CN101677642A - Wig base - Google Patents
Wig base Download PDFInfo
- Publication number
- CN101677642A CN101677642A CN200880018373A CN200880018373A CN101677642A CN 101677642 A CN101677642 A CN 101677642A CN 200880018373 A CN200880018373 A CN 200880018373A CN 200880018373 A CN200880018373 A CN 200880018373A CN 101677642 A CN101677642 A CN 101677642A
- Authority
- CN
- China
- Prior art keywords
- base cloth
- wig
- latticed base
- wig substrate
- bent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004744 fabric Substances 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims description 72
- 230000002093 peripheral effect Effects 0.000 claims description 26
- 238000009958 sewing Methods 0.000 claims description 3
- 230000008602 contraction Effects 0.000 abstract 1
- 238000007688 edging Methods 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 21
- 238000000034 method Methods 0.000 description 12
- 239000007769 metal material Substances 0.000 description 8
- 230000007306 turnover Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 210000004243 sweat Anatomy 0.000 description 2
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Images
Classifications
-
- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41G—ARTIFICIAL FLOWERS; WIGS; MASKS; FEATHERS
- A41G3/00—Wigs
- A41G3/0041—Bases for wigs
- A41G3/005—Bases for wigs made of a net structure
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Details Of Garments (AREA)
- Woven Fabrics (AREA)
- Prostheses (AREA)
- Knitting Of Fabric (AREA)
Abstract
On an attachment member joined along a part or the whole of the perimeter of the marginal portion of a net ground fabric adapted for implanting of human hair or artificial hair, the marginal portion of the net ground fabric is sewn under overfeed (edging contraction) to thereby form an inward retroflexion so as to avoid any outward retroflexion of the marginal portion. Alternatively, the peripheryof the marginal portion of a net ground fabric is folded back on the backside one or more times, and the back-folded portion on the backside while drawing together inward is sewn on the marginal portion on the obverse side to thereby form an inward retroflexion. Still alternatively, a net ground fabric is provided with another net ground fabric joined thereto and adapted to be disposed double onthe obverse side or backside of the net ground fabric, and the net ground fabric disposed on the backside is slidden so as to be drawn inward on the backside while the marginal portion of the net ground fabric disposed on the obverse side is slidden inward on the backside in conformity with the extent of the slide to thereby form an inward retroflexion.
Description
Technical field
The present invention relates to the wig substrate of latticed base cloth with the hair that is used to plant the people or artificial hair.
Background technology
In the past, there were a lot of people to like using wig.Though wig sometimes is to be used to modify, yet there is being the angry people that is vexed less to wear under the situation mostly in order to make actual in appearance hair look to increase.Therefore, wig need have the shape that conforms to actual hair.
Sinciput (Qian Head when particularly using wig) partly, hairline parts such as temples parts and collare hairline, be part the most eye-catching when the user wears wig.For example, when the user carries out combing with comb etc. and that wig is produced is crooked, the marginal portion of wig be the hairline part outwards rollover stick up, can diminish attractive in appearance.
Therefore, proposing has following scheme: be provided with in the temples portion of wig substrate or collare hairline portion as one man crooked and with nose shape by the core that metal material constitutes, prevent wig outwards rollover stick up and make it be close to (with reference to patent documentation 1) on the head.
Yet the wig substrate in the patent documentation 1 has owing in the temples portion of wig substrate with collare hairline portion is employed, the core that is made of metal material makes the user that the problem of discomfort be arranged when wearing.Particularly in summer, user's sweat etc. are dissolved out the ion of metal material, probably make user's head produce irritated.
In addition, it is bigger than the thickness of other parts to have a part of this core.Particularly this part still is the hairline part, so this thickness can be more eye-catching in appearance, and is therefore not preferred.
Patent documentation 1: TOHKEMY 2000-96327 communique
Summary of the invention
Problem of the present invention is, in view of above-mentioned existing actual conditions, provides a kind of wig substrate of not using the core of metal material and can avoiding edge part to turn over sticking up.
Wig substrate among the present invention is by being used to plant people's hair or the latticed base cloth of artificial hair constitutes, and at least a portion of the edge part periphery of this latticed base cloth forms towards inside bend.
