CN101105637B - System and method for using a two part cover for protecting a reticle - Google Patents

System and method for using a two part cover for protecting a reticle Download PDF

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Publication number
CN101105637B
CN101105637B CN 200710102349 CN200710102349A CN101105637B CN 101105637 B CN101105637 B CN 101105637B CN 200710102349 CN200710102349 CN 200710102349 CN 200710102349 A CN200710102349 A CN 200710102349A CN 101105637 B CN101105637 B CN 101105637B
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CN
China
Prior art keywords
stencil
system according
cover
mask
frame
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CN 200710102349
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Chinese (zh)
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CN101105637A (en
Inventor
乔纳森·H·费罗斯
伍德罗·J·奥尔松
圣地亚哥·E·德尔·普埃尔托
埃里克·R·卢普斯特拉
安德鲁·马萨尔
杜安·P·基什
阿卜杜拉·阿里汗
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Asml控股股份有限公司
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Priority to US35835402P priority Critical
Priority to US60/358354 priority
Priority to US36412902P priority
Priority to US60/364129 priority
Priority to US41435802P priority
Priority to US60/414358 priority
Application filed by Asml控股股份有限公司 filed Critical Asml控股股份有限公司
Priority to CN03142306.X priority
Priority to CN03142306.X2003.02.21 priority
Publication of CN101105637A publication Critical patent/CN101105637A/en
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Publication of CN101105637B publication Critical patent/CN101105637B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Abstract

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Description

使用两件式盖子保护模版的系统和方法 System and method using two templates cover protects the formula

[0001 ] 本申请是申请号为03142306. X的中国专利申请的分案申请,原申请的日为2003 年2月21日,名称为“使用两件式盖子保护模版的系统和方法”。 [0001] This application is a divisional application No. Chinese patent application 03142306. X, the date of the original application is February 21, 2003, entitled "Using the two systems and methods for protecting a cover template."

技术领域 FIELD

[0002] 本申请涉及光刻技术(lithography),尤其涉及不使用薄皮(pellicle)对光刻模版进行保护。 [0002] The present application relates to lithographic techniques (lithography), particularly to a thin skin is not used (the Pellicle) lithography template protection.

背景技术 Background technique

[0003] 光刻技术是一种在衬底的表面上产生特征的方法。 [0003] The lithography is a method of producing features on the surface of the substrate. 衬底可以包括在制造平板显示器、电路板、各种集成电路等中所使用的那些衬底。 The substrate may include those in a substrate manufacturing flat panel displays, circuit boards, various integrated circuits, and the like are used. 例如可以使用半导体晶片作为衬底来制造集成电路。 Example, a semiconductor wafer manufactured as an integrated circuit substrate.

[0004] 在光刻技术中,使用模版将所需图案转移到衬底上。 [0004] In lithography, the template used to transfer a desired pattern onto a substrate. 模版可以由对所使用的光刻波长来说是透明的材料制成,例如在可见光的情况下使用玻璃。 Templates may be made of lithographic wavelength used is a transparent material such as glass in the case of visible light. 模版也可以形成为能够反射所使用的光刻波长,例如反射极紫外线(EUV)。 Lithographic template may be formed in the reflection wavelength can be used, such as reflective extreme ultraviolet (EUV). 模版上印有图像。 The image is printed on the template. 针对使用模版的具体系统来选择模版的尺寸。 System specific templates to select the size of the template. 例如可以使用6英寸X6英寸并且厚度为1/4英寸的模版。 X6 may be used, for example, 6 inches and a thickness of 1/4 inch template. 在光刻过程中,放置在晶片台上的晶片被暴露于根据模版上所印图像而投射到晶片表面上的图像。 In a lithographic process, a wafer is placed on the wafer stage is exposed according to image the stencil printed image projected onto the wafer surface.

[0005] 所投射的图像使沉积在晶片表面上的层(例如光致抗蚀剂层)的特性发生变化。 [0005] the projected image of the deposited layer on the wafer surface property occurring (e.g. photoresist layer) changes. 这些变化与曝光过程中投射到晶片上的特征相对应。 These changes during the projection exposure onto the wafer corresponding to the feature. 在曝光之后,该层可以被刻蚀,以形成带图案的层。 After exposure, the layer can be etched to form a patterned layer. 该图案对应于在曝光过程中投射到晶片上的那些特征。 The pattern corresponds to those features projected onto the wafer during exposure. 然后使用该带有图案的层来除去该晶片内的在下面的结构层(例如导电层、半导电层或绝缘层)的曝光部分。 Layer is then patterned to remove the layer structure (such as conductive layer, semiconductive layer or insulating layer) is exposed within the portion below the wafer. 重复该过程以及其它步骤,直至在晶片的表面上形成所需的特征。 This process is repeated, and other steps, until the desired characteristics are formed on the surface of the wafer.

[0006] 从上面的描述中可以清楚地看到,通过光刻技术而产生的特征的准确位置和尺寸直接取决于投射到晶片上的图像的精度和准度。 [0006] can be clearly seen from the above description, the exact location and size of features produced by photolithographic technique is directly dependent on the precision and accuracy of the projected image on the wafer. 亚IOOnm光刻的严格性不仅对光刻工具、 而且也对模版提出了严格的要求。 Stringency Asia IOOnm not only for lithography lithography tool, but also on the template made stringent requirements. 沉降在模版上的空气中的颗粒和灰尘会导致晶片上的缺陷。 Air settle on the stencil and dust particles can cause defects on the wafer. 模版平面内的小的图像变形或移位可能比临界尺寸和重叠误差预计值更大。 Small image may be deformed or displaced than the critical dimension and overlay error in the estimated value larger stencil plane. 传统的解决方法是采用永久性固定透明材料薄片作为模版的薄皮。 The traditional solution is to use permanently fixed transparent material as a template pellicle sheet.

[0007] 该薄皮在光刻过程的所有步骤中都保留在原位。 [0007] The thin skin at all steps of the lithographic process are left in place. 薄皮在改善投射到晶片上的图像的准度方面具有双重功效。 In the thin-skinned to improve accuracy aspects of the image projected on the wafer has a dual effect. 首先,薄皮用于保护模版不与微粒污染物直接接触。 First, a pellicle for protecting the stencil from direct contact with particulate contamination. 如上所述, 沉降在模版上的颗粒会产生图像变形,因此必须除去。 As described above, the particles settle on the template will produce image distortion, and therefore must be removed. 但是,从模版上除去颗粒会导致对模版的损坏,因为这种除去可能会涉及到与模版直接接触。 However, particles removed from the stencil can cause damage to the stencil because such removal may involve direct contact with the stencil. 当使用薄皮时,颗粒会沉降在薄皮上而不是模版上。 When using the thin-skinned, particles will settle on the pellicle rather than the template. 因此必须清洁的是薄皮。 It must be cleaned of thin-skinned. 清洁薄皮而不是模版对模版的完整性来说危害较小,因为在该清洁过程中模版由其薄皮所保护。 Clean thin-skinned rather than a template less harmful to the integrity of the template, the template is protected because of its thin-skinned in the cleaning process.

[0008] 薄皮所产生的第二个功效与薄皮的间隙(standoff)有关。 [0008] The second thin skin effect generated by the thin skin with a gap (standoff) related. 在曝光过程中,聚焦平面对应于模版上印制的图像的位置。 During exposure, the focal plane corresponds to the position of the printed image on the stencil. 通过使用薄皮,系统中的任何颗粒会沉降在薄皮上而不是模版上。 By using the pellicle, any particles in the system will settle on the pellicle rather than the template. 利用薄皮的厚度,以及由此而在薄皮的表面和模版的带图案表面之间造成的距离,这些颗粒不会处于聚焦平面。 Using thin skin thickness, and the distance between the thereby resulting patterned surfaces and thin-skinned template, these particles will not be in the focal plane. 由于薄皮将颗粒抬升而不在聚焦平面,因此投射到衬底上的图像会包括这些颗粒的可能性就大大降低。 Since the pellicle without lifting the particles in the focal plane, the image is projected on the substrate including the possibility of these particles is greatly reduced.

[0009] 上述的这种方法在许多传统的光刻加工技术中效果很好。 [0009] This above-described method In many conventional lithographic processing techniques works well. 因此使用这种系统在光穿过模版和薄皮的系统中是方便的,因为制造透明薄皮和模版的材料是可以得到的。 Thus the use of such a system is convenient in the system and the light passes through the thin skin of the stencil, and the stencil Leptodora because the manufacturing material can be obtained. 但是该薄皮方法不适用于EUV应用,因为所使用的光的短波长很容易在穿过气体或固体时被吸收。 However, this method is not pellicle for EUV applications because the short wavelengths of light used are easily absorbed when passing through gases or solids.

[0010] 因此,目前没有材料对EUV足够透明而可以用于制造薄皮。 [0010] Thus, there are no materials sufficiently transparent to EUV that can be used for manufacturing the thin-skinned. 在EUV光刻技术中,EUV 不穿过模版,但是反射离开模版的图像侧。 In the EUV lithography, EUV does not pass through the template, but is reflected off the image side of the stencil. 该技术称为反射光刻。 This technique is known as reflective lithography. 如果在反射光刻过程中使用薄皮,则EUV必须两次穿过薄皮,一次是射向模版而另一次是反射离开模版。 If a pellicle in a lithographic process reflection, the EUV pellicle must pass through twice, once fired and once the template is reflected off of the stencil. 因此,在EUV加工技术中,与薄皮有关的任何光损失被加倍。 Therefore, in the EUV processing technology, thin-skinned about any light loss is doubled.

[0011] 因此,需要一种系统和方法,可以保护模版不受污染,它基本不会降低穿过系统的EUV光量。 [0011] Accordingly, a need for a system and method to protect the template from contamination, it does not substantially reduce the amount of EUV light passing through the system.

[0012] 发明概述 [0012] Summary of the Invention

[0013] 本发明的实施方案提供一种传输掩模的方法,包括如下步骤:(a)用可移式颗粒盖子覆盖掩模的第一部分,形成掩模-盖子构造;(b)将该构造封闭在一个气密的盒子中, 该盒子包括有掩模运载部分以及与该掩模运载部分分开的罩;以及(c)将该构造放在盒子内进行传输。 [0013] The embodiments of the present invention to provide a transmission mask in the method, comprising the steps of: (a) covered with a removable cover of the first type particle portion of the mask, a mask - a cover structure; (b) the structure enclosed in a gas-tight box, the box comprises a mask-carrying portion and separate from the mask-carrying portion of the hood; and (c) the transmission is configured in the box.

[0014] 本发明的实施方案提供一种用于传输掩模的气密的盒子,该盒子包括:掩模运载部分;罩;用于防止气体在掩模运载部分和罩之间流动的气密装置;以及用于将罩与该掩模运载部分暂时性的连接和固定的闩锁。 [0014] The embodiments of the present invention provides a mask to a box hermetic for transmission, the box comprising: a mask-carrying portion; a housing; for preventing the air-tight between the mask-carrying portion and the cap flows ; and means for the cover with the mask-carrying portion of the temporary connection and the fixed latch.

[0015] 本发明的实施方案提供一种传输、搬运和加工掩模的方法,包括如下步骤:(a) 用可移式颗粒盖子覆盖掩模的第一部分,形成掩模_盖子构造;(b)将该构造封闭在一个气密的盒子中,该盒子包括有掩模运载部分以及与该掩模运载部分分开的罩;(c)将带有该构造的盒子传送到加工工具,该工具具有以下每个部件中的至少一种:脱吊舱器(de-podder)、微环境腔、微环境操纵器、负载锁(Ioadlock)、真空腔、真空操纵器、以及掩模支座;(d)将带有该构造的盒子放在脱吊舱器的第一开口上,使得盒子的罩防止气体通过该第一开口而流动;(e)用清洁气体净化脱吊舱器的内部;(f)将掩模运载部分和罩分开而打开该盒子,保持罩在原位,用于阻挡气体流动,将掩模运载部分和该构造移动到脱吊舱器的内部;(g)利用微环境操纵器通过第二脱吊舱器开口而将该构造 [0015] embodiment of the present invention to provide a transmission, handling and processing a mask, comprising the steps of: (a) covering a first portion of a mask with a removable particle cover type, a mask configured to cover _; (b ) the structure enclosed in a gas-tight box, the box comprises a mask-carrying portion and separate from the mask-carrying portion of the cover; case (c) having the structure is transferred to the processing tool, the tool having at least one member in each of the following: de-podder (de-podder), micro-environment chamber, the micro-environment manipulator, a loadlock (Ioadlock), a vacuum chamber, a vacuum manipulator and a mask mount; (D ) with the configuration of the box on the opening of a first de-podder, such that the cover of the box prevents gas flow through the first opening; (e) purifying the internal de-podder with clean gas; (F ) the mask-carrying portion and the cover is opened to separate the box, holding the cover in place, for blocking gas flow, and the mask-carrying portion is configured to move to the interior of de-podder; (G) using a micro-environment manipulator by opening the second structure and the de-podder 从脱吊舱器抽到微环境腔内,并将该构造通过第一负载锁开口放到负载锁内部;(h)抽空负载锁;(i)利用真空操纵器将该构造通过第二负载锁从该负载锁中抽出,并将该构造移动到真空腔内;(j)将该构造放置在掩模支座上,使得掩模的未覆盖部分与支座相接触;(k)利用该支座保持该掩模;(1)利用真空操纵器,将盖子与掩模分开,取走盖子;(m)加工掩模。 Microenvironment pumped from the de-podder cavity, and constructed by the first loadlock opening into the load lock interior; (H) evacuating the load lock; (I) using a vacuum manipulator configured by the second loadlock withdrawn from the load lock, and the configuration of the mobile to the vacuum chamber; (j) the structure is placed on a mask mount, such that the portion of the mask uncovered contact with the abutment; (K) using the branched holder holding the mask; (1) using a vacuum manipulator, and a mask separate lid, the lid is removed; (m) processing the mask.

[0016] 本发明的实施方案提供了一种负载锁,包括:具有至少两个开口的封套;与该封套的第一开口耦合的空气侧门阀;与该封套的第二开口耦合的真空侧门阀;位于封套内的用于接收掩模的掩模保持器;位于封套内的用于覆盖掩模的可移动圆顶;以及用于移动圆顶的圆顶促动器,从而该圆顶可以被定位成覆盖该掩模。 [0016] Embodiments of the invention provide a loadlock, comprising: an envelope having at least two openings; an air valve coupled to the first side door opening of the envelope; vacuum side gate valve coupled to the second opening of the envelope ; a mask holder for receiving a mask within the envelope; a movable dome for covering the mask within the envelope; and a dome actuator for moving the dome, such that the dome can be positioned to cover the mask.

[0017] 本发明的实施方案提供一种将掩模从空气压力过渡到负载锁中的真空的方法,包括如下步骤:(a)将掩模放置在负载锁内;(b)将掩模用圆顶覆盖,以防止负载锁中的空气 [0017] Embodiments of the invention provide a mask transition from air pressure to vacuum load lock method, comprising the steps of: (a) placing a mask inside a loadlock; (b) the mask the dome cover to prevent air in the loadlock

7中的颗粒到达掩模;(C)关闭负载锁;⑷抽空负载锁;(e)打开负载锁通向真空;(f)缩回圆顶而使得掩模不被覆盖;以及(g)从负载锁中移开掩模。 7 particles reaching the mask; (C) closing the loadlock; ⑷ evacuating the loadlock; (e) opening leading to a vacuum load lock; (f) such that retraction of the dome is not covered by the mask; and (g) from load lock away the mask.

[0018] 本发明的实施方案提供一种传输、搬运和加工掩模的方法,包括如下步骤:(a)将掩模封闭在一个气密的盒子中,该盒子包括有掩模运载部分以及与该掩模运载部分分开的罩;(b)将带有该掩模的盒子传送到加工工具,该工具具有以下每个部件中的至少一种:脱吊舱器、微环境腔、微环境操纵器、负载锁、真空腔、真空操纵器、以及掩模支座;(c)将带有该掩模的盒子放在脱吊舱器的第一开口上,使得盒子的罩防止气体通过该第一开口而流动;(d)用清洁气体净化脱吊舱器的内部;(e)将掩模运载部分和罩分开而打开该盒子,保持罩在原位;(f)利用微环境操纵器,通过第二脱吊舱器开口而将该掩模从脱吊舱器抽到微环境腔内,并将该掩模通过第一负载锁开口放到负载锁内部;(g)抽空负载锁;(h)利用真空操纵器将该掩模通过第二负载锁从该负载锁中抽 [0018] The embodiments of the present invention to provide a transmission, handling and processing a mask, comprising the steps of: (a) a mask enclosed in a gas-tight box, the box comprising a mask-carrying portion and a at least one of (b) with the transfer of the mask cassette to the processing tool, the tool having each of the following components; mask-carrying portion of the separate cover: de-podder, micro-environment chamber, manipulating the microenvironment , a loadlock, a vacuum chamber, a vacuum manipulator and a mask mount; (c) the box with the mask on a first opening of a de-podder, such that the box section through which the gas cap to prevent a flow opening; (d) purge the interior of the de-podder with clean gas; (e) the mask-carrying portion and a separate cover of the box is opened, the cover remains in place; (f) using the micro-environment manipulator, and the de-podder through a second opening of the mask from the de-podder pumped microenvironment cavity, and the mask openings into the internal loadlock through a first loadlock; (G) evacuating the load lock; ( h) using a vacuum manipulator that the mask is withdrawn from the loadlock through a second loadlock 出,并将该掩模移动到真空腔内;(i) 将该掩模放置在掩模支座上;以及(j)加工掩模。 Out, and the mask is moved into the vacuum chamber; (I) placing the mask on the mask support; and (j) processing the mask.

