CN101939827A - Liquid material carburetor, and filming device using the carburetor - Google Patents
Liquid material carburetor, and filming device using the carburetor Download PDFInfo
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- CN101939827A CN101939827A CN2008801264743A CN200880126474A CN101939827A CN 101939827 A CN101939827 A CN 101939827A CN 2008801264743 A CN2008801264743 A CN 2008801264743A CN 200880126474 A CN200880126474 A CN 200880126474A CN 101939827 A CN101939827 A CN 101939827A
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- raw material
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- charging stock
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- 239000011344 liquid material Substances 0.000 title abstract 8
- 239000007788 liquid Substances 0.000 claims abstract description 254
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000005273 aeration Methods 0.000 claims description 180
- 238000002309 gasification Methods 0.000 claims description 126
- 239000002994 raw material Substances 0.000 claims description 106
- 239000006200 vaporizer Substances 0.000 claims description 98
- 230000015572 biosynthetic process Effects 0.000 claims description 30
- 238000010438 heat treatment Methods 0.000 claims description 26
- 230000008676 import Effects 0.000 claims description 13
- 230000033228 biological regulation Effects 0.000 claims description 12
- 238000005192 partition Methods 0.000 claims description 12
- 239000007921 spray Substances 0.000 claims description 12
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
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- 238000005259 measurement Methods 0.000 claims description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 230000005855 radiation Effects 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 1
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- 238000011144 upstream manufacturing Methods 0.000 description 16
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- 229910052751 metal Inorganic materials 0.000 description 7
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
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- 150000002367 halogens Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
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- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
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- 239000001301 oxygen Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02181—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing hafnium, e.g. HfO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Intended is to homogenize the temperature of the entirety of a gas-permeable member, when the liquid droplets of a liquid material are gasified through a gas-permeable member, thereby to prevent the gas-permeable member from being blinded by the liquid droplets left non-gasified. A liquid material carburetor (300) comprises a liquid material feeder unit (300A) for discharging the liquid material of the shape of liquid droplets into a carburetion space (350), a carburetor unit (300B), an introduction port (338) for introducing the liquid material of the liquid droplet shape from the liquid material feeder unit into the carburetor unit, a mist trap unit (360) arranged in the carburetor unit and composed of a gas-permeable member (362) made of a material to be heated by radiation heat, a radiation heater (370) for irradiating the outer surface of the gas-permeable member entirely with the heat ray, thereby to heat the gas-permeable member with the radiation heat, and a delivery port (340) for delivering the material gas, which is produced by gasifying the liquid material of the liquid droplet state through the gas-permeable member heated, to the outside.
Description
Technical field
Thereby the film formation device that the present invention relates to make the liquid raw material vaporizer of liquid charging stock gasification generation unstrpped gas and use this liquid raw material vaporizer.
Background technology
As the method for on the surface of processed substrates such as Semiconductor substrate or glass substrate, films such as dielectric, metal, semiconductor being carried out film forming, known a kind of chemical meteorology deposition (CVD:Chemical Vapor Deposition) method, it is to have the film forming room of above-mentioned processed substrate to supply with the Organic Ingredients gas of organo-metallic compound etc. to mounting, thereby and makes other gas reaction such as this Organic Ingredients G﹠O or ammonia carry out film forming.The Organic Ingredients that is used for such CVD method because majority is liquid or solid at normal temperatures, therefore, needs a kind of gasifier that is used to make the Organic Ingredients gasification.
Usually, above-mentioned Organic Ingredients uses solvent to be formed liquid in advance and is imported into gasifier.Thereby as making such liquid charging stock gasification generate the gasifier in the past of unstrpped gas, gasification face with a plurality of holes for example is set in vaporizer, by the resistance heating heater this gasification face is heated, simultaneously, from nozzle ejection liquid charging stock and make form drop (vaporific) thus the unstrpped gas of shape is taken on the fluid of carrier gas and is sprayed to gasification face, make its gasification thus.
In such gasifier,,, hope sprays to gasification face thereby can forming liquid charging stock the drop of path as much as possible in order to improve gasification efficiency.But, make the diameter of drop more little, may make it not contact gasification face more and spill by the hole., the drop that is not gasified totally like this is immersed in the main cause that becomes the generation particulate in the film forming room thereby taking advantage of the air-flow of carrier gas.For example; when the drop of the liquid charging stock that is not gasified totally was immersed in the film forming room, if oxygen remains in this film forming room, thereby then this drop generation oxidation became trickle particulate; if attached on the substrate, then there is the unusual or membranous bad problem of film forming that produces in this particulate.
Therefore, in the past, make the unstrpped gas that generates by gasifier by having small hole filter and supply with to film forming room, by resistance heating heater etc. this filter is heated, thereby the drop that is not gasified totally that unstrpped gas is comprised gasifies by filter.In view of the above, even the gasification efficiency of gasifier itself is poor slightly, can prevent that also the drop that is not gasified totally is immersed in the film forming room with its original state.
In addition, in order to improve gasification efficiency, configuration has the solid filling thing of fine holes or the aeration parts with small hole as porous plastid, by resistance heating heater or thermal medium etc. these aeration parts are heated, thereby the drop that makes liquid charging stock passes through and gasification (for example, with reference to patent documentation 1,2).Thus, owing to increased the possibility that drop contacts with the aeration parts, therefore, can improve gasification efficiency.
Patent documentation 1: TOHKEMY 2005-347598 communique
Patent documentation 2: Japanese kokai publication hei 10-85581 communique
But, in the past, be used to make the droplets vaporize of liquid charging stock and aeration parts such as the solid filling thing that uses, porous plastid, filter, because by heating from the heat conduction of resistance heating heater, therefore, can not be to whole aeration parts heat supplied equably.In the aeration parts, exist for example far from the resistance heating heater, therefore the lower part of part equitemperature that heat can not fully conduct, might cause that drop is not caused by gasification that mesh stops up.
Especially, owing to be formed with a lot of holes on the surface of aeration parts, so its surface area expansion, the aeration parts are the high parts of exothermicity at the very start.And its surface is tanned by the sun by the lower unstrpped gas of temperature and the drop of liquid charging stock.Therefore, in whole aeration parts, its temperature of zone that is difficult to conduct from the heat of resistance heating heater further descends.In addition, if the drop of liquid charging stock is arranged and gasified in the surface attachment of aeration parts, then because the heat of gasification of this moment, heat is seized from the aeration parts.At this moment, in the zone that heat is difficult to conduct, can not carry out fully additionally to the heat energy of the amount of its heat of gasification, its result is exactly to produce temperature difference in the aeration parts.
For example, in the gasifier of patent documentation 1 record, because the solid filling thing is heated by the heat conduction from the resistance heating heater outside it, therefore, in the solid filling thing, it is lower than near the outer regions the resistance heating heater that the temperature of middle section becomes, and is difficult to make the temperature of whole solid filling thing to become even.Under such situation, the temperature of middle section can not be able to make the temperature of liquid charging stock gasification, and is might generating gasification bad and cause the obstruction of solid filling thing mesh.
