CN101907589B - Harmonic micrometer/nanometre film thermal property test method - Google Patents
Harmonic micrometer/nanometre film thermal property test method Download PDFInfo
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Abstract
The invention discloses a harmonic micrometer/nanometre film thermal property test method. The method is characterized in that a minitype metal detector directly deposited on film/substrate sample structures to be tested is utilized for detecting thermal parameters of each layer of the film structure. The film/substrate sample structures are arranged in parallel at the inner cavity bottom of a constant temperature vacuum cavity during test. One end of a thermocouple of a temperature regulation system is inserted in the inner cavity, and the other end is electrically connected with a temperature controller. A TEC heating/cooling device is tightly attached to the inner cavity and arranged in a thermal insulating layer, and is controlled to start or stop by the temperature controller. A vacuum-pumping system is externally connected with the inner cavity. A harmonic measurement unit is electrically connected with the minitype metal detector, and harmonic is utilized for measuring fundamental wave voltage real parts and third harmonic voltage real parts at both ends of a metal band in the middle section of the minitype metal detector in the relevant frequency range. The heat conductivity coefficients and the thermal diffusivity parameters of the substrate surface single/multiple layer micrometer/nanometre film structures are fitted according to the harmonic test principle.
Description
Technical field
The present invention relates to technical field of measurement and test; Be to exchange the method that heating harmonic method is measured micrometer/nanometre film thermal property parameter (like coefficient of heat conductivity and thermal diffusivity etc.), particularly be applied to the method for substrate surface single/multiple layer micro-/ nano membrane structure thermal physical property parameter test about a kind of utilization.
Background technology
In micro-/ nano technological applications field, be a significant challenge that faces at present to the measurement of the thermal parameter of micro-/ nano yardstick film.Up to now, owing to the demand to micro-/ nano material thermophysical property data, people have been developed various test.The measuring method that is applicable to the micro-nano-scale film at present mainly contains two types: the cycle exchanges calorimetry and based on the flicker method of LASER HEATING.Though the cycle exchange calorimetry through the improvement thermal source after measure thickness be the film below the 500nm, this method directly measurement be thermal diffusivity, derive thermal conductivity then, the accuracy of measurement result and the uncertainty of thermal capacitance etc. are relevant.Though the improved flicker method based on LASER HEATING can directly be tested thermal conductivity, only the film for micron thickness has measuring accuracy preferably, and relatively more difficult for the test of the nano thin-film below the 500nm.In addition, a kind of more advanced material structure is the structure that plane of crystal deposits the multi-layer nano thick film in the micro-/ nano material, yet current measuring methods all can't characterize the coefficient of heat conductivity and the thermal diffusion coefficient of each layer nanometer thickness film exactly.To above-mentioned these problems; We have invented and have a kind ofly heated based on alternating current; The method of single, the hot rerum natura of multi-layer film structure that is suitable for measuring little, nano-scale that combines the harmonic wave Detection Techniques simultaneously can be measured the coefficient of heat conductivity and the thermal diffusivity parameter of substrate surface single/multiple layer micro-/ nano membrane structure simultaneously.
Summary of the invention
The present invention seeks to solve the technological deficiency that existing film thermophysical property measurement method can't be measured a plurality of thermal physical property parameters of nanometer thickness film exactly simultaneously and can't measure multilayer micro-/ nano membrane structure.For this reason; The present invention provides a kind of harmonic wave method micrometer/nanometre film thermal property method of testing; This method, effectively reduced radiation influence, the heat wave investigation depth is adjustable, and a plurality of thermal physical property parameters such as coefficient of heat conductivity and thermal diffusivity that can be used for substrate surface single/multiple layer micro-/ nano membrane structure are tested simultaneously.
