CN101817279A - Frame-mounted double-layer embroidery with stereoscopic effect and preparation method thereof - Google Patents
Frame-mounted double-layer embroidery with stereoscopic effect and preparation method thereof Download PDFInfo
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- CN101817279A CN101817279A CN 201010141918 CN201010141918A CN101817279A CN 101817279 A CN101817279 A CN 101817279A CN 201010141918 CN201010141918 CN 201010141918 CN 201010141918 A CN201010141918 A CN 201010141918A CN 101817279 A CN101817279 A CN 101817279A
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Abstract
The invention discloses a frame-mounted double-layer embroidery with stereoscopic effect and a preparation method thereof. The frame-mounted double-layer embroidery is characterized by mainly consisting of an inner frame (1), an outer frame (2), a front scenery silk embroidery (3) and a rear scenery silk embroidery (4), wherein the front scenery silk embroidery (3) which is formed by embroidering silk with good ventilation property is fixed to the front face of the inner frame (1), the rear scenery silk embroidery (4) is fixed to the rear face of the inner frame (1), the distance between the rear scenery silk embroidery (4) and the front scenery silk embroidery (3) is 1-20 centimeters, and the inner frame (1) is installed in the outer frame (2). When the embroidery is prepared, a picture is divided into a near scenery and a far scenery at first, and the front scenery silk embroidery and the rear scenery silk embroidery are then embroidered and combined respectively. The frame-mounted double-layer embroidery with simple structure, convenient manufacturing and strong stereoscopic effect is favorable for promoting traditional handicraft in the aspect of appreciation and collection.
Description
Technical field
The present invention relates to a kind of handicraft and preparation method thereof, especially a kind of embroidery with Chinese characteristics, as Suzhou embroidery, Hangzhoupro embroidery, Guangdong embroidery and Sichuan embroidery handicraft and preparation method thereof, specifically a kind of double-deck embroidery of band frame and preparation method thereof with stereoeffect.
Background technology
As everyone knows, Suzhou embroidery, Hangzhoupro embroidery, Guangdong embroidery and Sichuan embroidery are Chinese the four famous embroideries, and various embroideries always are the good merchantable brands of collection and appreciation.But all kinds of for a long time embroideries are planar structure, and all kinds of handicrafts of making also are planar products, do not have stereovision, lack a kind of agile U.S..Along with the raising of people's appreciation level, simple plane embroidery has been difficult to satisfy people's appreciation demand.
Summary of the invention
The objective of the invention is mostly to be planar products greatly at existing traditional embroidery, the problem of third dimension difference designs a kind of double-deck embroidery of band frame with stereoeffect, invents the method that a kind of preparation has the embroidery of stereoeffect simultaneously.
One of technical scheme of the present invention is:
A kind of double-deck embroidery of band frame with stereoeffect, it is characterized in that it mainly by inner frame 1, outside framework 2, prospect thin,tough silk embroider 3 and the background thin,tough silk embroider 4 and form, described prospect thin,tough silk is embroidered 3 and is adopted good embroidered the forming of silk of permeability, prospect thin,tough silk embroidery 3 is fixed on the front of inner frame 1, background thin,tough silk embroidery 4 is fixed on the back of inner frame 1, the distance that prospect thin,tough silk embroidery 3 and background thin,tough silk are embroidered between 4 is 1～20 centimetre, and inner frame 1 is installed in the outside framework 2.
Described background thin,tough silk is embroidered 4 and is single face embroidery or double-faced embroidery.
It is that the good silk of permeability is embroidered that described background thin,tough silk embroiders 4.
Described prospect thin,tough silk embroider 3 and the background thin,tough silk embroider 4 and be all a kind of in Suzhou embroidery goods, Hangzhoupro embroidery products, Guangdong embroidery system device or the Sichuan embroidery goods.
Described prospect thin,tough silk embroidery 3 and background thin,tough silk are embroidered the 4 random stitch embroidery goods that are all in the Suzhou embroidery goods.
Two of technical scheme of the present invention is:
A kind of double-deck embroidery of band frame with stereoeffect, it is characterized in that it mainly embroiders 3 and background thin,tough silk by inner frame 1, outside framework 2, two prospect thin,tough silk and embroider 4 and form, described prospect thin,tough silk is embroidered 3 and is adopted good embroidered the forming of silk of permeability, two prospect thin,tough silk are embroidered 3 and are separately fixed on the forward and backward both ends of the surface of inner frame 1, background thin,tough silk embroidery 4 is fixed on the middle part of inner frame 1, two prospect thin,tough silk embroider 3 and the background thin,tough silk distance of embroidering between 4 be 1～15 centimetre, inner frame 1 is installed in the outside framework 2.