[0019] 本发明的实施方案提供一种机械。 Embodiment [0019] The present invention provides a machine. 用于在盒子内对传送至该机械和离开该机械的掩模进行加工,该机械包括:滤过的空气环境部分;至少一个大气操纵器;至少一个脱吊舱器;用清洁气体在基本大气压力下进行净化的气体微环境部分;至少一个微环境操纵器; 至少一个负载锁;真空部分;以及至少一个真空操纵器。 For mechanical and transmitted to the mask away from the mechanical processing within the cassette, the machine comprising: a filtered air environment portion; at least one atmospheric manipulator; at least one de-podder; substantially atmospheric gas cleaning the purified gas at a pressure microenvironment portion; at least one micro-environment manipulator; at least one load lock; vacuum portion; and at least one vacuum manipulator.

[0020] 本发明的实施方案提供一种系统,包括模版和与该模版连接而保护模版的盖子。 [0020] Embodiments of the invention provide a system, comprising a stencil and a stencil is connected to the cover to protect the template. 盖子包括框架和可移动面板,该面板移动而允许在曝光过程中光的通路指向模版。 The lid comprises a frame and a movable panel that moves to allow the passage exposed Cheng Zhongguang point stencil. 模版和盖子利用自动操纵机械手移动至平台。 And a cover template using robot gripper to move internet. 模版和盖子在移开之前可以连接至基板。 Before removing the stencil and the cover may be attached to the substrate.

[0021] 本发明的其他实施方案、特征和优点以及本发明各实施方案的结构和操作将在下面参考附图作更详细描述。 [0021] Other embodiments of the present invention, the structure and operation of various embodiments and the features and advantages of the invention will be described in more detail below with reference to the accompanying drawings.

[0022] 附图的简要说明 [0022] BRIEF DESCRIPTION

[0023] 在这里引入附图并作为说明书的一部分,连同说明一起来解释本发明,还用于解释本发明的原理,并使得所属技术领域的技术人员可以实施本发明。 [0023] The accompanying drawings incorporated herein and constitute a part of the specification, together with the description serve to explain the present invention, further serve to explain the principles of the invention and to enable a person skilled in the relevant technical field of the present invention may be practiced.

[0024] 图1是本发明实施方案的模版上适当位置处的两件式盖子的分解图; [0024] FIG. 1 is a two-part cover exploded view of the embodiment of the present invention in place on the template;

[0025] 图2是根据本发明的实施方案利用自动装置将两件式盖子中的模版加载在平台上的视图; [0025] FIG. 2 is the use of the two-part cover in the load on the platform the template view of an automatic apparatus according to an embodiment of the present invention;

[0026] 图3是根据本发明的实施方案表示模版曝光进行光刻的视图; [0026] FIG. 3 is a view of the template exposure lithography according to an embodiment of the present invention;

[0027] 图4是表示本发明实施方案的两件式盖子的分解立体图; [0027] FIG. 4 is an exploded perspective view of a two-part cover of the embodiment of the present invention;

[0028] 图5是利用本发明实施方案的两件式盖子进行对准和转移的方法; [0028] FIG. 5 is an embodiment using a two-part cover of the present invention a method for alignment and transfer;

[0029] 图6是表示根据本发明的实施方案的定位配件的视图; [0029] FIG. 6 is a view showing the positioning parts according to an embodiment of the present invention;

[0030] 图7是表示本发明实施方案的带有定位配件的两件式盖子的外推图; [0030] FIG. 7 shows a two-part lid with a positioning fitting extrapolation view of an embodiment of the present invention;

[0031] 图8是根据本发明的实施方案用于增强模版中的区域的方法; [0031] FIG. 8 is a method for enhancing the stencil region in accordance with an embodiment of the present invention;

[0032] 图9-10分别表示根据本发明实施方案的示例模版盖子的俯视图和仰视图; [0032] Figures 9-10 are respectively a plan view and a bottom view of an exemplary embodiment of the template of the lid according to the present invention;

[0033] 图11表示图9-10的模版盖子的分解视图; [0033] FIG. 11 shows an exploded view of the template of the lid of Figures 9-10;

[0034] 图12表示根据本发明的实施方案双重包套吊舱(wrap pod)设计; [0034] FIG. 12 shows a double wrap pod (wrap pod) designed according to an embodiment of the present invention;

[0035] 图13是表示图12的双重包套吊舱的分解图; [0035] FIG. 13 shows a double wrap pod in FIG. 12 exploded;

[0036] 图14是表示本发明实施方案的负载锁; [0036] FIG. 14 shows a loadlock embodiment of the present invention;

[0037] 图15是表示图14的负载锁的分解图;[0038] 图16是表示本发明实施方案的模版搬运装置核心的视图; [0037] FIG. 15 is an exploded view of the loadlock in FIG. 14; [0038] FIG. 16 shows a reticle handler core of the apparatus of the present invention, embodiments of view;

[0039] 图17表示本发明实施方案的整个模版搬运装置; [0039] FIG. 17 shows the entire reticle handler apparatus embodiment of the present invention;

[0040] 图18表示根据本发明的实施方案传送掩模的方法的流程图; [0040] FIG. 18 shows a flowchart of a method of transmitting a mask according to an embodiment of the present invention;

[0041] 图19表示根据本发明的实施方案传送、搬运和加工掩模的方法的流程图; [0041] FIG. 19 shows a flowchart of a method of transfer, handling and processing a mask according to an embodiment of the present invention;

[0042] 图20表示根据本发明的实施方案在负载锁内从大气压力向真空传送掩模的方法的流程图; [0042] FIG. 20 shows a flowchart of embodiments of the present invention from atmospheric pressure to the vacuum transfer method in the mask loadlock;

[0043] 图21表示根据本发明的实施方案在负载锁内从真空向大气压力传送掩模的方法的流程图; [0043] FIG. 21 shows a flowchart of a method of transmitting vacuum to atmospheric pressure mask according to an embodiment of the present invention within the loadlock from;

[0044] 图22表示根据本发明的实施方案传送、搬运和加工掩模的方法的流程图。 [0044] FIG. 22 shows a flowchart of a method of transmitting according to an embodiment of the present invention, handling and processing a mask.

[0045] 以下将参考附图对本发明进行描述。 [0045] below with reference to the accompanying drawings of the present invention will be described. 在附图中,一些类似的附图标记表示同样的或功能相近的元件。 In the drawings, like reference numerals refer to some of the same elements or functionally similar. 另外,大多数附图标记中最左面的数字表示在那个附图中该附图标记第一次出现。 In addition, most of the reference numbers in the left-most digit indicates that the reference number first appears in the accompanying drawings.

[0046] 优选实施方案的详细说明 [0046] Detailed description of preferred embodiments of the

[0047] 本发明的实施方案提供一种保护模版的盖子,它相对于传统系统来说有所改进。 [0047] The embodiments of the present invention provide a protective cover template, which is with respect to conventional systems improved. 本发明的其他实施方案提供可与该盖子相配的吊舱或模版传送盒,它进一步保护模版不受颗粒侵害。 Other embodiments of the present invention may be provided with mating the cover transport box car or stencil, the stencil further protect it from abuse particles. 本发明的另一些实施方案提供与该盖子相配的负载锁,当在大气压力和真空之间传送模版时,它进一步保护模版不受颗粒侵害。 Other embodiments of the invention provide a match with the load lock cover, when transmitting the stencil between atmospheric pressure and vacuum, to further protect it against the stencil from the particles. 本发明的再一些实施方案提供具有三个独立的环境(例如滤过的室内空气、气体净化的微环境、以及真空)的模版搬运装置,每个环境都最适合于在各搬运步骤中有成本效率的减少对模版的污染。 Further embodiments of the present invention provides a stencil conveying apparatus having three separate environments (e.g., filtered room air, gas purification microenvironment, and vacuum), each best suited to the environment in the cost of transport step reducing pollution efficiency of the template. 本发明还有一些实施方案提供一种利用以上减少污染的所有装置来搬运模版的方法。 Some embodiments of the present invention to provide an apparatus utilizing all of the above methods of reducing pollution to carry the template.

[0048] 传统的光刻技术依赖于薄皮来保护模版的带图案区域不受到微粒污染。 [0048] The conventional photolithographic techniques rely on a thin skin to protect the patterned area of ​​the template is not subject to particle contamination. 但是如上所述,由于没有一种对极紫外光(EUV)来说是透明的材料,因此不能实现这个方法。 As described above, however, since there is no kind of extreme ultraviolet (EUV) is a transparent material, this method can not be achieved. 另外, 内部对准的限制使得整个模版盖子的除去难以正确进行。 Further, internal constraints such that the alignment template is removed the entire lid difficult to correct. 因此,根据本发明的实施方案,利用模版盖子来保护模版,该模版盖子包括用于支撑模版的框架,以及可以在曝光和清洁过程中除去的面板。 Thus, according to an embodiment of the present invention, a cover to protect the template using the template, the template comprising a cover frame for supporting a stencil, and a panel that can be removed during exposure and cleaning.

[0049] 尽管光刻系统在清洁的环境下进行操作,但是在加工过程中会产生颗粒。 [0049] While lithography systems operate in clean environments, but in the process can generate particles. 这些颗粒会污染模版。 These particles contaminate the template. 模版要周期性的清洁,从而将模版上的微粒量保持在一个允许的阈值之下。 To periodically clean the stencil, so that the amount of particles on the stencil remains below an allowable threshold. 因此必须考虑光刻系统内的颗粒产生来源。 The particles must be considered in the generation source of the lithography system. 通常,在另外的清洁系统中的颗粒是因为摩擦而产生的。 Typically, the particles in a further cleaning system is generated due to friction. 在传统的系统中,当模版从一个位置传送到另一个位置时会产生颗粒由于在传统的系统中模版在转移过程中可以滑动,因此任何模版在传送过程中的滑动也会产生另外的颗粒。 In conventional systems, when the stencil from one place to another due to the generated template particles may slide during the transfer process in the conventional system, the slide during transport any of the template will produce additional particles. 最后,传统系统中的振动也会导致摩擦和相关的颗粒产生。 Finally, vibration in conventional systems also causes friction and associated particle generation.

[0050] 根据本发明的实施方案,在可除去盖子上包括位置定位器和脊,从而避免转移和模版滑动摩擦。 [0050] According to an embodiment of the present invention, the removable cover includes a position locators and ridges, so as to avoid transfer of the stencil and sliding friction. 但是盖子的安装和除去会产生摩擦。 However, the installation and removal of the lid cause friction. 类似的,如在传送系统中的振动也会导致颗粒的形成。 Similarly, in the vibration transmission system also results in the formation of particles. 因此在实施本发明的实施方案时已经考虑到了这些颗粒产生原因的差别。 Thus in the practice of embodiments of the invention it has considered these differences cause particle generation.

[0051] 除了颗粒的产生,在设计光刻系统时,也需要考虑颗粒的沉降。 [0051] In addition to the generation of particles, in the design of the lithography system, also we need to consider settling particles. 在本发明的实施方案中使用可除去面板减少了颗粒在所有的时候都沉降在模版上的机会,当然除了曝光过程之外。 It can be removed using the panel reduces the chance of particles settle all the time on the stencil in embodiments of the present invention, of course, in addition to other than the exposure process. 明显的颗粒沉降在曝光之外的时间内发生,因此使用本发明实施方案的可除去面板, 即使在曝光步骤中除去盖子的时候也能够显著的保护模版不会发生颗粒沉降。 Occurrence of significant particle settling time outside exposure, thus the use of embodiments of the invention the panel may be removed, even when the cap is removed in the exposure step can be significant protection without template particles sedimentation.

[0052] 最后,也必须考虑颗粒迁移。 [0052] Finally, particle migration must also be considered. 颗粒迁移发生在快速动作和快速压力变化导致的紊流过程中。 Particles to migrate in a turbulent process of rapid action and rapid pressure changes caused in. 在EUV系统中,很多移动是发生在高真空中。 In the EUV systems, many mobile occurred in a high vacuum. 因此在例如从库架向投射支座的移动过程中的紊流是最小的。 Thus, for example, movement to the projection from the library rack mount turbulence is minimal. 但是由于有压力变化,因此这个紊流源必须予以考虑。 However, due to pressure changes, so this source of turbulence must be considered. 因此根据本发明的实施方案,通过使用与安装在模版上的框架相连接的可除去面板,基本消除了这种额外的颗粒迁移源。 Therefore, according to embodiments of the present invention, can be removed by using a panel frame mounted on the stencil connected substantially eliminate this additional source of particle migration.

[0053] 两件式盖子和其拟运动学的定位 [0053] positioned a two-part cover and its proposed kinematics

[0054] 图1表示包括根据本发明一个实施方案的两件式盖子(cover) 102的系统100的分解图。 [0054] Figure 1 shows comprising (Cover) 102 exploded view of the system 100 according to an embodiment of a two-part cover of the present invention. 两件式盖子102包括一个框架2,该框架2在搬运的过程中支撑一个模版1,并在曝光的过程中与模版1和一个平台7保持接触。 A two-part cover 102 includes a frame 2, the frame 2 is supported during conveyance of a stencil 1, the stencil 1 and a platform 7 and remain in contact during exposure. 框架2包括一个比模版(reticle) 1的场区(field)大的开口14,以在曝光过程中允许光化性的光线穿过开口14。 2 includes an opening ratio of the stencil frame (Reticle) field region (field) 1 14 large to allow light to pass through actinic opening 14 during exposure. 框架2还包括一个连接装置8,它对应于连接至平台(stage) 7的连接装置9。 The frame 2 also comprises a connecting means 8, which corresponds to the connection means 97 is connected to the platform (stage). 因此,连接装置8使得框架2 可以由连接装置9保持在平台7上。 Thus, the connecting means 8 so that the frame 2 by the connecting means 9 may be held on the platform 7.

[0055] 该实施方案还包括面板3,它与框架2在光刻曝光之前才相分开,在光刻曝光之后立刻重新连接至框架2。 [0055] This embodiment also includes a panel 3, it was re-connected to the spaced frame 2 before lithographic exposure immediately after the lithographic exposure to the frame 2. 面板3可以由对可见光透明的材料制成,从而可以肉眼检查和识别模版1的前侧。 Panel 3 can be made of a material transparent to visible light, allowing visual inspection and identification of a front side of a stencil.

[0056] 如图所示,连接装置8和9处于平台7和框架2之间,以及在框架2和面板3之间。 Connecting means [0056] is shown in FIGS. 8 and 9 between the platform 2 and the frame 7, as well as between frame 2 and panel 3. 如图所示,可以在平台7和框架2之间包括配件对5a和5b。 As shown, the fitting may comprise a pair 5a and 5b between the platform 2 and the frame 7. 配件对5a和5b可以是“两件之间的(between pieces) ”,这如该领域技术人员根据此处描述的至少一种技术可以知道的,可选自分别在每个片上的磁体和磁靶;机械紧固件,例如在一个片上的装有弹簧的闩锁或双稳锁存器以及在另一个片上的配套接头片;以及重力依赖装置,例如在另一个片上的配套配件上的位于一个片上的支靠配件。 Parts of 5a and 5b may be "(between pieces) between the two", which according to the skill in the art as at least one of the techniques described herein may be known, are selected from the magnet and on each sheet target; mechanical fasteners, such as on a sheet of spring-loaded latches or bi-stable latches and matching tabs in the other sheet; and gravity dependent devices, for example, positioned on a supporting plate fitting on the other supported by an on-chip parts.

[0057] 根据本发明的实施方案,连接装置8和/或9可以具有以下设计准则,包括但不限于:a)连接装置8和/或9可以通过两件式盖子102外部的装置来进行拆卸,该装置可以位于将模版1加载在平台7上的自动操纵机械手4上,或者在平台7内,和/或;b)连接装置8和/或9的释放和再连接应当产生最小的污染颗粒从而避免污染模版1 (为此,优选使用非接触式装置来促动连接装置8和/或9),和/或;c)连接装置8和/或9应当是自支撑的,从而一旦连接装置8和/或9已经被开始连接,则不需要施加外界作用将这些件保持在一起。 [0057] According to an embodiment of the present invention, the connecting means 8 and / or 9 may have the following design criteria including, but not limited to: a) connecting means 8 and / or 9 can be detachable by 102 an external device a two-part cover the apparatus may be located in the reticle 1 loaded on the platform 7 of robot gripper 4, or in the platform 7, and / or; b) connection release and reconnection 8 and / or 9, the device should produce minimal contamination particles thereby avoiding contamination of the template 1 (for this purpose, preferably a non-contact means is connected to the actuating means 8 and / or 9), and / or; c) connecting means 8 and / or 9 should be self-supporting, so that once the connecting means 8 and / or 9 connector has been started, the need to apply external action to hold together the pieces.

[0058] 在一个实施方案中,自动操纵机械手4可以用于挤压两个或多个装有弹簧的闩锁,从而释放这些件。 [0058] In one embodiment, robot gripper 4 can be used to squeeze two or more spring-loaded latches to release the pieces.

