CN101975991A - Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof - Google Patents
Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof Download PDFInfo
- Publication number
- CN101975991A CN101975991A CN 201010298120 CN201010298120A CN101975991A CN 101975991 A CN101975991 A CN 101975991A CN 201010298120 CN201010298120 CN 201010298120 CN 201010298120 A CN201010298120 A CN 201010298120A CN 101975991 A CN101975991 A CN 101975991A
- Authority
- CN
- China
- Prior art keywords
- light beam
- light
- depth
- phase
- bessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses a method for extending focal depth, including that: Bessel-Gauss radial polarized light passes through an annular diaphragm, so as to modulate amplitude and split the light into two light beams; one light beam is subject to 0-Phi phase coding and then are incident into the same optical beam combining device with the other light beam after optical reflex, so as to form a combined coaxial light beam, and then lens focusing is carried out, thus obtaining the extended focal depth spot. The invention also discloses a device for extending focal depth, comprising a light source generating Bessel-Gauss radial polarized light, an annular diaphragm, a beam splitter, a 0/Phi phase plate, an optical reflex device, an optical beam combining device and an apochromatism focusing lens. In the method and device, Bessel-Gauss laser is taken as a work light beam, the focal depth of extended focal spot is more than 8lambda, the focal spot can be less than diffraction limit of system, and light distribution after extending is more uniform, thus being more beneficial to practical application.
Description
Technical field
The present invention relates to photoetching, optical storage and tomography field, be specifically related to a kind of focus method and device of extended focal depth.
Background technology
Extended focal depth launches in succession in the research of applications such as optical disc storage, microscope imaging, optical correction and tomography, wherein based on wavefront coding technology (Wavefront Coding, WFC) be the new technology of the expansion optical system depth of focus that just grows up the nineties, propose in nineteen ninety-five by Dowski and Cathey.The research that obtains extended focal depth by polarization effect in recent years also receives publicity, and report utilizes radial vector light beam, accurate bifocal birefringent lens and glueds joint double lens and wait the research that realizes extended focal depth in succession recently.More than these methods research has extensively and profoundly been carried out in optical shaft orientation extended focal depth aspect, but be to be cost above most methods extended focal depth the time to sacrifice lateral resolution.
Summary of the invention
The invention provides a kind of based on selecting the special light pattern for use, the method and apparatus that Modulation and Amplitude Modulation, position modulation mutually, polarization technology and coherence combine comes the expanding system depth of focus, use the working beam of Bessel-Gauss laser as system, in air dielectric, focused spot after the expansion not only depth of focus can reach more than 8 λ, and beam quality also increases, and focal beam spot can reach below the diffraction limit of system itself, and the light distribution after the expansion is more even, more helps practical application.
A kind of depth of focus extended method that combines with polarization technology and phase board based on Modulation and Amplitude Modulation may further comprise the steps:
(1) working beam Bessel-Gauss radial polarisation light is passed through the lighttight annular diaphragm in centre, light beam is converted into the hollow radial polarized light beam;
(2) the hollow radial polarized light beam described in the step (1) is divided into two bundles by optical splitter, i.e. the first beam split light beam and the second beam split light beam;
(3) the described first beam split light beam is carried out 0/ π phase coding by one 0/ π phase board after, incide an optics bundling device spare;
(4) the described second beam split light beam being undertaken inciding the optics bundling device spare described in the step (3) after light path turns back by the optics device of turning back, is the coaxial beam of closing bundle from the light of described optics bundling device spare outgoing;
(5) coaxial beam of closing bundle that obtains in the step (4) is focused on by the secondary color difference condenser lens that disappears, near the focal plane of lens, obtain an extended focal depth hot spot.
Wherein, described annular diaphragm can realize that the preferred 0.8 times of entrance pupil radius of its lightproof part and the marginal radius of full impregnated part aperture obtains the hollow radial polarized light beam with the mode of photoetching.
Wherein, the ratio of the described first beam split light beam and the second beam split light beam light intensity is 0.53: 0.47.
Wherein, 0/ π phase board can be realized by lithography process or spatial light modulator.0/ π phase board carries out phase coding, the preferred 0.955 times of entrance pupil radius of the interregional marginal radius of its 0/ π bit phase delay to polarized light radially.
