CN101738663A - Wavelength-independent fused quartz transmission polarization beam splitting grating - Google Patents
Wavelength-independent fused quartz transmission polarization beam splitting grating Download PDFInfo
- Publication number
- CN101738663A CN101738663A CN200910200844A CN200910200844A CN101738663A CN 101738663 A CN101738663 A CN 101738663A CN 200910200844 A CN200910200844 A CN 200910200844A CN 200910200844 A CN200910200844 A CN 200910200844A CN 101738663 A CN101738663 A CN 101738663A
- Authority
- CN
- China
- Prior art keywords
- grating
- wavelength
- polarization beam
- ratio
- fused quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005540 biological transmission Effects 0.000 title claims abstract description 28
- 230000010287 polarization Effects 0.000 title claims abstract description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 239000005350 fused silica glass Substances 0.000 title claims abstract description 20
- 238000005530 etching Methods 0.000 claims abstract description 13
- 230000008033 biological extinction Effects 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 9
- 238000005516 engineering process Methods 0.000 abstract description 8
- 230000003287 optical effect Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000004377 microelectronic Methods 0.000 abstract description 3
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 102100029469 WD repeat and HMG-box DNA-binding protein 1 Human genes 0.000 description 8
- 101710097421 WD repeat and HMG-box DNA-binding protein 1 Proteins 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- 238000010606 normalization Methods 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000002922 simulated annealing Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
Images
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
A wavelength-independent fused silica transmission polarization beam splitting grating used for ultraviolet to near-infrared bands with wavelengths from 300 nanometers to 1800 nanometers is characterized in that: the incident conditions and the normalized structure parameters do not vary with wavelength. The normalized structural parameters are: the duty ratio of the grating is 0.5, the ratio of incident wavelength to grating period is 1.74-1.75, the ratio of etching depth to grating period is 2.21-2.22, and the grating has extremely high transmission efficiency and polarization extinction ratio in the wave band. The wavelength-independent fused quartz transmission polarization beam splitting grating can be actually manufactured by combining an optical holographic recording technology or an electron beam direct writing device with a microelectronic deep etching process, has mature process and low manufacturing cost, can be produced in large batch and has important practical prospect.
Description
Technical field
The present invention relates to polarization beam-splitting grating, particularly a kind of ultraviolet is to the Wavelength irrelevant fused quartz transmission polarization beam-splitting grating of near-infrared band.
Background technology
Grating is widely used in the various optical systems, and one of them important purposes is as the beam splitting device, is applied in holophotal system, optical information processing system and the measuring system.Traditional beam splitter energy loss based on multilayer dielectric film is bigger, complicate fabrication process, cost height.The photonic crystal of rising in recent years exists the cost height too as beam splitter, makes shortcomings such as difficulty.Fused quartz is a kind of extraordinary optical material, and it has from deep ultraviolet to far wide transmission spectrum, and very high optical quality is arranged, and temperature stability is good, the laser-damaged threshold value height, and abbe number is little.With the fused quartz is material, has designed and has made low-loss polarized relevant, high-diffraction efficiency grating and polarization beam-splitting grating.Some bibliographical information overpopulation phase gratings are as the polarization beam splitting device, but deviser's spininess designs single wavelength.When incident wavelength changed, designed grating did not often meet the demands, thereby needed redesign.Therefore if can utilize the physical characteristics of fused quartz, the polarization beam-splitting grating of the irrelevant structure of design wavelength, just the deviser need be under the situation of wavelength shift the design iterations process, this will have actual application value very much.
It is to utilize the deep etching technique of microelectronics that the high density rectangle loses grating deeply, and what process in substrate has a grating than deep trouth shape.Because the etching depth of surface etch grating is darker, so diffraction property is similar to body grating, has the Bragg diffraction effect of body grating, this point is different fully with common surperficial light engraving erosion plane grating.The high density rectangle loses the grating diffration theory deeply, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate the result by calculation of coding machine program.People such as Moharam have provided algorithm [the technology 1:M.G.Moharam et al. formerly of rigorous coupled wave theory, J.Opt.Soc.Am.A.12,1077 (1995)], can solve the diffraction problem of this class high dencity grating, but this method also can only calculate corresponding diffraction efficiency at single wavelength.As far as we know, up to the present, also have no talent to give in to the ultraviolet of 1800 nanometers to near-infrared band and appear the design parameter that Wavelength-independent loses fused quartz transmission polarization beam-splitting grating deeply in 300 nanometers.
Summary of the invention
The technical problem to be solved in the present invention is to the ultraviolet of 1800 nanometers to near-infrared band in 300 nanometers, a kind of Wavelength irrelevant fused quartz transmission polarization beam-splitting grating is provided, requires this grating in near-infrared band, to have high-transmission rate and high polarization extinction ratio in above-mentioned ultraviolet.