[0059] 在另一个实施方案中,平台7中的电磁体可以用于与闩锁中的永磁体发生相互作用,从而使得它们分开。 [0059] In another embodiment, the electromagnet 7 in the platform may be used to interact with the permanent magnets of the latch, so that they are separated.

[0060] 在另一个实施方案中,自动操纵机械手4中的电磁体通过克服分别处于盖子102 的两个件上的永磁体和靶之间的磁性吸引而释放面板3。 [0060] In another embodiment, the robotic manipulator electromagnet 4, by overcoming the magnetic attraction between each permanent magnet in the two members of the cover 102 and the target attraction release panel 3. 类似的,平台7内的电磁体应当被暂时的供能以克服分别位于框架102和平台7的永磁体和磁靶之间的磁性吸引。 Similarly, the electromagnet 7 in the platform should be temporarily energized to overcome the magnetic attraction between the platform frame 102 and the permanent magnet 7 and magnetic targets respectively located suction.

[0061] 许多其他的实施方案也是可行的,包括但不限于,连接配件的排列变换和结合和释放装置在机械手中而不是在平台定位,或者反之亦然。 [0061] Many other embodiments are possible, including but not limited to, rearranging and binding and release means connected to a robot for fitting the platform instead of positioning, or vice versa. 所有的这些排列变换和结合都在本发明的范围之内。 All these arrangements are converted and incorporated within the scope of the present invention.

[0062] 继续参考图1,在上述实施方案的变化中可以利用重力来将模版1、框架2和面板3保持在一起。 [0062] With continued reference to FIG. 1, the variation of the above embodiments may be held together by gravity to the reticle 1, frame 2 and panel 3. 具体的说,自动操纵机械手4可以支撑着面板3,框架2可以搁靠在面板3上,模版1可以靠在框架2内。 Specifically, robot gripper 4 can support the panel 3, frame 2 can rests on panel 3, a stencil frame 2 can rests. 相对应的配件对5a和5b可以将框架2与面板3对准,而相对应的配件对6a和6b可以将面板3与自动操纵机械手4对准。 Corresponding fitting may be aligned with the frame 2 and panel 3 to 5a and 5b, and corresponding to the panel 3 and the fitting may be robot gripper 4 aligned to 6a and 6b.

[0063] 在各种实施方案中,配件对5a和5b及6a和6b可以选自:运动支座(例如带有在沟槽或圆锥形底座内的球),孔和狭槽中的接合销,以及将一个件嵌套在另一个件中。 [0063] In various embodiments, feature pairs 5a and 5b and 6a and 6b can be selected from: motion bearing pin engages (e.g., with a ball in the groove or the conical base), and the slot hole and a member nested within another member. 用于提供能量从而使框架2相对于平台7保持定位和从平台7释放的装置可以位于平台7内, 如图1所示,或者内置于自动操纵机械手4中。 For providing energy so that the frame 7 relative to the platform 2 held in position 7 and release the platform from the device may be located within the platform 7, as shown, or incorporated in a robot gripper 4.

[0064] 根据本发明的另一个实施方案,位于平台7内的两个或多个带有弹簧的机械闩锁9通过利用舌片8可以用来将框架2保持在平台7上,如图2和3所示,并如下所述。 [0064] According to another embodiment of the present invention, the platform located in two or more mechanical latch with a spring 7 to 9 by using the tongue 8 to the frame 2 can be held on the platform 7, FIG. 2 and FIG. 3, and described below.

[0065] 在另一个实施方案中,例如通过利用与平台7连接的螺线管11瞬时施加电磁力以克服弹簧10所施加的闭合力,由此回缩可由磁性材料制成的闩锁,从而可以实现闩锁的释放。 [0065] In another embodiment, for example, 7 connected to the platform by using an electromagnetic force of the solenoid 11 to overcome the moment of applying the closing force exerted by the spring 10, thereby retracting the latch can be made of a magnetic material, whereby you can achieve the release latch.

[0066] 配件对14a和14b可以放置在面板3的底部侧和其它表面上,该表面必须放置有系统100(例如模版/盖子组件)。 [0066] 14a and 14b of the fittings can be placed on the bottom side of the panel 3 and the other surface which must be placed with a system 100 (e.g., stencil / lid assembly). 例如,在真空库架上以及在表示为13且在下文将详细描述的标准机械接口(SMIF)吊舱基板上。 For example, on vacuum library shelves and 13 and (the SMIF) standard mechanical interface pod substrate as described in detail hereinafter expressed as.

[0067] 图2表示根据本发明的一个实施方案模版1和盖子102的状态。 [0067] FIG. 2 shows a state according to an embodiment of the present invention, the stencil 1 and the cover 102. 因此图2所示的状态表示利用自动操纵机械手4将框架2和面板3加载在平台7上。 Thus the state shown in FIG. 2 shows a robot gripper 4 by using the frame 2 and panel 3 loaded on the platform 7. 在一个实施方案中, 该状态是在螺线管11已经被断开能量并且闩锁9已经捕获了舌片8的状态。 In one embodiment, the state has been switched off energy in the solenoid 11 and the latch 9 has been captured in a state in which the tongue 8. 在该状态中, 框架2固定在适当的位置。 In this state, the frame 2 is fixed in place. 该状态可以是在回缩自动操纵机械手4之前。 The status may be automatically retracted before operating the manipulator 4.

[0068] 图3表示根据本发明的实施方案的系统100的状态。 [0068] FIG. 3 shows the state of the system according to embodiments of the present invention 100. 在该状态中,在自动操纵机械手4(图3中没有显示)已经回缩,带走面板3(图3中没有显示)之后,模版1和框架2 仅由平台7支撑。 After this state, the robot gripper 4 (not shown in FIG. 3) has retracted away panel 3 (not shown in FIG. 3), the stencil 1 and the frame 2 is supported only by the platform 7. 在一些实施方案中,此时可以通过开口14进地光刻曝光。 In some embodiments, this time through the opening 14 into the lithographic exposure.

[0069] 自动操纵机械手4保持框架2而不是面板3的实施方案是更简单的,因此相对于其他实施方案来说是优选的。 [0069] The robot gripper 4 holds frame 2 instead of panel 3 embodiment is simpler, and therefore with respect to the other embodiments are preferred. 这是因为采用了重力将面板3和框架2保持在一起。 This is because the use of the force of gravity holding the panel together and the frame 3. 在框架2已经被平台7捕获之后为从框架2上拆下面板3基本只需要自动操纵机械手4的向下移动。 After the frame 2 has been captured as a platform 7 panels are removed from the frame 23 substantially only robot gripper 4 is moved downward.

[0070] 可替换的实施方案还能便于将模版1与平台7对准,以下将描述用于对准的方法。 [0070] Alternative embodiments also facilitate alignment of reticle 1 and the stage 7, a method for alignment will be described below.

[0071] 如本文其它处所述,模版1应当被放置和取向为和晶片相一致。 [0071] As described elsewhere herein, reticle 1 should be placed and oriented consistent and the wafer. 这基本确保了当前从模版图案复制到晶片上的电路层会与晶片上已经先存在的层对直。 This substantially guarantees that a current copy of the pattern from the template to the circuit layers on the wafer and the wafer will be already existing on the first straight.

[0072] 在以下将会详细描述的几个实施方案中,模版1可以在容器(例如吊舱)中传送至光刻系统(或“光刻工具”),该容器的一部分可以表示为13。 [0072] In the following several embodiments will be described in detail, the container 1 may stencil (e.g. car) transmitted to the lithography system (or "lithography tool"), a portion of the container 13 may be expressed as. 吊舱(pod)可以包括一支撑着模版1的框架以及在传送过程中使污染颗粒远离模版1的一面板。 Nacelle (POD) may comprise a propped stencil frame 1 and the transfer process, to a stencil contaminating particles away from the panel 1. 在这些实施方案中, 吊舱框架的底部侧可以具有与光刻工具中配套的定位配件相对应的定位配件,从而SMIF 吊舱相对于光刻工具的取向是唯一确定的。 In these embodiments, the bottom side of the pod frame can have supporting and positioning of the lithography tool parts corresponding to the positioning of parts, thereby SMIF pod relative to the orientation of the lithography tool is uniquely determined.

[0073] 参考图1,通过支靠点和内置于框架2内的止挡器以及内置在面板3中的弹簧的结合,模版1可以固定地保持在框架2顶部侧上的适当位置。 [0073] Referring to FIG 1, by bearing against the binding site built in the frame 2 and the stopper and the spring built in the panel 3, and reticle 1 can be held securely in place on the top side of the frame 2. 由于模版1可以是平的正方形,而没有特定的定位配件,因此可以有8种方法将其装配在支靠点、止挡器和弹簧所形成的嵌套中。 Since reticle 1 can be a flat square with no special locating parts, so there are eight possible ways to fit against the branch point, and the nested spring stopper formed.

[0074] 当将模版1加载在吊舱中时,必须小心将模版1放置为使其带有图案的一侧面对所需要的方向(例如右侧向上),并有需要的相对于吊舱的取向(例如90度)。 [0074] When loading reticle 1 in the pod, care must be taken to place reticle 1 with the patterned side of it facing direction (e.g., right side up) is required, and there is a need with respect to the nacelle orientation (e.g., 90 degrees). 例如,图案的顶部边缘可以朝着吊舱的前侧。 For example, the top edge of the pattern may be towards a front side of the nacelle. 然后当模版吊舱放在光刻工具中时,可以知道模版1相对于光刻工具的位置和取向。 When the stencil is then placed in the nacelle lithography tool, you can know the position and orientation of reticle 1 relative to the lithography tool. 通常,位置(X,Y)不确定性在大约Imm(毫米)的数量级,角度取向(θ ζ)不确定性在大约1度的数量级。 Typically, the position (X, Y) uncertainty in the order of magnitude of approximately Imm, (mm), the angular orientation (θ ζ) uncertainty in the order of about 1 degree. 但是,这种准确度对于目前的光刻来说是不够的。 However, the accuracy for the current lithography is not enough. 必须将位置的不确定性减小到几个微米,取向的不确定性必须小于1弧度秒。 Position uncertainty must be reduced to a few microns, the orientation uncertainty must be less than 1 arc second.

[0075] 因此,根据本发明的实施方案,光刻工具可以装备有预对准器。 [0075] Thus, according to an embodiment of the present invention, the lithography tool can be equipped with the pre-aligner. 该预对准器通过查看模版图案上的靶并将模版按照需要进行移动以校正其位置和取向,从而将模版1中的图案相对于光刻工具精确地定位和对准。 The pre-aligner target template and the template pattern view moves as needed to correct its position and orientation, so that the pattern in reticle 1 to the lithography tool with accurately positioned and aligned by the. 自动装置4或其他任何专用的转移机构,通常将模版1从框架2转移至预对准器,并从预对准器转移至平台7。 Robot 4 or any other dedicated transfer mechanism, typically transfers reticle 1 from frame 2 to the pre-aligner, and transferred from the pre-aligner to stage 7. 从预对准器转移至平台7必须是非常准确的,因为转移装置所带来的任何定位误差会降低模版1在平台7上的布置精确度。 Transferred from the pre-aligner to stage 7 it must be very accurate, since any positioning errors caused by the transfer device 1 reduces the stencil 7 disposed on the platform accuracy. 因此对于将模版1从预对准器转移至平台7的关键步骤来说,应当使用非常准确和可重复的自动装置或转移机构。 So for the stencil 1 is transferred from the pre-aligner to stage 7 of the key steps, it should be used very accurate and repeatable robot or transfer mechanism.

[0076] 精确移动的自动装置可以位于光刻系统的印制台,该光刻系统适用于深紫外(DUV)光刻。 [0076] The mobile robot may be accurately located printing stage of the lithography system, the lithography system is suitable for deep ultraviolet (DUV) photolithography. 但是,这不能用于EUV光刻,因为EUV过程必须在真空下进行。 However, this is not for EUV lithography because the EUV process must be carried out in a vacuum. 这是因为如上所述EUV光线在常压下被完全吸收。 This is because, as mentioned EUV light is completely absorbed at atmospheric pressure. 因此必须使用适用于真空的自动装置。 Automatic device must be used to apply the vacuum. 由于电机和电子设备产生热量和排除污染物气体,而这些在真空中是非常难以除去的,因此适用于真空的自动装置被设计为使其电机和电子设备处于真空腔之外。 Since motors and electronics generate heat and remove contaminant gas, which under vacuum is very difficult to remove, and therefore the vacuum applied to the automatic device is designed so that the motor and the electronic device is outside the vacuum chamber. 在真空腔内,使用长的机械联动机构将动作转移到要被处理的物体上。 In a vacuum chamber, long mechanical linkage using the operation proceeds to the object to be treated. 这种配置是清洁的,不会在腔内产生热,但是由于具有相当的长度、低刚性以及联动机构的自由移动(Play),因此会存在固有的定位准确性和可重复性不好的问题。 This arrangement is clean, it does not produce heat within the cavity, but rather move freely because of the length, low stiffness and a linkage mechanism (Play), thus positioning accuracy and there is an inherent problem of poor reproducibility . 因此,可获得的真空自动装置对于执行将模版从预对准器转移到平台的这一关键步骤来说是不够的。 Thus, the vacuum robot available for the implementation of the stencil is transferred from the pre-aligner to the platform key step is not sufficient. 很清楚,需要一种替换方法,使得自动装置的精确性和可重复性是理想的。 Clearly, a need for an alternative approach, so that accuracy and repeatability of the automatic device is desirable.

[0077] 图4表示系统100的实施方案,其中面板3可以用于在最后的转移中准确地和可重复的定位,由此允许使用清洁器和必要的不精确的自动装置。 [0077] FIG. 4 shows a system embodiment 100 in which panel 3 can be used for the final transfer to and accurately repeatable positioning, thereby allowing the use of cleaner and a robot necessary inaccurate. 通过将面板3运动地对接到预对准器,可以获得面板3相对于预对准器的准确位置。 By adding to the pre-aligner to, the panel 3 can be obtained with respect to the exact position of the pre-aligner panel 3 movably. 下部的V沟槽15a与圆的尖端的销15b相啮合,在一个实施方案中该销15b位于预对准器中。 V groove 15a and the lower portion of the tip circle of the pin 15b is engaged, in one embodiment the pin 15b is located in the pre-aligner. 下部的半球6a可以类似于尖端的销15b,上部V沟槽16b可以类似于V沟槽15a。 6a may be similar to the lower portion of the hemispherical tip pins 15b, the upper V-groove 16b may be similar to V-groove 15a. 使用V沟槽15a和16b以及圆的尖端的销15b和16a以将物体运动对接是已知的,也存在着其他已知的同样有效的运动对接(kinematic dock)设计。 The V grooves 15a and 16b, and the tip of the pin 16a and 15b to a circle abutting the moving objects are known, there are known other equally effective docking movement (kinematic dock) design. 本发明不限于使用V沟槽和圆的尖端的销,而是原则上可以按照所有已知的运动对接设计来进行。 The present invention is not limited to the use of the V-groove and the tip circle of the pin, but the principle can be designed according to the docking all known motion.

[0078] 然后自动操纵机械手4抓取面板/框架/模版组件,并将其移动到恰在平台7之下。 [0078] Then robot gripper 4 gripping the panel / frame / template assembly and move it just below the platform 7. 类似的,当机械手将面板/框架/模版组件向上移动时,可以通过将面板3中的上部V 沟槽i6b与平台7中的半球16a啮合在一起而获得面板3相对于平台7的精确运动位置。 Similarly, when the robot will move up the panel / frame / template assembly, the hemisphere by the upper V-groove 7 i6b platform panel 3 engaged with each panel 16a obtained accurate motion relative to the platform 3 7 position . 在面板3已经运动的与平台7啮合之后,可以给闩锁9和静电卡盘17供能,分别通过舌片8夹住框架2以及将模版1拉靠在平台7上。 After 7 engaging the panel 3 has moved to the platform, to the latch 9 and the electrostatic chuck 17 energized, respectively clamping frame 2, the tongue 8 and pull the reticle 1 rests on the platform 7. 然后自动操纵机械手4可以将面板3向下移动,并将其缩回离开平台7。 Then robot gripper 4 can move panel 3 downwards, and it is retracted away from the platen 7.

[0079] 运动的对接的固有属性是它们可以在几个微米之内重复进行,只需要起初的对准是在配套配件的捕获范围(capture range)之内。 Docking intrinsic properties [0079] movement is that they can be repeated within a few microns, only the initial alignment of the supporting parts is within the capture range (capture range). 例如,每个半球16a与每个上部V沟槽16b的对准必须是使得每个半球16a起初接触相应沟槽16b的任何部分。 For example, each hemisphere 16a is aligned with the V-groove 16b must be such that each upper hemisphere 16a of each first contact with any portion of the corresponding groove 16b. 如果满足该条件, 那么与起初的对不准无关,可以获得同样的最后相对位置。 If this condition is met, with the same last initial relative position misalignment nothing to get. 捕获范围依赖于配套配件的尺 Capture range depends on matching accessories foot

12寸。 12 inches. 例如,使用图1-4所示的配件尺寸,容易获得约士Imm的捕获范围。 For example, parts 1-4 shown in FIG size, easy access to the capture range of approximately Imm disabilities. 由于该范围大于真空自动装置的一般重复误差,可以实现所希望的功能性去耦。 Since this range is larger than a general vacuum robot repeatability error, it may achieve the desired functionality decoupling. 当面板3与平台7运动地啮合时,自动操纵机械手4必须依从于(X,Y)平面,从而不至于将自动操纵机械手4所建立的运动轨迹强加在运动的对接上,而是使得对接配件的相互作用限定最后的轨迹。 When the panel 3 engaged with the platform 7 movement, the robot gripper 4 be compliant in the (X, Y) plane, so as not to automatically manipulate the trajectory of robot 4 established imposed on the docking movement, but so that the joint fitting interaction defining the final trajectory. 相当大的长度,低刚性,以及机械手联动机构的自由移动,可以提供所需的少量依从性。 Considerable length, low stiffness, and the freedom of movement of the robot linkage can provide the small amount of compliance needed.