The above-mentioned part that is bent to form for example can form in the following way:, sewing up when taking in the edge part periphery that attached pad parts with respect to this will above-mentioned latticed base cloth with attached pad parts along the dorsal part pad of the edge part periphery of above-mentioned latticed base cloth; Perhaps for example can form in the following way: with the edge part periphery of above-mentioned latticed base cloth support or oppose side edgefold once more than, and when the flanging of this dorsal part is partly taken in, it is sutured in the table lateral edge portion.
In addition, the above-mentioned part that is bent to form also can form in the following way: have and be connected with above-mentioned latticed base cloth and overlapping another latticed base cloth that is disposed at the surface or the back side of this latticed base cloth, the mode that the above-mentioned latticed base cloth that is disposed at dorsal part is gone into the layback of supporting or opposing is shifted, and the above-mentioned edge part of latticed base cloth that is disposed at the table side and the above-mentioned shift amount sidesway of supporting or opposing is accordingly gone into.
In addition, the above-mentioned part that is bent to form for example can be that portion is worn in the front portion of above-mentioned latticed base cloth, in addition, for example also can be the edge complete cycle of above-mentioned latticed base cloth.
In addition, above-mentioned latticed base cloth for example is that its periphery part forms waveform, in addition, also can be that its whole peripheral shape becomes waveform.
Under this situation, preference such as the above-mentioned part that is bent to form are formed at the above-mentioned part that forms waveform.
According to the present invention, can provide a kind of wig substrate of not using the core of metal material and can avoiding edge part outwards to turn on one's side and stick up.
Description of drawings
Fig. 1 is the integrally-built stereogram that the wig substrate in first embodiment is shown.
Fig. 2 is the stereogram of an example of formation method that the wig substrate of Fig. 1 is shown.
Fig. 3 is the figure of section that the wig substrate of Fig. 1 is shown.
Fig. 4 is the integrally-built stereogram that the wig substrate in second embodiment is shown.
(a) among Fig. 5 figure and (b) figure be the stereogram of an example of formation method that the wig substrate of Fig. 4 is shown.
Fig. 6 is the integrally-built stereogram that the wig substrate in the 3rd embodiment is shown.
Fig. 7 is the stereogram of an example of formation method that the wig substrate of Fig. 6 is shown.
Fig. 8 is the integrally-built stereogram that the wig substrate in the 4th embodiment is shown.
(a) among Fig. 9 figure and (b) figure be the stereogram of an example of formation method that the wig substrate of Fig. 8 is shown.
(a) figure among Figure 10 is the figure that illustrates as the section of the wig substrate of the 6th embodiment.(b) figure and (c) figure be the figure that the A portion among (a) figure is amplified expression.
(a) figure among Figure 11 be illustrate as the 7th embodiment, have the full head that covers the shape till the temples parts side view with the wig substrate of wig, (b) figure is its vertical view.
Figure 12 illustrates the side view of using the wig substrate of wig as full head variation, that have the shape that does not cover the temples part of the 7th embodiment.
The specific embodiment
Below, described wig substrate describes with reference to accompanying drawing to embodiments of the present invention.
(first embodiment)
Fig. 1 is the integrally-built stereogram that the wig substrate 10 in first embodiment is shown.This wig substrate 10 is formed by base portion reticular part 11 and the boundary reticular part 13 (following both are collectively referred to as done reticular part 11) as the latticed base cloth of hair that is used to plant the people and artificial hair.In addition, be not plant people's the hair or the state of artificial hair shown in the wig substrate 10 shown in Figure 1.
This wig substrate 10 is provided with the netted outer peripheral edges portion 12 of ring-type at the periphery that forms circular reticular part 11.Utilize this netted outer peripheral edges portion 12 to make reticular part 11 bend to the curved surface shape, and form along the such bowl-type of user's head.
This netted outer peripheral edges portion 12 is in this example by forming the outer peripheral edges flanging.In addition, the formation method of netted outer peripheral edges portion 12 is not limited thereto, and for example the endless belt that also cutting of rubber-like resin sheet can be formed is by sewing up or hot melt fetches the periphery that is arranged at reticular part 11.
In addition, at least a portion of netted outer peripheral edges portion 12 forms crooked to the inside bend 14.Thus, for example be formed under the situation at preceding top of wig substrate 10 at this bend 14, after the user wears this wig substrate 10, promptly use comb etc. that people's hair and artificial hair are carried out combing, this bend 14 also is difficult for outwards rollover and sticks up.
