CN101905949B - Silicon tetrachloride feeding pressurization system and pressurization method thereof - Google Patents

Abstract

A silicon tetrachloride feed pressurization system and a pressurization method thereof of the present invention relate to feed pressurization of silicon tetrachloride raw materials for the production of optical fiber prefabricated parts, especially by adding a set of pressurization systems to realize long-distance The method of delivery. It includes two silicon tetrachloride pressurized tanks, one nitrogen pressurized tank, two weight electronic scales, several solenoid valves and PLC programmable controllers; the lower parts of the two silicon tetrachloride pressurized tanks are respectively equipped with weight electronics. Scales, or liquid level gauges are respectively installed inside the two silicon tetrachloride pressurized tanks, and the upper part of the silicon tetrachloride pressurized tanks is respectively equipped with nitrogen pipelines, feed pipelines and discharge pipelines. In this method, the silicon tetrachloride in the silicon tetrachloride raw material storage tank is firstly pressurized by nitrogen, and the silicon tetrachloride liquid is sent to two silicon tetrachloride pressurized tanks, and then one of the four The pressure of silicon tetrachloride in the silicon chloride pressurized tank is increased by nitrogen, and the silicon tetrachloride is sent to the silicon tetrachloride deposition equipment to realize process feeding.

Description

A silicon tetrachloride feed pressurization system and pressurization method thereof

technical field

A silicon tetrachloride feed pressurization system and pressurization method thereof of the present invention relate to the field of manufacturing optical fiber prefabricated parts. This method is used to pressurize the raw material silicon tetrachloride feed during the production of optical fiber prefabricated parts, especially It is a method to realize long-distance feeding by adding a booster system.

Background technique

At present, the continuous feeding method of silicon tetrachloride in the manufacture of general optical fiber preforms is realized by switching between two silicon tetrachloride raw material storage tanks. When the silicon tetrachloride in one silicon tetrachloride raw material storage tank is used up, it will automatically switch to another silicon tetrachloride raw material storage tank for feeding, and at the same time replace or fill the empty silicon tetrachloride storage tank Silicon chloride.

Though this method can keep SiCl _Continuous feeding, this method also has following some shortcoming: because the pressure resistance of the silicon tetrachloride raw material storage tank of international standard is 4KPa, when passing through silicon tetrachloride raw material storage tank When the tank is directly pressed to the deposition equipment, due to the existence of pressure loss, the distance from the silicon tetrachloride raw material storage tank to the deposition equipment is limited, and the material cannot be fed over a long distance, and the feed pressure of the silicon tetrachloride at the end of the pipeline will decrease. Unstable, thus affecting the quality of optical fiber preforms.

Contents of the invention

The purpose of the present invention is to address the above disadvantages, to provide a silicon tetrachloride feed pressurization system and a pressurization method thereof, to solve the problem that due to the insufficient pressure of the silicon tetrachloride raw material storage tank, it is impossible to realize long-distance feeding and the feeding pressure is not high. Stability issue.

A kind of silicon tetrachloride feed pressurization system and its pressurization method of the present invention are to adopt the following technical solutions to realize:

The silicon tetrachloride feed pressurization system includes two silicon tetrachloride pressurized tanks, one nitrogen pressurized tank, two weight electronic scales or two liquid level gauges, several solenoid valves and PLC programmable controller.

The lower parts of the two silicon tetrachloride pressurized tanks are respectively equipped with weight electronic scales or liquid level gauges are respectively installed inside the two pressurized tanks, and the upper parts of the silicon tetrachloride pressurized tanks are respectively equipped with nitrogen pipes, feed pipes and Outlet pipeline. A solenoid valve 1 is installed at the inlet end of the nitrogen pipeline of the silicon tetrachloride pressurized tank 1, and the solenoid valve 1 is connected with the nitrogen pressurized tank through a pipeline. The feed pipe of the silicon tetrachloride booster tank 1 is equipped with a solenoid valve 2, and the solenoid valve 2 is connected with the silicon tetrachloride raw material storage tank through a pipeline. A solenoid valve 3 is installed on the discharge port of the silicon tetrachloride pressurized tank 1, and the solenoid valve 3 is connected with the deposition equipment through a pipeline. The inlet end of the nitrogen pipeline of the silicon tetrachloride pressurized tank 2 is equipped with a solenoid valve 4, which is connected with the nitrogen pressurized tank through a pipeline. The second feed pipe of the silicon tetrachloride pressurized tank is equipped with a solenoid valve five, and the solenoid valve five is connected with the silicon tetrachloride raw material storage tank through a pipeline. The discharge pipe of the silicon tetrachloride booster tank 2 is equipped with a solenoid valve 6, and the solenoid valve 6 is connected with the deposition equipment through a pipeline. The solenoid valve 1, solenoid valve 2, solenoid valve 3, solenoid valve 4, solenoid valve 5, and solenoid valve 6 are respectively connected to PLC programmable controllers through control lines, and the opening and closing are controlled by the PLC programmable controller.