[0080] 如上所述,本发明的实施方案利用具有准确性和可重复性的自动装置解决了将框架2从预对准器向平台7准确转移的问题。 [0080] As described above, embodiments of the present invention utilizes the accuracy and repeatability with automatic device solves the problem of accurately transferring frame 2 from the pre-aligner to stage 7. 为了有效转移之外,从模版1被从预对准器提取的时刻到卡盘17被供能的时刻,模版1必须相对于面板3而言确切的保持在相同的位置上。 In order to effectively transfer outside the stencil from being extracted from the time the pre-aligner to chuck 17 is a time energy supply, reticle 1 relative to the panel 3 must be maintained in terms of the exact same position. 确保这一点的一个方法是将模版1紧密的装配在框架2内,框架定位配件5a与它们对应的定位配件5b有非常小的间隙。 One way to ensure this is to close the stencil 1 is fitted in the frame 2, the positioning frame parts 5a 5b has a very small clearance with their corresponding positioning accessories. 但是这可能不是最理想的预期情况,因为紧密装配的零件在拉开时容易产生许多颗粒。 But this may not be the ideal situation is expected, because the tight-fitting parts prone to many of the particles when opened. 幸运的是,在本发明的大部分实施方案中,可能不需要紧密的装配,因为零件之间的摩擦足以将它们彼此保持在适当的位置。 Fortunately, in most embodiments of the present invention may not be required tight fitting, since the friction between the parts is sufficient to hold them in position with each other.

[0081] 由于和真空内的电机相关的困难,并且因为抽吸抓取在真空内无法工作,适用于真空的自动装置可以被设计为它的加速和减速恰好慢到足以允许使用简单的无源夹具(passivegripper),这种夹具会仅通过重力和摩擦力来将晶片保持在3个销上。 [0081] Since the motor and the difficulties related to the vacuum, and because suction gripping does not work in vacuum, vacuum applied to the robot can be designed for its slow acceleration and deceleration just enough to allow the use of simple passive clamp (passivegripper), this will only clamp the wafer to be held on the pin 3 by gravity and friction. 真空自动装置制造商提供了基本上无滑动使用的简单的夹具。 Vacuum robot manufacturers provide substantially no sliding simple jig used.

[0082] 因此,我们已经侧重于最后的转移准确性问题。 [0082] Thus, we have focused on the final transfer accuracy problem. 本发明的其他实施方案显示出盖子2如何利于将模版1与平台7相对准。 Other embodiments of the present invention show how cover 2 to facilitate a stencil aligned with the platform 7. 通常如上所述,进入到吊舱中的工具内的模版可以相对于面板具有约Imm的定位误差以及约1度的取向误差。 Generally as described above, the template tool into the nacelle relative to the panel may have a positioning error of about Imm, and the alignment error of about 1 degree. 这些误差可以减小到几微米和小于约1弧度秒。 These errors can be reduced to a few microns and less than about 1 rad sec. 为了实现这一点,预对准器对模版1与面板3之间的相对对准和定位进行测量和校正是足够的,因为面板与平台的运动的对接已经是非常准确的。 To achieve this, the pre-aligner for alignment and relative positioning between the stencil 1 and the panel 3 are measured and corrected for sufficient because the motion of the docking platform panel is already very accurate. 优选的是,不将模版1从框架2上取下而进行再次对准,从而在任何一个模版表面上不会产生任何颗粒。 Preferably, the stencil is not removed from the frame 1 and 2 again aligned, so as not to produce any particle on any surface of a stencil.

[0083] 在各种实施方案中,使用两件式盖子102简化了将模版1与面板3对准的方法。 [0083] In various embodiments, a two-part cover 102 simplifies the method of the reticle 1 is aligned with the panel 3. 自动装置将面板/框架/模版组件送至预对准器,该预对准器装备有一套圆末端的销15b。 The robot panel / frame / template assembly to the pre-aligner, the pins 15b have a rounded tip of the pre-aligner equipment. 因此通过将下部的V沟槽15a与圆末端的销15b啮合,该组件与预对准器运动地对接。 Therefore, by the lower portion of the V-groove 15a and the pin 15b engages the rounded tip, the docking assembly movably pre-aligner. 因此面板3相对于预对准器精确的对准和定位。 Thus the panel 3 with respect to the pre-aligner precise alignment and positioning. 由此为了将模版1与面板3进行精确的定位和对准,所需要的仅仅是将其相对于预对准器进行定位和对准。 To the stencil whereby the panel 1 and 3 precise positioning and alignment need only be aligned and positioned relative to the pre-aligner. 为此,首先要测量误差,然后校正误差。 To this end, first a measurement error, and correct errors.

[0084] 根据本发明的一个实施方案,测量误差的一种方法是给预对准器装备采用摄像机的视觉系统,该系统可以测量在模版图案中的靶与永久固定于预对准器的并与圆末端的销相校准的靶之间的角度和位置误差。 [0084] According to an embodiment of the present invention, a method for measuring errors is to equip the pre-aligner using a camera vision system can be measured with a template pattern in a target permanently fixed to the pre-aligner and and the error between the angular position of the pin with a rounded tip calibration target. 由于该图案位于模版1的底侧上,摄像机必须透视面板3,该面板在摄像机的操作波长下应当是透明的。 Since the pattern is located on the bottom side of reticle 1, the camera must perspective panel 3, the panel at the operating wavelength of the camera should be transparent. 也有一些已知的其他方法能够对位置和角度误差进行测量,本发明不限于使用摄像机和一套靶。 There are other known methods capable of measuring the position and angle errors, the present invention is not limited to using a camera and target.

[0085] 在一个实施方案中,为了校正模版1相对于预对准器的位置和角度取向,预对准器可以装备具有Χ,γ,ζ和θ Z自由度的精度操纵器。 [0085] In one embodiment, in order to correct the position and angular orientation of the stencil with respect to a pre-aligner, the pre-aligner can be equipped with precision manipulator having Χ, γ, ζ and θ Z freedom. 该预对准器可以具有能够通过啮合舌片8而将框架2从下面提升的机械手。 The pre-aligner may have to be capable of lifting frame 2 by engaging from below the tongue 8 robot. 精度操纵器将首先将框架/模版刚好提升离开面板3,然后进行Χ,Υ和θ ζ校正,再将框架/模版降低回到面板3上。 The precision manipulator would first frame / template just lifted off the panel 3, and then Χ, Υ θ ζ and correction, then the frame / panel 3 back stencil reduced. 此时,模版1相对于面板3对准,并准备转移至平台7。 At this point, reticle 1 is aligned relative to panel 3 and ready to be transferred to the platform 7. 将框架2相对于面板3重新定位需要在定位配件5a和5b之间具有充分大的间隙。 2 with the frame needs to have a sufficiently large clearance between the parts 5a and 5b for positioning the panel 3 repositioned. [0086] 可以理解,由于已经知道真空自动装置能够转移物体而不会滑动,因此各种配件对可以提供精确定位的准确度。 [0086] It will be appreciated, has been known since the vacuum robot is capable of transferring the object without slipping, and therefore may provide a variety of accessories for precise positioning accuracy. 另外,各种配件对可以是安全的配件对,以防止在可由碰撞或电力失败导致自动装置突然的停止情况下发生严重的意外滑动。 In addition, a variety of accessories can be safe accessories to, in order to prevent serious accidents sliding occurs by a collision or sudden power failure cause the device to stop automatically the case. 在那种情况下,会丧失精确的对准,但是各种配件对会防止模版1从自动操纵机械手4脱落。 In that case, precise alignment would be lost, but will prevent the various accessories of the template 1 from falling off robot gripper 4.

[0087] 最后,在用于具有一个长范围自由度(例如沿着Y轴扫描的)扫描光刻系统的实施方案中,预对准器可能不必沿着与平台7的扫描轴相一致的自由度校正位置误差。 [0087] Finally, in a wavelength range having a free degree of freedom (e.g. scanned along the Y axis) embodiment of a scanning lithography system, the pre-aligner may not necessarily coincide with the platform along a scan axis 7 position error correction. 只需测量位置误差,并将其通知至平台控制器,然后该控制器通过在扫描过程中相应的偏移平台Y位置而补偿位置误差。 Simply measuring the position error, and notifies to the platform controller, the controller then compensated by a corresponding offset of the position error Y platform location during the scan.

[0088] 因此,在各实施方案中,各种配件对可以导致只具有一个水平平移自由度的预对准器中的精度操纵器,该自由度在实施例中是X方向,Z和Θ ζ方向也同样需要的。 [0088] Thus, in various embodiments, the various feature pairs can result in only one horizontal translational degree of freedom in the pre-aligner precision manipulator, the degree of freedom in the embodiment the X-direction, Z and Θ ζ direction is also needed. 因此, 在预对准器中的精度操纵器的设计可以针对扫描光刻工具而简化。 Thus, design accuracy of the manipulator in the pre-aligner can be simplified for scanning lithography tools.

[0089] 图5表示描述本发明实施方案的方法500的流程图。 [0089] FIG. 5 flowchart illustrating a method described embodiments of the present invention 500. 方法500可以是利用两件式盖子的对准和转移方法。 The method 500 may be aligned and a transfer method using a two-part cover. 在步骤501,用面板中的第一套配件对以及预对准器中的相应配件对,面板/框架/模版组件可以被运动地对接至预对准器。 In step 501, a panel and a first set of feature pairs in the pre-aligner to the respective parts, the panel / frame / template assembly can be kinematically docked to a pre-aligner. 在步骤502,测量模版相对于预对准器的位置和角度偏移。 502, the step of measuring the template offset and angular position with respect to the pre-aligner. 在步骤503,操纵框架以对测量的偏移进行校正,它将模版相对于面板重新定位。 In step 503, the manipulation frame offset correction on the measurement, the template will be repositioned relative to the panel. 在步骤504,面板/框架/模版组件被从预对准器中拿取。 In step 504, the panel / frame / template assembly is to pick up from the pre-aligner. 在步骤505, 面板/框架/模版组件被移动至平台加载位置,几乎没有相对滑动。 At 505, the panel / frame / template assembly is moved to the stage loading position step, almost no relative sliding. 在步骤506,利用面板中的第二套配件对以及平台中的相应配件对,面板/框架/模版组件被运动地对接至平台。 In step 506, using the second set of feature pairs in the panel and corresponding parts of the platform, the panel / frame / template assembly is kinematically docked to the internet. 在步骤507,模版和框架用内置于平台中的夹持装置(例如分别是静电卡盘和机械闩锁)来固定。 In step 507, the frame for the template, and built in the platform retaining means (e.g. electrostatic chuck and are mechanical latch) is fixed. 在步骤508,除去面板而暴露模版。 In step 508, the panel is removed to expose the stencil.

[0090] 如前所述,当在EUV工具中处理和对准模版时,本发明的实施方案用于显著地减少颗粒污染的产生.在传统的系统中,不使用盖子,在每一次将模版从SMIF吊舱中除去/ 重新放置在该SMIF吊舱中时,在每次将其放置在真空内的库中或从其中除去时,在每次将其加载和卸载在平台处时,都形成/打破了模版接触。 [0090] As described above, when handling and aligning the template in the EUV tool, embodiments of the present invention is used to significantly reduce particle contamination. In conventional systems, without lids, in each stencil when removed from the SMIF pod / reposition the SMIF pod, each time it is placed in a vacuum library, or removed from wherein, each time it is loaded and unloaded at the platform, is formed / break contact with the template.

[0091] 根据本发明的实施方案,如上和如下所述,通过使用两件式盖子可以对传统的系统进行改进。 [0091] According to an embodiment of the present invention, described above and below, may be modified by conventional systems using a two-part cover. 模版和框架之间的接触不会再被打破,因为框架保持为与模版接触,即使在曝光过程中也是这样。 The contact between the template and the frame will not be broken because the frame remains in contact with the stencil, even during exposure as well. 已经设想在处理模版的同时在模版的表面产生的颗粒数目直接根据与模版表面的机械接触的形成/打破的次数而变化。 We contemplated that the number of particles has been produced in the stencil surface while processing the stencil varies according to the number of direct mechanical contact with the stencil surface / broken. 通过完全消除在光刻工具中形成/打破与模版的接触的需要,与通过机械手直接搬运模版相比,两件式盖子相对于传统的方法中所教导的一件式盖子有了明显的改进,而传统的方法仅仅是减少了与模版表面直接相关的颗粒产生事件的数量。 Formed by completely eliminating the need for the contact / breaking the template in the lithography tool, as compared with the stencil conveyed by the robot directly to the two-part cover with respect to a closure lid marked improvement in the conventional method as taught, the traditional method of simply reducing the particle surface of the stencil directly related to the number of events produced.

[0092] 本发明该实施方案的两件式盖子也可以使用用于和模版接触的柔软材料,而不必太多顾及该柔软材料的耐用性,因为在原则上避免了重复的磨损作用。 [0092] The two-part cover of the embodiment of the present invention may also be used a soft material for contacting the stencil and without too much regard to durability of the soft material, since repeated abrasive action is avoided in principle. 利用精选的柔软材料估计可以减少在模版最初放置在框架的过程中的表面损坏和颗粒产生。 Estimated using a soft material selection can reduce the damage and particle generation during stencil initially placed in the frame surface. 柔软的材料例如柔软的聚合物可以易于流动,从而是顺应于而不会划伤模版的精致抛光表面。 A soft material such as flexible polymer can easily flow to conform to a polishing surface without scratching delicate stencil.

[0093] 相反,在不使用两件式盖子和直接利用自动操纵机械手搬运模版的传统系统中, 需要在机械手的接触点上有硬质材料以使得机械手具有可接受的耐用性。 [0093] In contrast, in the conventional system does not use a two-piece lid and directly stencil conveying robot gripper, the need for hard material at the contact point of the robot so that the robot has acceptable durability. 一件式盖子的接触点的最好的硬度取中间值,因为还有一些接触事件,但不是很多。 The best hardness of the contact piece lid points intermediate value, since some contacting events, but not many. 但是通过使用本发明的实施方案的两件式盖子,当发生变形而使得精度不可接受时,可以进行更换。 However, by using a two-part cover according to embodiments of the invention, when the deformation occurs such that when precision is unacceptable, can be replaced. [0094] 本发明实施方案的两件式盖子也易于将模版与平台预对准。 [0094] A two-piece cover embodiment of the present invention is also easy to align the stencil with the pre internet. 这样即使利用低精度的自动装置,可以实现从预对准器到平台的精确最后转移。 Thus even with low-precision automatic apparatus can achieve precise final transfer from the pre-aligner to the platform.

[0095] 本发明的两件式盖子比自动操纵机械手更容易的保持清洁。 [0095] The two-part cover according to the present invention than the robot gripper is easier to keep clean. 而位于光刻工具深处和真空中的自动操纵机械手需要进入式的维护,所以每次将模版从光刻工具中弹出来清洁或者更换盖子要方便得多。 Located deep lithography tool and in vacuum robot gripper require maintenance-entry, so each shot from the reticle cleaning or replacement of the lid lithography tools much more convenient.

[0096] 本发明对利用SMIF吊舱的示例性光刻环境进行了描述。 [0096] The present invention is of an example lithography environment using a SMIF pod exemplary are described. 这样的描述只是为了方便起见。 Such descriptions are merely for convenience. 而不是要将本发明限制在这些示例性的环境中。 But not to limit the invention in these example environments. 事实上,在阅读了以下的描述之后,相关领域的技术人员可以理解如何在现有已知和未来发展的替换环境中实施本发明。 In fact, after reading the following description, the related art will be understood in the art how to implement the invention in alternative environments known in the prior and future development.

[0097] 因此,根据本发明的实施方案,使用一种系统和方法来拟运动学地将模版与保护盖子对准。 [0097] Thus, according to an embodiment of the present invention, a system and method for using quasi kinematically stencil is aligned with the protective cap. 这样可以在预对准测量和转移至模版平台中维持模版的精确相对位置关系,由此避免了将模版在模版预对准过程中在光刻工具中重新进行机械定位。 Such pre-alignment measurement may be transferred to the stencil and the platform maintain precise relative positional relationship of the template, thereby avoiding a stencil reticle during pre-alignment in the re-positioning mechanical lithography tool. 第二,本发明披露了一种硬化模版接触区域的方法,从而在模版与盖子接触的时候产生较少的颗粒。 Second, the present invention discloses a method of hardening stencil contact area, resulting in fewer particles in contact with the cover when the stencil.

