CN101723299B - Tetraethyl orthosilicate (TEOS) refill system and purifying method thereof - Google Patents
Tetraethyl orthosilicate (TEOS) refill system and purifying method thereof Download PDFInfo
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- CN101723299B CN101723299B CN 200810201824 CN200810201824A CN101723299B CN 101723299 B CN101723299 B CN 101723299B CN 200810201824 CN200810201824 CN 200810201824 CN 200810201824 A CN200810201824 A CN 200810201824A CN 101723299 B CN101723299 B CN 101723299B
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Abstract
The invention provides a tetraethyl orthosilicate (TEOS) refill system and a purifying method thereof to improve the purifying effect and realize the cost saving when a solution in the system is replaced and the integral purification of the system. The system comprises an As50 subsystem and a second subsystem, wherein the As50 subsystem comprises a first storage device for storing a TEOS solution and a first outer port which is communicated to the As50 subsystem; the second subsystem comprises a second storage device for storing the TEOS solution and a second outer port which is communicated to the second subsystem, and the first outer port is connected with the second outer port by a first guide pipe. The system also comprises a purifying device and a second guide pipe, wherein both ends of the second guide pipe are respectively connected with the purifying device and the second outer port; and the purifying device can store a residual solution which is purified by the TEOS refill system.
Description
Technical field
The present invention relates to semiconductor applications, relate in particular to tetrem hydroxyl silicon (TEOS) and pour into again (refill) system and purification method thereof.
Background technology
Fig. 1 is the structural representation of existing TEOS refill system, and this system comprises: the solution tank 2 that stores TEOS solution 1; Store the solution tank 4 of TEOS solution 3; And for the conduit (tube) 5 that is communicated with valve V7 upper port 6 and valve MV7 right output port 7.
TEOS refill system needs to purify in multiple situation, for example during the TEOS solution in changing TEOS refill system, need first purified solution groove, and clean-up effect is had relatively high expectations, then introduce new soln, if the requirement of clean-up effect out of reach then needs to change mentioned solution by the scheme of changing solution tank, this will bring great cost; Also such as being attached to this system contaminant particles everywhere in order to remove, TEOS refill system also needs to purify, and can improve like this quality of TEOS technique.Therefore the purification pay attention to day by day of TEOS refill system.
Industry TEOS refill system adopts following purification scheme usually at present: purification bottle 8 is connected to the V7 lower port, stores the residue that purifies in the TEOS refill system, comprise residual solution and impurity etc., and can discharge the gas from the V7 lower port.Its purification process is:
1, valve-off MV7 opens valve V7 and AV1, and the TEOS solution 1 in the TEOS solution tank 2 is pumped into purification bottle 8;
2, open valve AV2 and AV3, nitrogen is sent into TEOS solution tank 2, then close AV2, open AV4, the gas in the TEOS solution tank 2 is extracted out;
After repeatedly carrying out 2, finish purification process.
But therefore this scheme exists following two problems owing to the remaining TEOS solution 3 in the solution tank 4 can't be pumped into purification bottle 8:
The clean-up effect out of reach requirement of the one, TEOS solution tank 2 still needs to change TEOS solution by changing TEOS solution tank 2, brings great cost waste; The 2nd, can't purify the graphic system architecture of Fig. 1 the latter half, namely should the purification scheme can't be with whole TEOS refill system purification.
Summary of the invention
The invention provides TEOS refill system and purification method thereof, to improve clean-up effect, the cost savings when realizing changing solution in this system and the integral body of this system purify.
The present invention proposes TEOS refill system, comprise local TEOS supply subsystem and the second subsystem, described local TEOS supply subsystem comprises the first storage device that stores TEOS solution, is communicated to the first external port of local TEOS supply subsystem; Described the second subsystem comprises the second storage device of storage TEOS solution, is communicated to the second external port of the second subsystem, and described the first external port and the second external port connect by the first conduit; Also comprise: clean-up device and the second conduit, wherein the two ends of the second conduit connect respectively clean-up device and the second external port; And clean-up device can be stored the residual solution that TEOS refill system purification goes out.
