CN101650528B - System and method for using a two part cover for protecting a reticle - Google Patents

Abstract

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Description

Use the system and method for two part cover for protecting masterplate

The application be in the application number that on February 21st, 2003 submitted be 200710102348.1, denomination of invention divides an application for the application for a patent for invention of " using the system and method for two part cover for protecting masterplate ", original application is the application number of submitting on February 21st, 2003 the dividing an application for the application for a patent for invention of " using the system and method for two part cover for protecting masterplate " that be 03142306.X, denomination of invention.

Technical field

The application relates to photoetching technique, relates in particular to not use thin skin that the photoetching masterplate is protected.

Background technology

Photoetching technique is a kind of method that on the surface of substrate, produces characteristic.Substrate can be included in makes employed those substrates in flat-panel monitor, circuit board, the various integrated circuit etc.For example can use semiconductor wafer to make integrated circuit as substrate.

In photoetching technique, use masterplate with required design transfer to substrate.Masterplate can be by being that material transparent is processed to employed lithographic wavelength.For example under the situation of visible light, use glass.Masterplate also can form can reflect employed lithographic wavelength, for example repeller ultraviolet ray (EUV).Be printed on image on the masterplate, be directed against the size that masterplate is selected by the concrete system that uses masterplate.For example can use 6 inches * 6 inches and thickness is 1/4 inch masterplate.In photoetching process, be placed on wafer on the wafer station and be exposed to and attend institute's watermark image according to masterplate and project the image on the wafer surface.

Institute's image projected changes the characteristic of the layer (for example photoresist layer) that is deposited on the wafer surface.These change with exposure process in the characteristic that projects on the wafer corresponding.After exposure, this layer can be etched, to form patterned layer.This pattern is corresponding to those characteristics that in exposure process, project on the wafer.Use this layer that has pattern to remove the exposed portion of the structural sheet below (for example conductive layer, semi-conductive layer or insulation course) in this wafer then.Repeat this process and other step, on surface, form required characteristic at wafer.

Can be clear that from top description the accurate position and the size of the characteristic that produces through photoetching technique directly depend on precision and the accuracy that projects the image on the wafer.The severity of inferior 100nm photoetching has not only proposed strict requirement to lithography tool but also to masterplate.The airborne particle and the dust that are deposited on the masterplate can cause the defective on the wafer.Little anamorphose in the masterplate plane or displacement maybe be bigger than critical dimension and aliasing error predicted value.Traditional solution is to adopt the thin skin of permanent fixedly transparent sheet of material as masterplate.

This thin skin all is retained in original position in the institute of photoetching process in steps.Thin skin projects in improvement has double effects aspect the accuracy of the image on the wafer.At first, thin skin is used to protect masterplate directly not contact with fume.As stated, the particle that is deposited on the masterplate can produce anamorphose, therefore must remove.But, remove degranulation from masterplate and can cause damage masterplate because this remove may relate to masterplate directly contact.When using thin skin, particle can be deposited on the thin skin rather than on the masterplate.What therefore must clean is thin skin.Cleaning thin skin rather than masterplate endanger less concerning the integrality of masterplate, because masterplate is protected by its thin skin in this cleaning course.

Second effect that thin skin produced is relevant with the gap (standoff) of thin skin.In exposure process, focussing plane is corresponding to the position of the image of printing on the masterplate.Through using thin skin, any particle in the system can be deposited on the thin skin rather than on the masterplate.Utilize the thickness of thin skin, and the distance that between the band patterned surfaces of the surface of thin skin and masterplate, causes therefrom, these particles can not be in focussing plane.Because the image that thin skin with the particle lifting and not at focussing plane, therefore projects on the substrate can comprise that the possibility of these particles just reduces greatly.

Above-mentioned this method effect in many traditional lithography process technology is fine.Therefore using this system to pass in the system of masterplate and thin skin at light is easily, is available because make the material of transparent thin skin and masterplate.But this thin skin method is not suitable for EUV to be used, because the short wavelength of employed light is easy to when passing gas or solid, be absorbed.

Therefore, there is not material enough transparent and can be used to make thin skin at present to EUV.In the EUV photoetching technique, EUV does not pass masterplate, but the image-side of masterplate is left in reflection.This technology is called the reflection photoetching.If use thin skin in reflection in the photoetching process, then EUV must pass thin skin twice, once is directive masterplate and another time is to reflect to leave masterplate.Therefore, in the EUV process technology, any light loss relevant with thin skin doubled.

Therefore, need a kind of system and method, can protect masterplate not contaminated, it can not reduce the EUV light quantity of the system of passing basically.

Summary of the invention

Embodiment of the present invention provide a kind of method of transmission mask, comprise the steps: (a) first with movable particle lid coverage mask, form mask-cover configuration; (b) this structure is enclosed in the airtight box cover that this box includes mask delivery part and separates with this mask delivery part; And (c) this structure is placed in the box transmits.

Embodiment of the present invention provide a kind of airtight box that is used for transmission mask, and this box comprises: mask delivery part; Cover; Be used to prevent gas mobile gas check between mask delivery part and cover; And be used for cover and this mask delivered that part is temporary to be connected and fixing breech lock.

Embodiment of the present invention provide the method for a kind of transmission, carrying and processing mask, comprise the steps: (a) first with movable particle lid coverage mask, form mask-cover configuration; (b) this structure is enclosed in the airtight box cover that this box includes mask delivery part and separates with this mask delivery part; The box that (c) will have this structure is sent to machining tool, and this instrument has at least a in following each parts: take off gondola device (de-podder), microenvironment chamber, microenvironment executor, loadlock (loadlock), vacuum chamber, vacuum manipulator and mask bearing; The box that (d) will have this structure is placed on first opening that takes off the gondola device, makes the cover of box prevent that gas from passing through this first opening and flowing; (e) purify the inside of taking off the gondola device with clean air; (f) mask delivery part and cover are separately opened this box, keep covering on original position, be used for barrier gas and flow, mask delivery part is moved to the inside of taking off the gondola device with this structure; (g) utilize the microenvironment executor to take off gondola device opening and should construct from taking off the gondola device and be extracted in the microenvironment chamber, and should construct through the first loadlock opening and be put into loadlock inside through second; (h) loadlock of finding time; (i) utilize vacuum manipulator to construct through second loadlock and from this loadlock, extract out, and this structure is moved in the vacuum chamber; (j) this structure is placed on the mask bearing, makes the unmasked portion of mask contact with bearing; (k) utilize this bearing to keep this mask; (l) utilize vacuum manipulator, lid and mask are separated, take lid away; (m) processing mask.

Embodiment of the present invention provide a kind of loadlock, comprising: the big envelope with at least two openings; The air side family of power and influence with the coupling of first opening of this big envelope; The inlet side family of power and influence with the coupling of second opening of this big envelope; Be positioned at the mask holder that is used to receive mask of big envelope; Be positioned at the removable dome that is used for coverage mask of big envelope; And the dome actuator that is used for moving dome, thereby this dome can be oriented to cover this mask.

Embodiment of the present invention provide a kind of mask are carried out the transition to the method for the vacuum the loadlock from air pressure, comprise the steps; (a) mask is placed in the loadlock; (b) mask is covered with dome, arrive mask to prevent the airborne particle in the loadlock; (c) close loadlock; (d) loadlock of finding time; (e) open loadlock and lead to vacuum; (f) withdraw dome and make mask be uncovered; And (g) from loadlock, remove mask.

Embodiment of the present invention provide the method for a kind of transmission, carrying and processing mask, comprise the steps: that (a) is enclosed in mask in the airtight box, the cover that this box includes mask delivery part and separates with this mask delivery part; The box that (b) will have this mask is sent to machining tool, and this instrument has at least a in following each parts: take off gondola device, microenvironment chamber, microenvironment executor, loadlock, vacuum chamber, vacuum manipulator and mask bearing; The box that (c) will have this mask is placed on first opening that takes off the gondola device, makes the cover of box prevent that gas from passing through this first opening and flowing; (d) purify the inside of taking off the gondola device with clean air; (e) mask delivery part and cover are separately opened this box, keep covering on original position; (f) utilize the microenvironment executor, take off gondola device opening and this mask is extracted in the microenvironment chamber from taking off the gondola device through second, and this mask is put into loadlock inside through the first loadlock opening; (g) loadlock of finding time; (h) utilize vacuum manipulator that this mask is extracted out from this loadlock through second loadlock, and this mask is moved in the vacuum chamber; (i) this mask is placed on the mask bearing; And (j) processing mask.