Three of technical scheme of the present invention is:
A kind of preparation method with double-deck embroidery of band frame of stereoeffect is characterized in that it may further comprise the steps:
At first, the pattern input computer that needs are embroidered, the pattern with input under the help of PaintShop is divided into prospect part and background part and exports prospect pattern and background pattern;
Secondly, the prospect pattern is embroidered on the good silk of permeability, form the prospect thin,tough silk and embroider; The embroidered background thin,tough silk that forms on common silk or penetrating silk of background pattern is embroidered;
The 3rd, above-mentioned prospect thin,tough silk embroidery and background thin,tough silk are embroidered the obverse and reverse that is separately fixed at inner frame, and the distance between control prospect thin,tough silk embroidery and the background thin,tough silk embroidery is between 1～20 centimetre;
Two prospect thin,tough silk perhaps will having embroidered are embroidered the obverse and reverse that is separately fixed at inner frame, and the background thin,tough silk is embroidered the middle part that is fixed on inner frame, and two prospect thin,tough silk are embroidered and the distance of background thin,tough silk between embroidering is 1～15 centimetre;
At last, be installed in the double-deck embroidery that promptly obtains having stereoeffect in the outside framework with being fixed with the inner frame that the prospect thin,tough silk is embroidered and the background thin,tough silk is embroidered.
Described background thin,tough silk is embroidered and is single face embroidery or double-faced embroidery.
Described prospect thin,tough silk is embroidered and background thin,tough silk embroidery is all a kind of in Suzhou embroidery goods, Hangzhoupro embroidery products, Guangdong embroidery system device or the Sichuan embroidery goods.
Described prospect thin,tough silk is embroidered and the background thin,tough silk is embroidered the random stitch embroidery goods that are all in the Suzhou embroidery goods.
Beneficial effect of the present invention:
1, the present invention is incorporated into the notion of relief painting in the embroidery first, not only makes embroidery more attractive in appearance, has satisfied the growing appreciation demand of people, and has expanded the scope of traditional embroidery.
2, the present invention is that tourist market and collection circle have increased new kind.
3, structure of the present invention, method are simple, easily manufactured, are the upgradings to traditional product.
4, richer third dimension of embroidery picture of the present invention and stereovision, can make the anterior layer red flowers and green willows during as the landscape works, Spring is very much in the air, the building at back layer fortune place or the scenery light and shade along with light in the clustering round of green shade springs up, can make whole works soft and graceful more elegant, help promoting it and view and admire and collect value.
5, the present invention is breakthrough and the innovation to traditional handicraft and product, can give traditional arts and crafts with times flavour, produces agile U.S. when making originally stiff plane works produce stereovision, more helps the performance of works artistic conception.
Description of drawings
Fig. 1 is to be the contour structures schematic diagram of the reflection feature of the present invention of background with the Humble Administrator's Garden.
Fig. 2 is one of structural representation of the present invention.
Fig. 3 is two of a structural representation of the present invention.
Fig. 4 is the photo figure of the Humble Administrator's Garden of the embodiment of the invention.
Fig. 5 embroiders according to the prospect thin,tough silk that photo shown in Figure 4 foreground picture after computer is handled is made.
Fig. 6 embroiders according to the background thin,tough silk of photo shown in Figure 4 background picture making after computer is handled.
The specific embodiment
The present invention is further illustrated below in conjunction with drawings and Examples.
Embodiment one.
As shown in Figure 1, 2.
