CN101780998A - Recycle treatment method for wafer rinse waste liquor - Google Patents

Recycle treatment method for wafer rinse waste liquor Download PDF

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Publication number
CN101780998A
CN101780998A CN201010131657A CN201010131657A CN101780998A CN 101780998 A CN101780998 A CN 101780998A CN 201010131657 A CN201010131657 A CN 201010131657A CN 201010131657 A CN201010131657 A CN 201010131657A CN 101780998 A CN101780998 A CN 101780998A
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China
Prior art keywords
membrane
silicon chip
waste water
processing method
polyethylene glycol
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Pending
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CN201010131657A
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Chinese (zh)
Inventor
赵经纬
邱晖
朱俊峰
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HANGZHOU TIANCHUANG WATER PURIFYING EQUIPMENT CO Ltd
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HANGZHOU TIANCHUANG WATER PURIFYING EQUIPMENT CO Ltd
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Application filed by HANGZHOU TIANCHUANG WATER PURIFYING EQUIPMENT CO Ltd filed Critical HANGZHOU TIANCHUANG WATER PURIFYING EQUIPMENT CO Ltd
Priority to CN201010131657A priority Critical patent/CN101780998A/en
Publication of CN101780998A publication Critical patent/CN101780998A/en
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/30—Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy

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  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

The invention relates to a treatment method for rinse waste water of silicon wafer cutting, which not only can fully recover and utilize polyethylene glycol and water in waste water, but also can reduce the treatment amount of the waste water to realize resource recovery. The method comprises the following steps: preliminarily filtering the rinse waste water of the silicon wafer cutting, carrying out softening process, filtering to remove mechanical impurities and sticky materials by one or the combination of a microfiltration membrane and a superfiltration membrane, entering a multi-level membrane separation device to obtain pure water and polyethylene glycol solution, and refining the polyethylene glycol solution to obtain polyethylene glycol the mass percent of which is larger than 95%. The invention has the advantages that the obtained pure water can be used for the rinse waste water of the silicon wafer cutting and the obtained polyethylene glycol is used for the preparation of cutting fluid of the silicon wafer; by the implementation of the invention, water can be recycled, and the polyethylene glycol in the waste water also can be recycled, thus realizing the source treatment of the waste water, greatly saving the cost, reducing the environmental pollution for silicon wafer manufacturing enterprises, and having considerable economic benefit and social benefit.