The entrance pupil radius is generally the radius size of the incident beam circular section that enters optical system.
Wherein, the described secondary color aplanat that disappears is preferably the secondary color aplanat that disappears of high-NA, and described high-NA is preferably NA=0.95.
The described optics device of turning back is a plane mirror, as required a plurality of plane mirrors can be set.
The present invention also provide a kind of be used to realize above-mentioned based on the special light pattern, Modulation and Amplitude Modulation, the device that the depth of focus that position modulation mutually, polarization combine with coherent technique is expanded comprises:
Be used to produce the light source of Bessel-Gauss radial polarisation light;
Be used for described Bessel-Gauss radial polarisation light is converted to the annular diaphragm of hollow light beam;
The optical splitter that to be used for described hollow light beam beam split be the first beam split light beam and the second beam split light beam;
Be used for the first beam split light beam is carried out 0/ π round and in position phase-plate of 0/ π phase coding;
Be used for the second beam split light beam is carried out optics that light beam the turns back device of turning back, constitute by first catoptron and second catoptron;
Be used for to close the optics bundling device spare of bundle through the second beam split light beam after the first beam split light beam behind the 0/ π phase coding and light beam are turned back;
Be used to carry out the secondary color difference condenser lens that disappears of the high-NA that light beam focuses on.
In apparatus of the present invention, described first catoptron and second scintilloscope are preferably the metal film catoptron, to keep incident light consistent with the reflected light polarization state.
In apparatus of the present invention, the described secondary color aplanat that disappears is preferably the secondary color aplanat that disappears of high-NA, and described high-NA is preferably NA=0.95.
In apparatus of the present invention, in the described annular diaphragm, the marginal radius of aperture of lightproof part and full impregnated part is preferably 0.8 times of entrance pupil radius.
In apparatus of the present invention, in the described 0/ π round and in position phase-plate, the interregional marginal radius of 0/ π bit phase delay is preferably 0.955 times of entrance pupil radius.
Principle of work of the present invention is as follows:
Bessel-Gauss radial polarisation light working beam is by an annular diaphragm, because the Bessel-Gauss zlasing mode is that the center section energy is low, outer portion of energy height so block after intermediate beam only stays peripheral annular part, can better be focused to small light spot and long depth of focus; Afterwards, light beam will further be divided into two bundles, and the two-beam light intensity is a special ratios, wherein a branch of carry out phase coding by 0/ π round and in position phase-plate after, merge into coaxial parallel light beam with another Shu Chongxin.According to the Theory of Electromagnetic Field of light field, the light beam after converging will no longer be common radial polarisation light, and the radial section of light beam will present the complicated Electric Field Distribution situation that has time factor.Such light beam is through behind the secondary color difference condenser lens that disappears of high-NA, to produce focusing effect at the rear focus place of lens, according to the interference of light diffraction theory, the electric-field intensity distribution in the focal beam spot for the radial polarisation light that carries out phase coding through 0/ π phase board through the focousing field behind the same lens with not through the radial polarisation light of phase coding vector addition through the focousing field internal electric field intensity distributions behind the same lens.The focousing field internal electric field distributes and can calculate by the Debye integral formula, and then addition draws the interior electric field intensity of focal beam spot of the excitation beam after converging.According to the electric field intensity of light and the relation of light intensity, the focal beam spot that can calculate this moment will be the solid focal beam spot of overlength depth of focus.
With respect to prior art, the present invention has following beneficial technical effects:
(1) focal beam spot that adopts the inventive method and device to obtain reaches the depth of focus of wavelength more than 8 times in the vertical, and trans D can be compressed to below the diffraction limit of system itself, is much better than prior art focusing level.
(2) focal beam spot longitudinal component (Z is to the component) purity of Chan Shenging has reached more than 85%, is much better than most of prior art, can be used in fields such as scanning near-field microscope, photoetching and optical storage easily.
(3) coherent light of the inventive method use single wavelength has reduced quantity of light source as working beam, has saved system cost, has increased practicality.
(4) the focal beam spot light intensity that adopts the inventive method and device to obtain has plateau effect, and intensity is more even in the vertical, helps practical application.