Embodiment of the present invention provide a kind of machinery.Be used in box, processing being sent to this machinery and leaving this mechanical mask, this machinery comprises: the air ambient part of filtration; At least one atmosphere executor; At least one takes off the gondola device; The gas microenvironment part that under basic atmospheric pressure, purifies with clean air; At least one microenvironment executor; At least one loadlock; Vacuum section; And at least one vacuum manipulator.

Embodiment of the present invention provide a kind of system, comprise that masterplate protects the lid of masterplate with being connected with this masterplate.Lid comprises framework and removable panel, and this panel moves and allows the path of light in exposure process to point to masterplate.Masterplate and the automatic manipulator robot of lid utilization move to platform.Masterplate and lid can be connected to substrate before removing.

The structure of other embodiments of the present invention, feature and advantage and each embodiment of the present invention and operation will be done more to describe in detail with reference to accompanying drawing below

Brief description of drawings

Introduce accompanying drawing here and, come together to explain the present invention, also be used to explain principle of the present invention, and make that the person of ordinary skill in the field can embodiment of the present invention together with explanation as the part of instructions.

Fig. 1 is the exploded view of the two-piece cover of appropriate position on the masterplate of embodiment of the present invention;

Fig. 2 utilizes aut.eq. that the masterplate in the two-piece cover is carried in the view on the platform according to embodiment of the present invention;

Fig. 3 representes the view that photoetching is carried out in the masterplate exposure according to embodiment of the present invention;

Fig. 4 is the exploded perspective view of the two-piece cover of expression embodiment of the present invention;

Fig. 5 is a method of utilizing the two-piece cover of embodiment of the present invention to aim at and shift;

Fig. 6 is the view of expression according to the catch fitting of embodiment of the present invention;

Fig. 7 is the extrapolation figure of the two-piece cover that has catch fitting of expression embodiment of the present invention;

Fig. 8 is the method that is used for strengthening the zone of masterplate according to embodiment of the present invention;

Fig. 9-10 representes the top and bottom perspective views of example masterplate lid according to embodiments of the present invention respectively;

The decomposition view of the masterplate lid of Figure 11 presentation graphs 9-10;

Figure 12 representes to design according to the dual jacket gondola of embodiment of the present invention (wrap pod);

Figure 13 is the exploded view of the dual jacket gondola of expression Figure 12;

Figure 14 is the loadlock of expression embodiment of the present invention;

Figure 15 is the exploded view of the loadlock of expression Figure 14;

Figure 16 is the view of the masterplate Handling device core of expression embodiment of the present invention;

Figure 17 representes the whole masterplate Handling device of embodiment of the present invention;

Figure 18 representes to transmit according to embodiment of the present invention the process flow diagram of the method for mask;

Figure 19 representes to transmit, carry and process the process flow diagram of the method for mask according to embodiment of the present invention;

Figure 20 representes to transmit to vacuum from atmospheric pressure in loadlock according to embodiment of the present invention the process flow diagram of the method for mask;

Figure 21 representes to transmit to atmospheric pressure from vacuum in loadlock according to embodiment of the present invention the process flow diagram of the method for mask;

Figure 22 representes to transmit, carry and process the process flow diagram of the method for mask according to embodiment of the present invention.

Below will present invention is described with reference to accompanying drawing.In the accompanying drawings, some similar Reference numerals are represented element same or that function is close.In addition, numeral this Reference numeral in that accompanying drawing on the left side occurs for the first time in most of Reference numerals.

Detailed description of preferred embodiments

Embodiment of the present invention provide a kind of lid of protecting masterplate, and it improves to some extent with respect to legacy system.Other embodiments of the present invention provide and can transmit box with gondola or the masterplate that this lid matches, and it further protects masterplate not encroached on by particle.Other embodiments of the present invention provide the loadlock that matches with this lid, and when between atmospheric pressure and vacuum, transmitting masterplate, it further protects masterplate not encroached on by particle.Some embodiments more of the present invention provide has three independently masterplate Handling devices of environment (room air that for example filters, the microenvironment and the vacuum of gas purification), and each environment all is suitable for most in each carrying step, the pollution of cost-efficient minimizing to masterplate being arranged.The method that the present invention also has some embodiments to provide a kind of all devices that utilize above minimizing to pollute to carry masterplate.

Traditional photoetching technique depends on thin skin and protects the band area of the pattern of masterplate not receive particle contamination.But as stated, be material transparent to extreme ultraviolet (EUV), therefore can not realize this method owing to do not have a kind of.In addition, the restriction of internal alignment makes that removing of whole masterplate lid is difficult to correctly carry out.Therefore, according to embodiment of the present invention, utilize the masterplate lid to protect masterplate, this masterplate lid comprises the framework that is used to support masterplate, and the panel that can in exposure and cleaning course, remove.

Although etching system is operated, in process, can produce particle under clean environment.These particles can pollute masterplate.Masterplate will periodically clean, thereby the particulate loading on the masterplate is remained under the threshold value of a permission.Therefore must consider that the particle in the etching system produces the source.Usually, the particle in other cleaning systems produces because of friction.In traditional system, when masterplate can produce particle when a position is sent to another position.Because masterplate can slide in transfer process in traditional system, therefore the slip of any masterplate in transport process also can produce other particle.At last, the vibration in the legacy system also can cause rubbing and relevant particle generation.

According to embodiment of the present invention, comprise position locator and ridge on the lid can removing, thereby avoid shifting and the masterplate sliding friction.But the installation of lid and remove and to produce friction.Similarly, also can cause the formation of particle like the vibration in transfer system.Therefore considered when the embodiment of embodiment of the present invention that these particles produce the difference of reason.

Except the generation of particle, in design during etching system, also need consider the sedimentation of particle, use and to remove panel and reduced particle and in all, all be deposited in the chance on the masterplate in embodiments of the invention, certainly except exposure process.Significantly particles settling took place in the time outside exposure, therefore used the panel removed of embodiment of the present invention, even also can protect masterplate particles settling can not take place significantly when in step of exposure, removing lid.

At last, must consider that also particle moves, the particle migration occurs in quick acting and rapid pressure changes in the turbulent process that causes.In the EUV system, a lot of moving is to occur in the high vacuum.Therefore be minimum for example from the turbulent flow of storehouse frame to the moving process of projection bearing.But owing to have pressure to change, so must pay attention in this turbulent source.Therefore according to embodiment of the present invention, through use be installed in masterplate on the panel removed that is connected of framework, eliminated this extra particle basically and moved the source.

Two-piece cover is intended kinematic location with it

Fig. 1 representes to comprise the exploded view of the system 100 of two-piece cover (cover) 102 according to an embodiment of the invention.Two-piece cover 102 comprises a framework 2, and this framework 2 supports a masterplate 1 in the process of carrying, and in the process of exposure, keeps in touch with masterplate 1 and a platform 7.Framework 2 comprises an opening 14 bigger than the place (field) of masterplate (reticle) 1, passes opening 14 in exposure process, to allow actinic light.Framework 2 also comprises a coupling arrangement 8, and it is corresponding to the coupling arrangement 9 that is connected to platform (stage) 7.Therefore, coupling arrangement 8 makes framework 2 to be remained on the platform 7 by coupling arrangement 9.

This embodiment also comprises panel 3, and it just separated before photolithographic exposure with framework 2 mutually, after photolithographic exposure, was connected to framework 2 at once again.Panel 3 can be processed by the material to visible transparent, thereby can visual check and the front side of discerning masterplate 1.

