CN101677485A - Plasma processing equipment, its radio frequency apparatus and radio frequency conveying method - Google Patents
Plasma processing equipment, its radio frequency apparatus and radio frequency conveying method Download PDFInfo
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- CN101677485A CN101677485A CN200810222559A CN200810222559A CN101677485A CN 101677485 A CN101677485 A CN 101677485A CN 200810222559 A CN200810222559 A CN 200810222559A CN 200810222559 A CN200810222559 A CN 200810222559A CN 101677485 A CN101677485 A CN 101677485A
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Abstract
The invention discloses a radio frequency apparatus, includes a radio frequency power supply, a radio frequency adapter and an inductance coupling coil connected in order, wherein the inductance coupling coil includes a center coil and at least a group of peripheral coils surrounding the center coi;l the center coil and the peripheral coils are in mutual independence, and the proportion of radio frequency current in these coils can be regulated. The invention also discloses a plasma processing equipment including the radio frequency apparatus. In the radio frequency conveying method disclosedby the invention, radio frequency energies are respectively input to the center position and peripheral position of the reaction chamber through at least two mutually independent inductance coupling coils, and the proportion of radio frequency current in these coils can be regulated according to the plasma concentration at these positions. As subarea conveying and subarea control of the radio frequency energy is realized, the uniformity of the plasma in the radial direction of the reaction chamber can be improved, thereby ensuring the smooth completion of the fine processing to the workpiece by the plasma processing equipment.
Description
Technical field
The present invention relates to microelectronics technology, particularly a kind of radio-frequency unit that is used for apparatus for processing plasma.The invention still further relates to a kind of apparatus for processing plasma that comprises above-mentioned radio-frequency unit, and a kind of in the reaction chamber of apparatus for processing plasma the radio frequency conveying method of input radio frequency energy.
Background technology
Apparatus for processing plasma is widely used in microelectronics technology.
Please refer to Fig. 1, Fig. 1 is a kind of structural representation of typical apparatus for processing plasma.
Apparatus for processing plasma 1 inside has reaction chamber 11, and the top of reaction chamber 11 has loam cake 12, and loam cake 12 is generally quartz cover.The middle part of loam cake 12 is provided with gas access 13, so that import gas via this gas access 13 in reaction chamber 11.The top of loam cake 12 also is provided with inductance-coupled coil 14, wherein can pass through radio-frequency current.
During apparatus for processing plasma 1 work, obtain the device (not shown) by vacuum and in reaction chamber 11, make and keep state near vacuum.Under this state, by suitable radio-frequency current, radio-frequency (RF) energy sees through loam cake 12 and enters in the reaction chamber 11 in inductance-coupled coil 14, thereby excites gas wherein, and then produces and keep plasma environment in reaction chamber.Owing to have strong etching and deposit ability, physical-chemical reactions such as etching or deposit can take place with workpiece 15 in described plasma, to obtain needed etching figure or illuvium.The accessory substance of above-mentioned physical-chemical reaction obtains device by described vacuum and extracts out from bleeding point 16.
Please refer to Fig. 2, Fig. 2 is a kind of structural representation of typical inductance-coupled coil.
Inductance-coupled coil 14 is formed and is roughly plate-like usually by involute, inductance-coupled coil 14 is distributed in the whole top of loam cake 12 substantially, the diameter of its integral diameter and reaction chamber 11 adapts, thereby can be to the various piece input radio frequency energy of reaction chamber 11.
As everyone knows, footpath at reaction chamber 11 makes progress, the electromagnetic field that inductance-coupled coil 14 is produced is uneven, this will cause the concentration of its plasma that excites non-uniform phenomenon upwards to occur in the footpath of reaction chamber 11, and some other factors such as the concrete structure of apparatus for processing plasma also may cause plasma upwards can not evenly distribute in reaction chamber 11 footpaths.The inhomogeneous workpiece 15 different piece processing speeds that will cause of plasma density there are differences, and this obviously can produce significant adverse effect to technical process.
