CN101782724A - Contact exposure apparatus and contact exposure method - Google Patents
Contact exposure apparatus and contact exposure method Download PDFInfo
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- CN101782724A CN101782724A CN201010004497A CN201010004497A CN101782724A CN 101782724 A CN101782724 A CN 101782724A CN 201010004497 A CN201010004497 A CN 201010004497A CN 201010004497 A CN201010004497 A CN 201010004497A CN 101782724 A CN101782724 A CN 101782724A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
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- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
An object of the invention is to provide a contact exposure apparatus and contact exposure method in which the sealing member will not connect to the mask platform upon performing contraposition of mask and workpiece. The contact exposure apparatus has a mask platform for holding mask formed with patterns, and a workpiece platform for placing the workpiece, annular sealing members are mounted on the peripheral part of the mask platform or the workpiece platform so that he workpiece placed in the workpiece platform is contacted with the mask, the exposure light is irradiated on the workpiece through the mask, under a state that the space formed by the mask, the mask platform, the workpiece, the workpiece platform and the sealing member is decompressed, which is characterized in that a travel mechanism performing upward and downward movement to the annular direction integration of the front end part of the sealing member.
Description
Technical field
The present invention relates to exposure device, relate in particular to the pattern that mask is adjacent to mutually with workpiece and will be formed on mask and be replicated in contact exposure apparatus and contact exposure method on the workpiece.
Background technology
In the manufacturing of required various electric parts such as processing such as the micro-dimension of semiconductor device, crystal liquid substrate, micromachine etc. etc., known such exposure device: in order on workpiece, to form various electronic components etc., by forming figuratum mask with rayed on workpiece, and on workpiece, mask pattern is exposed.In such exposure device, have and mask is adjacent to mutually with workpiece and mask pattern is replicated in contact exposure apparatus on the workpiece.
Figure 11 is the sectional view of an example of the contact exposure apparatus of expression prior art.
As shown in the drawing, this contact exposure apparatus roughly by the illumination part 101 that penetrates exposure light, keep mask 102 mask stage 103, and the work stage 105 that keeps carrying out the workpiece 104 of exposure-processed constituted.Illumination part 101 possesses and has: radiation comprise the light of exposure light lamp 1011, and reflection by the reflection of light mirror 1012 of lamp 1011 radiation.Mask stage 103 keeps being formed with the mask 102 of the pattern (mask pattern) 1022 that is replicated in workpiece 104.Work stage 105 keeps duplicating the workpiece 104 of mask pattern 1022.
At the periphery of work stage 105, resinous annular seal member 106, for example lip seal are installed in the mode of the part of surrounding mounting workpiece 104.Containment member 106 is for example at the part coating vacuum grease 107 that joins with work stage 105, and fixed by bolt 108.The front end of containment member 106 time contacts below mask stage 103 and forms confined space in exposure as described later.In addition, on mask stage 103, be provided for the vacuum pipe arrangement 109 that reduces pressure by mask 102, mask stage 103, workpiece 104, work stage 105 and containment member 106 formed confined spaces.
In addition, work stage driving mechanism 110 is installed on work stage 105, work stage driving mechanism 110 has work stage of making 105 and moves along directions X (for example left and right directions of paper), Y direction (for example relative to paper in vertical direction), Z direction (for example above-below direction of paper), and make work stage 105 with perpendicular to the workpiece face the axle be that the center is rotated the function of (this rotation is called the θ direction moves).Wherein, at mask 102 and workpiece 104,, be formed with alignment mark 1021,1041 separately in order to make both position phase contrapositions.
Figure 12 to Figure 14 is the figure of the exposure process of expression contact exposure apparatus shown in Figure 11.Wherein, in Figure 12 to Figure 14, omit illumination part 101 or work stage driving mechanism 110 shown in Figure 11.
Use Figure 11 to Figure 14, be illustrated at the exposure process of contact exposure apparatus.
In Figure 11, by not shown transport mechanism, workpiece 104 is placed on the work stage 105 and is kept.Wherein, the surface coated at workpiece 104 has the not shown resist that reacts because of exposure light.
Then, as shown in figure 12, not shown work stage driving mechanism 110 moves, and work stage 105 rising (the Z direction moves) to the mask 102 and the intervals of workpiece 104 become predefined the aligning till the space (contraposition gap).Aim at space (contraposition gap) and be for example 100 μ m.Then, between mask 102 and not shown illumination part 101, insert collimation microscope 111, detect simultaneously the mask alignment mark (mask mark) 1021 that is formed on mask 102, with the workpiece alignment mark (workpiece mark) 1041 that is formed on workpiece 104.Like this, collimation microscope 111 detects mask mark 1021 and workpiece mark 1041 simultaneously, therefore aims at the depth of focus that space (contraposition gap) exists with ... collimation microscope 111.Recently, in order to improve aligning (contraposition) precision, gradually the service precision height, be the shallow microscope of the depth of focus.
