CN101968226A - Burning treatment process of waste gas and waste liquid containing chlorosilane in polysilicon production - Google Patents
Burning treatment process of waste gas and waste liquid containing chlorosilane in polysilicon production Download PDFInfo
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- CN101968226A CN101968226A CN 201010522959 CN201010522959A CN101968226A CN 101968226 A CN101968226 A CN 101968226A CN 201010522959 CN201010522959 CN 201010522959 CN 201010522959 A CN201010522959 A CN 201010522959A CN 101968226 A CN101968226 A CN 101968226A
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Abstract
The invention relates to a burning treatment process of waste gas and waste liquid containing chlorosilane in polysilicon production, which comprises the steps of: removing waste gas and waste liquid containing chlorosilane (trichlorosilane, dichloro-dihydro-silicon, silicon tetrachloride and metal chloride) in the production process of polysilicon; using natural gas as fuel in a burning furnace; and hydrolyzing the chlorosilane in the waste gas and the waste liquid at high temperature under the conditions of high temperature of 900 DEG C to 1000 DEG C and pressure of 0.01 to 0.06 barg to generate SiO2, HCl, a small quantity of Cl2 and the like which can be easily processed. In the process, the toxic chlorosilane difficult to process is burned and hydrolyzed at high temperature to generate SiO2, HCl, a small quantity of Cl2 and the like which can be easily processed; therefore, the problems of incomplete performance of absorption of alkaline hydrolysis and neutralization and sedimentation treatment of Ca(OH)2, difficult removal of chlorine ions, serious secondary pollution, generation of a large quantity of waste water and waste dregs, high operating cost and the like are solved. Simultaneously, the waste water and the waste dregs are not generated basically and useful resources are recycled.
Description
One, technical field
The present invention relates to the burning treatment process of chlorine-containing silane waste gas, waste liquid in the production of polysilicon, it belongs to the technology of discharging the burning processing that contains chlorosilane waste gas, waste liquid in the polysilicon production process.This technology is to discharge waste gas, the waste liquid that contains chlorosilane (trichlorosilane, dichloro-dihydro silicon, silicon tetrachloride and metal chloride) in the polysilicon production process, in combustion furnace, with natural gas and combustion air, by high-temperature hydrolysis, generate materials such as easy to handle SiO2, HCl and a small amount of Cl2.
Two, background technology
Along with the develop rapidly of polysilicon industry, the continuous expansion of scale, output, the safety and the environmental issue of discharging chlorine-containing silane waste gas, waste liquid in the thing followed polysilicon production process become increasingly conspicuous, and have become to be badly in need of one of bottleneck that solves in the whole polysilicon industrial chain.
The polysilicon industry adopts following several method usually to the processing of chlorine-containing silane waste gas, waste liquid both at home and abroad at present:
(1) hydrolysising alkali absorption process: with chlorosilane waste gas, the waste liquid of each operation discharging in the production process, all send into eluting column with pipeline respectively, with 10%NaOH solution continuous washing, go out the leacheate at the bottom of the tower, after filtering, slag outward transport landfill, filtered fluid continues to handle with being pumped into the wastewater treatment operation, and residual air is through smoke stack emission.
(2) with conventional milk of lime Ca (OH)
2Neutralization precipitation method: with milk of lime Ca (OH)
2Waste gas, the waste liquid of hydrolysis neutralisation treatment chlorine-containing silane.Because the solubility height of calcium chloride in water, chlorion still is present in the water, and the water after the processing is brackish water, and this brackish water can not discharge, and causes treatment effect bad.
Above-mentioned two kinds of methods, though can both handle waste gas, the waste liquid of chlorine-containing silane basically, the hydrolysising alkali absorption process produces a large amount of waste water, waste residue, and especially quantity of alkali consumption is big, and slagging scorification causes equipment normally not move easily; Milk of lime Ca (OH)
2The neutralization precipitation method needs very big floor space, and the execute-in-place environment is very poor.
Along with the pay attention to day by day of country, how effectively, environmental protection, energy-conservation handle production of polysilicon and discharge chlorine-containing silane waste gas, waste liquid silicon, become one of main bottleneck that can the polysilicon industry develop in a healthy way to environmental protection.
Three, summary of the invention
The burning treatment process that the purpose of this invention is to provide chlorine-containing silane waste gas, waste liquid in a kind of production of polysilicon, be to discharge waste gas, the waste liquid that contains chlorosilane (trichlorosilane, dichloro-dihydro silicon, silicon tetrachloride and metal chloride) in the polysilicon production process, in combustion furnace, with natural gas and combustion air, pass through high-temperature hydrolysis, generate materials such as easy to handle SiO2, HCl and a small amount of Cl2, it can overcome hydrolysising alkali and absorb and milk of lime Ca (OH)
2Neutralization precipitation is handled not thorough, and chlorion can not be removed, and secondary pollution is serious, produces a large amount of waste water, waste residue, shortcomings such as operating cost height.