Under and the situation that technology lines workpiece 15 are bigger less, still can alleviate the difference that reaction chamber 11 is radially gone up plasma density to a certain extent, and satisfy technological requirement by being diffused in reaction chamber 11 sizes; But, along with continuing to increase of reaction chamber 11 sizes, make plasma density evenly more and more difficult by diffusion effect, and along with the technology lines of workpiece 15 diminish gradually, the difference of plasma density have a negative impact more and more significant to technical process.
Therefore, how improving the apparatus for processing plasma reaction chamber, radially to go up the uniformity of plasma be the present technical issues that need to address of those skilled in the art.
Summary of the invention
The purpose of this invention is to provide a kind of radio-frequency unit that is used for apparatus for processing plasma, can significantly improve the uniformity that the apparatus for processing plasma reaction chamber is radially gone up plasma.Another object of the present invention provides a kind of apparatus for processing plasma that comprises above-mentioned radio-frequency unit, and provide a kind of in the reaction chamber of apparatus for processing plasma the radio frequency conveying method of input radio frequency energy.
For solving the problems of the technologies described above, the invention provides a kind of radio-frequency unit, be used for apparatus for processing plasma, comprise the radio-frequency power supply, radio frequency adaptation and the inductance-coupled coil that connect successively, described inductance-coupled coil comprises the centering coil that is positioned at described apparatus for processing plasma reaction chamber top center position, and centers on described centering coil and the radially-arranged at least one group of periphery coil along described reaction chamber top; Described centering coil and each described periphery coil are independent mutually, and the ratio of radio-frequency current can be adjusted in each coil.
Further, described centering coil and each periphery coil all have an end ground connection, and its other end all connects the output of radio frequency adaptation main part; Described radio frequency adaptation further comprises the output of being located at its main part and the variable element between described centering coil and the periphery coil, to change the current ratio between each coil.
Further, the number of described periphery coil is one group, in described centering coil and the periphery coil at least one with the output of described radio frequency adaptation main part between be connected in series first variable capacitance.
Further, described radio frequency adaptation further comprises second variable capacitance, is connected in series the branch road that forms by described second variable capacitance with described first variable capacitance and is connected between the output of ground wire and described radio frequency adaptation main part.
Further, the number of described periphery coil is one group, in described centering coil and the periphery coil at least one with the output of described radio frequency adaptation main part between be connected in series constant electric capacity; Described radio-frequency unit further comprises second variable capacitance, and the branch road that is formed by described second variable capacitance and described constant capacitance series is connected between the output of ground wire and described radio frequency adaptation main part.
Further, described periphery coil and described centering coil upwards have suitable spacing in the footpath at described reaction chamber top.
Further, described periphery coil and described centering coil are planar coil or three-dimensional coil.
The present invention also provides a kind of apparatus for processing plasma, comprises above-mentioned each described radio-frequency unit.
The present invention also provides a kind of radio frequency conveying method, be used for reaction chamber input radio frequency energy to apparatus for processing plasma, respectively to the centre of described reaction chamber and at least one periphery position input radio frequency energy, and adjust the ratio of radio-frequency current in each inductance-coupled coil according to the concentration of described centre and periphery position ionic medium body by at least two separate inductance-coupled coils around described centre.
Further, each described inductance-coupled coil connects same radio frequency adaptation, and each described inductance-coupled coil is adjusted the ratio of described radio-frequency current by connected variable element.