Description of drawings
Fig. 1 is the device synoptic diagram that is used to realize the depth of focus expansion of the present invention.
Fig. 2 is the synoptic diagram of employed annular diaphragm among the present invention.
Fig. 3 is the synoptic diagram of employed 0/ π phase board among the present invention.
Fig. 4 is the light intensity section comparison diagram when only using Bessel-Gauss radial polarisation light to add the ring light Modulation and Amplitude Modulation; Wherein, (a) being the surface of intensity distribution of xz section upper edge optical axis direction, (b) is the surface of intensity distribution on the optical axis direction of yz section upper edge, (c) is the surface of intensity distribution on the xy section.
Fig. 5 is the focal beam spot section light intensity comparison diagram when using native system (Fig. 1 device); Wherein, (a) being the surface of intensity distribution of xz section upper edge optical axis direction, (b) is the surface of intensity distribution on the optical axis direction of yz section upper edge, (c) is the surface of intensity distribution on the xy section.
Among the figure:
Embodiment
Describe the present invention in detail below in conjunction with drawings and Examples, but the present invention is not limited to this.
A kind of device that is used to realize the depth of focus expansion as shown in Figure 1, comprise: the light source, the annular diaphragm 1 that produce working beam 10, spectroscope 2,0/ π phase board 3, light combination mirror 4, the first catoptrons 5, the second catoptrons 6, the secondary color difference that disappears condenser lens 7, the extended focal depth hot spot that obtains after the focusing appear near the working face 8 of the secondary color difference condenser lens 7 that disappears.
The polarization direction that radial polarisation light is every all is along radial direction, and all polarization directions constitute an angular-spread beam.Wherein the light polarization direction of the every bit in the light beam (at the light polarization direction Px of x axle, at the light polarization direction Py of y axle, at the light polarization direction Pz of z axle) can be represented by following unit matrix:
In the formula,
Angle for position polar coordinates vector and X-axis in the light beam vertical Z axle section.
To be divided into two bundles by beam splitter 2 through the light beam behind the annular diaphragm 1 (light beam 20), the ratio of two-beam (first light beam 30 and second light beam 50) light intensity is 0.53: 0.47.
Wherein stronger a branch of (first light beam 30) carries out phase coding by 0/ π round and in position phase-plate 3, and the light that obtains (light beam 40) reenters and is mapped to light combination mirror 4.
The cardinal principle of 0/ π round and in position phase-plate, 3 phase codings is to make the light beam by it produce different phase delay to reach the purpose of phase coding at diverse location.
Be the horizontal synoptic diagram of 0/ π round and in position phase-plate 3 as shown in Figure 3, the interregional marginal radius of its 0/ π bit phase delay is 0.955 times of entrance pupil radius.The bit phase delay amount Δ α of 3 pairs of incident lights of 0/ π round and in position phase-plate is determined by following formula:
In the formula, R
InnerBe the interregional marginal radius of 0/ π bit phase delay on the phase board plane, r is the distance of the interior arbitrfary point of beam cross section apart from the light beam axis.
Through after the turning back of first catoptron 5 (light that obtains is light beam 60) and second catoptron 6, the light that obtains (light beam 70) reenters and is mapped to light combination mirror 4 the more weak light (second light beam 50) of another bundle successively.First catoptron 5 and second catoptron 6 are for can keep the incident light metal film catoptron consistent with the reflected light polarization characteristic.
From the light (light beam 80) of light combination mirror 4 outgoing is the coaxial collimate in parallel light that closes bundle again.Light beam after this converges (light beam 80) will no longer be common hollow polarized light, and the radial section of light beam will present the complicated Electric Field Distribution situation that has time factor.
After light beam after this converges (light beam 80) passes through the secondary color difference condenser lens 7 that disappears, will be that place, working face 8 positions focuses on the formation focal beam spot at lens focal plane.The secondary color difference that herein disappears condenser lens 7 is selected the high-NA secondary color aplanat that disappears for use, adopts the high-NA microcobjective that 100 of NA=0.95 * the secondary color difference that disappears has flat field correction that disappears.