As shown in the figure, coupling arrangement 8 and 9 is between platform 7 and the framework 2, and between framework 2 and panel 3.As shown in the figure, can comprise that between platform 7 and framework 2 accessory is to 5a and 5b.Accessory can be " (between pieces) between two " to 5a and 5b, and this can know according at least a technology described herein like these those skilled in the art, and is optional from magnet on each sheet and magnetic target respectively; Machanical fastener, for example breech lock that spring is housed on a sheet or bistable latch and the supporting tab on another sheet; And gravity dependence device, for example lean on accessory the propping up on the sheet that be positioned on the supporting accessory on another sheet.

According to embodiment of the present invention; Coupling arrangement 8 and/or 9 can have following design criteria; Include but not limited to: a) coupling arrangement 8 and/or 9 can be dismantled through two-piece cover 102 outside devices; This device can be positioned at masterplate 1 is carried on the automatic manipulator robot 4 on the platform 7, perhaps in platform 7, and/or; B) coupling arrangement 8 and/or 9 release should produce minimum contamination particle with being connected again, thereby avoid polluting masterplate 1 (for this reason, preferably using contactless device to actuate coupling arrangement 8 and/or 9), and/or; C) coupling arrangement 8 and/or 9 should be a self-supporting, thereby in case coupling arrangement 8 and/or 9 has been begun to connect, then need not apply external influence these parts are kept together.

In one embodiment, manipulator robot 4 can be used to push two or more breech locks that spring is housed automatically, thereby discharges these parts.

In another embodiment, the electromagnet in the platform 7 can be used for interacting with the permanent magnet of breech lock, thereby makes them separately.

In another embodiment, the electromagnet in the automatic manipulator robot 4 discharges panel 3 through permanent magnet and the magnetic attraction between the target that overcomes on two parts that are in lid 102 respectively.Similarly, the electromagnet in the platform 7 should be by temporary transient energy supply to overcome the permanent magnet that lays respectively at framework 102 and platform 7 and the magnetic attraction between the magnetic target.

Many other embodiments also are feasible, include but not limited to, the scrambling transformation of connection fittings and combination and releasing means are in mechanical arm rather than in the platform location, and perhaps vice versa.These all scrambling transformations and combination are all within scope of the present invention.

Continuation can utilize gravity that masterplate 1, framework 2 and panel 3 are kept together in the variation of above-mentioned embodiment with reference to figure 1.Specifically, manipulator robot 4 can support panel 3 automatically, and framework 2 can be put and lean against on the panel 3, and masterplate 1 can lean against in the framework 2.Corresponding accessory can be aimed at framework 2 5a and 5b with panel 3, and corresponding accessory can be aimed at panel 3 6a and 6b with automatic manipulator robot 4.

In various embodiments, accessory can be selected from 5a and 5b and 6a and 6b: kinematic mount (for example having the ball in groove or conical base), and the double pointed nail in hole and the slit, and a part is nested in another part.Thereby the device that is used to provide energy to make framework 2 keep the location with respect to platform 7 and discharges from platform 7 can be positioned at platform 7, and is as shown in Figure 1, perhaps is built in the automatic manipulator robot 4.

According to another embodiment of the invention, the two or more mechanical latches 9 that have spring that are positioned at platform 7 can be used for framework 2 is remained on the platform 7 through utilizing tongue piece 8, shown in Fig. 2 and 3, and are described below.

In another embodiment, for example through utilizing the solenoid 11 instantaneous electromagnetic forces that apply be connected with platform 7 to overcome the closing force that spring 10 is applied, the breech lock that bounces back thus and can process by magnetic material, thus can realize the release of breech lock.

Accessory can be placed on the bottom side and other surface of panel 3 14a and 14b, and this surface must be placed with system 100 (for example masterplate/assembly of lid).For example, on the frame of vacuum storehouse and be expressed as 13 and hereinafter with SMIF (SMIF) the gondola substrate of describing in detail on.

Fig. 2 representes the state according to one embodiment of the invention masterplate 1 and lid 102.Therefore the automatic manipulator robot 4 of STA representation utilization shown in Figure 2 is carried in framework 2 and panel 3 on the platform 7.In one embodiment, this state is to be disconnected the state that energy and breech lock 9 have been caught tongue piece 8 at solenoid 11.In this state, framework 2 is fixed in position.This state can be before the automatic manipulator robot 4 of retraction.

Fig. 3 representes the state according to the system 100 of embodiment of the present invention.In this state, bounce back in automatic manipulator robot 4 (not showing among Fig. 3), take away panel 3 (not showing among Fig. 3) afterwards, masterplate 1 and framework 2 are only supported by platform 7.In some embodiments, can carry out photolithographic exposure through opening 14 this moment.

Automatically the embodiment of manipulator robot 4 maintenance frameworks 2 rather than panel 3 is simpler, is preferred with respect to other embodiments therefore.This is because adopted gravity that panel 3 and framework 2 are kept together., framework 2 needs moving down of automatic manipulator robot 4 after being caught by platform 7 for pull down 3 basic of panels from framework 2.

Interchangeable embodiment can also be convenient to masterplate 1 is aimed at platform 7, below uses description to the method for aiming at.

State like other place of this paper, masterplate 1 should be placed and be oriented to wafer consistent.This guaranteed basically current from reticle pattern copy on the wafer circuit layer can with the layer that pre-existed on the wafer to directly.

In the following several embodiments that will describe in detail, masterplate 1 can be sent to etching system (or " lithography tool ") in container (for example gondola), and the part of this container can be expressed as 13.Gondola (pod) can comprise the framework that is supporting masterplate 1 and in transport process, make the panel of contamination particle away from masterplate 1.In these embodiments, the bottom side of pod framework can have with lithography tool in the supporting corresponding catch fitting of catch fitting, thereby the SMIF gondola is well-determined with respect to the orientation of lithography tool.

With reference to figure 1, through propping up by point and being built in backstop apparatus in the framework 2 and the combination that is built in the spring in the panel 3, masterplate 1 can remain on the appropriate location on framework 2 top side regularly.Because masterplate 1 can be the square of putting down, and do not have specific catch fitting, therefore can have 8 kinds of methods with its be assemblied in lean on point, backstop apparatus and spring formed nested in.

When being carried in masterplate 1 in the gondola, taking every caution against error masterplate 1 is placed as makes its side that has pattern to needed direction (for example right side upwards), and the orientation with respect to gondola (for example 90 degree) that needs is arranged.For example, the top of pattern can be towards the front side of gondola.When the masterplate gondola is placed in the lithography tool, can know position and the orientation of masterplate 1 then with respect to lithography tool.Usually, position (X, Y) the uncertain order of magnitude, the uncertain order of magnitude of angular orientation (θ z) at about 1 degree at about 1mm (millimeter).But this accuracy is not enough for present photoetching.Must the uncertainty of position be reduced to several microns, the uncertainty of orientation must be less than 1 arcsecond.

Therefore, according to embodiment of the present invention, lithography tool can be equipped with prealigner.This prealigner is through checking the target on the reticle pattern and masterplate moved proofreading and correct its position and orientation as required, thereby the pattern in the masterplate 1 is accurately located with respect to lithography tool and aimed at.The transfer device of aut.eq. 4 or other any special uses is transferred to prealigner with masterplate 1 from framework 2 usually, and is transferred to platform 7 from prealigner.Being transferred to platform 7 from prealigner must be very accurately, because any positioning error that transfer device brought can reduce the layout degree of accuracy of masterplate 1 on platform 7.Therefore for masterplate 1 is transferred to the committed step of platform 7 from prealigner, should use very accurately and repeatably aut.eq. or transfer device.