Technical solution of the present invention is as follows:
A kind of Wavelength irrelevant fused quartz transmission polarization beam-splitting grating of 300 nanometers to the ultraviolet of 1800 nanometers to near-infrared band that be used for, its characteristics are: the normalization structural parameters of this grating and grating incident condition do not change because of wavelength.These normalization structural parameters are: the dutycycle of grating is 0.5, and the incident wavelength and the ratio in grating cycle are 1.74～1.75, and the etching depth of grating groove and the ratio in grating cycle are 2.21～2.22.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of the deep etching quartz grating of high density rectangle.Zone 1,2 all is uniformly, is respectively air (refractive index n
1=1) and fused quartz (refractive index n
2, have dispersion variation with incident wavelength).Grating vector K is positioned at plane of incidence.The TE polarization corresponding to the electric field intensity direction of vibration perpendicular to the plane of incidence, the TM polarized light corresponding to the direction of vibration of magnetic vector perpendicular to the plane of incidence.When the incident light that contains TE and TM polarization simultaneously (can be expressed as with littrow arrangement
), incident angle depends on that when inciding on the grating face, this grating can mainly be diffracted into the TE polarized light one 1 grades of transmission direction to normalized parameter (λ/Λ)), and the TM polarized light mainly is diffracted into 0 grade of transmission direction.
Under optical grating construction as shown in Figure 1, the present invention utilizes improved grating to simplify pattern theory [formerly technology 2:I.C.Botten et al., Opt.Acta, 28,413-428 (1981)], and adopts the normalization design parameter to instruct design.Concrete parameter is: grating dutycycle, incident wavelength and the ratio in grating cycle, etching depth and the ratio in grating cycle.Utilize rigorous coupled wave theory [formerly technology 1] to calculate high-density deeply etched fused quartz grating in the present invention respectively 0 grade of diffraction efficiency with-1 grade of transmission direction, in conjunction with simulated annealing [technology 3:W.Goffe et al. formerly, J.Econom., 60,65-99 (1994)] be optimized search.Final optimization pass result shows, when the grating dutycycle is 0.5, when adopting littrow arrangement incident, incident wavelength and the ratio in grating cycle are 1.74～1.75 if the normalization structural parameters satisfy, etching depth and the ratio in grating cycle are 2.21～2.22, to the ultraviolet of 1800 nanometers to near-infrared band, grating can reach fabulous polarization beam splitting effect in 300 nanometers.Be in particular in that 0 grade of transmission direction TM polarized light and-1 grade of transmission direction TE polarized light have high-diffraction efficiency, and 0 grade of transmission direction TE polarized light and-1 grade of transmission direction TM polarized light diffraction efficiency are near zero.For example, a prominent example in parameter area of the presently claimed invention is presented at 300 nanometers in 1800 nanometer wavelength range, as shown in Figure 2: 0 grade of transmission direction TE polarized light diffraction efficiency is 0.06%～0.86%, and TM polarized light diffraction efficiency is 97.5%～98.97%;-1 grade of transmission direction TE polarized light diffraction efficiency is 84.96%～89.4%, and TM polarized light diffraction efficiency is 0.0004%～0.57%.Defining 0 grade and-1 grade of transmission direction extinction ratio respectively is:
The extinction ratio of above-mentioned example in same wavelength coverage as shown in Figure 3.As seen in so wide wavelength band, 0 grade and-1 grade of transmission direction extinction ratio are higher than 20db all the time, and-1 grade of transmission direction extinction ratio increases with wavelength.Particularly 0 grade and-1 grade of transmission direction extinction ratio equate when wavelength is 1064 nanometers, are 35.95db.Do not relate to concrete wavelength owing to adopted novel normalization structural parameters in the present invention, solved the problem that polarization beam-splitting grating need redesign under different wave length incident condition in the past.And have so high extinction ratio in so wide wave spectrum scope, this makes the present invention can become a kind of very desirable polarization beam splitting device.Owing to its simple rectangular raster structure, be very easy to make, thereby make this grating have important Practical significance simultaneously.
Description of drawings
Fig. 1 is the geometry of Wavelength irrelevant fused quartz transmission polarization beam-splitting grating of the present invention.
Among the figure, 1 represents zone 1, and (refractive index is n
1), 2 represent zone 2, and (refractive index is n
2), 3 represent grating, and 4 represent incident light, and 5 represent 0 order diffraction light, 6 representatives-1 order diffraction light, two kinds of polarization directions are respectively TE and TM, and Λ represents the grating space periodic, and h represents grating depth, and b represents the width (dutycycle f=b/ Λ) of grating projection.
Fig. 2 is that the TE of an example in claimed range of the present invention and TM polarized light are respectively at 0 grade and-1 grade of transmission direction diffraction efficiency curve (with littrow arrangement incident) with wavelength variations
Fig. 3 be among Fig. 2 example at 0 grade and-1 grade of transmission direction polarization extinction ratio curve with wavelength variations
Embodiment
Utilize the micro-optic technology to make high-density deeply etched rectangular raster, deposition layer of metal chromium film on the fused quartz substrate of dry, cleaning at first, and on the chromium film, evenly be coated with the last layer positive photoetching rubber (Shipley, S1818, USA).Adopt the holographic recording mode to write down grating then, develop, then spend chrome liquor again photoengraving pattern is transferred on the chromium film from photoresist, and utilize chemical reagent that unnecessary photoresist is removed.At last, sample is put into the plasma etching that inductively coupled plasma etching machine carries out certain hour, grating is transferred on the fused quartz substrate, spent chrome liquor more remaining chromium film is removed, just obtain the fused quartz grating of high-density deeply etched surface relief structure.
