CN101923254A - Process for manufacturing liquid crystal display - Google Patents

Process for manufacturing liquid crystal display Download PDF

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Publication number
CN101923254A
CN101923254A CN 201010169521 CN201010169521A CN101923254A CN 101923254 A CN101923254 A CN 101923254A CN 201010169521 CN201010169521 CN 201010169521 CN 201010169521 A CN201010169521 A CN 201010169521A CN 101923254 A CN101923254 A CN 101923254A
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China
Prior art keywords
liquid crystal
sept
thickness
crystal display
alignment film
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CN 201010169521
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Chinese (zh)
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CN101923254B (en
Inventor
李绍文
张海峰
户为民
陆晓莉
曾贵全
刘金权
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Wuhu Tianma Automotive Electronics Co ltd
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Tianma Microelectronics Co Ltd
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Abstract

The invention provides a process for manufacturing a liquid crystal display. The liquid crystal display comprises two glass substrates, a liquid crystal and a spacer, wherein the liquid crystal and the spacer are formed between the two glass substrates; and the spacer is formed by the following steps of: forming a coating layer with preset thickness between the two glass substrates; and etching the coating layer to form the spacer. In the process for manufacturing the liquid crystal display, the spacer is formed by etching the coating layer and the thickness of the coating layer can be effectively controlled, so the thickness of the spacer can be controlled uniformly.