For making both alignment mark 1021,1041 corresponding to modes (or become preposition relation), by work stage driving mechanism 110 work stage 105 is moved along XY θ direction, carry out the contraposition (aligning) of mask 102 and workpiece 104.Wherein, the contraposition of mask 102 and workpiece 104 can make mask stage 103 move to carry out, also can make work stage 105 and mask stage 103 both move and carry out.
Then, as shown in figure 13, after aiming at end, make work stage 105 risings and mask 102 is contacted with workpiece 104.Be arranged on work stage 105 annular seal member 106 whole meetings on every side and surround the part that mountings have workpiece 104, seamlessly contact mask stage 103 below, be formed with the confined space that is sealed by mask 102, mask stage 103, workpiece 104, work stage 105, containment member 106.Under this state, the vacuum pipe arrangement 109 that is arranged on mask stage 103 is supplied with vacuum, aforementioned seal cavity is reduced pressure.If seal cavity is depressurized, mask 102 is pressed against workpiece 104, and mask 102 spreads all over comprehensively and mutually with workpiece 104 and is adjacent to.Wherein, also can be at this moment by the not shown vacuum suction hole blow out air (being also referred to as blow back) that is formed on work stage 105 with workpiece 102 by being pressed in mask 104.
At this, the reason that seal cavity is reduced pressure is in order to prevent that residual air accumulates between mask 102 and workpiece 104, to be adjacent to mutually and mask 102 is spreaded all over comprehensively with workpiece 104.If only mask 102 is contacted with workpiece 104, then have warpage or small concavo-convex etc. situation at mask 102 or workpiece 104, and mask 102 is spreaded all over comprehensively with workpiece 104 be adjacent to mutually, and can between mask 102 and workpiece 104, produce the gap, and make the exposure accuracy variation.Make in that seal cavity is reduced pressure under mask 102 and the state that workpiece 104 is adjacent to mutually,, then on workpiece 104, be replicated mask pattern if when exposure light being radiated at workpiece 104 by mask 102 by not shown illumination part 101.
As shown in figure 14, if finish the irradiation of exposure light, not shown work stage driving mechanism 110 moves, and work stage 105 descends.Afterwards, by not shown transport mechanism, workpiece 104 is taken out of to exposure device by work stage 105.
Like this, mask 102 will be adjacent to mutually with workpiece 104, and makes between mask stage 103 and the work stage 105 decompression and expose and be called rigid contact exposure (Hard ContactExposure).As the example of this rigid contact exposure, for example be illustrated in patent documentation 1 or the patent documentation 2.
Wherein, in Figure 11 to Figure 14, as containment member 106, the section shape that is called as lip seal that the market sells is represented in medelling.If lip seal, particularly its fore-end 1061 contacts are below mask stage 103.That is, the lip seal integral body of ring-type is surrounded workpiece 104 and is formed pressure reduction space below the contact mask stage 103 in its fore-end 1061.But in the device of reality, if when directly using the lip seal that the market sells, then lip seal major part be the resin system of softness, so it is sagging because of gravity to have the part of fore-end 1061, the unjustified situation of the height of lip seal.If the height of the fore-end 1061 of lip seal is unjustified, then in Figure 13, if when mask 102 is contacted with workpiece 104, the part of fore-end 1061 that is set as the lip seal of ring-type can't contact mask stage 103 below, have and produce the situation of leaking and can't reduce pressure between mask 102 and the workpiece 104.
Wherein, Figure 15 is the leakage of expression in order to prevent to use lip seal as containment member 106, the inventor etc. improve the figure of the formation of employed containment member 112, and Figure 15 (a) is the stereographic map of containment member 112, and Figure 15 (b) is the part sectioned view of containment member 112.
As shown in these figures, containment member 112 is for the height alignment with fore-end, on the top of the 1st resin part 1121 of ring-type the metal sheet shape member (stainless steel ring) 1123 of ring-type is installed, on the tabular component 1123 of this ring-type, is formed with ring-type and is the 2nd resin part 1122 of overshooting shape.In addition, the mode of the 1st resin part 1121 can not be out of shape because of the weight of the tabular component 1123 of ring-type is equipped with the spring member 1124 that for example is made of plate-shaped springs etc. at a plurality of positions of tabular component 1123.The opposition side with being installed in tabular component 1123 sides of spring member 1124 is fixed on work stage 105.Thus, tabular component 1123 is suppressed the direction in mask stage 103 by the elasticity of spring member 1124.Be formed on the 2nd resin part 1122 of the ring-type on the tabular component 1123 of ring-type, in fore-end 11221, below mask stage 103, join.Like this, on the tabular component 1123 of ring-type, be formed with the 2nd resin system part 1122 of joining with mask stage 103, therefore, the tabular component 1123 of ring-type has the effect with the height alignment of the fore-end 11221 of the 2nd resin part 1122, the sagging situation of the part of the fore-end 11221 of the 2nd resin part 1122 of joining with mask stage 103 can be eliminated, can be with the height alignment of the fore-end of containment member 112.