The inductance-coupled coil of radio-frequency unit provided by the present invention comprises at least two separate parts, promptly be positioned at the centering coil of described apparatus for processing plasma reaction chamber top center position, and at least one group of periphery coil that is positioned at periphery position, described reaction chamber top and radially distributes; The ratio of radio-frequency current can be adjusted in described centering coil and each the described periphery coil.Therefore, radio-frequency unit provided by the present invention can subregion in described reaction chamber the concentration of input radio frequency and subregion control plasma; Promptly, when described reaction chamber is radially gone up the plasma density unevenness when even, can adjust the ratio of radio-frequency current in each coil as the case may be, thereby adjust each coil in the centre of described reaction chamber and the relative intensity of periphery electromagnetic field that the position forms, so that eliminate the difference that described reaction chamber is radially gone up plasma density, and then guarantee that the various technical processs of carrying out in the gas ions treatment facility finish smoothly.Provided by the present invention in the reaction chamber of apparatus for processing plasma the radio frequency conveying method of input radio frequency energy realized that the subregion of radio-frequency (RF) energy is carried and subregion control, help improving the uniformity that described reaction chamber is radially gone up plasma, can guarantee that equally the various technical processs of carrying out in the gas ions treatment facility finish smoothly.
Description of drawings
Fig. 1 is a kind of structural representation of typical apparatus for processing plasma;
Fig. 2 is a kind of structural representation of typical inductance-coupled coil;
Fig. 3 is the structural representation of a kind of embodiment of inductance-coupled coil provided by the present invention;
Fig. 4 is the structural representation of the another kind of embodiment of inductance-coupled coil provided by the present invention;
Fig. 5 is the structural representation of first kind of embodiment of radio-frequency unit provided by the present invention;
Fig. 6 is the structural representation of second kind of embodiment of radio-frequency unit provided by the present invention;
Fig. 7 is the structural representation of the third embodiment of radio-frequency unit provided by the present invention;
Fig. 8 is the structural representation of the 4th kind of embodiment of radio-frequency unit provided by the present invention;
Fig. 9 is the structural representation of the 5th kind of embodiment of radio-frequency unit provided by the present invention.
Embodiment
In order to make those skilled in the art person understand the present invention program better, the present invention is described in further detail below in conjunction with the drawings and specific embodiments.
The radio-frequency unit that is used for apparatus for processing plasma provided by the present invention comprises radio-frequency power supply, radio frequency adaptation and inductance-coupled coil, and the three connects successively.
Please refer to Fig. 3, Fig. 3 is the structural representation of a kind of embodiment of inductance-coupled coil provided by the present invention.
In first kind of embodiment, inductance-coupled coil provided by the present invention comprises two phase independent parts at least, i.e. centering coil L1 and periphery coil L2.
Centering coil L1 is located at the center at described apparatus for processing plasma reaction chamber top, and periphery coil L2 is positioned at the circumferential position at described apparatus for processing plasma reaction chamber top, and periphery coil L2 is around centering coil L1.Obviously, the below of centering coil L1 and periphery coil L2 corresponds respectively to the centre and the periphery position of reaction chamber, and both are input radio frequency energy in described centre and periphery position respectively, and then excites and keep plasma.Therefore, described reaction chamber directly upwards also just forms two zones that plasma density is different at it, and the plasma in each zone is mainly excited by the radio-frequency (RF) energy from different coils.
Because the ratio of radio-frequency current can be adjusted among centering coil L1 and the periphery coil L2, therefore, can subregion control the concentration of described reaction chamber ionic medium body.When described reaction chamber is radially gone up the plasma density unevenness when even, can adjust the ratio of radio-frequency current among centering coil L1 and the periphery coil L2 as the case may be, thereby adjust both in the centre of described reaction chamber and the relative intensity of periphery electromagnetic field that the position forms, so that eliminate the difference that described reaction chamber is radially gone up plasma density, and then guarantee that the various technical processs of carrying out in the apparatus for processing plasma finish smoothly.
The outside of periphery coil L2 can further be provided with one group or organize the periphery coil more, and each periphery coil is along the radial distribution at described reaction chamber top.Like this, described reaction chamber is in its zone that directly upwards can further form three or more, and the plasma in each zone is excited by the radio-frequency (RF) energy from different coils equally.