Description

Process for manufacturing liquid crystal display
Technical field
The present invention relates to a kind of manufacturing process, relate in particular to a kind of manufacturing process of LCD.
Background technology
Along with the fast development of electronic technology, the application of LCD more and more widely.
Usually, as shown in Figure 1, a kind of LCD 1 comprises lower glass substrate 2, transparency conducting layer 3, protective seam 4, alignment film 5, sept 7, frame 8 and liquid crystal 9.Wherein, this sept 7 is to be formed at up and down between two glass substrates 2 by powder injection process.
Yet not of uniform size, different by this sept 7 that powder injection process forms, promptly this sept 7 that forms by powder injection process is influenced by powder injection process, and its randomness is stronger, and THICKNESS CONTROL is inhomogeneous.This sept 7 in uneven thickness makes the crushing resistance of this LCD 1 be affected easily.
Summary of the invention
At the uneven problem of sept THICKNESS CONTROL of prior art LCD, the invention provides the uniform process for manufacturing liquid crystal display of a kind of sept THICKNESS CONTROL.
A kind of process for manufacturing liquid crystal display, this LCD comprise two glass substrates and are formed at two liquid crystal and septs between the glass substrate that the formation of this sept may further comprise the steps: form the default coating of thickness between two glass substrates; This coating of etching forms this sept.
Preferably, this LCD comprises transparency conducting layer, and this sept is formed at this transparency conducting layer.
Preferably, this LCD comprises alignment film, and this sept is formed at this alignment film surface.
Preferably, this LCD comprises transparency conducting layer and protective seam, and this protective seam is formed at this transparency conducting layer, and this alignment film is formed at this protective seam.
Preferably, this sept consistency of thickness.
Preferably, this LCD comprises transparency conducting layer, and this alignment film is formed at this transparency conducting layer
Preferably, this LCD comprises transparency conducting layer, protective seam and the alignment film that forms successively, and this sept is formed at protective seam and alignment film.
Preferably, this sept thickness that is formed at protective seam is different with the sept thickness that is formed at alignment film.
Preferably, this sept thickness that is formed at protective seam is greater than the sept thickness that is formed at this alignment film.
This sept that forms by this coating of etching in the process for manufacturing liquid crystal display of the present invention is owing to this coating thickness can effectively be controlled, so this sept THICKNESS CONTROL is even.
Therefore, the LCD that forms by process for manufacturing liquid crystal display of the present invention have in it sept THICKNESS CONTROL evenly, satisfy the advantage that any liquid crystal thick cell requires.
Description of drawings
Fig. 1 is a kind of cross-sectional view of LCD related to the present invention.
Fig. 2 is the cross-sectional view of LCD one better embodiment of process for manufacturing liquid crystal display formation of the present invention.
Fig. 3 is the synoptic diagram that forms transparency conducting layer in the manufacturing process of LCD shown in Figure 2.
Fig. 4 is the synoptic diagram that forms oriented film after Fig. 3 step.
Fig. 5 is the synoptic diagram that forms alignment film after Fig. 4 step.
Fig. 6 is the synoptic diagram that forms coating after Fig. 5 step.
Fig. 7 is the synoptic diagram that forms sept after Fig. 6 step.
Fig. 8 goes up the synoptic diagram that lower glass substrate is fitted into liquid crystal cell after Fig. 7 step.
Fig. 9 is the brilliant synoptic diagram that forms this LCD of perfusion liquid after Fig. 8 step.
Figure 10 is the structural representation of another better embodiment of LCD of process for manufacturing liquid crystal display formation of the present invention.
Figure 11 is the synoptic diagram that forms transparency conducting layer in the manufacturing process of LCD shown in Figure 10.
Figure 12 is the synoptic diagram that forms oriented film after Figure 11 step.
Figure 13 is the synoptic diagram that forms alignment film after Figure 12 step.
Figure 14 removes the synoptic diagram that is positioned at peripheral alignment film after Figure 13 step.
Figure 15 is the synoptic diagram that forms coating after Figure 14 step.
Figure 16 is the synoptic diagram that forms sept after Figure 15 step.
Figure 17 goes up the synoptic diagram that lower glass substrate is fitted into liquid crystal cell after Figure 16 step.
Figure 18 is the brilliant synoptic diagram that forms this LCD of perfusion liquid after Figure 17 step.
Embodiment
Below in conjunction with accompanying drawing process for manufacturing liquid crystal display of the present invention being reached the LCD that is formed by this manufacturing process describes.
See also Fig. 2 to Fig. 9, wherein, Fig. 2 is the structural representation of LCD 10 1 better embodiment that formed by process for manufacturing liquid crystal display of the present invention, and Fig. 3 to Fig. 9 is the structural representation of the process for making of this LCD 10.This LCD 10 comprises upper and lower glass substrate 20, transparency conducting layer 30, protective seam 40, alignment film 50, sept 70, frame 80 and liquid crystal 90.
See also Fig. 3 to Fig. 9, the process for making of this LCD 10 is as follows:
(1), forms transparency conducting layer 30 as Fig. 3.At first provide with the last lower glass substrate 20 that forms liquid crystal cell, at the transparency conducting layer 30 of this glass substrate 20 photomask surfaces formation space, wherein the material of this transparency conducting layer 30 is tin indium oxide (ITO) or indium zinc oxide (IZO);
(2), form protective seam 40 as Fig. 4.Form described protective seam 40 by steps such as coating, exposure and etchings on these transparency conducting layer 30 surfaces.This protective seam 40 is an organic mixture, has characteristics such as printing opacity, insulation and anticorrosion, and according to manufacture craft and cost consideration, this step also can be omitted;
