CN101864934B - Supercharging gas recovery method for two-stage ejector of gas field - Google Patents
Supercharging gas recovery method for two-stage ejector of gas field Download PDFInfo
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Abstract
The invention relates to a supercharging gas recovery method for a two-stage ejector of a gas field, which is applied in gas recovery of the gas field. The method comprises the following steps of: introducing medium-pressure natural gas recovered from a medium-pressure gas well into the high-pressure gas inlet of a first-stage ejection supercharger; introducing low-pressure natural gas recovered from a low-pressure gas well into the suction inlet of the first-stage ejection supercharger; introducing natural gas exhausted from the mixed gas outlet of the first-stage ejection supercharger into the suction inlet of a second-stage ejection supercharger; introducing natural gas recovered from the high-pressure gas well into the high-pressure gas inlet of the second-stage ejection supercharger; introducing natural gas exhausted from the mixed gas outlet of the second-stage ejection supercharger into the inlet of a separator; and separating the natural gas from water in the separator and delivering the natural gas into a gathering line. The method has the advantages of recovering gas from the high-pressure gas well, the medium-pressure gas well and the low-pressure gas well at the same time, making full use of the energies of the high-pressure gas well and the medium-pressure gas well, realizing gas recovery from the low-pressure gas well and delivery of the recovered gas, saving energy and realizing stable production of the low-pressure gas well along with simple and convenient operation, low maintenance cost and no need of external energy.
Description
Technical field
The present invention relates to oil gas field production gas technology field; Be particularly related to gas gathering station field, cluster well group well site etc.; Make full use of high-pressure gas well, in the calm the anger stratum energy of well, realize the low-pressure gas well two-step supercharging after gas production defeated outward, be a kind of gas production method of two-stage ejector supercharging.
Background technology
At present, the middle and later periods of gas field development, the subject matter that faces is exactly the steady production problem of a large amount of low-voltage and low-yield natural gas wells.Because formation heterogeneity and product are built influence factors such as the cycle is long, cause the pressure drop of the gas well same gas gathering station in different, have in the gas gathering station high-pressure gas well 3, in calm the anger well 1,2 whiles of low-pressure gas well and deposit.High-pressure gas well 3 is meant that the pressure of gas recovery well is at 10～20MPa; In calm the anger pressure that well 1 is meant gas recovery well at 5～10MPa; Low-pressure gas well 2 is meant that the pressure of gas recovery well is at 0.5～5MPa.Part high-pressure gas well 3 needs the throttling step-down to produce, and the conserve energy waste prolongs the gas production time.And the oldish well of part can't get into gathering system and carry out gas production production because pressure is lower.
Because the gas well pressure in the gas gathering station pressure is unbalanced, every implication well recovery percent and reservoir properties are different, and each gas well pressure, tolerance there are differences in the well.Simultaneously, tandem mode between well is adopted in the part gas field, causes after same main line manifold closes, and has mutual pressure disturbances between each well.For avoiding pressure disturbances, gas gathering station can only take intermittently, gas production production model in turn, and rate when influencing gas well and driving a well has reduced the development efficiency in gas field.In addition, in 2 processes that drive a well of low-pressure gas well, pressure decline is rapid or pressure is lower, produces comparatively difficulty, how to improve low-voltage and low-yield well production efficiency, is a great problem that we face at present.
At present, the gas field development middle and later periods is mainly adopted the compressor boost exploitation, because the pressure of different wells is different in the same block, adopts the compressor choose opportunities improper, causes the remaining problem of compressor horsepower.For this reason, we consider to adopt a kind of easy two-stage ejector supercharging process, realize that low-pressure gas well 2 superchargings are defeated outward, postpone the compressor boost time.