Footpath at the reaction chamber top makes progress, and can keep suitable distance between centering coil L1 and the periphery coil L2, and this distance is obviously obviously greater than the spacing between two adjacent in the every group of coil circles.Because the concentration of reaction chamber centre plasma is higher easily, keep above-mentioned suitable distance to help avoiding the excessive concentration of plasma in the reaction chamber centre between centering coil L1 and the periphery coil L2, therefore plasma will be more even in the distribution that reaction chamber directly makes progress.
Please refer to Fig. 4, Fig. 4 is the structural representation of the another kind of embodiment of inductance-coupled coil provided by the present invention.
Centering coil L1 shown in Figure 3 and periphery coil L2 be planar coil (mainly upwards extend in the footpath of coil, its on-plane surface height be usually less than coil diameter 10%), but the concrete form of each coil should not be limited to this.As shown in Figure 4, centering coil L1 can be three-dimensional coil.In addition, periphery coil L2 can be equally three-dimensional coil (mainly coil axially on extend, its on-plane surface height is usually above 10% of coil diameter).
To introduce radio-frequency unit provided by the present invention all-sidely below.
Please refer to Fig. 5, Fig. 5 is the structural representation of first kind of embodiment of radio-frequency unit provided by the present invention.
Described radio-frequency unit comprises radio-frequency power supply 4, and its common operating frequency is 13.56MHz, and radio-frequency power supply 4 connects centering coil L1 and periphery coil L2 by radio frequency adaptation 3.
Radio frequency adaptation 3 provided by the present invention comprises main part 31 and appendix 32.Main part 31 can comprise some variable capacitances, and these variable capacitances can form common network configurations such as T type, L type, inverted L shape; Main part 31 among Fig. 5 specifically comprises the 3rd variable capacitance C3 and the 4th variable capacitance C4, and both form L type network configuration.The 3rd variable capacitance C3 and the 4th variable capacitance C4 all can change capacitance by motor-driven.
As everyone knows, when the impedance of the impedance of load and radio-frequency power supply did not match, the input impedance of radio frequency adaptation was not equal to the output impedance of radio-frequency power supply (being generally 50 ohm); Therefore, can be at radio frequency adaptation sensor input connection 311, therefore transducer 311 can monitor the input impedance of radio frequency adaptation in real time, and the impedance signal of its acquisition is passed to controller 312.Controller 312 is according to the current state of its impedance signal that receives and the 3rd variable capacitance C3 and the 4th variable capacitance C4, motor to control the 3rd variable capacitance C3 and the 4th variable capacitance C4 sends instruction, thereby regulate above-mentioned two variable capacitances to proper state, and then guarantee that the impedance of load impedance and radio-frequency power supply keeps conjugate impedance match.
Above-mentioned centering coil L1 and periphery coil L2 are separate, this for a change between the two the ratio of radio-frequency current provide may.Those skilled in the art can adopt multiple mode to change the ratio of radio-frequency current between each coil, such as, can adopt many cover radio-frequency power supplies respectively to each coil power supply, this is a kind of very simple mode, this mode cost is higher, the market prospects dimness but obviously.Therefore, the applicant provides several comparatively simple, reliable and ratios lower-cost electric current to shift gears; It is pointed out that the method that changes the ratio of radio-frequency current between each coil is not limited to these concrete modes.
Centering coil L1 and periphery coil L2 all have an end ground connection, and both other ends can connect radio frequency adaptation 3 main parts 31 output (be node a).With the connected mode of node a can be directly to be connected, and for example centering coil L1 also can be indirect connection, for example periphery coil L2.When the periphery coil was many groups, each organized the output that periphery coil homogeneous end ground connection one end connects main part 31.Below be that one group situation is that example describes with the outer peripheral lines circle.
