CN101974962A - Production method of photovoltaic roof tiles - Google Patents

Production method of photovoltaic roof tiles Download PDF

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Publication number
CN101974962A
CN101974962A CN2010102934031A CN201010293403A CN101974962A CN 101974962 A CN101974962 A CN 101974962A CN 2010102934031 A CN2010102934031 A CN 2010102934031A CN 201010293403 A CN201010293403 A CN 201010293403A CN 101974962 A CN101974962 A CN 101974962A
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time
silicon cell
lamination
semiproduct
seconds
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CN2010102934031A
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CN101974962B (en
Inventor
王琰琨
陈兵斌
邹宏战
王帅
马超
张钰亮
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Zhejiang Beisheng Green Energy Technology Co., Ltd
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ZHEJIANG TRUNSUN SOLAR CO Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B10/00Integration of renewable energy sources in buildings
    • Y02B10/10Photovoltaic [PV]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention relates to a production method of photovoltaic roof tiles, which comprises the following steps: laminating in twice, and simultaneously stacking in twice, wherein in the primary laminating, products are initially evacuated, silicon cell chips are initially positioned, and package sealing compounds are initially hot melted and crosslinked; and a second layer of package sealing compounds is laid after the temperature is reduced to room temperature, and the secondary laminating is carried out after a glass covering plate is placed on the package sealing compounds. The invention has two-time laminating technology so as to effectively control the offset of the silicon cell chips in the laminating process, extremely improve the arrangement accuracy of cell units, and extremely reduce fracture of tile type back pieces and the silicon cell chips; optimized technology parameters ensure the optimum crosslinking extent of the package sealing compounds, and ensure the ultraviolet and aging resistant performance of the products to the full extent; and simultaneously, the optimized technology parameters are greatly reduced so as to basically avoid bubbles remained in the products.

Description

The photovoltaic roof tile production method
Technical field
The present invention relates to a kind of production method of solar module, relate in particular to the production method of photovoltaic roof tile.
Background technology
Solar energy has advantages such as cleaning, environmental protection as a kind of regenerative resource, in today that environment goes from bad to worse, solar energy is employed more and more, and photoelectric technology becomes important generating means just gradually as a kind of mode preferably of solar energy utilization.Existing solar photoelectric assembly adopts metal shell mostly, and be installed on metallic support or the timbering, because the characteristic of metal, easily oxidation, not corrosion-resistant, cause the life-span of solar photoelectric assembly not long, application number (201020216673.8) discloses a kind of photovoltaic roof tile, the tile type backing that adopts is made by pottery or macromolecular material, and the life-span is much higher than metal.
Photovoltaic roof tile is because the material of backing is different with traditional solar components, if adopt traditional production technology, the tile type backing very easily breaks, and causes waste product, and yield rate is not high.
Summary of the invention
The present invention provides a kind of yield rate high photovoltaic roof tile production method for solving the prior art problem.
Technical scheme of the present invention is: the photovoltaic roof tile production method is characterized in that: step is as follows:
A, monolithic welding: the negative pole that an end of the interconnecting strip of electroplating surfaces with tin is welded in silicon cell;
B, string sheet welding: the welding of string sheet: get the silicon cell that two or multi-disc are welded with interconnecting strip, the positive pole welding of a slice silicon cell is gone up interconnecting strip as first, and the interconnecting strip other end of silicon cell negative pole is welded in the positive pole of adjacent silicon cell, form the silicon cell string; Get two or go here and there the silicon cell string, the interconnecting strip of the negative pole of the positive pole of first silicon cell and cauda silicon cell is welded in busbar respectively, forms the silicon cell group more;
C, preliminary lamination: on platform, lay the tile type backing, in the tile type backing, lay the sealing of first floor capsule, in the sealing of first floor capsule, place the silicon cell group, make semiproduct one time;
D, a lamination: semiproduct are put into laminating machine, carry out the lamination first time, make silicon cell group and tile type backing relative fixed, form the secondary semiproduct;
E, lamination once more: the secondary semiproduct are transferred on the platform, and the sealing of laying second layer capsule is placed glass cover-plate in the sealing of second layer capsule in the tile type backing, above the silicon cell group, makes semiproduct three times;
F, lamination once more: three semiproduct are carried out the lamination second time, make glass cover-plate and tile type backing relative fixed, form the lamination semiproduct;
G, wiring: behind the tile type backing, junction box is installed,, and is electrically connected, make finished product with the power line of junction box with the lead thereto behind four semiproduct.