[0098] 图6表示本发明实施方案的两件式盖子102。 [0098] FIG. 6 shows a two-part cover 102 embodiment of the present invention. 模版1具有能够与框架2中的对准配件精确对准的边缘601。 Template 1 has a frame 2 can be aligned with the edge 601 fitting precisely aligned. 在一个实施方案中,在模版1的边缘601中至少是接触运动对准配件602的部分进行倒角。 In one embodiment, the edges 601 of reticle 1 are at least partially aligned with the contact movement the chamfered parts 602. 在另一个实施方案中,模版1的边缘601的该部分成圆角而不是斜面。 In another embodiment, an edge of the stencil portion 601 is radiused instead of the inclined surface. 在又一个实施方案中,在模版1边角处的改进边缘部分的交点在每个边角中产生球形或者圆环形(toroid)扇区(球形或者圆环形的八分之一),然后它与框架2的每个边角中的可适用的对准配件602通过界面接合。 In yet another embodiment, the generation (one-eighth of a spherical or circular), or a spherical annular (Toroid) sectors in each corner at the intersection of the edge portion of an improved stencil at the corner, and then its interface is engaged with each corner of the frame 2 in applicable parts 602 are aligned. 用户可以选择该改进的模版边缘601的哪些部分要被接触,而哪些部分不被接触。 The user can select the modified template edge portion 601 which is to be contacted, and which portion is not in contact.

[0099] 关于框架2中的对准配件602,其位置不限于如图6所示的框架的边角。 [0099] About 602 parts of the frame 2 is aligned, which position is not limited to a corner of the frame shown in Figure 6. 但是在优选的实施方案中,这可能是一个优选的位置。 However, in a preferred embodiment, this may be a preferred location. 例如,框架2可以在每一侧的中部具有对准配件602。 For example, the frame 2 may have a fitting 602 aligned in the middle of each side. 显然,对准配件602的实际形状可以是不同的,以最好的容纳模版边缘601。 Obviously, the actual shape of the alignment fitting 602 may be different in order to best accommodate the stencil edge 601. 例如,在一个实施方案中,对准配件602可以是V形槽,沟槽602的每个面603是平的。 For example, in one embodiment, the accessory 602 may be aligned with V-shaped grooves, each groove 602 face 603 is flat. 这种特定的形状适合于容纳在模版边缘601的圆角。 This particular shape adapted to receive the rounded edge 601 of the stencil. 可以理解,在其他实施方案中,如果模版边缘601是倒角的,它们最好由对准配件602中的凹形(而不是平的)沟槽表面来容纳。 It will be appreciated that in other embodiments, if the template is chamfered edges 601, which are preferably aligned to receive a female fitting 602 (instead of flat) groove surfaces.

[0100] 根据本发明的一个实施方案,使用对准配件602可以省略图5中的步骤503。 [0100] According to an embodiment of the present invention, the step of using the alignment parts 602 are omitted in FIG. 5 may be 503. 这是非常有利的,因为会需要相当复杂的预对准机构来操纵框架2。 This is very advantageous, because it will take quite a complicated pre-alignment mechanism to manipulate the frame 2. 通过消除了对框架2相对于面板3重新定位的需要,简化了光刻工具的设计。 By eliminating the need for frame 2 relative to panel 3 repositionable, simplifies the design of the lithographic tool.

[0101] 图7表示本发明一个实施方案的系统100。 [0101] FIG. 7 shows a system 100 of the embodiment of the present invention. 框架2可以保持模版1,并通过第一套运动的对准配件对201a和201b与面板3运动地对准。 2 stencil frame 1 can be kept, and by fitting the alignment of the first set of motion 201a and 201b are aligned with the panel 3 kinematically. 类似的,面板3可以通过第二套运动的对准配件对202a和202b与自动操纵机械手4运动地对准。 Similarly, panel 3 can be aligned with the second set of motion of the parts 202a and 202b robot gripper 4 passing through aligned movement. 另外,可以使用第三套运动对准配件对203a和203b将面板3与真空库架和总的由13表示的SMIF吊舱基板进行运动对准。 Further, a third set of motion may be used to align parts 203a and 203b will align panel 3 to vacuum library motion total SMIF pod holder and the substrate 13 is represented.

[0102] 在图7所示的实施方案中,运动配件202a和203b共用同一个沟槽,202a在沟槽的最里面通过界面连接至202b,203a在沟槽的最外面通过界面连接至203b.对于本领域的技术人员来说,很明显该相对位置是可以颠倒的。 [0102] In the embodiment shown in FIG. 7, the moving parts 202a and 203b share the same groove, the groove 202a is connected through the interface to the innermost 202b, 203a 203b are connected through an interface to the outermost trench. those skilled in the art, it is clear that this relative position may be reversed. 显然,分开的沟槽用于实现运动配件的每个。 Obviously, separate grooves for implementing each sport accessories.

[0103] 在另一个实施方案中,可以使用一件式盖子。 [0103] In another embodiment, a closure lid may be used. 在该实施方案中,框架2可以固定于(例如粘结或者由同一块材料制成)面板3,以形成一件式盖子。 In this embodiment, the frame 2 may be secured to (e.g., an adhesive material or made of the same) panel 3, to form a closure lid. 该一件式盖子全部被除去, The entire one-piece cover is removed,

15以进行模版1的光刻曝光。 15 is a stencil lithographic exposure. 因此,在该一件式盖子的实施方案中可能不需要配件对201a和201b。 Thus, in the embodiment of the one-piece cover may not be required for fitting 201a and 201b.

[0104] 硬化的樽版 [0104] hardened version of bottles

[0105] 已经知道,模版1的EUV反射涂层的特点是易损和柔软的。 [0105] It is known EUV reflective coating of the stencil is characterized by soft and vulnerable. 因此,该涂层在接触时易于产生颗粒。 Thus, the coating particles are easily generated upon contact. 因此理想的是具有一个无EUV反射涂层的特定区域。 It is therefore desirable that a particular region having a non-EUV-reflective coating. 它可以用于由其反射侧支撑或者传送模版1。 It can be used by the reflected or transmitted side supports reticle 1. 为此,更硬的衬底材料将变为不被覆盖的也就是“暴露的”表面。 To do this, a harder substrate material becomes covered is not "exposed" surface. 遗憾的是,实际上产生一个使裸露的模版衬底暴露的区域(也就是裸点)是非常困难的。 Unfortunately, in fact, produce a template so bare substrate exposed area (ie, bare spots) is very difficult. 产生裸点的一种已知的方法是使用在沉机EUV反射涂层的粒子束溅射过程覆盖它们的掩模。 One known method for producing bare spots is to use a heavy particle beam sputtering machine EUV-reflective coating mask covers thereof. 这种方法的一个问题是由于沉积过程的性质,易于在掩模上形成松散的颗粒或者薄片,并在该过程结束除去掩模的时候会脱落,一些颗粒或者薄片会落在模版上并将其污染。 One problem with this approach is that due to the nature of the deposition process, easily formed on the mask loose particles or flakes, and the process ends when the mask is removed will fall off, or some of the particles will fall on the stencil sheet and Pollution. 另一个暴露衬底的区域的方法是从设计用于传送的区域中选择性蚀刻EUV反射涂层。 Another method of the exposed substrate region is a region designed for transmission from the selective etching EUV-reflective coating. 该方法的问题在于该蚀刻过程也易于损坏模版的其它区域。 The problem with this approach is that the etching process is also easy to damage other areas of the stencil.

[0106] 看起来仅通过使用如本说明书中所述的成圆角的或者倒角的边缘就可以解决支撑模版的问题。 [0106] appear only can solve the problem by using a stencil support radiused as described in this specification or bevelled edges. 但是实际上并不如此,因为EUV反射涂层的脆弱性决定了空白的衬底在被涂布之前其边缘必须已经加工成最后的形状,并且由于沉积涂层的溅射过程的均勻的、非选择性的覆盖,未被掩盖的倒角或者成圆角的边缘也会涂布有脆的材料。 But in fact is not the case, since the fragility of the EUV-reflective coating is determined before the blank substrate must already be coated edges thereof machined to final shape, and since uniform sputter depositing a coating process, non- selective coverage, the unmasked chamfered or radiused edges will be coated with a brittle material.

[0107] 为了解决上述问题,已经提出用更硬的材料涂布EUV反射材料。 [0107] In order to solve the above problems, there has been proposed a coating with a harder material EUV reflective material. 对这种材料的通常选择是沉积在EUV反射材料顶部上并被选择性蚀刻从而产生或者“写上”模版图案的EUV 阻挡层。 Selection of such a material is typically deposited and selectively etched to produce EUV reflective material on top of the EUV-blocking layer or "write" a pattern template. 遗憾的是,为了具有正确的光学特性,该层必须是非常薄的。 Unfortunately, in order to have the correct optical properties, this layer must be very thin. 在柔软反射材料顶部上的薄的阻挡层在机械搬运接触的高水平应力下容易破裂。 A thin barrier layer on top of the soft reflective material is easily cracked at a high level of mechanical handling contact stress. 可以在阻挡层顶部上加上一个厚层并对其进行选择性蚀刻,但是价格昂贵并且也未经过试验证实。 It may be added on top of a thick barrier layer and subjected to selective etching, but also expensive and has not been confirmed by experiment.

[0108] 因此,需要一种能够补救反射涂层的固有柔软性和脆性,而不需要掩盖或者要除去涂层来产生裸点的过程。 [0108] Accordingly, a need for a reflective coating to remedy the inherent brittleness and flexibility, without the need to remove the coating or masking process to produce a bare spot. 也需要一种在所选接触区域中不需要裸点也不用覆盖附加保护层的方法。 You need not be a need for a method of bare spots in the selected contact areas do not have to cover an additional protective layer.

[0109] 有猜想认为EUV反射涂层的固有柔软性是由于它的多层性质。 [0109] There has been speculation that the inherent flexibility of the EUV-reflective coating is due to its multi-layered nature. 如该领域所知,EUV 反射层迄今为止的“多层结构”或者简单的表示为“多层”可以包括约100个钼和硅的交替层,每个成分的层仅有几个纳米厚。 As known in the art, the EUV reflective layer date "multilayer structure" or simply expressed as "multi-layer" can include about 100 alternating layers of molybdenum and silicon, only a few nanometers thick layer of each component. 不论是硅还是钼通常都不是柔软的材料。 Whether silicon or molybdenum is usually not the soft material. 因此,,根据本发明的实施方案,这些材料在理想的接触点处可以局部熔融在一起,以将柔软的多层结构转变为更硬的勻质的合金材料层。 Thus ,, according to an embodiment of the present invention, these materials at the desired contact points may be locally melted together, to convert the soft alloy material layer of the multilayer structure is harder homogeneous. 仅为了方便起见,我们将多层局部转变为更硬物质的过程称之为“局部热处理”。 Merely for convenience, we will transition local multilayer called "localized heat treatment" for the process of the harder substance.

[0110] 在一些实施方案中,不需要完全熔化该多层,以获得理想的硬度。 [0110] In some embodiments, the multi-layer need not be completely melted to achieve the desired hardness. 这是因为已经知道热导致多层中的每种材料快速的扩散到另一种中,由此形成更均质的层。 This is because it is known to heat results in rapid diffusion of another multiple layers of each material, thereby forming a more homogeneous layer. 即使在温度低于多层的成分中任一种的熔点的温度也可以发生这种情况。 Even if any one of a melting point at a temperature below the temperature of the multilayer component This situation can also occur. 因此,显然,也可以采用局部热处理,以通过互相扩散来代替熔化而将多层转变为勻质的层。 Thus, obviously, local heat treatment may be employed, to each other by diffusion instead of melting the multilayer converted homogeneous layer.

[0111] 在其他实施方案中,外来物质在层上的沉积和扩散可以用于增强该层。 [0111] In other embodiments, deposition and diffusion of foreign substances on a layer can be used to enhance the layer. 因此,对存在外来物质的接触区域,为使该物质加入该层而进行的局部加热,作为热处理过程。 Thus, the presence of foreign matter on the contact area, the substance is added to the layer for localized heating, as the heat treatment process.

[0112] 图8表示本发明实施方案的方法800的流程图。 [0112] FIG. 8 shows a flowchart of a method embodiment 800 of the invention. 方法800可以用于通过将多层结构的EUV反射涂层进行局部转换而强化模版中的用于搬运的区域。 The method may be used for the local converter 800 by the EUV-reflective coating of the multilayer structure is reinforced by the template area for handling. 在步骤802中,进行用EUV反射多层结构(钼-硅或者钼-钌_硅多层,如在现有技术中的状态)涂布模版衬底的 In step 802, performed with EUV reflective multilayer structure (Mo - Si or Mo - Si multilayer _ ruthenium, as in the prior state of the art) template substrate coated

16操作。 16 operation. 在步骤804中,对要用于搬运的区域进行局部的热处理,从而将多层结构的局部热处理部分转变为更强的(更硬、更坚固)的材料。 In step 804, a region to be used for handling local heat treatment, so that the local heat treatment of the portion of the multilayer structure into a stronger (harder, more rigid) material.

[0113] 在一个实施方案中,可以通过例如有包括反应性试剂和催化剂的化学物质存在情况下将大功率激光束聚焦在模版的特定区域中进行步骤804。 [0113] In one embodiment, for example, by the presence of a catalyst comprising the reaction of chemical reagents and a case where the step of high-power laser beam is focused in a particular region 804 of the stencil. 可以使用其他类型辐射能量来代替激光束。 Other types of radiant energy may be used instead of the laser beam. 可以使用其他局部加热方法,例如利用射频电磁场的感应式加热。 Other localized heating methods may be used, for example, using a radio frequency electromagnetic field induction heating.

[0114] 典型的EUV模版衬底材料和多层结构自身的低导热性便于专门对所需区域进行局部的多层转变。 [0114] A typical multilayer EUV stencil and substrate material of low thermal conductivity of the structure itself to facilitate specifically localized areas desired multilayer transition. 可以进行这一点,而不用过于担心在模版的有图案场区内或者附近无意识的改变了该EUV反射材料。 This can be carried out without too much worry there is a template or pattern field region near the unintended change the EUV reflective material. 该多层结构应当保持为完整无缺的,以保持其独特的光学性质。 The multi-layer structure should remain intact in order to retain its unique optical properties. 按照在本说明书中建议的将接触区域设置在模版1的边角处使得它们距离该有图案的场区的距离最大化,因此使得对接触区域局部热处理的影响对于关注的模版有图案的场区的光学特征而言最可以忽略的。 As recommended in the present specification, the contact region such that they are arranged to maximize the distance from the field area in a patterned stencil corners 1, so that the influence on the contact areas for the local heat treatment stencil interest patterned field region optical characteristics in terms of the most negligible.

[0115] 基本平的樽版盖子 [0115] substantially flat plate bottle cap

[0116] 图9-11表示本发明实施方案的模版盖子(reticle cover)是902。 [0116] 9-11 show an embodiment of the template of the present invention the lid (reticle cover) is 902. 在预定时刻可以除去的模版盖子902保护模版(例如掩模(mask))901。 It can be removed at a predetermined timing stencil stencil protective cover 902 (e.g., a mask (mask)) 901. 模版盖子902对一定的光波长可以是透明的,其包括:支撑垫或者垫圈903 ;嵌套销904 ;运动定位器(例如掩模定位器)905 ;以及孔906。 Template lid 902 pairs of certain wavelengths of light may be transparent, comprising: a support pad or washers 903; nesting pins 904; motion locator (e.g., mask locators) 905; and a hole 906. 孔906可以用于在盖子902和模版901之间注入加压气体清扫,该孔还可以包括空气过滤器。 Holes 906 can be used to inject pressurized gas sweep between cover 902 and the stencil 901, the aperture may further include an air filter. 可以使用各种材料来制造垫903和销904,以使它们在接触或者脱离模版901的时候不会损坏模版901或者散发出颗粒。 Various materials can be used to manufacture the pad 903 and the pin 904, so that they are in contact with or out of the stencil, when 901 or 901 will not damage the stencil emit particles. 因为在模版901和嵌套销904之间可能需要一些间隙来除去盖子902,模版会相对于盖子902有少量的滑动。 Because some clearance may be required between the template 901 and the nesting pins 904 for removing the cover 902, the cover 902 with respect to the template will be a small amount of slip. 对上述实施方案的改进是该盖子902基本是平的。 Improvements to the above embodiments is that the cover 902 is substantially flat. 通过采用基本平的设计,在清洁过程中会存留更少的液体,因为没有可以存留液体的袋或者是腔穴。 By using substantially planar design, the cleaning process will remain in the less liquid, because there is no liquid storage bag or a cavity. 因此,盖子902是容易清洁或者是“超净的(superclean) ”。 Thus, the cover 902 is easy to clean or "ultraclean (Superclean)." 在某些实施方案中,在池里对盖子902超声波清洁、漂洗、和离心烘燥清洁。 In certain embodiments, the cover 902 of an ultrasonic pool cleaning, rinsing, cleaning and drying centrifugation. 因此,与传统复杂的盖子由于其自身结构的原因而非常难以清洁相反,盖子902非常容易清洁。 Thus, the conventional cover due to its complicated structure itself is very difficult to clean the contrary, the cover 902 is easy to clean.