Can between outer peripheral lines circle L2 and node a, variable element be set, the first variable capacitance C1 for example, the first variable capacitance C1 can manual adjustments also can regulate automatically; The first variable capacitance C1 among Fig. 5 can be regulated automatically by controller 312.Like this, periphery coil L2 is connected in series the branch road that forms and is connected between above-mentioned node a and the ground wire with the first variable capacitance C1; Centering coil L1 is connected between above-mentioned node a and the ground wire equally.Controller 312 can be controlled the first variable capacitance C1 (concentration of the real-time monitoring of plasma of mode that can be by routine and be sent to controller 312 with concentration signal) according to the concentration of reaction chamber centre and periphery position plasma, and then the distribution of change radio-frequency current between centering coil L1 and periphery coil L2, to adjust the relative concentration of described reaction chamber diverse location plasma, finally make the concentration trend of each position plasma of described reaction chamber consistent.First current sensor 51 and second current sensor 52 can be set, both are in series with centering coil L1 and periphery coil L2 respectively; First current sensor 51 directly is connected between node a and the centering coil L1 in Fig. 5, and 52 of the second throttling transducers are connected between the first variable capacitance C1 and the periphery coil L2.The signal that first current sensor 51 and second current sensor 52 are gathered is sent to controller 312, controller 312 is adjusted the first variable capacitance C1 and the 3rd variable capacitance C3 and the 4th variable capacitance C4 according to this signal, thereby reaches impedance matching when satisfying the current ratio adjusting.
Certainly, the first variable capacitance C1 also can be arranged between node a and the centering coil L1, perhaps between node a and the centering coil L1, between node a and the periphery coil L2 one first variable capacitance C1 is set all; This can adjust the relative concentration of described reaction chamber centre and periphery position plasma equally.
Can on the basis of radio-frequency unit shown in Figure 5, improve.
Please refer to Fig. 6 and Fig. 7, Fig. 6 is the structural representation of second kind of embodiment of radio-frequency unit provided by the present invention; Fig. 7 is the structural representation of the third embodiment of radio-frequency unit provided by the present invention.
As previously mentioned, the appendix 32 of radio frequency adaptation 3 only comprises one or two first variable capacitances C1 in embodiment shown in Figure 5, promptly between at least one and the node a the first variable capacitance C1 can be set among centering coil L1 and the periphery coil L2.The number second variable capacitance C2 identical with the first variable capacitance C1 can further be set, and the branch road that makes the second variable capacitance C2 be connected in series formation with the first variable capacitance C1 is connected between node a and the ground wire.At this moment, the appendix 32 of radio frequency adaptation 3 comprises the some first variable capacitance C1 and the second variable capacitance C2, and both all can be by controller 312 controls.The signal that first current sensor 51 and second current sensor 52 are gathered is sent to controller 312, controller 312 is adjusted the first variable capacitance C1, the second variable capacitance C2 and the 3rd variable capacitance C3 and the 4th variable capacitance C4 according to this signal, thereby reaches impedance matching when satisfying the current ratio adjusting.
When the first variable capacitance C1 only was arranged between periphery coil L2 and the node a, the number of the second variable capacitance C2 was one group, and it is arranged between node b and the ground wire, and the circuit structure of this moment as shown in Figure 6.When the first variable capacitance C1 only is arranged between centering coil L1 and the node a, still one group of the number of the second variable capacitance C2, and it is arranged between node c and the ground wire, and the circuit structure of this moment is as shown in Figure 7.When the first variable capacitance C1 was arranged between node a and centering coil L1, the periphery coil L2 simultaneously, the number of the second variable capacitance C2 was two groups, and the set-up mode of two second variable capacitance C2 can be respectively with reference to figure 6 and Fig. 7.
Please refer to Fig. 8 and Fig. 9, Fig. 8 is the structural representation of the 4th kind of embodiment of radio-frequency unit provided by the present invention; Fig. 9 is the structural representation of the 5th kind of embodiment of radio-frequency unit provided by the present invention.
As previously shown, those skilled in the art can adopt multiple mode to change the ratio of radio-frequency current between each coil.