The aut.eq. that accurately moves can be positioned at the printing platform of etching system, and this etching system is applicable to deep ultraviolet (DUV) photoetching.But this can not be used for the EUV photoetching, because the EUV process must be carried out under vacuum.This is because EUV light is absorbed under normal pressure fully as stated.Therefore must use the aut.eq. that is applicable to vacuum.Because motor and electronic equipment produce heat and decontaminate thing gas, and these are difficult to remove in a vacuum very much, therefore are applicable to that the aut.eq. of vacuum is designed to make its motor and electronic equipment to be in outside the vacuum chamber.In vacuum chamber, use long mechanical linkage which controls that action is transferred on the object that will be processed.This configuration is cleaned, and can in the chamber, not produce heat, but owing to have move freely (play) of suitable length, low rigidity and link gear, therefore can have intrinsic accurate positioning property and repeatable bad problem.Therefore, obtainable vacuum aut.eq. is not enough for carrying out this committed step that masterplate is transferred to platform from prealigner.Very clear, need a kind of replacement method, make that the accuracy of aut.eq. and repeatability are desirable.

Fig. 4 representes the embodiment of system 100, and wherein panel 3 can be used for locating exactly and repeatably in last transfer, allows to use clearer and necessary coarse aut.eq. thus.Through panel 3 is docked to prealigner with moving, can obtain the accurate position of panel 3 with respect to prealigner.The V groove 15a of bottom is meshed with the pin 15b at the tip of circle, and this pin 15b is arranged in prealigner in one embodiment.The hemisphere 6a of bottom can be similar to most advanced and sophisticated pin 15b, and top V groove 16b can be similar to V groove 15a.Using the pin 15b and the 16a at the tip of V groove 15a and 16b and circle is known so that object of which movement is docked, and also exists other known same effectively motion butt joints (kinematic dock) and designs.The invention is not restricted to use the pin at the V groove and the tip of circle, but can carry out according to all known motion butt joint designs in principle.

Automatically manipulator robot 4 grasps panel/framework/masterplate assembly then, and it is moved to just under platform 7.Similarly, when mechanical arm with panel/framework/when the masterplate assembly moves up, can obtain the accurate movement position of panel 3 through the top V groove 16b in the panel 3 and the hemisphere 16a in the platform 7 are meshed together with respect to platform 7.Panel 3 that moved with platform 7 engagements after, can give breech lock 9 and electrostatic chuck 17 energy supplies, clamp framework 2 through tongue piece 8 respectively and masterplate 1 drawn and lean against on the platform 7.Automatically manipulator robot 4 can move down panel 3 then, and platform 7 is left in its withdrawal.

The build-in attribute of the butt joint of motion is that they can repeat within several microns, and only needing aligning originally is within the capture range (capture range) at supporting accessory.For example, each hemisphere 16a must be to make each hemisphere 16a originally contact any part of respective groove 16b with the aligning of each top V groove 16b.If satisfy this condition, irrelevant with misalignment originally so, can obtain same last relative position.Capture range depends on the size of supporting accessory.For example, use the accessory size shown in Fig. 1-4, obtain the capture range of pact ± 1mm easily.Because this scope can realize desirable functional decoupling greater than the general repetitive error of vacuum aut.eq..When panel 3 meshes with platform 7 motion ground; Automatically manipulator robot 4 must be comply with in (X; Y) plane, thus be unlikely to the movement locus that automatic manipulator robot 4 is set up force motion to connecting, but make the interaction of joint fitting limit last track.Sizable length, low rigidity, and the moving freely of mechanical arm link gear can provide required a small amount of compliance.

As stated, embodiment of the present invention utilization has accuracy and has solved the problems that framework 2 is accurately shifted to platform 7 from prealigner with repeatable aut.eq..Outside effectively shifting, from masterplate 1 extracted from prealigner the time be carved into chuck 17 by the moment of energy supply, masterplate 1 must definite remaining on the identical position for panel 3.A method guaranteeing this point is that masterplate 1 is assemblied in the framework 2 closely, and the catch fitting 5b that framework catch fitting 5a is corresponding with them has very little gap.But this possibly not be optimal expection situation, because the part of close fit is easy to generate many particles when drawing back.Fortunately, in most of embodiment of the present invention, possibly not need to assemble closely, because the friction between the part is enough to they are kept in position each other.

Because with the relevant difficulty of motor in the vacuum; And, suction in vacuo can't work because grasping; The aut.eq. that is applicable to vacuum can be designed as its acceleration and slows down just slowly to being enough to allow use simple passive anchor clamps (passive gripper), and this anchor clamps can only remain on wafer on 3 pins through gravity and friction force.Vacuum aut.eq. manufacturer provides and has had basically no the simple anchor clamps that slide and use.

Therefore, we have laid particular emphasis on last transfer accuracy problem.Other embodiments of the present invention demonstrate lid 2 and how to be beneficial to masterplate 1 and platform 7 are aligned.Usually as stated, the masterplate that enters in the instrument of gondola can have the misorientation that the positioning error and about 1 of about 1mm is spent with respect to panel.These errors can be reduced to several microns and less than about 1 arcsecond.In order to realize this point, prealigner is aimed at relative between masterplate 1 and the panel 3 and to measure and proofread and correct be enough in the location, because the docking of motion of panel and platform is very accurately.Preferably, masterplate 1 is not taken off and aims at once more from framework 2, thereby on any one reticle surface, can not produce any particle.

In various embodiments, use two-piece cover 102 to simplify the method that masterplate 1 is aimed at panel 3.Aut.eq. is delivered to prealigner with panel/framework/masterplate assembly, and this prealigner is equipped with the terminal pin 15b of a cover circle.Therefore pass through V groove 15a and the terminal pin 15b engagement of circle with the bottom, this assembly docks with prealigner with moving.Therefore panel 3 is with respect to accurate aligning of prealigner and location.In order masterplate 1 to be carried out accurate localization with panel 3 and to aim at, needed only is that it is positioned and aim at respect to prealigner thus.For this reason, at first want measuring error, then correction error.

According to one embodiment of the invention; A kind of method of measuring error is to adopt the vision system of video camera to prealigner equipment, this system can measure in reticle pattern target be permanently secured to prealigner and and the target calibrated mutually of the pin of circle end between angle and site error.Because this pattern is positioned on the bottom side of masterplate 1, video camera must be had an X-rayed panel 3, and this panel should be transparent under the operative wavelength of video camera.Also there are some known additive methods to measure, the invention is not restricted to use a video camera and a cover target position and angular error.

In one embodiment, in order to proofread and correct position and the angular orientation of masterplate 1 with respect to prealigner, prealigner can be equipped has X, Y, the precision executor of Z and θ z degree of freedom.This prealigner can have can be through engagement tongue piece 8 with the mechanical arm of framework 2 from following lifting.The precision executor will at first just promote framework/masterplate and leave panel 3, carry out X then, and Y and θ z proofread and correct, and framework/masterplate reduced get back on the panel 3 again.At this moment, masterplate 1 is aimed at respect to panel 3, and prepares to be transferred to platform 7.Framework 2 reorientated with respect to panel 3 need between catch fitting 5a and 5b, have fully big gap.

Be appreciated that therefore various accessories are to providing pinpoint accuracy owing to known that the vacuum aut.eq. can shift object and can not slide.In addition, various accessories are to being that safe accessory is right, to prevent and can cause taking place under the unexpected situation that stops of aut.eq. serious accidental slide by collision or electric power failure.Under the sort of situation, can lose accurate aligning, but various accessories prevent that to meeting masterplate 1 from coming off from automatic manipulator robot 4.

At last, in (for example along Y axle scanning) the scanning photoetching system implementation scheme that is used for having a long scope degree of freedom, prealigner maybe along with the corresponding to degree of freedom correction position of the scan axis of platform 7 error.Only need the measuring position error, and it is notified to platform controller, this controller passes through corresponding skew platform Y position in scanning process and the compensated position error then.

Therefore, in each embodiment, various accessories are to the precision executor in the prealigner that can cause only having a horizontal translation degree of freedom, and this degree of freedom is directions X in an embodiment, and Z and θ z direction need too.Therefore, the design of the precision executor in prealigner can be simplified to the scanning photoetching instrument.