Summary of the invention
The objective of the invention is: a kind of two-stage ejector pressure boost gas production method that is used for the gas field is provided, can be simultaneously to high-pressure gas well, in calm the anger well and low-pressure gas well exploit.Make full use of high-pressure gas well, in the calm the anger energy of well, realize that low-pressure gas well pressure boost gas production collection is defeated, both energy conservation can realize the low-pressure gas well steady production again.
The technical scheme that the present invention adopts is: be used for the two-stage ejector supercharging device that the two-stage ejector pressure boost gas production method in gas field adopts, mainly by high-pressure gas well, low-pressure gas well, in calm the anger well, one-level spray booster, two-stage injection booster, valve, bypass line and eliminator and form.In calm the anger well outlet have pipeline to connect the high pressure gas inlet that one-level is sprayed booster; The low-pressure gas well outlet has pipeline to connect the intake that one-level is sprayed booster; The mixed gas outlet that one-level is sprayed booster has pipeline to connect two-stage injection booster low pressure intake; The high-pressure gas well outlet has pipeline to connect the high pressure gas inlet of two-stage injection booster; The mixed gas outlet of two-stage injection booster has pipeline to connect separator inlet, and the outlet of eliminator connects gathering line.
Calming the anger well in described can be by the well group of calming the anger in 1～5 implication well construction; Described low-pressure gas well can be the low pressure gas well group by 1～5 implication well construction; Described high-pressure gas well can be the high pressure gas well group by 1～5 implication well construction.In calm the anger well, low-pressure gas well and high-pressure gas well can not be interpreted as and include only a bite gas well.
For in calm the anger well pressure when meeting the requirement of gathering line pressure; In the calm the anger natural gas of well extraction can directly get into eliminator; In the well outlet well bypass line of calming the anger in having of calming the anger connect separator inlet, in calm the anger well export between the separator inlet in calm the anger and valve arranged on the well bypass line.
For the natural gas of high-pressure gas well extraction can directly get into eliminator, the high-pressure gas well outlet has the high-pressure gas well bypass line to connect separator inlet, and exporting on the high-pressure gas well bypass line between the separator inlet at high-pressure gas well has valve.Two-stage injection booster mixed gas outlet have to the pipeline between the separator inlet valve and this valve in the calm the anger access point upper reaches of well bypass line and high-pressure gas well bypass line, promptly near a side of two-stage injection booster.
What one-level was sprayed booster 4 and 5 employings of two-stage injection booster is that the Shaanxi boat is far from the production of standard device Co., Ltd, and model is CQGE50-P6-5 and/or CQGE50-P15-10
The two-stage ejector pressure boost gas production method that is used for the gas field:
A, at first, with in the calm the anger natural gas of pressure between 5.0～10MPa of well extraction, be that the high pressure gas inlet that one-level is sprayed booster is introduced in 4～50,000 sides/sky with flow; Is that 1～4 ten thousand side/sky introduce low pressure intake that one-level spray booster at the natural gas of 0.5～5.0MPa with flow with the pressure of low-pressure gas well extraction; The gas pressure that one-level is sprayed the mixed gas outlet discharge of booster is controlled at 3.0～4.0MPa, and flow is between 5～90,000 side/skies;
B, secondly, it is 3.0～4.0MPa that one-level is sprayed the pressure that the booster mixed gas outlet discharges, flow is the low pressure intake of the natural gas introducing two-stage injection booster in 5～90,000 side/skies; Is the high pressure gas inlet that the two-stage injection booster is introduced in 8～200,000 sides/sky with the natural gas of pressure between 10.0～15MPa of high-pressure gas well extraction with flow; The gas pressure that two-stage injection booster mixed gas outlet is discharged is controlled at 4.5～5.6MPa, flow 13～290,000 side/skies;
C, last; The pressure that two-stage injection booster mixed gas outlet is discharged is 4.5～5.6MPa, and flow is that the natural gas in 13～290,000 side/skies is introduced separator inlet, in eliminator, carries out natural gas and separated form water; After natural gas and the separated form water, natural gas is sent into gathering line.
