CN101726471A - Membrane stress measuring device based on Hartmann sensor - Google Patents
Membrane stress measuring device based on Hartmann sensor Download PDFInfo
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- CN101726471A CN101726471A CN200910250013A CN200910250013A CN101726471A CN 101726471 A CN101726471 A CN 101726471A CN 200910250013 A CN200910250013 A CN 200910250013A CN 200910250013 A CN200910250013 A CN 200910250013A CN 101726471 A CN101726471 A CN 101726471A
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Abstract
The invention relates to a membrane stress measuring device based on a Hartmann sensor, belonging to the branch field of optics in the field of physics. The membrane stress measuring device comprises an auto-collimation imaging system and the Hartmann sensor, wherein the auto-collimation imaging system comprises a dispersion prism, an objective and a relay lens; the dispersion prism is a depolarization dispersion right-angle prism, and the objective and the relay lens are double balsaming lenses; and the Hartmann sensor comprises a Hartmann lens array and a CMOS receiver, wherein the Hartmann lens array is manufactured by a batch of plano-convex lenses with same focal lengths and calibers through means, i.e. adhesion, cutting, and the like, and is positioned in the image space of the relay lens. The membrane stress measuring device can prevent larger errors caused by the vibration of coating equipment in a self-adaptation way, has high measuring precision, easy and convenient operation and low price and can be used when being on-line and off-line.
Description
Technical field
The present invention relates to a kind of membrane stress measuring device, belong to the optics branch field in the physical field based on Hartmann sensor.
Background technology
Membrane stress is the universal phenomenon in the film preparation process, and nearly all film all is among certain stress.The existence of stress is to all there being extremely adverse influence in yield rate, stability, reliability and serviceable life etc. of various microelectronic circuits, thin film electronic components and parts, Film Optics components and parts and thin film magnetic recording media.Be key subjects in the film field to the control of membrane stress in the thin film preparation process process, wherein extremely crucial to the test of membrane stress.
The method that is used for MEASUREMENTS OF THIN stress at present mainly contains: substrate deformation method, X-ray diffraction method, Raman spectroscopic methodology etc.But owing to be subjected to the restriction of factors such as diffracted intensity is on the low side, diffraction peak distortion, broadening, X-ray diffraction method has very big difficulty when being used to measure thickness less than tens nano thin-film stress.And during with Raman spectrographic determination membrane stress, result that stress factor obtains and disunity, therefore inconsistent according to the stress result that the wave spectrum displacement calculates.X-ray diffraction method will be used X-ray tube and the Raman spectroscopic methodology will be used gas laser in addition, and these equipment all compare expensive, are unfavorable for product promotion.
The substrate deformation method is because its simple and nondestructive characteristics, and is widely used in the measurement of film.Traditional substrate deformation method utilizes reflection of light, interference and diffraction theory mainly based on laser instrument, and the surface deformation amount of coated basal plate is measured, and will be out of shape in the relational expression of value substitution stress and deflection then, obtains the stress value of film to be measured.This has not only proposed relatively harsher requirement to film coating environment, and more requires to design the measuring error of complication system to reduce to cause owing to the coating machine vibration when stress measurement device is installed on the coating machine.
Summary of the invention
It is big to the objective of the invention is to overcome the prior art measuring error, and the shortcoming high to the coating system equipment requirements provides a kind of membrane stress measuring device based on Hartmann sensor.This device can with the self-adaptation form avoid owing to filming equipment vibration cause than mistake, measuring accuracy height, easy and simple to handle, cheap and online, off-line all can use.
Inventive point of the present invention is to replace conventional laser with Hartmann sensor, is used in the membrane stress measuring device.
A kind of membrane stress measuring device based on Hartmann sensor of the present invention comprises autocollimation imaging system and Hartmann sensor.
1) the autocollimation imaging system is made of Amici prism, object lens, relay lens.Amici prism is a depolarization beam split right-angle prism, prism; Object lens and relay lens are cemented doublet.Wherein the light receiving surface of Amici prism and light-emitting face are coated with anti-reflection film, and prism is positioned at 1 times of focal length of object lens, and its principal section is parallel to incident ray, and the prism plane of incidence is perpendicular to optical axis direction; Object lens and relay lens are conjugated lens, and promptly the focus in object space of the rear focus of object lens and relay lens overlaps.Outside higher source luminance is positioned at the equivalent focal length place of object lens.