Near this focal beam spot light beam Electric Field Distribution can be calculated by following formula:
In the formula,
Be to be the cylindrical coordinate of initial point with desirable focal position, C is a normaliztion constant, A
1Be the light distribution parameter of light beam, A
2Be the structural parameters of the secondary color aplanat 7 that disappears, θ is a beam angle, and i is an imaginary unit,
Angle for position polar coordinates vector and X-axis in the light beam vertical Z axle section.Adopt above-mentioned formula can calculate the size of the focal beam spot on the focal plane.Since working beam be the Bessel-Gauss hollow drive to polarized light, therefore calculate and can get focal beam spot vertically being that length can reach more than 8 λ on the z direction of principal axis, can accomplish 9.5 λ in the test, the depth of focus of system has obtained effective expansion.
As seen working beam Bessel-Gauss radial polarisation light (light beam 10) can obtain the solid focal beam spot of overlength depth of focus after by above-mentioned depth of focus expanding unit on working face.
Fig. 4 is the light intensity section comparison diagram that (just among Fig. 1, blocks light path 40, when only allowing light path 70 focus on) when only using Bessel-Gauss radial polarisation light to add the ring light Modulation and Amplitude Modulation; Wherein, (a) being the surface of intensity distribution of xz section upper edge optical axis direction, (b) is the surface of intensity distribution on the optical axis direction of yz section upper edge, (c) is the surface of intensity distribution on the xy section.As can be seen from Figure 4, focal beam spot is that the full width at half maximum length on the z axle is 3.95 λ in the vertical, horizontal full width at half maximum 0.43 λ.
And Fig. 5 is after allowing light beam 40 and light beam 70 close bundle, improves depth of focus and the horizontal spot size of compression by the twin-beam coherence effect.Wherein, (a) being the surface of intensity distribution of xz section upper edge optical axis direction, (b) is the surface of intensity distribution on the optical axis direction of yz section upper edge, (c) is the surface of intensity distribution on the xy section.As can be seen from Figure 5, focal beam spot is that the full width at half maximum length on the z axle is the overlength depth of focus of＞8 λ (actual can reach 9.5 λ) in the vertical, and horizontal full width at half maximum further is compressed to 0.4 λ.Except above-mentioned advantage, it can also be seen that by Fig. 5, the hot spot light intensity presents the flat-top distribution behind extended focal depth, intensity is more even in the vertical, and the solid focal beam spot of this overlength depth of focus is highly suitable for semiconductor and microelectronic applications field, can be used as litho machine laser ablation device, CD burning and reads the light path design scheme of laser head.Be indifferent under the situation of longitudinal frame, can be used as the design proposal of computed tomography scanning imaging.
Claims (10)
1. a depth of focus extended method is characterized in that, may further comprise the steps:
(1) working beam Bessel-Gauss radial polarisation light is passed through the lighttight annular diaphragm in centre, light beam is converted into the hollow radial polarized light beam;
(2) the hollow radial polarized light beam described in the step (1) is divided into two bundles by optical splitter, i.e. the first beam split light beam and the second beam split light beam;
(3) the described first beam split light beam is carried out 0/ π phase coding by one 0/ π phase board after, incide an optics bundling device spare;
(4) the described second beam split light beam being undertaken inciding the optics bundling device spare described in the step (3) after light path turns back by the optics device of turning back, is the coaxial beam of closing bundle from the light of described optics bundling device spare outgoing;
(5) coaxial beam of closing bundle that obtains in the step (4) the secondary color difference condenser lens that disappears by high-NA is focused on, near the focal plane of lens, obtain an extended focal depth hot spot.
2. depth of focus extended method as claimed in claim 1 is characterized in that, the ratio of the described first beam split light beam and the second beam split light beam light intensity is 0.53: 0.47.
3. depth of focus extended method as claimed in claim 1 is characterized in that, in the described annular diaphragm, the marginal radius of aperture of lightproof part and full impregnated part is 0.8 times of entrance pupil radius.
4. depth of focus extended method as claimed in claim 1 is characterized in that, in the described 0/ π phase board, the interregional marginal radius of 0/ π bit phase delay is 0.955 times of entrance pupil radius.
5. depth of focus extended method as claimed in claim 1 is characterized in that, described high-NA is NA=0.95.