[patent documentation 1] Japanese kokai publication hei 4-27931 communique
[patent documentation 2] Japanese kokai publication hei 11-186124 communique
Containment member 112 shown in Figure 15 also is used in the space that is used for 105 of mask stage 103 and work stage and reduces pressure.Therefore, make in that work stage 105 is risen under workpiece 104 and the state that mask 102 is adjacent to mutually, the fore-end 11221 of containment member 112 must contact below mask stage 103.But, if make the height (length) of containment member 112 when workpiece 104 is adjacent to mutually with mask 102, make its front end become the such height (length) that below mask stage 103, fully contacts, shown in Figure 12 when carrying out the contraposition of mask 102 and workpiece 104, mask 102 is also less as mentioned above with the interval of workpiece 104, be 100 μ m, so the fore-end 11221 of containment member 112 contact below mask stage 103.As previously mentioned, use the collimation microscope 111 that the depth of focus is shallow and precision is high recently gradually, aiming at space (contraposition gap) has the tendency that narrows down increasingly.Generally speaking, containment member 112 is a resin system, is difficult to processing and fabricating height correctly with μ m level.The contraposition of mask 102 and workpiece 104 makes any one or its two side of mask stage 103 or work stage 104 mobile and carry out.Displacement is generally about 50～200 μ m, but in order to shorten the whole spent time (productive temp) of exposure-processed, must smoothly move as far as possible quickly.But if containment member 112 is when contacting with mask stage 103 below, because the elasticity of resinous containment member 112, mask stage 103 or work stage 105 can't move smoothly, or are pulled after mobile, or expend time in during contraposition, or the aligning accuracy variation.That is, no matter under the situation of using containment member 106 shown in Figure 11, still under the situation of using containment member 112 shown in Figure 15, all can produce identical problem.
Summary of the invention
The objective of the invention is to supervise in the problems referred to above point, a kind of contact exposure apparatus or contact exposure method are provided, possessing at the periphery of work stage has containment member, mask is adjacent to mutually with workpiece, decompression between with mask stage and work stage and when exposing, when carrying out the contraposition of mask and workpiece, containment member can not contacted with mask stage.
The present invention adopts method as follows in order to solve above-mentioned problem.
The 1st method is a kind of contact exposure apparatus, possess: form figuratum mask, the mask stage that keeps this mask, and the work stage of mounting workpiece, the containment member of ring-type is installed at the periphery of aforementioned mask stage or work stage, the said workpiece that is positioned in the said workpiece platform is contacted with aforementioned mask, to by aforementioned mask, aforementioned mask stage, said workpiece, the said workpiece platform, under the state that reduces pressure with the formed space of aforementioned containment member, exposure light is radiated on the said workpiece by aforementioned mask, it is characterized by: the travel mechanism that the leading section integral body that makes the sealing member moves up and down is installed at aforementioned containment member.
The 2nd method is in the contact exposure apparatus of the 1st method, and aforementioned containment member possesses: be fixed on the said workpiece platform and the 1st resin part of the ring-type of elastically deformable; Be installed in the tabular component of ring-type on the top of the 1st resin component element: the 2nd resin part that is formed on the top ring-type of this tabular component: and an end is fixed on aforementioned tabular component and the other end is fixed on the said workpiece platform, the spring that aforementioned tabular component is suppressed to the direction of aforementioned mask stage
The 3rd method is a kind of contact exposure method, possess: form figuratum mask, the mask stage that keeps this mask, and the work stage of mounting workpiece, the containment member of the ring-type that leading section integral body moves up and down is installed at the periphery of aforementioned mask stage or said workpiece platform, after the contraposition of carrying out aforementioned mask and said workpiece, aforementioned mask is contacted with said workpiece, exposure light is radiated on the said workpiece by aforementioned mask, it is characterized by: when carrying out the contraposition of aforementioned mask and said workpiece, the leading section of aforementioned containment member is kept out of the way to said workpiece platform that aforementioned containment member is installed or aforementioned mask stage side, when exposure light is radiated at said workpiece by aforementioned mask, the leading section of aforementioned containment member moves to the direction of opposed aforementioned mask stage or said workpiece platform, contact with aforementioned mask stage or said workpiece platform, by aforementioned mask, aforementioned mask stage, said workpiece, the said workpiece platform, be depressurized with the formed space of aforementioned containment member.
The 4th method is a kind of contact exposure method, it is characterized by, and comprises: in the 1st operation of work stage mounting workpiece; The leading section of containment member is kept out of the way to work stage that the sealing member is installed or mask stage side, made work stage move to the 2nd operation of contraposition position; The 3rd operation that the alignment mark that detection is formed on mask carries out contraposition with being formed on the alignment mark of said workpiece; The leading section of containment member is moved to opposed aforementioned mask stage or said workpiece platform, make the said workpiece platform move to the 4th operation of exposure position; To by aforementioned mask, aforementioned mask stage, said workpiece, said workpiece platform, and the 5th operation that reduces pressure of leading section and aforementioned mask stage or the formed space of the contacted aforementioned containment member of said workpiece platform; Exposure light is radiated at the 6th operation of said workpiece by aforementioned mask; And will be through said workpiece the 7th operation of taking out of after the exposure from aforementioned work stage.