Fig. 5 representes to describe the process flow diagram of the method 500 of embodiment of the present invention.Method 500 can be to utilize the aligning and the transfer method of two-piece cover.In step 501, with first in panel cover accessory to and prealigner in respective accessory right, panel/framework/masterplate assembly can be docked to prealigner passive movement.In step 502, measure position and the angular deflection of masterplate with respect to prealigner.In step 503, control frame is to proofread and correct the skew of measuring, and it is reorientated masterplate with respect to panel.In step 504, panel/framework/masterplate assembly is taken from prealigner.In step 505, panel/framework/masterplate assembly is moved into the platform loads position, does not almost slide relatively.In step 506, utilize second in panel cover accessory to and platform in respective accessory right, be docked to platform panel/framework/masterplate assembly passive movement.In step 507, masterplate and framework fix with the clamping device (for example being respectively electrostatic chuck and mechanical latches) that is built in the platform.In step 508, remove panel and expose masterplate.

As previously mentioned, when in the EUV instrument, handling and aiming at masterplate, embodiment of the present invention are used for reducing significantly the generation of particle contamination.In traditional system; Do not use lid, when masterplate being removed/being reapposed in this SMIF gondola each time, in the storehouse that at every turn places it in the vacuum or when wherein removing from the SMIF gondola; With its loading with when being discharged in the platform place, all form/broken the masterplate contact at every turn.

According to embodiment of the present invention, as above be described below, can traditional system be improved through using two-piece cover.Contact between masterplate and the framework can not broken again, contacts because framework remains with masterplate, even be like this in exposure process yet.The number of times of having imagined the formation of the direct basis of numbers of particles that when handling masterplate, produces on the surface of masterplate and the Mechanical Contact of reticle surface/break changes.Through eliminating in lithography tool the needs that contact that form/break with masterplate fully; With directly carry masterplate through mechanical arm and compare; Two-piece cover has had tangible improvement with respect to the single type lid of being instructed in traditional method, and traditional method only is to have reduced the quantity that the particle directly related with reticle surface produces incident.

The two-piece cover of the embodiment of the present invention also can use and be used for the flexible material that contacts with masterplate, and needn't take the durability of this flexible material too much into account, because avoided the abrasive action that repeats in principle.Utilize selected flexible material to estimate to reduce and be placed on surface distress and particle generation in the process of framework at first at masterplate.The for example soft polymkeric substance of soft material can be easy to flow, from but conform to and can not scratch the exquisite polished surface of masterplate.

On the contrary, not using two-piece cover and directly utilizing in the legacy system of automatic manipulator robot carrying masterplate, need on the contact point of mechanical arm, hard material be arranged so that mechanical arm has acceptable durability.The best hardness of the contact point of single type lid is got intermediate value, because also have some contact incidents, but is not a lot.But the two-piece cover of the embodiment of the application of the invention makes when precision is unacceptable when deforming, and can change.

The two-piece cover of embodiment of the present invention also is easy to masterplate and platform prealignment.Even utilize the aut.eq. of low precision like this, can realize accurately last transfer the from the prealigner to the platform.

Two-piece cover of the present invention keeps clean than automatic manipulator robot is easier.And the automatic manipulator robot that is arranged in lithography tool depths and vacuum need get into the maintenance of formula, thus at every turn with masterplate from lithography tool be hit by a bullet out cleaning or change lid and will make things convenient for manyly.

The present invention is described the exemplary photoetching environment that utilizes the SMIF gondola.Such description just for convenience's sake.Rather than to limit the present invention in these exemplary environment.In fact, after the description below having read, how those skilled in the relevant art are appreciated that embodiment of the present invention in the replacement environment of existing known and future development.

Therefore, according to embodiment of the present invention, use a kind of system and method to intend kinematics ground masterplate is aimed at the protection lid.Can and be transferred to the accurate relative position relation of keeping masterplate in the masterplate platform in the prealignment measurement like this, avoid thus masterplate is carried out mechanical positioning again in masterplate prealignment process in lithography tool.The second, the present invention has disclosed a kind of method of the masterplate contact area that hardens, thus masterplate with produce less particle when lid contacts.

Fig. 6 representes the two-piece cover 102 of embodiment of the present invention.Masterplate 1 has can the accurate edge of aiming at 601 with the align fittings in the framework 2.In one embodiment, be that the part of contact movement align fittings 602 is carried out chamfering at least in the edge 601 of masterplate 1.In another embodiment, this part at the edge 601 of masterplate 1 becomes fillet rather than inclined-plane.In another embodiment; Intersection point in the improvement marginal portion of masterplate 1 edge produces spherical or annular (toroid) sector (spherical or annular 1/8th) in each corner, the align fittings applicatory 602 in each corner of it and framework 2 is passed through interface then.The user can select this improved masterplate edge 601 which partly to be contacted, and which part is not contacted.

About the align fittings in the framework 2 602, its position is not limited to the corner of framework as shown in Figure 6.But in preferred embodiments, this possibly be a preferred positions.For example, framework 2 can have align fittings 602 at the middle part of each side.Obviously, the true form of align fittings 602 can be different, with the best masterplate edge 601 that holds.For example, in one embodiment, align fittings 602 can be a V-shaped groove, and each face 603 of groove 602 is put down.This specific shape is suitable for being contained in the fillet at masterplate edge 601.Be appreciated that in other embodiments if masterplate edge 601 is chamferings, they are preferably held by the spill in the align fittings 602 (rather than flat) flute surfaces.

According to one embodiment of the invention, use align fittings 602 can omit the step 503 among Fig. 5.This is very favorable, because can need quite complicated prealignment mechanism to come control frame 2.Through having eliminated the needs that framework 2 is reorientated with respect to panel 3, simplified the design of lithography tool.

Fig. 7 representes the system 100 of one embodiment of the invention.Framework 2 can keep masterplate 1, and through the align fittings of the first cover motion 201a and 201b is aimed at panel 3 with moving.Similarly, panel 3 can be aimed at automatic manipulator robot 4 202a and 202b through the align fittings of the second cover motion with moving.In addition, can use the 3rd cover motion align fittings that 203a and 203b are aimed at panel 3 and vacuum storehouse frame and total being moved by the 13 SMIF gondola substrates represented.

In the embodiment depicted in fig. 7, the shared same groove of motion accessory 202a and 203b, 202a is connected to 202b in the inside of groove through the interface, and 203a is connected to 203b at the outermost of groove through the interface.For a person skilled in the art, clearly this relative position can be put upside down.Obviously, the groove that separates is used to realize each of motion accessory.

In another embodiment, can use the single type lid.In this embodiment, framework 2 can be fixed in (for example bonding is perhaps processed by same block of material) panel 3, to form the single type lid.This single type lid all is removed, to carry out the photolithographic exposure of masterplate 1.Therefore, in the embodiment of this single type lid, possibly not need accessory to 201a and 201b.

The masterplate of sclerosis

Know that the characteristics of the EUV reflectance coating of masterplate 1 are rapid wear and softness.Therefore, this coating is easy to produce particle when contact.Therefore it is desirable to have the specific region of a no EUV reflectance coating.It can be used for supporting or transmit masterplate 1 by its reflection side.For this reason, harder backing material will become just " exposure " surface that is uncovered.Regrettably, in fact produce one make exposed masterplate substrate area exposed (bare spot just) be very the difficulty.A kind of known method that produces bare spot is to use their mask of particle beams sputter procedure covering at deposition EUV reflectance coating.A problem of this method is because the character of deposition process is easy on mask, form loose granule or thin slice, and when this process finishes to remove mask, can come off, and some particles or thin slice can drop on the masterplate and with its pollution.Another method that exposes the zone of substrate is a selective etch EUV reflectance coating from the zone that is designed for transmission, and the problem of this method is that this etching process also is easy to damage other zone of masterplate.

Seem only through using the edge one-tenth fillet or chamfering described in this instructions just can solve the problem that supports masterplate.But it is not in fact like this; Because the fragility of EUV reflectance coating has determined blank substrate before being applied, must be processed into last shape in its edge; And because uniform, the nonselective covering of the sputter procedure of deposited coatings, not concealed chamfering perhaps becomes the edge of fillet also can be coated with crisp material.