To this, in the gasifier of patent documentation 2 records, thereby, the stream by the part in the porous plastid is set in order liquid charging stock more effectively to be gasified because of porous plastid causes the mesh obstruction, by thermal medium is circulated in this stream, can heat from the inside of porous plastid.But, only can not say to prevent fully that mesh from stopping up with this structure.That is,, therefore, in the scope of whole porous plastid, can not conduct heat equably because the stream of medium passing only is configured on the interior part of porous plastid.Therefore, local generating gasification is bad, can not get rid of the possibility that the porous plastid mesh stops up fully.In addition, in order in the scope of whole porous plastid, to conduct heat equably, it is also conceivable that on whole porous plastid, to form the stream that does not have the dead angle.But like this, it is complicated that structure not only becomes, the area decreases that unstrpped gas can be passed through form the amount of stream, it is big that the pressure loss in the porous plastid becomes.So just can not obtain the unstrpped gas of regulation flow.
Summary of the invention
Therefore, the present invention is the invention of making in view of this problem, its purpose is the film formation device that a kind of liquid raw material vaporizer is provided and uses this liquid raw material vaporizer, when the drop that makes liquid charging stock gasifies by the aeration parts, the temperature of whole aeration parts is become evenly, can prevent that the mesh that not exclusively causes because of gasifying from stopping up.
In order to solve above-mentioned problem, according to a viewpoint of the present invention, provide a kind of liquid raw material vaporizer, it is characterized in that having: make liquid charging stock become the liquid charging stock supply unit of droplet-like and ejection; Make the liquid charging stock gasification of described droplet-like and the gasification portion of generation unstrpped gas; The introducing port that will in described gasification portion, import from the liquid charging stock of the described droplet-like of described liquid charging stock supply unit; The fog collection unit that is configured in the described gasification portion and constitutes by the aeration parts, these aeration parts are by constituting by the heated material of radiant heat; The radiant heat heater to the whole outer surface irradiation heat ray of described aeration parts, and heats described aeration parts by this radiant heat; Send mouth, it passes out to the outside with unstrpped gas, and described unstrpped gas is to gasify by heated described aeration parts by the liquid charging stock that makes described droplet-like to generate.
In order to solve above-mentioned problem, according to other viewpoint of the present invention, a kind of film formation device is provided, has film forming room, from the liquid raw material vaporizer that makes liquid charging stock gasification and generation unstrpped gas unstrpped gas is imported this film forming room, and in this film forming room, processed substrate is carried out film forming and handle, it is characterized in that having: make described liquid charging stock become the liquid charging stock supply unit of droplet-like and ejection; Make the liquid charging stock gasification of described droplet-like and the gasification portion of generation unstrpped gas; To import the introducing port in the described gasification portion from the liquid charging stock of the described droplet-like of described liquid charging stock supply unit; Be configured in the described gasification portion, and the fog collection unit that constitutes by the aeration parts, described aeration parts are made of the material by the radiant heat heating; The radiant heat heater shines the whole outer surface of described aeration parts with heat ray, and by this radiant heat described aeration parts is heated; Send mouth, it passes out to the outside with unstrpped gas, and described unstrpped gas is to gasify by heated described aeration parts by the liquid charging stock that makes described droplet-like to generate.
According to such the present invention, make to the liquid charging stock of droplet-like catch and the fog collection unit that makes its gasification by constituting by the heated aeration parts of radiant heat, and make the whole outer surface of heat ray irradiation aeration parts all by the radiant heat heater, therefore, can heat whole aeration parts equably.Thus, because the temperature of aeration parts is become evenly, so, only pass through the aeration parts by the liquid charging stock that makes droplet-like, just can there be to make whole droplets vaporize residually.Thus, gasification efficiency is brought up to more than the existing level, and, because it is bad to prevent that local temperature from reducing the gasification that causes, therefore, can prevent that the mesh of aeration parts from stopping up.And, can the whole outer surface of aeration parts directly be heated again, therefore, when the aeration parts,, also can promptly replenish heat energy even because of the heat of gasification of drop heat is seized in certain part at the liquid charging stock that makes droplet-like.
In addition, preferably constitute, the described introducing port of above-mentioned gasification portion and the described mouth of sending are provided with opposite to each other, described aeration parts be from described importing oral-lateral to the described shape of sending the tubular that disposes in the scope of oral-lateral, the end of described importing oral-lateral is closed, and the described end of sending oral-lateral is communicated with the described mouth of sending.Like this, by making the aeration parts form tubular, can make the area on the surface of aeration parts become bigger with compacter size, therefore, thereby can make the liquid charging stock gasification of more droplet-like generate the unstrpped gas of amount fully, and, can shorten the time of the temperature that is heated to regulation etc., can improve the efficiency of heating surface.In addition, by closing the end that imports oral-lateral, can make the drop of the liquid charging stock of supplying with from introducing port import to the outer lateral side of the aeration parts that surround by the radiant heat heater.
Under this situation, preferred described radiant heat heater disposes in the mode of the outer surface that surrounds described aeration parts.Such radiant heat heater is made of the carbon heater that for example is processed into desirable shape easily.Like this, owing to can once heat, therefore, can further improve the efficiency of heating surface from the radiant heat heater to the whole surface of aeration parts.
And, preferably constitute, between described aeration parts and described radiant heat heater, be provided with the partition member of tubular in the mode of surrounding described aeration parts, described partition member is separated the gasification space that liquid charging stock circulated of described droplet-like and the space that sets of described radiant heat heater, and described partition member is made of the heat ray that described radiant heat heater is shone parts that see through, that do not have aeration.Such partition member for example is made of quartz.By such partition member is set, can prevents surface attachment particulate, and can improve the gasification efficiency of the liquid charging stock of droplet-like at the radiant heat heater.Promptly, owing between the outer lateral side of the inner surface of partition member and fog collection unit, be formed with the stream that is surrounded by the radiant heat heater, therefore, act directly on from the heat ray of radiant heat heater on the liquid charging stock of the droplet-like by this stream, and, as long as the aeration parts are heated, the environmental gas of overall flow paths also is heated.Thus, the gasification efficiency of the drop of droplet-like is improved.
Under this situation, the further end of the importing oral-lateral by closing the aeration parts, the drop of the whole liquid charging stocks that can supply with from introducing port imports to and is formed on being surrounded the stream by the radiant heat heater between fog collection unit and the partition member.Thus, the heat ray of radiant heat heater is acted on the drop of whole liquid charging stocks, and, can be effectively in outer surface conduction by the direct-fired aeration parts of radiant heat heater.Therefore, gasification efficiency is further improved.
In addition, the temperature sensor that the temperature of described aeration parts is measured can also be set; Control part, it is based on being controlled described radiant heat heater by the temperature of the described aeration parts of described temperature sensor measurement, thus, with the adjustment of described aeration parts temperature for regulation.Directly measure and the temperature of monitor ventilation parts by temperature sensor, and, the radiant heat heater is controlled, thus, can adjust the temperature of aeration parts exactly based on the temperature of this mensuration.Therefore, the temperature of whole aeration parts often can be remained the temperature of regulation.
In addition, the medial surface of casing that preferably constitutes the housing of described gasification portion has been implemented mirror finish, thereby makes its outer surface towards described aeration parts so that the heat ray from described radiant heat heater is reflected.Thus, the heat ray from the radiant heat heater is accumulated on the aeration parts effectively, can improve the efficiency of heating surface of aeration parts like this.