A kind of double-deck embroidery of band frame with stereoeffect, it is mainly by inner frame 1, outside framework 2, prospect thin,tough silk embroidery 3 and background thin,tough silk are embroidered 4 and are formed, as shown in Figure 2, described prospect thin,tough silk is embroidered good embroidered the forming of silk of 3 employing permeabilities, and (embroidery can adopt any embroidery in the four famous embroideries, especially can adopt random stitch embroidery in the Suzhou embroidery for making embroidering method), the background thin,tough silk embroiders 4 can adopt the weaker silk of permeability embroidered (adopting when generally being used to be installed in the body of wall), not only can adopt single face to embroider but also can adopt double-faced embroidery, the background thin,tough silk is embroidered 4 any embroideries that also can adopt in the four famous embroideries, especially can adopt random stitch embroidery in the Suzhou embroidery for making embroidering method, prospect thin,tough silk embroidery 3 is fixed on the front of inner frame 1, background thin,tough silk embroidery 4 is fixed on the back of inner frame 1, inner frame 1 mid portion is and can makes picture produce relief space structure, the distance that prospect thin,tough silk embroidery 3 and background thin,tough silk are embroidered between 4 is 1～20 centimetre, can select according to the picture dimension and the depth of field during concrete enforcement, be good generally with 3-8 centimetre, inner frame 1 is installed in the outside framework 2, as shown in Figure 2, embroider the characteristics that 4 penetrating degree and works are put according to the background thin,tough silk, the rear portion of outside framework 2 can install liner plate additional, also can not install liner plate additional.Fig. 1 is to be the profile schematic diagram of the double-deck embroidery of the present invention of background with the Humble Administrator's Garden.During concrete enforcement, the background thin,tough silk is embroidered 4 and also can be adopted the good silk of transparent performance embroidered, both can adopt the single face rust, also can adopt double-faced embroidery, adopt the good silk of permeability to embroider the embroidery of formation in 4 o'clock generally to be installed on the partition or body of wall with through hole as the background thin,tough silk, so both can watch, also can watch from its reverse side from the front of partition or body of wall.The present invention simultaneously also can be installed in desktop, ground or cabinet top and go up so that all can enjoy space pattern of the present invention from both sides, raising artistic grade and visual enjoyment.
Embodiment two.
As shown in Figure 3.
A kind of double-deck embroidery of band frame with stereoeffect, it is mainly by inner frame 1, outside framework 2, two prospect thin,tough silk are embroidered 3 and background thin,tough silk and are embroidered 4 compositions, as shown in Figure 3, described two prospect thin,tough silk are embroidered 3 and are all adopted embroidered the forming of the good silk of permeability, two prospect thin,tough silk embroider 3 be separately fixed at inner frame 1 before, on the back both ends of the surface, background thin,tough silk embroidery 4 is fixed on the middle part of inner frame 1, two prospect thin,tough silk embroider 3 and the background thin,tough silk distance of embroidering between 4 be 1～15 centimetre, two prospect thin,tough silk embroider 3 and the background thin,tough silk embroider that distance between 4 can equate also can be unequal, can determine that inner frame 1 is installed in the outside framework 2 according to concrete picture and the depth of field and bright and dark light.The background thin,tough silk is embroidered the 4 general double-faced embroideries that adopt, the pattern on two sides can be identical also can be inequality, two similarly corresponding prospect thin,tough silk embroider 3 also can be identical or inequality.Present embodiment is particularly useful for being installed on the partition or body of wall with through hole, so both can watch from the front of partition or body of wall, also can watch from its reverse side.The embroidery of present embodiment also can be installed on desktop, ground or the cabinet top simultaneously, so that all can enjoy space pattern of the present invention from both sides, improves artistic grade and visual enjoyment.
Embodiment three.
Shown in Fig. 1,4,5,6.
Be that example is done a detailed description to preparation method of the present invention with the three-dimensional embroidery in Humble Administrator's Garden, Suzhou below.
At first, the picture with scenes of " Humble Administrator's Garden, Suzhou " shown in Figure 4 that needs are embroidered input computer, the pattern with input under the help of PaintShop is divided into prospect part and background part and exports prospect pattern and background pattern;
Secondly, adopt the random stitch embroidery method in the Suzhou embroidery embroidered on the good silk of permeability in the prospect pattern, form prospect thin,tough silk shown in Figure 5 and embroider; Simultaneously the background pattern is adopted also that random stitch embroidery method in the Suzhou embroidery is embroidered to be formed background thin,tough silk shown in Figure 6 and embroider on common silk; The embroidery method that adopts during concrete enforcement can be selected according to the characteristic of various places, can be artificial embroidery, also can be machine and embroiders, and is wherein precious with artificial embroidery.The background thin,tough silk is embroidered and can be adopted common silk also can adopt the good silk of permeability (as white silk silk).
The 3rd, above-mentioned prospect thin,tough silk embroidery and background thin,tough silk are embroidered the obverse and reverse that is separately fixed at inner frame, and the distance between control prospect thin,tough silk embroidery and the background thin,tough silk embroidery is between 1～20 centimetre; Two prospect thin,tough silk perhaps will having embroidered are embroidered the obverse and reverse that is separately fixed at inner frame, and the background thin,tough silk is embroidered the middle part that is fixed on inner frame, and two prospect thin,tough silk are embroidered and the distance of background thin,tough silk between embroidering is 1～15 centimetre, distance between the two can be identical also can be different.