Fig. 2 is the stereogram that an example that makes the formation method that netted outer peripheral edges portion 12 is bent to form to the inside is shown.At least a portion in netted outer peripheral edges portion 12 is sewed with suitable attached pad parts 15 along the dorsal part (wrapping up in Side) of netted outer peripheral edges portion 12.At this moment, with respect to 15 pairs of attached pad parts netted outer peripheral edges portion 12 contract and sew up in the seam (ぃ せ こ む).
In addition, the seam that contracts refers to long stitching amount with respect to progressively taking in along suture direction than this stitching amount short than the slit resultant, sews up like this being called the seam stitching of contracting in the seam that contracts.
Thus, this seam sutured portion that contracts is inwardly turned on one's side and is stuck up, and promptly forms bending to the inside, and forming can outwards not turn on one's side sticks up.That is, form and after the user wears, promptly use comb etc. that people's hair and artificial hair are carried out combing, also be difficult for making bend 14 outwards rollover stick up.
That is, partly impose the seam that contracts by the most eye-catching hairline when wearing wig and sew up and make it have the advantages that inside rollover is stuck up, thereby can be close on user's the preceding top always.Thus, aspect outward appearance, also can form the stable form of wearing, become the wig that concerning the user, has pleasant appearance.
In addition, constitute at the boundary reticular part 13 that forms base portion reticular part 11 parts under the situation of a part of netted outer peripheral edges portion 12, similarly sew up to form and stick up, in order to avoid outwards rollover is stuck up towards turning over of inboard by the seam that contracts.
Fig. 3 is the figure that the section of wig substrate 10 is shown.As mentioned above,, sew up, to have formed towards turning over of inboard and to have stuck up (in addition, explanation is easy to be understood in order making, and will turn over to stick up slightly turgidly in the figure to illustrate) by seam that not shown attached pad parts are contracted at the preceding top of wig substrate 10.Stick up by edge part is inwardly turned on one's side, can make edge part be close to head better.
(second embodiment)
Fig. 4 is the integrally-built stereogram that the wig substrate 20 in second embodiment is shown.This wig substrate 20 also is to be formed by the base portion reticular part 21 of hair that is used to plant the people and artificial hair and boundary reticular part 23 (below, be collectively referred to as do reticular part 21 with both).What also illustrate in Fig. 4 in addition, is that wig substrate 20 does not plant people's the hair and the state of artificial hair.
In the wig substrate 20 in the present embodiment, at least a portion of netted outer peripheral edges portion 22 forms waveform.This forms corrugated part 26 formation of waveform and the part of user's preceding top butt.By formation like this, the hairline part more is difficult for becoming eye-catching.
In addition, this corrugated part 26 forms towards inside bend.Thus, for example be formed under the situation at preceding top of wig substrate 20 at this corrugated part 26, after the user wears this wig substrate 20, promptly use comb etc. that people's hair and artificial hair are carried out combing, this corrugated part 26 also is difficult for outwards rollover and sticks up.
(a) figure among Fig. 5 is the stereogram that an example that makes the formation method that corrugated part 26 is bent to form to the inside is shown.At these corrugated part 26 places from the dorsal part pad with the attached pad parts 25 that form on one side waveform, corrugated part 26 is sewed up with respect to attached pad parts 25 seam that contracts, thereby is formed turning over and stick up to the inside.By formation like this, corrugated part 26 is worn part and can outwards do not turned on one's side and stick up user's preceding top, therefore make edge part to wear sense good.In addition, these attached pad parts 25 also can make the top of attached pad parts 25 also form waveform shown in (b) figure among Fig. 5.
(the 3rd embodiment)
Fig. 6 is the integrally-built stereogram that the wig substrate 30 in the 3rd embodiment is shown.This wig substrate 30 also is to be formed by the base portion reticular part 31 of hair that is used to plant the people and artificial hair and boundary reticular part 33 (below, be collectively referred to as do reticular part 31 with both).In addition, in Fig. 6, also show wig substrate 30 and do not plant people's the hair or the state of artificial hair.
As shown in Figure 6, the wig substrate 30 in this example all forms towards inside bend in the complete cycle scope of the netted outer peripheral edges portion 32 of reticular part 31.By formation like this, the wig substrate 30 in this example all is difficult for outwards rollover and sticks up in the complete cycle scope of netted outer peripheral edges portion 32.