The objective of the invention is to finish like this: the burning treatment process of chlorine-containing silane waste gas, waste liquid in the production of polysilicon, it is with in the polysilicon production process, discharge contains waste gas, the waste liquid of chlorosilane (trichlorosilane, dichloro-dihydro silicon, silicon tetrachloride and metal chloride), in combustion furnace, act as a fuel with natural gas, under the pressure condition of 900-1000 ℃ high temperature and 0.01-0.06 kilogram, with the chlorosilane pyrohydrolysis in waste gas, the waste liquid, generate materials such as easy to handle SiO2, HCl and a small amount of Cl2.
Waste gas at first enters off-gas buffer tank, enters the combustion furnace burning by pressure-regulating valve then and handles; Waste liquid at first enters temporary jar of waste liquid, according to the operating condition of combustion furnace, sends into the burning of combustion furnace system with compressed nitrogen and handles then.Combustion-supporting natural gas provides heat, to reach 900-1000 ℃ the ignition temperature that needs; Combustion air provides oxygen more than needed, makes chlorine-containing silane abundant pyrohydrolysis in combustion process, then at the waste heat boiler recovered steam; In filter, reclaim silica SiO2; In level Four circulation densifying tower, reclaim hydrochloric acid HCl and a small amount of Cl2; Residue is discharged behind secondary caustic wash tower, moisture trap.
The characteristics of the burning treatment process of chlorine-containing silane waste gas, waste liquid are in the production of polysilicon of the present invention: with poisonous, unmanageable chlorosilane, combustion high temperature is hydrolyzed to materials such as easy to handle SiO2, HCl and a small amount of Cl2, it is not thorough to have solved the conventional method processing, the difficult problem that chlorion can not be removed.Simultaneously do not produce waste water, waste residue substantially, realized the recycling of useful resources.
Four, description of drawings
The burning processing technological flow figure of chlorine-containing silane waste gas, waste liquid in accompanying drawing 1 production of polysilicon.
Five, the specific embodiment
Embodiment one:
The waste gas of chlorine-containing silane in producing is at first entered off-gas buffer tank, enter the combustion furnace burning by pressure-regulating valve then and handle; The waste liquid of chlorine-containing silane in producing is at first entered temporary jar of waste liquid, act as a fuel with natural gas respectively, combustion air provides oxygen enrichment, under 950 ℃ high temperature, combustion air provides oxygen more than needed, makes chlorine-containing silane abundant pyrohydrolysis in combustion process, then at the waste heat boiler recovered steam; In filter, reclaim silica SiO2; In level Four circulation densifying tower, reclaim hydrochloric acid HCl and a small amount of Cl2; Residue is discharged behind secondary caustic wash tower, moisture trap.
The burning treatment process of chlorine-containing silane waste gas, waste liquid in the production of polysilicon of the present invention is handled exhaust gas discharged, waste liquid in the polysilicon production process in my company, and the rate of abolishing of chlorosilane has reached more than 99%, and treatment effect is better.
Claims (2)
1. the burning treatment process of chlorine-containing silane waste gas, waste liquid in the production of polysilicon, it is characterized in that: it is with in the polysilicon production process, discharge contains waste gas, the waste liquid of chlorosilane (trichlorosilane, dichloro-dihydro silicon, silicon tetrachloride and metal chloride), in combustion furnace, act as a fuel with natural gas, under the pressure condition of 900-1000 ℃ high temperature and 0.01-0.06barg,, generate easy to handle SiO with the chlorosilane pyrohydrolysis in waste gas, the waste liquid
2, HCl and a small amount of Cl
2Deng material.
