby the by product that reaction produces in the reaction chamber 40 is difficult to enter in the recoil gas passage 42, especially be difficult to enter in the gas-holder 425, thereby can effectively reduce by product on pressure switch 43 deposition and adhere to, eliminate the potentially dangerous that pressure switch 43 lost efficacy and causes, and prolonged pressure switch 43 work-ing lifes, reduced operation cost.
The gas-phase reaction device of present embodiment is a low pressure chemical vapor deposition equipment, the contriver is through research and experiment measuring, experiment condition specifically comprises: envrionment temperature is 20 ℃, the temperature of reaction of the substrate in the reaction chamber 40 is 200 ℃, the volume of reaction chamber 40 is 700L, the gas flow of described intake channel is 4.6slm, the gas flow of described exhaust channel is 8slm, with this understanding, for internal diameter is 200mm, length is the exhaust valve tube 411 of 5m, and internal diameter is 100mm, length is the recoil valve tube 421 of 100mm, when the flow of the recoil gas of the inlet end of recoil gas passage 42 is 2 to 4slm, when also the flow that promptly flows into the recoil gas of a side at the recoil gas of trunnion 424 is 2 to 4slm, selecting internal diameter for use is 15 to 17mm, length is 70 to 90mm trunnion 424, selecting volume for use is the gas-holder 425 of 1L, make that the pressure P5 in the described gas-holder 425 is 1.36mbar, described trunnion 424 is 1mbar near the pressure P6 of exhaust channel 41 1 sides, under this pressure difference, in the by product gas-holder 425 more difficult to get access that produces in the reaction chamber 40, the influence that the feasible pressure switch 43 that is connected on the described gas-holder 425 is subjected to by product is less, thereby eliminated the potentially dangerous that pressure switch 43 lost efficacy and causes, and prolonged the work-ing life of pressure switch 43, helped cutting operating costs.
To sum up, among first embodiment of the technical program pressure switch is connected on the recoil gas passage, because recoil gas flows into exhaust channel by the recoil gas passage, pressure in the recoil gas passage is more bigger than the pressure in exhaust channel and the reaction chamber, therefore, by product recoil more difficult to get access gas passage under pressure action that reaction produces in the reaction chamber, be beneficial to reduce by product on pressure switch deposition and adhere to, thereby be beneficial to the work-ing life that prolongs pressure switch, eliminated the potential potential safety hazard that lost efficacy and cause owing to pressure switch, and help reducing the replacing frequency of pressure switch, save operation cost.
Further, on the recoil gas passage, installed trunnion additional among second embodiment of the technical program, the internal diameter of described trunnion is less than the internal diameter of the recoil valve tube in the recoil gas passage, make trunnion bigger than the pressure of close exhaust channel one side near the pressure of gas source one side of recoil gas, and with pressure switch be connected trunnion near the recoil gas gas source one side, further increased recoil gas passage that pressure switch connects and the pressure difference between exhaust channel and the reaction chamber, thus be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
Further, the technical program installs additional on the basis of trunnion on the recoil gas passage, gas source one side at the close recoil of described trunnion gas is serially connected with gas-holder, described pressure switch is connected on the described gas-holder, thereby further increase and stablized the pressure difference between described gas-holder and exhaust channel and the reaction chamber, be beneficial to further minimizing reaction by-product on pressure switch deposition and adhere to.
Though the present invention with preferred embodiment openly as above; but it is not to be used for limiting the present invention; any those skilled in the art without departing from the spirit and scope of the present invention; can utilize the method and the technology contents of above-mentioned announcement that technical solution of the present invention is made possible change and modification; therefore; every content that does not break away from technical solution of the present invention; to any simple modification, equivalent variations and modification that above embodiment did, all belong to the protection domain of technical solution of the present invention according to technical spirit of the present invention.
Claims (10)
1. gas-phase reaction device comprises:
Reaction chamber;
Exhaust channel links to each other with described reaction chamber, and described reaction chamber is carried out exhaust;
The recoil gas passage links to each other with described exhaust channel, and recoil gas flows into described exhaust channel by described recoil gas passage, and the pressure of described reaction chamber is regulated;
Pressure switch,
It is characterized in that described pressure switch is connected on the described recoil gas passage.
2. gas-phase reaction device according to claim 1, it is characterized in that, described recoil gas passage comprises the recoil valve tube and is serially connected in trunnion on the described recoil valve tube, the internal diameter of described trunnion is less than the internal diameter of described recoil valve tube, and described pressure switch is connected on the recoil gas passage of described trunnion near gas source one side of described recoil gas.