In order to solve above-mentioned problem, according to other viewpoint of the present invention, a kind of liquid raw material vaporizer is provided, be connected with the other liquid raw material vaporizer that makes liquid charging stock gasification and generation unstrpped gas, it is characterized in that having: the introducing port that the unstrpped gas that is generated by described other liquid raw material vaporizer is imported; By the fog collection unit that the aeration parts constitute, these aeration parts are made of the material by the radiant heat heating; The radiant heat heater makes the whole outer surface irradiation of heat ray to described aeration parts, and by this radiant heat described aeration parts is heated; Send mouth, it makes the unstrpped gas from described other liquid raw material vaporizer that imports from described introducing port send by heated described aeration parts and to the outside.
According to such the present invention, make the unstrpped gas that generates by other liquid raw material vaporizer pass through the aeration parts of the radiant heat heating of origin autoradiolysis hot heater, thus, even the drop that is not gasified totally by other liquid raw material vaporizer also can gasify by liquid raw material vaporizer of the present invention.
In order to solve above-mentioned problem, according to other viewpoint of the present invention, a kind of film formation device is provided, has film forming room, from the liquid raw material vaporizer that makes liquid charging stock gasification and generation unstrpped gas unstrpped gas is imported this film forming room, and in this film forming room, processed substrate is carried out film forming and handle, it is characterized in that, described liquid raw material vaporizer is by making liquid charging stock gasification and generating first liquid raw material vaporizer of unstrpped gas and the second coupled liquid raw material vaporizer constitutes, and described second liquid raw material vaporizer has: the introducing port that the unstrpped gas that is generated by described first liquid raw material vaporizer is imported; By the fog collection unit that the aeration parts constitute, these aeration parts are made of the material by the radiant heat heating; The radiant heat heater, it makes heat ray shine the whole outer surface of described aeration parts, and by this radiant heat described aeration parts is heated; Send mouth, it makes from the unstrpped gas from described first liquid raw material vaporizer of described introducing port importing and sends by heated described aeration parts and to the outside.
According to such the present invention, the aeration parts of second liquid raw material vaporizer that the radiant heat that makes the unstrpped gas that is generated by first liquid raw material vaporizer pass through origin autoradiolysis hot heater heats, thus, even by the drop that first liquid raw material vaporizer is not gasified totally, also can be by the gasification of second liquid raw material vaporizer.Thus, the drop that can prevent liquid charging stock enters film forming room etc. with unstrpped gas.
The invention effect
According to the present invention, when the drop that makes liquid charging stock passes through the aeration parts, can whole aeration parts directly be heated by the radiant heat that the radiant heat heater produces.Therefore, owing to can in whole aeration parts scope, evenly heat, so, can there be to make whole droplets vaporize residually.Thus, the gasification efficiency that can make compared with the past improves, and, can prevent that the gasification that causes because of the local temperature reduction is bad, therefore, can prevent that the mesh of aeration parts from stopping up.
Description of drawings
Fig. 1 is the figure of structure example of the film formation device of expression first execution mode of the present invention.
Fig. 2 is the longitudinal section of structure example of the liquid raw material vaporizer of this execution mode of expression.
Fig. 3 is the sectional block diagram of the partial structurtes example of expression gasification portion shown in Figure 2
Fig. 4 is the stereogram that sets example of expression radiant heat heater shown in Figure 2.
Fig. 5 is the figure of structure example of the film formation device of expression second execution mode of the present invention.
Fig. 6 is the longitudinal section of structure example of the liquid raw material vaporizer of this execution mode of expression.
The explanation that accompanying drawing is represented
100,102 film formation devices
110 liquid charging stock supply sources
112 liquid charging stock supplying tubing
114 liquid charging stock flow control valves
120 carrier gas supply sources
122 carrier gas supplying tubing
124 carrier gas flow control valves
132 unstrpped gas supplying tubing
134 raw material gas flow control valves
140 control parts
200 film forming room
210 side member
212 roof parts
214 bottom wall parts
222 pedestals (susceptor)
224 support units
226 heaters
228 power supplys
230 exhaust outlets
232 exhaust gears
240 shower nozzles (spray head)
242 inner spaces
244 gas squit holes
300 liquid raw material vaporizers
300A liquid charging stock supply unit
300B gasification portion
302,304,308 liquid raw material vaporizers
306 connecting pipings
310 liquid charging stock streams
312 carrier gas streams
314 nozzles
316 ejiction openings
318 carrier gas injection portions
320 carrier gas ejiction openings
330 casings
331 side member
332 upstream side end wall member
334 downstream single wall parts
336 secure components
338 introducing ports
340 send mouth
342 sleeve parts
344,346 spot-facings
348 seal members
350 gasification spaces
360 fog collection units
362 aeration parts
364 shut-off blocks
366 inner spaces
368 outer space (stream)
370 radiant heat heaters
372 through holes
374 heater power sources
376 temperature sensors
The W wafer
Embodiment
Below, the limit is with reference to accompanying drawing, and the limit is elaborated to preferred implementation of the present invention.In addition, in this specification and accompanying drawing,, mark identical Reference numeral and omit repeat specification having the inscape of identical functions structure in fact.
(film formation device of first execution mode)
At first, describe with reference to the film formation device of accompanying drawing first execution mode of the present invention.Fig. 1 is the figure of summary structure example that is used to illustrate the film formation device of first execution mode.Russia shown in Figure 1 film formation device 100, be processed substrate for example semiconductor wafer (below, only being called " wafer ") W is last by the CVD method metal oxide film is carried out the device of film forming, Hafnium Tert-Butoxide) for example have: comprising HTB (tert-butoxy hafnium: the liquid charging stock supply source 110 supplied with of the liquid charging stock of Hf such as; The carrier gas supply source 120 that inert gases such as Ar are supplied with as carrier gas; Make from the liquid charging stock gasification of liquid charging stock supply source 110 supplies and the liquid raw material vaporizer 300 of generation unstrpped gas; Use the unstrpped gas of liquid raw material vaporizer 300 generations and on wafer W, form for example HfO
2The film forming room 200 of film; The control part 140 that the each several part of film formation device 100 is controlled.
Liquid charging stock supply source 110 is connected by liquid charging stock supplying tubing 112 with liquid raw material vaporizer 300, carrier gas supply source 120 is connected by carrier gas supplying tubing 122 with liquid raw material vaporizer 300, and liquid raw material vaporizer 300 is connected by unstrpped gas supplying tubing 132 with film forming room 200.And, on liquid charging stock supplying tubing 112, have liquid charging stock flow control valve 114, on carrier gas supplying tubing 122, have carrier gas flow control valve 124, on unstrpped gas supplying tubing 132, have raw material gas flow control valve 134.These liquid charging stock flow control valves 114, carrier gas flow control valve 124 and raw material gas flow control valve 134 constitute by its aperture separately of control signal from control part 140 and are adjusted.Control part 140 is preferably measured the flow of the liquid charging stock that flows through liquid charging stock supplying tubing 112, the flow of carrier gas that flows through carrier gas supplying tubing 122 and the flow that flows through the unstrpped gas of unstrpped gas supplying tubing 132, and according to this measurement result output control signal.