The effect of invention
By the present invention, when mask and workpiece contraposition, because containment member descends for the ring-type direction is whole, therefore the fore-end that is used to form the seal cavity of containment member does not have following (when containment member is arranged on the mask stage side then for above the work stage) the contacted situation with mask stage, therefore moving of work stage do not have the situation that expends time in or be pulled, do not have the situation that aligning accuracy reduces yet, can carry out moving of mask stage or work stage or two sides smoothly.
Description of drawings
Fig. 1 is the sectional view of formation of contact exposure apparatus of the invention of expression the 1st embodiment.
Fig. 2 is the sectional view of exposure process of contact exposure apparatus of the invention of expression the 1st embodiment.
Fig. 3 is the sectional view of exposure process of contact exposure apparatus of the invention of expression the 1st embodiment.
Fig. 4 is the sectional view of exposure process of contact exposure apparatus of the invention of expression the 1st embodiment.
Fig. 5 is the stereographic map of expression containment member travel mechanism (absorption layer) 9.
Fig. 6 is the sectional view of exposure process of contact exposure apparatus of the invention of expression the 2nd embodiment.
Fig. 7 is the sectional view of exposure process of contact exposure apparatus of the invention of expression the 2nd embodiment.
Fig. 8 is the sectional view of formation of contact exposure apparatus of the invention of expression the 3rd embodiment.
Fig. 9 is the formation sectional view of the employed containment member 6 of contact exposure apparatus of the invention of expression the 4th embodiment.
Figure 10 is the formation sectional view of the employed containment member 6 of contact exposure apparatus of the invention of expression the 5th embodiment.
Figure 11 is the sectional view of contact exposure apparatus one example of expression prior art.
Figure 12 is the figure of the exposure process of expression contact exposure apparatus shown in Figure 11.
Figure 13 is the figure of the exposure process of expression contact exposure apparatus shown in Figure 11.
Figure 14 is the figure of the exposure process of expression contact exposure apparatus shown in Figure 11.
Figure 15 is the pie graph of the containment member 112 after expression improves prior art problems point.
Among the figure, 1: illumination part; 11 ': lamp; 12 ': catoptron;
2: mask; 21: the mask alignment mark; 22: pattern;
3: mask stage; 4: workpiece; 41: the workpiece alignment mark;
5: work stage; 6: containment member; 61: the 1 resin parts;
62: the 2 resin parts; 63: tabular component; 64: spring member;
65: bellows members 66: resin; 67: diaphragm element
671: top (leading section); 7: the vacuum pipe arrangement; 8: the work stage driving mechanism;
9: containment member travel mechanism; 91: pillar; 92: corrugated part; 93: the adsorption section;
94: the vacuum path;
10: the vacuum pipe arrangement; 11: the collimation microscope; 12: containment member travel mechanism;
121: internal thread part; 122: external thread part; 123: motor.
Embodiment
Use Fig. 1 to Fig. 5, the 1st embodiment of the present invention is described.
Fig. 1 is the sectional view of formation of contact exposure apparatus of the invention of expression present embodiment.
As shown in the drawing, this contact exposure apparatus possesses and has: penetrate exposure light illumination part 1, keep forming figuratum mask 2 mask stage 3, and keep carrying out the work stage 5 of the workpiece 4 of exposure-processed.Illumination part 1 possesses and has: radiate the lamp 11 of the light that comprises exposure light ' and the catoptron 12 that will reflect by the light of lamp 11 ' radiated '.Mask stage 3 keeps being formed with the mask 2 of the pattern (mask pattern) 22 that is replicated in workpiece 4.Work stage 5 keeps duplicating the workpiece 4 of mask pattern 22.
The containment member 6 of ring-type is installed in the mode of the part of encirclement mounting workpiece 4 at the periphery of work stage 5.Containment member 6 is fixed by bolt at the part coating vacuum grease that for example joins with work stage 5.The leading section integral body of the 2nd resin part 62 of containment member 6 as described later, is surrounded the part of mounting workpiece 4 and is seamlessly contacted below mask stage 3 and form enclosure space in when exposure with ring-type.In addition, be provided for by mask 2, mask stage 3, workpiece 4, work stage 5, and the vacuum pipe arrangement 7 that reduces pressure of containment member 6 formed enclosure spaces in mask stage 3.Wherein, the containment member 6 of ring-type is provided with in the mode of the part of surrounding mounting workpiece 4, and the mode of ring-type is not to be defined in colyliform, for example also comprises to meet the workpiece shape and form square shape.
In addition, work stage driving mechanism 8 is installed on work stage 5, work stage driving mechanism 8 has work stage of making 5 and moves along directions X (for example left and right directions of paper), Y direction (for example being vertical direction with respect to paper), Z direction (for example above-below direction of paper), and to make work stage 5 be that the center is rotated the function of (this rotation is called the θ direction moves) with the axle perpendicular to the workpiece face.Wherein, on mask 2 and workpiece 4, be formed with alignment mark 21,41 respectively, so that both positions are involutory.