In order to address the above problem, proposed with harder material coating EUV reflecting material.To the common selection of this material is to be deposited on the EUV reflecting material top and thereby the etching of being selected property produces the EUV restraining barrier of perhaps " writing " reticle pattern.Regrettably, in order to have correct optical characteristics, this layer must be extremely thin.Break under the high-level stress of mechanical handing contact easily in thin restraining barrier on the soft reflecting material top.Can on the top, restraining barrier, add a thick-layer and it is carried out selective etch, but cost an arm and a leg and also confirm without overtesting.

Therefore, need a kind of intrinsic flexibility and the fragility that can remedy reflectance coating, will not remove the process that coating produces bare spot and need not cover perhaps.Also need a kind of method that in selected contact area, does not need bare spot also need not cover the supplementary protection layer.

There is guess to think that the intrinsic flexibility of EUV reflectance coating is because its multilayer character.Such as this field knowledge, EUV reflection horizon " sandwich construction " up to now or simply be expressed as the alternating layer that " multilayer " can comprise about 100 molybdenums and silicon, each composition several nanometer thickness layer are only arranged.No matter be that silicon or molybdenum are not soft material usually.Therefore, according to embodiment of the present invention, these materials can partial melting at desirable contact point place together, change the alloy material layer of harder even matter into sandwich construction with softness.Only for convenience's sake, our process that changes the multilayer part into harder material is referred to as " local heat treatmet ".

In some embodiments, do not need to melt fully this multilayer, to obtain desirable hardness.This is because know that every kind of material that thermal conductance causes in the multilayer is diffused in the another kind fast, forms the more layer of homogeneous thus.Even the temperature that is lower than any fusing point in the composition of multilayer in temperature also can this thing happens.Therefore, obviously, also can adopt local heat treatmet, change multilayer into spare matter layer to replace melting through mutual diffusion.

In other embodiments, deposition and the diffusion of foreign matter on layer can be used for strengthening this layer.Therefore, to there being the contact area of foreign matter.For making this material add the spot heating that this layer carries out, as heat treatment process.

Fig. 8 representes the process flow diagram of the method 800 of embodiment of the present invention.Method 800 can be used for carrying out the zone that is used to carry that local transitions is strengthened masterplate through the EUV reflectance coating with sandwich construction.In step 802, carry out reflecting the operation of sandwich construction (molybdenum-silicon or molybdenum-ruthenium-silicon multilayer is like state in the prior art) coating masterplate substrate with EUV.In step 804, local thermal treatment is carried out in the zone that be used to carry, thereby partly changed the local heat treatmet of sandwich construction the material of into stronger (more firmly, firmer).

In one embodiment, can carry out step 804 through for example having the chemical substance that comprises reactive reagent and catalyzer to exist under the situation high-power laser beam focused in the specific region of masterplate.Can use the other types emittance to replace laser beam.Can use other spot heating methods, for example utilize the induction type heating of radio frequency electromagnetic field.

The low heat conductivity of typical EUV masterplate backing material and sandwich construction self is convenient to specially desired zone to be carried out local multilayer and is changed.Can carry out this point, and need not too worry masterplate have the pattern on-site or near unconscious this EUV reflecting material that changed.This sandwich construction should remain intact, to keep its unique optical property.The edge that contact area is arranged on masterplate 1 according to suggestion in this manual makes the distance of their this figuratum places of distance maximize, and therefore makes as far as the heat treated influence of contact portion of Regional Bureau the most negligible for the optical signature of the figuratum place of paying close attention to of masterplate.

Basic flat masterplate lid

The masterplate lid (reticle cover) of Fig. 9-11 expression embodiment of the present invention is 902.Masterplate lid 902 in that predetermined instant can be removed is protected masterplates (for example mask (mask)) 901.902 pairs of certain optical wavelength of masterplate lid can be transparent, and it comprises: supporting pad perhaps fills up Figure 90 3; Nested pin 904; Kinematic location (for example mask alignment device) 905; And hole 906.Hole 906 can be used between lid 902 and masterplate 901, injecting the gas-pressurized cleaning, and this hole can also comprise air strainer.Can use various materials to make pad 903 and pin 904, so that they can not damage masterplate 901 or give out particle in contact or when breaking away from masterplate 901.Because between masterplate 901 and nested pin 904, possibly need some gaps to remove lid 902, masterplate can have a spot of slip with respect to lid 902.Improvement to above-mentioned embodiment is that this lid 902 is put down basically.Through adopting basic flat design, in cleaning course, can retain liquid still less because do not have can retain liquid bag or cave, chamber.Therefore, lid 902 is to clean easily or " (superclean) of ultra-clean ".In certain embodiments, in the pond, lid 902 ultrasound wave cleanings, rinsing and spin drying are cleaned.Therefore, because himself structural reason and to be difficult to very much cleaning opposite, lid 902 is very easy to cleaning with the complicated lid of tradition.

The masterplate box of dual jacket (for example masterplate gondola)

Figure 12-13 representes the masterplate box (reticle box) of embodiment of the present invention or the side view and the exploded view of gondola (pod) 1250 (following be called " gondola ") respectively.Figure 17 has shown more characteristics of exemplary gondola 1250, below will describe in detail.Gondola 1250 comprise can be airtight outer box 1252, this outer box has a base portion 1254, base portion 1254 be fixed to lid or cover 1256 its can be fixing through the breech lock (not shown).Plate 1258 is similar to top lid 902, can put down basically, does not have hole or cave, chamber, has reduced the generation of particle like this, and it is easier to make plate 1258 cleanings get up.And, because do not need screw etc., so the particle that produces is still less.Can use granule sealed device 1260 (for example inner or first jacket) to protect masterplate to avoid the particle infringement; And can make and be somebody's turn to do outer box 1252 hermetic seals that it is protecting inner or first jacket 1263 does not receive molecular contamination by using gases packoff 1262 (for example outside or second jacket).When gondola 1250 sealings, granule sealed device 1260 is engagement before gas-tight sealing 1262, and when gondola 1250 is opened, after gas-tight sealing 1262, unties.This and traditional to lack gas-tight sealing (because not using vacuum) opposite with the system of granule sealed device.

Outer box 1252 internal fixation have ventilative interior bellows 1263, and it is used to prevent particle contamination, and have dismountable part so that clean.Interior bellows 1263 comprises dome 1264 (for example

glass dome), and it can have the thin-walled (for example 2mm) with plate 1266 (for example being processed or be coated with polyimide, ESD level polyetherimide etc. by polyimide, ESD level polyetherimide etc.) coupling.Masterplate 1 and masterplate lid 102 (for example processing) by

glass etc. be arranged on can be with automatic manipulator robot (not shown) interactional in the bellows 1263.Can operative installations 1268 (for example spring etc.) dome 1263 is coupled to cover 1256, and inwardly bellows 1263 applies and keep-ups pressure, and masterplate 1 can not moved in transmission course.Also can press granule sealed device 1260.The surface 1302 of masterplate 1 can be glass, chromium plating (for example Cr plating) or utilize other durable material plating.In use, the lid of gondola 1250 or cover 1256 and can remove with the masterplate 1 of taking.The passage 1304 that filters can link to each other the space that is included between dome 1264 and the plate 1266 with other spaces in being included in gondola 1250, allow gas between two spaces, to flow, and still prevents particle flow.The example of the passage 1304 that filters can be the hole that the wall that passes dome 1264 is coated with film gas filtrator etc.Another example can be to pass the hole that plate 1258 is plugged with the powdered-metal gas filter etc. of sintering.Be appreciated that the position and the filtration unit that can use other, known like this field.Alignment device 1306 can have the surface in contact of polyimide coated.

The above-mentioned examples material that is used to make gondola 1250 each several parts has reduced the generation of particle.Be appreciated that these materials are preferred example, can use other known materials.

Gondola 1250 can divide two stages to open, and described in detail about system's operation technique as following.At first, the height that cover 1256 raises and is scheduled to is to break gas-tight sealing 1262 formed air seals.Make gas flow in the gondola 1250 like this, and particle is along with gas is transmitted.But particle can directly not arrive masterplate 1.