For reaching said purpose, technical solution of the present invention is:
A kind of harmonic wave method micrometer/nanometre film thermal property method of testing, it comprises that step is following:
Step 1: the employing magnetron sputtering technique deposits skim Ti or Ge metal earlier on the membrane structure surface, to strengthen the adhesive strength of detector, on Ti or Ge metal level, deposits one deck Pt or the Au metal film material as the micro metal detector again;
Step 2: adopt photoetching process on Pt or Au metal film, to make miniature four pad detectors that comprise the interlude metal tape;
Step 3: place the constant temperature vacuum chamber to the membrane structure that has the micro metal detector, the start-up temperature regulating system makes in the constant temperature vacuum chamber and meets the requirements of temperature;
Step 4: open pumped vacuum systems, treat to close pumped vacuum systems after the interior vacuum tightness of constant temperature vacuum chamber reaches requirement;
Step 5: four lead ends of micro metal detector are connected harmonic measurement unit; The simple sinusoidal alternating current of feeding certain amplitude for the micro metal detector is measured the fundamental voltage real part of interlude metal tape in the correlated frequency scope and the effective value of third harmonic voltage real part;
Step 6: calculate corresponding micro metal detector temperature rise value of real part according to the third harmonic voltage real part with fundamental voltage real part measured value, the relation curve of record and analysis temperature rise real part and logarithm frequency;
Step 7: according to the coefficient of heat conductivity and the thermal diffusivity parameter of harmonic wave method test philosophy match single/multiple layer micro-/ nano membrane structure.
Described harmonic wave method micrometer/nanometre film thermal property method of testing; In its said step 1, for the single thin film structure, through thermal oxide or chemogenic deposit or vacuum sputtering prepared on substrate; For multi-layer film structure, multilayer film are made through repeating above-mentioned technology.
Described harmonic wave method micrometer/nanometre film thermal property method of testing; In its said step 5; The micro metal detector adopts faint cycle sinusoidal current heating; During test, adjust the fundamental voltage of said micro metal detector, the third harmonic voltage in the middle of making between two lead ends is near tens to hundreds of μ V.
Described harmonic wave method micrometer/nanometre film thermal property method of testing, its said faint cycle sinusoidal current, its amplitude size is several milliamperes.
Described harmonic wave method micrometer/nanometre film thermal property method of testing, in its said step 5, the correlated frequency scope is generally hundreds of to several ten thousand Hz for single thin film/substrat structure, is generally less than 1KHz for multilayer film/substrat structure.
Described harmonic wave method micrometer/nanometre film thermal property method of testing, when if its said micro metal detector material therefor was metal Pt, the metal that is used to strengthen adhesive strength adopted Ti; During for metal A u, be used to strengthen the metal employing Ge of adhesive strength.
Described harmonic wave method micrometer/nanometre film thermal property method of testing, the thickness range of each layer film in its said membrane structure is 50～500nm for the nanometer thickness film, is 1～10 μ m for the micron thick film; The thickness range of micro metal detector is 100～300nm, and width range is 8～100 μ m, and the total length scope is 3～10mm, and the effective length of interlude metal tape is 2～8mm; Strengthening adhesive strength metal layer thickness scope is 5～20nm; The length of four pads or width range are 200～1500 μ m.
Described thermal physical property of single conductive filamentary material by using harmonic method method of testing, it is used to measure the coefficient of heat conductivity and the thermal diffusivity parameter of substrate surface single/multiple layer micro-/ nano membrane structure.
Beneficial effect of the present invention: the present invention can solve the problem that the method that is used for the film thermophysical property measurement at present can't characterize a plurality of thermal physical property parameters of nanometer thickness film exactly simultaneously and can't measure multilayer micro-/ nano membrane structure to a great extent; Can effectively reduce the influence of radiation with a micro metal detector; Scalable heat wave investigation depth is again measured when can realize coefficient of heat conductivity and the thermal diffusivity of substrate surface single/multiple layer micro-/ nano membrane structure.
The micro metal detector adopts four pad structures, can effectively eliminate the influence of micro metal strap end portion heat radiation, owing to adopt the mode of connection of four-wire system, the influence of contact resistance and thermal contact resistance can be ignored during measurement simultaneously.
Compare with existing film thermophysical property measurement method, the present invention can effectively reduce influence and other thermal loss of radiation; The degree of depth that heat wave can be surveyed can realize through the frequency that changes the input AC current signal; Utilize this method can obtain the coefficient of heat conductivity and the thermal diffusivity of substrate surface micro-/ nano membrane structure simultaneously.Because the spacing of the lead-in wire spare of micro metal detector can adjust when design, makes the effective length of micro metal detector to adjust, and can reduce the influence of little metal tape end effect.
Description of drawings
Fig. 1 is a micro metal detector synoptic diagram of the present invention;
Fig. 2 is metal tape of the present invention and substrate surface membrane structure sectional view;
Fig. 3 is that substrate surface membrane structure of the present invention, constant temperature vacuum chamber, humidity control system are connected synoptic diagram with pumped vacuum systems;
Fig. 4 is the structural representation of harmonic measurement unit of the present invention.