The invention allows for the purification method of a kind of TEOS refill system, described system is provided with local TEOS supply subsystem and the second subsystem, described local TEOS supply subsystem comprises the first storage device that stores TEOS solution, is communicated to the first external port of local TEOS supply subsystem; Described the second subsystem comprises the second storage device of storage TEOS solution, is communicated to the second external port of the second subsystem, and described the first external port and the second external port connect by the first conduit; The method comprises: clean-up device and the second conduit are provided, and described clean-up device can be stored the residual solution that TEOS refill system purification goes out, and the two ends of the second conduit connect respectively clean-up device and the second external port; TEOS solution and the TEOS solution in the second storage device of the first storage device are introduced clean-up device; Use Purge gas to purify TEOS refill system; Discharge used Purge gas.
The present invention is based on clean-up device and second conduit of TEOS refill system, described clean-up device can be stored the residual solution that TEOS refill system purification goes out, the two ends of the second conduit connect respectively clean-up device and the second external port, make it possible to the remaining TEOS solution 3 in the solution tank 4 is introduced purification bottle 8, avoid producing the problem of background technology, for example the cost savings during TEOS solution and the integral body of TEOS refill system purify to have realized changing solution in this system.
Description of drawings
Fig. 1 is the structural representation of existing TEOS refill system;
Fig. 2 is the structural representation of the TEOS refill system of embodiment of the invention proposition;
Fig. 3 is the diagram of circuit of the purification method of embodiment of the invention proposition.
The specific embodiment
Analysis according to background technology, because existing TEOS refill system can't be pumped into purification bottle 8 with the remaining TEOS solution 3 in the solution tank 4, therefore there is above-mentioned two problems, so the embodiment of the invention proposes new TEOS refill system, to solve above-mentioned two problems, improve clean-up effect, realize changing solution in this system for example cost savings and the TEOS refill entire system during TEOS solution purify.
The present application people analyzes and obtains, the reason that existing TEOS refill system can't be pumped into purification bottle 8 with the remaining TEOS solution 3 in the solution tank 4 is: purification bottle 8 is connected to port 6, be connected to port 7 by conduit 5, be connected to again solution tank 4, so cause the problems referred to above.
Based on this analysis, the embodiment of the invention proposes purification bottle 8 is connected to port one 0 by conduit 9, then the remaining TEOS solution 3 in the solution tank 4 can be pumped into purification bottle 8, then just can solve the described problem of background technology, as shown in Figure 2.
According to above-mentioned idea, the embodiment of the invention proposes following TEOS refill system, purifies with the integral body that realizes cost savings and TEOS refill system.This system comprises local TEOS supply subsystem and the second subsystem, and wherein for simplicity, technical personnel often is called the As50 subsystem with local TEOS supply subsystem, therefore following adopted As50 subsystem is described each technical scheme of the embodiment of the invention.Described As50 subsystem comprises the first storage device that stores TEOS solution, is communicated to the first external port of As50 subsystem; Described the second subsystem comprises the second storage device of storage TEOS solution, is communicated to the second external port of the second subsystem, and described the first external port and the second external port connect by the first conduit; Also comprise: clean-up device and the second conduit, wherein the two ends of the second conduit connect respectively clean-up device and the second external port; And clean-up device can be stored the residual solution that TEOS refill system purification goes out.Optionally, this clean-up device can discharge the gas that enters this clean-up device.
When this system implements with the structure of Fig. 2, described As50 subsystem is the structure of Fig. 2 the first half, the second subsystem is the structure of Fig. 2 the latter half, the first memory storage is that solution tank 2, the first external port are that port 6, the second external port are the port on valve MV 5～9 the right, the first conduit is conduit 5, the second conduit is conduit 9, and clean-up device is purification bottle 8, and described gas is nitrogen.
In addition because the second subsystem may comprise a plurality of second external port that can be interconnected, the structure of Fig. 2 for example, so optional, the second conduit is connected to respectively the second different external port from the first conduit, be connected to port 7, the second conduits 9 such as the first conduit 5 among Fig. 2 and be connected to port one 0.The second external port that certain the second conduit and the first conduit connect also can be same port, and just this port generally need to possess structure or this port that can connect two conduits and was connected with the structure that can connect two conduits this moment.
Purifying by this system to have various ways, below provide purification method based on said system first, then provide the embodiment of each method based on Fig. 2 structure.
Fig. 3 is the diagram of circuit of the purification method of embodiment of the invention proposition, and with reference to this figure, this purification method comprises:
Step 30 is discharged used Purge gas.