Fig. 7 is the stereogram that an example that makes the formation method that outer peripheral edges portion 32 is bent to form to the inside is shown.As shown in Figure 7, the wig substrate 30 in this example has attached pad parts 35 from the dorsal part pad equally with above-mentioned, sews up by impose the seam that contracts in the complete cycle edge extent of reticular part 31, sticks up thereby it is formed towards turning over of inboard.
By formation like this, wear when utilizing the wig that this wig substrate 30 is made the user, stick up because whole edge part all is difficult for outwards rollover, so can access the comfortable sense of wearing always.
(the 4th embodiment)
Fig. 8 is the integrally-built stereogram that the wig substrate 40 in the 4th embodiment is shown.This wig substrate 40 is also formed by the base portion reticular part 41 of hair that is used to plant the people and artificial hair and boundary reticular part 43 (below, be collectively referred to as do reticular part 41 with both).In addition, in Fig. 8, also show wig substrate 40 and do not plant people's the hair or the state of artificial hair.
As shown in Figure 8, the complete cycle of the outer peripheral edges portion 42 of reticular part 41 forms waveform.By formation like this, the hairline part is difficult for becoming eye-catching more in the complete cycle scope.In addition, in this case, also impose and the above-mentioned same seam that contracts is sewed up, stick up towards turning over of inboard thereby form by outer peripheral edges portion 42 to the reticular part 41 that forms waveform.
(a) figure among Fig. 9 is the stereogram that an example that makes the formation method that outer peripheral edges portion 42 is bent to form to the inside is shown.Shown in (a) figure among Fig. 9, for the wig substrate 40 in this example, with above-mentioned equally also from the dorsal part pad with attached pad parts 45, and in the complete cycle scope of the outer peripheral edges portion 42 of reticular part 41, impose the seam that contracts and sew up, form thus towards turning over of inboard and stick up.
By formation like this, wear when utilizing the wig that this wig substrate 40 is made the user, outer peripheral edges portion 42 all is difficult for outwards rollover in the complete cycle scope sticks up, and therefore can obtain the comfortable sense of wearing always.In addition, these attached pad parts 45 also can make the top of attached pad parts 45 also form waveform shown in (b) figure among Fig. 9.
Like this, in any above-mentioned embodiment, on that main part or complete cycle of the edge part of wig substrate, thereby sew up when edge part is contracted seam with respect to attached pad parts and form the seam sutured portion that contracts, therefore, wig can outwards not turned on one's side in hairline part stick up and be close to head always, can access the comfortable state of wearing.
In addition, the attached pad parts that for example constitute that the edge part of wig substrate has only used that the seam that is used to contract sews up by latticed base cloth etc., and do not use the core etc. of metal material, therefore do not worry having metal material to be dissolved in the problem that in the sweat ionization takes place and cause head allergy.
Therefore in addition, the edge part of wig substrate does not use cores such as metal material, does not worry existing edge part thickness to increase and the problem that impairs outward appearance yet.
In addition, in above-mentioned first～the 4th embodiment, for the edge part bending to the inside that makes the wig substrate, along the dorsal part pad of the edge part periphery of latticed base cloth (base portion reticular part and boundary reticular part) with attached pad parts, the edge part periphery of latticed base cloth is being sewed up in the attached pad parts income with respect to this, thereby the formation bend, yet the formation of bend also is not limited thereto.Below, other formation methods of relevant bend describe with the 5th and the 6th embodiment.
(the 5th embodiment)
The not special diagram of the 5th embodiment, the formation of bend be by the edge part periphery with latticed base cloth support or oppose side edgefold once more than, and when the flanging of this dorsal part is partly taken in, it is sutured in the table lateral edge portion and forms.So the shape of the bend that forms can directly apply to first～the 4th above-mentioned embodiment.
(the 6th embodiment)
(a) figure among Figure 10 is the figure that the section of the wig substrate 60 in the 6th embodiment is shown.(in addition, for easy understanding is described, this figure will turn over to stick up slightly turgidly and illustrate).Stick up by edge part is inwardly turned on one's side, thereby make edge part be close to head well.