Description

A kind of recycling processing method of wafer rinse waste liquor
Technical field
The present invention relates to fully to recycle polyoxyethylene glycol and the water in the waste water, can reduce the treatment process of a kind of silicon chip cutting Cleaning Wastewater of wastewater treatment capacity, the recovery of realization resource utilization again, belonged to silicon chip cutting waste water treatment process field.
Background technology
Monocrystalline silicon piece and polysilicon chip are that solar cell and semi-conductor are indispensable former.As the most potential energy of 21 century, the development potentiality of solar energy industry is huge, and it adds the characteristic of good policy environment, industry itself as emerging Chaoyang industry, makes solar cell industry have higher investment value and development potentiality.The silicon industry development of China is swift and violent in recent years, and especially the silicon chip industry is more outstanding.The environmental problem of bringing when the silicon industry develops rapidly also can not look down upon.Mainly contain two kinds of waste water with regard to silicon chip cutting, a kind of is slicing slurry, and its main component is polyoxyethylene glycol and silica flour, and another kind of for cutting Cleaning Wastewater, main material thing is a polyoxyethylene glycol.For slicing slurry, publication number is that the Chinese patent of CN 101474511A proposes vigorous agent is fallen in the interpolation earlier of the waste mortar for wire cutting in the monocrystalline silicon piece complete processing, carries out solid-liquid separation and obtains suspension part and solid particulate part.Partly add flocculating aids for suspension, filter press, millipore filtration, Hollow Fiber Ultrafiltration, ion-exchange then at last with suspension vacuum distilling, is reclaimed polyoxyethylene glycol.Carry out alkali reaction cleaning, water wash column washing, centrifugation, acid-respons cleaning, water wash column washing once more, centrifugation, acid-respons cleaning, drying and dry classification successively for solid particulate, obtain the silicon-carbide particle that can be recycled at last.And for the recycling of cutting Cleaning Wastewater do not appear in the newspapers to, generally take now to precipitate, air supporting, biochemical method handles, and has the shortcoming of cost height, the wasting of resources.The table composed as follows of cutting waste water
Project Index
Polyoxyethylene glycol % ??0.1～1
??COD/mg·L -1 ??1000～10000
??ρ(NO 3 -)/mg·L -1 ??500～5000
??ρ(Ca 2+)/mg·L -1 ??100～3000
??ρ(Mg 2+)/mg·L -1 ??1～50
??ρ(F -)/mg·L -1 ??2～100
ρ (solubility SiO 2)/mg·L -1 ??10～300
??ρ(HCO 3 -)/mg·L -1 ??10～300
Project Index
Silica flour On a small quantity
Ca 2+、Mg 2+、F -、HCO 3 -、SiO 2、NO 3 -
Summary of the invention
Purpose of design: avoid the weak point in the background technology, design and a kind ofly can fully recycle polyoxyethylene glycol and the water in the waste water, can reduce wastewater treatment capacity again, realize the treatment process of a kind of silicon chip cutting Cleaning Wastewater that resource utilization reclaims.
Design: in order to realize above-mentioned purpose of design.The application is according to the composition of cutting Cleaning Wastewater, and earlier with the waste water coarse filtration, filtration can be taked the solid particulate in the methods taking-up waste water such as air supporting method, filter element filtering, pressure filter filtration, bag type filtering machine filtration.Waste water after the filtration softens processing, removes Ca in the waste water by the dosing precipitator method and ion exchange method 2+, Mg 2+, F -, HCO 3 -, SiO 2, NO 3 -Plasma, dosing can be lime, soda ash etc., and the resin that ion-exchange is adopted is one or more of strong-acid ion exchange resin, weak-acid ion exchange resin, strong basic ion exchange resin, weak-base ion-exchange resin, pass ion exchange resin.Waste water after softening filters with microfiltration membrane or ultra-filtration membrane or micro-filtration+ultrafiltration, described microfiltration membrane can be various forms of films such as folding type filter element, tubular membrane, flat sheet membrane, described ultra-filtration membrane can be various forms of films such as tubular membrane, flat sheet membrane, hollow-fibre membrane, rolled film, the material that microfiltration membrane and ultra-filtration membrane are adopted can be polypropylene, pottery, polyvinylidene difluoride (PVDF), polymeric amide, metal, the filtered version that micro-filtration and ultrafiltration are adopted is dead-end filtration or cross flow filter, and filter pressure is 0.01～1.0MPa.Enter multistage membrane separation unit through the waste water of micro-filtration, ultra-filtration filters and concentrate, obtain pure water and massfraction and be 5～30% polyglycol solution, described pure water conductivity is 0.5～100 μ s/cm; Described multistage membrane separation unit is 1～5 grade, adopts the combination of reverse osmosis membrane, nanofiltration membrane or two kinds of films, and the form of film is a rolled film; The membrane sepn working pressure is controlled between 0.2～8.0Mpa, preferred 0.6～4.0Mpa, and temperature is controlled at 5～50 ℃, preferred 15～40 ℃.Aforementioned massfraction is 5～30% polyglycol solution by the refining massfraction that obtains is polyoxyethylene glycol more than 95%.
Technical scheme: the recycling processing method of silicon chip cleaning liquid, the cleaning waste liquid of silicon chip cutting softens processing after preliminary the filtration, again through a kind of of microfiltration membrane, ultra-filtration membrane or the combination remove by filter mechanical impurity and viscous substance after, enter multistage membrane separation unit, obtain pure water and polyglycol solution, polyglycol solution is through the refining polyoxyethylene glycol that obtains massfraction＞95%.
The present invention compares with background technology, and the one, the pure water that obtains can be used for the Cleaning Wastewater of silicon chip cutting, and the polyoxyethylene glycol that obtains is used for the preparation of silicon chip cutting liquid; The 2nd, by enforcement of the present invention, water can recycle, and the polyoxyethylene glycol in the waste water also recycles, and has realized the recycling treatment of waste water, for silicon chip manufacturing enterprise saves cost greatly, reduces environmental pollution, has considerable economic and social benefit.
Embodiment
Embodiment 1: a kind of recycling processing method of silicon chip cleaning liquid, and the cleaning waste liquid of (1) silicon chip cutting soften processings after preliminary the filtration, describedly softeningly be treated to that lime softens, lime-soda ash softens, resin remollescent one or more combination; (2) again through a kind of of microfiltration membrane, ultra-filtration membrane or the combination remove by filter mechanical impurity and viscous substance after, enter multistage membrane separation unit, obtain pure water and polyglycol solution, described microfiltration membrane, ultra-filtration membrane are one or more of tubular membrane, hollow-fibre membrane, rolled film, flat sheet membrane, and its material can be polypropylene, pottery, polyvinylidene difluoride (PVDF), polymeric amide, metal; Described multistage membrane separation unit is the one or more combination of electrodialytic membranes, reverse osmosis membrane, nanofiltration membrane, and the progression of film is 1～5 grade, and the adjustment by progression reaches and separates spissated requirement; Polyglycol solution is through the refining polyoxyethylene glycol that obtains massfraction＞95%.The refining method that adopts rectifying or resin absorption and rectifying combination of described polyoxyethylene glycol.Described membrane sepn working pressure is controlled between 0.2～8.0MPa and comprises end value (0.2,0.3,0.4,0.5,0.6,0.7,0.8,1.0,2.0,3.0,4.0,5.0,6.0,7.0,8.0), preferred 0.6～4.0MPa and comprise end value (0.6,0.7,0.8,1.0,2.0,3.0,4.0), temperature is controlled at 5～50 ℃ and comprise end value (5 ℃, 6 ℃, 7 ℃, 8 ℃, 9 ℃, 10 ℃, 15 ℃, 20 ℃, 25 ℃, 30 ℃, 35 ℃, 40 ℃, 45 ℃, 50 ℃), preferred 15～40 ℃ (15 ℃, 20 ℃, 25 ℃, 30 ℃, 35 ℃, 40 ℃).Described pure water can be used as the wash-down water of silicon chip cutting, and polyoxyethylene glycol can be as preparation silicon chip cutting fluid.
What need understand is: though the foregoing description is to the mentality of designing of the present invention detailed text description of contrasting; but these text descriptions; just the simple text of mentality of designing of the present invention is described; rather than to the restriction of mentality of designing of the present invention; any combination, increase or modification that does not exceed mentality of designing of the present invention all falls within the scope of protection of the present invention.