The pressure resistance of the silicon tetrachloride booster tank 1 and the silicon tetrachloride booster tank 2 is greater than 4KPa.

Silicon tetrachloride feed pressurization method is as follows:

First, all the valves are closed, and the solenoid valve 2 and solenoid valve 5 are respectively opened, and the silicon tetrachloride raw material storage tank passes nitrogen pressure to pressurize the silicon tetrachloride into the silicon tetrachloride booster tank 1 and the silicon tetrachloride booster tank Two, weight electronic scale one and weight electronic scale two detect the silicon tetrachloride weight in silicon tetrachloride booster tank one and silicon tetrachloride booster tank two at the same time, when the weight limit is reached, solenoid valve two and Solenoid valve 5 is closed to stop feeding, or the liquid level of silicon tetrachloride in silicon tetrachloride pressurized tank 1 and silicon tetrachloride pressurized tank 2 is detected by liquid level gauge 1 and liquid level gauge 2 respectively. When the liquid level is at the upper limit, solenoid valve 2 and solenoid valve 5 are closed to stop feeding. Afterwards, solenoid valve one and solenoid valve three are opened, and the nitrogen pressurized tank exerts a pressure greater than 4KPa, and starts to pass into nitrogen pressurization to silicon tetrachloride pressurized tank one, and silicon tetrachloride is discharged from silicon tetrachloride pressurized tank one. The medium pressure is sent to the silicon tetrachloride deposition equipment for process feeding, and the second silicon tetrachloride booster tank is in the state to be switched; at the same time, the weight of the silicon tetrachloride in the first pair of silicon tetrachloride booster tanks is weighed by electronic scales When the weight reaches the lower limit, it will automatically switch to the second silicon tetrachloride booster tank for feeding, or the liquid level gauge will detect the silicon tetrachloride liquid level in the first silicon tetrachloride booster tank. When the position reaches the lower limit, it will automatically switch to silicon tetrachloride pressurized tank 2 for feeding. At this time, solenoid valve 1 and solenoid valve 3 are closed, solenoid valve 4 and solenoid valve 6 are opened, and the nitrogen pressurized tank exerts a pressure greater than 4KPa. Inject nitrogen into the silicon tetrachloride pressurized tank 2 to pressurize silicon tetrachloride from the silicon tetrachloride pressurized tank 2 to the silicon tetrachloride deposition equipment to realize automatic switching and stable feeding; at the same time, the solenoid valve Two open, silicon tetrachloride raw material storage tank begins to feed to the silicon tetrachloride booster tank one, when the weight electronic scale one detects that the silicon tetrachloride weight in the silicon tetrachloride booster tank one reaches the upper limit, Or when the liquid level gauge 1 detects that the silicon tetrachloride liquid level in the silicon tetrachloride booster tank 1 reaches the upper limit, the solenoid valve 2 is closed, the silicon tetrachloride raw material storage tank stops feeding, and the silicon tetrachloride booster tank 1 Enter the state to be switched; at the same time, the weight electronic scale two detects the silicon tetrachloride weight in the silicon tetrachloride booster tank two, and when the weight reaches the lower limit, or the liquid level gauge two pairs of the silicon tetrachloride booster tank two The silicon tetrachloride liquid level in the tank is detected. When the liquid level reaches the lower limit, it will automatically switch to the silicon tetrachloride booster tank 1 to feed, and at the same time, the silicon tetrachloride booster tank 2 will start feeding; in this cycle, the four Silicon chloride feeds stably over a long distance.

