CN101853886A - Electrode pattern of solar cell - Google Patents

Electrode pattern of solar cell Download PDF

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Publication number
CN101853886A
CN101853886A CN200910048793A CN200910048793A CN101853886A CN 101853886 A CN101853886 A CN 101853886A CN 200910048793 A CN200910048793 A CN 200910048793A CN 200910048793 A CN200910048793 A CN 200910048793A CN 101853886 A CN101853886 A CN 101853886A
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CN
China
Prior art keywords
grid line
main grid
distance
edge
electrode pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN200910048793A
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Chinese (zh)
Inventor
任路辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Jinglong Optical & Electronic Technologies Co Ltd
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Shanghai Jinglong Optical & Electronic Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shanghai Jinglong Optical & Electronic Technologies Co Ltd filed Critical Shanghai Jinglong Optical & Electronic Technologies Co Ltd
Priority to CN200910048793A priority Critical patent/CN101853886A/en
Publication of CN101853886A publication Critical patent/CN101853886A/en
Pending legal-status Critical Current

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Abstract

The invention relates to an electrode pattern of a solar cell, which comprises a body, wherein two main grid lines and at least 40 thin grid lines which are vertical with the main grid lines are arranged on the body; the distance between every two thin grid lines is 2.40-2.75mm, and the thin grid lines are uniformly distributed on the surface of the cell; and in the position at which the distance between one end of each main grid line and the edge of the cell is not less than 6.12mm, each main grid line is gradually widened from 1.8mm to 2.5mm-3mm, and distance between the edge of each main grid line at the end and the edge of a crystal cell slice is greater than 3mm. The invention has the advantages that 'heat stress' generated in the production process is released by changing the design structure, thus adapting to the development needs of slices in future; and the contact resistance is not influenced, and simultaneously, the usage amount of slurry is reduced.

Description

The electrode pattern of solar cell
Technical field
The present invention relates to a kind of solar cell, relate in particular to the electrode pattern of this solar cell.
Background technology
The manufacturing process of solar energy crystal silicon cell has: cleaning, diffusion, etching, dephosphorization silex glass, coated with antireflection film, silk screen printing, sintering.Wherein silk screen printing is negative electrode silver slurry, back electric field aluminum pulp, and positive electrode silver slurry uses the stainless steel web plate to be printed onto the positive and negative surface of silicon chip according to certain graphic style.When making sun assembly, need employing to be coated with the tin copper strips and be welded on the main grid line (both typographic battery cathode), be connected to each other by being coated with the tin copper strips again between the battery sheet then, by making solar module after lamination, the group frame technology.
Electrode pattern wherein of the prior art because silvery grid line 10 need descend sintering in the condition of high temperature (more than 700 ℃), makes it and silicon wafer-based body formation good Ohmic contact as shown in Figure 1.In this process,, can produce thermal stress at silver and silicon intersection owing to expansion contraction problem.When assembly is produced, equally also need adopt higher temperature and certain dynamics to be welded to assigned address being coated with the tin copper strips, this also can aggravate this " thermal stress ".Along with the development of microtomy, the crystal silicon chip matrix is more and more thinner now, and the thing followed is because the fragment problems that above-mentioned " thermal stress " produces becomes also more outstanding.
Summary of the invention
The invention provides a kind of electrode pattern of solar cell, be intended to solve the above problems.
In order to solve the problems of the technologies described above, the present invention is achieved through the following technical solutions:
The present invention includes: body; On body, comprise two main grid lines and vertical with the main grid line thin grid line that is not less than 40; Thin grid line distance between centers of tracks is 2.40~2.75mm, is evenly distributed in battery surface; Be not less than the position of 6.12mm on one on main grid line apart from battery edge, the main grid line width is widened to width between 2.5mm-3mm gradually from 1.8mm, this end main grid line edge to the distance at crystal battery sheet edge greater than 3mm.
Compared with prior art, the invention has the beneficial effects as follows: by changing project organization, discharge " thermal stress " that occur in process of production, adapt to thin slice development need from now on; When not influencing contact resistance, reduced the use amount of slurry.
Description of drawings
Fig. 1 is an electrode pattern schematic diagram in the prior art;
Fig. 2 A is a schematic diagram of the present invention;
Fig. 2 B is an I place enlarged drawing among Fig. 2 A.
Embodiment
Below in conjunction with accompanying drawing and embodiment the present invention is described in further detail:
By Fig. 2 A, Fig. 2 B as seen: the present invention includes: body; On body, comprise two main grid lines 1 and vertical with the main grid line 1 thin grid line 2 that is not less than 40; Thin grid line distance between centers of tracks is 2.40~2.75mm, is evenly distributed in battery surface; Be not less than the position of 6.12mm on 1 one on main grid line apart from battery edge, the main grid line width is widened to width between 2.5mm-3mm gradually from 1.8mm, this end main grid line edge to the distance at crystal battery sheet edge greater than 3mm;
The bar number of described thin grid line 2 is 45; Thin grid line distance between centers of tracks is 2.657mm; The main grid line width is widened to 3mm gradually from 1.8mm; Main grid line edge is 6.90mm to the distance at crystal battery sheet edge.
The present invention adopts this printed pattern, adapts to existing silk screen printing and sintering process fully.Require the qualified silk screen of customization according to design configuration, adopt normal typography to realize.Be coated with tin copper strips width at present and be mainly 1.8 ± 0.2mm, it is 1.8mm that the present invention designs main grid line body width, and Fig. 2 B is an emphasis of the present invention, and this design the widest part is slightly larger than present conventional welding width; The widest part has certain distance apart from battery sheet edge, promptly is to discharge the stress distance.In the assembly ordinary production, be coated with the tin copper strips and can from Fig. 2 A, indicate the A weldering, end weldering at the wideest B of main grid line place.This kind design has reached " thermal stress " that effective release produces, and has obtained good result in experiment with in producing, and has solved the thin frangible problem of solar cell piece of present existence, adapts to the development need of industry.
One aspect of the present invention can reduce the stress of product in the processing process, to reduce fragment or implicit damage, improves the quality of products and rate of finished products, strengthens enterprise competitiveness; On the other hand, in making cell process, use the expensive silver-colored material slurry of price, and, reach the effect that reduces cost by adopting the present invention can save the consumption of slurry.