Laminating technology is the physics of a complexity, and chemical change process treats in the lamination cavity that the structure of laminate material and size can produce material impact to the lamination result, and inappropriate laminating technology very easily causes the product fragmentation, even damage equipment; The structure of tile type backing and size cause photovoltaic roof tile can't adopt common laminating technology to carry out lamination, and the present invention carries out lamination at twice, carry out simultaneously lamination at twice, lamination can make product tentatively find time for the first time, silicon cell Primary Location, the preliminary hot melt of capsule sealing, crosslinked; Room temperature to be reduced to re-lays the sealing of second layer capsule, places glass cover-plate on it again, carries out the lamination second time; Need in the lamination process product is heated, and silicon cell and tile type backing, the rate of the expanding with heat and contract with cold difference of materials such as glass cover-plate, tile type backing in the process of heating after the installation, glass cover-plate and silicon cell relative fixed, can produce big stress mutually between these hard materials, the material of these materials is all more crisp, being subjected to stress very easily breaks, lamination carries out at twice, for the first time in the tile type backing capsule sealing and silion cell group only are installed during lamination, the capsule sealing after-tack of heating, can not produce bigger stress to tile type backing and silicon cell, tile type backing and silicon cell are difficult for breaking, for the second time before the lamination, capsule sealing in the secondary semiproduct is solidified fully and cool off, and the silion cell assembly is fixed in the tile type backing, and the second time is during lamination, the capsule sealing and the new capsule sealing that is positioned at the glass cover-plate below of laying of solidifying cooling have certain buffer protection function, protect these materials can not break; And in the lamination process, silicon cell only has one side stressed each time, is difficult for moving, and the technology of twice lamination can effectively reduce the displacement of silicon cell in the lamination process, improves the arrangement precision of battery unit greatly.
As preferably, among the step b, the unit for electrical property parameters gap of silicon cell is in 5%.
As preferably, the parameter of lamination use for the first time is as follows respectively in the steps d: 100~150 degrees centigrade of heating-up temperatures, 80~120 seconds pumpdown times, pressurization time-delay 15~30 seconds, 10~25 seconds pressing times of the first time, the process point pressure value-60 of the pressurization first time~-100Kpa, 5~13 seconds pressing times of the second time, the process point pressure value-50 of the pressurization second time~-95Kpa, 10~25 seconds pressing times for the third time, for the third time Jia Ya process point pressure value-45~-80Kpa, 90~120 seconds pressing times.
As preferably, the parameter of lamination use is as follows respectively once more among the step f: 95~150 degrees centigrade of heating-up temperatures, 100~150 seconds pumpdown times, pressurization time-delay 15~30 seconds, 10~25 seconds pressing times of the first time, the process point pressure value-60 of the pressurization first time~-100Kpa, 5~13 seconds pressing times of the second time, the process point pressure value-50 of the pressurization second time~-95Kpa, 10~25 seconds pressing times for the third time, for the third time Jia Ya process point pressure value-45~-80Kpa, 190~230 seconds pressing times.
Laminating temperature, pumpdown time, evacuation rate, pressing time, technological parameters such as moulding pressure have determined the quality of product, and different technological parameters can cause the difference of capsule sealing crosslinking degree, thereby cause the difference of capsule sealing ultraviolet-resistant aging performance, so that influence the terminal life of product; Inappropriate technological parameter easily causes the product inside bubble that bleeds, the air in the bubble with crosslinked after capsule sealing meeting chemically reactive, produce more gas, in case so bubble appears in the product, then bubble can slowly become greatly along with the time, so that product rejection; The technological parameter of rationally setting and cooperatively interacting can guarantee the yield rate height of product, effectively reduces the bubble probability of occurrence.