On the bottom wall part 214 of film forming room 200, be formed with exhaust outlet 230, on this exhaust outlet 230, be connected with exhaust gear 232.And, can will be adjusted to the specified vacuum degree in the film forming room 200 by exhaust gear 232.
On the roof parts 212 of film forming room 200, shower nozzle 240 is installed.Be connected with unstrpped gas supplying tubing 132 on this shower nozzle 240, via this unstrpped gas supplying tubing 132, the unstrpped gas that is generated by liquid raw material vaporizer 300 is imported in the shower nozzle 240.Shower nozzle 240 has inner space 242; The a plurality of gas squit holes 244 that are communicated with this inner space 242.The unstrpped gas that is imported into the inner space 242 of shower nozzle 240 via unstrpped gas supplying tubing 132 sprays from the wafer W of gas squit hole 244 on pedestal 222.
In this film formation device 100, be supplied to as follows from the unstrpped gas of liquid raw material vaporizer 300.Liquid charging stock from liquid charging stock supply source 110 is fed into liquid raw material vaporizer 300 via liquid charging stock supplying tubing 112, and, carrier gas from carrier gas supply source 120 is supplied to via carrier gas supplying tubing 122, then pass through the liquid charging stock supply unit 300A described later of liquid raw material vaporizer 300, liquid charging stock becomes droplet-like with carrier gas and to the 300B of gasification portion ejection, thereby this drop is gasified by the 300B of gasification portion and generates unstrpped gas.The unstrpped gas that generates by liquid raw material vaporizer 300 is fed into film forming room 200 via unstrpped gas supplying tubing 132, the wafer W in the film forming room 200 is implemented desirable process handle.
In the liquid raw material vaporizer 300 of film formation device 100 as described above, under the situation that liquid charging stock is gasified totally, the part of the drop of liquid charging stock might be blended in the unstrpped gas and be sent unstrpped gas supplying tubing 132, and flow in the film forming room 200.The drop that flow into the liquid charging stock in the film forming room 200 like this becomes the main cause that is formed on the membranous reduction of the film on the wafer W as particulate.In addition, in liquid raw material vaporizer 300, under the situation that the gasification efficiency of liquid charging stock worsens, may be fed into the underfed of the unstrpped gas of film forming room 200, and cause on wafer W, forming for example HfO
2Can not obtain desirable film forming ratio during film.
Therefore, in the liquid raw material vaporizer 300 in the present embodiment, constitute the drop of whole liquid charging stocks is gasified effectively, thereby in film forming room 200, carry out to generate when film forming is handled the unstrpped gas of the fine quality of sufficient quantity.Below the concrete structure example of such liquid raw material vaporizer 300 is described.
(structure example of the liquid raw material vaporizer of first execution mode)
Below, describe with reference to the structure example of accompanying drawing the liquid raw material vaporizer 300 of first execution mode of the present invention.Fig. 2 is the longitudinal section of summary structure example of the liquid raw material vaporizer 300 of expression first execution mode.This liquid raw material vaporizer 300 is substantially by making liquid charging stock become droplet-like and the liquid charging stock supply unit 300A that supplies with of stage rearwards; Make from the 300B of the gasification portion formation of the liquid charging stock gasification of this liquid charging stock supply unit 300A supply.
At first, the structure example to liquid charging stock supply unit 300A describes.On this liquid charging stock supply unit 300A, be provided with the liquid charging stock stream 310 that vertically extends to inside from upper surface, and the carrier gas stream 312 that extends to inner along continuous straight runs from the side.End at liquid charging stock stream 310 is connected with liquid charging stock supplying tubing 112, is connected with carrier gas supplying tubing 122 at an end of carrier gas stream 312.
The other end at liquid charging stock stream 310 has nozzle 314, and this nozzle 314 makes liquid charging stock become droplet-like and sprays.This nozzle 314 constitutes for example front end thin (having omitted the diagram of this structure in Fig. 2), and the ejiction opening 316 of its front end disposes in the mode of the gasification space 350 in the 300B of gasification portion.
The diameter of the ejiction opening 316 of nozzle 314 is determined according to the target size of the drop that is fed into the liquid charging stock in the 300B of gasification portion.In the 300B of gasification portion, for the liquid charging stock that can make droplet-like gasifies reliably, the size of drop is less more favourable, and therefore, the diameter of preferred ejiction opening 316 is also less.But, if drop undersized, then might make the underfed of the unstrpped gas that droplets vaporize obtains.These aspects of preferred consideration are determined the diameter of ejiction opening 316.
As the constituent material of nozzle 314, preferably have synthetic resin or metals such as stainless steel and titanium such as polyimide resin at the patience of organic solvent.If constitute nozzle 314 by synthetic resin, then can be not from the heat of the conduction of the liquid charging stock before ejection on every side.Especially, by using polyimide resin, the residue of liquid charging stock (precipitate) is difficult to attached on the nozzle 314, can prevent that the mesh of nozzle from stopping up.
In addition, the mode with the front end that surrounds nozzle 314 disposes carrier gas injection portion 318 in the inside of liquid charging stock supply unit 300A.Carrier gas injection portion 318 is connected on the other end of above-mentioned carrier gas stream 312, and the carrier gas from carrier gas stream 312 is sprayed with the gasification space 350 of liquid charging stock to the 300B of gasification portion.
Specifically, carrier gas injection portion 318 forms the cup-shaped of the front end that surrounds nozzle 314, is formed with carrier gas ejiction opening 320 in its bottom.Carrier gas ejiction opening 320 forms in the mode of surrounding this ejiction opening 316 near the ejiction opening 316 of the front end of nozzle 314.Thus, can around ejiction opening 316, spray carrier gas, make from the drop of the liquid charging stock of ejiction opening 316 ejection and splash to the 300B of gasification portion reliably, and fog collection unit described later 360 guiding that can be in being located at the 300B of gasification portion.
Next, the structure example to the 300B of gasification portion describes.The 300B of gasification portion has: casing 330 roughly cylindraceous; Fog collection unit 360 is made of the aeration parts 362 cylindraceous that are located in the gasification space 350, and wherein gasification space 350 is formed on this central part; With surround these aeration parts 362 around mode dispose and the radiant heat heater 370 that equably aeration parts 362 is heated by radiant heat; Between radiant heat heater 370 and aeration parts 362 to the sleeve part cylindraceous 342 that space and gasification space 350 are separated that sets of radiant heat heater 370 as partition member.
Below, the structure of the each several part of the 300B of gasification portion is described in further detail.End at the upstream side of casing 330 is formed with introducing port 338, the drop that this introducing port 338 is used for the liquid charging stock that will supply with from liquid charging stock supply unit 300A is taken into, be formed with in the end in downstream and send mouthfuls 340, this is sent mouthfuls 340 unstrpped gases that are used for making the droplets vaporize of liquid charging stock to generate and sends in gasification space.Fog collection unit 360 is by constituting to sending the aeration parts 362 cylindraceous that dispose in mouthful 340 scopes from introducing port 338.Aeration parts 362 are closed with the one end, and other end opening and covering are sent the mode of mouth 340 and installed.Thus, by fog collection unit 360, the inner space 366 and the outer space 368 of the aeration parts 362 of gasification space 350 are separated.