Claims (7)

1. the recycling processing method of a silicon chip cleaning liquid, it is characterized in that: the cleaning waste liquid of silicon chip cutting softens processing after preliminary the filtration, again through a kind of of microfiltration membrane, ultra-filtration membrane or the combination remove by filter mechanical impurity and viscous substance after, enter multistage membrane separation unit, obtain pure water and polyglycol solution, polyglycol solution is through the refining polyoxyethylene glycol that obtains massfraction＞95%.
2. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1 is characterized in that: describedly softeningly be treated to that lime is softening, lime-soda ash is softening, resin remollescent one or more combination.
3. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1, it is characterized in that: described microfiltration membrane, ultra-filtration membrane are one or more of tubular membrane, hollow-fibre membrane, rolled film, flat sheet membrane, and its material can be polypropylene, pottery, polyvinylidene difluoride (PVDF), polymeric amide, metal.
4. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1, it is characterized in that: described multistage membrane separation unit is the one or more combination of electrodialytic membranes, reverse osmosis membrane, nanofiltration membrane, the progression of film is 1～5 grade, and the adjustment by progression reaches and separates spissated requirement.
5. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1 is characterized in that: the refining method that adopts rectifying or resin absorption and rectifying combination of described polyoxyethylene glycol.
6. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1, it is characterized in that: described membrane sepn working pressure is controlled between 0.2～8.0MPa, preferred 0.6～4.0MPa, temperature is controlled at 5～50 ℃, preferred 15～40 ℃.
7. the recycling processing method of a kind of silicon chip cleaning liquid according to claim 1, it is characterized in that: described pure water can be used as the wash-down water of silicon chip cutting, and polyoxyethylene glycol can be as preparation silicon chip cutting fluid.
CN201010131657A 2010-03-20 2010-03-20 Recycle treatment method for wafer rinse waste liquor Pending CN101780998A (en)