Gas flow balances each other pressure in the dome 1264 and extraneous pressure through the passage 1304 of this filtration.The second because cover 1256 can be continuous rise, dome 1264 can raise and leave plate 1266.Pressure in abovementioned steps in the dome 1264 with the ambient pressure balance after, when dome 1264 rise when leaving dome 1264 in or outside do not have the mobile of tangible gas or particle.In these embodiments, dome 1264, plate 1266 or the two are all breathed freely, and just their allow gas flow to produce pressure differential to avoid dome 1264 between inside and outside.

Loadlock (load lock)

Figure 14-15 representes the side view and the decomposition view of the loadlock of embodiment of the present invention respectively.In one embodiment, masterplate 1401 (can on the top of supporting pin 1404) and masterplate lid 1402 are arranged between base portion 1403 and the dome 1405.Dome is removed device (for example dome lifting device) 1406 and is comprised motor 1407, lead screw 1408 and corrugated tube (bellow) 1409.Loadlock also comprises the opening 1410 that is used for the atmospheric side and the inlet side family of power and influence.All above-mentioned parts all are arranged in bottom (for example vacuum shell) 1411 and top (for example vacuum shell top) the 1412 formed big envelopes.Loadlock also can comprise basic sealed base and/or the granule sealed device consistent with the openend of gondola dome, is used to prevent that particle from flowing between dome and base.Loadlock can comprise that also the passage 1413 of filtration (for example passes the hole of domed wall; And be coated with the film gas filtrator); It balances each other interior gaseous tension of dome and the outer gaseous tension of dome, also comprises the device (for example sensor or detecting device) that is used to detect interior air delivery of loadlock (airborne) or gas delivery (the following air that all is called delivers) particle.

Usually, loadlock is very dirty, mainly is because seal with due to the family of power and influence who loadlock is found time or ventilate.Seal at every turn or during opening encapsulation, produced the particle of air delivery or gas delivery.And the family of power and influence is the complicated mechanical assembly, has many parts and lubricants of moving, wear and tear and rubbing of causing.Cause dirt to be collected at the inside of loadlock like this.In the ventilation process of loadlock, gas flows into loadlock and its pressure and atmospheric pressure is balanced each other, and causes particle to produce motion.And when finding time loadlock, gas flows out loadlock, has caused flowing of particle.Therefore, according to embodiment of the present invention, through masterplate being encapsulated in dome and the plate, the protection masterplate is not injured by particle.

The masterplate Handling device

Figure 16-17 representes the masterplate carrying core (reticle handlercore) 1701 and masterplate handling system of embodiment of the present invention respectively.The masterplate handling system comprises: core environment (for example vacuum and microenvironment) and atmosphere (air) environment.The core environment is positioned at masterplate carrying core 1701 basically.With reference to Figure 16, masterplate carrying core 1701 is included in the masterplate 1601 in the vacuum chamber 1602.Masterplate 1601 moves through vacuum chamber 1602 through the vacuum aut.eq. 1603 that can have two arms.Masterplate core 1701 is also included within the family of power and influence 1604 between vacuum chamber 1602 and the processing cavity.Masterplate core 1701 also comprises the loadlock 1605 with loadlock turbopump 1606 and loadlock family of power and influence 1607.Masterplate core 1701 also comprise open gondola 1609 take off gondola device (depodder) 1608.Loadlock is connected to clean air microenvironment chamber 1610 with the opening that takes off in the gondola device, and can pass in and out through microenvironment aut.eq. 1611.

In operating process, from the gondola of opening 1609, remove masterplate (cannot see among this figure) through microenvironment aut.eq. 1611.This masterplate is placed in the loadlock 1605 through the family of power and influence (gate valve) 1607 then.The loadlock of finding time utilizes vacuum aut.eq. 1603 that masterplate is removed from loadlock.Utilize aut.eq. 1603 that vacuum chamber 1602 is passed through in masterplate 1601 transmission, and be placed in the processing cavity (not shown) through the family of power and influence 1604.After processing, vacuum aut.eq. 1603 is removed masterplate in processing cavity through the family of power and influence 1604, and is placed in the loadlock 1605 through the family of power and influence 1607.Then this loadlock is ventilated, masterplate 1601 passed loadlock 1605 from right to left before getting into microenvironment chamber 1610.Microenvironment chamber 1610 can be filled with the filtration and/or the dry gas (for example drying nitrogen) of cleaning.Microenvironment aut.eq. 1611 is removed masterplate from loadlock then, and is held in place and takes off opening in the gondola 1609 in the gondola device 1608.This takes off the gondola device and closes gondola then.

With reference to Figure 17, the masterplate handling system also comprises air or the atmospheric environment with the atmosphere aut.eq. 1702 that is used for mobile gondola 1703.Gondola 1703 can leave on the gondola storage rack, and is as shown in the figure.General using is shown as rod or the handle of crossing the gondola top and is utilized the each several part with various aut.eq. engagements of its shell to carry gondola 1703 by what the operator grasped.Be shown as and be in the conveyance plane that upper gondola lifter 1705 will be risen to aut.eq. 1702 by the gondola 1703 that the operator is placed on input position 1706.Perhaps, can send gondola 1703 to this instrument by the overhead track (not shown) that gondola 1703 is placed on the position 1707 that aut.eq. 1702 can directly arrive.Aut.eq. 1702 can with gondola 1703 on top lifter retainer 1712, gondola storage rack 1714, built on stilts position 1707 and/or take off between the gondola device 1609 and move.Take off in the gondola device 1609 in case gondola 1703 is placed on, masterplate carrying core 1701 is opened gondola 1703, and processes this masterplate 1601, as stated.Equally, after masterplate 1601 was processed, masterplate carrying core 1701 was placed on this masterplate in the gondola 1703 once more, and closes gondola 1703.Therefore, this is operated in masterplate is carried out the masterplate carrying core 1701 of gondola 1703 and divided between the Handling device atmosphere part of carrying gondola 1703.

This two sub-systems shifts the carrying to masterplate 1601 each other through taking off gondola device 1609.Masterplate carrying core 1701 can be described with reference to Figure 16, but can see also that in Figure 17 it is positioned under the atmosphere aut.eq. 1702.Confirm direction for the ease of the reader, pointed out vacuum chamber 1602, microenvironment chamber 1610, taken off gondola device 1609 and microenvironment aut.eq. 1611.In atmospheric environment and core environment, storage capacity is arranged all.

In some embodiments, the filtered air environment also can comprise the identification station, is used for reading: the ID mark of coding on gondola 1703 is connected to the intelligent label of gondola 1703 etc.

In some embodiments, the gas microenvironment can comprise: (a) identification station is used to read out in the ID mark of encoding on the mask; (b) heat adjustment station is used for making that the temperature of input mask and predetermined processing temperature balance each other; (c) mask inspection station is used to detect at least one the lip-deep pollutant at mask; (d) mask cleaning station is used for removing surface contaminant from least one surface of mask; And/or (e) mask Directing Station, be used for mask being carried out accurate orientation with respect to machinery.And in some embodiments, microenvironment purifies with being selected from following gas, comprising: the potpourri of the dry air of filtration, synthesis of air, drying nitrogen and dry oxygen and/or drying nitrogen or other gases.

In some embodiments, vacuum section comprises: (a) identification station is used to read out in the ID mark of encoding on the mask; (b) storehouse (library) is used at least one mask of temporary storage; (c) heat adjustment station is used for making that the temperature of input mask and predetermined processing temperature balance each other; (d) mask inspection station; (e) be used to detect at least one lip-deep pollutant at mask; (f) mask cleaning station is used for removing surface contaminant from least one surface of mask; (g) mask Directing Station is used for respect to machinery mask being carried out accurate orientation; And/or (h) processing station, be used to process at least one mask.In some embodiments, processing station is used to utilize light that the pattern photoetching on the mask surface is copied to the wafer that scribbles photoresist.In some embodiments, optical wavelength is corresponding to extreme ultraviolet (EUV) part of spectrum, between the 10-15 nanometer, preferably in 13 nanometers.