(b) among Figure 10 figure and (c) figure the A of outer peripheral edges portion among Figure 10 (a) figure is amplified the figure that represents.Shown in (b) figure among Figure 10, prerequisite is that this wig substrate 60 is the wig substrate 60 under the situation about coupling together at stacked latticed base cloth 66 in the surface or the back side of reticular part 61 and reticular part 61.In addition, (b) in Figure 10 figure and (c) among the figure, latticed base cloth 66 is disposed at the back side (inboard) of reticular part 61.
Shown in (c) figure among Figure 10, outer peripheral edges portion 62 can form in the following way: will be disposed at the mode that the latticed base cloth 66 of dorsal part goes into the layback of supporting or opposing and be shifted, and outer peripheral edges portion 62 and the above-mentioned shift amount that will be disposed at the reticular part 61 of the table side sidesway of supporting or opposing is accordingly gone into.So the shape of the outer peripheral edges portion 62 that forms also can directly apply to above-mentioned first～the 4th embodiment.
In addition, in first～the 4th embodiment, the shape of wig substrate is shown the bowl-type of back-off, and what the wig substrate of sub-fraction wig was adopted is this shape, yet the wig substrate in the first～the 4th and the above-mentioned the 5th and the 6th embodiment is not limited thereto.
(the 7th embodiment)
(a) figure among Figure 11 be illustrate as the 7th embodiment, have the full head that covers the shape till the temples parts side view with the wig substrate of wig, (b) figure is its vertical view.In addition, (a) among Figure 11 figure and (b) figure illustrate with the line chart of profile that each several part only is shown, and what illustrate is not plant people's the hair or the state of artificial hair.
(a) in Figure 11 figure and (b) among the figure as illustrated in first～the 6th embodiment, also can sew up or additive method formation bend by the seam that contracts on the part of the edge part of wig substrate or complete cycle.In addition, also can make the hairline of sinciput portion or complete cycle partly form waveform, and form bend in this part.
(variation of the 7th embodiment)
Figure 12 illustrates the side view of using the wig substrate of wig as full head variation, that have the shape that does not cover the temples part of the 7th embodiment.In addition, omitted the diagram of vertical view.
For the wig substrate of Figure 12, as illustrated in first～the 6th embodiment, also can on the part of the edge part of wig substrate or complete cycle, sew up or additive method forms bend by the seam that contracts.In addition, also can make the hairline of sinciput portion or complete cycle partly form waveform, and form bend in this part.
Claims (9)
1. a wig substrate is characterized in that,
This wig substrate is by being used to plant people's hair or the latticed base cloth of artificial hair constitutes,
At least a portion of the edge part periphery of this latticed base cloth forms towards inside bend.
2. wig substrate according to claim 1 is characterized in that,
The described part that is bent to form forms as follows:, sewing up when taking in the edge part periphery that attached pad parts with respect to this will described latticed base cloth with attached pad parts along the dorsal part pad of the edge part periphery of described latticed base cloth.
3. wig substrate according to claim 1 is characterized in that,
The described part that is bent to form forms as follows: with the edge part periphery of described latticed base cloth support or oppose side edgefold once more than, and when the flanging of this dorsal part is partly taken in, it is sutured in the table lateral edge portion.
4. wig substrate according to claim 1 is characterized in that,
The described part that is bent to form forms as follows: have and be connected with described latticed base cloth and overlapping another latticed base cloth that is disposed at the surface or the back side of this latticed base cloth, the mode that the described latticed base cloth that is disposed at dorsal part is gone into the layback of supporting or opposing is shifted, and the described edge part of latticed base cloth that is disposed at the table side and the described shift amount sidesway of supporting or opposing is accordingly gone into.
5. according to claim 1,2,3 or 4 described wig substrates, it is characterized in that,
Portion is worn in the front portion that the described part that is bent to form is described latticed base cloth.
6. according to claim 1,2,3 or 4 described wig substrates, it is characterized in that,
The edge complete cycle that the described part that is bent to form is described latticed base cloth.
7. according to claim 1,2,3 or 4 described wig substrates, it is characterized in that,
The periphery part of described latticed base cloth forms waveform.
8. according to claim 1,2,3 or 4 described wig substrates, it is characterized in that,
The whole peripheral shape of described latticed base cloth becomes waveform.