The main element explanation:
Substrate surface membrane structure 2 comprises: substrate 21, the first film layer 22, second thin layer 23 ..., N thin layer 2 (N+1);
Constant temperature vacuum chamber 3 comprises: metal shell 31, heat-insulation layer 32 and inner chamber 33;
Humidity control system 4 comprises: thermopair 41, TEC heating/cooling device 42 and temperature controller 43;
Pumped vacuum systems 5;
Embodiment
Specify each related detailed problem in the technical scheme of the present invention below in conjunction with accompanying drawing.Be to be noted that described embodiment only is intended to be convenient to understanding of the present invention, and the present invention is not played any qualification effect.
A kind of harmonic wave method micrometer/nanometre film thermal property method of testing of the present invention; Relate to the technical scheme that combines the harmonic wave Detection Techniques with alternating current heating micro metal detector, measurement when realizing that coefficient of heat conductivity to substrate surface single/multiple layer micro-/ nano membrane structure is with the thermal diffusivity parameter.The step that harmonic wave method micrometer/nanometre film thermal property method of testing realizes is following: 1. adopt magnetron sputtering technique to deposit skim metal 13 (Ti or Ge) earlier on the membrane structure surface to strengthen the adhesive strength of detector body (metal tape 11 and four lead-in wire parts 121～124), deposit the material of layer of metal film (Pt or Au) as the micro metal detector body again; 2. adopt photoetching process on Pt or Au metal film, to make miniature four pad detectors (metal tape 11 and four lead-in wire parts 121 to 124), four pads are four lead-in wire parts 121～124 of micro metal detector; 3. place constant temperature vacuum chamber 3 to membrane structure 2, start-up temperature regulating system 4 makes in the constant temperature vacuum chamber 3 and meets the requirements of temperature; 4. open pumped vacuum systems 5, treat to close pumped vacuum systems 5 after constant temperature vacuum chamber 3 interior vacuum tightnesss reach requirement; 5. four lead end 6a～6d that four the lead end 12a～12d of micro metal detector 1 connected harmonic measurement unit 6; Feed the simple sinusoidal alternating current of certain amplitude for micro metal detector 1, measure the fundamental voltage real part of interlude metal tape 11 in the correlated frequency scope and the effective value of third harmonic voltage real part; 6. calculate corresponding micro metal detector 1 temperature rise value of real part according to the third harmonic voltage real part with fundamental voltage real part measured value, the relation curve of record and analysis temperature rise real part and logarithm frequency; 7. according to the coefficient of heat conductivity and the thermal diffusivity parameter of harmonic wave method test philosophy match single/multiple layer micro-/ nano membrane structure 2.It is the cycle weak current heating of ω that said micro metal detector 1 adopts angular frequency, and its amplitude size is several milliamperes.During test, adjust the fundamental voltage of said detector, the third harmonic voltage that makes interlude metal tape 11 is near tens to hundreds of μ V.Third harmonic voltage can not be too big or too little; Third harmonic voltage means that too greatly input current is bigger; Radiation loss is also bigger, the too little then extraneous as easy as rolling off a log stability that influences measuring-signal of noise of third harmonic voltage, the reliability of the data that the both collects influence.
Please refer to the implement device of the harmonic wave method micrometer/nanometre film thermal property method of testing shown in Fig. 1, Fig. 2, Fig. 3 and Fig. 4; Fig. 3 illustrates this device; Contain: micro metal detector 1, substrate surface membrane structure 2, constant temperature vacuum chamber 3, humidity control system 4, pumped vacuum systems 5, harmonic measurement unit 6 (harmonic measurement unit does not make marks in Fig. 3), wherein:
Please refer to Fig. 3 the surface that micro metal detector 1 is deposited on substrate surface membrane structure 2 is shown; Substrate surface membrane structure 2 is placed in parallel in 33 ends of inner chamber of constant temperature vacuum chamber 3; Thermopair 41 1 ends of humidity control system 4 insert in the inner chamber 33, and the other end is electrically connected temperature controller 43, and TEC heating/cooling device 42 is close to inner chamber 33 and is placed heat-insulation layer 32; Pumped vacuum systems 5 external inner chambers 33; Harmonic measurement unit 6 is electrically connected with four lead end 12a to 12d of micro metal detector 1; Measure the fundamental voltage at intermetallic metal band 11 two ends in the correlated frequency scope and the real part effective value of third harmonic voltage with the harmonic wave method, according to the coefficient of heat conductivity and the thermal diffusivity parameter of harmonic wave method test philosophy match substrate surface membrane structure 2 each layer film sample.