Containment member 6 aligns for the height that makes the ring-type direction of contacted fore-end below mask stage 3, the tabular component (stainless steel ring) 63 of the thin metal of ring-type is installed on the top of the 1st resin part 61 of ring-type, and being formed with leading section on the tabular component 63 of ring-type is ring-type and the 2nd resin part 62 that is overshooting shape.In addition, the mode of the 1st resin part 61 can not be out of shape because of the weight of the tabular component 63 of ring-type is equipped with the spring member 64 that for example is made of plate-shaped springs etc. at a plurality of positions of tabular component 63.The opposition side with being installed in tabular component 63 sides of spring member 64 is fixed on work stage 5.Thus, tabular component 63 is suppressed the direction in mask stage 3 by the elasticity of spring member 64.The part of the leading section that is formed on ring-type the 2nd resin part 62 on the tabular component 63 of ring-type for joining below with mask stage 3.On the tabular component 63 of ring-type, be formed with the 2nd resin part 62 of joining with mask stage 3, therefore the tabular component 63 of ring-type has the effect of the height alignment of the front end that makes containment member 6, and the part of the ring-type direction of the front end of the containment member 6 that joins with mask stage 3 is sagging and produce the situation of leaking and can eliminate.
In addition, work stage 5 is provided with containment member travel mechanism 9.Containment member travel mechanism 9 particularly is made of absorption layer, and 3 to 4 positions are installed around containment member 6.Fig. 5 is the stereographic map of containment member travel mechanism (absorption layer) 9.Containment member travel mechanism (absorption layer) 9 mainly is made of pillar 91 and resin system corrugated part 92, on corrugated part 92 tops adsorption section 93 is set.On pillar 91, be formed with the vacuum path 94 of supplying with vacuum,, also supply with vacuum at corrugated part 92 when when vacuum is supplied with in this vacuum path 94.Supplying with under the state of vacuum to corrugated part 92, if in the adsorption section when 93 absorption are as the tabular component 63 of the ring-type of absorbate, then corrugated part 92 inside are depressurized, and corrugated part 92 shrinks downwards.Because pillar 91 is fixed on work stage 3, therefore by the contraction of corrugated part 92, the tabular component 63 that is attracted to the ring-type of adsorption section 93 moves downwards.
Fig. 2 to Fig. 4 is the figure of the exposure process of expression contact exposure apparatus shown in Figure 1.Wherein, in Fig. 2 to Fig. 4, illumination part 1 shown in Figure 1 is omitted with work stage driving mechanism 8.
Use Fig. 1 to Fig. 4, be illustrated at the exposure process of contact exposure apparatus of the present invention.
In Fig. 1, by not shown transport mechanism, workpiece 4 is placed on the work stage 5 and is kept.Wherein, in workpiece 4 surface coated the not shown resist that reacts because of exposure light is arranged.Containment member travel mechanism (absorption layer) 9 is set in the adsorption section 93 that 3 to 4 positions are set of containment member 6 mutually opposed with the bottom surface of the tabular component 63 of the ring-type on the 1st resin part 61 tops that are installed in containment member 6 on every side.The pillar 91 of containment member travel mechanism (absorption layer) 9 is fixed on work stage 5.Between being different from the containment member travel mechanism (absorption layer) 9, form the vacuum pipe arrangement 7 of vacuum and be connected with vacuum pipe arrangement 10 in addition, containment member travel mechanism (absorption layer) 9 is supplied with vacuum with arbitrary sequence with mask stage 3 and work stage 5.Wherein, though express state from vacuum to containment member travel mechanism (absorption layer) 9 that do not supply with, also can supply with vacuum.
In Fig. 2,, work stage 5 is risen (the Z direction moves) to aiming at space (contraposition gap, for example 100 μ m) by not shown work stage driving mechanism 8.Follow in this, supply with vacuum to containment member travel mechanism (absorption layer) 9 by vacuum pipe arrangement 10.The adsorption section 93 of containment member travel mechanism (absorption layer) 9 is adsorbed the bottom surface of the tabular component 63 of the ring-type of opposed containment member 6 and corrugated part 92 is shunk.Because corrugated part 92 shrinks, on the tabular component 63 of ring-type, than the tabular component 63 of the ring-type of containment member 6 more the 1st resin part 61 of below can deform, the leading section of the 2nd resin part 62 of containment member 6 is for the ring-type direction and whole descend (to keeping out of the way mobile away from the direction of mask stage 3) as a result.Then, between illumination part 1 and mask 2, insert collimation microscope 11, detect mask alignment mark 21 and workpiece alignment mark 41.So that both alignment mark 21,41 corresponding to modes the mode of preposition relation (or become), by work stage driving mechanism 8 work stage 5 is moved along XY θ direction, carry out the contraposition (aligning) of mask 2 and workpiece 4.
