CN101923254B

CN101923254B - Process for manufacturing liquid crystal display

Info

Publication number: CN101923254B
Application number: CN 201010169521
Authority: CN
Inventors: 李绍文; 张海峰; 户为民; 陆晓莉; 曾贵全; 刘金权
Original assignee: Tianma Microelectronics Co Ltd
Current assignee: Wuhu Tianma Automotive Electronics Co ltd
Priority date: 2010-05-06
Filing date: 2010-05-06
Publication date: 2013-10-09
Anticipated expiration: 2030-05-06
Also published as: CN101923254A

Abstract

The invention provides a process for manufacturing a liquid crystal display. The liquid crystal display comprises two glass substrates, a liquid crystal and a spacer, wherein the liquid crystal and the spacer are formed between the two glass substrates; and the spacer is formed by the following steps of: forming a coating layer with preset thickness between the two glass substrates; and etching the coating layer to form the spacer. In the process for manufacturing the liquid crystal display, the spacer is formed by etching the coating layer and the thickness of the coating layer can be effectively controlled, so the thickness of the spacer can be controlled uniformly.

Description

Process for manufacturing liquid crystal display

Technical field

The present invention relates to a kind of manufacturing process, relate in particular to a kind of manufacturing process of LCD.

Background technology

Along with the fast development of electronic technology, the application of LCD more and more widely.

Usually, as shown in Figure 1, a kind of LCD 1 comprises lower glass substrate 2, transparency conducting layer 3, protective seam 4, alignment film 5, sept 7, frame 8 and liquid crystal 9.Wherein, this sept 7 is to be formed at up and down between two glass substrates 2 by powder injection process.

Yet not of uniform size, different by this sept 7 that powder injection process forms, namely this sept 7 that forms by powder injection process is influenced by powder injection process, and its randomness is stronger, and THICKNESS CONTROL is inhomogeneous.This sept 7 in uneven thickness makes the crushing resistance of this LCD 1 be affected easily.

Summary of the invention

At the inhomogeneous problem of the sept THICKNESS CONTROL of prior art LCD, the invention provides the uniform process for manufacturing liquid crystal display of a kind of sept THICKNESS CONTROL.

A kind of process for manufacturing liquid crystal display, this LCD comprises two glass substrates and is formed at two liquid crystal and a plurality of septs between the glass substrate, the formation of these a plurality of septs may further comprise the steps: at the transparency conducting layer of this glass baseplate surface photoetching formation space, wherein the material of this transparency conducting layer is tin indium oxide (ITO) or indium zinc oxide (IZO); By coating, exposure and etching, form protective seam in this layer at transparent layer, this protective seam is organic mixture; Form alignment film at this protective seam, formed this alignment film is cured; When this LCD periphery is not established the electrode cabling, remove this alignment film that is positioned at this glass substrate periphery; Generate the default coating of thickness at this protective seam and this alignment film, the interior thickness of this coating is less than its peripheral thickness; This coating of etching forms first separation material in the centre that is positioned at this glass substrate, forms second separation material at the periphery that is positioned at this glass substrate, and the size of this first separation material is less than the size of this second separation material; The last lower glass substrate applying that forms first, second separation material is formed liquid crystal cell, and on this, form frame between lower glass substrate; Pour into, solidify this liquid crystal, form this LCD.

This sept that forms by this coating of etching in the process for manufacturing liquid crystal display of the present invention is owing to this coating thickness can effectively be controlled, so this sept THICKNESS CONTROL is even.

Therefore, the LCD that is formed by process for manufacturing liquid crystal display of the present invention have in it sept THICKNESS CONTROL evenly, satisfy the advantage that any liquid crystal thick cell requires.

Description of drawings

Fig. 1 is a kind of cross-sectional view of LCD related to the present invention.

Fig. 2 is the cross-sectional view of LCD one preferred embodiments of process for manufacturing liquid crystal display formation of the present invention.

Fig. 3 is the synoptic diagram that forms transparency conducting layer in the manufacturing process of LCD shown in Figure 2.

Fig. 4 is the synoptic diagram that forms oriented film after Fig. 3 step.

Fig. 5 is the synoptic diagram that forms alignment film after Fig. 4 step.

Fig. 6 is the synoptic diagram that forms coating after Fig. 5 step.

Fig. 7 is the synoptic diagram that forms sept after Fig. 6 step.