6. a device that is used to realize the depth of focus expansion is characterized in that, comprising:
Be used to produce the light source of Bessel-Gauss radial polarisation light;
Be used for described Bessel-Gauss radial polarisation light is converted to the annular diaphragm of hollow light beam;
The optical splitter that to be used for described hollow light beam beam split be the first beam split light beam and the second beam split light beam;
Be used for the first beam split light beam is carried out 0/ π round and in position phase-plate of 0/ π phase coding;
Be used for the second beam split light beam is carried out optics that light beam the turns back device of turning back, constitute by first catoptron and second catoptron;
Be used for will be behind 0/ π phase coding the first beam split light beam and the second beam split light beam after light beam is turned back close the optics bundling device spare of bundle;
Be used to carry out the secondary color difference condenser lens that disappears of the high-NA that light beam focuses on.
7. device as claimed in claim 6 is characterized in that, described first catoptron and second scintilloscope are the metal film catoptron.
8. device as claimed in claim 6 is characterized in that, described high-NA is NA=0.95.
9. device as claimed in claim 6 is characterized in that, in the described annular diaphragm, the marginal radius of aperture of lightproof part and full impregnated part is 0.8 times of entrance pupil radius.
10. device as claimed in claim 6 is characterized in that, in the described 0/ π round and in position phase-plate, the interregional marginal radius of 0/ π bit phase delay is 0.955 times of entrance pupil radius.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102981206A CN101975991B (en) | 2010-09-30 | 2010-09-30 | Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010102981206A CN101975991B (en) | 2010-09-30 | 2010-09-30 | Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101975991A true CN101975991A (en) | 2011-02-16 |
| CN101975991B CN101975991B (en) | 2012-05-23 |
Family
ID=43575888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102981206A Expired - Fee Related CN101975991B (en) | 2010-09-30 | 2010-09-30 | Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101975991B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102830102A (en) * | 2012-08-21 | 2012-12-19 | 浙江大学 | Method and device for hollow focused light spot excitation-based confocal microscopy |
| CN103503434A (en) * | 2011-12-16 | 2014-01-08 | 奥林巴斯医疗株式会社 | Depth expansion device |
| CN106991249A (en) * | 2017-04-25 | 2017-07-28 | 中国民航大学 | A kind of optical fiber order vectors mould transverse intensity distribution of light beam evaluation method |
| CN108594444A (en) * | 2018-03-28 | 2018-09-28 | 浙江师范大学 | The method for generating Mathieu light beams based on film amplitude modulation and axicon lens phase-modulation |
| CN111307067A (en) * | 2020-03-30 | 2020-06-19 | 深圳大学 | Optical measuring system |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6721258B1 (en) * | 1999-06-21 | 2004-04-13 | Citizen Watch Co., Ltd. | Optical device for super-resolution |
| US20080007730A1 (en) * | 2006-05-31 | 2008-01-10 | Michael Kempe | Microscope with higher resolution and method for increasing same |
| CN101178485A (en) * | 2007-12-07 | 2008-05-14 | 南京航空航天大学 | Electric-controlled focal shift ultra-resolved iris filter |
| CN101469972A (en) * | 2008-09-08 | 2009-07-01 | 哈尔滨工业大学 | Long-focus depth super-resolution secondary confocal measuring apparatus |
| CN101769821A (en) * | 2010-02-04 | 2010-07-07 | 北京理工大学 | Lens refractive index and thickness measuring method and device based on differential confocal technology |
-
2010
- 2010-09-30 CN CN2010102981206A patent/CN101975991B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6721258B1 (en) * | 1999-06-21 | 2004-04-13 | Citizen Watch Co., Ltd. | Optical device for super-resolution |
| US20080007730A1 (en) * | 2006-05-31 | 2008-01-10 | Michael Kempe | Microscope with higher resolution and method for increasing same |
| CN101178485A (en) * | 2007-12-07 | 2008-05-14 | 南京航空航天大学 | Electric-controlled focal shift ultra-resolved iris filter |
| CN101469972A (en) * | 2008-09-08 | 2009-07-01 | 哈尔滨工业大学 | Long-focus depth super-resolution secondary confocal measuring apparatus |