Any in theory metal of micro metal detector material therefor is all right, but in the reality, generally selects the metal of the big and linear variation of resistance following temperature rising of temperature-coefficient of electrical resistance.The metal of Chang Zuowei temperature sensor has Pt and Au.If when adopting metal Pt, the cushion metal that is used to strengthen adhesive strength should adopt Ti; If when adopting metal A u, the cushion metal that is used to strengthen adhesive strength should adopt Ge.Micro metal detector 1 is deposited on substrate surface membrane structure 2 surfaces through magnetron sputtering technique, prepares the shape that needs through photoetching process again.Micro metal detector 1 is generally very little, connects lead for four lead-in wire parts 121～124 and can not adopt conventional scolding tin or the bonding method of elargol, and should use the method for spun gold ball bond or spot welding to connect diameter through microscopically be the conduction spun gold of tens micron dimensions.
The thickness range of thin layer 22～2 to be measured (N+1) is 50～500nm for the nanometer thickness film, is 1～10 μ m for the micron thick film; The thickness range of metal detector 1 is 100～300nm, and width range is 8～100 μ m, and the total length scope is 3～10mm, and interlude metal tape effective length is 2～8mm; The thickness range that strengthens adhesive strength cushion 13 is 5～20nm; The length or the width range of four lead-in wire parts 121～124 are 200～1500 μ m.
Please refer to Fig. 3 illustrates; Said constant temperature vacuum chamber comprises: a metal shell 31, a heat-insulation layer 32 and an inner chamber 33; Wherein: the outside of heat-insulation layer 32 is close in the inboard of metal shell 31, and the inboard of heat-insulation layer 32 surrounds the outside of inner chamber 33, the approximate formation of three concentric cylinder body structure; Substrate surface membrane structure 2 parallel being placed at 33 ends of inner chamber; The side perforate of inner chamber 33 is connected with pumped vacuum systems 5.
Said humidity control system comprises: a thermopair 41, a TEC heating/cooling device 42 and a temperature controller 43; Thermopair 41 1 ends insert in the inner chamber 33, and the other end is electrically connected temperature controller 43; TEC heating/cooling device 42 is close to inner chamber 33 and is placed heat-insulation layer 32, and is controlled start and stop by temperature controller 43.The reading of thermopair 41 is delivered to temperature controller 43 by set algorithm decision hot/cold amount, thereby realizes temperature automatically controlled to inner chamber 33 by the action of the output order control TEC heating/cooling device 42 of temperature controller 43 again.
Described harmonic wave method micrometer/nanometre film thermal property method of testing is used to measure the coefficient of heat conductivity and the thermal diffusivity parameter of substrate surface single/multiple layer micro-/ nano membrane structure.
Fig. 1, Fig. 2, Fig. 3 and Fig. 4 form the implement device of harmonic wave method micrometer/nanometre film thermal property method of testing; Wherein the structure for amplifying of micro metal detector among Fig. 3 and Fig. 41 and substrate surface membrane structure 2 is seen Fig. 1 and Fig. 2; The particular location of substrate surface membrane structure 2 is seen Fig. 3 during test; Four lead end 12b, 12c and 12a of the micro metal detector 1 among Fig. 3,12d pass through harmonic wave detecting voltage lead end 6b, 6c and current feed end 6a, the 6d of the harmonic measurement unit 6 of lead map interlinking 4 respectively.