The leading section of the 2nd resin part 62 of containment member 6 makes whole decline by containment member travel mechanism (absorption layer) 9 keep out of the way for the ring-type direction, therefore can not contact below mask stage 3, and work stage 5 is moved.Therefore, can carry out the contraposition of mask 2 and workpiece 4 at short notice.In addition, because therefore the situation that work stage 5 is pulled after moving does not have the situation that aligning accuracy reduces yet.
Wherein, in the present embodiment, the contraposition that example illustrates mask 2 and workpiece 4 makes work stage 5 move the example that carries out, but mask stage 3 is moved carries out, and in addition, two sides of work stage 5 and mask stage 3 is moved carry out.Like this, when making mask stage 3 or mask stage 3 and two sides of work stage 5 mobile, therefore the front end of containment member 6 can not contact below mask stage 3 yet, can carry out the contraposition of mask 2 and workpiece 4 smoothly, does not have that contraposition expends time in or the situation of aligning accuracy variation.
In Fig. 3, after aligning finishes, work stage 5 is risen, mask 2 is contacted with workpiece 4.With its while, stop to be supplied to the vacuum of containment member travel mechanism (absorption layer) 9.The absorption of the ring-type tabular component 63 of the containment member 6 that releasing is caused because of the adsorption section 93 of containment member travel mechanism (absorption layer) 9 disappears the power of the downward side shifting that puts on tabular component 63.Containment member 6 recovers original height by the elasticity of plate-shaped springs 64, suppressed in mask stage 3, the leading section of the 2nd resin part 62 of containment member 6 moves and seamlessly contacts below mask stage 3 to the direction of opposed mask stage 3 at ring-type direction integral body, forms seal cavities by mask 2, mask stage 3, workpiece 4, work stage 5, containment member 6.The corrugated part 92 of containment member travel mechanism (absorption layer) 9 also reverts to original state.The vacuum pipe arrangement 7 that is arranged on mask stage 3 is supplied with vacuum and above-mentioned seal cavity is reduced pressure.If seal cavity is depressurized, then mask 2 is pressed against workpiece 4, and mask 2 spreads all over comprehensively with workpiece 4 and is adjacent to mutually.By not shown illumination part 1 exposure light is radiated at workpiece 4 by mask 2.Therefore, not shown mask pattern 22 is replicated on the workpiece 4.
In Fig. 4, not shown work stage driving mechanism 8 moves, and work stage 5 descends.Then, by not shown transport mechanism, workpiece 4 is taken out of to contact exposure apparatus by work stage 5.Wherein, in the present embodiment, containment member 6 is installed in work stage 5 sides and constitutes, but also can be installed in mask stage 3 sides.
Use Fig. 6 and Fig. 7, the 2nd embodiment of the present invention is described.
Fig. 6 and Fig. 7 are the sectional views of exposure process of contact exposure apparatus of the invention of expression present embodiment.Wherein, in these figure, illumination part 1 shown in Figure 1 is omitted with work stage driving mechanism 8.
As shown in the drawing, containment member 6 is installed in mask stage 3 sides with containment member travel mechanism (absorption layer) 9.
Fig. 6 is the synoptic diagram that mask 2 and the state of the contraposition of workpiece 4 are carried out in expression, containment member travel mechanism (absorption layer) 9 is supplied with vacuum, the bottom surface of the tabular component 63 of the ring-type of the adsorption section 93 absorption containment members 6 of containment member travel mechanism (absorption layer) 9 and corrugated part 92 is shunk.Plate-shaped springs 64 is shunk and the 1st resin part 61 deforms, and the leading section of the 2nd resin part 62 of containment member 6 makes whole to keeping out of the way mobile away from the direction of work stage 5 for the ring-type direction as a result.Insert collimation microscope 11, to detect mask alignment mark 21 and workpiece alignment mark 41.So that both alignment mark 21,41 corresponding to modes the mode of preposition relation (or become), travelling workpiece platform 5 or mask stage 3 are carried out the contraposition (aligning) of mask 2 and workpiece 4.
Fig. 7 is the constitutional diagram that the workpiece exposure is carried out in expression.Work stage 5 rises, and mask 2 contacts with workpiece 4.With its while, stop to be supplied to the vacuum of containment member travel mechanism (absorption layer) 9.Containment member 6 reverts to original height by the elasticity of plate-shaped springs 64, the leading section of the 2nd resin part 62 of containment member 6 moves and seamlessly contacts on work stage 5 to the direction of opposed work stage 5 at ring-type direction integral body, forms seal cavity by mask 2, mask stage 3, workpiece 4, work stage 5, containment member 6.Supply with vacuum and above-mentioned seal cavity is reduced pressure to the vacuum pipe arrangement 7 that is arranged on mask stage 3.Mask 2 spreads all over comprehensively with workpiece 4 and is adjacent to mutually, by not shown illumination part 1 exposure light is radiated at workpiece 4 by mask 2.Therefore, not shown mask pattern 22 is replicated on the workpiece 4.Wherein, in the present embodiment, use absorption layer shown in Figure 5 as containment member travel mechanism 9, but containment member travel mechanism 9 also can adopt other formation.
Use Fig. 8, the 3rd embodiment of the present invention is described.