The invention realizes long-distance and stable feeding of silicon tetrachloride by adding a set of silicon tetrachloride pressurization device. In this method, the silicon tetrachloride in the silicon tetrachloride raw material storage tank is firstly pressurized by nitrogen, and the silicon tetrachloride liquid is sent to two silicon tetrachloride pressurized tanks, and then one of the four Nitrogen gas greater than 4KPa is introduced into the silicon chloride pressurized tank to increase the pressure, and the silicon tetrachloride is sent to the silicon tetrachloride deposition equipment to realize process feeding. Simultaneously, the weight electronic scale at the bottom of the silicon tetrachloride booster tank detects the weight of the silicon tetrachloride booster tank, or the liquid level gauge inside the silicon tetrachloride booster tank increases the silicon tetrachloride pressure. The liquid level of silicon tetrachloride in the pressurized tank is detected, and when the weight of silicon tetrachloride in the silicon tetrachloride pressurized tank reaches the weight lower limit, or the liquid level of silicon tetrachloride in the silicon tetrachloride pressurized tank When the position reaches the lower limit, it will be automatically switched to another silicon tetrachloride pressurized tank to feed through the PLC programmable controller control. At the same time, the silicon tetrachloride pressurized tank starts to feed, and when the weight of silicon tetrachloride reaches the upper limit, or when the liquid level of silicon tetrachloride reaches the upper limit, the feeding is stopped, and it automatically enters the waiting state. Repeatedly, the long-distance and stable feeding of silicon tetrachloride is realized, and the pressure is stable, which meets the process requirements of the deposition equipment.

Description of drawings

The present invention will be further described below in conjunction with accompanying drawing:

Fig. 1 is a schematic diagram of the silicon tetrachloride feed pressurization system of the present invention.

Labels in the figure: 1. Silicon tetrachloride booster tank 1, 2. Silicon tetrachloride booster tank 2, 3. Weight electronic scale 1, 4. Weight electronic scale 2, 5. Silicon tetrachloride raw material storage tank, 6. Solenoid valve one, 7. Solenoid valve two, 8. Solenoid valve three, 9. Solenoid valve four, 10. Solenoid valve five, 11. Solenoid valve six, 12. Nitrogen pressurized tank, 13. Liquid level gauge one, 14. Level gauge two.

Detailed ways

Referring to Figure 1, the silicon tetrachloride feed pressurization system includes two silicon tetrachloride pressurized tanks, a nitrogen pressurized tank, two weight electronic scales or two liquid level gauges, several solenoid valves and PLC can Program the controller. Weight electronic scale one 3 and weight electronic scale two 4 are respectively housed in silicon tetrachloride booster tank one 1 and silicon tetrachloride booster tank two 2 bottoms, or in silicon tetrachloride booster tank one 1 and tetrachloride Liquid level gauge 13 and liquid level gauge 14 are respectively installed inside silicon tetrachloride booster tank 2, and nitrogen pipeline and feed pipeline are respectively installed on the upper part of silicon tetrachloride booster tank 1 and silicon tetrachloride booster tank 2 and discharge pipes. Wherein the nitrogen pipeline inlet end of the silicon tetrachloride pressurized tank-1 is equipped with a solenoid valve-6, and the solenoid valve-6 is connected to the nitrogen pressurized tank 12 through a pipeline. The feed pipe of silicon tetrachloride pressurized tank one 1 is equipped with electromagnetic valve two 7, and electromagnetic valve two 7 is connected with silicon tetrachloride raw material storage tank 5 through pipeline. A solenoid valve 3 8 is installed on the discharge port of the silicon tetrachloride pressurized tank 1 , and the solenoid valve 3 8 is connected to the deposition equipment through pipelines. The nitrogen pipeline inlet end of silicon tetrachloride pressurized tank 2 2 is equipped with solenoid valve 4 9, and solenoid valve 4 9 links to each other with nitrogen pressurized tank 12 by pipeline. Electromagnetic valve five 10 is housed on the feed pipe of silicon tetrachloride booster tank two 2, and electromagnetic valve five 10 links to each other with silicon tetrachloride raw material storage tank 5 by pipeline. The discharge pipe of the silicon tetrachloride booster tank 2 is equipped with a solenoid valve 6 11, and the solenoid valve 6 11 is connected to the deposition equipment through a pipeline. The solenoid valve one 6, solenoid valve two 7, solenoid valve three 8, solenoid valve four 9, solenoid valve five 10 and solenoid valve six 11 are respectively connected to PLC programmable controllers through control lines, Control on and off.