Feeding angular frequency for micro metal detector 1 is the cycle weak current of ω; The heat that produces because of Joule effect will heat metal tape 11 with the frequency of 2 ω; Produce frequency different temperature ripple; The resistance that causes metal tape 11 increases, and the resistance that metal tape 11 increases is the periodic current acting in conjunction generation frequency different voltages with different harmonic wave of ω with angular frequency.Fundamental voltage real part wherein and third harmonic voltage real part are measured and record by harmonic wave probe unit 6.For substrate surface single thin film structure, calculate the temperature rise of metal tape 11 by fundamental voltage real part and third harmonic voltage real part, can confirm the thermal conductivity and the thermal diffusivity of film again according to the relation of temperature rise and frequency; For the substrate surface multi-layer film structure, calculate the entire thermal resistance of substrate surface multi-layer film structure by fundamental voltage real part and third harmonic voltage real part, simulate the coefficient of heat conductivity and the thermal diffusivity parameter of each layer film simultaneously according to multilayer film thermal resistance model.Coefficient of heat conductivity and the thermal diffusivity parameter of utilizing theoretical model that the present invention proposes and data processing method can measure substrate surface single/multiple layer micro-/ nano membrane structure simultaneously.
It is the cycle weak current heating micro metal detector 1 of ω that the present invention adopts angular frequency, and through changing the size of angular frequency, the heat effect degree of depth of detection is also along with variation, and the heat effect degree of depth and ω
0.5Be inversely proportional to.For the film of different-thickness, the suitable heat effect degree of depth is not quite similar, and the survey frequency scope of therefore choosing also is not quite similar.Before formal the measurement, should carry out preliminary surveying to the third harmonic real part in the frequency range widely at one; For substrate surface single thin film structure, the third harmonic real part of selection reduces to occur the frequency range of frequency range for being fit to that straight line increases phenomenon with frequency; For the substrate surface multi-layer film structure, each layer film coefficient of heat conductivity is bigger to the sensitivity coefficient of surface resistance of heat transfer real component under the low frequency, should under low frequency, utilize the coefficient of heat conductivity and the thermal diffusion of each layer of real component match of third harmonic as far as possible.For the substrate surface multi-layer film structure; The coefficient of heat conductivity of each layer and the reconstruct of thermal diffusivity belong to the multi-parameter fitting problem, generally set up an objective function, through iterative algorithm; Calculating objective function is minimum value, can confirm the coefficient of heat conductivity and the thermal diffusivity value of each layer film simultaneously.The coefficient of heat conductivity scope of the film of the present invention's test is at 1～200Wm
-1K
-1Between, the uncertainty of measurement of coefficient of heat conductivity is less than ± 5.4%, and the uncertainty of measurement of thermal diffusion coefficient is less than ± 8%.
During test, four parallel lead wire end 12a～12d of micro metal detector 1 are connected with harmonic wave probe unit 6 respective terminal 6a～6d through lead; Be positioned over substrate surface membrane structure 2 in the constant temperature vacuum chamber 3, start-up temperature regulating system 4 makes in the constant temperature vacuum chamber 3 and meets the requirements of temperature; Open pumped vacuum systems 5, treat to close pumped vacuum systems 5 after constant temperature vacuum chamber 3 interior vacuum tightnesss reach requirement; Give 65 1 about 10mV of very faint signal of signal generator, regulate the maximum resistance that the adjustable resistance R9 that connects is approaching or possibly reach greater than micro metal detector 1 in the measuring process slightly; (size of current amplitude should guarantee that third harmonic voltage amplitude size is about 10-100 μ V to give the simple sinusoidal alternating current that micro metal detector 1 feeds certain amplitude; And the third harmonic amplitude is more stable when measuring), the fundamental voltage real part and the third harmonic voltage real part of micro metal detector 1 interlude metal tape in the measurement correlated frequency scope; Start-up temperature regulating system 4 makes constant temperature vacuum chamber 3 arrive another temperature, writes down the resistance value of micro metal detector 1 interlude metal tape under this temperature; Repeat above-mentioned steps until resistance value of noting and corresponding temperature value reach ten groups or more than, calculate the temperature-coefficient of electrical resistance of metal tape 11; Coefficient of heat conductivity and thermal diffusivity parameter according to each layer film in the harmonic wave method test philosophy match substrate surface membrane structure 2.
See also the structure that Fig. 4 illustrates harmonic measurement unit 6 of the present invention, harmonic measurement unit 6 comprises: first operational amplifier 61, second operational amplifier 62, the 3rd operational amplifier 63, prime amplifier 64, signal generator 65, lock-in amplifier 66, system controlled by computer and data acquisition system (DAS) 67, the first low temperature drift resistance R 1, the second low temperature drift resistance R 2, the 3rd low temperature drift resistance R 3, the 4th low temperature drift resistance R 4, the 5th low temperature drift resistance R 5, the 6th low temperature drift resistance R 6, the 7th low temperature drift resistance R 7, the 8th low temperature drift resistance R 8, adjustable resistance R9, the first current feed end 6a, the second current feed end 6d, the first detecting voltage lead end 6b, the second detecting voltage lead end 6c.