In the calm the anger middle pressure natural gas of well extraction, spray the high-pressure injection source of the gas of booster as one-level; Greater than the high-pressure gas well natural gas of 10MPa high-pressure injection source of the gas as the two-stage injection booster; One-level is sprayed the low pressure gas source of the natural gas of booster discharge as the two-stage injection booster.Spray supercharging through two-stage, realize the natural gas extraction in the low-pressure gas well and be pressurized to 5～6MPa collection defeated.
In the middle of the calm the anger amount of natural gas of well extraction be used for the two-stage ejector pressure boost gas production and have when unnecessary; And in calm the anger the gas pressure of well extraction when meeting gathering line pressure; Can be simultaneously with in the calm the anger natural gas redundance of well extraction, through in the well bypass line of calming the anger be delivered directly to eliminator.
When being used for the two-stage ejector pressure boost gas production, the amount of natural gas of high-pressure gas well extraction has when unnecessary; And when the gas pressure of high-pressure gas well extraction meets gathering line pressure; Can be delivered directly to eliminator through the high-pressure gas well bypass line simultaneously with the natural gas redundance of high-pressure gas well extraction.
Beneficial effect of the present invention: the present invention is used for the two-stage ejector pressure boost gas production method in gas field, is applied to the middle and later periods that gas field is produced, and has the following advantages:
1, two-stage ejector pressure boost gas production method is carried out gas production, can be simultaneously to high-pressure gas well, in calm the anger well and low-pressure gas well exploit.Make full use of high-pressure gas well, in the calm the anger energy of well, realize the extraction of low-pressure gas well natural gas and outer defeated, both energy conservation can realize low-pressure gas well supercharging steady production again; Low-pressure gas well pressure can be low to moderate 0.5～1.5MPa.
2, easy and simple to handle, maintenance cost is low, does not need the external energy, energy-saving and environmental protection, efficient;
3, postpone the time that the gas production block uses compressor boost to bring into use.
Description of drawings
Fig. 1 is the two-stage ejector pressure boost gas production method structural representation that the present invention is used for the gas field.
Among the figure, the well of calming the anger in 1., 2. low-pressure gas well, 3. high-pressure gas well, 4. one-level is sprayed booster, 5. two-stage injection booster, 6. eliminator, calm the anger in 7. well bypass line, 8. high-pressure gas well bypass line, 9. valve.
The specific embodiment
Embodiment 1: with a two-stage ejector pressure boost gas production method that is used for the gas field is example, and the present invention is done further explain.
Consult Fig. 1.The two-stage ejector pressure boost gas production method that is used for the gas field; The two-stage ejector supercharging device that adopts, mainly by high-pressure gas well 3, low-pressure gas well 2, in calm the anger well 1, one-level spray booster 4, two-stage injection booster 5, valve 9, bypass line and eliminator 6 and form.Two mouthfuls adopt natural gas in calm the anger after the outlet line parallel connection of well 1, be connected to the high pressure gas inlet that one-level is sprayed booster 4 by a pipeline; After the outlet line parallel connection of two mouthfuls of low-pressure gas wells 2 of adopting natural gas, connect the intake that one-level is sprayed booster 4 by a pipeline; The mixed gas outlet that one-level is sprayed booster 4 has pipeline to connect two-stage injection booster 5 intakes, and a valve 9 is arranged on this pipeline; After the outlet line parallel connection of three mouthfuls of high-pressure gas wells 3 of adopting natural gas, connect the high pressure gas inlet of two-stage injection booster 5 by a pipeline; The mixed gas outlet of two-stage injection booster 5 has pipeline to connect eliminator 6 inlets, and a valve 9 is arranged on this pipeline.The outlet of eliminator 6 connects gathering line.