At last, will be fixed with that the prospect thin,tough silk is embroidered and the inner frame of background thin,tough silk embroidery is installed in and promptly obtains the double-deck embroidery with stereoeffect shown in Figure 1 in the outside framework.
Double-deck random stitch embroidery works shown in Figure 1 set each other off with the random stitch embroidery performance garden on the Yangtze Delta Humble Administrator's Garden water stone that the picture reason combines with the embroidery reason, simple and unsophisticated beautiful scenery, it is crisscross to handle the needle, through thickness, length, the neither colo(u)r streak together of density, the lively variation that represents gardens light and color vividly, owing to adopted the methods of invention of double-deck stack, make richer third dimension of picture and stereovision, the anterior layer red flowers and green willows, Spring is very much in the air, layer building or scenery light and shade along with light in the clustering round of green shade at a distance in back springs up, can make whole works soft and graceful more elegant, allow the people very much to south of the River scene reverie, be extremely precious ornamental article and trophy, help promoting it and view and admire and collect value.
Pattern of the present invention is not limited to the Humble Administrator's Garden among the embodiment during concrete enforcement.
During concrete enforcement, inner frame and outside framework both can be two independently members, also can be an overall structure.
The part that the present invention does not relate to prior art that maybe can adopt all same as the prior art is realized.
Claims (10)
1. double-deck embroidery of the band frame with stereoeffect, it is characterized in that it mainly embroiders (3) by inner frame (1), outside framework (2), prospect thin,tough silk and background thin,tough silk embroidery (4) is formed, described prospect thin,tough silk is embroidered (3) and is adopted good embroidered the forming of silk of permeability, the prospect thin,tough silk is embroidered the front that (3) are fixed on inner frame (1), the background thin,tough silk is embroidered the back that (4) are fixed on inner frame (1), the distance that the prospect thin,tough silk is embroidered between (3) and the background thin,tough silk embroidery (4) is 1～20 centimetre, and inner frame (1) is installed in the outside framework (2).
2. the double-deck embroidery of band frame with stereoeffect according to claim 1 is characterized in that described background thin,tough silk embroidery (4) is that single face is embroidered or double-faced embroidery.
3. the double-deck embroidery of band frame with stereoeffect according to claim 1 is characterized in that it is that the good silk of permeability is embroidered that described background thin,tough silk is embroidered (4).
4. the double-deck embroidery of the band frame with stereoeffect according to claim 1 is characterized in that described prospect thin,tough silk embroiders (3) and background thin,tough silk embroidery (4) and be all a kind of in Suzhou embroidery goods, Hangzhoupro embroidery products, Guangdong embroidery system device or the Sichuan embroidery goods.
5. the double-deck embroidery of band frame with stereoeffect according to claim 4 is characterized in that described prospect thin,tough silk embroidery (3) and background thin,tough silk embroidery (4) is all the random stitch embroidery goods in the Suzhou embroidery goods.
6. double-deck embroidery of the band frame with stereoeffect, it is characterized in that it mainly embroiders (3) by inner frame (1), outside framework (2), two prospect thin,tough silk and a background thin,tough silk embroidery (4) is formed, described prospect thin,tough silk is embroidered (3) and is adopted good embroidered the forming of silk of permeability, two prospect thin,tough silk are embroidered (3) and are separately fixed on the forward and backward both ends of the surface of inner frame (1), the background thin,tough silk is embroidered the middle part that (4) are fixed on inner frame (1), the distance that two prospect thin,tough silk embroideries (3) and background thin,tough silk are embroidered between (4) is 1～15 centimetre, and inner frame (1) is installed in the outside framework (2).
7. claim 1 or 6 described preparation methods with double-deck embroidery of band frame of stereoeffect is characterized in that it may further comprise the steps:
At first, the pattern input computer that needs are embroidered, the pattern with input under the help of PaintShop is divided into prospect part and background part and exports prospect pattern and background pattern;
Secondly, the prospect pattern is embroidered on the good silk of permeability, form the prospect thin,tough silk and embroider; The embroidered background thin,tough silk that forms on common silk or penetrating silk of background pattern is embroidered;
The 3rd, above-mentioned prospect thin,tough silk embroidery and background thin,tough silk are embroidered the obverse and reverse that is separately fixed at inner frame, and the distance between control prospect thin,tough silk embroidery and the background thin,tough silk embroidery is between 1～20 centimetre;
Two prospect thin,tough silk perhaps will having embroidered are embroidered the obverse and reverse that is separately fixed at inner frame, and the background thin,tough silk is embroidered the middle part that is fixed on inner frame, and two prospect thin,tough silk are embroidered and the distance of background thin,tough silk between embroidering is 1～15 centimetre;
At last, be installed in the double-deck embroidery that promptly obtains having stereoeffect in the outside framework with being fixed with the inner frame that the prospect thin,tough silk is embroidered and the background thin,tough silk is embroidered.