Drop from the liquid charging stock of introducing port 338 sprays to such fog collection unit 360 with carrier gas.At this moment, the drop of liquid charging stock space 368 laterally spreads, and is injected into the outer surface of heated aeration parts 362 and is gasified, and enters inner space 366 after becoming unstrpped gas, and is sent from sending mouthfuls 340.
The limit illustrates in greater detail the structure example of such 300B of gasification portion with reference to Fig. 3, Fig. 4 limit.Fig. 3 is the sectional block diagram that is used to illustrate the structure example of the 300B of gasification portion shown in Figure 2.Fig. 4 is the stereogram that sets example of expression radiant heat heater 370.In addition, in Fig. 3, omitted the diagram of radiant heat heater 370.The casing 330 of the 300B of gasification portion is made of side member 331 cylindraceous, the upstream side end wall member 332 and the downstream end wall member 334 that are provided with respectively in the mode of the end in the end of the upstream side of cutting out this side member 331 and downstream.
Above-mentioned introducing port 338 is formed on the upstream side end wall member 332, and the above-mentioned mouth 340 of sending is formed on the downstream end wall member 334.The side member 331, upstream side end wall member 332, the downstream end wall member 334 that constitute casing 330 are made of for example metal such as aluminium, stainless steel respectively.Upstream side end wall member 332 and downstream end wall member 334 are installed on the side member 331 by secure components such as a plurality of bolts 336 for example shown in Figure 2 respectively.In addition, the inner surface of side member 331 has been implemented mirror finish, so that from the gasification space 350 of the central part of heat ray (for example electromagnetic wave such as far infrared) the directive casing 330 of radiant heat heater 370.Thus, because therefore aeration parts 362 gatherings of the heat ray of autoradiolysis hot heater 370 in gasification space 350 in the future effectively, can improve the efficiency of heating surface of aeration parts 362.
Above-mentioned sleeve part 342 is provided with in the mode that becomes with the coaxial double pipe structure of side member 331 in the inboard of casing 330.Sleeve part 342 is installed in the mode that is pressed between upstream side end wall member 332 and the downstream end wall member 334.And for example, as shown in Figure 2, the flange that is formed on the two ends of sleeve part 342 is inserted into respectively in the spot-facing 344,346 of the inboard that is formed on upstream side end wall member 332 and downstream end wall member 334 and is positioned.
The contact portion of sleeve part 342 and upstream side end wall member 332 and downstream end wall member 334 is respectively by 348 sealings of seal members such as for example metal O type ring.Thus, the radiant heat heater 370 in the gasification space 350 of the inboard of sleeve part 342 and the outside to set the space sealed.
By such sleeve part 342 is set, the space that sets of the gasification space 350 of the inboard of sleeve part 342 and the radiant heat heater 370 in the outside is separated, therefore, for example can prevent on the surface of particulate that the one-tenth by the liquid charging stock of gasification space 350 thermal decompositions grades attached to radiant heat heater 370.Therefore, do not need the cleaning etc. on the surface of time-consuming radiant heat heater 370, can reduce maintenance times.Under this situation, though the possibility that still has particulate to adhere in the inboard of sleeve part 342,, can only remove by sleeve part 342 is cleaned simply.In addition, sleeve part 342 is a tubular, by its inner surface is smoothly processed, can make particulate be difficult to adhere to.
This fog collection unit 360 is parts that its gasification was caught and made to the drop of the liquid charging stock that imports with carrier gas from introducing port 338 by 362 pairs of aeration parts.Become unstrpped gas after the droplets vaporize of liquid charging stock and enter into the inner space 366 of aeration parts 362, and send from sending mouthfuls 340 with carrier gas.In addition, the end in the downstream of aeration parts 362 directly is bonded on the downstream end wall member 334, and can is that clamping heat insulating member ground engages.Thus, heat side wall components 334 escapes downstream of fog collection unit 360 can be prevented, the efficiency of heating surface can be improved.
Here, aeration parts 362 are described.Aeration parts 362 do not make the drop of liquid charging stock by ground it be caught, and are the parts with aeration that the unstrpped gas that generates after the droplets vaporize that makes liquid charging stock passes through.In addition, constituent material as aeration parts 362, use has the material of following characteristic, promptly passes through the heated characteristic of this material of heat ray that radiant heat heater 370 produces, thereby for example absorbs the easy characteristic that rises of temperature of these materials of electromagnetic wave such as infrared ray.As material, for example can list metals such as carborundum potteries such as (SiC) with vesicular structure or stainless steel with such characteristic.In addition, shut-off block 364 is made of metals such as for example carborundum potteries such as (SiC) or stainless steels equally with aeration parts 362.
The thickness of aeration parts 362 will consider also that preferably not only by considering thermal capacitance gasification efficiency and heating-up temperature wait to determine.Make the thickness of aeration parts 362 thin more, the thermal capacitance of aeration parts 362 becomes more little, therefore, the efficiency of heating surface is improved, and in addition, can shorten the required time of heating.On the other hand, make the thickness of aeration parts 362 thin more, the surface area of aeration parts 362 becomes more little, and therefore, the gasification efficiency of the liquid charging stock of droplet-like reduces.But, can suppress the reduction of gasification efficiency by the raising heating-up temperature.Therefore, the thickness of aeration parts 362 is preferably thin as far as possible in the scope that can access sufficient gasification efficiency.
In addition, the length of aeration parts 362 forms shortlyer than the length of side member 331, and the diameter of aeration parts 362 forms forr a short time than sleeve part 342.Therefore, the end of the upstream side of aeration parts 362 (ends of shut-off block 364 sides) are left from upstream side end wall member 332 a little, and the side of aeration parts 362 is positioned at the inboard of sleeve part 342.Thus, form towards the drop of introducing port 338 ejections and carrier gas from the upstream side of aeration parts 362 stream to side (outer space 368).
By between aeration parts 362 and sleeve part 342, forming stream like this, can the side of the drop guiding aeration parts 362 of this stream (outer space 368) will be passed through effectively, therefore, almost all drops all be injected on the outer surface of aeration parts 362 and gasification.And because this stream is formed on the inboard of radiant heat heater 370, therefore, the part of the drop by this stream is directly accepted from the heat ray of radiant heat heater 370 and passes through this radiant heat to gasify.Like this, by stream being formed on the inboard of radiant heat heater 370, can before aeration parts 362, make its gasification by fog collection unit 360.
In addition, sleeve part 342 is made of the material that for example heat ray from radiant heat heater 370 electromagnetic waves such as (for example) far infrareds is seen through.As such material, can list for example transparent quartz or aluminium oxide etc.Thus, owing to almost be not radiated at damply on the aeration parts 362 through sleeve part 342, therefore, can effectively heat aeration parts 362 from the outside of sleeve part 342 by this radiant heat from the heat ray of radiant heat heater 370.As the radiant heat heater 370 of such heat of emission ray, for example can use QCH-HEATER carbon heaters such as (registered trade marks).In addition,, be not limited thereto, can also use halogen heater, nichrome heater as radiant heat heater 370.Such radiant heat heater 370, the electric power of for example supplying with from heater power source 374 is controlled, thereby the intensity (heater power) from the heat ray of radiant heat heater 370 irradiation is controlled, thus, can be controlled the heat that is imparted on the aeration parts 362.