Silicon tetrachloride feed pressurization method is as follows:

First, all the valves are closed, respectively open solenoid valve 2 7 and solenoid valve 5 10, the silicon tetrachloride raw material storage tank 5 passes nitrogen pressure, presses the silicon tetrachloride to the silicon tetrachloride booster tank 1 and tetrachloride Silicon tetrachloride pressurized tank two 2, simultaneously weight electronic scale one 3 and weight electronic scale two 4 detect the silicon tetrachloride weight in silicon tetrachloride pressurized tank one 1 and silicon tetrachloride pressurized tank two 2 respectively, wait for When the weight limit is reached, solenoid valve 2 7 and solenoid valve 5 10 are closed to stop feeding, or at the same time liquid level gauge 1 13 and liquid level gauge 2 14 pressurize silicon tetrachloride pressurized tank 1 and silicon tetrachloride respectively Silicon tetrachloride liquid level detection in tank two 2, when the upper limit of the liquid level is reached, solenoid valve two 7 and solenoid valve five 10 are closed, and the feeding is stopped; after that, solenoid valve one 6 and solenoid valve three 8 are opened, and nitrogen is pressurized The tank 12 exerts a pressure greater than 4KPa, and starts to feed nitrogen into the silicon tetrachloride booster tank-1 to pressurize silicon tetrachloride from the silicon tetrachloride booster tank-1 and send it to the silicon tetrachloride deposition Equipment for process feeding. Silicon tetrachloride booster tank two 2 is in the state to be switched. Simultaneously, the weight electronic scale-3 detects the silicon tetrachloride weight in the silicon tetrachloride booster tank-1, and when the weight reaches the lower limit, or the liquid level gauge-13 pairs of silicon tetrachloride booster tank-1 The silicon tetrachloride liquid level is detected, and when the liquid level reaches the lower limit, it is automatically switched to the silicon tetrachloride booster tank two 2 for feeding. At this time, the solenoid valve one 6 and the solenoid valve three 8 are closed, and the solenoid valve four 9 And the electromagnetic valve six 11 is opened, the nitrogen pressurized tank 12 applies a pressure greater than 4KPa, and silicon tetrachloride is pressed out from the silicon tetrachloride pressurized tank two 2 to the silicon tetrachloride deposition equipment to realize automatic switching and stable feeding. Simultaneously, electromagnetic valve two 7 is opened, and silicon tetrachloride raw material storage tank 5 begins to feed in silicon tetrachloride pressurized tank one 1, when weight electronic scale one 3 detects that in silicon tetrachloride pressurized tank one 1 When the silicon tetrachloride weight reaches the upper limit, or when the liquid level gauge one 13 detects that the silicon tetrachloride liquid level in the silicon tetrachloride pressurized tank one 1 reaches the upper limit, the solenoid valve two 7 is closed, and the silicon tetrachloride raw material storage Tank 5 stops feeding, and silicon tetrachloride pressurized tank 1 enters the state to be switched. Simultaneously, weight electronic scale 2 4 detects the silicon tetrachloride weight in the silicon tetrachloride pressurized tank 2 2, and when the weight reaches the lower limit, or the liquid level gauge 2 14 pairs in the silicon tetrachloride pressurized tank 2 2 The silicon tetrachloride liquid level is detected. When the liquid level reaches the lower limit, it will automatically switch to the silicon tetrachloride booster tank 1 to feed, and at the same time, the silicon tetrachloride booster tank 2 2 will start feeding. With this cycle, the long-distance and stable feeding of silicon tetrachloride can be realized.

Described nitrogen pressure control is by adding a nitrogen pressurized tank 12, in silicon tetrachloride pressurized tank one 1 and silicon tetrachloride pressurized tank two 2 pressure-resistant ranges, by going to silicon tetrachloride pressurized tank one 1 or silicon tetrachloride pressurized tank two 2 is fed with nitrogen gas greater than 4KPa, so as to increase the supply pressure of silicon tetrachloride and realize long-distance stable feeding of silicon tetrachloride. And the nitrogen pressure applied by the nitrogen pressure tank 12 can be adjusted, and the nitrogen pressure can be adjusted according to actual needs.

The pressure resistance of the silicon tetrachloride booster tank 1 and the silicon tetrachloride booster tank 2 is greater than 4KPa.

The weight electronic scale one 3 and the weight electronic scale two 4 adopt commercially available weight electronic scales. The liquid level gauge one 13 and the liquid level gauge two 14 adopt commercially available liquid level gauges. The solenoid valve one 6, solenoid valve two 7, solenoid valve three 8, solenoid valve four 9, solenoid valve five 10 and solenoid valve six 11 are commercially available solenoid valves. The PLC programmable controller adopts a commercially available programmable controller.