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Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101905938A (en) * 2010-08-17 2010-12-08 黄立军 Method for recycling silicon chip cutting waste fluid
CN102001715A (en) * 2010-10-23 2011-04-06 浙江硅宏电子科技有限公司 Method for recycling single crystal silicon chip cleaning water
CN102041155A (en) * 2010-12-31 2011-05-04 南京工业大学 Silicon wafer cutting waste liquor recycling method
CN102815830A (en) * 2012-08-02 2012-12-12 华夏新资源有限公司 System for recycle of cleaning liquid used for surface treatment wet process
CN103086528A (en) * 2011-10-31 2013-05-08 库特勒自动化系统(苏州)有限公司 Treatment device and treatment method for waste system in photocell production
CN103255419A (en) * 2012-02-15 2013-08-21 库特勒自动化系统(苏州)有限公司 Recovery system and recovery method of waste system in photocell wet process
CN103432816A (en) * 2013-07-29 2013-12-11 南京工业大学 Recovery method and recovery device of waste cleaning solvent
CN103572051A (en) * 2013-11-15 2014-02-12 吴鋆 Dechlorination method of zinc sulfate solution
CN103896425A (en) * 2012-12-29 2014-07-02 陕西华浩科技有限公司 Polycrystalline silicon wastewater treatment device and method
CN104211204A (en) * 2013-06-03 2014-12-17 北京朗新明环保科技有限公司 High-salt industrial wastewater treatment process system
CN105668862A (en) * 2016-04-15 2016-06-15 林淑录 Method for recycling sodium hydroxide containing waste water in silicon wafer production process
CN106082530A (en) * 2016-06-17 2016-11-09 云南今业生态建设集团有限公司 A kind of integrated treatment photovoltaic energy enterprise productive life method of wastewater treatment
CN107265695A (en) * 2017-07-12 2017-10-20 晶科能源有限公司 A kind of crystalline silicon diamond wire saw slug cutting fluid recovery method and system
CN109231607A (en) * 2018-11-26 2019-01-18 佛山科学技术学院 A kind of device and method by electric flocculation and microfiltration membranes combination processing industrial wastewater
CN110002692A (en) * 2019-05-12 2019-07-12 南京霄祥工程技术有限公司 A kind of Zero-discharge treating process of industry cleaning link waste water
CN112852326A (en) * 2021-01-11 2021-05-28 宁波市镇海宇通服饰有限公司 Regenerated silica gel composite membrane and preparation method thereof
CN113620384A (en) * 2021-09-06 2021-11-09 苏州晶洲装备科技有限公司 OLED cleaning water filtering equipment and method

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CN1686870A (en) * 2005-03-31 2005-10-26 苏州市环境工程有限责任公司 Technique for processing reclamation of industrial wastewater from printing electronic circuit board
CN101327622A (en) * 2007-06-21 2008-12-24 正申科技（北京）有限责任公司 Mortar recovery technique for cutting single-crystal and polycrystalline silicon wire
CN101474511A (en) * 2008-12-17 2009-07-08 西安交通大学 Process for recovering polyethylene glycol and silicon carbide in waste mortar from silicon wafer wire cutting