In two mouthfuls, calm the anger after the well 1 outlet line parallel connection; Be connected with the well bypass line 7 of calming the anger in; In the calm the anger other end of well bypass line 7 connect eliminator 6 inlets, in calm the anger well 1 export between eliminator 6 inlets in calm the anger and a valve 9 arranged on the well bypass line 7.After the 3 outlet line parallel connections of three mouthfuls of high-pressure gas wells; Be connected with a high-pressure gas well bypass line 8; The other end of high-pressure gas well bypass line 8 connects eliminator 6 inlets, and exporting on the high-pressure gas well bypass line 8 between eliminator 6 inlets at high-pressure gas well 3 has a valve 9.Two-stage injection booster 5 mixed gas outlets have to the pipeline between eliminator 6 inlet a valve 9 and this valve 9 in calm the anger the access point of well bypass line 7 and high-pressure gas well bypass line 8 at the upper reaches one side.
One-level sprays that booster 4 adopts is that to be far from the model that standard device Co., Ltd produces be CQGE50-P6-5 to the Shaanxi boat; The model of two-stage injection booster 5 is CQGE50-P15-10.
The two-stage ejector pressure boost gas production method embodiment that is used for the gas field:
A, at first is the natural gas of 5.5MPa with the pressure after the converging of well 1 extraction of calming the anger in two mouthfuls, and is 40,000 side/skies with flow, introduces the high pressure gas inlet that one-level is sprayed booster 4; With the pressure after the converging of two mouthfuls of low-pressure gas well 2 extraction is that the natural gas of 0.5MPa is 10,000 side/skies with flow, introduces the low pressure intake that one-level is sprayed booster 4; The gas pressure that one-level is sprayed the mixed gas outlet discharge of booster 4 is controlled at 3.5MPa, and flow is in 50,000 side/skies;
B, secondly, it is 3.5MPa that one-level is sprayed the pressure that booster 4 mixed gas outlets discharge, the low pressure intake of the natural gas introducing two-stage injection booster 5 in flow 50,000 side/skies; The natural gas that with the pressure after the converging of three mouthfuls of high-pressure gas well 3 extraction is 10MPa is the high pressure gas inlet that two-stage injection booster 5 is introduced in 150,000 sides/sky with flow; The gas pressure that two-stage injection booster 5 mixed gas outlets are discharged is controlled at the defeated pressure 5.2MPa of collection, and flow is 200,000 side/skies;
C, be 5.2MPa with two-stage injection booster 5 mixed gas outlet discharge pressures at last, flow is that the natural gas in 200,000 side/skies is introduced eliminator 6 inlets, in eliminator 6, carries out natural gas and separated form water, and after natural gas and the separated form water, natural gas is sent into gathering line.
Embodiment 2: the two-stage ejector supercharging device of employing is identical with embodiment 1, and difference is:
One-level is sprayed booster 4 high pressure gas inlet pressure 7MPa, gas discharge is 50,000 side/skies.One-level is sprayed booster 4 low pressure suction pressure 1.0MPa, gas discharge is 2.0 ten thousand side/skies.The gas pressure that one-level is sprayed the discharge of booster 4 mixed gas outlets is 3.5MPa, and flow is in 70,000 side/skies; Draw the low pressure intake that one-level is sprayed the natural gas entering two-stage injection booster 5 of booster 4 mixed gas outlets discharge.The high pressure gas inlet pressure 12MPa of two-stage injection booster 5, gas discharge are 160,000 side/skies.The gas pressure that two-stage injection booster 5 mixed gas outlets are discharged is 5.2MPa, and flow is in 230,000 side/skies.