2) Hartmann sensor is made of Hartmann's lens arra, CMOS receiver.Hartmann's lens arra is made by means such as adhesion, cuttings by a collection of focal length, plano-convex lens that bore is identical, and lens arra is positioned at the image space of relay lens.The CMOS receiver adopts the high resolving power light-sensitive surface, and light-sensitive surface is positioned at the focal length place of Hartmann's lens arra, receives the emission light from sample, and the gray-scale value of each pixel is deposited in the Dram of having distributed.The output terminal of CMOS receiver links to each other with input end and computer, and the light signal that will deposit the CMOS receiver in by the data acquisition module in the computing machine of design converts digital signal to and is transferred in the computing machine to be handled.
The course of work of a kind of membrane stress measuring device based on Hartmann sensor of the present invention is: before measured sample plated film begins, with the data acquisition and the processing module initialization of computing machine, set the image data threshold value then earlier.The light that outside higher source luminance is sent is from the optical fiber input of measurement mechanism, through the Amici prism beam split, by impinging perpendicularly on sample surfaces behind the object lens, after the surface reflection of directional light measured sample, convert directional light to through relay lens again, arrive CMOS receiver light-sensitive surface through Hartmann's lens array imaging then,, make hot spot fall within CMOS light-sensitive surface central area as far as possible by regulating external light source.When plated film begins, software systems are gone into computing machine with the data read in the CMOS receiver Dram in real time, barycenter with its center spot is a reference point, calculates the variable in distance of the facula mass center in the outside apart from this reference point, calculates STRESS VARIATION according to deformation and stress formula again.As being used with brilliant control instrument, this device also can draw out the change curve of membrane stress with thickness.
Beneficial effect:
The present invention with the central area on testing sample surface as benchmark, measure the variable quantity of peripheral region with respect to benchmark, avoided causing measuring error with the self-adaptation form owing to the influence of filming equipment vibration, and can realize stress on-line measurement and On-line Control to monofilm, multilayer film, and can build on arbitrary the coating machine, device is compatible good.And under off-line state, the present invention can also be as a high-precision surface configuration tester, analyze workpiece in plated film front and rear surfaces distortion situation and workpiece environment for use to the influence of stress in thin film etc.
Description of drawings
Fig. 1 is the mechanical construction drawing of a kind of membrane stress measuring device based on Hartmann sensor of the present invention, among the figure, the 1-object lens, the 2-fixed base plate, 3-regulates base, 4-regulates ball, the 5-riser, the 6-set square, the 7-objective tube, the 8-prism table, the 9-cushion block, 10-optical fiber is regulated fixed head, the 11-CMOS fixed head, 12-optical fiber adjusting bracket, 13-relay lens tube, 14-is as diaphragm, the 15-picture is regulated lens barrel, the 16-trim ring, 17-relay lens seat, the 18-set screw, 19-CMOS regulates base, the 20-screw, 21-regulates side plate, the 22-CMOS receiver, 23-Hartmann lens arra, the 24-window glass, the 25-relay lens, the 26-fiber fixed seat, the 27-optical fiber head, 28-optical fiber, 29, the 30-lens isis, the 31-compressing tablet, the 32-Amici prism.
Embodiment
The invention will be further described below in conjunction with drawings and Examples, but should not limit protection scope of the present invention with this.
A kind of membrane stress measuring device based on Hartmann sensor of the present invention comprises autocollimation imaging system, Hartmann sensor.Wherein the autocollimation imaging system is made of Amici prism 32, object lens 1, relay lens 25; Hartmann sensor is made of Hartmann's lens arra 23, CMOS22 receiver.The external light source of this measurement is selected to be made up of brightness blue light optically focused LED and optical fiber, light source is from optical fiber incident, through the Amici prism beam split, by impinging perpendicularly on sample surfaces behind the object lens, after directional light is reflected by sample surfaces, convert directional light to through relay lens again, arrive CMOS receiver photosensitive area through Hartmann's lens array imaging then, be transferred to computing machine after last CMOS receiver is converted to digital signal with the light signal that receives.
The resolution that the CMOS photosensitive region is set is 1280 * 768, and the gray-scale value of each pixel is deposited in the Dram of having distributed.Write down each locations of pixels Array[x+1280*y with an one-dimension array Array], wherein x is the horizontal ordinate of pixel, span: 0
1279, y is the ordinate of pixel, span: 0
767.Necessary horizontal ordinate of barycenter formula and corresponding gray have so just been obtained.