As preferably, among the step e, the secondary semiproduct carry out once more must being cooled to room temperature before the lamination, and keep static before being cooled to room temperature.The temperature of secondary semiproduct when finishing lamination for the first time is higher, and does not have the upper cover plate protection, therefore must keep original position motionless, a large amount of bubbles occur in the finished product and scraps otherwise can cause, even produce sliver.
As preferably, among the step e, glass cover-plate must cover the silion cell group fully, and the Edge Distance of the edge of glass cover-plate and silion cell group is 10~30mm.Glass cover-plate must cover the silion cell group fully, to protect silicon cell in the outdoor application process; If the edge of silion cell group and the Edge Distance of glass cover-plate be less than 10mm, the silion cell group is subject to big stress and causes and break in the lamination process; If but the Edge Distance of the edge of silion cell group and glass cover-plate is excessive, then the effective area of photovoltaic roof tile is less, and the finished product generating efficiency is low.
As preferably, described tile type backboard adopts pottery or macromolecular material to make.
In sum, the present invention has the following advantages:
1, twice laminating technology controlled the displacement of silicon cell in the lamination process effectively, greatly improves the arrangement precision of battery unit, greatly reduces tile type backing and silicon cell and breaks;
2, optimized parameters has guaranteed the best crosslinking degree of capsule sealing, at utmost guarantees the anti-ultraviolet and the ageing properties of product;
3, optimized parameters significantly reduces so that avoids the residual of bubble in the product substantially.
The specific embodiment
The invention will be further described with embodiment below.
Embodiment one:
The photovoltaic roof tile production method, step is as follows:
A, the sorting of battery sheet: select the unit for electrical property parameters gap 1% with interior a collection of silicon cell, and battery sheet surface flawless;
B, monolithic welding: the negative pole that an end of the interconnecting strip of electroplating surfaces with tin is welded in silicon cell;
C, the welding of string sheet, get the silicon cell that multi-disc is welded with interconnecting strip, the other end of interconnecting strip is welded in the positive pole of adjacent silicon cell, form the silicon cell string, get many string silicon cell strings, the interconnecting strip of welding on the negative pole of the positive pole of first silicon cell and cauda silicon cell is welded in busbar respectively, forms the silicon cell group;
D, preliminary lamination: on the lamination platform, tile type backing in the laying is laid the sealing of first floor capsule in the tile type backing, place the silicon cell group in the sealing of first floor capsule, and with silicon cell group location, makes semiproduct one time;
E, a lamination: semiproduct are put into laminating machine, parameter is provided with as follows: 100 degrees centigrade of heating-up temperatures, 80 seconds pumpdown times, pressurization time-delay 15 seconds, 10 seconds pressing times of the first time, the process point pressure value-60Kpa of the pressurization first time, 5 seconds pressing times of the second time, the process point pressure value-50Kpa of the pressurization second time, 10 seconds pressing times, Jia Ya process point pressure value-45Kpa for the third time for the third time, 90 seconds pressing times, carry out the lamination first time, make silion cell group and tile type backing relative fixed, form the secondary semiproduct;
F, lamination once more: after treating that the secondary semiproduct stay in original position and are cooled to 25 degrees centigrade of room temperatures fully, the secondary semiproduct are transferred on the lamination platform, laying second layer capsule sealing in the tile type backing, above the silion cell group, in the sealing of second layer capsule, place the upper glass cover plate, the Edge Distance 15mm of the edge of glass cover-plate and silion cell group makes semiproduct three times;
G, lamination once more: three semiproduct are put into laminating machine, parameter is provided with as follows: 95 degrees centigrade of heating-up temperatures, 100 seconds pumpdown times, pressurization time-delay 15 seconds, 10 seconds pressing times of the first time, the process point pressure value-60Kpa of the pressurization first time, 5 seconds pressing times of the second time, the process point pressure value-50Kpa of the pressurization second time, 10 seconds pressing times, Jia Ya process point pressure value-45Kpa for the third time for the third time, 190 seconds pressing times, carry out the lamination second time, make glass cover-plate and tile type backing relative fixed, form the lamination semiproduct;
H, deburring and cleaning: the capsule sealing excision that will overflow from glass cover-plate and tile type backing edge is also handled cleaning, coats anti-aging fluid sealant, and product surface is cleaned up, and makes semiproduct four times;
I, wiring: behind the tile type backing, junction box is installed,, and is electrically connected, make finished product with the power line of junction box with the lead thereto behind four semiproduct;
J, detection: finished product is carried out outward appearance and electrical property detection, and to detecting underproof doing over again, it is qualified to detect, and becomes certified products;
K, deciding grade and level packing: the result according to electrical property detects, carry out classification to product, packing back warehouse-in.