Here, the example that sets to radiant heat heater 370 describes.Radiant heat heater 370 for example as shown in Figure 4, disposes in the mode from the side (outer surface) of the outer side covers aeration parts 362 of sleeve part 342.In Fig. 4, use QCH-HEATER (registered trade mark) as radiant heat heater 370, constitute meander-like.By such radiant heat heater 370, can make the whole side (outer surface) that is radiated at the aeration parts 362 of aeration parts 362 from the heat ray of radiant heat heater 370, therefore, by this radiant heat, the temperature of aeration parts 362 is heated equably.
The end of radiant heat heater 370 as shown in Figure 2, is extended outside the casing 330 of the 300B of gasification portion from the through hole 372 that is formed on the downstream end wall member 334, and is connected on the heater power source 374.In addition, on aeration parts 362, be provided with thermocouple equitemperature transducer 376.These heater power sources 374, temperature sensor 376 are connected on the control part 140.Control part 140 is controlled the electric power of heater power source 374 according to the temperature from temperature sensor 376, thus radiant heat heater 370 is controlled, and 362 heating of aeration parts can be controlled to the temperature of regulation.
(action of film formation device)
Below, the action of the film formation device 100 of present embodiment is described.The each several part of film formation device 100 is by control part 140 controls, and the action of going forward side by side is done.When generating unstrpped gases, thereby make radiant heat heater 370 heatings of liquid raw material vaporizer 300 aeration parts 362 are heated to the temperature of regulation by liquid raw material vaporizer 300.At this moment, heat ray is from radiant heat heater 370 radiation around aeration parts 362, and the integral body of aeration parts 362 is not heated to the temperature of regulation unevenly.And the temperature by temperature sensor 376 mensuration aeration parts 362 measure temperature based on this, and via heater power source 374, the power of radiant heat heater 370 is adjusted.Like this, the temperature of aeration parts 362 is remained on the temperature of regulation.The temperature of the aeration parts 362 of this moment is maintained at the high temperature (for example 100～300 ℃) of gasification temperature of ratio such as liquid charging stock.
Next, the aperture of liquid charging stock flow control valve 114 is adjusted, so that the liquid charging stock of the flow of regulation is supplied with to liquid raw material vaporizer 300 from liquid charging stock supply source 110 via liquid charging stock supplying tubing 112.Meanwhile, the aperture of carrier gas flow control valve 124 is adjusted, so that the carrier gas of the flow of regulation is supplied with to liquid raw material vaporizer 300 from carrier gas supply source 120 via carrier gas supplying tubing 122.
The liquid charging stock of supplying with to liquid raw material vaporizer 300 via liquid charging stock supplying tubing 112 arrives nozzle 314 via liquid charging stock stream 310, is ejected after ejiction opening 316 becomes droplet-like.In addition, the carrier gas that is fed into liquid raw material vaporizer 300 with liquid charging stock arrives carrier gas injection portion 318 via carrier gas stream 312, and sprays from the gasification space 350 of carrier gas ejiction opening 320 to the 300B of gasification portion.Injected like this carrier gas is because by near the ejiction opening 316 of nozzle 314, therefore, can make the drop of the liquid charging stock that is sprayed continuously from ejiction opening 316 take its fluid and be fed in the 300B of gasification portion.
Spray to the fog collection unit 360 of gasification space 350 from introducing port 338 with carrier gas from the drop of the liquid charging stock of nozzle 314 ejection.At this moment, this drop and carrier gas are directed to the side from the upstream side longshore current road (outer space 368) of fog collection unit 360, and therefore, quilt sprays to the outer surface of the aeration parts 362 of fog collection unit 360.
The temperature of aeration parts 362 is by being adjusted into the temperature of the regulation higher than the gasification temperature of liquid charging stock equably by integral body from the radiant heat of radiant heat heater 370.Therefore, no matter the drop of liquid charging stock to which position on the surface of aeration parts 362 sprays, and this drop is fully gasified.
The drop of liquid charging stock is sprayed and gasification to aeration parts 362 in this wise, flows into inner space 366 after becoming unstrpped gas, and is sent unstrpped gas supplying tubing 132 with carrier gas via sending mouthfuls 340.The unstrpped gas that is sent unstrpped gas supplying tubing 132 is fed into film forming room 200, and is directed to the inner space 242 of shower nozzle 240, from the wafer W ejection of gas squit hole 244 on pedestal 222.Thereby, on wafer W, form the film of stipulating, for example HfO
2Film.In addition, the flow that is imported into the unstrpped gas of film forming room 200 can be controlled by the aperture of raw material gas flow control valve 134 that unstrpped gas supplying tubing 132 is had and adjust.
As mentioned above, liquid raw material vaporizer 300 by first execution mode, make to the liquid charging stock of droplet-like catch and the fog collection unit 360 that makes its gasification by constituting by the heated aeration parts 362 of radiant heat, and radiant heat heater 370 is set in the mode on every side of surrounding these aeration parts 362, thus, can directly heat whole aeration parts 362 by radiant heat from radiant heat heater 370.Therefore, the temperature of aeration parts 362 is become evenly, therefore,, just can make drop not have all gasifications of residual ground only by liquid charging stock to such aeration parts 362 liquid droplets shapes.Thus, gasification efficiency is brought up to more than the existing degree.In addition, because it is bad to prevent that local temperature from reducing the gasification that causes, therefore, can prevent that the mesh of aeration parts 362 from stopping up.Therefore, the life-span of aeration parts 362 can be prolonged, and then the maintenance period of gasification portion 300 can be prolonged.Thus, can improve productivity ratio in the film formation device 100.
In addition, owing to be provided with the sleeve part of separating in the space 342 that sets to the gasification space 350 of the liquid charging stock of droplet-like circulation and radiant heat heater 370, therefore, can prevent from the surface of radiant heat heater 370, to be attached with particulate, and, can improve the gasification efficiency of the drop of liquid charging stock.Promptly, between the outer lateral side of the inner surface of sleeve part 342 and aeration parts 362, be formed with the stream that surrounds by radiant heat heater 370, therefore, can act directly on from the heat ray of radiant heat heater 370 on the drop of liquid charging stock of this stream of circulation, and all environmental gas of stream also can be by 370 heating of radiant heat heater.Thus, the gasification efficiency of the drop of liquid charging stock is further improved.
In addition, carry out The real time measure, radiant heat heater 370 is controlled, therefore, can be adjusted into the temperature that makes aeration parts 362 and often remain on design temperature based on the temperature of this mensuration by the temperature of 376 pairs of aeration parts 362 of temperature sensor.Therefore, in film forming is handled, the temperature of whole aeration parts 362 is often kept equably, can make reliably by the gasification of the liquid charging stock of the droplet-like of spraying to aeration parts 362, thereby can stably supply with the unstrpped gas of desirable flow to film forming room 200.
In addition, can be according to the condition of liquid charging stock supply unit 300A, for example size of the kind of liquid charging stock, amount, drop etc. is so that the temperature of aeration parts 362 becomes the mode of optimum temperature that the power of radiant heat heater 370 is adjusted.Thus, be not limited to the condition of liquid charging stock supply unit 300A, gasification efficiency is improved.