Embodiment 3: the two-stage ejector supercharging device of employing is identical with embodiment 1, and difference is:
One-level is sprayed booster 4 high pressure gas inlet pressure 8MPa, gas discharge is 5.0 ten thousand side/skies.One-level is sprayed booster 4 low pressure suction pressure 3.0MPa, gas discharge is 3.5 ten thousand side/skies.The gas pressure that one-level is sprayed the discharge of booster 4 mixed gas outlets is 3.5MPa, and flow is in 8.5 ten thousand side/skies; Draw the low pressure intake that one-level is sprayed the natural gas entering two-stage injection booster 5 of booster 4 mixed gas outlets discharge.The high pressure gas inlet pressure 15MPa of two-stage injection booster 5, gas discharge are 180,000 side/skies.The gas pressure that two-stage injection booster 5 mixed gas outlets are discharged is 5.6MPa, and flow is in 26.5 ten thousand side/skies.
Embodiment 4: the two-stage ejector supercharging device of employing is identical with embodiment 1, and difference is:
One-level is sprayed booster 4 high pressure gas inlet pressure 6MPa, gas discharge is 5.0 ten thousand side/skies.One-level is sprayed booster 4 low pressure suction pressure 3.5MPa, gas discharge is 4.0 ten thousand side/skies.The gas pressure that one-level is sprayed the discharge of booster 4 mixed gas outlets is 4.0MPa, and flow is in 9.0 ten thousand side/skies; Draw the low pressure intake that one-level is sprayed the natural gas entering two-stage injection booster 5 of booster 4 mixed gas outlets discharge.The high pressure gas inlet pressure 20MPa of two-stage injection booster 5, gas discharge are 200,000 side/skies.The gas pressure that two-stage injection booster 5 mixed gas outlets are discharged is 6.0MPa, and flow is in 290,000 side/skies.
Claims (7)
1. two-stage ejector pressure boost gas production method that is used for the gas field: it is characterized in that:
A, at first, will in the calm the anger natural gas of pressure between 5.0～10MPa of well (1) extraction, be that the high pressure gas that one-level injection booster (4) is introduced in 4～50,000 sides/sky enters the mouth with flow; Is that 1～4 ten thousand side/sky introduce low pressure intake that one-level spray booster (4) at the natural gas of 0.5～5.0MPa with flow with the pressure of low-pressure gas well (2) extraction; The gas pressure that one-level is sprayed the mixed gas outlet discharge of booster (4) is controlled at 3.0～4.0MPa, and flow is between 5～90,000 side/skies;
B, secondly, it is 3.0～4.0MPa that one-level is sprayed the pressure that booster (4) mixed gas outlet discharges, flow is the low pressure intake of the natural gas introducing two-stage injection booster (5) in 5～90,000 side/skies; Is the high pressure gas inlet that two-stage injection booster (5) is introduced in 8～200,000 sides/sky with the natural gas of pressure between 10.0～20MPa of high-pressure gas well (3) extraction with flow; The gas pressure that two-stage injection booster (5) mixed gas outlet is discharged is controlled at 4.5～5.6MPa, flow 13～290,000 side/skies;
C, last; The pressure that two-stage injection booster (5) mixed gas outlet is discharged is 4.5～5.6MPa, and flow is that the natural gas in 13～290,000 side/skies is introduced eliminator (6) inlet, in eliminator (6), carries out natural gas and separated form water; After natural gas and the separated form water, natural gas is sent into gathering line.
2. the two-stage ejector pressure boost gas production method that is used for the gas field as claimed in claim 1 is characterized in that: will in the calm the anger natural gas redundance of well (1) extraction, through in the well bypass line (7) of calming the anger be delivered directly to eliminator (6).
3. the two-stage ejector pressure boost gas production method that is used for the gas field as claimed in claim 1 is characterized in that: with the natural gas redundance of high-pressure gas well (3) extraction, be delivered directly to eliminator (6) through high-pressure gas well bypass line (8).