Embodiment two:
The photovoltaic roof tile production method, step is as follows:
A, the sorting of battery sheet: select the unit for electrical property parameters gap 5% with interior a collection of silicon cell, and battery sheet surface flawless;
B, monolithic welding: the negative pole that an end of the interconnecting strip of electroplating surfaces with tin is welded in silicon cell;
C, the welding of string sheet, get the silicon cell that multi-disc is welded with interconnecting strip, the other end of interconnecting strip is welded in the positive pole of adjacent silicon cell, form the silicon cell string, get many string silicon cell strings, the interconnecting strip of welding on the negative pole of the positive pole of first silicon cell and cauda silicon cell is welded in busbar respectively, forms the silicon cell group;
D, preliminary lamination: on the lamination platform, tile type backing in the laying is laid the sealing of first floor capsule in the tile type backing, place the silicon cell group in the sealing of first floor capsule, and with silicon cell group location, makes semiproduct one time;
E, a lamination: semiproduct are put into laminating machine, parameter is provided with as follows: 150 degrees centigrade of heating-up temperatures, 120 seconds pumpdown times, pressurization time-delay 30 seconds, 25 seconds pressing times of the first time, the process point pressure value-100Kpa of the pressurization first time, 13 seconds pressing times of the second time, the process point pressure value-95Kpa of the pressurization second time, 25 seconds pressing times, Jia Ya process point pressure value-80Kpa for the third time for the third time, 120 seconds pressing times, carry out the lamination first time, make silion cell group and tile type backing relative fixed, form the secondary semiproduct;
F, lamination once more: after treating that the secondary semiproduct stay in original position and are cooled to 25 degrees centigrade of room temperatures fully, the secondary semiproduct are transferred on the lamination platform, laying second layer capsule sealing in the tile type backing, above the silion cell group, in the sealing of second layer capsule, place the upper glass cover plate, the Edge Distance 35mm of the edge of glass cover-plate and silion cell group makes semiproduct three times;
G, lamination once more: three semiproduct are put into laminating machine, parameter is provided with as follows: 150 degrees centigrade of heating-up temperatures, 150 seconds pumpdown times, pressurization time-delay 30 seconds, 25 seconds pressing times of the first time, the process point pressure value-100Kpa of the pressurization first time, 13 seconds pressing times of the second time, the process point pressure value-95Kpa of the pressurization second time, 25 seconds pressing times, Jia Ya process point pressure value-80Kpa for the third time for the third time, 230 seconds pressing times, carry out the lamination second time, make glass cover-plate and tile type backing relative fixed, form the lamination semiproduct;
H, deburring and cleaning: the capsule sealing excision that will overflow from glass cover-plate and tile type backing edge is also handled cleaning, coats anti-aging fluid sealant, and product surface is cleaned up, and makes semiproduct four times;
I, wiring: behind the tile type backing, junction box is installed,, and is electrically connected, make finished product with the power line of junction box with the lead thereto behind four semiproduct;
J, detection: finished product is carried out outward appearance and electrical property detection, and to detecting underproof doing over again, it is qualified to detect, and becomes certified products;
K, deciding grade and level packing: the result according to electrical property detects, carry out classification to product, packing back warehouse-in.