In the process of making grating, under different incident wave conditions, the normalization design parameter that provides according to the present invention is selected suitable grating cycle and etching depth, just can make corresponding fused quartz transmission polarization beam-splitting grating.
Wavelength irrelevant fused quartz transmission polarization beam-splitting grating of the present invention has the characteristics of high-diffraction efficiency, High Extinction Ratio and high laser-damaged threshold value simultaneously, is a kind of ideal polarization beam splitting device. Owing to adopt the normalized parameter design, not for single incident wavelength, in the selected wave band of the present invention, have universality, and it is simple in structure, realize easily. Utilize holographic grating recording technique or direct electronic beam write device in conjunction with microelectronics deep etching technology, can be in enormous quantities, low-cost production, the grating stable performance after the etching, reliable has important practical prospect.
Claims (1)
1. one kind is used for 300 nanometers arrive near-infrared band to the ultraviolet of 1800 nanometers Wavelength irrelevant fused quartz transmission polarization beam-splitting grating, it is characterized in that: the normalized structural parameters of this grating are that dutycycle is 0.5, and the incident wavelength and the ratio in grating cycle are 1.74～1.75, the etching depth and the ratio in grating cycle of grating groove are 2.21～2.22.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910200844A CN101738663A (en) | 2009-12-25 | 2009-12-25 | Wavelength-independent fused quartz transmission polarization beam splitting grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910200844A CN101738663A (en) | 2009-12-25 | 2009-12-25 | Wavelength-independent fused quartz transmission polarization beam splitting grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101738663A true CN101738663A (en) | 2010-06-16 |
Family
ID=42462374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910200844A Pending CN101738663A (en) | 2009-12-25 | 2009-12-25 | Wavelength-independent fused quartz transmission polarization beam splitting grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101738663A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102841395A (en) * | 2011-06-23 | 2012-12-26 | 精工爱普生株式会社 | Transmissive diffraction grating and detection apparatus |
-
2009
- 2009-12-25 CN CN200910200844A patent/CN101738663A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102841395A (en) * | 2011-06-23 | 2012-12-26 | 精工爱普生株式会社 | Transmissive diffraction grating and detection apparatus |
| CN102841395B (en) * | 2011-06-23 | 2017-03-01 | 精工爱普生株式会社 | Transmissive diffraction grating and detection means |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6873764B2 (en) | Method for producing a grid structure, an optical element, an evanescence field sensor plate, microtitre plate and an optical communication engineering coupler as well as a device for monitoring a wavelength | |
| CN102768381B (en) | Micro-nano structured D-shaped optical fiber, method for producing same and application | |
| CN101546002B (en) | Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band | |
| CN103675969A (en) | High-efficiency oblique double-layer optical grating | |
| CN100464199C (en) | 1550 nm wavelength silicon reflection type polarization beam splitting grating | |
| CN103364856A (en) | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating | |
| CN101315440B (en) | Zero level restraint phase mask in 248 nanometer wave range | |
| CN1322339C (en) | High diffraction efficiency quartz transmission grating with 532 nm wavelength | |
| CN100570756C (en) | A kind of metal film and manufacture method thereof | |
| CN101609176B (en) | Metal embedded fused quartz broadband reflection grating | |
| CN101661126A (en) | Polarization-independent broadband high-efficiency quartz transmission grating | |
| CN102156315A (en) | TE polarized double-ridge fused quartz 1 x 5 beam splitting grating | |
| CN101907735A (en) | Sandwich type fused quartz transmission 1X 2 beam splitting grating | |
| CN101149444A (en) | Fused quartz transmission 1X 2 beam splitting grating | |
| CN101738663A (en) | Wavelength-independent fused quartz transmission polarization beam splitting grating | |
| CN100340875C (en) | Quartz transmission polarization beam splitting grating with 800 nanometer wave band | |
| CN101750648A (en) | Wavelength-independent fused silica transmission 1 x 2 polarization-independent beam splitting grating | |
| CN101614836A (en) | Quartz transmission polarization beam splitting grating | |
| JP2007333826A (en) | Reflection-type diffraction element | |
| CN1322340C (en) | High diffraction efficiency quartz transmission grating with 1053 nanometer wavelength | |
| CN101609241A (en) | Fused quartz grating pulse compressor | |
| CN101571608B (en) | Quartz transmission dual-channel polarization-independent beam-splitting grating for 1310 nano wave band | |
| CN1322341C (en) | 632.8 nm wavelength high diffraction efficiency quartz transmission grating | |
| CN101666885B (en) | Broadband high-efficiency fused quartz transmission polarization correlation grating | |
| CN201242598Y (en) | 1 x 3 polarization-independent beam-splitting grating for 785 nano-waveband fused quartz transmission |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20100616 |