Described Purge gas can but to be not limited to be nitrogen.
Embodiment one, no matter can clean-up device discharge the Purge gas that enters self, and step 20 and 30 can realize in the following way:
Step a1 passes into Purge gas from the second subsystem;
Step a2, control Purge gas flow through the second subsystem, the first conduit and As50 subsystem;
Step a3 discharges used Purge gas from the As50 subsystem.
Below in conjunction with system shown in Figure 2 structure illustrative step 10 and step a1～a3 implementation process in the present embodiment:
Open MV7, MV8, AV12 and AV1, close AV3, AV8 and AV11, then the TEOS solution in the solution tank 2 and the TEOS solution 3 in the solution tank 4 are pumped into purification bottle 8;
Open MV3, AV6, AV7, AV8, AV12, AV3 and AV4; Pass into Purge gas nitrogen from the MV3 left end, then nitrogen will be in turn through the second subsystem, the first conduit 5 and As50 subsystem, and emits from As50 subsystem right-hand member.This process is repeatedly implemented, can be finished purification.
If embodiment two clean-up devices can discharge the gas that enters self, then step 20 and 30 can realize in the following way:
Step b1 passes into Purge gas from the As50 subsystem;
Step b2, the control Purge gas flows into clean-up device behind the As50 subsystem of flowing through, the first conduit and the second conduit;
Step b3 passes into Purge gas from the second subsystem;
Step b4, the control Purge gas flows into clean-up device behind flow through the second subsystem and the second conduit; And
Step b5 discharges described Purge gas from clean-up device.
Above-mentioned steps can be carried out in turn, also can be that selectively combination is carried out, and for example after b1～b2 and b3～b4 executed in parallel, carries out b5 again; And according to the order execution of b1, b2, b5, b3, b4 and b5 etc.
If carry out according to the order of b1, b2, b5, b3, b4 and b5, then for structure shown in Figure 2, the implementation process of step 10 and step b1～b5 is:
Implementation step 10: open MV7, MV8, AV12 and AV1, close AV3, AV8 and AV11, then the TEOS solution in the solution tank 2 and the TEOS solution 3 in the solution tank 4 are pumped into purification bottle 8;
Implementation step b1, b2 and b5: open AV2 and AV3, pass into nitrogen from the AV2 left end, then will flow through solution tank 2, the first conduit 5, MV7, MV8 and the second conduit 9 of nitrogen flows into purification bottle 8, emits from purification bottle 8 again; Nitrogen is after passing through AV3, if open AV4 and AV5, then can also flow through AV4 and AV5 purify this path, emits from As50 subsystem right-hand member again, realizes the purification of As50 subsystem;
Implementation step b3, b4 and b5: open MV3, MV4, AV6, AV7, AV8, AV11 and AV12, pass into nitrogen from the second subsystem left end, then nitrogen will be by AV11 and residing two paths of AV8 difference, flow into solution tank 4, AV12 and MV8, flow into again purification bottle 8, then emit from purification bottle 8, realize the purification of second system.
By above-mentioned implementation process, TEOS solution 1 in the solution tank 2 and the TEOS solution 3 in the solution tank 4 all can be introduced purification bottle 8, thereby solved the problem of prior art, improved clean-up effect, avoided existing TEOS refill system when changing As50 because clean-up effect is not good, need to change the problems such as cost waste that solution tank 2 brings, the for example cost savings during TEOS solution of solution in the TEOS refill system have been realized changing, and the integral body that can realize TEOS refill system purifies, and is conducive to improve the effect of TEOS technique.
Even but for structure shown in Figure 2, above-mentioned purification implementation process also only is the part embodiment, for the purification method that the present invention proposes, more have numerous embodiments, so the purification method that the present invention proposes is not limited to realize by above-mentioned implementation process and embodiment.
Obviously, those skilled in the art can carry out various changes and modification to the present invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.