Embodiment three:
The photovoltaic roof tile production method, step is as follows:
A, the sorting of battery sheet: select the unit for electrical property parameters gap 3% with interior a collection of silicon cell, and battery sheet surface flawless;
B, monolithic welding: the negative pole that an end of the interconnecting strip of electroplating surfaces with tin is welded in silicon cell;
C, the welding of string sheet, get the silicon cell that multi-disc is welded with interconnecting strip, the other end of interconnecting strip is welded in the positive pole of adjacent silicon cell, form the silicon cell string, get many string silicon cell strings, the interconnecting strip of welding on the negative pole of the positive pole of first silicon cell and cauda silicon cell is welded in busbar respectively, forms the silicon cell group;
D, preliminary lamination: on the lamination platform, tile type backing in the laying is laid the sealing of first floor capsule in the tile type backing, place the silicon cell group in the sealing of first floor capsule, and with silicon cell group location, makes semiproduct one time;
E, a lamination: semiproduct are put into laminating machine, parameter is provided with as follows: 120 degrees centigrade of heating-up temperatures, 10 seconds pumpdown times, pressurization time-delay 20 seconds, 20 seconds pressing times of the first time, the process point pressure value-750Kpa of the pressurization first time, 10 seconds pressing times of the second time, the process point pressure value-70Kpa of the pressurization second time, 15 seconds pressing times, Jia Ya process point pressure value-60Kpa for the third time for the third time, 105 seconds pressing times, carry out the lamination first time, make silion cell group and tile type backing relative fixed, form the secondary semiproduct;
F, lamination once more: after treating that the secondary semiproduct stay in original position and are cooled to 25 degrees centigrade of room temperatures fully, the secondary semiproduct are transferred on the lamination platform, laying second layer capsule sealing in the tile type backing, above the silion cell group, in the sealing of second layer capsule, place the upper glass cover plate, the Edge Distance 35mm of the edge of glass cover-plate and silion cell group makes semiproduct three times;
G, lamination once more: three semiproduct are put into laminating machine, parameter is provided with as follows: 120 degrees centigrade of heating-up temperatures, 130 seconds pumpdown times, pressurization time-delay 25 seconds, 20 seconds pressing times of the first time, the process point pressure value-80Kpa of the pressurization first time, 8 seconds pressing times of the second time, the process point pressure value-70Kpa of the pressurization second time, 15 seconds pressing times, Jia Ya process point pressure value-55Kpa for the third time for the third time, 210 seconds pressing times, carry out the lamination second time, make glass cover-plate and tile type backing relative fixed, form the lamination semiproduct;
H, deburring and cleaning: the capsule sealing excision that will overflow from glass cover-plate and tile type backing edge is also handled cleaning, coats anti-aging fluid sealant, and product surface is cleaned up, and makes semiproduct four times;
I, wiring: behind the tile type backing, junction box is installed,, and is electrically connected, make finished product with the power line of junction box with the lead thereto behind four semiproduct;
J, detection: finished product is carried out outward appearance and electrical property detection, and to detecting underproof doing over again, it is qualified to detect, and becomes certified products;
K, deciding grade and level packing: the result according to electrical property detects, carry out classification to product, packing back warehouse-in.

Claims (7)

1. photovoltaic roof tile production method, it is characterized in that: step is as follows:
A, monolithic welding: the negative pole that an end of the interconnecting strip of electroplating surfaces with tin is welded in silicon cell;
B, string sheet welding: get the silicon cell that two or multi-disc are welded with interconnecting strip, the positive pole welding of a slice silicon cell is gone up interconnecting strip as first, and the interconnecting strip other end of silicon cell negative pole is welded in the positive pole of adjacent silicon cell, form the silicon cell string; Get two or go here and there the silicon cell string, the interconnecting strip of the negative pole of the positive pole of first silicon cell and cauda silicon cell is welded in busbar respectively, forms the silicon cell group more;
C, preliminary lamination: on platform, lay the tile type backing, in the tile type backing, lay the sealing of first floor capsule, in the sealing of first floor capsule, place the silicon cell group, make semiproduct one time;
D, a lamination: semiproduct are put into laminating machine, carry out the lamination first time, form the secondary semiproduct;
E, lamination once more: the secondary semiproduct are transferred on the platform, and the sealing of laying second layer capsule is placed glass cover-plate in the sealing of second layer capsule in the tile type backing, above the silicon cell group, makes semiproduct three times;
F, lamination once more: three semiproduct are carried out the lamination second time, make glass cover-plate and tile type backing relative fixed, form the lamination semiproduct;
G, wiring: behind the tile type backing, junction box is installed,, and is electrically connected, make finished product with the power line of junction box with the lead thereto behind four semiproduct.