9. wig substrate according to claim 7 is characterized in that,
The described part that is bent to form is formed at the described part that forms waveform.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP151930/2007 | 2007-06-07 | ||
| JP2007151930 | 2007-06-07 | ||
| JP2007187174 | 2007-07-18 | ||
| JP187174/2007 | 2007-07-18 | ||
| PCT/JP2008/001430 WO2008149555A1 (en) | 2007-06-07 | 2008-06-05 | Wig base |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101677642A true CN101677642A (en) | 2010-03-24 |
| CN101677642B CN101677642B (en) | 2012-10-24 |
Family
ID=40093387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008800183734A Active CN101677642B (en) | 2007-06-07 | 2008-06-05 | Wig base |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5306195B2 (en) |
| CN (1) | CN101677642B (en) |
| WO (1) | WO2008149555A1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104337091A (en) * | 2013-08-02 | 2015-02-11 | 自然艺术公司 | Wig base and wig |
| CN106102495A (en) * | 2014-08-08 | 2016-11-09 | 爱德兰丝株式会社 | Possesses the wig matrix of the elastic region of generally H shape |
| CN106974347A (en) * | 2013-12-25 | 2017-07-25 | 爱德兰丝株式会社 | Wig matrix |
| TWI683632B (en) * | 2015-01-28 | 2020-02-01 | 日商愛德蘭絲股份有限公司 | Wig bottom net and wig |
| CN111093413A (en) * | 2017-09-15 | 2020-05-01 | 爱德兰丝株式会社 | Wig base and wig |
| CN115171475A (en) * | 2022-06-30 | 2022-10-11 | 袁著勇 | Method for positioning hairline contours of different head circumference sizes, head model and wig |
| US11602188B2 (en) | 2019-02-21 | 2023-03-14 | CreatedHair, Inc. | Reversible and adjustable headband with silicone insert for securing wig |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6016340B2 (en) * | 2011-08-29 | 2016-10-26 | 株式会社アデランス | Wig |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000096327A (en) * | 1998-09-28 | 2000-04-04 | Art Of Hair:Kk | Core material for wig base and wig |
| JP2001081618A (en) * | 1999-09-03 | 2001-03-27 | Fuonteenu Kk | Wig |
| JP4203765B2 (en) * | 2005-08-08 | 2009-01-07 | 株式会社ハリウッドマジック | Wig |
| CN2887106Y (en) * | 2006-03-03 | 2007-04-11 | 河南瑞贝卡发制品股份有限公司 | A wig sheath with hollow structure |
| JP2007239153A (en) * | 2006-03-10 | 2007-09-20 | Svenson:Kk | Wig |
-
2008
- 2008-06-05 WO PCT/JP2008/001430 patent/WO2008149555A1/en active Application Filing
- 2008-06-05 JP JP2009517726A patent/JP5306195B2/en active Active
- 2008-06-05 CN CN2008800183734A patent/CN101677642B/en active Active
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104337091A (en) * | 2013-08-02 | 2015-02-11 | 自然艺术公司 | Wig base and wig |
| CN104337091B (en) * | 2013-08-02 | 2017-12-05 | 自然艺术公司 | Wig base and wig |
| CN106974347A (en) * | 2013-12-25 | 2017-07-25 | 爱德兰丝株式会社 | Wig matrix |
| CN106974347B (en) * | 2013-12-25 | 2019-05-14 | 爱德兰丝株式会社 | Wig matrix |
| CN106102495A (en) * | 2014-08-08 | 2016-11-09 | 爱德兰丝株式会社 | Possesses the wig matrix of the elastic region of generally H shape |
| TWI683632B (en) * | 2015-01-28 | 2020-02-01 | 日商愛德蘭絲股份有限公司 | Wig bottom net and wig |
| CN111093413A (en) * | 2017-09-15 | 2020-05-01 | 爱德兰丝株式会社 | Wig base and wig |
| US11602188B2 (en) | 2019-02-21 | 2023-03-14 | CreatedHair, Inc. | Reversible and adjustable headband with silicone insert for securing wig |
| CN115171475A (en) * | 2022-06-30 | 2022-10-11 | 袁著勇 | Method for positioning hairline contours of different head circumference sizes, head model and wig |
| CN115171475B (en) * | 2022-06-30 | 2024-02-02 | 袁著勇 | Hairline contour positioning method, head model and wig with different head circumference sizes |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2008149555A1 (en) | 2010-08-19 |
| WO2008149555A1 (en) | 2008-12-11 |
| CN101677642B (en) | 2012-10-24 |
| JP5306195B2 (en) | 2013-10-02 |
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