Fig. 8 is the sectional view of formation of contact exposure apparatus of the invention of expression present embodiment.Wherein, in the figure, illumination part 1 shown in Figure 1 is omitted with work stage driving mechanism 8.
As shown in the drawing, this contact exposure apparatus possesses containment member travel mechanism 12, and containment member travel mechanism 12 is by internal thread part 121 and the motor 123 of internal thread part 121 rotations is constituted.It is that the center is rotated with the turning axle that motor 123 makes to the upright external thread part of this figure above-below direction 122.External thread part 122 runs through the tabular component 63 of the ring-type of containment member 6.The tabular component 63 of the ring-type that is run through at external thread part 122 internal thread part 121 is installed up and down, external thread part 122 is meshed with internal thread part 121.When external thread part 121 was rotated by motor 123, the tabular component 63 of the ring-type of containment member 6 carried out knee-action, and the leading section of the 2nd resin part 62 that makes containment member 6 thus is also for the ring-type direction and integral body is carried out knee-action.When mask 2 and workpiece 4 contrapositions, motor 123 makes external thread part 122 be rotated along the direction that the tabular component 63 of ring-type is fallen.In addition, motor 123 makes external thread part 122 be rotated along the direction that the tabular component 63 of ring-type rises during exposure.As a result, the leading section of the 2nd resin part 62 of containment member 6 along the direction of opposed mask stage 3 move and with contact above the mask stage 3, form seal cavity by mask 2, mask stage 3, workpiece 4, work stage 5, containment member 6.
Use Fig. 9, the 4th embodiment of the present invention is described.
Fig. 9 (a) is the sectional view of formation of the employed containment member 6 of contact exposure apparatus of the invention of expression present embodiment.
Shown in Fig. 9 (a), containment member 6 is by 65 formations of corrugated tube shape member (bellows members) of annular metal system, and with ring-type the leading section that joins with mask stage 3 being installed on top is resin 66.Bellows members 65 is circular, but expression is cut into half state with bellows members 65 in Fig. 9 (a), and as shown in the drawing, inside is hollow.Constitute and be installed in not shown work stage 5, but in the inside of hollow air supply or vacuum.
Shown in Fig. 9 (b), when contraposition, if when the inside of bellows members 65 formed vacuum, then ripple shrinks, and the resin 66 of leading section descends to the direction of work stage 5 for ring-type direction integral body and keeps out of the way.In addition, shown in Fig. 9 (c), when sending into air in the inside of bellows members 65, the ripple of bellows members 65 stretches during exposure, and the resin 66 of leading section moves and contacts below mask stage 3 to the direction of mask stage 3.As a result, the resin 66 of the leading section of containment member 6 for the ring-type direction whole with contact above the opposed mask stage 3, by mask 2, mask stage 3, workpiece 4, work stage 5, containment member 6 formation seal cavities.
Use Figure 10, the 4th embodiment of the present invention is described.
Figure 10 (a) is the sectional view of formation of the employed containment member 6 of contact exposure apparatus of the invention of expression present embodiment.
Shown in Figure 10 (a), containment member 6 is by 67 formations of resinous ring-type septiform (diaphram) member (diaphragm element).This diaphragm element 67 is circular, but represents diaphragm element 67 is cut into the state of half among Figure 10 (a), and as shown in the drawing, the inside that constitutes barrier film 67 is hollow, is installed in not shown work stage 5, but in the inside of hollow air supply or vacuum.
Shown in Figure 10 (b), when contraposition, if diaphragm element 67 inside are formed vacuum, diaphragm element 67 depressions then, the top of diaphragm element 67 (leading section) 671 descends to the direction of work stage 5 and keeps out of the way.In addition, shown in Figure 10 (c), during exposure when sending into air in the inside of diaphragm element 67, then diaphragm element 67 expands, the top of diaphragm element 67 (leading section) 671 moves to the direction of mask stage 3, the top of diaphragm element 67 (leading section) 671 contacts below mask stage 3 for the ring-type direction is whole, forms seal cavity by mask 2, mask stage 3, workpiece 4, work stage 5, containment member 6.
Wherein, though be illustrated in the example that the containment member 6 shown in Fig. 8, Fig. 9, Figure 10 is installed in work stage 5 sides, as mentioned above, also can be installed in mask stage 3 sides.
Claims (4)
1. contact exposure apparatus, possess: form figuratum mask, keep mask stage, and the work stage of mounting workpiece of this mask, the containment member of ring-type is installed at the periphery of aforementioned mask stage or work stage, the said workpiece that is positioned in the said workpiece platform is contacted with aforementioned mask, under to the state that reduces pressure by aforementioned mask, aforementioned mask stage, said workpiece, said workpiece platform, with the formed space of aforementioned containment member, exposure light is radiated on the said workpiece by aforementioned mask, it is characterized by:
At aforementioned containment member the travel mechanism that the leading section integral body that makes the sealing member moves up and down is installed.