2. according to the described photovoltaic roof tile production method of claim 1, it is characterized in that: among the step b, the unit for electrical property parameters gap of silicon cell is in 5%.
3. according to claim 1 or 2 described photovoltaic roof tile production methods, it is characterized in that: the parameter of lamination use for the first time is as follows respectively in the steps d: 100~150 degrees centigrade of heating-up temperatures, 80~120 seconds pumpdown times, pressurization time-delay 15~30 seconds, 10~25 seconds pressing times of the first time, the process point pressure value-60 of the pressurization first time~-100Kpa, 5~13 seconds pressing times of the second time, the process point pressure value-50 of the pressurization second time~-95Kpa, 10~25 seconds pressing times for the third time, for the third time Jia Ya process point pressure value-45~-80Kpa, 90~120 seconds pressing times.
4. according to claim 1 or 2 described photovoltaic roof tile production methods, it is characterized in that: the parameter of lamination use is as follows respectively once more among the step f: 95~150 degrees centigrade of heating-up temperatures, 100~150 seconds pumpdown times, pressurization time-delay 15~30 seconds, 10~25 seconds pressing times of the first time, the process point pressure value-60 of the pressurization first time~-100Kpa, 5~13 seconds pressing times of the second time, the process point pressure value-50 of the pressurization second time~-95Kpa, 10~25 seconds pressing times for the third time, for the third time Jia Ya process point pressure value-45~-80Kpa, 190~230 seconds pressing times.
5. according to the described photovoltaic roof tile production method of claim 1, it is characterized in that: among the step e, the secondary semiproduct carry out once more must being cooled to room temperature before the lamination, and keep static before being cooled to room temperature.
6. according to claim 1 or 5 described photovoltaic roof tile production methods, it is characterized in that: among the step e, glass cover-plate must cover the silion cell group fully, and the Edge Distance of the edge of glass cover-plate and silion cell group is 10~30mm.
7. according to the described photovoltaic roof tile production method of claim 1, it is characterized in that: described tile type backboard adopts pottery or macromolecular material to make.
CN2010102934031A 2010-09-27 2010-09-27 Production method of photovoltaic roof tiles Active CN101974962B (en)

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CN104779324A (en) * 2015-04-27 2015-07-15 沙嫣 Two-faced glass crystalline silicon solar cell series group packaging method
CN106374004A (en) * 2016-12-05 2017-02-01 苏州融硅新能源科技有限公司 Solar flexible assembly and lamination technology thereof
CN108321230A (en) * 2018-03-26 2018-07-24 浙江尚越新能源开发有限公司 A kind of resistance to hot spot photovoltaic double-glass assembly
CN108538942A (en) * 2018-04-13 2018-09-14 广东汉能薄膜太阳能有限公司 A kind of production method of power generation tile
CN108807580A (en) * 2018-06-14 2018-11-13 北京汉能光伏投资有限公司 A kind of electrification component forming method

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104779324A (en) * 2015-04-27 2015-07-15 沙嫣 Two-faced glass crystalline silicon solar cell series group packaging method
CN106374004A (en) * 2016-12-05 2017-02-01 苏州融硅新能源科技有限公司 Solar flexible assembly and lamination technology thereof
CN108321230A (en) * 2018-03-26 2018-07-24 浙江尚越新能源开发有限公司 A kind of resistance to hot spot photovoltaic double-glass assembly
CN108538942A (en) * 2018-04-13 2018-09-14 广东汉能薄膜太阳能有限公司 A kind of production method of power generation tile
CN108807580A (en) * 2018-06-14 2018-11-13 北京汉能光伏投资有限公司 A kind of electrification component forming method

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