3. gas-phase reaction device according to claim 2, it is characterized in that, described recoil gas passage also comprises gas-holder, and described gas-holder is serially connected on the recoil valve tube of described trunnion near gas source one side of described recoil gas, and described pressure switch is connected on the described gas-holder.
4. gas-phase reaction device according to claim 3, it is characterized in that, described recoil gas passage also comprises switch-valve and the flow director that is serially connected on the described recoil valve tube, and described recoil gas enters described exhaust channel via described flow director, switch-valve, gas-holder and trunnion successively.
5. according to each described gas-phase reaction device in the claim 2 to 4, it is characterized in that, described recoil gas passage has inlet end, the flow of the recoil gas of described inlet end is 2 to 4slm, the internal diameter 30mm to 200mm of described recoil valve tube, the internal diameter of described exhaust valve tube is 100mm to 200mm, and the internal diameter of described trunnion is 15 to 17mm, and length is 70 to 90mm.
6. gas-phase reaction device according to claim 5 is characterized in that, the flow of the recoil gas of described inlet end is 3slm, the internal diameter of described recoil valve tube is 100mm, the internal diameter of described exhaust valve tube is 200mm, and the internal diameter of described trunnion is 16mm, and length is 80mm.
7. according to each described gas-phase reaction device in the claim 2 to 4, it is characterized in that, described recoil gas passage also comprises transfer tube, and the internal diameter of described transfer tube is greater than the internal diameter of described trunnion, and described trunnion or recoil valve tube link to each other with described exhaust channel by described transfer tube.
8. according to each described gas-phase reaction device in the claim 1 to 4, it is characterized in that described exhaust channel comprises vacuum pump and exhaust valve tube, described vacuum pump links to each other with described reaction chamber by described exhaust valve tube.
9. according to each described gas-phase reaction device in the claim 1 to 4, it is characterized in that described gas-phase reaction device is chemical vapor depsotition equipment, low pressure chemical vapor deposition equipment, plasma enhanced chemical vapor deposition equipment or high density plasma CVD equipment.
10. gas-phase reaction device according to claim 9 is characterized in that, is connected with reactant gases in the described reaction chamber, and described reactant gases comprises oxygen-containing gas and contain zinc gas that described recoil gas is nitrogen, rare gas element or other non-active gas.
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| CN2010105243463A CN102061457B (en) | 2010-10-28 | 2010-10-28 | Gas phase reaction device |
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| CN2010105243463A CN102061457B (en) | 2010-10-28 | 2010-10-28 | Gas phase reaction device |
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| CN102061457B CN102061457B (en) | 2012-10-31 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105202309A (en) * | 2014-06-24 | 2015-12-30 | 北大方正集团有限公司 | Pipeline stirring device and plasma chemical vapor deposition equipment |
| CN107841730A (en) * | 2017-11-23 | 2018-03-27 | 滁州国凯电子科技有限公司 | A kind of method of extension ALD vacuum meter service lifes |
| CN115287636A (en) * | 2022-07-25 | 2022-11-04 | 中国电子科技集团公司第四十八研究所 | LPCVD pressure control system and pressure control method |
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| US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
| CN1401014A (en) * | 2000-02-14 | 2003-03-05 | 株式会社荏原制作所 | Exhaust pipe with reactive by-product adhesion preventing means and method of preventing the adhesion |
| JP2003089877A (en) * | 2001-09-17 | 2003-03-28 | Ebara Corp | Evacuation system |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1401014A (en) * | 2000-02-14 | 2003-03-05 | 株式会社荏原制作所 | Exhaust pipe with reactive by-product adhesion preventing means and method of preventing the adhesion |
| US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
| JP2003089877A (en) * | 2001-09-17 | 2003-03-28 | Ebara Corp | Evacuation system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105202309A (en) * | 2014-06-24 | 2015-12-30 | 北大方正集团有限公司 | Pipeline stirring device and plasma chemical vapor deposition equipment |
| CN107841730A (en) * | 2017-11-23 | 2018-03-27 | 滁州国凯电子科技有限公司 | A kind of method of extension ALD vacuum meter service lifes |
| CN115287636A (en) * | 2022-07-25 | 2022-11-04 | 中国电子科技集团公司第四十八研究所 | LPCVD pressure control system and pressure control method |
| CN115287636B (en) * | 2022-07-25 | 2023-11-24 | 中国电子科技集团公司第四十八研究所 | LPCVD pressure control system and pressure control method |
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| CN102061457B (en) | 2012-10-31 |
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