Claims (2)

1. the electrode pattern of a solar cell comprises: body; On body, comprise two main grid lines and vertical with the main grid line thin grid line that is not less than 40; Thin grid line distance between centers of tracks is 2.40~2.75mm, is evenly distributed in battery surface; It is characterized in that: be not less than the position of 6.12mm on one on main grid line apart from battery edge, the main grid line width is widened to width between 2.5mm-3mm gradually from 1.8mm, this end main grid line edge to the distance at crystal battery sheet edge greater than 3mm.
2. the electrode pattern of solar cell according to claim 1, it is characterized in that: the bar number of described thin grid line is 45; Thin grid line distance between centers of tracks is 2.657mm; The main grid line width is widened to 3mm gradually from 1.8mm; Main grid line edge is 6.90mm to the distance at crystal battery sheet edge.
CN200910048793A 2009-04-03 2009-04-03 Electrode pattern of solar cell Pending CN101853886A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200910048793A CN101853886A (en) 2009-04-03 2009-04-03 Electrode pattern of solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200910048793A CN101853886A (en) 2009-04-03 2009-04-03 Electrode pattern of solar cell

Publications (1)

Publication Number Publication Date
CN101853886A true CN101853886A (en) 2010-10-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910048793A Pending CN101853886A (en) 2009-04-03 2009-04-03 Electrode pattern of solar cell

Country Status (1)

Country Link
CN (1) CN101853886A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102101396A (en) * 2010-11-19 2011-06-22 奥特斯维能源(太仓)有限公司 Method for aligning metal grid line in solar cell metallization process
CN102130193A (en) * 2010-12-31 2011-07-20 常州天合光能有限公司 Positive electrode of silicon solar cell designed according to topology principle
CN102152676A (en) * 2010-11-29 2011-08-17 奥特斯维能源(太仓)有限公司 Saving type ink jet printing process for solar cell grid lines
CN103337528A (en) * 2013-05-30 2013-10-02 海南英利新能源有限公司 Solar cell
CN111916514A (en) * 2020-07-28 2020-11-10 江苏辉伦太阳能科技有限公司 Novel seamless photovoltaic module and preparation method thereof
JP2021168405A (en) * 2014-09-30 2021-10-21 エルジー エレクトロニクス インコーポレイティドLg Electronics Inc. Solar cell and solar cell panel including the same
US11769842B2 (en) 2014-09-30 2023-09-26 Shangrao Jinko Solar Technology Development Co., Ltd Solar cell and solar cell panel including the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102101396A (en) * 2010-11-19 2011-06-22 奥特斯维能源(太仓)有限公司 Method for aligning metal grid line in solar cell metallization process
CN102101396B (en) * 2010-11-19 2013-04-24 奥特斯维能源(太仓)有限公司 Method for aligning metal grid line in solar cell metallization process
CN102152676A (en) * 2010-11-29 2011-08-17 奥特斯维能源(太仓)有限公司 Saving type ink jet printing process for solar cell grid lines
CN102130193A (en) * 2010-12-31 2011-07-20 常州天合光能有限公司 Positive electrode of silicon solar cell designed according to topology principle
CN102130193B (en) * 2010-12-31 2012-10-17 常州天合光能有限公司 Positive electrode of silicon solar cell designed according to topology principle
CN103337528A (en) * 2013-05-30 2013-10-02 海南英利新能源有限公司 Solar cell
JP2021168405A (en) * 2014-09-30 2021-10-21 エルジー エレクトロニクス インコーポレイティドLg Electronics Inc. Solar cell and solar cell panel including the same
US11769842B2 (en) 2014-09-30 2023-09-26 Shangrao Jinko Solar Technology Development Co., Ltd Solar cell and solar cell panel including the same
CN111916514A (en) * 2020-07-28 2020-11-10 江苏辉伦太阳能科技有限公司 Novel seamless photovoltaic module and preparation method thereof

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Open date: 20101006