Barycenter with center spot is a reference point, utilizes the range formula of point-to-point transmission to calculate the distance D of the facula mass center in the outside apart from this reference point respectively
iReal time record variable in distance in the coating process: Δ D=D
It-D
I0According to formula
Try to achieve the deformation quantity δ of sample reality when facula position produces the skew of Δ D.At last according to stress formula:
Try to achieve the stress value of film.When utilizing above-mentioned membrane stress measurement mechanism to carry out the on-line measurement membrane stress, film thickness t
fBe the real-time film thickness value of gathering of crystalline substance control instrument; When utilizing above-mentioned membrane stress measurement mechanism to carry out the off-line measurement membrane stress, t
fBe necessary for the known film one-tenth-value thickness 1/10.
When the diameter of testing selected light source is 50 μ m, Hartmann's lens sizes is 1.2mm * 1.2mm, focal length is 20mm, objective focal length is 210mm, the relay lens focal length is 40mm, when the Pixel Dimensions of CMOS was 5.2 μ m * 5.2 μ m, this device can make the detection accuracy of facula mass center be better than the 1/10CMOS Pixel Dimensions, i.e. Δ x≤0.52 μ m.The surface shape measurement precision of device is
When substrate adopts silicon materials, substrate thickness ts=250 μ m, film thickness t
f=300nm, silicon substrate Young modulus E
s=155.8GPa, Poisson ratio η
s=0.2152, sample diameter D
sDuring=31.5mm, according to stress formula
The stress value of trying to achieve film is 0.86 * 10
6Pa, stress measurement device sensitivity promptly of the present invention is 0.86 * 10
6Pa.And under same test parameters, the sensitivity of " based on the membrane stress sensor of auto-convergence multiple beam array " of people such as Lin Xiaochun invention is 2.5 * 10
6Pa.And the sensitivity of people such as external Bicker invention " utilizing two-way light reflection in-site measurement membrane stress device " is 4.4 * 10
6Pa.
Claims (1)
1. the membrane stress measuring device based on Hartmann sensor is characterized in that: comprise autocollimation imaging system and Hartmann sensor, wherein
1) the autocollimation imaging system is made of Amici prism, object lens, relay lens; Amici prism is a depolarization beam split right-angle prism; Object lens and relay lens are cemented doublet; Wherein the light receiving surface of Amici prism and light-emitting face are coated with anti-reflection film respectively, and prism is positioned at 1 times of focal length of object lens, and its principal section is parallel to incident ray, and the prism plane of incidence is perpendicular to optical axis direction; Object lens and relay lens are conjugated lens, and promptly the focus in object space of the rear focus of object lens and relay lens overlaps; Outside higher source luminance is positioned at the equivalent focal length place of object lens;
2) Hartmann sensor is made of Hartmann's lens arra, CMOS receiver; Hartmann's lens arra comprises that a collection of focal length, the plano-convex lens that bore is identical are made by adhesion, cutting means, and lens arra is positioned at the image space of relay lens; The CMOS receiver adopts the high resolving power light-sensitive surface, and light-sensitive surface is positioned at the focal length place of Hartmann's lens arra, receives the emission light from sample, and the gray-scale value of each pixel is deposited in the Dram of having distributed; The output terminal of CMOS receiver links to each other with input end and computer, and the light signal that will deposit the CMOS receiver in by the data acquisition module in the computing machine of design converts digital signal to and is transferred in the computing machine to be handled.
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| Application Number | Priority Date | Filing Date | Title |
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| CN200910250013A CN101726471A (en) | 2009-12-01 | 2009-12-01 | Membrane stress measuring device based on Hartmann sensor |
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| CN200910250013A CN101726471A (en) | 2009-12-01 | 2009-12-01 | Membrane stress measuring device based on Hartmann sensor |
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| CN101726471A true CN101726471A (en) | 2010-06-09 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9261429B2 (en) | 2014-05-21 | 2016-02-16 | Corning Incorporated | Prism-coupling systems and methods for characterizing large depth-of-layer waveguides |
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2009
- 2009-12-01 CN CN200910250013A patent/CN101726471A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9261429B2 (en) | 2014-05-21 | 2016-02-16 | Corning Incorporated | Prism-coupling systems and methods for characterizing large depth-of-layer waveguides |
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Open date: 20100609 |