Claims (2)

1. a silicon tetrachloride feeding supercharging system is characterized in that comprising two silicon tetrachloride booster jars, a nitrogen pressure jar, two weight electronic scaless or two liquidometers, several SVs and PLC programmable logic controllers;

Two silicon tetrachloride booster jar bottoms the weight electronic scales is housed respectively; Or liquidometer is housed respectively two booster jar inside; Nitrogen pipeline is equipped with on silicon tetrachloride booster jar top respectively; Feed pipe and discharge pipe, the nitrogen pipeline entrance end of one of them silicon tetrachloride booster jar one is equipped with SV one, and SV one links to each other with the nitrogen pressure jar through pipeline; SV two is housed on the feed-pipe of silicon tetrachloride booster jar one, and SV two links to each other with the silicon tetrachloride raw material storage tank through pipeline; SV three is housed on the discharge port of silicon tetrachloride booster jar one, and SV threeway piping links to each other with depositing device; The nitrogen pipeline entrance end of silicon tetrachloride booster jar two is equipped with SV four, and SV four-way piping links to each other with the nitrogen pressure jar; On silicon tetrachloride booster jar two feed-pipes SV five is housed, SV five-way piping links to each other with the silicon tetrachloride raw material storage tank; The extraction line of silicon tetrachloride booster jar two is equipped with SV six, and SV six links to each other with depositing device through pipeline; Said SV one, SV two, SV three, SV four, SV five, SV six link to each other with the PLC programmable logic controller respectively through wire, open and close through the PLC Controlled by Programmable Controller;

Said silicon tetrachloride booster jar one is withstand voltage greater than 4KPa with silicon tetrachloride booster jar two.

2. method of using the described silicon tetrachloride feeding supercharging system of claim 1 to carry out the silicon tetrachloride feeding supercharging is characterized in that:

At first, all valve closes is opened SV two and SV five respectively; The silicon tetrachloride raw material storage tank is depressed into silicon tetrachloride booster jar one and silicon tetrachloride booster jar two through nitrogen pressure with silicon tetrachloride, and weight electronic scales one and weight electronic scales two are respectively to the silicon tetrachloride weight detecting in silicon tetrachloride booster jar one and the silicon tetrachloride booster jar two simultaneously; When waiting to reach upper weight limit, SV two cuts out with SV five, stops feeding; Or through liquidometer one and liquidometer two respectively to the silicon tetrachloride Level Detection in silicon tetrachloride booster jar one and the silicon tetrachloride booster jar two; Wait to reach on the liquid level and prescribe a time limit, SV two cuts out with SV five, stops feeding; Afterwards; SV one is opened with SV three; The nitrogen pressure jar applies the pressure greater than 4KPa; Begin silicon tetrachloride booster jar one is fed nitrogen pressure, silicon tetrachloride is extruded from silicon tetrachloride booster jar one deliver to the silicon tetrachloride depositing device and carry out the technology feeding, silicon tetrachloride booster jar two is to be switched state; Simultaneously, the silicon tetrachloride weight in a pair of silicon tetrachloride booster jar one of weight electronic scales detects, when weight reaches down in limited time; Automatically switch to silicon tetrachloride booster jar two and carry out feeding, or the silicon tetrachloride liquid level in a pair of silicon tetrachloride booster jar one of liquidometer detects, when liquid level reaches down in limited time; Automatically switch to silicon tetrachloride booster jar two and carry out feeding; At this moment, SV one cuts out with SV three, and SV four is opened with SV six; The nitrogen pressure jar applies the pressure greater than 4KPa; Silicon tetrachloride booster jar two is fed nitrogen pressure, silicon tetrachloride is pressed out to the silicon tetrachloride depositing device from silicon tetrachloride booster jar two, realize automaticallying switch and stablize feeding; Simultaneously; SV two is opened, and begins feed supplement in silicon tetrachloride booster jar one in the silicon tetrachloride raw material storage tank, and silicon tetrachloride weight reaches in limited time in the silicon tetrachloride booster jar one when weight electronic scales one detects; Or reach and prescribe a time limit when liquidometer one detects in the silicon tetrachloride booster jar one the silicon tetrachloride liquid level; SV two cuts out, and the silicon tetrachloride raw material storage tank stops feeding, and silicon tetrachloride booster jar one gets into to be switched state; Simultaneously; Silicon tetrachloride weight in two pairs of silicon tetrachloride booster jars two of weight electronic scales detects; When weight reaches down in limited time, or the silicon tetrachloride liquid level in two pairs of silicon tetrachloride booster jars two of liquidometer detects, when liquid level reaches down in limited time; Automatically switch to one feeding of silicon tetrachloride booster jar, silicon tetrachloride booster jar two beginning feed supplements simultaneously; Circulate with this, the realization silicon tetrachloride is stablized feeding at a distance.

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