Fig. 8 goes up the synoptic diagram that lower glass substrate is fitted into liquid crystal cell after Fig. 7 step.

Fig. 9 is the brilliant synoptic diagram that forms this LCD of perfusion liquid after Fig. 8 step.

Figure 10 is the structural representation of another preferred embodiments of LCD of process for manufacturing liquid crystal display formation of the present invention.

Figure 11 is the synoptic diagram that forms transparency conducting layer in the manufacturing process of LCD shown in Figure 10.

Figure 12 is the synoptic diagram that forms oriented film after Figure 11 step.

Figure 13 is the synoptic diagram that forms alignment film after Figure 12 step.

Figure 14 removes the synoptic diagram that is positioned at peripheral alignment film after Figure 13 step.

Figure 15 is the synoptic diagram that forms coating after Figure 14 step.

Figure 16 is the synoptic diagram that forms sept after Figure 15 step.

Figure 17 goes up the synoptic diagram that lower glass substrate is fitted into liquid crystal cell after Figure 16 step.

Figure 18 is the brilliant synoptic diagram that forms this LCD of perfusion liquid after Figure 17 step.

Embodiment

Below in conjunction with accompanying drawing process for manufacturing liquid crystal display of the present invention being reached the LCD that is formed by this manufacturing process describes.

See also Fig. 2 to Fig. 9, wherein, Fig. 2 is the structural representation of LCD 10 1 preferred embodiments that formed by process for manufacturing liquid crystal display of the present invention, and Fig. 3 to Fig. 9 is the structural representation of the process for making of this LCD 10.This LCD 10 comprises upper and lower glass substrate 20, transparency conducting layer 30, protective seam 40, alignment film 50, sept 70, frame 80 and liquid crystal 90.

See also Fig. 3 to Fig. 9, the process for making of this LCD 10 is as follows:

(1) as Fig. 3, forms transparency conducting layer 30.At first provide with the last lower glass substrate 20 that forms liquid crystal cell, at the transparency conducting layer 30 of this glass substrate 20 photomask surfaces formation space, wherein the material of this transparency conducting layer 30 is tin indium oxide (ITO) or indium zinc oxide (IZO);

(2) as Fig. 4, form protective seam 40.Form described protective seam 40 by steps such as coating, exposure and etchings on these transparency conducting layer 30 surfaces.This protective seam 40 is organic mixture, has characteristics such as printing opacity, insulation and anticorrosion, and according to manufacture craft and cost consideration, this step also can be omitted;

(3) as Fig. 5, form alignment film 50.Form these alignment films 50 at this protective seam 40, then formed this alignment film 50 be cured, the material that forms this alignment film 50 in the embodiment of the present invention be polyimide (polyimide, PI);

(4) as Fig. 6, form coating 60.This default coating 60 of coating thickness on this alignment film 50, the thickness of this coating 60 is set according to actual needs, and the material of this coating 60 is not limited by present embodiment with concrete manufacturing process, can select according to needs;

(5) as Fig. 7, etching forms sept 70.This coating 60 of etching is to form as this sept 70 that supports in the liquid crystal cell, and the pattern of this sept 70 and size can be pre-designed, and the concrete grammar of etching is also unrestricted.This sept 70 adopts circular pattern in the embodiment of the present invention, and pattern magnitude and concrete shape are not limited;

(6) as Fig. 8, fit into box.Last lower glass substrate 20 applyings that will be formed with this sept 70 form liquid crystal cell, and form this frame 80 20 of last lower glass substrate;

(7) as Fig. 9, perfusion, curing liquid crystal 90 form this LCD 10.

Because the periphery of this LCD 10 is provided with the electrode cabling among Fig. 2, be set to consistently so be positioned at thickness and the thickness of this sept 70 of this box of this sept 70 at these frame 80 places, satisfy the thick uniformity requirement of these LCD 10 boxes.

This sept 70 of establishing in this LCD 10 of the present invention is to form by etching on this default coating 60 of thickness, so the sept that more traditional powder injection process forms, these sept 70 thickness can be controlled preferably; Simultaneously, can be by the thickness of this sept 70 of the corresponding control of these coating 60 thickness of control, to satisfy the thick requirement of any liquid crystal cell.

To sum up, this sept 70 by this coating 60 of etching forms because these coating 60 thickness are effectively to control, so these sept 70 THICKNESS CONTROL are even, thereby satisfies any liquid crystal thick cell requirement.