4. the two-stage ejector pressure boost gas production method that is used for the gas field as claimed in claim 1; It is characterized in that: the two-stage ejector supercharging device of employing; Mainly by high-pressure gas well (3), low-pressure gas well (2), in calm the anger well (1), one-level spray booster (4), two-stage injection booster (5), valve (9), bypass line and eliminator (6) and form, in well (1) outlet of calming the anger have pipeline to connect one-level to spray the high pressure gas of booster (4) and enter the mouth; Low-pressure gas well (2) outlet has pipeline to connect the low pressure intake that one-level is sprayed booster (4); The mixed gas outlet that one-level is sprayed booster (4) has pipeline to connect two-stage injection booster (5) low pressure intake; High-pressure gas well (3) outlet has pipeline to connect the high pressure gas inlet of two-stage injection booster (5); The mixed gas outlet of two-stage injection booster (5) has pipeline to connect eliminator (6) inlet, and the outlet of eliminator (6) connects gathering line.
5. like claim 1,2, the 3 or 4 described two-stage ejector pressure boost gas production methods that are used for the gas field, it is characterized in that: the well of calming the anger in described (1) is by the well group of calming the anger in 1～5 implication well construction; Described low-pressure gas well (2) is the low pressure gas well group by 1～5 implication well construction; Described high-pressure gas well (3) is the high pressure gas well group by 1～5 implication well construction.
6. the two-stage ejector pressure boost gas production method that is used for the gas field as claimed in claim 4; It is characterized in that: in well (1) the outlet well bypass line (7) of calming the anger in having of calming the anger connect eliminator (6) inlet, in calm the anger well (1) export between eliminator (6) inlet in calm the anger and valve (9) arranged on the well bypass line (7); High-pressure gas well (3) outlet has high-pressure gas well bypass line (8) to connect eliminator (6) inlet, and exporting on the high-pressure gas well bypass line (8) between eliminator (6) inlet at high-pressure gas well (3) has valve (9); Two-stage injection booster (5) mixed gas outlet have to the pipeline between eliminator (6) inlet valve (9) and this valve (9) in the calm the anger access point upper reaches of well bypass line (7) and high-pressure gas well bypass line (8).
7. the two-stage ejector pressure boost gas production method that is used for the gas field as claimed in claim 4 is characterized in that: one-level sprays that booster (4) and two-stage injection booster (5) adopt is that the model that the Shaanxi boat is far from the production of standard device Co., Ltd is CQGE50-P6-5 and/or CQGE50-P15-10.
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| CN104314531A (en) * | 2014-09-28 | 2015-01-28 | 中国石油化工股份有限公司 | Method for improving recovery efficiency of gas wells |
| CN111520108B (en) * | 2020-04-30 | 2022-05-24 | 成都百胜野牛科技有限公司 | Well group energy management method |
| CN111364949A (en) * | 2020-04-30 | 2020-07-03 | 成都百胜野牛科技有限公司 | Natural gas well group |
| CN111561657A (en) * | 2020-05-21 | 2020-08-21 | 大连海洋大学 | Boil-off gas treatment device for liquefied natural gas device |
| CN114135525B (en) * | 2020-09-02 | 2024-03-26 | 中国石油化工股份有限公司 | Adjustable ejector and gas-liquid mixing and conveying system for high-pressure gas well and low-pressure gas well |
| CN112682700B (en) * | 2020-12-23 | 2022-06-24 | 中国石油大学(华东) | Gas field low pressure gathering and transportation multifunctional pressurizing pry |
| CN112647908A (en) * | 2021-01-08 | 2021-04-13 | 重庆科技学院 | Combined drainage gas production system and method and underground atomization drainage gas production structure |
| CN116428034A (en) * | 2023-05-06 | 2023-07-14 | 西南石油大学 | High-pressure gas well pressure energy and geothermal energy combined utilization device and method thereof |
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| US4509596A (en) * | 1984-01-23 | 1985-04-09 | Atlantic Richfield Company | Enhanced oil recovery |
| RU2131021C1 (en) * | 1998-08-07 | 1999-05-27 | Зайцев Игорь Юрьевич | Method of development of gas-condensate and oil-gas condensate fields (versions) |
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