The above; Be merely the embodiment among the present invention, but protection scope of the present invention is not limited thereto, anyly is familiar with this technological people in the technical scope that the present invention disclosed; Can understand conversion or the replacement expected; All should be encompassed in of the present invention comprising within the scope, therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (6)
1. a harmonic wave method micrometer/nanometre film thermal property method of testing is characterized in that, comprises that step is following:
Step 1: the employing magnetron sputtering technique deposits skim Ti or Ge metal earlier on the membrane structure surface, to strengthen the adhesive strength of detector, on Ti or Ge metal level, deposits one deck Pt or the Au metal film material as the micro metal detector again;
Step 2: adopt photoetching process on Pt or Au metal film, to make miniature four pad detectors that comprise the interlude metal tape;
Step 3: place the constant temperature vacuum chamber to the membrane structure that has the micro metal detector, the start-up temperature regulating system makes in the constant temperature vacuum chamber and meets the requirements of temperature;
Step 4: open pumped vacuum systems, treat to close pumped vacuum systems after the interior vacuum tightness of constant temperature vacuum chamber reaches requirement;
Step 5: four lead ends of micro metal detector are connected harmonic measurement unit; The simple sinusoidal alternating current of feeding certain amplitude for the micro metal detector is measured the fundamental voltage real part of interlude metal tape in the correlated frequency scope and the effective value of third harmonic voltage real part;
Step 6: calculate corresponding micro metal detector temperature rise value of real part according to the third harmonic voltage real part with fundamental voltage real part measured value, the relation curve of record and analysis temperature rise real part and logarithm frequency;
Step 7: according to the coefficient of heat conductivity and the thermal diffusivity parameter of harmonic wave method test philosophy match single/multiple layer micro-/ nano membrane structure;
In the said step 1, for the single thin film structure, on substrate, for multi-layer film structure, multilayer film are made through repeating above-mentioned technology through thermal oxide or chemogenic deposit or vacuum sputtering prepared;
In the said step 5, the micro metal detector adopts faint cycle sinusoidal current heating, during test, adjusts the fundamental voltage of said micro metal detector, and the third harmonic voltage tens in the middle of making between two lead ends is to hundreds of μ V.
2. harmonic wave method micrometer/nanometre film thermal property method of testing as claimed in claim 1 is characterized in that, said faint cycle sinusoidal current, and its amplitude size is several milliamperes.
3. harmonic wave method micrometer/nanometre film thermal property method of testing as claimed in claim 1 is characterized in that, in the said step 5, the correlated frequency scope is for single thin film/substrat structure, for hundreds of to several ten thousand Hz, for multilayer film/substrat structure, for less than 1KHz.
4. harmonic wave method micrometer/nanometre film thermal property method of testing as claimed in claim 1 is characterized in that, when being metal Pt as if micro metal detector material therefor, is used to strengthen the metal employing Ti of adhesive strength; During for metal A u, be used to strengthen the metal employing Ge of adhesive strength.
5. harmonic wave method micrometer/nanometre film thermal property method of testing as claimed in claim 1 is characterized in that the thickness range of each layer film in the said membrane structure is 50～500nm for the nanometer thickness film, is 1～10 μ m for the micron thick film; The thickness range of micro metal detector is 100～300nm, and width range is 8～100 μ m, and the total length scope is 3～10mm, and interlude metal tape effective length is 2～8mm; Strengthening adhesive strength metal layer thickness scope is 5～20nm; The length of four pads or width range are 200～1500 μ m.
6. harmonic wave method micrometer/nanometre film thermal property method of testing as claimed in claim 1 is characterized in that, is used to measure the coefficient of heat conductivity and the thermal diffusivity parameter of substrate surface single/multiple layer micro-/ nano membrane structure.
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| 王照亮等.3ω法加热/测温膜中温度波解析及其在微/纳米薄膜导热系数测量中的应用.《物理学报》.2007,第56卷(第2期),说明书第750页左栏第23行至第752页右栏倒数第8行，图3，4. * |
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