2. the burning treatment process of chlorine-containing silane waste gas, waste liquid in the production of polysilicon as claimed in claim 1, it is characterized in that: the waste gas in the production of polysilicon at first enters off-gas buffer tank, enters the combustion furnace burning by pressure-regulating valve then and handles; Waste liquid in the production of polysilicon at first enters temporary jar of waste liquid, according to the operating condition of combustion furnace, sends into the burning of combustion furnace system with compressed nitrogen and handles then, and combustion-supporting natural gas provides heat, to reach 900-1000 ℃ the ignition temperature that needs; Combustion air provides oxygen more than needed, makes chlorine-containing silane abundant pyrohydrolysis in combustion process, then at the waste heat boiler recovered steam; In filter, reclaim silica SiO
2In level Four circulation densifying tower, reclaim hydrochloric acid HCl and a small amount of Cl
2The residue flue gas discharges behind secondary caustic wash tower, moisture trap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2010105229593A CN101968226B (en) | 2010-10-26 | 2010-10-26 | Burning treatment process of waste gas and waste liquid containing chlorosilane in polysilicon production |
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| CN2010105229593A CN101968226B (en) | 2010-10-26 | 2010-10-26 | Burning treatment process of waste gas and waste liquid containing chlorosilane in polysilicon production |
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| CN101968226A true CN101968226A (en) | 2011-02-09 |
| CN101968226B CN101968226B (en) | 2012-03-28 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102679368A (en) * | 2012-05-15 | 2012-09-19 | 北京航天动力研究所 | System and method for performing suspended fluidization, incineration and hydrolysis on wastes containing chlorine and silicon |
| CN104696971A (en) * | 2015-03-03 | 2015-06-10 | 陕西天宏硅材料有限责任公司 | Method for balancing pressure of polycrystalline silicon production drying method processing system |
| CN104990995A (en) * | 2015-03-03 | 2015-10-21 | 陕西天宏硅材料有限责任公司 | Simple detection apparatus and simple detection method for chlorine-containing silane waste gas during polycrystalline silicon production process |
| CN106006557A (en) * | 2016-05-18 | 2016-10-12 | 昆明理工大学 | Method for producing hydrogen chloride from chlorosilane raffinate |
| CN107091480A (en) * | 2017-06-12 | 2017-08-25 | 南京博纳能源环保科技有限公司 | Silicone hydride waste gas incinerating and purifying system |
| CN109539283A (en) * | 2018-11-02 | 2019-03-29 | 上海鉴灵节能环保技术有限公司 | A kind of pharmacy mother liquor thermal energy lowered temperature reclamation system and method |
| CN109915841A (en) * | 2019-03-04 | 2019-06-21 | 广东粤清环境科技有限公司 | A kind of minimizing technology of organic exhaust gas |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101592332B (en) * | 2009-05-22 | 2011-01-05 | 西安交通大学 | Waste heat boiler for recovering waste heat generated by incineration of wastes from polysilicon purification process |
| CN201815202U (en) * | 2010-10-20 | 2011-05-04 | 北京柯兰富尔过滤技术有限公司 | Separating, dedusting and packaging system for burning of exhaust gases from polycrystalline silicon |
-
2010
- 2010-10-26 CN CN2010105229593A patent/CN101968226B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101592332B (en) * | 2009-05-22 | 2011-01-05 | 西安交通大学 | Waste heat boiler for recovering waste heat generated by incineration of wastes from polysilicon purification process |
| CN201815202U (en) * | 2010-10-20 | 2011-05-04 | 北京柯兰富尔过滤技术有限公司 | Separating, dedusting and packaging system for burning of exhaust gases from polycrystalline silicon |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102679368A (en) * | 2012-05-15 | 2012-09-19 | 北京航天动力研究所 | System and method for performing suspended fluidization, incineration and hydrolysis on wastes containing chlorine and silicon |
| CN102679368B (en) * | 2012-05-15 | 2014-08-27 | 北京航天动力研究所 | System and method for performing suspended fluidization, incineration and hydrolysis on wastes containing chlorine and silicon |
| CN104696971A (en) * | 2015-03-03 | 2015-06-10 | 陕西天宏硅材料有限责任公司 | Method for balancing pressure of polycrystalline silicon production drying method processing system |
| CN104990995A (en) * | 2015-03-03 | 2015-10-21 | 陕西天宏硅材料有限责任公司 | Simple detection apparatus and simple detection method for chlorine-containing silane waste gas during polycrystalline silicon production process |
| CN104990995B (en) * | 2015-03-03 | 2018-02-27 | 陕西天宏硅材料有限责任公司 | The simple detection device and its detection method of chlorine-containing silane waste gas in polysilicon production process |
| CN106006557A (en) * | 2016-05-18 | 2016-10-12 | 昆明理工大学 | Method for producing hydrogen chloride from chlorosilane raffinate |
| CN106006557B (en) * | 2016-05-18 | 2018-06-15 | 昆明理工大学 | A kind of method of chlorosilane raffinate production hydrogen chloride gas |
| CN107091480A (en) * | 2017-06-12 | 2017-08-25 | 南京博纳能源环保科技有限公司 | Silicone hydride waste gas incinerating and purifying system |
| CN109539283A (en) * | 2018-11-02 | 2019-03-29 | 上海鉴灵节能环保技术有限公司 | A kind of pharmacy mother liquor thermal energy lowered temperature reclamation system and method |
| CN109915841A (en) * | 2019-03-04 | 2019-06-21 | 广东粤清环境科技有限公司 | A kind of minimizing technology of organic exhaust gas |
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| Publication number | Publication date |
|---|---|
| CN101968226B (en) | 2012-03-28 |
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Granted publication date: 20120328 Termination date: 20191026 |