Method

Figure 18 representes to be used for according to embodiment of the present invention the process flow diagram of the method 1800 of transmission mask.In step 1802, the first of mask is covered with movable particle lid (particle cover).Form a temporary transient mask-cover means like this, it is protecting first not receive the particle contamination of air delivery.In step 1804, the second portion of mask stayed do not cover.In step 1806, this device is enclosed in the airtight box.This box can include mask bearing part and the cover that can separate with this mask bearing part, is used to protect mask not receive the molecular contamination of air delivery.In step 1806, the device in the transmission box.

Figure 19 representes the process flow diagram according to the method 1900 of embodiment of the present invention transmission, carrying and processing mask.In step 1902, the first of mask is covered with movable particle lid.Form a temporary transient mask-cover means like this, do not receive the particle contamination of air delivery with protection first.In step 1904, the second portion of mask stayed do not cover.In step 1906, this device is enclosed in the airtight box.This box can have mask bearing part and the cover that can separate with this mask bearing part, is used to protect mask not receive the molecular contamination of air delivery.

In step 1908, the box that will have this device is transferred to machining tool.This machining tool has at least one of following every kind of parts, comprising: take off gondola device, microenvironment chamber, microenvironment executor, loadlock, vacuum chamber, vacuum manipulator and mask bearing.In step 1910, the box that will include this device is placed on first opening that takes off the gondola device, makes the cover of box prevent that gas from passing through this first opening and flowing.In step 1912, purify the inside of taking off the gondola device with clean air.In step 1914, mask delivery part and cover are separately opened this box, keep covering on original position, be used for barrier gas and flow, mask delivery part is moved to the inside of taking off the gondola device with this device.In step 1916, utilize the microenvironment executor to take off gondola device opening and this device is drawn in the microenvironment chamber from taking off the gondola device, and this device is put into loadlock inside through the first loadlock opening through second.In step 1918, the loadlock of finding time.In step 1920, utilize vacuum manipulator that this device is extracted out from this loadlock through second loadlock, and this device is moved in the vacuum chamber.In step 1922, this device is placed on the mask bearing, make the unmasked portion of mask contact with bearing.In step 1924, utilize this bearing to keep this mask.In step 1926, utilize vacuum manipulator, lid and mask are separated, take or reorientate lid away.In step 1928, the processing mask.

Figure 20 representes to be used for mask is transferred to from atmospheric pressure in loadlock the process flow diagram of the method 2000 of vacuum.In step 2002, mask is placed in the loadlock.In step 2004, mask is covered with dome, arrive mask with the particle that prevents the air delivery in the loadlock.In step 2006, close loadlock.In step 2008, the loadlock of finding time.In step 2010, open loadlock to vacuum.In step 2012, withdrawal dome and make mask be uncovered.In step 2014, from loadlock, remove mask.

Figure 21 representes to be used for mask at the process flow diagram that is transferred to the method 2100 of atmospheric pressure from the loadlock vacuum.In step 2102, mask is placed in the loadlock.In step 2104, mask is covered with dome.This covering step 2014 is used for preventing that particle that loadlock becomes air delivery from arriving mask in subsequently ventilation and opening steps.In step 2106, close loadlock.In step 2108, loadlock is ventilated.In step 2110, the atmosphere end of loadlock is opened to atmospheric environment.In step 2112, the particles settling of air delivery.In step 2114, withdrawal dome and make mask be uncovered.In step 2116, from loadlock, remove mask.

Figure 22 representes to be used to transmit, carry and process the process flow diagram of the method 2200 of mask.In step 2202, mask is enclosed in the airtight box, this box has mask delivery part and can deliver the cover that part is separated with this mask, is used to protect mask can not receive the pollution of the molecule of air delivery.In step 2204, the box that will include this mask is sent to machining tool, and this instrument has at least a in following each parts: (a) take off the gondola device; (b) microenvironment chamber; (c) microenvironment executor; (d) loadlock; (e) vacuum chamber; (f) vacuum manipulator and mask bearing.In step 2206, the box that will include this mask is placed on first opening that takes off the gondola device, makes the cover of box prevent that gas from passing through this first opening and flowing.In step 2208, purify the inside of taking off the gondola device with clean air (for example drying nitrogen).In step 2210, mask delivery part and cover are separately opened this box, keep covering on original position, be used for barrier gas and flow, mask delivery part is moved to the inside of taking off the gondola device with this mask.In step 2212, utilize the microenvironment executor, take off gondola device opening and this mask is drawn in the microenvironment chamber from taking off the gondola device through second, and this mask is put into loadlock inside through the first loadlock opening.In step 2214, the loadlock of finding time.In step 2216, utilize vacuum manipulator that this mask is extracted out from this loadlock through the second loadlock opening, and this mask is moved in the vacuum chamber.In step 2218, this mask is placed on the mask bearing.In step 2220, the processing mask.

In a word, in above-mentioned several embodiments, masterplate faces three environment: gondola environment (for example purify dry gas microenvironment), take off gondola device to loadlock environment (for example vacuum) and from loadlock to chuck environment.In each environment transition, can masterplate be encapsulated.In some embodiments, use dual jacket gondola, comprising: open gondola, purify and take off the gondola device, wait for steady air current, open bellows, from bellows, extract masterplate and/or lid out through following steps.In other embodiments; Use the loadlock of the particular design have dome through following steps, comprising: masterplate and/or lid are placed in the loadlock, cover masterplate with dome; Ventilation is to purify loadlock; Wait for steady air current, the rising dome is extracted masterplate and/or lid out from loadlock.In other embodiment, through control air-flow in pressure transition or on the masterplate front side filtered airflow (curtain/block piece) and do not use the physical barriers part to prevent the particles settling on figuratum zone.In other embodiment; Utilize ventilative lid to adopt the physical barriers part that does not see through particle to protect masterplate, perhaps masterplate is covered with lid and is stored in the gondola, this masterplate and lid are placed in the loadlock; Be covered with lid and carry out pressure transition, remove lid in the time of in getting into vacuum environment.

Through adopting above-mentioned embodiment,, also can reduce the generation of particle even to each parts of various systems and system material of non-ideal use.This part is through using protectiveness framework, lid etc. and having used the edge treated strategy to realize.

Conclusion

Although below described each embodiment of the present invention, be appreciated that this only is a kind of example, rather than limitation ot it.Those skilled in the relevant art are appreciated that under the prerequisite that does not break away from spirit and scope of the invention can do various changes to form and details.Therefore, scope of the present invention should be not limited to above-mentioned any exemplary embodiment, only should be limited appended claim and its equivalents.

Claims (9)

1. framework that is used to keep reflective mask; This framework is a rectangle and basically around this mask of surrounded by edges of this mask; Thereby keep the reflecting surface of this mask to open wide, this framework comprises rim, and this rim supports this mask in the edge of the reflecting surface of this mask.

2. framework according to claim 1, wherein, this framework has and is suitable for the tongue piece of cooperating mutually with a breech lock.

3. framework according to claim 1, wherein, this framework has catch fitting, this this mask of catch fitting contact, thereby with respect to this this mask of framework location.

4. framework according to claim 3, wherein, this catch fitting is located at least one bight of this framework.

5. a component type lid comprises a framework and a plate according to claim 1, and the size of the reflecting surface of this plate and this mask is basic identical, and this plate has towards first side of this mask and second side that deviates from this mask.

6. two component type lids according to claim 5, wherein, this plate has catch fitting, and this catch fitting stretches out and contacts this framework from first side of this plate.

7. two component type lids according to claim 5, wherein, this plate is transparent, to allow the reflecting surface of this mask of inspection.

8. a lid is used to cover the masterplate with reflecting surface, and this lid comprises a plate; The size of this plate and said reflecting surface is basic identical, and is held in substantially parallelly with said reflecting surface in use, and this plate allows the reflecting surface of this masterplate is checked; And has a framework according to claim 1; This framework has catch fitting, so that contact the edge of this masterplate, thereby with respect to this this masterplate of plate location.

9. lid according to claim 8 has the motion docking structure.

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