(3), form alignment film 50 as Fig. 5.On this protective seam 40, form this alignment film 50, then formed this alignment film 50 be cured, the material that forms this alignment film 50 in the embodiment of the present invention be polyimide (polyimide, PI);
(4), form coating 60 as Fig. 6.This default coating 60 of coating thickness on this alignment film 50, the thickness of this coating 60 is set according to actual needs, and the material of this coating 60 is not limited by present embodiment with concrete manufacturing process, can select according to needs;
(5) as Fig. 7, etching forms sept 70.This coating 60 of etching is to form as this sept 70 that supports in the liquid crystal cell, and the pattern of this sept 70 and size can be pre-designed, and the concrete grammar of etching is also unrestricted.This sept 70 adopts circular pattern in the embodiment of the present invention, and pattern magnitude and concrete shape are not limited;
(6), fit into box as Fig. 8.Last lower glass substrate 20 applyings that will be formed with this sept 70 form liquid crystal cell, and form this frame 80 20 of last lower glass substrate;
(7) as Fig. 9, perfusion, curing liquid crystal 90 form this LCD 10.
Because the periphery of this LCD 10 is provided with the electrode cabling among Fig. 2, be set to consistently so be positioned at thickness and the thickness of this sept 70 of this box of this sept 70 at these frame 80 places, satisfy the thick uniformity requirement of these LCD 10 boxes.
This sept 70 of establishing in this LCD 10 of the present invention is to form by etching on this default coating 60 of thickness, so the sept that more traditional powder injection process forms, these sept 70 thickness can be controlled preferably; Simultaneously, can be by the thickness of this sept 70 of the corresponding control of these coating 60 thickness of control, to satisfy the thick requirement of any liquid crystal cell.
To sum up, this sept 70 by this coating 60 of etching forms because these coating 60 thickness are effectively to control, so these sept 70 THICKNESS CONTROL are even, thereby satisfies any liquid crystal thick cell requirement.
Figure 10 is the structural representation of LCD 100 another better embodiment of being formed by process for manufacturing liquid crystal display of the present invention, and this LCD 100 comprises upper and lower glass substrate 200, transparency conducting layer 300, protective seam 400, alignment film 500, sept, frame 800 and liquid crystal 900.
Figure 11 is extremely shown in Figure 180 to be these LCD 100 process for making.This LCD 100 is identical to the manufacturing process that forms this alignment film 50 from forming this transparency conducting layer 30 with this LCD 10 to the manufacturing process that forms this alignment film 500 from forming this transparency conducting layer 300, and by forming the manufacturing process that this alignment film 500 step afterwards is different from this LCD 10, concrete difference is:
(1), removes this alignment film 500 of part as Figure 14.Because these LCD 100 peripheries are not established the electrode cabling, so need remove this alignment film 500 that is positioned at these glass substrate 200 peripheries;
(2), on this protective seam 400 and this alignment film 500, form coating 600 simultaneously as Figure 15.Promptly generate the default coating 600 of thickness on this protective seam 400 and this alignment film 500, these coating 600 interior thicknesses are less than its peripheral thickness;
(3) as Figure 16 and Figure 17, etching forms sept, and this sept comprises first, second separation material 710,730.Promptly form first separation material 710 in the centre that is positioned at this glass substrate 200, form second separation material 730 along these glass substrate 200 peripheries by this coating 600 of etching.First, second separation material 710,730 all adopts circular pattern in the present embodiment, and for guaranteeing that thickness is even in this liquid crystal cell, and the size of this first separation material 710 is less than the size of this second separation material 730;
(4), fit into box as Figure 17.Last lower glass substrate 200 applyings that form first, second separation material 710,730 are formed liquid crystal cell, and form frame 800 200 of last lower glass substrate;
(5) as Figure 18, pour into, solidify this liquid crystal 900, form this LCD 100.
LCD 10 different being of this LCD 100 and Fig. 2: these LCD 100 peripheries are not established the electrode cabling, and the thickness of first separation material 710 that is positioned at this liquid crystal cell centre is less than the thickness of second separation material 730 that is positioned at these frame 800 places.
Process for manufacturing liquid crystal display of the present invention, be to form first, second separation material 710,730 by this coating 600 of etching, and can control the thickness of first, second separation material 710,730 by the thickness of controlling this coating 600, more traditional powder injection process, first, second separation material 710,730 thickness can be controlled preferably.
To sum up, by this sept 700 of these coating 600 formation of etching, because these coating 600 thickness are effectively to control, so these first, second sept 710,730 THICKNESS CONTROL are even, can satisfy any liquid crystal thick cell requirement.
Understandable; the sept 70 of LCD 10,100, first, second separation material 710,730 also can be set directly at transparency conducting layer 30,300 according to the concrete structure of LCD 10,100; that is to say that this sept 70, first, second separation material 710,730 can be set directly at transparency conducting layer 30,300 when not establishing protective seam 40,400 and alignment film 50,500 in the LCD 10,100.
Only be preferred case study on implementation of the present invention below, be not limited to the present invention, for a person skilled in the art, the present invention can have various changes and variation.Within the spirit and principles in the present invention all, any modification of being done, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (9)