| CN101769821A (en) * | 2010-02-04 | 2010-07-07 | 北京理工大学 | Lens refractive index and thickness measuring method and device based on differential confocal technology |
Non-Patent Citations (3)
| Title |
|---|
| 《光学学报》 20060630 王吉明等 电控径向双折射滤波器的横向超分辨与轴向扩展焦深 第26卷, 第6期 2 * |
| 《光学学报》 20100531 谢翊乐等 电控振幅型超分辨光瞳滤波器的调谐特性分析 第30卷, 第5期 2 * |
| 《物理学报》 20080131 云茂金等 可调谐位相型光瞳滤波器的横向光学超分辨和轴向扩展焦深 第57卷, 第1期 2 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103503434A (en) * | 2011-12-16 | 2014-01-08 | 奥林巴斯医疗株式会社 | Depth expansion device |
| CN103503434B (en) * | 2011-12-16 | 2016-09-28 | 奥林巴斯株式会社 | Depth expansion device |
| CN102830102A (en) * | 2012-08-21 | 2012-12-19 | 浙江大学 | Method and device for hollow focused light spot excitation-based confocal microscopy |
| CN102830102B (en) * | 2012-08-21 | 2015-03-18 | 浙江大学 | Method and device for hollow focused light spot excitation-based confocal microscopy |
| CN106991249A (en) * | 2017-04-25 | 2017-07-28 | 中国民航大学 | A kind of optical fiber order vectors mould transverse intensity distribution of light beam evaluation method |
| CN108594444A (en) * | 2018-03-28 | 2018-09-28 | 浙江师范大学 | The method for generating Mathieu light beams based on film amplitude modulation and axicon lens phase-modulation |
| CN111307067A (en) * | 2020-03-30 | 2020-06-19 | 深圳大学 | Optical measuring system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101975991B (en) | 2012-05-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107941763B (en) | Coaxial three-dimensional stimulated radiation loss super-resolution microscopic imaging method and device | |
| CN101975991B (en) | Method for extending focal depth based on amplitude modulation, polarization and phase modulation and device thereof | |
| CN103257130B (en) | Stimulated radiation loss micro imaging system | |
| CN106735875A (en) | A kind of laser flexible micro-machining system and method based on LCD space light modulator | |
| CN104111590B (en) | Based on the laser direct-writing device of combined vortex bivalve focal beam spot | |
| TW201012579A (en) | Adaptive optic beamshaping in laser processing systems | |
| CN105929560A (en) | Broadband far field super-resolution imaging apparatus | |
| CN111856892A (en) | Parallel super-resolution three-dimensional direct writing device | |
| CN109283673B (en) | Device and method for realizing three-dimensional controllability of optical focal field spin direction | |
| CN106980174A (en) | A kind of comprehensive fluorescence super-resolution microscopic imaging device | |
| CN201518072U (en) | Multi-focus regulating and controlling system | |
| CN111879234B (en) | Three-dimensional sub-ten nanometer positioning method and device based on polarization modulation hollow light spot illumination | |
| CN109709683B (en) | Device and method for generating space diffraction invariant square array vector light beam by using two-dimensional grating | |
| CN107966110A (en) | A kind of bimodal Digital holographic microscopy device | |
| CN111007587A (en) | Full-medium broadband polarization and phase control super-surface and far-field super-resolution focusing device | |
| CN101504490A (en) | Ring-shaped vector light beam focusing system | |
| JP2021043295A (en) | Polarizing diffractive element and vector beam mode detection system using the same | |
| CN113703170B (en) | Novel three-dimensional hollow light field generation method and device | |
| CN101975992B (en) | Focal-depth expanding method and device based on phase and polarization | |
| He et al. | Vectorial adaptive optics: correction of polarization and phase | |
| CN101246257A (en) | Radial cosine phase type axial multi-focus regulation system | |
| CN112286015A (en) | Two-photon laser printing device based on columnar vector polarized light beam modulation | |
| CN217122085U (en) | Laser welding system for generating multi-focus adjustable ring light spots | |
| CN114019765B (en) | Common-path phase modulation laser direct writing method and device based on edge light suppression | |
| CN105242404A (en) | Method for the generation of local hollow light beam on the basis of apodization zone plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120523 Termination date: 20120930 |