Figure 10 is the structural representation of LCD 100 another preferred embodiments of being formed by process for manufacturing liquid crystal display of the present invention, and this LCD 100 comprises upper and lower glass substrate 200, transparency conducting layer 300, protective seam 400, alignment film 500, sept, frame 800 and liquid crystal 900.

Figure 11 is extremely shown in Figure 180 to be these LCD 100 process for making.This LCD 100 is identical to the manufacturing process that forms this alignment film 50 from forming this transparency conducting layer 30 with this LCD 10 to the manufacturing process that forms this alignment film 500 from forming this transparency conducting layer 300, and by forming the manufacturing process that this alignment film 500 step afterwards is different from this LCD 10, concrete difference is:

(1) as Figure 14, removes this alignment film 500 of part.Because these LCD 100 peripheries are not established the electrode cabling, so need remove this alignment film 500 that is positioned at these glass substrate 200 peripheries;

(2) as Figure 15, on this protective seam 400 and this alignment film 500, form coating 600 simultaneously.Namely generate the default coating 600 of thickness at this protective seam 400 and this alignment film 500, these coating 600 interior thicknesses are less than its peripheral thickness;

(3) as Figure 16 and Figure 17, etching forms sept, and this sept comprises first, second separation material 710,730.Namely form first separation material 710 by this coating 600 of etching in the centre that is positioned at this glass substrate 200, form second separation material 730 along these glass substrate 200 peripheries.First, second separation material 710,730 all adopts circular pattern in the present embodiment, and for guaranteeing that thickness is even in this liquid crystal cell, and the size of this first separation material 710 is less than the size of this second separation material 730;

(4) as Figure 17, fit into box.With form first, second separation material 710,730 last lower glass substrate 200 is fitted and is formed liquid crystal cells, and at 200 formation of last lower glass substrate frame 800;

(5) as Figure 18, pour into, solidify this liquid crystal 900, form this LCD 100.

LCD 10 different being of this LCD 100 and Fig. 2: these LCD 100 peripheries are not established the electrode cabling, are positioned at the thickness of first separation material 710 of this liquid crystal cell centre less than the thickness of second separation material 730 that is positioned at these frame 800 places.

Process for manufacturing liquid crystal display of the present invention, be to form first, second separation material 710,730 by this coating 600 of etching, and can control first, second separation material 710,730 thickness by the thickness of controlling this coating 600, more traditional powder injection process, first, second separation material 710,730 thickness can be controlled preferably.

To sum up, this sept 700 that forms by this coating of etching 600 is because these coating 600 thickness are effectively to control, so this first, second sept 710,730 THICKNESS CONTROL are even, can satisfy any liquid crystal thick cell requirement.

Understandable; LCD 10,100 sept 70, first, second separation material 710,730 also can be set directly at transparency conducting layer 30,300 according to LCD 10,100 concrete structure; that is to say when do not establish in the LCD 10,100 protective seam 40,400 and alignment film 50,500 the time, this sept 70, first, second separation material 710,730 can be set directly at transparency conducting layer 30,300.

Only be preferred case study on implementation of the present invention below, be not limited to the present invention, for a person skilled in the art, the present invention can have various changes and variation.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.

Claims

1. process for manufacturing liquid crystal display, this LCD comprises two glass substrates and is formed at two liquid crystal and a plurality of septs between the glass substrate that the formation of these a plurality of septs may further comprise the steps:

At the transparency conducting layer of this glass baseplate surface photoetching formation space, wherein the material of this transparency conducting layer is tin indium oxide (ITO) or indium zinc oxide (IZO);

By coating, exposure and etching, form protective seam in this layer at transparent layer, this protective seam is organic mixture;

Form alignment film at this protective seam, formed this alignment film is cured;

When this LCD periphery is not established the electrode cabling, remove this alignment film that is positioned at this glass substrate periphery;

Generate the default coating of thickness at this protective seam and this alignment film, the interior thickness of this coating is less than its peripheral thickness;

This coating of etching forms first separation material in the centre that is positioned at this glass substrate, forms second separation material at the periphery that is positioned at this glass substrate, and the size of this first separation material is less than the size of this second separation material;

The last lower glass substrate applying that forms first, second separation material is formed liquid crystal cell, and on this, form frame between lower glass substrate;

Pour into, solidify this liquid crystal, form this LCD.