Can between at least one and the node a constant capacitor C 5 be set among both at outer peripheral lines circle L2, centering coil L1, make to be connected in series the branch road that forms with constant capacitor C 5 by periphery coil L2 and to be connected between above-mentioned node a and the ground wire; Centering coil L1 is connected between above-mentioned node a and the ground wire equally.The second variable capacitance C2 is set simultaneously, and the second variable capacitance C2 formed branch road of connecting with constant capacitor C 5 is connected between node a and the ground wire.Manually or automatically regulate the second variable capacitance C2 this moment and can change radio-frequency current ratio between centering coil L1 and the periphery coil L2.This moment, the appendix 32 of radio frequency adaptation 3 comprised some second variable capacitance C2 and constant capacitor C 5.The effect of first current sensor 51 and second current sensor 52 is still the current signal of gathering each coil and is sent to controller 312; Controller 312 is adjusted each variable capacitance according to this signal, thereby reaches impedance matching when satisfying the current ratio adjusting.
Fig. 8 shows constant capacitor C 5 and only is arranged at situation between node a and the periphery coil L2, and Fig. 9 shows constant capacitor C 5 and only is arranged at situation between node a and the centering coil L1.When constant capacitor C 5 was arranged between node a and centering coil L1, the periphery coil L2 simultaneously, the number of the second variable capacitance C2 was two groups, and the set-up mode of two second variable capacitance C2 can be respectively with reference to figure 8 and Fig. 9.
More than be that one group situation is that example describes technical scheme of the present invention all with the number of outer peripheral lines circle L2; When the number of periphery coil L2 is many groups, other periphery coils can be connected between ground wire and the node a, and with reference to constant electric capacity or variable capacitance above are set, thereby can adjust radio frequency adaptation 3 so that adjust the radio-frequency current ratio of respectively organizing between the coil.This this paper is no longer launched to describe.
Apparatus for processing plasma provided by the present invention comprises above-mentioned each described radio-frequency unit; Other structures of described gas ions treatment facility can be with reference to prior art; For example, can be with reference to the gas ions treatment facility among the figure 1, but be not limited to this concrete form.
The radio frequency conveying method that is used for to the reaction chamber input radio frequency energy of apparatus for processing plasma provided by the present invention can be with reference to prior art at aspects such as the generation of radio frequency and impedance matchings; One of its key is, the present invention be by at least two separate inductance-coupled coils respectively to the centre of described reaction chamber and at least one periphery position input radio frequency energy around described centre, and adjust the ratio of radio-frequency current in each inductance-coupled coil according to the concentration of described centre and periphery position ionic medium body.Briefly, the present invention has realized that the subregion of radio-frequency (RF) energy is carried and subregion control, when described reaction chamber is radially gone up the plasma density unevenness when even, can adjust the ratio of radio-frequency current in each coil as the case may be, thereby adjust each coil in the centre of described reaction chamber and the relative intensity of periphery electromagnetic field that the position forms, so that eliminate the difference that described reaction chamber is radially gone up plasma density, and then guarantee that the various technical processs of carrying out in the gas ions treatment facility finish smoothly.
The ratio of radio-frequency current can be by variable element adjustment such as variable capacitance (this does not repel the existence of constant element in circuit) in the inductance-coupled coil, and the concrete connected mode of described variable element can be with reference to the description of preamble about radio-frequency unit and apparatus for processing plasma.
More than to apparatus for processing plasma provided by the present invention, its radio-frequency unit and in the reaction chamber of apparatus for processing plasma the radio frequency conveying method of input radio frequency energy be described in detail.Used specific case herein principle of the present invention and execution mode are set forth, the explanation of above embodiment just is used for helping to understand method of the present invention and core concept thereof.Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention, can also carry out some improvement and modification to the present invention, these improvement and modification also fall in the protection range of claim of the present invention.