2. contact exposure apparatus as claimed in claim 1, it is characterized by, aforementioned containment member possesses: be fixed on the said workpiece platform and the 1st resin part of the ring-type of elastically deformable: the tabular component of ring-type that is installed in the top of the 1st resin component element: the 2nd resin part that is formed on the top ring-type of this tabular component: and an end is fixed on aforementioned tabular component and the other end is fixed on the said workpiece platform, the spring that aforementioned tabular component is suppressed to the direction of aforementioned mask stage.
3. contact exposure method, possess: form figuratum mask, keep mask stage, and the work stage of mounting workpiece of this mask, the containment member of the ring-type that leading section integral body moves up and down is installed at the periphery of aforementioned mask stage or said workpiece platform, after the contraposition of carrying out aforementioned mask and said workpiece, aforementioned mask is contacted with said workpiece, exposure light is radiated at said workpiece by aforementioned mask, it is characterized by:
When carrying out the contraposition of aforementioned mask and said workpiece, the leading section of aforementioned containment member is kept out of the way to said workpiece platform that aforementioned containment member is installed or aforementioned mask stage side, when exposure light is radiated at said workpiece by aforementioned mask, the leading section of aforementioned containment member moves to the direction of opposed aforementioned mask stage or said workpiece platform, contact with aforementioned mask stage or said workpiece platform, by aforementioned mask, aforementioned mask stage, said workpiece, said workpiece platform, be depressurized with the formed space of aforementioned containment member.
4. a contact exposure method is characterized by, and comprises: in the 1st operation of work stage mounting workpiece; The leading section of containment member is kept out of the way to work stage that the sealing member is installed or mask stage side, made work stage move to the 2nd operation of contraposition position; The 3rd operation that the alignment mark that detection is formed on mask carries out contraposition with being formed on the alignment mark of said workpiece; The leading section of containment member is moved to opposed aforementioned mask stage or said workpiece platform, make the said workpiece platform move to the 4th operation of exposure position: to by aforementioned mask, aforementioned mask stage, said workpiece, said workpiece platform, and the 5th operation that reduces pressure of leading section and aforementioned mask stage or the formed space of the contacted aforementioned containment member of said workpiece platform; Exposure light is radiated at the 6th operation of said workpiece by aforementioned mask: and, will be through said workpiece the 7th operation of taking out of after the exposure from aforementioned work stage.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP010531/2009 | 2009-01-21 | ||
| JP2009010531A JP5495094B2 (en) | 2009-01-21 | 2009-01-21 | Contact exposure apparatus and contact exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101782724A true CN101782724A (en) | 2010-07-21 |
Family
ID=42522772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010004497A Pending CN101782724A (en) | 2009-01-21 | 2010-01-21 | Contact exposure apparatus and contact exposure method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5495094B2 (en) |
| KR (1) | KR20100085838A (en) |
| CN (1) | CN101782724A (en) |
| TW (1) | TW201028796A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103616803A (en) * | 2013-11-25 | 2014-03-05 | 中国科学院长春光学精密机械与物理研究所 | Vacuum reproduction exposure equipment for grating ruler |
| CN103676472A (en) * | 2012-09-20 | 2014-03-26 | 李永春 | Pattern transfer substrate device and pattern transfer substrate thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62230537A (en) * | 1986-03-31 | 1987-10-09 | Canon Inc | 2-plate separator |
| JPH01139237U (en) * | 1988-03-15 | 1989-09-22 | ||
| JPH02103919A (en) * | 1988-10-13 | 1990-04-17 | Matsushita Electric Ind Co Ltd | Aligner |
| JP2000081707A (en) * | 1998-09-03 | 2000-03-21 | Adtec Engineeng Co Ltd | Aligner |
| TW484037B (en) * | 1999-09-01 | 2002-04-21 | Sanei Giken Co Ltd | Substrate supporting table of exposure system |
-
2009
- 2009-01-21 JP JP2009010531A patent/JP5495094B2/en not_active Expired - Fee Related
- 2009-11-12 TW TW098138430A patent/TW201028796A/en unknown
-
2010
- 2010-01-06 KR KR1020100000833A patent/KR20100085838A/en not_active Application Discontinuation
- 2010-01-21 CN CN201010004497A patent/CN101782724A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103676472A (en) * | 2012-09-20 | 2014-03-26 | 李永春 | Pattern transfer substrate device and pattern transfer substrate thereof |
| CN103676472B (en) * | 2012-09-20 | 2017-01-04 | 李永春 | Pattern transfer substrate device and pattern transfer substrate thereof |
| CN103616803A (en) * | 2013-11-25 | 2014-03-05 | 中国科学院长春光学精密机械与物理研究所 | Vacuum reproduction exposure equipment for grating ruler |
| CN103616803B (en) * | 2013-11-25 | 2015-09-09 | 中国科学院长春光学精密机械与物理研究所 | Grating scale vacuum reproduction exposure equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201028796A (en) | 2010-08-01 |
| JP5495094B2 (en) | 2014-05-21 |
| JP2010171094A (en) | 2010-08-05 |
| KR20100085838A (en) | 2010-07-29 |
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Application publication date: 20100721 |