In addition, in the first embodiment,, still, needn't be defined in this to the fog collection unit is illustrated by the situation that the pent aeration parts 362 cylindraceous of an end constitute.Fog collection unit 360 is made of the cone shape aeration parts 362 that are protrusion at upstream side.Under this situation, whole fog collection unit 360 is made of aeration parts 362, can also makes the fore-end opening and shut-off block 364 is installed.In addition, radiant heat heater 370 can be along the outer surface configuration of aeration parts 362.
In addition, the shut-off block 364 that one end of aeration parts 362 is closed can be made of the parts that have aeration equally with aeration parts 362, but, by this shut-off block 364 is made of the parts that do not have aeration, stream (outer space 368) that the drop that is fed into whole liquid charging stocks of gasification space 350 from introducing port 338 is imported to form, between aeration parts 362 and the sleeve part 342 in the inboard of radiant heat heater 370.Thus, the heat ray of radiant heat heater 370 is acted on the drop of whole liquid charging stocks, and, and effectively conduct at the outer surface by radiant heat heater 370 direct-fired aeration parts 362.Therefore, the further high gasification efficiency of gas.
In addition,, still, this needn't be defined in, cylinder tubular in addition can also be formed casing 330, sleeve part 342, aeration parts 362 are formed situation cylindraceous and are illustrated.For example can form the rib tubular.In addition, the 300B of gasification portion can also constitute sleeve part 342 is not set.
(film formation device of second execution mode)
Below, describe with reference to the film formation device of accompanying drawing second execution mode of the present invention.Fig. 5 is the figure of summary structure example that is used to illustrate the film formation device 102 of second execution mode.Here, to describing by first liquid raw material vaporizer 304 with by the situation that connecting pipings 306 connected second liquid raw material vaporizers 308 constitute the liquid raw material vaporizer 302 that film formation device 102 utilized.In addition, about the structure beyond the liquid raw material vaporizer in the film formation device 102 of second execution mode 302, because it is identical with the film formation device 100 of first execution mode shown in Figure 1, therefore, in Fig. 5, the structural element with identical function structure is marked same reference numerals and omits its detailed explanation.
The liquid raw material vaporizer 302 of second execution mode has: make from the liquid charging stock gasification of liquid charging stock supply source 110 supplies and first liquid raw material vaporizer 304 of generation unstrpped gas; Second liquid raw material vaporizer 308 that the ejiction opening of the unstrpped gas that is generated via the connecting pipings 306 and first liquid raw material vaporizer 304 is connected makes from the unstrpped gas of the ejiction opening ejection of second liquid raw material vaporizer 308 and supplies with to film forming room 200 via unstrpped gas supplying tubing 132.
The structure example of second liquid raw material vaporizer 308 of second execution mode as shown in Figure 6.Second liquid raw material vaporizer 308 is the liquid raw material vaporizers that only are made of the 300B of gasification portion in the liquid raw material vaporizer 300 of first execution mode.Therefore, second liquid raw material vaporizer 308 is and the identical structure of the 300B of gasification portion shown in Figure 2 therefore, the structural element with identical function structure to be marked identical Reference numeral and the detailed description of omitting it.
One side's first liquid raw material vaporizer 304 is so long as make liquid charging stock gasification of supplying with from liquid charging stock supply source 110 and the liquid raw material vaporizer that generates unstrpped gas, and no matter its structure or kind etc. can be existing liquid raw material vaporizer.
According to such the present invention, in second liquid raw material vaporizer 308, make the aeration parts 362 of unstrpped gas that generate by first liquid raw material vaporizer 304, do not have complete vaporized drop also can gasify by second liquid raw material vaporizer 308 by first liquid raw material vaporizer 304 by bulk temperature is evenly risen.Thus, the drop that can prevent liquid charging stock flow into film forming room 200 etc. with unstrpped gas.In addition, owing to can prevent that to reduce the gasification that causes bad because of the local temperature of aeration parts 362, therefore, can prevent that the mesh of aeration parts 362 from stopping up.
More than, the limit is illustrated preferred implementation of the present invention with reference to the accompanying drawing limit, still, the invention is not restricted to described embodiment.So long as those skilled in the art puts down in writing in the category in the scope of patent request, various modifications or the modification that can expect are conspicuous, and these modifications or modification also belong to technical scope of the present invention certainly.
For example, liquid raw material vaporizer of the present invention can be applicable to MOCVD device, plasma CVD apparatus, ALD (atomic layer film forming) device, LP-CVD employed liquid raw material vaporizers such as (batch-type, longitudinal type, horizontal type, small-sized batch-types).
Industrial applicibility
Thereby the present invention can be applicable to liquid charging stock the gasify liquid raw material vaporizer that generates unstrpped gas and the film formation device that uses this liquid raw material vaporizer.
Claims (11)
1. a liquid raw material vaporizer is characterized in that, comprising:
The liquid charging stock supply unit that makes liquid charging stock become droplet-like and spray;
The liquid charging stock of described droplet-like is gasified and the gasification portion of generation unstrpped gas;
To import to the introducing port in the described gasification portion from the liquid charging stock of the described droplet-like of described liquid charging stock supply unit;
The fog collection unit that is configured in the described gasification portion and constitutes by the aeration parts, these aeration parts are by constituting by the heated material of radiant heat;
The radiant heat heater, this radiant heat heater shines heat ray to the whole outer surface of described aeration parts, and by this radiant heat described aeration parts is heated; With
Send mouth, this send mouthful will be by making described droplet-like liquid charging stock pass out to the outside by the heated described aeration parts unstrpped gas that generates that gasifies.
2. liquid raw material vaporizer as claimed in claim 1 is characterized in that:
The described introducing port of described gasification portion and the described mouth of sending are provided with in opposite directions,
Described aeration parts are from described importing oral-lateral to the described cylindrical shape that is disposed in the scope of oral-lateral of sending, and the end of described importing oral-lateral is closed, and the described end of sending oral-lateral mouthful is communicated with described sending.
3. liquid raw material vaporizer as claimed in claim 2 is characterized in that:
Described radiant heat heater disposes in the mode of the outer surface that surrounds described aeration parts.
4. liquid raw material vaporizer as claimed in claim 3 is characterized in that:
Described radiant heat heater is made of carbon heater.
5. liquid raw material vaporizer as claimed in claim 3 is characterized in that:
Between described aeration parts and described radiant heat heater, be provided with the partition member of tubular in the mode of surrounding described aeration parts, described partition member is separated the gasification space that liquid charging stock circulated of described droplet-like and the space that sets of described radiant heat heater
Described partition member is made of the heat ray that described radiant heat heater is shone parts that see through, that do not have aeration.
6. liquid raw material vaporizer as claimed in claim 5 is characterized in that:
Described partition member is made of quartz.
7. liquid raw material vaporizer as claimed in claim 1 is characterized in that, comprising:
The temperature sensor that the temperature of described aeration parts is measured; With
Control part, this control part be based on being controlled described radiant heat heater by the temperature of the described aeration parts of described temperature sensor measurement, thus with the adjustment of the described aeration parts temperature for regulation.