Claims (10)
1, a kind of radio-frequency unit, be used for apparatus for processing plasma, comprise the radio-frequency power supply, radio frequency adaptation and the inductance-coupled coil that connect successively, it is characterized in that, described inductance-coupled coil comprises the centering coil that is positioned at described apparatus for processing plasma reaction chamber top center position, and centers on described centering coil and the radially-arranged at least one group of periphery coil along described reaction chamber top; Described centering coil and each described periphery coil are independent mutually, and the ratio of radio-frequency current can be adjusted in each coil.
2, radio-frequency unit as claimed in claim 1 is characterized in that, described centering coil and each periphery coil all have an end ground connection, and its other end all connects the output of radio frequency adaptation main part; Described radio frequency adaptation further comprises the output of being located at its main part and the variable element between described centering coil and the periphery coil, to change the current ratio between each coil.
3, radio-frequency unit as claimed in claim 2 is characterized in that, the number of described periphery coil is one group, in described centering coil and the periphery coil at least one with the output of described radio frequency adaptation main part between be connected in series first variable capacitance.
4, radio-frequency unit as claimed in claim 3 is characterized in that, further comprises second variable capacitance, is connected in series the branch road that forms by described second variable capacitance with described first variable capacitance and is connected between the output of ground wire and described radio frequency adaptation main part.
5, radio-frequency unit as claimed in claim 2 is characterized in that, the number of described periphery coil is one group, in described centering coil and the periphery coil at least one with the output of described radio frequency adaptation main part between be connected in series constant electric capacity; Described radio-frequency unit further comprises second variable capacitance, and the branch road that is formed by described second variable capacitance and described constant capacitance series is connected between the output of ground wire and described radio frequency adaptation main part.
6, radio-frequency unit as claimed in claim 1 is characterized in that, described periphery coil and described centering coil upwards have suitable spacing in the footpath at described reaction chamber top.
7, radio-frequency unit as claimed in claim 1 is characterized in that, described periphery coil and described centering coil are planar coil or three-dimensional coil.
8, a kind of apparatus for processing plasma is characterized in that, comprises as each described radio-frequency unit of claim 1 to 7.
9, a kind of radio frequency conveying method, be used for reaction chamber input radio frequency energy to apparatus for processing plasma, it is characterized in that, respectively to the centre of described reaction chamber and at least one periphery position input radio frequency energy, and adjust the ratio of radio-frequency current in each inductance-coupled coil according to the concentration of described centre and periphery position ionic medium body by at least two separate inductance-coupled coils around described centre.
10, radio frequency conveying method as claimed in claim 9 is characterized in that, each described inductance-coupled coil connects same radio frequency adaptation, and each described inductance-coupled coil is adjusted the ratio of described radio-frequency current by connected variable element.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105097397A (en) * | 2014-05-22 | 2015-11-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Impedance matching device and semiconductor machining equipment |
| CN108271307A (en) * | 2016-12-30 | 2018-07-10 | 中微半导体设备(上海)有限公司 | Inductance coupling plasma processing device and plasma generating device |
| WO2023246663A1 (en) * | 2022-06-22 | 2023-12-28 | 深圳市恒运昌真空技术有限公司 | Current control method and energy radiation system |
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2008
- 2008-09-19 CN CN200810222559A patent/CN101677485A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105097397A (en) * | 2014-05-22 | 2015-11-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Impedance matching device and semiconductor machining equipment |
| CN105097397B (en) * | 2014-05-22 | 2018-05-08 | 北京北方华创微电子装备有限公司 | Impedance-matching device and semiconductor processing equipment |
| CN108271307A (en) * | 2016-12-30 | 2018-07-10 | 中微半导体设备(上海)有限公司 | Inductance coupling plasma processing device and plasma generating device |
| WO2023246663A1 (en) * | 2022-06-22 | 2023-12-28 | 深圳市恒运昌真空技术有限公司 | Current control method and energy radiation system |
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Application publication date: 20100324 |