[0117] 双重包套的模版盒(例如模版吊舱) [0117] double wrap box stencil (stencil e.g. car)

[0118] 图12-13分别表示本发明实施方案的模版盒(reticle box)或者吊舱(pod) 1250 (以下都称为“吊舱”)的侧视图和分解图。 [0118] Figures 12-13 represent the embodiment of the template of the present invention, the cartridge (reticle box) or pod (pod) 1250 (both hereinafter referred to as "pod") is an exploded side view and FIG. 图17显示了示例性吊舱1250的更多特征,以下将会详细描述。 17 shows additional features of the exemplary nacelle 1250, will be described below in detail. 吊舱1250包括可以气密的外盒1252,该外盒具有一基部1254, 基部1254固定到盖子或者是罩1256其可以是通过闩锁(未显示)而固定的。 Pod 1250 can include a gas-tight pack 1252, the pack having a base 1254, base 1254 is fixed to the lid or cover 1256 which may be by a latch (not shown) and fixed. 板1258类似于上面的盖子902,可以基本是平的,没有孔或者腔穴,这样减少了颗粒的产生,并使得板1258清洁起来更容易。 1258 cover plate 902 similar to the above, may be substantially flat, without holes or cavities, thus reducing the generation of particles, plate 1258 and so easier to clean up. 而且,因为不需要螺丝等,所以产生的颗粒更少。 Further, since no screws or the like, so that fewer particles generated. 可以使用颗粒密封装置1260(例如内部或者第一包套)来保护模版免受颗粒侵害,并可以使用气体密封装置1262 (例如外部或者第二包套)来使得该外盒1252气密封,它保护着内部或者第一包套1263不受分子污染。 Particle sealing device 1260 may be used (e.g., inner or first wrap) to protect the particles against the stencil from, and can use a gas sealing device 1262 (e.g., a second or outer wrap) to the outer case 1252 such that the gas seal, which is protected the inner or first wrap 1263 against molecular contaminants. 当吊舱1250封闭时,颗粒密封装置1260在气体密封装置1262之前啮合,并且在吊舱1250打开时在气体密封装置1262之后解开。 1250 when the pod is closed, the particle sealing device 1260 engages before the gas sealing device 1262 when the pod 1250 and 1262 open to unlock after the gas sealing device. 这与传统的缺少气体密封装置(因为不使用真空)和颗粒密封装置的系统相反。 This lack of a conventional gas seal means (since no vacuum) system and a sealing means opposite particles.

[0119] 外盒1252内固定有透气的内膜盒1263,它用于防止微粒污染,并具有可拆卸的部分以便于清洗。 [0119] breathable lining fixed cassette pack 12,521,263, which is used to prevent particulate contamination, and has a removable portion to facilitate cleaning. 内膜盒1263包括圆顶1264 (例如Pyrex :®玻璃圆顶),它可以具有与板1266 (例如由聚酰亚胺、ESD级聚醚酰亚胺等制成或者涂布有聚酰亚胺、ESD级聚醚酰亚胺等)耦合的薄壁(例如2mm)。 Endometrial cartridge 1263 includes a dome 1264 (e.g. Pyrex: ® glass dome) which can have a plate 1266 (e.g., made of polyimide, the ESD grade polyetherimide, or the like made of polyimide coated with ) coupled to thin-walled, ESD grade polyetherimide (e.g., 2mm). 模版1和模版盖子102 (例如由Pyrex 玻璃等制成)设置在能与自动操纵机械手(未示出)相互作用的内膜盒1263内。 Template 1 Template and cover 102 (e.g., made of Pyrex glass or the like) disposed within the cartridge capable of interacting with the intima robot gripper (not shown) of 1263. 可以使用装置1268 (例如弹簧等)将圆顶1263耦合至罩1256,并向内膜盒1263施加保持压力,使模版1在传输过程中不会移动。 Apparatus 1268 may be used (e.g., a spring) 1263 is coupled to the dome cover 1256, and applies a pressure to maintain endometrial cassette 1263, so that the stencil 1 does not move during transmission. 也可以压颗粒密封装置1260。 Pressure sealing means may be 1260 particles. 模版1的表面1302可以是玻璃的、镀铬(例如Cr镀覆)或者利用其他耐用材料镀覆的。 The template 1302 may be the surface of a glass, chrome (Cr e.g. plating) or by using other durable material plated. 在使用过程中,吊舱1250的盖子或者罩1256可以除去以拿取模版1。 During use, the pod cover or lid 1250 of 1256 to pick up the stencil 1 can be removed. 过滤的通道1304可以将包括在圆顶1264和板1266之间的空间与包括在吊舱1250内的其它空间相连,允许气体在两个空间之间流动,但是防止颗粒流动。 The filter 1304 may include a channel space between the dome 1264 and the plate 1266 and the space within the other and connected to the pod 1250, allowing gas to flow between the two spaces, but preventing particle flow. 过滤的通道1304的示例可以是穿过圆顶1264的壁覆盖有薄膜气体过滤器等的孔。 Example filtered passage 1304 can be a hole through the wall of the dome 1264 covered with a film of a gas filter or the like. 另一个示例可以是穿过板1258塞有烧结的粉末金属气体过滤器等的孔。 Another example may be a hole through the plate 1258 plugged with a sintered powder metal gas filter and the like. 可以理解,可以使用其他的位置和过滤装置,如该领域所已知的。 It will be appreciated, other locations and filtering devices, as known in the art. 对准装置1306可以具有聚酰亚胺涂布的接触表面。 The alignment device 1306 may have a contact surface of the polyimide coated.

[0120] 用于制造吊舱1250各部分的上述示例材料减少了颗粒的产生。 [0120] Examples of materials for manufacturing the above-described portions of the pod 1250 reduce generation of particles. 可以理解,这些材料只是优选的示例,可以使用其他已知的材料。 It will be appreciated that these materials are only preferred examples, other known materials may be used.

[0121] 吊舱1250可以分两个阶段打开,如以下关于系统使用技术所详细描述的。 [0121] pod 1250 can be opened in two stages, as described below on systems using the techniques described in detail. 首先, 罩1256升高预定的高度,以打破气体密封装置1262所形成的气体密封。 First, the cover 1256 is raised a predetermined height, the gas to break the gas seal 1262 formed seal. 这样使得气体流入到吊舱1250中,并且颗粒随着气体被传输。 Such that the gas flows into the pod 1250, and the particles as the gas is transmitted. 但是颗粒不会直接到达模版1。 But the particles do not directly reach the reticle 1.

[0122] 气体流动通过该过滤的通道1304,将圆顶1264内的压力与外界的压力相平衡。 [0122] the gas flow through the channels 1304 of the filter, the pressure and the outside pressure within the dome 1264 equilibrium. 第二,因为罩1256可以连续的升起,圆顶1264可以升高离开板1266。 Second, since the cover 1256 can be continuously lifted, the dome 1264 can be lifted off the plate 1266. 在前述步骤中圆顶1264 内的压力已经与外界压力平衡之后,当圆顶1264升起离开时在圆顶1264内或者是外没有明显的气体或者颗粒的流动。 After the pressure inside the dome 1264 has a pressure equilibrium with the outside world in the preceding step, when the dome 1264 in the dome 1264 lifted off the outer or no significant flow of gas or particles. 在这些实施方案中,圆顶1264、板1266或者是这两者都是透气的,也就是它们允许气体流动以避免圆顶1264内外之间产生压力差。 In these embodiments, the dome 1264, the plate 1266, or both are permeable, i.e., they allow the flow of gas in order to avoid a pressure difference between inside and outside the dome 1264.

[0123]负载锁(load lock) [0123] Load lock (load lock)

[0124] 图14-15分别表示本发明实施方案的负载锁的侧视图和分解视图。 [0124] Figures 14-15 represent the embodiment of the loadlock embodiment of the present invention and an exploded side view. 在一个实施方案中,模版1401 (可以在支撑销1404的顶部上)和模版盖子1402设置在基部1403和圆顶1405之间。 In one embodiment, the template 1401 (may be on top of the support pin 1404) and templates cover 1402 is provided between the base 1403 and a dome 1405. 圆顶除去装置(例如圆顶抬升器)1406包括电机1407、导螺杆1408以及波纹管(bellow) 1409。 Dome removing device (e.g., a dome lifter) 1406 comprises a motor 1407, a lead screw 1408, and bellows (bellow) 1409. 负载锁也包括用于大气侧和真空侧门阀的开口1410。 Loadlock also comprises an opening for atmospheric side and vacuum side gate valves 1410. 所有的上述部件都设置在底部(例如真空壳)1411和顶部(例如真空壳顶)1412所形成的封套中。 All the components are disposed on the top 1411 and bottom (e.g. vacuum shell) (e.g., vacuum shell roof) of the envelope 1412 is formed. 负载锁还可包括基本与吊舱圆顶的开口端一致的密封底座和/或颗粒密封装置,用于防止颗粒在圆顶和底座之间流动。 Loadlock further comprises a substantially coincides with the open end of the dome of the pod seal base and / or particle sealing device for preventing particle flow between the dome and the base. 负载锁还可包括过滤的通道1413 (例如穿过圆顶壁的孔,并且覆盖有薄膜气体过滤器),它使圆顶内的气体压力与圆顶外的气体压力相平衡,还包括用于检测负载锁内空气运载(airborne)或者气体运载(以下都称为空气运载)颗粒的装置(例如传感器或者检测器)。 Loadlock further comprises filtering a channel 1413 (e.g., a hole through the dome wall, and covered with a thin film gas filters), that the gas pressure outside the gas pressure inside the dome with the dome equilibrium, further comprising means for the air lock detecting a load carrier (Airborne) or carrier gas (both hereinafter referred to as an air carrier) particles, means (e.g., sensors or detectors).

[0125] 通常,负载锁是非常脏的,主要是因为密封以对负载锁进行抽空或者通风的门阀所致。 [0125] Generally, the load lock is very dirty, mainly because of gate valve seal for ventilation or due to evacuation of the load lock. 每次进行密封或者开启密封时,产生了空气运载或气体运载的颗粒而且,门阀是复杂的机械组件,具有许多导致移动、磨损和摩擦的部件以及润滑剂。 Each seal or sealing the open, generating an air or gas carrying particulate carrier and, gate valve assembly is mechanically complex, with many caused to move, the friction and wear parts and a lubricant. 这样导致污物集聚在负载锁的内部。 This results in the accumulation of dirt inside the load lock. 在负载锁的通风过程中,气体流入负载锁并将其压力与大气压力相平衡,导致颗粒产生运动。 In the draft process loadlock, gas flows into the loadlock and the atmospheric pressure and the equilibrium pressure, causes the particles to generate motion. 而且,当抽空负载锁时,气体流出负载锁,导致了颗粒的流动。 Further, when evacuating the loadlock, gas flows out of the load lock, resulting in the flow of particles. 因此,根据本发明的实施方案,通过将模版封装在圆顶和板内,保护模版不受颗粒伤害。 Thus, according to an embodiment of the present invention, by a dome and housed within the stencil plate, stencil protection from particulate damage.

[0126] 模版搬运装置 [0126] stencil conveying means

[0127] 图16-17分别表示本发明实施方案的模版搬运核心(reticle handlercore) 1701和模版搬运系统。 [0127] Figures 16-17 represent the reticle handler core embodiment of the present invention (reticle handlercore) 1701 and a reticle handler system. 模版搬运系统包括:核心环境(例如真空和微环境)以及大气(空气) 环境。 Template transfer system comprising: a core environment (e.g., vacuum and microenvironment) and atmospheric (air) environment. 核心环境基本位于模版搬运核心1701内。 The basic core environment located within the reticle handler core 1701. 参考图16,模版搬运核心1701包括在真空腔1602内的模版1601。 16, reticle handler core 1701 comprises a template in the vacuum chamber 1601 1602. 模版1601通过可以具有两个臂的真空自动装置1603移动通过真空腔1602。 Stencil move the vacuum robot 1601 through 1603 may have two arms 1602 through the vacuum chamber. 模版核心1701也包括在真空腔1602和加工腔之间的门阀1604。 The core also includes a gate valve 1701 template between the vacuum chamber 1602 and the process chamber 1604. 模版核心1701还包括具有负载锁涡轮泵1606和负载锁门阀1607的负载锁1605。 The core 1701 further comprises a stencil having a loadlock turbo pump 1606 and loadlock gate valve of the load lock 16051607. 模版核心1701还包括打开吊舱1609的脱吊舱器(cbpodder) 1608。 The core 1701 comprises a further opening stencil nacelle de-podder 1609 (cbpodder) 1608. 负载锁和脱吊舱器中的开口连接至清洁空气微环境腔1610,并可以通过微环境自动装置1611而进出。 Loadlock opening and the de-podder connect to a clean air chamber 1610 microenvironment, and can be out by micro-environment robot 1611.

[0128] 在操作过程中,从打开的吊舱1609中通过微环境自动装置1611除去模版(该图中看不见)。 [0128], (not visible in the figure) removing the stencil during operation from an open pod 1609 by a micro-environment robot 1611. 然后该模版通过门阀(gate valve) 1607放置在负载锁1605内。 The template is then through the gate valve (gate valve) 1607 is placed inside loadlock 1605. 抽空负载锁, 利用真空自动装置1603将模版从负载锁中除去。 Loadlock evacuated, by the vacuum robot 1603 is removed from the load lock stencil. 利用自动装置1603将模版1601传输通过真空腔1602,并通过门阀1604放置在加工腔(图中未显示)内。 1603 using robot 1601 stencil transmitted through vacuum chamber 1602, and placed in a process chamber (not shown) through the gate valve 1604. 在加工之后,真空自动装置1603将模版从加工腔内通过门阀1604除去,并通过门阀1607放置在负载锁1605内。 After processing, the vacuum robot 1603 from the processing chamber through a gate valve stencil is removed 1604, and 1607 through gate valve 1605 placed in the loadlock. 然后对该负载锁通风,模版1601在进入微环境腔1610之前从右至左穿过负载锁1605。 Then the loadlock vent stencil 1601 before entering the micro-environment chamber 1610 from right to left through loadlock 1605. 微环境腔1610可以充有清洁的过滤和/或者干燥的气体(例如干燥氮气)。 Microenvironment cavity 1610 may be filled with a cleaning filter and / or dry gas (e.g., dry nitrogen). 然后微环境自动装置1611将模版从负载锁中除去,并放置在位于脱吊舱器1608内的打开吊舱1609内。 Then the micro-environment robot 1611 stencil is removed from the load lock, positioned and placed in the de-podder 1608 1609 pod opening. 然后该脱吊舱器关闭吊舱。 The de-podder then closes the pod.

[0129] 参考图17,模版搬运系统也包括具有用于移动吊舱1703的大气自动装置1702的空气或者大气环境。 [0129] Referring to FIG. 17, the reticle handler system also comprises an atmospheric robot 1703 used to move pods atmosphere of air or 1702. 吊舱1703可以存放在吊舱存储架上,如图所示。 Pods 1703 can be stored in a pod storage rack, as shown in FIG. 一般利用由操作者抓取的显示为越过吊舱顶部的棒或手柄以及利用其外壳的与各种自动装置啮合的各部分来搬运吊舱1703。 Generally utilize grasped by the operator is displayed over the top of the nacelle or handle bars and portions of the housing with its engaging various automatic devices to carry the pods 1703. 显示为处于上位的吊舱升降机1705将由操作者放置在输入位置1706的吊舱1703提升到自动装置1702的搬运平面。 Is shown in the upper elevator car 1705 is disposed at the input by the operator positions the lift car 1706 1703 1702 robot conveying plane. 或者,可以将吊舱1703由将吊舱1703放置在自动装置1702可以直接到达的位置1707的架空轨道(未显示)传送给该工具。 Alternatively, pods 1703 can be placed in overhead track robot 1702 can directly reach a position 1707 (not shown) will be transmitted to the tool by the pod 1703. 自动装置1702能够将吊舱1703在上部升降机止动器1712、吊舱存储架1714、架空位置1707和/或者脱吊舱器1609之间移动。 Automatic device 1702 can be an elevator car in an upper stopper 1703 1712, 1714, pod storage rack 1609 is moved between positions 1707 and overhead / or de-podder. 一旦吊舱1703放置在脱吊舱器1609中,模版搬运核心1701 打开吊舱1703,并加工该模版1601,如上所述。 Once the pods 1703 placed in the de-podder 1609, reticle handler core 1701 opens the pod 1703 and 1601 process the template, as described above. 同样,在模版1601已经被加工之后,模版搬运核心1701将该模版再次放置在吊舱1703中,并关闭吊舱1703。 Similarly, in 1601, after the stencil has been processed, reticle handler core 1701 The template is again placed in the pod 1703 and closes the pod 1703. 因此,该工作在将模版搬运出吊舱1703的模版搬运核心1701和仅仅是搬运吊舱1703的搬运装置大气部分之间被划分。 Thus, the work conveying a stencil reticle handler core nacelle is divided between 1703 and 1701 only part of the air conveying means conveying the pod 1703.

[0130] 这两个子系统通过脱吊舱器1609彼此转移对模版1601的搬运。 [0130] These two subsystems transfer de-podder 1609 1601 stencil conveying each other. 模版搬运核心1701可以参考图16来描述,但是在图17中也可以看见,它位于大气自动装置1702之下。 Reticle handler core 1701 may be described with reference to FIG. 16, but can also be seen in FIG. 17, which is located below the atmospheric robot 1702. 为了便于读者确定方向,指出了真空腔1602、微环境腔1610、脱吊舱器1609以及微环境自动装置1611。 In order to facilitate the reader to ascertain the direction, it indicated the vacuum chamber 1602, the micro-environment chamber 1610, de-podder 1609 and the micro-environment robot 1611. 在大气环境和核心环境中都有存储能力。 In the atmospheric environment and the core environment has storage capacity.