1. process for manufacturing liquid crystal display, this LCD comprises two glass substrates and is formed at two liquid crystal and septs between the glass substrate that the formation of this sept may further comprise the steps:
Between two glass substrates, form the default coating of thickness;
This coating of etching forms this sept.
2. process for manufacturing liquid crystal display according to claim 1 is characterized in that: this LCD comprises transparency conducting layer, and this sept is formed at this transparency conducting layer.
3. process for manufacturing liquid crystal display according to claim 1 is characterized in that: this LCD comprises alignment film, and this sept is formed at this alignment film surface.
4. process for manufacturing liquid crystal display according to claim 3 is characterized in that: this LCD comprises transparency conducting layer and protective seam, and this protective seam is formed at this transparency conducting layer, and this alignment film is formed at this protective seam.
5. process for manufacturing liquid crystal display according to claim 4 is characterized in that: this sept consistency of thickness.
6. process for manufacturing liquid crystal display according to claim 3 is characterized in that: this LCD comprises transparency conducting layer, and this alignment film is formed at this transparency conducting layer.
7. process for manufacturing liquid crystal display according to claim 1 is characterized in that: this LCD comprises transparency conducting layer, protective seam and the alignment film that forms successively, and this sept is formed at protective seam and alignment film.
8. process for manufacturing liquid crystal display according to claim 7 is characterized in that: this sept thickness that is formed at protective seam is different with the sept thickness that is formed at alignment film.
9. process for manufacturing liquid crystal display according to claim 8 is characterized in that: this sept thickness that is formed at protective seam is greater than the sept thickness that is formed at this alignment film.
CN 201010169521 2010-05-06 2010-05-06 Process for manufacturing liquid crystal display Active CN101923254B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105044988A (en) * 2015-08-20 2015-11-11 南京大学 Liquid crystal polarization converter, preparation method and vector photoalignment system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874461A (en) * 1986-08-20 1989-10-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing liquid crystal device with spacers formed by photolithography
CN1154866C (en) * 1997-02-05 2004-06-23 国际商业机器公司 Improvements in liquid crystal display
CN2857051Y (en) * 2005-12-19 2007-01-10 比亚迪股份有限公司 LCD device able to control thickness of liquid crystal layer
CN1916737A (en) * 2006-09-13 2007-02-21 友达光电股份有限公司 Liquid crystal display plate, and fabricating method
CN101246285A (en) * 2007-02-14 2008-08-20 展茂光电股份有限公司 Method for producing light sensitive spacer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874461A (en) * 1986-08-20 1989-10-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing liquid crystal device with spacers formed by photolithography
CN1154866C (en) * 1997-02-05 2004-06-23 国际商业机器公司 Improvements in liquid crystal display
CN2857051Y (en) * 2005-12-19 2007-01-10 比亚迪股份有限公司 LCD device able to control thickness of liquid crystal layer
CN1916737A (en) * 2006-09-13 2007-02-21 友达光电股份有限公司 Liquid crystal display plate, and fabricating method
CN101246285A (en) * 2007-02-14 2008-08-20 展茂光电股份有限公司 Method for producing light sensitive spacer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105044988A (en) * 2015-08-20 2015-11-11 南京大学 Liquid crystal polarization converter, preparation method and vector photoalignment system
CN105044988B (en) * 2015-08-20 2017-11-24 南京大学 A kind of liquid crystal polarized converter, preparation method and the photo orientated system of vector

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Address after: 3rd Floor, Building B1, Wanjiang Fortune Plaza, No. 88 Ruixiang Road, Guandou Street, Jiujiang District, Wuhu City, Anhui Province 241060

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Address before: 518000, Guangdong, Shenzhen, Futian District Shennan Road, building 22, South Airlines

Patentee before: Tianma Micro-Electronics Co.,Ltd.