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
CN1686870A (en) * 2005-03-31 2005-10-26 苏州市环境工程有限责任公司 Technique for processing reclamation of industrial wastewater from printing electronic circuit board
CN101327622A (en) * 2007-06-21 2008-12-24 正申科技（北京）有限责任公司 Mortar recovery technique for cutting single-crystal and polycrystalline silicon wire
CN101474511A (en) * 2008-12-17 2009-07-08 西安交通大学 Process for recovering polyethylene glycol and silicon carbide in waste mortar from silicon wafer wire cutting

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101905938B (en) * 2010-08-17 2012-07-04 黄立军 Method for recycling silicon chip cutting waste fluid
CN101905938A (en) * 2010-08-17 2010-12-08 黄立军 Method for recycling silicon chip cutting waste fluid
CN102001715A (en) * 2010-10-23 2011-04-06 浙江硅宏电子科技有限公司 Method for recycling single crystal silicon chip cleaning water
CN102041155A (en) * 2010-12-31 2011-05-04 南京工业大学 Silicon wafer cutting waste liquor recycling method
CN102041155B (en) * 2010-12-31 2013-03-13 南京工业大学 Silicon wafer cutting waste liquor recycling method
CN103086528A (en) * 2011-10-31 2013-05-08 库特勒自动化系统(苏州)有限公司 Treatment device and treatment method for waste system in photocell production
CN103255419A (en) * 2012-02-15 2013-08-21 库特勒自动化系统(苏州)有限公司 Recovery system and recovery method of waste system in photocell wet process
CN102815830A (en) * 2012-08-02 2012-12-12 华夏新资源有限公司 System for recycle of cleaning liquid used for surface treatment wet process
CN102815830B (en) * 2012-08-02 2014-02-12 华夏新资源有限公司 System for recycle of cleaning liquid used for surface treatment wet process
CN103896425A (en) * 2012-12-29 2014-07-02 陕西华浩科技有限公司 Polycrystalline silicon wastewater treatment device and method
CN103896425B (en) * 2012-12-29 2015-09-30 陕西华浩科技有限公司 A kind of polysilicon wastewater treatment equipment and method
CN104211204A (en) * 2013-06-03 2014-12-17 北京朗新明环保科技有限公司 High-salt industrial wastewater treatment process system
CN104211204B (en) * 2013-06-03 2016-03-30 北京朗新明环保科技有限公司 High salt industrial waste water treatment process system
CN103432816A (en) * 2013-07-29 2013-12-11 南京工业大学 Recovery method and recovery device of waste cleaning solvent
CN103572051A (en) * 2013-11-15 2014-02-12 吴鋆 Dechlorination method of zinc sulfate solution
CN105668862A (en) * 2016-04-15 2016-06-15 林淑录 Method for recycling sodium hydroxide containing waste water in silicon wafer production process
CN106082530A (en) * 2016-06-17 2016-11-09 云南今业生态建设集团有限公司 A kind of integrated treatment photovoltaic energy enterprise productive life method of wastewater treatment
CN107265695A (en) * 2017-07-12 2017-10-20 晶科能源有限公司 A kind of crystalline silicon diamond wire saw slug cutting fluid recovery method and system
CN109231607A (en) * 2018-11-26 2019-01-18 佛山科学技术学院 A kind of device and method by electric flocculation and microfiltration membranes combination processing industrial wastewater
CN110002692A (en) * 2019-05-12 2019-07-12 南京霄祥工程技术有限公司 A kind of Zero-discharge treating process of industry cleaning link waste water
CN110002692B (en) * 2019-05-12 2021-11-12 济南上华科技有限公司 Zero-discharge treatment process for industrial cleaning wastewater
CN112852326A (en) * 2021-01-11 2021-05-28 宁波市镇海宇通服饰有限公司 Regenerated silica gel composite membrane and preparation method thereof
CN112852326B (en) * 2021-01-11 2022-12-06 宁波市镇海宇通服饰有限公司 Regenerated silica gel composite membrane and preparation method thereof
CN113620384A (en) * 2021-09-06 2021-11-09 苏州晶洲装备科技有限公司 OLED cleaning water filtering equipment and method

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Application publication date: 20100721