Claims (7)
1. tetrem hydroxyl silicon filling system again, comprise local tetrem hydroxyl silicon supply subsystem and the second subsystem, described local tetrem hydroxyl silicon supply subsystem comprises the first storage device that stores tetrem hydroxyl silicon solution, is communicated to the first external port of local tetrem hydroxyl silicon supply subsystem; Described the second subsystem comprises the second storage device of storage tetrem hydroxyl silicon solution, is communicated to the second external port of the second subsystem, and described the first external port and the second external port connect by the first conduit; It is characterized in that, also comprise:
Clean-up device and the second conduit, wherein the two ends of the second conduit connect respectively clean-up device and the second external port; And
Clean-up device can be stored the again residual solution that purifies of filling system of tetrem hydroxyl silicon.
2. the system as claimed in claim 1 is characterized in that, the second subsystem comprises a plurality of second external port that can be interconnected; And
The second conduit is connected to respectively the second different external port from the first conduit.
3. the system as claimed in claim 1 is characterized in that, the second subsystem comprises a plurality of second external port that can be interconnected; And
The second external port that the second conduit and the first conduit connect is same external port.
4. the system as claimed in claim 1 is characterized in that, described clean-up device can discharge the gas that enters self.
5. the tetrem hydroxyl silicon purification method of filling system again, this system comprises local tetrem hydroxyl silicon supply subsystem and the second subsystem, described local tetrem hydroxyl silicon supply subsystem comprises the first storage device that stores tetrem hydroxyl silicon solution, is communicated to the first external port of local tetrem hydroxyl silicon supply subsystem; Described the second subsystem comprises the second storage device of storage tetrem hydroxyl silicon solution, is communicated to the second external port of the second subsystem, and described the first external port and the second external port connect by the first conduit; It is characterized in that, the method comprises:
Clean-up device and the second conduit are provided, and described clean-up device can be stored the again residual solution that purifies of filling system of tetrem hydroxyl silicon, and the two ends of the second conduit connect respectively clean-up device and the second external port;
The tetrem hydroxyl silicon solution of the first storage device and the tetrem hydroxyl silicon solution in the second storage device are introduced clean-up device;
Use Purge gas to purify again filling system of tetrem hydroxyl silicon;
Discharge used Purge gas.
6. method as claimed in claim 5 is characterized in that, described use Purge gas purifies again filling system of tetrem hydroxyl silicon, specifically comprises:
Pass into Purge gas from the second subsystem;
Control Purge gas flow through the second subsystem, the first conduit and local tetrem hydroxyl silicon supply subsystem;
Discharge used Purge gas from local tetrem hydroxyl silicon supply subsystem.
7. method as claimed in claim 5 is characterized in that, described clean-up device can discharge the gas that enters self; And
Described use Purge gas purifies again filling system of tetrem hydroxyl silicon, specifically comprises:
Pass into Purge gas from local tetrem hydroxyl silicon supply subsystem;
The control Purge gas flows into clean-up device behind the flow through local supply of tetrem hydroxyl silicon subsystem, the first conduit and the second conduit;
Pass into Purge gas from the second subsystem;
The control Purge gas flows into clean-up device behind flow through the second subsystem and the second conduit; And
Discharge described Purge gas from clean-up device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810201824 CN101723299B (en) | 2008-10-27 | 2008-10-27 | Tetraethyl orthosilicate (TEOS) refill system and purifying method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810201824 CN101723299B (en) | 2008-10-27 | 2008-10-27 | Tetraethyl orthosilicate (TEOS) refill system and purifying method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN101723299A CN101723299A (en) | 2010-06-09 |
| CN101723299B true CN101723299B (en) | 2013-04-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 200810201824 Expired - Fee Related CN101723299B (en) | 2008-10-27 | 2008-10-27 | Tetraethyl orthosilicate (TEOS) refill system and purifying method thereof |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0229050A1 (en) * | 1985-06-21 | 1987-07-22 | Schumacher Co J C | Chemical refill system. |
| WO1999002251A2 (en) * | 1997-07-11 | 1999-01-21 | Advanced Delivery & Chemical Systems, Ltd. | Bulk chemical delivery system |
-
2008
- 2008-10-27 CN CN 200810201824 patent/CN101723299B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0229050A1 (en) * | 1985-06-21 | 1987-07-22 | Schumacher Co J C | Chemical refill system. |
| WO1999002251A2 (en) * | 1997-07-11 | 1999-01-21 | Advanced Delivery & Chemical Systems, Ltd. | Bulk chemical delivery system |
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| CN101723299A (en) | 2010-06-09 |
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Granted publication date: 20130417 Termination date: 20181027 |