CN102033265B - 具有热稳定性的梳状滤波器/梳波复用器 - Google Patents
具有热稳定性的梳状滤波器/梳波复用器 Download PDFInfo
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- CN102033265B CN102033265B CN201010534001.6A CN201010534001A CN102033265B CN 102033265 B CN102033265 B CN 102033265B CN 201010534001 A CN201010534001 A CN 201010534001A CN 102033265 B CN102033265 B CN 102033265B
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- 230000003287 optical effect Effects 0.000 claims abstract description 84
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- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 7
- 239000011780 sodium chloride Substances 0.000 claims description 7
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 abstract description 62
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CN201010534001.6A CN102033265B (zh) | 2010-11-05 | 2010-11-05 | 具有热稳定性的梳状滤波器/梳波复用器 |
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CN201010534001.6A CN102033265B (zh) | 2010-11-05 | 2010-11-05 | 具有热稳定性的梳状滤波器/梳波复用器 |
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CN102033265A CN102033265A (zh) | 2011-04-27 |
CN102033265B true CN102033265B (zh) | 2014-12-10 |
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CN201010534001.6A Active CN102033265B (zh) | 2010-11-05 | 2010-11-05 | 具有热稳定性的梳状滤波器/梳波复用器 |
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CN114966906A (zh) * | 2021-02-23 | 2022-08-30 | 中国科学院理化技术研究所 | 用于实现干涉和/或衍射的光学器件 |
CN113365032A (zh) * | 2021-05-28 | 2021-09-07 | 武汉光迅科技股份有限公司 | 一种温度补偿标准具及可调激光器封装结构 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6865318B1 (en) * | 2000-02-23 | 2005-03-08 | Schott Glass Technologies, Inc. | Athermal optical components |
CN1806185A (zh) * | 2003-06-17 | 2006-07-19 | 柯尼卡美能达精密光学株式会社 | 光学元件 |
Family Cites Families (1)
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JP2006123289A (ja) * | 2004-10-28 | 2006-05-18 | Dainippon Printing Co Ltd | ガスバリア性フィルム、並びにこれを用いたカラーフィルタ及びディスプレイ |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6865318B1 (en) * | 2000-02-23 | 2005-03-08 | Schott Glass Technologies, Inc. | Athermal optical components |
CN1806185A (zh) * | 2003-06-17 | 2006-07-19 | 柯尼卡美能达精密光学株式会社 | 光学元件 |
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JP特开2006-123289A 2006.05.18 * |
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CN102033265A (zh) | 2011-04-27 |
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Address after: 430223 innovation and Science Park, East Lake hi tech Development Zone, Wuhan, Hubei, China Applicant after: WUHAN AOXIN TECHNOLOGY Co.,Ltd. Address before: 430223 innovation and Science Park, East Lake hi tech Development Zone, Wuhan, Hubei, China Applicant before: Wuhan Aoxin Technology Co.,Ltd. |
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Address after: 430223 Hubei city of Wuhan province East Lake New Technology Development Zone, the Great Wall Road, Wuhan AoXin Technology Co. Ltd. 1 1-3 layer plant No. 2 Patentee after: Wuhan Aoxin Technology Co.,Ltd. Address before: 430223 innovation and Science Park, East Lake hi tech Development Zone, Wuhan, Hubei, China Patentee before: WUHAN AOXIN TECHNOLOGY Co.,Ltd. |
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Address after: 430223 Great Wall Innovation Science and Technology Park, Donghu New Technology Development Zone, Wuhan City, Hubei Province Patentee after: Jiepu Technology (Wuhan) Co.,Ltd. Country or region after: China Address before: 430223 No.2 workshop, 1-3 floors, building 1, Wuhan AoXin Technology Co., Ltd., changchangyuan Road, Donghu New Technology Development Zone, Wuhan City, Hubei Province Patentee before: Wuhan Aoxin Technology Co.,Ltd. Country or region before: China |