8. liquid raw material vaporizer as claimed in claim 7 is characterized in that:
The medial surface of casing that constitutes the housing of described gasification portion has been implemented mirror finish, thereby makes its outer surface towards described aeration parts so that the heat ray from described radiant heat heater is reflected.
9. liquid raw material vaporizer, this liquid raw material vaporizer generate unstrpped gas with making the liquid charging stock gasification other liquid raw material vaporizer is connected, and it is characterized in that, comprising:
The introducing port that the unstrpped gas that is generated by described other liquid raw material vaporizer is imported;
By the fog collection unit that the aeration parts constitute, these aeration parts are made of the material by the radiant heat heating;
The radiant heat heater makes the whole outer surface irradiation of heat ray to described aeration parts, and by this radiant heat described aeration parts is heated; With
Send mouth, this sends mouth makes the unstrpped gas from described other liquid raw material vaporizer that imports from described introducing port send to the outside by heated described aeration parts.
10. film formation device, this film formation device has film forming room, and the liquid raw material vaporizer that generates unstrpped gas from making the liquid charging stock gasification imports unstrpped gas, processed substrate is carried out film forming handle, and it is characterized in that described liquid raw material vaporizer comprises:
The liquid charging stock supply unit that makes described liquid charging stock become droplet-like and spray;
The liquid charging stock of described droplet-like is gasified and the gasification portion of generation unstrpped gas;
To import to the introducing port in the described gasification portion from the liquid charging stock of the described droplet-like of described liquid charging stock supply unit;
Be configured in the described gasification portion, by the fog collection unit that the aeration parts constitute, described aeration parts are made of the material by the radiant heat heating;
The radiant heat heater shines the whole outer surface of described aeration parts with heat ray, by this radiant heat described aeration parts is heated; With
Send mouth, this send mouthful will be by making described droplet-like liquid charging stock pass out to the outside by the heated described aeration parts unstrpped gas that generates that gasifies.
11. a film formation device has film forming room, the liquid raw material vaporizer that generates unstrpped gas from making the liquid charging stock gasification imports unstrpped gas, processed substrate is carried out film forming handle, and it is characterized in that:
Described liquid raw material vaporizer generates first liquid raw material vaporizer of unstrpped gas by making the liquid charging stock gasification and the second coupled liquid raw material vaporizer constitutes,
Described second liquid raw material vaporizer comprises:
The introducing port that the unstrpped gas that is generated by described first liquid raw material vaporizer is imported;
By the fog collection unit that the aeration parts constitute, these aeration parts are made of the material by the radiant heat heating;
Radiant heat heater, this radiant heat heater make heat ray shine the whole outer surface of described aeration parts, and by this radiant heat described aeration parts are heated;
Send mouth, this sends mouth makes the unstrpped gas from described first liquid raw material vaporizer that imports from described introducing port send to the outside by heated described aeration parts.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008027997A JP2009188266A (en) | 2008-02-07 | 2008-02-07 | Liquid raw material vaporizer and film-forming device using it |
| JP2008-027997 | 2008-02-07 | ||
| PCT/JP2008/072233 WO2009098815A1 (en) | 2008-02-07 | 2008-12-08 | Liquid material carburetor, and filming device using the carburetor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101939827A true CN101939827A (en) | 2011-01-05 |
| CN101939827B CN101939827B (en) | 2013-01-16 |
Family
ID=40951898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008801264743A Expired - Fee Related CN101939827B (en) | 2008-02-07 | 2008-12-08 | Liquid material carburetor, and filming device using the carburetor |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2009188266A (en) |
| KR (1) | KR101176737B1 (en) |
| CN (1) | CN101939827B (en) |
| WO (1) | WO2009098815A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103422075A (en) * | 2012-05-14 | 2013-12-04 | 中芯国际集成电路制造(上海)有限公司 | Method for forming film layer |
| CN106159113A (en) * | 2014-09-16 | 2016-11-23 | 三星显示有限公司 | The manufacture device of display device and the manufacture method of display device |
| CN110062883A (en) * | 2016-12-14 | 2019-07-26 | 日本特殊陶业株式会社 | Exhalation sensor |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8511583B2 (en) | 2010-02-05 | 2013-08-20 | Msp Corporation | Fine droplet atomizer for liquid precursor vaporization |
| JP5885564B2 (en) * | 2012-03-30 | 2016-03-15 | 株式会社ブイテックス | Vaporizer |
| CN105214568B (en) | 2014-06-10 | 2018-04-20 | 万华化学集团股份有限公司 | A kind of heater, the purposes of the heater and the method for preparing isocyanates using the heater |
| KR20200101981A (en) * | 2018-03-23 | 2020-08-28 | 가부시키가이샤 코쿠사이 엘렉트릭 | Vaporizer, substrate processing device, and manufacturing method of semiconductor device |
| KR102449994B1 (en) * | 2021-02-22 | 2022-10-04 | (주)탑크루 | Heating module for heating harmful gas in exhaust pipe and heating module for heating heat transfer gas injected into exhaust pipe |
| US20230062455A1 (en) * | 2021-09-01 | 2023-03-02 | Entegris, Inc. | Vaporizer assembly |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2795868B2 (en) * | 1989-01-23 | 1998-09-10 | アネルバ株式会社 | CVD equipment |
| DE4124018C1 (en) * | 1991-07-19 | 1992-11-19 | Leybold Ag, 6450 Hanau, De | |
| KR200173175Y1 (en) * | 1996-10-17 | 2000-03-02 | 김영환 | Vaporizer of liquid |
| JP3938391B2 (en) * | 1997-06-04 | 2007-06-27 | シーケーディ株式会社 | Liquid raw material vaporizer |
| JP4316341B2 (en) * | 2003-10-01 | 2009-08-19 | 東京エレクトロン株式会社 | Vaporizer and film forming apparatus |
| JP4601535B2 (en) * | 2005-09-09 | 2010-12-22 | 株式会社リンテック | A vaporizer capable of vaporizing liquid raw materials at low temperatures |
-
2008
- 2008-02-07 JP JP2008027997A patent/JP2009188266A/en active Pending
- 2008-12-08 KR KR1020107013745A patent/KR101176737B1/en not_active IP Right Cessation
- 2008-12-08 CN CN2008801264743A patent/CN101939827B/en not_active Expired - Fee Related
- 2008-12-08 WO PCT/JP2008/072233 patent/WO2009098815A1/en active Application Filing
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103422075A (en) * | 2012-05-14 | 2013-12-04 | 中芯国际集成电路制造(上海)有限公司 | Method for forming film layer |
| CN106159113A (en) * | 2014-09-16 | 2016-11-23 | 三星显示有限公司 | The manufacture device of display device and the manufacture method of display device |
| CN106159113B (en) * | 2014-09-16 | 2019-07-05 | 三星显示有限公司 | The manufacturing device of display device and the manufacturing method of display device |
| CN110062883A (en) * | 2016-12-14 | 2019-07-26 | 日本特殊陶业株式会社 | Exhalation sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20100116170A (en) | 2010-10-29 |
| CN101939827B (en) | 2013-01-16 |
| WO2009098815A1 (en) | 2009-08-13 |
| KR101176737B1 (en) | 2012-08-23 |
| JP2009188266A (en) | 2009-08-20 |
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