8. preparation method according to claim 7 is characterized in that described background thin,tough silk embroidery is that single face is embroidered or double-faced embroidery.
9. preparation method according to claim 7 is characterized in that described prospect thin,tough silk is embroidered and background thin,tough silk embroidery is all a kind of in Suzhou embroidery goods, Hangzhoupro embroidery products, Guangdong embroidery system device or the Sichuan embroidery goods.
10. preparation method according to claim 9 is characterized in that described prospect thin,tough silk is embroidered and the background thin,tough silk is embroidered the random stitch embroidery goods that are all in the Suzhou embroidery goods.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010141918A CN101817279B (en) | 2010-04-08 | 2010-04-08 | Frame-mounted double-layer embroidery with stereoscopic effect and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201010141918A CN101817279B (en) | 2010-04-08 | 2010-04-08 | Frame-mounted double-layer embroidery with stereoscopic effect and preparation method thereof |
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| CN101817279A true CN101817279A (en) | 2010-09-01 |
| CN101817279B CN101817279B (en) | 2012-10-10 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102837546A (en) * | 2012-09-12 | 2012-12-26 | 周海云 | Three-layered embroidery with frame and three-dimensional effect |
| CN103847413A (en) * | 2014-04-02 | 2014-06-11 | 司马建明 | Double-layer stereoscopic carving embroidery with frame |
| CN105803703A (en) * | 2016-04-22 | 2016-07-27 | 武汉纺织大学 | Automatically controlled double-surface embroidering device |
| CN115534571A (en) * | 2022-09-27 | 2022-12-30 | 李文峰 | Novel silk net drawing method |
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| GB1485979A (en) * | 1974-10-24 | 1977-09-14 | Morrall Ltd A | Framed embroidery assembly |
| CN2136255Y (en) * | 1991-12-18 | 1993-06-16 | 张国仁 | Three-dimensional two-side embroidery |
| CN2283578Y (en) * | 1997-01-30 | 1998-06-10 | 胡晨光 | Pearl embroidered handicraft picture |
| CN201627070U (en) * | 2010-04-08 | 2010-11-10 | 江苏爱涛文化艺术有限公司 | Stereoscopic framed dual-layer embroidery |
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2010
- 2010-04-08 CN CN201010141918A patent/CN101817279B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1485979A (en) * | 1974-10-24 | 1977-09-14 | Morrall Ltd A | Framed embroidery assembly |
| CN2136255Y (en) * | 1991-12-18 | 1993-06-16 | 张国仁 | Three-dimensional two-side embroidery |
| CN2283578Y (en) * | 1997-01-30 | 1998-06-10 | 胡晨光 | Pearl embroidered handicraft picture |
| CN201627070U (en) * | 2010-04-08 | 2010-11-10 | 江苏爱涛文化艺术有限公司 | Stereoscopic framed dual-layer embroidery |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102837546A (en) * | 2012-09-12 | 2012-12-26 | 周海云 | Three-layered embroidery with frame and three-dimensional effect |
| CN102837546B (en) * | 2012-09-12 | 2014-11-26 | 周海云 | Three-layered embroidery with frame and three-dimensional effect |
| CN103847413A (en) * | 2014-04-02 | 2014-06-11 | 司马建明 | Double-layer stereoscopic carving embroidery with frame |
| CN105803703A (en) * | 2016-04-22 | 2016-07-27 | 武汉纺织大学 | Automatically controlled double-surface embroidering device |
| CN105803703B (en) * | 2016-04-22 | 2023-12-12 | 武汉纺织大学 | Automatic change two-sided embroidery device of control |
| CN115534571A (en) * | 2022-09-27 | 2022-12-30 | 李文峰 | Novel silk net drawing method |
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| CN101817279B (en) | 2012-10-10 |
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Address after: No. 199 Tianyuan West Road, Economic Development Zone, Jiangning District, Nanjing City, Jiangsu Province, 211106 Patentee after: Jiangsu Suhao Aitao Culture Co.,Ltd. Address before: Floor 8, Hongye Building, No. 50 Zhonghua Road, Nanjing, Jiangsu, 210001 Patentee before: JIANGSU ARTALL ARTS Co.,Ltd. |
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