[0131] 在一些实施方案中,过滤的空气环境也可以包括识别站,用于阅读:在吊舱1703 上编码的ID标记,连接至吊舱1703的智能标签等。 [0131] In some embodiments, the filtered air environment can also comprise identification station for reading: 1703 on the nacelle encoded ID tag, smart tag, etc. is connected to the nacelle 1703.

[0132] 在一些实施方案中,气体微环境可以包括:(a)识别站,用于读出在掩模上编码的ID标记;(b)热调整站,用于使得输入掩模的温度与预定的加工温度相平衡;(c)掩模检验站,用于检测在掩模的至少一个表面上的污染物;(d)掩模清洁站,用于从掩模的至少一个表面上除去表面污染物;和/或(e)掩模定向站,用于相对于机械将掩模进行精确的定向。 [0132] In some embodiments, the gas may include a micro-environment: (a) identification station for reading the ID mark encoded on a mask; (b) adjusting the thermal station, for causing the temperature of the input mask a predetermined processing temperature equilibrium; (c) a mask inspection station, for detecting contaminants on at least one surface of the mask; (d) a mask cleaning station, for removing from the surface on at least one surface of the mask contamination; and / or (e) a mask orienting station, for a mechanical mask with respect to accurate orientation. 而且在一些实施方案中,微环境用选自以下的气体进行净化,包括:过滤的干燥空气、合成空气、干燥氮气和干燥氧气的混合物、和/或干燥氮气或者其他气体。 And in some embodiments, the micro-environment purged with a gas selected from the group comprising: filtered dry air, synthetic air mixture, dry nitrogen and dry oxygen, and / or dry nitrogen, or other gases.

[0133] 在一些实施方案中,真空部分包括:(a)识别站,用于读出在掩模上编码的ID标记;(b)库(library),用于暂时性存储至少一个掩模;(c)热调整站,用于使得输入掩模的温度与预定的加工温度相平衡;(d)掩模检验站;(e)用于检测在掩模的至少一个表面上的污染物;(f)掩模清洁站,用于从掩模的至少一个表面上除去表面污染物;(g)掩模定向站, 用于相对于机械对掩模进行精确的定向;和/或(h)加工站,用于加工至少一个掩模。 [0133] In some embodiments, the vacuum portion comprises: (a) identification station for reading the ID mark encoded on a mask; (b) library (Library) for temporarily storing at least one mask; (c) adjusting the thermal station, for causing the temperature of the input mask is balanced with a predetermined processing temperature; (d) a mask inspection station; (e) for the contaminants on at least one surface of the mask is detected; ( f) a mask cleaning station, for removing at least one surface of the mask from the surface contamination; (G) a mask orienting station, for relative precise mechanical alignment of the mask; and / or (h) processing station, at least one mask used for processing. 在一些实施方案中,加工站用于利用光将掩模表面上的图案光刻复制到涂有光刻胶的晶片上。 In some embodiments, the processing station using a light mask for photolithography on the surface of the transfer pattern onto a photoresist coated wafer. 在一些实施方案中,光波长对应于光谱的极紫外(EUV)部分,在10-15纳米之间,优选在13 纳米。 In some embodiments, light having a wavelength corresponding to an extreme ultraviolet (EUV) portion of the spectrum in between 10-15 nm, preferably 13 nm.

[0134] ^^ [0134] ^^

[0135] 图18表示根据本发明的实施方案用于传输掩模的方法1800的流程图。 [0135] FIG 18 shows a flowchart of a method 1800 for transmitting a mask according to an embodiment of the present invention. 在步骤1802,将掩模的第一部分用可移式颗粒盖子(particle cover)覆盖。 In step 1802, the mask covering the first portion of the particles have removable lid (particle cover). 这样形成一个暂时的掩模_盖子装置,它保护着第一部分不受空气运载的颗粒污染。 Thus forming a temporary mask particle contamination _ cover means, which protects the first portion from the air carrier. 在步骤1804,将掩模的第二部分留下不覆盖。 In step 1804, the second portion of the mask is left uncovered. 在步骤1806,将该装置封闭在气密的盒子内。 In step 1806, the device is enclosed in an airtight box. 该盒子可以包括有掩模承载部分和能与该掩模承载部分分开的罩,用于保护掩模不受空气运载的分子污染。 The cassette may include a mask carrier part and a molecular contamination can cover portions are separated and the mask carrier, for protecting the mask from the carrier air. 在步骤1806,传输盒子内的装置。 It means in step 1806, the transmission box.

[0136] 图19表示根据本发明的实施方案传输、搬运和加工掩模的方法1900的流程图。 [0136] FIG. 19 shows a flowchart of a method 1900 according to embodiments of the transmission, handling and processing a mask according to the present invention. 在步骤1902,将掩模的第一部分用可移式颗粒盖子覆盖。 In step 1902, a first portion of the mask is covered with a removable cover type particle. 这样形成一个暂时的掩模-盖子装置,以保护第一部分不受空气运载的颗粒污染。 A temporary mask thus formed - cover means to protect a first portion of particulate contamination from the air carrier. 在步骤1904,将掩模的第二部分留下不覆盖。 In step 1904, the second portion of the mask is left uncovered. 在步骤1906,将该装置封闭在气密的盒子内。 In step 1906, the device is enclosed in an airtight box. 该盒子可以具有掩模承载部分和能与该掩模承载部分分开的罩,用于保护掩模不受空气运载的分子污染。 The cassette may have a molecular contamination mask carrying portion and the mask can be separated from the cover carrying portion, for protecting the mask from the carrier air.

[0137] 在步骤1908,将带有该装置的盒子传输到加工工具。 [0137] In step 1908, the cassette with the transfer means to the processing tool. 该加工工具具有以下每种部件的至少一个,包括:脱吊舱器、微环境腔、微环境操纵器、负载锁、真空腔、真空操纵器以及掩模支座。 The processing tool having at least one each of the following components, comprising: a de-podder, micro-environment chamber, the micro-environment manipulator, a loadlock, a vacuum chamber, a vacuum manipulator and a mask mount. 在步骤1910,将包含有该装置的盒子放在脱吊舱器的第一开口上,使得盒子的罩防止气体通过该第一开口而流动。 In step 1910, the apparatus comprising the cassette is placed on a first opening of a de-podder, such that the cover of the box prevents gas flow through the first opening. 在步骤1912,用清洁气体净化脱吊舱器的内部。 In step 1912, an internal purge de-podder with clean gas. 在步骤1914,将掩模运载部分和罩分开而打开该盒子,保持罩在原位,用于阻挡气体流动,将掩模运载部分和该装置移动到脱吊舱器的内部。 In 1914, the mask-carrying portion and a separating step of the cover of the box is opened, the cover remains in place, for blocking gas flow, and the mask-carrying portion of the device is moved to the interior of the de-podder. 在步骤1916,利用微环境操纵器通过第二脱吊舱器开口而将该装置从脱吊舱器抽取到微环境腔内,并将该装置通过第一负载锁开口放到负载锁内部。 In step 1916, using a micro-environment manipulator via a second de-podder opening while the device is withdrawn from the off to the microenvironment pod cavity means and opening into the interior of the load lock by the first load lock. 在步骤1918,抽空负载锁。 In step 1918, the loadlock evacuated. 在步骤1920,利用真空操纵器将该装置通过第二负载锁从该负载锁中抽出,并将该装置移动到真空腔内。 In step 1920, the device using a vacuum manipulator withdrawn from the loadlock through a second loadlock, and the device is moved into the vacuum chamber. 在步骤1922,将该装置放置在掩模支座上,使得掩模的未覆盖部分与支座相接触。 In step 1922, the device is placed on a mask mount, such that the mask does not cover the portion of the contact carrier. 在步骤1924,利用该支座保持该掩模。 In step 1924, the use of the holder holding the mask. 在步骤1926,利用真空操纵器,将盖子与掩模分开,取走或者重新定位盖子。 In step 1926, using a vacuum manipulator, and a mask separate lid, the lid is removed or repositioned. 在步骤1928, 加工掩模。 In step 1928, the mask processing.

[0138] 图20表示用于将掩模在负载锁中从大气压力传输到真空的方法2000的流程图。 [0138] FIG. 20 shows a flowchart for the mask loadlock transmitted from atmospheric pressure to vacuum in method 2000. 在步骤2002,将掩模放置在负载锁内。 In step 2002, the mask is placed inside a loadlock. 在步骤2004,将掩模用圆顶覆盖,以防止负载锁中的空气运载的颗粒到达掩模。 In step 2004, the mask is covered with a dome to prevent loadlock air carrying particles from reaching a mask. 在步骤2006,关闭负载锁。 In step 2006, the load lock is closed. 在步骤2008,抽空负载锁。 In step 2008, taking the load lock. 在步骤2010,打开负载锁至真空。 In step 2010, the loadlock is opened to vacuum. 在步骤2012,缩回圆顶而使得掩模不被覆盖。 In step 2012, the mask is retracted so that the dome is not covered. 在步骤2014,从负载锁中移开掩模。 In step 2014, the mask is removed from the load lock.

[0139] 图21表示用于将掩模在从负载锁中真空传输到大气压力的方法2100的流程图。 [0139] FIG. 21 shows a mask for transfer from the load lock vacuum to atmospheric pressure method of flowchart 2100. 在步骤2102,将掩模放置在负载锁内。 In step 2102, the mask is placed inside a loadlock. 在步骤2104,将掩模用圆顶覆盖。 In step 2104, the mask is covered with a dome. 该覆盖步骤2014用于防止负载锁中变为空气运载的颗粒在随后的通风和打开步骤中到达掩模。 The covering step 2014 for preventing the load lock becomes air carrying particles from reaching a mask during subsequent venting and opening steps of. 在步骤2106, 关闭负载锁。 In step 2106, the loadlock off. 在步骤2108,对负载锁进行通风。 In step 2108, the load locks ventilation. 在步骤2110,将负载锁的大气端打开至大气环境。 In step 2110, the loadlock is opened to the atmosphere end atmosphere. 在步骤2112,空气运载的颗粒沉降。 In step 2112, the air carrying particles settle. 在步骤2114,缩回圆顶而使得掩模不被覆盖。 In step 2114, the mask is retracted so that the dome is not covered. 在步骤2116,从负载锁中移开掩模。 In step 2116, the mask is removed from the load lock.

[0140] 图22表示用于传输、搬运和加工掩模的方法2200的流程图。 [0140] FIG. 22 shows a method for transmitting, handling and processing a mask 2200 flowchart. 在步骤2202,将掩模封闭在一个气密的盒子中,该盒子具有掩模运载部分以及能与该掩模运载部分分开的罩, 用于保护掩模不会受到空气运载的分子的污染。 In step 2202, the mask is enclosed in a gas-tight box, having a mask-carrying portion of the box and can be distinguished from the mask-carrying portion of the cover, for protecting the mask is not contaminated air carrier molecule. 在步骤2204,将包含有该掩模的盒子传送到加工工具,该工具具有以下每个部件中的至少一种:(a)脱吊舱器;(b)微环境腔;(c)微环境操纵器;(d)负载锁;(e)真空腔;(f)真空操纵器以及掩模支座。 In step 2204, the box containing the mask has transferred to the machining tool, the tool having each at least one of the following components: (a) de-podder; (b) the micro-environment chamber; (c) micro-environment manipulator; (d) a load lock; (e) a vacuum chamber; (f) a vacuum manipulator and a mask mount. 在步骤2206,将包含有该掩模的盒子放在脱吊舱器的第一开口上,使得盒子的罩防止气体通过该第一开口而流动。 In step 2206, the mask will contain the first box on the opening of the de-podder, such that the cover of the box prevents gas flow through the first opening. 在步骤2208,用清洁气体(例如干燥氮气)净化脱吊舱器的内部。 In step 2208, an internal purge de-podder with clean gas (e.g. dry nitrogen). 在步骤2210,将掩模运载部分和罩分开而打开该盒子,保持罩在原位,用于阻挡气体流动,将掩模运载部分和该掩模移动到脱吊舱器的内部。 In 2210, the mask-carrying portion and a separating step of the cover of the box is opened, the cover remains in place, for blocking gas flow, the mask-carrying portion and the mask to move the inner de-podder. 在步骤2212,利用微环境操纵器,通过第二脱吊舱器开口而将该掩模从脱吊舱器抽取到微环境腔内,并将该掩模通过第一负载锁开口放到负载锁内部。 In step 2212, using a micro-environment manipulator, while the mask is extracted from the de-podder through a second de-microenvironment pod cavity opening and the mask openings into the loadlock through a first loadlock internal. 在步骤2214,抽空负载锁。 In step 2214, the loadlock evacuated. 在步骤2216,利用真空操纵器将该掩模通过第二负载锁开口从该负载锁中抽出,并将该掩模移动到真空腔内。 In step 2216, the mask using a vacuum manipulator withdrawn from the loadlock through a second loadlock opening and moving the mask to the vacuum chamber. 在步骤2218,将该掩模放置在掩模支座上。 In step 2218, the mask is placed on a mask mount. 在步骤2220,加工掩模。 In step 2220, the mask processing.

[0141] 总之,在上述几个实施方案中,模版面临三个环境:吊舱环境(例如净化的干燥气体微环境)、脱吊舱器至负载锁环境(例如真空)、以及从负载锁至卡盘环境。 [0141] In summary, in several embodiments above, the stencil facing three environments: pod environment (e.g., the drying gas purge microenvironment), de-podder to loadlock environment (e.g., vacuum), and from loadlock to chuck environment. 在每个环境过渡中可以将模版封装。 In each environment transition template may be encapsulated. 在一些实施方案中,通过如下步骤使用双重包套吊舱,包括:打开吊舱,净化脱吊舱器,等待气流稳定,打开膜盒,从膜盒中抽出模版和/或盖子。 In some embodiments, by the steps of using a double wrap pod, comprising: opening the pod, purification de-podder, waiting for a stable air flow, the capsule is opened, extracting the stencil and / or cover from the film cassette. 在另一些实施方案中,通过如下步骤使用带有圆顶的特殊设计的负载锁,包括:将模版和/或盖子放置在负载锁中,用圆顶覆盖模版,通风以净化负载锁,等待气流稳定,升高圆顶,将模版和/或盖子从负载锁中抽出。 In other embodiments, a special design loadlock with dome by the steps comprising: a stencil and / or the lid is placed in the loadlock, covering the dome with the template, to vent purge the loadlock, waiting for airflow stability, increased dome, stencil and / or withdrawn from the load lock lid. 在另外的实施方案中,通过在压力过渡中控制气流或者在模版前侧上过滤气流(帘/阻挡件)而不使用物理阻挡件来防止在有图案的区域上的颗粒沉降。 In a further embodiment, the pressure by controlling the air flow in the transition or filtering gas flow (curtain / barrier) on the front side of the template without using a physical barrier to prevent the particles in the region of the settling pattern. 在另外的实施方案中,利用透气盖子采用不透过颗粒的物理阻挡件来保护模版,或者将模版盖着盖子存储在吊舱内,该模版和盖子放在负载锁内,盖着盖子进行压力过渡,当进入真空环境中时除去盖子。 In a further embodiment, the use of air-permeable cap is not employed to protect the template particles through a physical barrier, or in the nacelle, the stencil on the stencil covered with a lid and stored within the cover loadlock, the pressure lid covered transition, when the lid is removed into the vacuum environment.

[0142] 通过采用上述实施方案,即使对各种系统和系统的各部件使用不理想的材料,也能减少颗粒的产生。 [0142] With the above embodiments, even if not preferable materials for the various systems and components of the respective systems, but also can reduce generation of particles. 这部分是通过使用保护性框架、盖子等以及使用了边缘处理策略来实现的。 This is partly achieved by using a protective frame, cover, etc. and using edge handling policy.

[0143] Mrk [0143] Mrk

[0144] 尽管以上已经描述了本发明的各实施方案,但是可以理解,这仅是一种示例,而不是对其的限制。 [0144] While the above embodiment has been described in various embodiments of the present invention, it will be appreciated that this is merely an example, and not limitation thereof. 相关领域的技术人员可以理解,在不脱离本发明精神和范围的前提下可以对形式和细节作各种改变。 Skilled in the relevant art may be appreciated without departing from the spirit and scope of the invention various changes may be made in form and detail. 因此,本发明的范围应当不限于上述任何示例性的实施方案,只应当由所附的权利要求和其等同内容来限定。 Accordingly, the scope of the invention should not be limited to any of the above-described exemplary embodiments, but should be defined by the appended claims and their equivalents.

21 twenty one

Claims (49)

  1. 一种保护模版的系统,包括:盖子,该盖子保护模版,该盖子包括:框架,该框架将该盖子联接到该模版,并且在该框架内容纳该模版的至少一部分,该框架包括对准装置;和可复位的面板,当该模版处于曝光位置时,该可复位面板移动离开该模版,以允许光线在曝光过程中直接到达该模版,该可复位面板包括与该框架上的对准装置相对应的对准装置;所述保护模版的系统还包括吊舱,该吊舱用于将该模版与该盖子传输通过该系统,且所述吊舱提供一盒,所述盒通过将基部固定至罩而形成,所述基部支撑所述模版,所述盒保护所述模版免受污染物的污染。 A protective stencil, comprising: a cover template protection, the cover comprising: a frame coupled to the cap of the stencil, and the stencil is satisfied that at least a portion of the content in the frame, the frame comprises alignment means ; and reset the panel, when the stencil is in the exposure position, the panel can be moved away from the reset stencil, the stencil to allow direct light from reaching the exposure process, the panel may include a reset phase and the alignment means on the frame corresponding to the alignment means; said protection system further comprises a pod stencil, the stencil for the car with the cover through the transmission system, and to provide a box of the pod, the cartridge is fixed to the base by the cover is formed, the base support of the stencil, the stencil from the protective box related pollution.
  2. 2.根据权利要求1所述的系统,还包括:联接至该盖子的自动操纵机械手,该自动操纵机械手构造成允许一自动装置利用该自动操纵机械手来移动该盖子和模版。 2. The system according to claim 1, further comprising: a cap coupled to the robot gripper, the robot gripper is configured to allow the use of a robot to move the robot gripper and the cover template.
  3. 3.根据权利要求2所述的系统,还包括:连接至该自动操纵机械手和盖子的基板。 3. System according to claim 2, further comprising: a substrate coupled to the robotic manipulator and the lid.
  4. 4.根据权利要求3所述的系统,还包括:该基板上的对准装置以及该可复位面板上的对应的对准装置。 4. The system of claim 3, further comprising: alignment means on the substrate and a corresponding alignment means on the panel can be reset.
  5. 5.根据权利要求1所述的系统,其中,该对应的对准装置包括下列中的一种:运动支座,磁体与磁靶,重力依赖装置,和机械紧固件。 5. The system according to claim 1, wherein the corresponding alignment means comprises one of the following: movement of the support, the magnet of the magnetic target, gravity dependent devices, and mechanical fasteners.
  6. 6.根据权利要求4所述的系统,其中,该对应的对准装置包括下列中的一种:运动支座,磁体与磁靶,重力依赖装置,和机械紧固件。 6. The system according to claim 4, wherein the corresponding alignment means comprises one of the following: movement of the support, the magnet of the magnetic target, gravity dependent devices, and mechanical fasteners.
  7. 7.根据权利要求1所述的系统,还包括平台,该平台构造成联接至该盖子。 7. The system according to claim 1, further comprising a platform configured to be coupled to the lid.
  8. 8.根据权利要求7所述的系统,其中,该平台具有连接装置,并且该框架具有对应的连接装置,使得当该盖子保持该模版时,该盖子可拆卸地连接至该平台。 8. The system of claim 7, wherein the platform has a coupling means, and the frame having a corresponding connecting means such that when the cap holding the stencil, the cover is detachably connected to the internet.
  9. 9.根据权利要求8所述的系统,其中,该连接装置是一舌片和一闩锁。 9. The system of claim 8, wherein the connecting means is a tongue and a latch.
  10. 10.根据权利要求9所述的系统,其中,该闩锁是弹簧闩锁。 10. The system according to claim 9, wherein the latch is a spring latch.
  11. 11.根据权利要求9所述的系统,其中,该舌片包括电磁体,并且该闩锁包括永磁体。 11. The system according to claim 9, wherein the tongue comprises an electromagnet, and the latch comprises a permanent magnet.
  12. 12.根据权利要求9所述的系统,其中,该闩锁包括电磁体,并且该舌片包括永磁体。 12. The system according to claim 9, wherein the latch comprises an electromagnet and the tongue comprises a permanent magnet.
  13. 13.根据权利要求7所述的系统,还包括用于可拆卸地将该框架连接至该平台的装置。 13. The system according to claim 7, further comprising means for removably connecting the frame to the platform means.
  14. 14.根据权利要求3所述的系统,还包括:用于将该自动操纵机械手与该可复位面板对准的装置。 14. The system according to claim 3, further comprising: means for the robot gripper is aligned with the panel means may be reset.
  15. 15.根据权利要求3所述的系统,还包括:用于将该基板与该可复位面板对准的装置。 15. The system according to claim 3, further comprising: means for resetting the substrate and the panel can be used for alignment.
  16. 16.根据权利要求1所述的系统,还包括预对准装置,在将该模版传输至平台之前,该预对准装置对该模版进行对准。 16. The system according to claim 1, further comprising a pre-alignment means, before transmitting the template to the platform, the pre-alignment means for aligning the stencil.
  17. 17.根据权利要求16所述的系统,其中:该预对准装置和该框架包括对应的对准装置;和该框架和该平台包括对应的对准装置。 17. The system according to claim 16, wherein: the pre-alignment device and the frame includes a corresponding alignment means; and the frame and the platform includes a corresponding alignment means.
  18. 18.根据权利要求17所述的系统,其中,所述的对应对准装置是销与槽。 18. The system according to claim 17, wherein said alignment means is a pin corresponding to the groove. 2 2
  19. 19.根据权利要求17所述的系统,其中,所述的对应对准装置是运动对接装置。 19. The system according to claim 17, wherein said alignment means corresponding to the docking means is a motion.
  20. 20.根据权利要求16所述的系统,还包括: 用于将该预对准装置与该框架对准的装置;和用于将该框架与该平台对准的装置。 20. The system according to claim 16, further comprising: means for aligning the frame and the pre-alignment; the frame, and means for aligning the platform.
  21. 21.根据权利要求1所述的系统,其中,所述吊舱包括气密的外盒和固定在所述外盒内的透气的内膜盒。 21. The system according to claim 1, wherein the pod comprises a breathable outer box and hermetically secured in the outer box intimal cartridge.
  22. 22.根据权利要求1所述的系统,还包括预对准装置,在将该模版定位在该吊舱内之前,该预对准装置对该模版进行对准。 22. The system according to claim 1, further comprising a pre-alignment means, before the template positioned within the nacelle, the pre-alignment means for aligning the stencil.
  23. 23.根据权利要求1所述的系统,其中,该模版的预定区域被硬化,以减少该模版被接触时产生的颗粒。 23. The system according to claim 1, wherein the predetermined region of the template is hardened to reduce the particles generated when the stencil is in contact.
  24. 24.根据权利要求1所述的系统,其中,该模版的预定区域被形成为具有圆角,以减少该模版被接触时产生的颗粒。 24. The system according to claim 1, wherein the predetermined region of the stencil is formed with rounded corners to reduce the particles generated when the stencil is in contact.
  25. 25.根据权利要求1所述的系统,其中,该模版的预定区域被形成为具有球形,以减少该模版被接触时产生的颗粒。 25. The system according to claim 1, wherein the predetermined region of the stencil is formed to have a spherical shape to reduce the particles generated when the stencil is in contact.
  26. 26.根据权利要求1所述的系统,其中,该模版的预定区域被形成为具有环形,以减少该模版被接触时产生的颗粒。 26. The system according to claim 1, wherein the predetermined region of the template is formed to have a ring to reduce the particles generated when the stencil is in contact.
  27. 27.根据权利要求1所述的系统,其中,该模版的预定区域受到热处理,以硬化该预定区域,从而减少该模版被接触时产生的颗粒。 27. The system according to claim 1, wherein the predetermined region of the stencil is subjected to heat treatment to harden the predetermined region, thereby reducing the particles generated when the stencil is in contact.
  28. 28.根据权利要求1所述的系统,其中,该模版的预定区域被局部处理,以减少该模版被接触时产生的颗粒。 28. The system according to claim 1, wherein the predetermined region of the template is locally processed to reduce the particles generated when the stencil is in contact.
  29. 29.根据权利要求1所述的系统,其中,用于容纳该至少一部分模版的一部分框架还用于支撑该至少一部分模版。 29. The system according to claim 1, wherein at least a part of the frame for receiving the portion of the template is also at least a portion for supporting the stencil.
  30. 30. 一种保护模版的系统,包括:盖子,该盖子保护模版,该盖子包括:框架,该框架将该盖子联接到该模版,并且在该框架内容纳该模版的至少一部分;和可复位的面板,当该模版处于曝光位置时,该可复位面板移动离开该模版,以允许光线在曝光过程中直接到达该模版;和吊舱,该吊舱用于将该模版与该盖子传输通过该系统,且所述吊舱提供一盒,所述盒通过将基部固定至罩而形成,所述基部支撑所述模版,所述盒保护所述模版免受污染物的污^fe ο 30. A stencil protection system, comprising: a cover template protection, the cover comprising: a frame coupled to the cap of the stencil, and the stencil is satisfied that at least a portion of the content in the frame; and a resettable panel, when the stencil is in the exposure position, the panel can be moved away from the stencil reset to allow light to reach the stencil directly during exposure; and car, the car with the cover for the stencil transmitted through the system and providing a box of the pod, the cartridge is formed by a base fixed to the cover, the base support of the stencil, the stencil from the protective box dirt contaminants ^ fe ο
  31. 31. 一种保护模版的系统,包括:盖子,该盖子保护模版,该盖子包括:框架,该框架将该盖子联接到该模版,并且在该框架内容纳该模版的至少一部分;和可复位的面板,当该模版处于曝光位置时,该可复位面板移动离开该模版,以允许光线在曝光过程中直接到达该模版;平台,该平台构造成联接至该盖子;和吊舱,该吊舱用于将该模版与该盖子传输通过该系统,且所述吊舱提供一盒,所述盒通过将基部固定至罩而形成,所述基部支撑所述模版,所述盒保护所述模版免受污染物的污^fe ο 31. A stencil protection system, comprising: a cover template protection, the cover comprising: a frame coupled to the cap of the stencil, and the stencil is satisfied that at least a portion of the content in the frame; and a resettable panel, when the stencil is in the exposure position, the panel can be moved away from the stencil reset to allow light to reach the stencil directly during exposure; platform configured to be coupled to the cover; and a nacelle, the nacelle with the template in the cover through which the transmission system, and to provide a box of the pod, the cartridge is formed by a base fixed to the cover, the base support of the stencil, the stencil from the protective box dirt contaminants ^ fe ο
  32. 32.根据权利要求31所述的系统,其中,该平台具有连接装置,并且该框架具有对应的连接装置,使得当该盖子保持该模版时,该盖子可拆卸地连接至该平台。 32. The system according to claim 31, wherein the platform has a coupling means, and the frame having a corresponding connecting means such that when the cap holding the stencil, the cover is detachably connected to the internet.
  33. 33.根据权利要求32所述的系统,其中,所述连接装置是互补的。 33. The system according to claim 32, wherein said connector means are complementary.
  34. 34.根据权利要求32所述的系统,其中,该第一和第二连接装置中的一个包括弹簧闩锁,该第一和第二连接装置中的另一个包括舌片。 34. The system according to claim 32, wherein the first and second connection means comprises a spring latch, the other of the first and second connection means comprises a tongue.
  35. 35.根据权利要求32所述的系统,其中,该第一和第二连接装置中的一个包括电磁体, 该第一和第二连接装置中的另一个包括永磁体。 35. The system according to claim 32, wherein the first and second electromagnet comprises a connecting means, the other of the first and second connection means comprises a permanent magnet.
  36. 36. 一种保护模版的系统,包括: 盖子,该盖子保护模版,该盖子包括:框架,该框架将该盖子联接到该模版,并且在该框架内容纳该模版的至少一部分;和可复位的面板,当该模版处于曝光位置时,该可复位面板移动离开该模版,以允许光线在曝光过程中直接到达该模版;和吊舱,该吊舱用于将该模版与该盖子传输通过该系统,且所述吊舱提供一盒,所述盒通过将基部固定至罩而形成,所述基部支撑所述模版,所述盒保护所述模版免受污染物的污^fe ο 36. A stencil protection system, comprising: a cover template protection, the cover comprising: a frame coupled to the cap of the stencil, and the stencil is satisfied that at least a portion of the content in the frame; and a resettable panel, when the stencil is in the exposure position, the panel can be moved away from the stencil reset to allow light to reach the stencil directly during exposure; and car, the car with the cover for the stencil transmitted through the system and providing a box of the pod, the cartridge is formed by a base fixed to the cover, the base support of the stencil, the stencil from the protective box dirt contaminants ^ fe ο
  37. 37. 一种保护模版的系统,包括: 掩模,该掩模具有前侧和后侧;可拆卸颗粒盖子,该可拆卸颗粒盖子构造成被定位在第一位置和第二位置,该可拆卸颗粒盖子在该第一位置基本覆盖该掩模的前侧,该可拆卸颗粒盖子在该第二位置远离处于曝光位置的掩模,以允许利用该掩模进行光刻曝光,该可拆卸颗粒盖子包括: 板,该板具有面向该掩模的第一侧和背离该掩模的第二侧; 框架,该框架在该掩模的前侧的边缘处支撑该掩模;和运动支架,该运动支架联接至该板,该运动支架从该板的第一侧伸出并接触该框架;和吊舱,该吊舱用于将该模版与该盖子传输通过该系统,且所述吊舱提供一盒,所述盒通过将基部固定至罩而形成,所述基部支撑所述模版,所述盒保护所述模版免受污染物的污^fe ο 37. A stencil protection system, comprising: a mask, the mask having a front side and a rear side; removable particle cover the removable particle cover configured to be positioned in a first position and a second position, the detachable in this first position the particles cover substantially covers the front side of the mask, the removable particle cover the mask in the second position away from the exposure position to allow exposure photolithography using the mask, the removable particle cover comprising: a plate having a first side facing the mask and away from the second side of the mask; a frame supporting the mask at the front edge side of the mask; and movement of the carriage, the movement coupled to the plate holder, the movement of the holder extends from a first side of the plate and contacts the frame; and car, the car with the cover for the stencil transmission through the system, and provides a the pod a cassette formed by a base fixed to the cover, the base support of the stencil, the stencil from the protective box dirt contaminants ^ fe ο
  38. 38.根据权利要求37所述的系统,其中,该板对至少一种波长的光是透明的,以允许检查该掩模的第一侧。 38. The system according to claim 37, wherein the at least one wavelength plate is transparent to light to allow inspection of the first side of the mask.
  39. 39.根据权利要求37所述的系统,还包括;位于该板的第二侧上的位置定位器,以便于用操纵器精确地保持该盖子。 39. The system according to claim 37, further comprising; position location on a second side of the plate, so as to be accurately maintained with the actuator cap.
  40. 40.根据权利要求37所述的系统,其中,该板还包括至少一个孔。 40. The system according to claim 37, wherein the plate further comprises at least one aperture.
  41. 41.根据权利要求40所述的系统,其中,该板内的该至少一个孔包括空气过滤器。 41. The system according to claim 40, wherein the at least one aperture in the panel includes an air filter.
  42. 42.根据权利要求37所述的系统,其中,该框架具有适合于与闩锁相协作的舌片。 42. The system according to claim 37, wherein the frame is adapted to cooperate with the latch lock tongue.
  43. 43.根据权利要求37所述的系统,其中,该框架为矩形并且基本上绕该掩模的边缘包围该掩模,从而保持该掩模的第一和第二表面敞开。 43. The system according to claim 37, wherein the frame is rectangular and the edges of the mask around substantially surrounds the mask, so as to maintain the first and second open surface of the mask.
  44. 44.根据权利要求37所述的系统,其中,该框架具有定位配件,该定位配件接触该掩模,从而相对于该框架定位该掩模。 44. The system according to claim 37, wherein the frame has a catch fitting, the fitting is positioned in contact with the mask, thereby positioning the frame with respect to the mask.
  45. 45.根据权利要求44所述的系统,其中,该定位配件设于该框架的至少一个角部。 At least one corner 45. The system according to claim 44, wherein the positioning parts provided on the frame.
  46. 46.根据权利要求37所述的系统,其中,该运动支架包括闩锁。 46. ​​The system according to claim 37, wherein the movement of the holder includes a latch.
  47. 47.根据权利要求37所述的系统,其中,该运动支架包括设在该板上的销以及设在该框架内的孔。 47. The system according to claim 37, wherein the movement of the holder comprises a pin and a hole provided in the frame provided in the plate.
  48. 48.根据权利要求37所述的系统,还包括: 基本气密的盒子,该盒子承载该掩模。 48. The system according to claim 37, further comprising: a substantially airtight box which carries the mask.
  49. 49.根据权利要求37所述的系统,其中,该掩模包括反射型掩模,其前侧具有反射性。 49. The system according to claim 37, wherein the mask comprises a reflective mask, the front side reflective.
CN 200710102349 2002-02-22 2003-02-21 System and method for using a two part cover for protecting a reticle CN101105637B (en)

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US35835402P true 2002-02-22 2002-02-22
US60/358354 2002-02-22
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US41435802P true 2002-09-30 2002-09-30
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248508A (en) 1979-08-03 1981-02-03 The Perkin-Elmer Corporation Projection mask storage and carrier system
US5611452A (en) 1992-04-08 1997-03-18 Asyst Technologies, Inc. Sealable transportable container having improved liner
US6239863B1 (en) 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6317479B1 (en) 1996-05-17 2001-11-13 Canon Kabushiki Kaisha X-ray mask, and exposure method and apparatus using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248508A (en) 1979-08-03 1981-02-03 The Perkin-Elmer Corporation Projection mask storage and carrier system
US5611452A (en) 1992-04-08 1997-03-18 Asyst Technologies, Inc. Sealable transportable container having improved liner
US6239863B1 (en) 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same

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CN101105636A (en) 2008-01-16
CN101105637A (en) 2008-01-16

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